Substrate processing equipment

Abstract

The present invention relates to a substrate processing device. In all processing units, a processing chamber, a liquid medicine piping space and an exhaust chamber are arranged along a conveying space, and when viewed from the conveying space side, a liquid medicine piping space is arranged on one side of the processing chamber, and the exhaust chamber is arranged in a manner opposite to the liquid medicine piping space across the processing chamber. Since the exhaust chamber is arranged opposite to the liquid medicine piping space across the processing chamber, it is possible to prevent the exhaust pipe from obstructing the passage through which the piping passes, and the piping is used to supply liquid medicine to a substrate held on a holding rotating part. In addition, in the past, it was composed of two types of processing units, but in the present invention, it can be solved by one type of processing unit. Therefore, the parts can be made common in all processing units.

Description

Technical Field

[0001] The present invention relates to a substrate processing device for processing a substrate. The substrate includes, for example, a semiconductor substrate, a substrate for a FPD (Flat Panel Display), a glass substrate for a photomask, a substrate for an optical disk, a substrate for a magnetic disk, a ceramic substrate, a substrate for a solar cell, etc. The FPD includes, for example, a liquid crystal display device, an organic EL (electroluminescence) display device, etc. Background Art

[0002] Conventional substrate processing devices, such as Figure 1 Or, for example, as shown in Japanese Patent Laid-Open No. 2014-197592, a transfer and conveying unit 203 and a processing block 211 are provided. The transfer and conveying unit 203 includes a carrier mounting unit 204 and a transfer and conveying mechanism (robot) 206. A carrier C for accommodating a substrate W is mounted on the carrier mounting unit 204. The transfer and conveying mechanism 206 transfers the substrate W between the carrier C mounted on the carrier mounting unit 204 and the processing block 211. The processing block 211 includes a substrate transfer mechanism (robot) 216 and a plurality of processing units 221. The plurality of processing units 221 are configured in multiple stages (e.g., two stages) in the up and down direction.

[0003] Reference Figure 2 . An exhaust port 252 is provided in each of the processing units 221 that are multi-stage (e.g., 2-stage) in the up-down direction. In addition, above the uppermost processing unit 221, three separate exhaust pipes 281, 282, and 283 for the flow of acid exhaust, alkali exhaust, and organic exhaust, respectively, are provided. One end of the exhaust pipe 241 is connected to the exhaust port 252 of the processing unit 221, and the other end of the exhaust pipe 241 is connected to the exhaust switching device 251. The exhaust switching device 251 is provided above the uppermost processing unit 221, and is configured to distribute the exhaust from the exhaust port 252 of the processing unit 221 to the three separate exhaust pipes 281, 282, and 283 (for example, refer to Japanese Patent Gazette No. 2019-016818). Summary of the invention

[0004] [Problems to be solved by the invention]

[0005] However, conventional substrate processing devices have the following problems. For example, Figure 2 When there are two stages of processing units 221 in the vertical direction, the two exhaust pipes 241 are arranged to extend in the vertical direction to the exhaust switching device 251 provided above the upper (uppermost) processing unit 221. Figure 32 is a schematic top view of the upper processing unit 221. The processing unit 221 includes a processing chamber 223 and a pipe section 294. The processing chamber 223 includes a holding and rotating section 231 for holding a substrate W and rotating the held substrate. The pipe section 294 includes, for example, pipes (not shown) for supplying acidic, alkaline, and organic chemical solutions, and two exhaust pipes 241 for the upper and lower processing units 221.

[0006] Here, two exhaust pipes 241 are arranged adjacent to the processing chamber 223 to exhaust the processing chamber 223. For example, the number of stages of the processing units 221 is increased, and six (six stages) of the processing units 221 are arranged in the vertical direction. In this case, in the piping section 294 of the uppermost processing unit 221, a Figure 3 The four exhaust pipes 241 shown by the dotted lines are thus provided with six exhaust pipes 241. Therefore, the six exhaust pipes 241 become obstacles, such as Figure 3 As shown by the symbol PT, the passage through which the pipe for supplying the chemical solution to the substrate W held on the holding and rotating unit 231 passes is narrowed.

[0007] In addition, if Figure 1 As shown by the symbols A and B, in the conventional substrate processing apparatus, although the same chemical solution processing is performed, two types of processing units 221 are provided. Therefore, it is necessary to prepare the parts for the processing unit 221 shown by the symbol A and the parts for the processing unit 221 shown by the symbol B, so it is highly desired to standardize the parts.

