A low scatter processing method for a support device
By designing a hollow low-scattering dome and using radar imaging technology to separate the scattering source of the support device, the problem of strong scattering of the support device in radar target testing was solved, improving testing accuracy and processing precision.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHONGQING QIWEI TECH CO LTD
- Filing Date
- 2024-11-27
- Publication Date
- 2026-05-29
AI Technical Summary
In existing technologies, support devices such as jacks form strong scattering sources in radar target scattering characteristic measurements, affecting the test results, and existing low-scattering processing methods are difficult to meet the requirements of accurate testing.
The design incorporates a low-scattering radome, with hollow upper and lower absorbing radomes respectively enclosing the upper and lower parts of the support device. By combining radar two-dimensional imaging technology and scattering source separation technology, the influence of scattering sources on the support device is separated and reduced.
This approach achieves low-scattering processing for the support device, simplifies the installation process, improves testing accuracy and the precision of scattering source separation, and reduces subsequent processing workload.
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Abstract
Description
Technical Field
[0001] This invention relates to the field of radar target scattering characteristics measurement technology, and in particular, to a low-scattering processing method for a support device such as a jack. Background Technology
[0002] Radar Cross Section (RCS) is a crucial physical parameter measuring a radar target's ability to scatter electromagnetic waves and is a core indicator for assessing a target's stealth performance. During field tests of aircraft stealth performance, support devices, such as jacks, are typically used to erect the target. While jacks have traditionally been used as target supports for measuring target scattering characteristics, these supports create strong scattering sources in the target area, negatively impacting test results. Therefore, it is essential to implement low-scattering treatments for support devices such as jacks to improve the accuracy of stealth target scattering measurements.
[0003] Taking jacks as an example, there are currently two main measures for low-scattering treatment of support devices:
[0004] 1. Wrap the outside of the jack with absorbing material to reduce body scattering. This method is relatively simple to implement, but jacks are generally complex structures, making it relatively difficult to wrap them with material. Moreover, the wrapped state is prone to wear and tear during transportation and transfer under outdoor conditions, resulting in changes in state and weak RCS reduction effect, which cannot meet the requirements of the support mechanism for low scattering target testing.
[0005] 2. Post-processing image matting and filtering using imaging technology is used to forcibly remove the jack's scattering source. Because the jack's scattering source has a large area distribution, it cannot be distinguished from the scattering source of the actual aircraft body. Therefore, it is very easy to remove the target's own scattering source, making it unsuitable for application and field testing.
[0006] In view of the shortcomings of the existing technologies, in order to achieve accurate testing and diagnosis of low-detectability targets, simplifying and optimizing methods and devices, and carrying out low-scattering optimization design and modification of support devices, has become a technical problem that needs to be solved in the existing technologies. Summary of the Invention
[0007] To address the problems of previous technologies, this invention provides a low-scattering processing method for a support device used in scattering characteristic testing. The method involves designing a low-scattering shield to reduce scattering from the support device and eliminating the influence of scattering sources from the support device on the target RCS test through scattering source separation and filtering technology. To achieve this objective, this invention employs the following technical solution:
[0008] A method for low-scattering processing of a support device includes the following steps:
[0009] Low-scattering shield fabrication step S110:
[0010] A low-scattering cover is prepared according to the shape of the support device. The low-scattering cover is a hollow structure, made of microwave absorbing material, and is composed of two overlapping parts, namely an upper microwave absorbing cover and a lower microwave absorbing cover, which respectively include the upper and lower parts of the support device.
[0011] Low-scattering support device installation step S120:
[0012] The lower and upper absorbing covers are respectively installed on the outside of the support device. The bottom area of the upper absorbing cover is larger than the upper surface area of the lower absorbing cover, and they overlap each other. The support device is installed inside the low-scattering cover.
[0013] Electromagnetic scattering test procedure S130:
[0014] The aircraft under test was set up using a support device with a low-scattering radome installed, and various electromagnetic scattering tests, including those of the target, the calibration body, and the background scattering signals, were completed in sequence.
[0015] Step S140 for determining weak scattering sources:
[0016] Two-dimensional radar imaging technology was used to determine the location of the weak scattering source of the support device.
[0017] Low-scattering source separation step S150:
[0018] By using high-resolution imaging processing and scattering source separation techniques, weak scattering sources are reconstructed and separated, and then filtered and integrated.
[0019] Optionally, in the scattering shield preparation step S110,
[0020] The upper and lower absorbing covers are frustum structures, with the bottom area of the upper absorbing cover being larger than the upper surface area of the lower absorbing cover, so as to respectively wrap the upper and lower parts of the support device and overlap each other to form a basically closed absorbing cover.
[0021] Optionally, the microwave absorbing material used to prepare the scattering cover is polyurethane foam.
[0022] Optionally, the support device is a jack.
[0023] Optionally, in the low-scattering support device installation step S120,
[0024] Place the jack in the designated position, attach the lower absorber to the outside of the jack to include the jack's multiple support legs, then place the upper absorber on top of the lower absorber, and finally roughly align the center of the upper absorber with the center of the lower absorber and overlap them, so that the jack is basically enclosed inside the low-scattering cover.
