Reflection optical unit and microscope comprising an reflection optical unit
Patent Information
- Application Number
- PCT/DE2025/100581
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-06-25
- Filing Date
- 2025-06-12
- Publication Date
- 2026-03-12
AI Technical Summary
Existing X-ray microscopes face challenges in measuring electrons generated on the excitation side of thick samples due to interference from component-generated electrons, especially in the EUV and low X-ray ranges, limiting the ability to perform quantitative measurements and requiring high radiation exposure.
A reflection optic with a center stop, focusing element, and solid window design that shields component-generated electrons using total internal reflection, allowing for epi-geometry measurements by focusing electromagnetic radiation onto a focal plane while separating sample-generated electrons for detection.
Enables quantitative measurements of electrons from thick samples without interference, facilitating epigeometry and reducing radiation exposure, suitable for EUV and low X-ray ranges.