[0008] The present invention has been made in view of the above situation, and an object of the present invention is to provide a substrate processing apparatus that prevents an exhaust pipe from obstructing a passage of a pipe leading to a processing chamber and that can realize commonality of parts.

[0009] [Technical means to solve the problem]

[0010] In order to achieve this purpose, the present invention adopts the following structure. That is, the substrate processing device of the present invention is provided with a substrate conveying mechanism for conveying a substrate, and a plurality of processing units for performing a specific chemical liquid treatment on the substrate conveyed by the substrate conveying mechanism. The plurality of processing units are arranged along the conveying path of the substrate conveying mechanism. In addition, the plurality of processing units are arranged opposite to each other across the conveying path, and are further arranged in a stacked manner in the vertical direction. Moreover, each of the processing units is provided with a holding rotating part that rotates while holding the substrate, and performs chemical liquid treatment on the substrate held and rotated by the holding rotating part. Furthermore, each of the processing units is provided with a processing chamber, a chemical liquid piping part, and an exhaust chamber. The processing chamber is an area for exchanging substrates with the substrate conveying mechanism via a substrate conveying port. The chemical liquid piping part is an area for configuring a chemical liquid piping for supplying chemical liquid to the processing chamber. The exhaust chamber is connected to the processing chamber via an exhaust port to exhaust the processing chamber, and is connected to an exhaust pipe extending in the vertical direction. In all the processing units, the processing chamber, the chemical liquid piping section and the exhaust chamber are arranged along the transport path, and when viewed from the transport path side, the chemical liquid piping section is arranged on one side of the processing chamber, and the exhaust chamber is arranged in a manner opposite to the chemical liquid piping section across the processing chamber.

[0011] According to the substrate processing device of the present invention, in all processing units, the processing chamber, the liquid medicine piping section and the exhaust chamber are arranged along the conveying path, and when viewed from the conveying path side, the liquid medicine piping section is arranged on one side of the processing chamber, and the exhaust chamber is arranged in a manner opposite to the liquid medicine piping section across the processing chamber. Since the exhaust chamber is arranged opposite to the liquid medicine piping section across the processing chamber, it is possible to prevent the exhaust pipe from obstructing the passage through which the piping passes, and the piping is used to supply liquid medicine to the substrate held on the holding rotating part. In addition, when all processing units are viewed from the conveying path side, the liquid medicine piping section is arranged on one side of the processing chamber, and the exhaust chamber is arranged in a manner opposite to the liquid medicine piping section across the processing chamber. Therefore, the problem that was previously composed of two processing units can be solved by one processing unit in the present invention. Therefore, the parts can be made common in all processing units.

[0012] In the substrate processing apparatus, the exhaust chamber is preferably connected to a plurality of exhaust pipes extending in a vertical direction, and the exhaust chamber includes an opening and closing mechanism for switching an exhaust path of gas from the processing chamber to any one of the plurality of exhaust pipes.

[0013] The exhaust chamber is arranged at the side of the processing chamber. Therefore, the opening and closing mechanism can switch the exhaust near the processing chamber. Therefore, compared with the situation that the exhaust is switched at a position higher than the uppermost processing unit as in the prior art, the responsiveness of the switching is improved. In addition, since the exhaust chamber is arranged at the side of the processing chamber, the height of the processing unit can be suppressed. In addition, since the opening and closing mechanism can switch the exhaust near the processing chamber, a common exhaust pipe can be arranged for a plurality of processing units stacked in one row in the vertical direction. Therefore, a plurality of exhaust pipes at the side of the processing chamber can be compactly arranged.

[0014] In addition, in the substrate processing device, it is preferred that the processing chamber further includes a liquid supply part for supplying a chemical solution to the substrate held by the holding rotating part, and the opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the first exhaust pipe among the multiple exhaust pipes when the liquid supply part supplies an acidic chemical solution, and the opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the second exhaust pipe among the multiple exhaust pipes when the liquid supply part supplies an alkaline chemical solution, and the opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the third exhaust pipe among the multiple exhaust pipes when the liquid supply part supplies an organic chemical solution.

[0015] Thus, the opening and closing mechanism can switch the exhaust from the processing chamber to the first exhaust pipe, the second exhaust pipe, and the third exhaust pipe according to the acidic, alkaline, and organic chemical solutions supplied by the liquid supply unit.

