Branched compositions for lithographic patterning cross-reference to related applications

Graft polymers address component leaching, pattern collapse, and optical reflection in photolithography by forming in-situ barriers and anti-reflective coatings, enhancing process compatibility and reducing environmental risks associated with PFAS.

WO2026060243A1 Publication Date: 2026-03-19HUSTAD PHILLIP DENE
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Patent Information

Application Number
PCT/US2025/046155
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-16
Filing Date
2025-09-12
Publication Date
2026-03-19

AI Technical Summary

Technical Problem

The semiconductor industry faces challenges in photolithography due to component leaching, pattern collapse, and optical reflection, which are exacerbated by the use of per- and polyfluoroalkyl substances (PFAS) in current solutions, posing environmental and health risks.

Method used

The use of graft polymers, including acid-labile polymers and photoacid generators, forms an in-situ barrier to prevent component leaching and reduces pattern collapse, while also serving as a top anti-reflective coating to minimize optical reflections.

Benefits of technology

The graft polymers effectively reduce surface contamination, enhance compatibility with immersion lithography, and improve pattern fidelity by minimizing leaching and reflections, thus supporting advanced photolithography processes without PFAS.

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Abstract

Disclosed are compositions and methods for photolithography that employ branched compositions, such as graft or bottlebrush polymers. In one embodiment, a photoresist composition includes a graft polymer that, due to lower surface energy and reduced chain entanglement, migrates to the upper region of the resist layer during application to form an in-situ barrier that minimizes the leaching of photoresist components into an immersion lithography fluid, thereby reducing contamination of the exposure tool without requiring a separate topcoat. The graft polymers can also be formulated into top coats, top anti-reflective coatings, or used as surfactants in rinse solutions to prevent pattern collapse. These compositions can be formulated to be free of per- and polyfluoroalkyl substances (PFAS), offering an environmentally safer alternative for advanced lithographic processes.
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