Coated glass, laminated glass and manufacturing method
By introducing functional layers and optical reflective layers into the glass structure, the existing glass windows are solved, and the cost and difficulty in manufacturing are high when superimposing multifunctional layers is achieved, the projection function and other functions are integrated, and the performance of glass is improved.
Patent Information
- Application Number
- CN202411861162.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-17
- Publication Date
- 2025-03-21
AI Technical Summary
In the process of multi-function layering, existing glass windows are costly and difficult to produce and manage. Especially when implementing HUD functions, custom wedge-shaped film molds are required, resulting in increased costs and difficulties.
By setting a functional layer and an optical reflective layer in the glass structure, a multi-layer functional layer with composite functions is introduced, and the optical projection reflectivity of the glass is adjusted through the optical reflective layer to eliminate ghosting, improve brightness, and improve projection display quality.
The projection function is integrated with functions such as ultraviolet isolation, electrical heating and infrared heat insulation, which reduces costs and improves the performance of glass, including wear and scratch resistance, environment resistance, high and low temperature resistance, and water and gas resistance.
Smart Images
Figure CN119661090A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of glass technology, and in particular to a coated glass, a laminated glass and a manufacturing method thereof. Background Art
[0002] The demand for performance of existing glass windows, such as car windshields, windows and sunroofs, high-speed rail windows, train windows, and cruise ship windows, is becoming increasingly obvious. Various functional requirements need to be achieved by stacking various functional layers, but the cost is generally high. For glass with HUD (Head Up Display) function, it is necessary to use wedge-shaped films on the basis of stacking multiple functional layers to solve the problem of glass ghosting. However, since this method has high optical requirements, each model needs to customize the wedge-shaped film mold, resulting in high cost of wedge-shaped films and increased difficulty in production and manufacturing control. Summary of the invention
[0003] The present application provides a coated glass, a laminated glass and a manufacturing method to improve the performance of the glass.
[0004] A first aspect of the present application provides a coated glass, comprising:
[0005] substrate;
[0006] A functional layer is disposed on the substrate;
[0007] The optical reflective layer is arranged on a side of the functional layer away from the substrate.
[0008] In some embodiments, the optical reflective layer is selected from one or more of a silicon oxide / niobium oxide composite film, a silicon oxide / titanium oxide composite film, a silicon oxynitride / titanium oxide composite film, a silicon oxynitride / niobium oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / titanium oxide / silicon oxide composite film, and a silicon oxynitride / titanium oxide / silicon oxide composite film.
[0009] In some embodiments, the optical reflective layer has a thickness ranging from 50 to 800 nm.
[0010] In some embodiments, the reflectivity of the optical reflective layer is greater than or equal to 8%.
[0011] In some embodiments, the functional layer includes any one of an anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, and a defogging layer.
[0012] In some embodiments, the functional layer includes a first anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a defogging layer, and a second anti-reflection layer which are sequentially stacked in a direction away from the substrate.
[0013] In some embodiments, the coated glass satisfies any of the following conditions:
[0014] The materials of the first anti-reflection layer and the second anti-reflection layer are selected from one or more of silicon oxide, silicon oxynitride, niobium silicon oxide, titanium oxide, and titanium oxynitride, and the thickness of the first anti-reflection layer and the second anti-reflection layer ranges from 5 to 800 nm;
[0015] The material of the ultraviolet isolation layer is selected from one or more of indium oxide, zinc oxide, tin oxide, titanium oxide, magnesium zinc oxide, tantalum titanium oxide, indium tin oxide, and zinc aluminum oxide, and the thickness of the ultraviolet isolation layer ranges from 2 to 500 nm;
[0016] The material of the infrared heat insulation layer is selected from one or more of tungsten and tungsten oxide, silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium tungsten oxide, iridium manganate, titanium, nickel, chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide, indium tin oxide, zinc aluminum oxide, zinc tin oxide, and fluorine-doped tin oxide. The thickness of the infrared heat insulation layer ranges from 2 to 5000 nm.
[0017] The material of the demisting layer is selected from one or more of indium tin oxide, zinc aluminum oxide, zinc boron oxide, zinc gallium oxide, zinc indium gallium oxide, fluorine-doped tin oxide, nano silver mesh, and porous nano silver film, and the thickness of the demisting layer ranges from 10 to 1200 nm.
[0018] In some embodiments, the functional layer includes a first anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a first defogging layer, a second anti-reflection layer, a second defogging layer and a third anti-reflection layer which are stacked in sequence in a direction away from the substrate.
[0019] In some embodiments, a low-reflection hardening layer is further provided on the side of the optical reflective layer away from the substrate, and the material of the low-reflection hardening layer is selected from one or more of tungsten oxide, tungsten oxide, nickel chromium oxide, silicon oxynitride, and aluminum oxide, and the thickness of the low-reflection hardening layer ranges from 15 to 500 nm.
[0020] A second aspect of the present application provides a laminated glass, comprising:
[0021] a first substrate glass;
[0022] A functional layer is disposed on the first glass substrate;
[0023] A second glass substrate is arranged on a side of the functional layer away from the first glass substrate;
[0024] The optical reflective layer is arranged on a side of the second glass substrate away from the first glass substrate.