[0016] In addition, in the substrate processing device, it is preferred that the processing chamber has a side wall in a manner opposite to the substrate transfer port across the holding and rotating part in a plan view, the holding and rotating part is arranged in the processing chamber at a position closer to the substrate transfer port than the side wall, the multiple exhaust pipes are arranged in a row in a horizontal direction orthogonal to the extension direction of the transfer path, and the exhaust port of the exhaust chamber is arranged closer to the transfer path than the multiple exhaust pipes.

[0017] In the processing chamber, the holding rotating part tends to be arranged near the substrate transfer port. The exhaust port of the exhaust chamber is arranged closer to the transfer path than the plurality of exhaust pipes. Thus, the installation area of ​​the exhaust chamber and the plurality of exhaust pipes in a top view can be suppressed to be smaller, and the exhaust port can be made closer to the holding rotating part. Therefore, the vapor of the chemical solution around the holding rotating part can be smoothly sent to the exhaust chamber.

[0018] In addition, the substrate processing apparatus preferably further comprises a horizontal exhaust pipe which is located higher than the plurality of processing units and is arranged along the conveying path, and the horizontal exhaust pipe is connected to the exhaust chambers of the plurality of processing units stacked in a row in the vertical direction via the exhaust pipe. In each processing unit, an opening and closing mechanism is provided in the exhaust chamber on the side of the processing chamber, so that the structure of the connection part between the horizontal exhaust pipe and the plurality of exhaust pipes can be simplified.

[0019] In addition, in the substrate processing apparatus, the exhaust chamber preferably includes a pressure adjustment mechanism disposed near the exhaust port and adjusting the pressure of the gas passing through the exhaust port. The pressure adjustment of the exhaust gas can be performed in each processing unit. For example, the pressure adjustment of the exhaust gas of each processing unit is easier than the case where the exhaust gas from a plurality of processing units is gathered and then the pressure adjustment of the exhaust gas is performed uniformly.

[0020] In addition, the substrate processing apparatus preferably further comprises one or more substrate transfer mechanisms, each of which transfers substrates to a plurality of processing units of a predetermined level among a plurality of processing units stacked in the vertical direction. Even if the number of processing units increases, substrate transfer can be shared by the plurality of substrate transfer mechanisms.

[0021] [Effects of the Invention]

[0022] According to the substrate processing apparatus of the present invention, the passage of the piping leading to the processing chamber is not obstructed by the exhaust pipe, and parts can be made common. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to illustrate the invention, several embodiments that are currently considered to be suitable are shown in the figures, but it should be understood that the invention is not limited to the structures and methods shown in the figures.

[0024] Figure 1 FIG. 1 is a plan view showing a conventional substrate processing apparatus.

[0025] Figure 2 FIG. 1 is a piping diagram showing an exhaust structure of a conventional substrate processing apparatus.

[0026] Figure 3 A diagram used to illustrate a problem with a processing unit.

[0027] Figure 4 It is a cross-sectional view showing a substrate processing apparatus according to an embodiment.

[0028] Figure 5 It is a longitudinal sectional view of the substrate processing apparatus in the front-rear direction.

[0029] Figure 6 is from Figure 4A longitudinal sectional view of the substrate processing apparatus 1 observed along the arrow EE.

[0030] Figure 7 It is a right side view showing the right structure of the substrate processing apparatus.

[0031] Figure 8 It is a left side view showing the left structure of the substrate processing apparatus.

[0032] Fig. 9 is a cross-sectional view showing a processing unit.

[0033] Fig.10 It is a schematic structural diagram mainly showing the structure of a longitudinal section of a processing unit.

[0034] Figures 11A to 11C It is a diagram for explaining the switching operation for three exhaust pipes.

[0035] Fig.12 This is a piping diagram showing an exhaust structure of a substrate processing apparatus.

[0036] Fig.13 FIG. 1 is a top view showing a horizontal exhaust pipe of a substrate processing apparatus.

[0037] Fig.14 It is a diagram showing a switching mechanism according to a modified example.

[0038] Fig.15 It is a diagram showing a switching mechanism according to a modified example.

[0039] Fig.16 It is a diagram showing a switching mechanism according to a modified example.

[0040] Fig.17 It is a diagram showing a switching mechanism according to a modified example.

[0041] Fig.18 FIG. 1 is a piping diagram showing an exhaust structure of a substrate processing apparatus according to a modified example.

[0042] Fig.19 FIG. 1 is a cross-sectional view showing a substrate processing apparatus according to a modified example. DETAILED DESCRIPTION

[0043] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Figure 4 It is a cross-sectional view showing a substrate processing apparatus according to an embodiment.