[0025] Optionally, the step S140 for determining the weak scattering source specifically includes:
[0026] The target test data is calibrated and background cancellation is performed sequentially to obtain a two-dimensional image of the stealth target. The synthetic aperture angle of the two-dimensional image is more than 10° greater than the angle of interest. The imaging angle is selected as the central angle of the angle of interest. The location of the low-weak scattering source of the support device is determined in the two-dimensional image.
[0027] Optionally, the low-weak scattering source separation step S150 specifically comprises:
[0028] The low-scattering sources of the support device are selected and reconstructed in the two-dimensional image. This includes using spatial filtering techniques to separate the regions where the low-scattering sources of the support device are located, and reconstructing the RCS curve and the two-dimensional image through the RCS inversion algorithm.
[0029] The present invention has the following advantages:
[0030] 1. It uses a low-scattering cover to match the shape of the support device, and has a simple structure that is easy to manufacture and install. It is suitable for various types of support devices, including jacks.
[0031] 2. The low-scattering cover reduces the scattering of the support device, making it easier to identify and separate weak scattering sources, improving the accuracy of subsequent processing, and reducing the workload of filtering and other related processes. Attached Figure Description
[0032] Figure 1 This is a flowchart of a low-scattering processing method for a support device according to a specific embodiment of the present invention;
[0033] Figure 2 This is a schematic diagram of the structure of an exemplary support device according to a specific embodiment of the present invention;
[0034] Figure 3 This is a schematic diagram of the structure of a low-scattering shield according to a specific embodiment of the present invention;
[0035] Figure 4 This is a schematic diagram of the structure of a support device using a low-scattering shield according to a specific embodiment of the present invention.
[0036] The technical features referred to by the reference numerals in the figure are as follows:
[0037] 1. Support device; 2. Upper absorber cover; 3. Lower absorber cover. Detailed Implementation
[0038] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, and not all of the structures.
[0039] The main features of this invention are: based on the structural characteristics of the support device, upper and lower low-scattering covers are designed to include the lower and upper parts of the support device respectively, thereby reducing the scattering capability of the support device; the location of the low-weak scattering source of the support device is determined by the target two-dimensional imaging technology, thereby performing scattering source separation and filtering comprehensive processing, reducing the impact of the support device on the target stealth test.
[0040] In this invention, the support device refers to a device that can support a stealth test aircraft, such as an airplane. It typically includes a lower part and an upper part. The lower part is used to support the support device itself and usually includes multiple support legs or a relatively wide base, which increases the stability and reliability of the support. The upper part is used to support the aircraft under test, preventing the aircraft from directly contacting the ground, thereby simulating the flight state of the aircraft or facilitating the placement of the aircraft under test in the desired attitude.
[0041] In one specific embodiment, see Figure 2 The support device can be a jack, which can raise the height of the aircraft under test. Its lower part consists of multiple support legs in contact with the ground, while the upper part is a support column to support the aircraft under test. The lower part is wider than the upper part. This invention basically uses a jack as an example to explain the use of a low-scattering shield in this invention.
[0042] However, the present invention is not limited thereto and may also include other support devices.
[0043] For details, see Figure 1 A flowchart of a low-scattering processing method for a support device according to a specific embodiment of the present invention is shown, including the following steps:
[0044] S110: Preparation step of scattering shield:
[0045] See Figure 3 A low-scattering cover is prepared according to the shape of the support device. The low-scattering cover is a hollow structure made of microwave absorbing material and is composed of two overlapping parts, namely an upper microwave absorbing cover 2 and a lower microwave absorbing cover 3, which respectively include the upper and lower parts of the support device.
[0046] Furthermore, the upper absorbing cover 2 and the lower absorbing cover 3 are frustum structures, and the bottom area of the upper absorbing cover 2 is larger than the upper surface area of the lower absorbing cover 3, so as to respectively wrap the upper and lower parts of the support device and overlap each other to form a basically closed absorbing cover.
[0047] Furthermore, the absorbing material used to prepare the low-scattering shield is polyurethane foam.
[0048] In one specific embodiment, the shape of the low-scattering cover is designed according to the jack support used in the prior art. The low-scattering cover is designed as a hollow, overlapping structure. To facilitate installation and disassembly, a modular design is adopted, which can be disassembled into two frustum structures of different sizes.
[0049] Low-scattering support device installation step S120:
[0050] The lower absorbing cover 3 and the upper absorbing cover 2 are respectively installed on the outside of the support device 1. The bottom area of the upper absorbing cover 2 is larger than the upper surface area of the lower absorbing cover 3, and they overlap each other. The support device is installed inside the low scattering cover.
[0051] For details, see Figure 4 The use of the low-scattering shield of the present invention will be illustrated by taking a jack as an example.
[0052] Place the jack in the designated position, attach the lower absorber 3 to the outside of the jack to include the multiple support legs of the jack, then place the upper absorber 2 on the upper side of the lower absorber 3, and finally roughly align the center of the upper absorber 2 with the center of the lower absorber 3 and overlap them, so that the jack is basically enclosed inside the low-scattering cover.