[0025] A third aspect of the present application provides a method for manufacturing glass, which is used to manufacture the aforementioned coated glass or laminated glass. The method for manufacturing glass comprises the following steps: forming a functional layer and an optical reflective layer on a substrate.
[0026] The present application has the following beneficial effects: The present application provides a coated glass, a laminated glass and a manufacturing method, wherein a functional layer and an optical reflective layer are provided in the glass structure, and the function of the thin film on the glass surface is increased by introducing a functional layer with a multi-layer composite function. In addition, the reflectivity of the glass optical projection is adjusted by providing an optical reflective layer, which helps to eliminate ghosting and increase brightness, and improve the quality of projection display. Thus, the projection function can be integrated with various optional functions such as ultraviolet isolation, electric heating and infrared heat insulation. In addition, the wear resistance, scratch resistance, environmental resistance, high and low temperature resistance, water vapor resistance and other properties of the glass structure can be improved by adding a low-reflective hardening layer 400 and a waterproof and wear-resistant layer 500. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.
[0028] Figure 1 A schematic structural diagram of a coated glass is shown as an example.
[0029] Figure 2 A schematic structural diagram of another type of coated glass is shown as an example.
[0030] Figure 3 A schematic structural diagram of another coated glass is shown as an example.
[0031] Figure 4 A schematic structural diagram of a laminated glass is shown as an example.
[0032] Figure 5 A schematic structural diagram of another type of laminated glass is shown as an example.
[0033] Figure 6 A schematic diagram showing the sequence of steps of a method for manufacturing glass is shown as an example.
[0034] Description of the markings of the accompanying drawings: 100 - substrate, 110 - first substrate glass, 120 - second substrate glass, 200 - functional layer, 210 - dielectric layer, 220 - first anti-reflection layer, 230 - ultraviolet isolation layer, 240 - infrared heat insulation layer, 250 - demisting layer, 251 - first demisting layer, 252 - second demisting layer, 260 - second anti-reflection layer, 270 - third anti-reflection layer, 300 - optical reflective layer, 400 - low-reflection hardening layer, 500 - waterproof and wear-resistant layer, 600 - adhesive layer. DETAILED DESCRIPTION
[0035] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present application. In addition, it should be understood that the specific implementation methods described herein are only used to illustrate and explain the present application and are not used to limit the present application. In the present application, unless otherwise stated, the directional words used, such as "up", "down", "left", and "right", generally refer to the up, down, left, and right of the device in actual use or working state, specifically the drawing direction in the accompanying drawings.
[0036] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features.
[0037] The present application provides a coated glass, a laminated glass and a manufacturing method, which are described in detail below. It should be noted that the description order of the following embodiments does not limit the preferred order of the embodiments of the present application. In the following embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, please refer to the relevant description of other embodiments.
[0038] See also Figure 1 An embodiment of the present application provides a coated glass, including a substrate 100 , a functional layer 200 and an optical reflective layer 300 .
[0039] For example, the substrate 100, the functional layer 200 and the optical reflective layer 300 may be arranged in sequence. Of course, in other examples, other film layers and structures may be arranged between the substrate 100 and the functional layer 200, and between the functional layer 200 and the optical reflective layer 300, and this embodiment does not constitute an undue limitation thereto.
[0040] The substrate 100 may be a flat substrate or a curved substrate, and is usually made of a transparent material. The substrate 100 may be made of glass, organic glass, PET, PC, PMMA, PI, etc., and the examples in this embodiment do not constitute an improper limitation thereto.
[0041] The functional layer 200 is used to realize the required functions. Here, the functional layer 200 is arranged on the substrate 100 to realize the corresponding functional requirements.
[0042] The optical reflective layer 300 is disposed on a side of the functional layer 200 away from the substrate 100 , so that the coated glass can meet the requirements of optical projection.
[0043] The embodiment of the present application adjusts the reflectivity of glass optical projection by disposing the optical reflective layer 300, which helps to eliminate ghosting and increase brightness, and improves the quality of projection display.
[0044] In some embodiments, the optical reflective layer 300 is selected from one or more of a silicon oxide / niobium oxide composite film, a silicon oxide / titanium oxide composite film, a silicon oxynitride / titanium oxide composite film, a silicon oxynitride / niobium oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / titanium oxide / silicon oxide composite film, and a silicon oxynitride / titanium oxide / silicon oxide composite film.
[0045] Here, the A / B composite film refers to a composite film layer having two film layers of material A and material B, for example, a silicon oxide / niobium oxide composite film refers to a composite film layer including at least one silicon oxide film layer and at least one niobium oxide film layer, for example, the composite film layer includes a silicon oxide film layer and a niobium oxide film layer disposed thereon. A / B / C composite film refers to a composite film layer having three film layers of material A, material B and material C, for example, a silicon oxide / niobium oxide / silicon oxide composite film refers to a composite film layer having three film layers of material silicon oxide, niobium oxide and silicon oxide, usually these composite film layers include a number of film layers stacked in sequence according to the order described by the name of the composite film layer, for example, a silicon oxide / niobium oxide / silicon oxide composite film is a silicon oxide film layer, a niobium oxide film layer and a silicon oxide film layer stacked in sequence.