[0044] <Configuration of substrate processing apparatus 1>

[0045] The substrate processing apparatus 1 processes a substrate (eg, a semiconductor wafer) W. The substrate W is a thin, substantially circular flat plate.

[0046] The substrate processing apparatus 1 includes a transfer unit 3 and a processing block 11. The processing block 11 is connected to the transfer unit 3. The transfer unit 3 and the processing block 11 are arranged in a horizontal direction. The transfer unit 3 supplies a substrate W to the processing block 11. The processing block 11 performs a predetermined process on the substrate W. The transfer unit 3 collects the substrate W from the processing block 11.

[0047] In this specification, for convenience, the horizontal direction in which the transfer and conveying part 3 and the processing block 11 are arranged is referred to as the "front-to-back direction X". In the front-to-back direction X, the direction from the processing block 11 toward the transfer and conveying part 3 is referred to as the "front". The direction opposite to the front is referred to as the "rear". The horizontal direction orthogonal to the front-to-back direction X is referred to as the "width direction Y". One direction of the "width direction Y" is referred to as the "right" as appropriate. The direction opposite to the right is referred to as the "left". The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z". In each figure, the front, back, right, left, top, and bottom are displayed as appropriate for reference. In the case where there is no need to specifically distinguish between "front", "back", "right", and "left", it is referred to as "side".

[0048] <1. Configuration of the transfer and conveying unit 3>

[0049] The transfer and conveying unit 3 includes a plurality of (eg, four) carrier mounting units 4. The carrier mounting units 4 are arranged in the width direction Y. Each carrier mounting unit 4 mounts one carrier C. The carrier C accommodates a plurality of substrates W. The carrier C is, for example, a FOUP (frontopening unified pod).

[0050] The transfer conveying unit 3 includes a transfer space 5. The transfer space 5 is arranged behind the carrier placement unit 4. The transfer space 5 extends in the width direction Y.

[0051] The transfer and transport section 3 includes one or more (for example, one) transport mechanisms 6. The transport mechanism 6 is also referred to as a transfer and transport mechanism. The transport mechanism 6 is provided in the transport space 5. The transport mechanism 6 is disposed behind the carrier mounting section 4. The transport mechanism 6 transports the substrate W. The transport mechanism 6 can access the carrier C mounted on the carrier mounting section 4.

[0052] Reference Figure 4 The structure of the transport mechanism 6 is described. The transport mechanism 6 includes a hand 7 and a hand driving unit 8. The hand 7 supports a substrate W in a horizontal position. The hand driving unit 8 is connected to the hand 7. The hand driving unit 8 moves the hand 7. The hand driving unit 8 moves the hand 7 in the front-back direction X, the width direction Y, and the vertical direction Z. The hand driving unit 8 includes a plurality of electric motors.

[0053] Reference Figure 4 , Figure 5 . Figure 51 is a longitudinal sectional view of the substrate processing device 1 in the front-rear direction X. The structure of the hand driving unit 8 is illustrated. The hand driving unit 8, for example, includes a rail 8a, a horizontal moving unit 8b, a vertical moving unit 8c, a rotating unit 8d, and an advance-retract moving unit 8e. The rail 8a is fixedly provided. The rail 8a is arranged at the bottom of the conveying space 5. The rail 8a extends in the width direction Y. The horizontal moving unit 8b is supported on the rail 8a. The horizontal moving unit 8b moves in the width direction Y relative to the rail 8a. The vertical moving unit 8c is supported on the horizontal moving unit 8b. The vertical moving unit 8c moves in the vertical direction Z relative to the horizontal moving unit 8b. The rotating unit 8d is supported on the vertical moving unit 8c. The rotating unit 8d rotates relative to the vertical moving unit 8c. The rotating unit 8d rotates around the rotation axis A1. The rotation axis A1 is an imaginary line parallel to the vertical direction Z. The advance-retract moving unit 8e moves relative to the rotating unit 8d. The forward and backward moving part 8e moves back and forth in a horizontal direction determined by the direction of the rotating part 8d. The forward and backward moving part 8e is connected to the hand 7. Through this hand driving part 8, the hand 7 can be parallel moved in the vertical direction Z. The hand 7 can be parallel moved in any horizontal direction. The hand 7 can rotate around the rotation axis A1.

