Method of analyzing spectral peaks
By generating interference curve parameters and fitting multiple curves to the interference peaks of the optical spectrometer, the problem of analytical errors caused by overlapping spectral peaks was solved, thus improving the accuracy and efficiency of spectral analysis.
Patent Information
- Application Number
- CN202211623392.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-12-17
- Filing Date
- 2022-12-16
- Publication Date
- 2026-07-21
- Estimated Expiration
- 2042-12-16
AI Technical Summary
When analyzing samples, existing optical spectrometers suffer from overlapping spectral peaks, leading to misidentification and increased analysis time. Existing inter-element correction algorithms are not suitable for resolving all overlapping peaks, and the resolution depends on the optical spectrometer.
By generating interference curve parameters, based on the expected curve parameter model of the optical spectrometer and the detector position, multiple curves are fitted to the interference peak. The interference peak is analyzed using a double Gaussian curve model and regression algorithm, and the peak wavelength and intensity are optimized.
It enables efficient analysis of overlapping spectral peaks, simplifies user operation, improves analysis accuracy and efficiency, and reduces dependence on the resolution of optical spectrometers.