[0046] The principle of setting the composite film is to achieve optical matching through different refractive indices of optical materials, thereby achieving the desired optical effect. Exemplarily, it can be stacked in the order of a first high refractive index film layer, a low refractive index film layer, and a second high refractive index film layer, wherein the refractive indexes of the first high refractive index film layer and the second high refractive index film layer are both higher than the low refractive index film layer, and the refractive indices of the two can be the same or different. Alternatively, it can be stacked in the order of a first low refractive index film layer, a high refractive index film layer, and a second low refractive index film layer, wherein the refractive indexes of the first low refractive index film layer and the second low refractive index film layer are both lower than the high refractive index film layer, and the refractive indices of the two can be the same or different.
[0047] In some embodiments, generally, as the number of film layers stacked in the optical reflective layer 300 increases, the film thickness will become thicker, and the corresponding reflectivity will also increase. However, too thick glass will also produce other defects, such as being inconvenient to use after the thickness is too thick. Exemplarily, the embodiment of the present application can set the thickness of the optical reflective layer 300 to a range of 50 to 800 nm.
[0048] In some embodiments, the reflectivity and transmittance of the optical reflective layer 300 are controlled by the composite film layer arrangement. For example, the performance of the optical reflective layer is controlled by the fitting of optical materials and the micro-nano structure formed by coating.
[0049] For example, the micro-nano structure refers to the degree of crystallization of the film layer. The optical reflective layer 300 includes a high crystallization layer and a low crystallization layer. The low crystallization layer is stacked on the high crystallization layer. The high crystallization layer is located on the side of the low crystallization layer close to the substrate 100, and the low crystallization layer is located on the side of the high crystallization layer away from the substrate 100.
[0050] Among them, during the preparation process of the film layer, the different pressures and the presence of doping gases will lead to different degrees of crystallization of the film layer. When the film layer is sputtered, the lower the pressure, the higher the degree of crystallization of the film layer, and conversely, the higher the pressure, the lower the degree of crystallization of the film layer. In addition, when the film layer is sputtered, if nitrogen is used as the doping gas, the crystallization of the film layer will be higher because the N element will not occupy the vacancies in the film layer elements, while if oxygen is used as the doping gas, the degree of crystallization of the film layer will be lower.
[0051] Therefore, when performing sputtering deposition of the film layer, the degree of crystallization of the film layer can be changed by adjusting the process parameters and the doping gas, thereby forming a high crystallization layer with a higher degree of crystallization and a low crystallization layer with a lower degree of crystallization, and the degree of crystallization of the high crystallization layer is higher than that of the low crystallization layer.
[0052] For example, the aforementioned A / B composite film may be a composite film layer including a high crystalline layer and a low crystalline layer.
[0053] It can be understood that, in some embodiments, the optical reflective layer 300 may include at least one high crystalline layer and at least one low crystalline layer, the high crystalline layer and the low crystalline layer are alternately arranged, and the first high crystalline layer is closer to the substrate 100 than the first low crystalline layer, wherein the degree of crystallization of each high crystalline layer may be the same or different, and the degree of crystallization of each low crystalline layer may be the same or different, but the degree of crystallization of the high crystalline layer is higher than that of the adjacent low crystalline layer. For example, a first high crystalline layer, a first low crystalline layer, a second high crystalline layer, and a second low crystalline layer are sequentially stacked; for another example, the aforementioned A / B / C composite film may be a first high crystalline layer, a first low crystalline layer, and a second high crystalline layer that are sequentially stacked.
[0054] In some embodiments, the reflectivity of the optical reflective layer 300 is greater than or equal to 8%.
[0055] For example, the reflectivity can be tested by a spectrophotometer, and a reflection test can be performed by an integrating sphere to obtain direct reflectivity, diffuse reflectivity, the sum of secondary and multi-layer reflectivity, etc. Of course, those skilled in the art can also use other methods to test reflectivity, etc., which is achievable for those skilled in the art.
[0056] In some embodiments, see Figures 2 to 5 The aforementioned functional layer 200 includes any one of an anti-reflection layer, an ultraviolet isolation layer 230 , an infrared heat insulation layer 240 , and a defogging layer 250 .
[0057] The anti-reflection layer is used to reduce the reflectivity of the glass. Exemplarily, the material of the anti-reflection layer is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), niobium silicon oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx).
[0058] The UV isolation layer 230 is used to block the penetration of ultraviolet rays. Exemplarily, the material of the UV isolation layer 230 is selected from one or more of indium oxide (InOx), zinc oxide (ZNOx), tin oxide (SnOx), titanium oxide (TiOX), magnesium zinc oxide (MgZnOx), tantalum titanium oxide (TaTiOx), indium tin oxide (ITO), and aluminum zinc oxide (AZO).
[0059] The infrared heat insulation layer 240 is used to reflect infrared heat and reduce infrared radiation. Exemplarily, the material of the infrared heat insulation layer 240 is selected from one or more of tungsten and tungsten oxide (W&WOx), silver (Ag), gold (Au), palladium (Ba), silver-gold alloy, silver-palladium alloy, vanadium and vanadium tungsten oxide (V&VOx), iridium manganate, titanium (Ti), nickel (Ni), chromium (Cr), titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide (CSXWO3), indium tin oxide (ITO), zinc aluminum oxide (AZO), zinc tin oxide (ZnSnOx), fluorine-doped tin oxide (FTO), etc.