[0054] <2. Configuration of Processing Block 11>

[0055] Refer to as appropriate Figures 4 to 10 The processing block 11 includes, for example, two conveying mechanisms 16A and 16B, and, for example, 24 (plural) processing units 21. Each of the 24 processing units 21 performs a specific liquid treatment on a substrate W conveyed by one of the two conveying mechanisms 16A and 16B. The 24 processing units 21 are arranged along the conveying paths (conveying spaces 12A and 12B) of the two conveying mechanisms 16A and 16B. In addition, the 24 processing units 21 are arranged to face each other across the conveying paths, and are further arranged to be stacked in the vertical direction. The detailed structure of the processing block 11 is described.

[0056] Reference Figure 4 The processing block 11 includes a transfer space 12A. The transfer space 12A is disposed in the center of the processing block 11 in the width direction Y. The transfer space 12A extends in the front-rear direction X. The front portion of the transfer space 12A is connected to the transfer space 5 of the transfer conveyor 3 .

[0057] The processing block 11 includes a substrate placement unit 14A. The substrate placement unit 14A is provided in the transfer space 12A. The substrate placement unit 14A is disposed in the front portion of the transfer space 12A. The transfer mechanism 6 of the transfer conveyor unit 3 can also access the substrate placement unit 14A. The substrate placement unit 14A places one or more substrates W.

[0058] The processing block 11 includes a transfer mechanism 16A. The transfer mechanism 16A is provided in the transfer space 12A. The transfer mechanism 16A transfers the substrate W. The transfer mechanism 16A can access the substrate placement portion 14A.

[0059] like Figure 4 As shown, the processing block 11 includes four processing units 21A, 21B, 21C, and 21D. The processing units 21A and 21B are arranged on the right side of the conveying space 12A. The processing units 21A and 21B are arranged in the front-to-back direction X along the conveying space 12A. The processing unit 21B is arranged behind the processing unit 21A. The processing units 21C and 21D are arranged on the left side of the conveying space 12A. The processing units 21C and 21D are arranged in the front-to-back direction X along the conveying space 12A. The processing unit 21D is arranged behind the processing unit 21C. The two processing units 21A and 21B and the two processing units 21C and 21D are arranged in a manner opposite to each other across the conveying space 12A.

[0060] In addition, when there is no need to distinguish the processing units 21A, 21B, 21C, and 21D, they are referred to as the processing unit 21. The processing unit 21 processes the substrate W.

[0061] Reference Figure 5 In addition to the transport space 12A, the processing block 11 also includes a transport space 12B. The transport space 12B is arranged below the transport space 12A. The transport space 12B overlaps with the transport space 12A in a plan view. The transport space 12B has a shape substantially the same as that of the transport space 12A. The transport space 12B is also connected to the transport space 5 of the transfer conveyor 3. When there is no need to distinguish between the transport spaces 12A and 12B, it is referred to as the transport space 12.

[0062] The processing block 11 includes a partition wall 13. The partition wall 13 is disposed below the transfer space 12A and above the transfer space 12B. The partition wall 13 has a horizontal plate shape. The partition wall 13 partitions the transfer space 12A from the transfer space 12B.

[0063] The processing block 11 includes a substrate loading unit 14B in addition to the substrate loading unit 14A. The substrate loading unit 14B is provided in the transport space 12B. The substrate loading unit 14B is arranged below the substrate loading unit 14A. The substrate loading unit 14B overlaps with the substrate loading unit 14A in a plan view. The substrate loading unit 14B is arranged at the same position as the substrate loading unit 14A in a plan view. The substrate loading unit 14B is arranged in the front part of the transport space 12B. The transport mechanism 6 of the transfer conveyor 3 can also access the substrate loading unit 14B. The substrate loading unit 14B carries one or more substrates W.

[0064] The processing block 11 includes a transfer mechanism 16B in addition to the transfer mechanism 16A. The transfer mechanism 16B is provided in the transfer space 12B. The transfer mechanism 16B transfers the substrate W. The transfer mechanism 16B can access the substrate placement portion 14B.

[0065] The conveyance mechanism 16B has the same structure as the conveyance mechanism 16A. When there is no need to distinguish between the conveyance mechanisms 16A and 16B, they are referred to as the conveyance mechanism 16.

[0066] Reference Figure 4 , Figure 5 Each transport mechanism 16 includes a hand 17 and a hand driving unit 18. The hand 17 supports one substrate W in a horizontal posture. The hand driving unit 18 is connected to the hand 17. The hand driving unit 18 moves the hand 17 in the front-rear direction X, the width direction Y, and the vertical direction Z. The hand driving unit 18 includes a plurality of electric motors.

