Hemispherical harmonic oscillator mass imbalance trimming device and method

By designing a hemispherical harmonic oscillator mass imbalance adjustment device, and utilizing the cooperation of a turntable and clamping mechanism, combined with ion beam etching and vibration information acquisition, the problem of insufficient structural optimization in existing batch adjustment devices has been solved, achieving efficient, precise and automated batch adjustment of harmonic oscillators.

CN121917151APending Publication Date: 2026-04-24CENT CHINA OPTOELECTRONICS TECH RES INST (CHINA STATE SHIPBUILDING CORP 717TH RES INST)
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Patent Information

Application Number
CN202511969595.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-12-24
Publication Date
2026-04-24

AI Technical Summary

Technical Problem

In the existing technology, the batch processing scheme for hemispherical resonator gyroscopes lacks in-depth optimization of the equipment structure for batch adjustment processes, especially in preventing ion beams from accidentally damaging unprocessed resonators.

Method used

A device for adjusting the mass imbalance of a hemispherical resonator was designed, including a vacuum chamber, a clamping unit, an ion beam etching unit, an excitation unit, a detection unit, and a central control unit. Through the cooperation of a turntable and a clamping mechanism, the device enables automated batch adjustment of the resonator. The device uses a shielding component to protect the unadjusted resonator and combines ion beam etching with vibration information acquisition to achieve precise etching.

Benefits of technology

This achievement enables in-depth optimization of batch unbalanced processing of resonators, avoids accidental damage to unadjusted resonators by ion beams, improves adjustment efficiency and accuracy, and realizes equipment integration and automation.

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Abstract

The invention relates to a hemispherical harmonic oscillator mass imbalance trimming device and method, and the device comprises a vacuum chamber which is internally provided with a trimming station; the clamping unit comprises a rotary table and a plurality of clamping mechanisms, the rotary table can rotate around the first axis, the multiple clamping mechanisms are distributed in the circumferential direction of the first axis at intervals, and the clamping mechanisms clamp the harmonic oscillator and drive the harmonic oscillator to rotate around the sensitive shaft; an ion beam etching unit; the clamping mechanisms are connected with a shielding assembly, when the rotary table rotates, the multiple clamping mechanisms sequentially pass through the trimming station, the shielding assembly covers the clamped harmonic oscillator, the shielding assembly is provided with a trimming hole for an ion beam to pass through, and the ion beam emitted by the ion beam etching unit penetrates through the trimming hole in the shielding assembly located in the trimming station. And the light is emitted to the lip edge of the harmonic oscillator. According to the invention, the shielding assembly is arranged, so that the condition that the ion beam is sputtered to other harmonic oscillators which are not trimmed or trimmed to cause accidental damage can be avoided, and deep optimization of harmonic oscillator batch unbalance processing is realized.
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