[0060] The demisting layer 250 is used to achieve functions such as demisting and defrosting. Exemplarily, the demisting layer 250 is a conductive film demisting layer, which is provided with a connected conductive film and an electrode. After applying a voltage to the electrode, the conductive film can be heated, and the surface temperature of the glass rises after heating, thereby achieving the demisting and defrosting functions. The material of the demisting layer 250 can be selected from one or more of indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), gallium zinc oxide (IGZO), fluorine-doped tin oxide (FTO), nanosilver mesh, and porous nanosilver film.
[0061] In some embodiments, a dielectric layer 210 may be further disposed between the functional layer 200 and the substrate 100, between the functional layer 200 and the optical reflective layer 300, between each functional layer 200, and between the optical reflective layer 300 and other layers. The dielectric layer 210 is used to increase the adhesion and optical matching performance between subsequent film layers and the substrate 100 or each film layer.
[0062] For example, see Figures 2 to 5 The material of the dielectric layer 210 is selected from one or more of silicon oxide / silicon nitride / silicon oxynitride (SiNOx), indium tin oxide (ITO), aluminum zinc oxide (AZO), zinc boron oxide (BZO), zinc gallium oxide (GZO), zinc indium gallium oxide (IGZO), fluorine-doped tin oxide (FTO), niobium oxide (NbOx), zinc tin oxide (ZnSnOx), zinc oxide (ZnOx), tin oxide (SnOx), tungsten oxide (WOx), and titanium oxide (TiOx).
[0063] In some embodiments, see Figure 2 and Figure 3 A low-reflective hardening layer 400 may be further disposed on a side of the optical reflective layer 300 away from the substrate 100 .
[0064] The low-reflection hardening layer 400 is used to improve the hardness and adhesion performance of the glass. The material of the low-reflection hardening layer 400 is selected from one or more of zirconium oxide (ZrOx), tungsten oxide (WOx), nickel chromium oxide (NiCrOx), silicon oxynitride (SiNx), and aluminum oxide (AlOx). The thickness of the low-reflection hardening layer 400 can range from 15 to 500nm.
[0065] In some embodiments, a waterproof and wear-resistant layer 500 is further provided on the side of the low-reflective hardened layer 400 away from the optical reflective layer 300 . The waterproof and wear-resistant layer 500 is used to improve the wear resistance of the outermost side of the glass and the environmental stability inside the glass.
[0066] Exemplarily, the material of the waterproof and wear-resistant layer 500 is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), a stack of silicon oxide (Siox) and silicon nitride (SiNx), titanium oxide (Tiox), titanium oxynitride (TiNOx), titanium oxide (Tiox) and titanium nitride (TiNx) stacks.
[0067] In some embodiments, see Figure 2 The anti-reflection layer includes a first anti-reflection layer 220 and a second anti-reflection layer 260. The materials and thicknesses of the first anti-reflection layer 220 and the second anti-reflection layer 260 may be the same or different. Exemplarily, the functional layer 200 includes a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a defogging layer 250, and a second anti-reflection layer 260 which are sequentially stacked in a direction away from the substrate 100.
[0068] In some embodiments, see Figure 3 , the anti-reflection layer includes a first anti-reflection layer 220, a second anti-reflection layer 260 and a third anti-reflection layer 270, and the materials and thicknesses of the first anti-reflection layer 220, the second anti-reflection layer 260 and the third anti-reflection layer 270 can be the same or different. The demisting layer 250 includes a first demisting layer 251 and a second demisting layer 252, and the materials and thicknesses of the first demisting layer 251 and the second demisting layer 252 can be the same or different. The functional layer 200 includes a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first demisting layer 251, a second anti-reflection layer 260, a second demisting layer 252 and a third anti-reflection layer 270 stacked in sequence in a direction away from the substrate 100. It can be understood that in other embodiments, only one anti-reflection layer or more layers or no anti-reflection layer may be provided, and the examples in this embodiment do not constitute an improper limitation thereto.
[0069] In some embodiments, the thickness of the first anti-reflection layer 220 is in the range of 5 to 800 nm. When the second anti-reflection layer 260 and / or the third anti-reflection layer 270 are provided, the thickness of the second anti-reflection layer 260 and the third anti-reflection layer may also be in the range of 5 to 800 nm. The thickness of the ultraviolet isolation layer 230 is in the range of 2 to 500 nm; the thickness of the infrared heat insulation layer 240 is in the range of 2 to 5000 nm; and the thickness of the defogging layer 250 is in the range of 10 to 1200 nm.
[0070] The embodiment of the present application increases the function of the glass surface film by introducing a multi-layer composite functional layer 200 into the glass structure, and also realizes the integration of projection function, ultraviolet isolation, electric heating and infrared heat insulation function by adding an optical reflection layer 300. In addition, the wear resistance, scratch resistance, environmental resistance, high and low temperature resistance, water vapor resistance and other performance of the film can be greatly improved by adding a low-reflective hardening layer 400 and a waterproof and wear-resistant layer 500.