[0067] The structure of the hand driving unit 18 is exemplified. The hand driving unit 18 includes, for example, two support columns 18a, a vertical moving unit 18b, a horizontal moving unit 18c, a rotating unit 18d, and an advancing and retreating moving unit 18e.

[0068] Two pillars 18a are fixedly provided. The two pillars 18a are arranged at the side of the conveying space 5. The two pillars 18a are arranged in the front-to-back direction X. Each pillar 18a extends in the vertical direction Z. The vertical moving part 18b is supported by the two pillars 18a. The vertical moving part 18b extends in the front-to-back direction X across the two pillars 18a. The vertical moving part 18b moves in the vertical direction Z relative to the two pillars 18a. The horizontal moving part 18c is supported by the vertical moving part 18b. The horizontal moving part 18c moves in the front-to-back direction X relative to the vertical moving part 18b. The horizontal moving part 18c moves in the front-to-back direction X across the two pillars 18a. The rotating part 18d is supported by the horizontal moving part 18c. The rotating part 18d rotates relative to the horizontal moving part 18c. The rotating part 18d rotates around the rotation axis A2. The rotation axis A2 is an imaginary line parallel to the vertical direction Z.

[0069] The advance / retract movement portion 18e moves relative to the rotating portion 18d. The advance / retract movement portion 18e moves back and forth in a horizontal direction determined by the direction of the rotating portion 18d. The advance / retract movement portion 18e is connected to the hand 17. According to the hand driving portion 18, the hand 17 can move in parallel in the vertical direction Z. The hand 17 can move in parallel in any horizontal direction. The hand 17 can rotate around the rotation axis A2.

[0070] Reference Figures 4 to 8 . Figure 7 It is a right side view showing the right structure of the substrate processing apparatus 1. Figure 81 is a left side view showing the left structure of the substrate processing device 1. The processing block 11 includes six processing units 21A. The six processing units 21A are arranged in a stacked manner in the vertical direction. That is, the six processing units 21A are arranged in a row in the vertical direction Z. Similarly, the processing block 11 includes six processing units 21B, six processing units 21C, and six processing units 21D. The six processing units 21B, the six processing units 21C, and the six processing units 21D are arranged in a stacked manner in the vertical direction.

[0071] Figure 5 The upper transport mechanism 16A shown in the figure transports substrates W to the 12 upper processing units 21 (4×upper 3 stages). The lower transport mechanism 16B transports substrates W to the 12 lower processing units 21 (4×lower 3 stages). The transport mechanism 16 can access the holders 31 of the processing units 21.

[0072] <2-1. Configuration of processing unit 21>

[0073] Fig. 9 2 is a cross-sectional view showing the processing unit 21. Each of the 24 processing units 21 includes a processing chamber 23 (processing housing), a chemical liquid piping space 94, and a switching mechanism 51.

[0074] The processing chamber 23 is an area in which a holding portion 31 is arranged to rotate while holding a substrate W, and a chemical liquid treatment is performed on the substrate W held and rotated by the holding portion 31, and the substrate W is exchanged between the transfer mechanism 16 via the substrate transfer port 27. The chemical liquid piping space 94 is an area in which a chemical liquid piping for supplying a chemical liquid to the processing chamber 23 is arranged. The switching mechanism 51 (exhaust chamber 53) is connected to the processing chamber 23 via the exhaust port 52 to exhaust the inside of the processing chamber 23. In addition, the switching mechanism 51 is connected to three exhaust pipes 41, 42, and 43 extending in the up-down direction.

[0075] When the exhaust pipe 41 is divided into each of the processing units 21A to 21D, it is referred to as the exhaust pipe 41A, 41B, 41C, and 41D. The same applies to the exhaust pipes 42 and 43.

[0076] <2-1-1. Configuration of Processing Chamber 23>

[0077] First, the structure of the processing chamber 23 will be described. The processing chamber 23 has a substantially box shape. The processing chamber 23 has a substantially rectangular shape in plan view, front view, and side view. The processing chamber 23 has a processing space 24 therein. The processing unit 21 processes the substrate W in the processing space 24.

[0078] Reference Figure 6 to Figure 8The six processing chambers 23 of the six processing units 21A are stacked one on top of the other. Similarly, the six processing chambers 23 of the six processing units 21B are stacked one on top of the other. The six processing chambers 23 of the six processing units 21C are stacked one on top of the other. The six processing chambers 23 of the six processing units 21D are stacked one on top of the other. Each processing chamber 23 is adjacent to the transfer space 12.

