Arc discharge ion nitriding technology and nitriding furnace
By using the high-density nitrogen ion flow generated by the cathode arc source in the ion chemical heat treatment for nitriding, and using a titanium target on the target material to provide the titanium ion flow, the problem of slow nitriding speed in the existing technology is solved and a more efficient process is achieved. Efficient nitriding effect and simple operation process.
Patent Information
- Application Number
- CN201910627083.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2019-07-12
- Publication Date
- 2021-01-12
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
The glow discharge ion nitriding speed in the existing ion chemical heat treatment is slow, the production cycle is long, and there is a lack of technology and nitriding furnace that use the cathode arc source to generate high-density nitrogen ions for nitriding.
The electron flow in the arc discharge plasma generated by the cathode arc source is used to ionize nitrogen, and high-density nitrogen ions are used for nitriding. A titanium target is selected on the target to provide titanium ion flow and active titanium atoms to increase the nitriding speed. .
It significantly improves the nitriding rate and nitriding efficiency, simplifies the equipment structure and operating procedures, and is suitable for various workpiece surface treatments.