[0071] Accordingly, see Figure 3 and Figure 4 An embodiment of the present application further provides a laminated glass, which includes a first substrate glass 110 , a functional layer 200 , a second substrate glass 120 and an optical reflective layer 300 .
[0072] Among them, the functional layer 200 is arranged on the first glass substrate 110; the second glass substrate 120 is arranged on the side of the functional layer 200 away from the first glass substrate 110; the optical reflective layer 300 is arranged on the side of the second glass substrate 120 away from the first glass substrate 110. Exemplarily, the first glass substrate 110, the functional layer 200, the second glass substrate 120 and the optical reflective layer 300 are stacked in sequence. In addition, an adhesive layer 600 can be arranged between the functional layer 200 and the second glass substrate 120, and the adhesive layer 600 can be a film such as PVB / EVA / SGP / PMMA.
[0073] The first glass substrate 110 may be an outer glass, and the second glass substrate 120 may be an inner glass.
[0074] The structures of the functional layer 200, the optical reflective layer 300 and the like of the laminated glass can be referred to in the aforementioned embodiments, and will not be described in detail in this embodiment.
[0075] The laminated glass increases the function of the glass surface film by introducing a multi-layer composite functional layer 200 in the structure, adds a functional coating film layer and an anti-reflection layer on the side of the second substrate glass 120 close to the first substrate glass 110 of the laminated glass structure, and coats an optical reflective layer 300 on the side of the first substrate glass 110 away from the second substrate glass 120, thereby integrating the projection HUD function, ultraviolet isolation, electric heating and infrared heat insulation functions, and greatly improves the wear-resistant and scratch-resistant, environmentally resistant, high and low temperature resistant, and water vapor resistant performance of the laminated glass through the wear-resistant and waterproof layer and the hardened layer.
[0076] Accordingly, the embodiment of the present application also provides a method for manufacturing glass, which is used to manufacture glass having an optical reflective layer 300. Figure 6 , illustratively, the manufacturing method includes the following steps S1 to S9.
[0077] Step S1: forming a dielectric layer 210.
[0078] Exemplarily, in step S1, a dielectric layer 210 is deposited on the substrate 100 by vacuum coating, evaporation coating, etc. The thickness of the dielectric layer 210 is 3 to 50 nm, and the deposition material is selected from one or more of silicon oxide / silicon nitride / silicon oxynitride (SiNOx), indium tin oxide (ITO), aluminum zinc oxide (AZO), zinc boron oxide (BZO), zinc gallium oxide (GZO), zinc indium gallium oxide (IGZO), fluorine-doped tin oxide (FTO), niobium oxide (NbOx), oxides containing zinc or tin (ZnSnOx, ZnOx, SnOx), tungsten oxide (WOx), and titanium oxide (TiOx). The dielectric layer 210 helps to increase the adhesion between the glass of the substrate 100 and the surface of the film layer thereon.
[0079] Step S2: forming a first anti-reflection layer 220.
[0080] Exemplarily, in step S2, a first anti-reflection layer 220 is deposited on the substrate 100 or the dielectric layer 210 by vacuum coating, evaporation coating, etc., with a thickness of 5 to 800 nm, and the deposition material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), niobium silicon oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx). The first anti-reflection layer 220 helps to reduce the reflectivity of the glass surface. Exemplarily, it can reduce the reflectivity of the glass surface to less than 1%.
[0081] Step S3: forming an ultraviolet isolation layer 230 .
[0082] Exemplarily, in step S3, an ultraviolet isolation layer 230 is deposited on the first anti-reflection layer 220 by vacuum coating, evaporation coating, etc. The thickness of the ultraviolet isolation layer 230 is 2 to 500 nm, and its deposition material is selected from one or more of indium oxide (InOx), zinc oxide (ZNOx), tin oxide (SnOx), titanium oxide (TiOX), magnesium zinc oxide (MgZnOx), tantalum titanium oxide (TaTiOX), indium tin oxide (ITO), and zinc aluminum oxide (AZO). The ultraviolet isolation layer 230 helps to block ultraviolet rays. Exemplarily, it can block more than 99.995% of ultraviolet rays.
[0083] In the embodiment of the present application, ultraviolet isolation is achieved by sputtering an anti-ultraviolet film, and there is no need to dope the film with an anti-ultraviolet material. The ultraviolet isolation layer 230 has one or more layers of optical films to completely isolate ultraviolet rays of different wavelengths. For example, it can achieve the effect of a sun protection index of SPF50+.
[0084] Step S4: forming an infrared heat insulation layer 240.
[0085] Exemplarily, in step S4, an infrared heat-insulating layer 240 is deposited on the ultraviolet blocking layer by vacuum coating, evaporation coating and other methods. The thickness of the infrared heat-insulating layer 240 is 2 to 5000 nm, and its deposition material is selected from tungsten and tungsten oxide (W&WOx), silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium tungsten oxide (V&VOx), iridium manganate, titanium (Ti), nickel (Ni), chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide (CSXWO3), indium tin oxide (ITO), aluminum zinc oxide (AZO), zinc tin oxide (ZnSnOx), fluorine-doped tin oxide (FTO) One or more. The infrared heat-insulating layer 240 can isolate infrared rays. Exemplarily, it can isolate 50% to 99.7% of infrared light.