[0053] Electromagnetic scattering test procedure S130:
[0054] The test aircraft is set up using a support device 1 with a low-scattering radome installed, and various electromagnetic scattering tests, including those of the target, the calibration body, and the background scattering signals, are completed in sequence.
[0055] Step S140 for determining weak scattering sources:
[0056] Two-dimensional radar imaging technology was used to determine the location of the weak scattering source of the support device.
[0057] Specifically, the target test data is calibrated and background cancellation is performed sequentially to obtain a two-dimensional image of the stealth target. The synthetic aperture angle of the two-dimensional image is more than 10° greater than the angle of interest. The imaging angle is selected as the central angle of the angle of interest. The location of the low-weak scattering source of the support device is determined in the two-dimensional image.
[0058] Low-scattering source separation step S150:
[0059] By using high-resolution imaging processing and scattering source separation techniques, weak scattering sources are reconstructed and separated, and then filtered and integrated.
[0060] Specifically, the weak scattering sources of the support device are selected and reconstructed in the two-dimensional image. Spatial filtering techniques are used to separate the regions where the weak scattering sources of the support device are located, and the RCS curve and two-dimensional image are reconstructed using the RCS inversion algorithm.
[0061] Therefore, the present invention utilizes a low-scattering shield to reduce radiation and facilitate the separation of scattering sources, specifically including the following advantages:
[0062] 1. It uses a low-scattering cover to match the shape of the support device, and has a simple structure that is easy to manufacture and install. It is suitable for various types of support devices, including jacks.
[0063] 2. The low-scattering cover reduces the scattering of the support device, making it easier to identify and separate weak scattering sources, improving the accuracy of subsequent processing, and reducing the workload of filtering and other related processes.
[0064] The above description is a further detailed explanation of the present invention in conjunction with specific preferred embodiments. It should not be considered that the specific embodiments of the present invention are limited to this. For those skilled in the art, several simple deductions or substitutions can be made without departing from the concept of the present invention, and all such deductions or substitutions should be considered to fall within the scope of protection of the present invention as defined by the submitted claims.
Claims
1. A method for low-scattering processing of a support device, characterized in that, Includes the following steps: Low-scattering shield fabrication step S110: A low-scattering cover is prepared according to the shape of the support device. The low-scattering cover is a hollow structure, made of microwave absorbing material, and is composed of two overlapping parts, namely an upper microwave absorbing cover and a lower microwave absorbing cover, which respectively include the upper and lower parts of the support device. Low-scattering support device installation step S120: The lower and upper absorbing covers are respectively installed on the outside of the support device. The bottom area of the upper absorbing cover is larger than the upper surface area of the lower absorbing cover, and they overlap each other. The support device is installed inside the low-scattering cover. Electromagnetic scattering test procedure S130: The aircraft under test was set up using a support device with a low-scattering radome installed, and various electromagnetic scattering tests, including those of the target, the calibration body, and the background scattering signals, were completed in sequence. Step S140 for determining weak scattering sources: Two-dimensional radar imaging technology was used to determine the location of the weak scattering source of the support device. Low-scattering source separation step S150: By using high-resolution imaging processing and scattering source separation techniques, weak scattering sources are reconstructed and separated, and then filtered and integrated.
2. The low-scattering processing method according to claim 1, characterized in that: In the process of preparing the scattering shield, S110, The upper and lower absorbing covers are frustum structures, with the bottom area of the upper absorbing cover being larger than the upper surface area of the lower absorbing cover, so as to respectively wrap the upper and lower parts of the support device and overlap each other to form a basically closed absorbing cover.
3. The low-scattering processing method according to claim 2, characterized in that: The microwave absorbing material used to prepare the low-scattering shield is polyurethane foam.
4. The low-scattering processing method according to claim 1, characterized in that: The supporting device is a jack.
5. The low-scattering processing method according to claim 4, characterized in that: In step S120 of installing the low-scattering support device Place the jack in the designated position, attach the lower absorber to the outside of the jack to include the jack's multiple support legs, then place the upper absorber on top of the lower absorber, and finally roughly align the center of the upper absorber with the center of the lower absorber and overlap them, so that the jack is basically enclosed inside the low-scattering cover.
6. The low-scattering processing method according to claim 1, characterized in that: The step S140 for determining the weak scattering source specifically involves: The target test data is calibrated and background cancellation is performed sequentially to obtain a two-dimensional image of the stealth target. The synthetic aperture angle of the two-dimensional image is more than 10° greater than the angle of interest. The imaging angle is selected as the central angle of the angle of interest. The location of the low-weak scattering source of the support device is determined in the two-dimensional image.
7. The low-scattering processing method according to claim 6, characterized in that: The low-weak scattering source separation step S150 specifically includes: The low-scattering sources of the support device are selected and reconstructed in the two-dimensional image. This includes using spatial filtering techniques to separate the regions where the low-scattering sources of the support device are located, and reconstructing the RCS curve and the two-dimensional image through the RCS inversion algorithm.