[0079] Reference Fig. 9 , Fig.10 Each processing chamber 23 includes four side walls 25a, 25b, 25c, and 25d, a top plate 25e, and a bottom plate 25f. The side walls 25a to 25d each have a substantially vertical plate shape. The top plate 25e and the bottom plate 25f have a substantially horizontal plate shape. The processing space 24 is divided by the side walls 25a to 25d, the top plate 25e, and the bottom plate 25f.

[0080] The side walls 25a and 25c extend in the front-rear direction X. The side wall 25c is provided on the opposite side of the side wall 25a. The side walls 25b and 25d extend in the width direction Y. The side walls 25b and 25d extend from the side wall 25a to the side wall 25c, respectively. The side wall 25d is provided on the opposite side of the side wall 25b.

[0081] The side wall 25a is disposed at a position in contact with the transport space 12. In the case of the processing units 21A and 21B, as shown in FIG. Figure 4 As shown, the side wall 25c is located to the right of the side wall 25a, and the side wall 25d is located behind the side wall 25b. In the case of the processing units 21C and 21D, the side wall 25c is located to the left of the side wall 25a, and the side wall 25d is located in front of the side wall 25b.

[0082] The processing chamber 23 has a substrate transfer port 27. The substrate transfer port 27 is formed on the side wall 25a. The substrate W can pass through the substrate transfer port 27. The substrate W moves between the outside of the processing chamber 23 (that is, the transfer space 12) and the inside of the processing chamber 23 (that is, the processing space 24) through the substrate transfer port 27. Each processing unit 21 is equipped with a shutter (not shown). The shutter is installed on the side wall 25a. The shutter opens or closes the substrate transfer port 27.

[0083] The processing chamber 23 includes a holding portion 31. The holding portion 31 is disposed inside the processing chamber 23. The holding portion 31 holds a substrate W in a horizontal position. The holding portion 31 has an upper surface 31a. The upper surface 31a is approximately horizontal. The substrate W is placed on the upper surface 31a. The holding portion 31 can hold the lower surface of the substrate W by, for example, vacuum adsorption. In addition, the holding portion 31 can include a rotating base and three or more support pins erected on the rotating base. In this case, the three or more support pins have a gap between the rotating base and the substrate W, and clamp the side of the substrate W to hold the substrate W. In addition, Figure 4 In FIG. 1 , the substrate W held by the holding portion 31 is indicated by a dotted line.

[0084] Each processing unit 21 further includes a rotation drive unit 32. The rotation drive unit 32 is disposed inside the processing chamber 23. The rotation drive unit 32 is connected to the holding unit 31. The rotation drive unit 32 includes, for example, an electric motor to rotate the holding unit 31. The substrate W held by the holding unit 31 rotates integrally with the holding unit 31. The substrate W rotates around a rotation axis A3. The rotation axis A3 is an imaginary line parallel to the vertical direction Z. The rotation axis A3 passes through the center of the substrate W.

[0085] in addition, Figure 1 The conventional substrate processing apparatus shown in the figure has two types (A, B) of processing units 221 arranged symmetrically with respect to the arrangement of the nozzles 243 and other configurations. In this case, in order to equally perform the chemical liquid treatment in the two processing units, the holding part is rotated counterclockwise in a plan view in one processing unit and the holding part is rotated clockwise in the other processing unit. In this embodiment, the rotation drive unit 32 rotates the holding part 31 only in a specific direction (e.g., counterclockwise) in a plan view.

[0086] Reference Figure 4 The processing chamber 23 includes a liquid supply unit 33. The liquid supply unit 33 is provided inside the processing chamber 23. The liquid supply unit 33 supplies a chemical liquid (also referred to as a processing liquid) to the substrate W held by the holding unit 31. The liquid supply unit 33 supplies a first chemical liquid, a second chemical liquid, and a third chemical liquid. The first chemical liquid, the second chemical liquid, and the third chemical liquid are of different types.

[0087] The first chemical solution is classified as an acidic liquid (acidic chemical solution), for example, and includes at least one of hydrofluoric acid (hydrogen fluoride acid), hydrochloric acid hydrogen peroxide, sulfuric acid, sulfuric acid hydrogen peroxide, nitric acid (a mixture of hydrofluoric acid and nitric acid), and hydrochloric acid.

[0088] The second chemical solution is classified as an alkaline liquid (alkaline chemical solution), for example. The second chemical solution includes at least one of ammonia hydrogen peroxide (SC1), ammonia water, ammonium fluoride solution, and tetramethylammonium hydroxide (TMAH).