[0086] In the embodiment of the present application, the film doped with infrared absorbing material is replaced by a sputtered infrared reflective layer. The film doped with infrared absorbing material will cause the heat to continue to be transferred to the other side of the glass after the glass absorbs heat and increase the internal temperature. The infrared heat insulation layer 240 mainly reflects infrared energy to reduce infrared radiation heat. In particular, when the glass provided by the embodiment of the present application is used in a vehicle, it can achieve a better heat insulation effect and prevent heat from being transferred into the vehicle.
[0087] Step S5: forming a demisting layer 250, wherein the demisting layer 250 has an electrode.
[0088] Exemplarily, in step S5, a demisting layer 250 is deposited on the infrared heat insulation layer 240 by vacuum coating, evaporation coating and the like. The thickness of the demisting layer 250 is 10 to 1200 nm, and the resistance is less than 80 ohm. Silver paste lines are printed on both sides of the demisting layer 250 as electrodes to achieve the demisting function of applying voltage. The material of the demisting layer 250 can be selected from one or more of indium tin oxide (ITO), aluminum zinc oxide (AZO), boron zinc oxide (BZO), gallium zinc oxide (GZO), indium zinc gallium oxide (IGZO), fluorine-doped tin oxide (FTO), nanosilver mesh, and porous nanosilver film.
[0089] The demisting layer 250 heats the glass by surface heating. In some embodiments, the demisting layer 250 can also be divided into several regions by regional laser, mask plate, etching, etc., and each region or several regions as a set are independently controlled and heated.
[0090] Here, by providing a planar defogger layer 250, better defogger and defrost functions can be achieved through surface heating, the heating is more uniform and stable, and the heating power can be designed and adjusted according to actual needs.
[0091] The transparent oxide film made of ITO, AZO, FTO, BZO and other materials has good high conductivity and high carrier concentration, so it has good infrared reflectivity and transparency within the film thickness and resistance range set in the embodiment of the present application, that is, it has good low-radiation energy-saving performance. By adjusting the resistance range of the defogging layer 250, the heating defogging and defrosting functions at different voltages and powers can be fully met.
[0092] Step S6: forming a second anti-reflection layer 260.
[0093] Exemplarily, in step S6, a second anti-reflection layer 260 is deposited on the defogging layer 250 by vacuum coating, evaporation coating, or the like. The thickness of the second anti-reflection layer 260 is 18 to 500 nm, and its material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), niobium silicon oxide (NbSiOx), titanium oxide (TiOx), and titanium oxynitride (TiNOx). The reflectivity of the functional layer 200 can be reduced by setting the second anti-reflection layer 260. Exemplarily, after adding the second anti-reflection layer 260, the reflectivity of the coating film surface can be reduced from 10 to 15% to less than 2%.
[0094] Step S7: forming an optical reflective layer 300 .
[0095] Exemplarily, in step S7, an optical reflective layer 300 is deposited on the second anti-reflection layer 260 by vacuum coating, evaporation coating, etc. The thickness of the optical reflective layer 300 is 50 to 800 nm. Exemplarily, the reflectivity of the optical reflective layer 300 is greater than 8% to achieve a better optical reflection projection function.
[0096] The deposition material of the optical reflective layer 300 may be selected from one or more of silicon oxide (SiOx) and niobium oxide (NbOx), silicon oxide (SiOx) and titanium oxide (TiOx), silicon oxynitride (SiNOx) and titanium oxide (TiOx), silicon oxynitride (SiNOx) and niobium oxide (NbOx), silicon oxide (SiOx) and niobium oxide (NbOx) and silicon oxide (CrOx), silicon oxide (SiNOx) and niobium oxide (NbOx) and silicon oxide (CrOx), silicon oxide (SiOx) and titanium oxide (TiOx) and silicon oxide (CrOx), silicon oxide (SiOx) and titanium oxide (TiOx) and silicon oxide (CrOx), silicon oxynitride (SiNOx) and titanium oxide (TiOx) and silicon oxide (CrOx).
[0097] Step S8: forming a low-reflective hardening layer 400.
[0098] Exemplarily, a low-reflection hardening layer 400 is deposited on the optical reflective layer 300 by vacuum coating, evaporation coating, and the like. The thickness of the low-reflection hardening layer 400 is 15 to 500 nm, and its material is selected from one or more of zirconium oxide (ZrOx), tungsten oxide (WOx), nickel chromium oxide (NiCrOx), silicon oxynitride (SiNx), and aluminum oxide (AlOx). The hardness of the glass surface can be improved by setting the low-reflection hardening layer 400, and the normal projection function of the optical reflective layer 300 can be ensured. Exemplarily, the low-reflection hardening layer 400 can make the hardness of the glass surface as high as 4H or more.
[0099] Step S9: forming a waterproof and wear-resistant layer 500.
[0100] Exemplarily, it is deposited on the anti-reflection layer by vacuum coating, evaporation coating and the like, with a film thickness of 20 to 150 nm. The material is selected from one or more of silicon oxide (SiOx), silicon oxynitride (SiNOx), silicon oxide (SiOx) and silicon nitride (SiNx), titanium oxide (Tiox), titanium oxynitride (TiNOx), titanium oxide (TiOx) and titanium nitride (TiNx). For example, when its material is silicon oxide (SiOx) and silicon nitride (SiNx), it is a composite film layer of silicon oxide (SiOx) and silicon nitride (SiNx).
[0101] The waterproof and wear-resistant layer 500 helps to improve the stability of the glass under normal use conditions, helps to improve the water vapor erosion resistance, wear resistance, scratch resistance and oxidation resistance, and also helps to make the glass meet the standards of acid and alkali resistance and boiling water tests.
[0102] By first coating a dielectric layer 210 on the substrate 100, it is helpful to increase the adhesion and optical matching between the subsequent functional film and the substrate 100. Coating a first anti-reflection layer 220 on the dielectric film helps to reduce the reflectivity of the glass, and coating an ultraviolet isolation layer 230 on the first anti-reflection layer 220 helps to block the penetration of ultraviolet rays. Coating an infrared heat insulation layer 240 on the ultraviolet isolation layer 230 helps to reflect a large amount of infrared heat and reduce infrared radiation. Coating a defogging layer 250 on the infrared heat insulation layer 240 can heat the conductive film after applying a voltage to the electrode to increase the surface temperature of the glass to achieve the defogging and defrosting function. A second anti-reflection layer 260 is then coated on the defogging layer 250 to reduce the reflectivity. An optical reflection layer 300 is then coated on the second anti-reflection layer 260 to meet the requirements of optical projection, and then a low-reflection hardening layer 400 is coated on the optical reflection layer 300 to ensure the hardness and adhesion performance of the film. The outermost layer is coated with a waterproof and wear-resistant layer 500 to ensure the wear resistance and environmental stability of the outermost layer of the film.
[0103] In some embodiments, any of the aforementioned steps S1 to S6 and S8 and S9 may be omitted. Exemplarily, at least one of steps S2 to S6 may be performed. For example, in some embodiments, step S2 is performed to form a first anti-reflection layer 220 on the substrate 100, and then step S7 is performed to form an optical reflective layer 300 on the first anti-reflection layer 220; for another example, step S2, S3, and S4 may be performed in sequence, and then step S7 may be performed to form a first anti-reflection layer 220, an ultraviolet blocking layer, an infrared heat insulation layer 240, and an optical reflective layer 300 stacked in sequence on the substrate 100.
[0104] Therefore, in some embodiments, the method for manufacturing the glass may be considered to include the following steps: forming a functional layer 200 and an optical reflective layer 300 on a substrate 100 .
[0105] In some embodiments, the substrate 100 may include a first glass substrate 110 and a second glass substrate 120, that is, the method for manufacturing the glass is used to manufacture laminated glass. At this time, the steps of forming the functional layer 200 and the optical reflective layer 300 on the substrate 100 may be refined as follows: forming the functional layer 200 on the first glass substrate 110; connecting the second glass substrate 120 via the adhesive layer 600 on the side of the functional layer 200 away from the first glass substrate; and forming the optical reflective layer 300 on the side of the second glass substrate 120 away from the adhesive layer 600.
[0106] It is to be understood that the order described in this specification does not necessarily limit the order of execution of the steps. For example, the step of forming the optical reflective layer 300 can be performed before the step of bonding the second glass substrate 120 on the functional layer 200, or after the step, or the two can be performed simultaneously, and the examples in this embodiment do not constitute an improper limitation on them.
[0107] In addition, in any of the above embodiments, a low-reflective hardening layer 400 and a waterproof and wear-resistant layer 500 may be sequentially formed on a side of the optical reflective layer 300 away from the substrate 100 .
[0108] Application Example 1
[0109] See also Figure 2 A coated glass is provided, which includes a substrate 100, a dielectric layer 210, a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a demisting layer 250, a second anti-reflection layer 260, an optical reflection layer 300, a low-reflection hardening layer 400 and a waterproof and wear-resistant layer 500 arranged in sequence.
[0110] Application Example 2
[0111] See also Figure 3 A coated glass is provided, which includes a substrate 100, a dielectric layer 210, a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first demisting layer 251, a second anti-reflection layer 260, a second demisting layer 252, a third anti-reflection layer 270, an optical reflection layer 300, a low-reflection hardening layer 400 and a waterproof and wear-resistant layer 500 arranged in sequence.
[0112] Here, the ultraviolet isolation layer 230 is arranged at a position relatively close to the substrate 100, that is, it can be close to the outer layer and contact with the sunlight to isolate ultraviolet rays, and the infrared heat insulation layer 240 is located behind the ultraviolet isolation layer 230 to block infrared energy. The first demisting layer 251 and the second demisting layer 252 are located behind the ultraviolet isolation layer 230 and the infrared heat insulation layer 240 to keep the glass warm and make the temperature inside the glass and the indoor environment not too different, thereby reducing the formation of fog. Each layer of anti-reflection layer helps to reduce the visible light reflectivity of these functional film layers to ensure that the human eye does not feel strong reflections and dizziness.
[0113] Application Example 3
[0114] See also Figure 4A coated glass is provided, which is specifically a laminated glass, including a first glass substrate 110, a dielectric layer 210, a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a demisting layer 250, a second anti-reflection layer 260, an adhesive layer 600, a second glass substrate 120, an optical reflective layer 300, a low-reflection hardening layer 400 and a waterproof and wear-resistant layer 500 arranged in sequence.
[0115] Application Example 4
[0116] See also Figure 5 A coated glass is provided, which is specifically a laminated glass, including a first glass substrate 110, a dielectric layer 210, a first anti-reflection layer 220, an ultraviolet isolation layer 230, an infrared heat insulation layer 240, a first demisting layer 251, a second anti-reflection layer 260, a second demisting layer 252, a third anti-reflection layer 270, an adhesive layer 600, a second glass substrate 120, an optical reflective layer 300, a low-reflection hardening layer 400 and a waterproof and wear-resistant layer 500 arranged in sequence.
[0117] It can be understood that the meanings of the terms in the embodiments of the present application are the same. For the content not described in detail in a certain embodiment, the specific implementation details can refer to the descriptions in other embodiments. The example descriptions and technical effects shown in the aforementioned embodiments can be implemented accordingly. For the repeated parts, this embodiment will not go into details.
[0118] The coated glass, laminated glass and manufacturing method provided by the present application are introduced in detail above. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea. At the same time, for general technicians in this field, according to the idea of the present application, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.
Claims
1. A coated glass, characterized in that: include, substrate; A functional layer is disposed on the substrate; The optical reflective layer is arranged on a side of the functional layer away from the substrate.
2. The coated glass according to claim 1, characterized in that: The optical reflective layer is selected from one or more of a silicon oxide / niobium oxide composite film, a silicon oxide / titanium oxide composite film, a silicon oxynitride / titanium oxide composite film, a silicon oxynitride / niobium oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / niobium oxide / silicon oxide composite film, a silicon oxide / titanium oxide / silicon oxide composite film, and a silicon oxynitride / titanium oxide / silicon oxide composite film.
3. The coated glass according to claim 1, characterized in that: The optical reflective layer has a thickness ranging from 50 to 800 nm.
4. The coated glass according to claim 1, characterized in that: The reflectivity of the optical reflective layer is greater than or equal to 8%.
5. The coated glass according to claim 1, characterized in that: The functional layer includes any one of an anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, and a defogging layer.
6. The coated glass according to claim 1, characterized in that: The functional layer comprises a first anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a defogging layer and a second anti-reflection layer which are sequentially stacked in a direction away from the substrate.
7. The coated glass according to claim 6, characterized in that: The coated glass satisfies any of the following conditions: The materials of the first anti-reflection layer and the second anti-reflection layer are selected from one or more of silicon oxide, silicon oxynitride, niobium silicon oxide, titanium oxide, and titanium oxynitride, and the thickness of the first anti-reflection layer and the second anti-reflection layer ranges from 5 to 800 nm; The material of the ultraviolet isolation layer is selected from one or more of indium oxide, zinc oxide, tin oxide, titanium oxide, magnesium zinc oxide, tantalum titanium oxide, indium tin oxide, and zinc aluminum oxide, and the thickness of the ultraviolet isolation layer ranges from 2 to 500 nm; The material of the infrared heat insulation layer is selected from one or more of tungsten and tungsten oxide, silver, gold, palladium, silver-gold alloy, silver-palladium alloy, vanadium and vanadium tungsten oxide, iridium manganate, titanium, nickel, chromium, titanium-nickel alloy, iron-chromium alloy, cesium-doped tungsten oxide, indium tin oxide, zinc aluminum oxide, zinc tin oxide, and fluorine-doped tin oxide. The thickness of the infrared heat insulation layer ranges from 2 to 5000 nm. The material of the demisting layer is selected from one or more of indium tin oxide, zinc aluminum oxide, zinc boron oxide, zinc gallium oxide, zinc indium gallium oxide, fluorine-doped tin oxide, nano silver mesh, and porous nano silver film, and the thickness of the demisting layer ranges from 10 to 1200 nm.
8. The coated glass according to claim 1, characterized in that: The functional layer includes a first anti-reflection layer, an ultraviolet isolation layer, an infrared heat insulation layer, a first defogging layer, a second anti-reflection layer, a second defogging layer and a third anti-reflection layer which are sequentially stacked in a direction away from the substrate.
9. The coated glass according to claim 1, characterized in that: A low-reflection hardening layer is also provided on the side of the optical reflective layer away from the substrate. The material of the low-reflection hardening layer is selected from one or more of tungsten oxide, tungsten oxide, nickel chromium oxide, silicon oxynitride, and aluminum oxide. The thickness of the low-reflection hardening layer ranges from 15 to 500 nm.
10. A laminated glass, characterized in that: include, a first substrate glass; A functional layer is disposed on the first glass substrate; A second glass substrate is arranged on a side of the functional layer away from the first glass substrate; The optical reflective layer is arranged on a side of the second glass substrate away from the first glass substrate.
11. A method for manufacturing glass, used for manufacturing the coated glass according to any one of claims 1 to 9 or the laminated glass according to claim 10, characterized in that: The glass manufacturing method comprises the following steps: forming a functional layer and an optical reflective layer on a substrate.