[0089] The third chemical liquid is classified as an organic liquid (organic chemical liquid), for example. The organic liquid includes at least one of isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), and acetone.

[0090] Reference Fig. 9The liquid supply unit 33 includes one or more (for example, three) nozzles 34A, 34B, and 34C. The nozzles 34A, 34B, and 34C eject liquid medicines, respectively. The nozzle 34A ejects, for example, the first liquid medicine. The nozzle 34B ejects, for example, the second liquid medicine. The nozzle 34C ejects, for example, the third liquid medicine. In addition, the liquid supply unit 33 may be provided with an additional nozzle to eject an inert gas such as nitrogen, or may eject a mixture of an inert gas and liquid medicines.

[0091] Each nozzle 34A, 34B, 34C has a tube shape extending linearly. The nozzles 34A, 34B, 34C include front end portions 35A, 35B, 35C and base end portions 36A, 36B, 36C, respectively. The front end portions 35A, 35B, 35C each have a discharge port (not shown) for discharging a liquid medicine.

[0092] The liquid supply unit 33 includes one or more (for example, three) bases 37A, 37B, and 37C. The bases 37A, 37B, and 37C support the nozzles 34A, 34B, and 34C, respectively. Specifically, the bases 37A, 37B, and 37C are connected to the base ends 36A, 36B, and 36C.

[0093] The base part 37A moves the nozzle 34A to the processing position and the retreat position. When the nozzle 34A is located at the processing position, the front end part 35A (discharge port) is located above the substrate W held on the holding part 31. When the nozzle 34A is located at the processing position, the front end part 35A (discharge port) overlaps with the substrate W held on the holding part 31 in a plan view. When the nozzle 34A is located at the retreat position, the entire nozzle 34A does not overlap with the substrate W held on the holding part 31 in a plan view. Similarly, the base parts 37B and 37C move the nozzles 34B and 34C to the processing position and the retreat position, respectively.

[0094] Specifically, the base portion 37A rotates the nozzle 34A around the rotation axis A4. The rotation axis A4 is an imaginary line parallel to the vertical direction Z. The rotation axis A4 passes through the base portion 37A. Similarly, the base portions 37B and 37C rotate the nozzles 34B and 34C around the rotation axes A5 and A6, respectively. The rotation axes A5 and A6 are imaginary lines parallel to the vertical direction Z, respectively. The rotation axes A5 and A6 pass through the base portions 37B and 37C, respectively.

[0095] The base portion 37A is disposed at a corner portion where the side walls 25b and 25c are connected. The base portions 37B and 37C are disposed at a corner portion where the side walls 25c and 25d are connected.

[0096] The substrate transfer port 27 and the nozzles 34A, 34B, and 34C are arranged so as to surround the holding portion 31 in a plan view. When the nozzles 34A, 34B, and 34C are located at a standby position outside the substrate W, the substrate transfer port 27 and the nozzle 34B are arranged so as to face each other across the holding portion 31. In addition, the nozzle 34A and the nozzle 34C are arranged so as to face each other across the holding portion 31. Each processing unit 21 includes a shield 38 arranged around the holding portion 31. The shield 38 blocks the chemical liquid that is scattered from the substrate W during the chemical liquid processing.

[0097] Reference Fig.10 . The first nozzle 34A is connected to the supply source SC1 via the piping LN1. The piping LN1 is provided with a switch valve V1 and a pump PP1. The switch valve V1 supplies the liquid medicine from the supply source SC1 to the first nozzle 34A, or stops the supply of the liquid medicine. Similarly, the second nozzle 34B is connected to the supply source SC2 via the piping LN2. The piping LN2 is provided with a switch valve V2 and a pump PP2. The switch valve V2 supplies the liquid medicine from the supply source SC2 to the second nozzle 34B, or stops the supply of the liquid medicine. In addition, the third nozzle 34C is connected to the supply source SC3 via the piping LN3. The piping LN3 is provided with a switch valve V3 and a pump PP3. The switch valve V3 supplies the liquid medicine from the supply source SC3 to the third nozzle 34C, or stops the supply of the liquid medicine. The three pumps PP1 to PP3 each feed the liquid medicine.

[0098] <2-1-2. Configuration of the chemical liquid piping space 94>

[0099] The chemical liquid piping space 94 is an area where three pipings LN1, LN2, and LN3 for supplying chemical liquid to the processing chamber 23 are arranged. That is, the chemical liquid piping space 94 includes three pipings LN1 to LN3 and three switch valves V1, V2, and V3. In addition, in addition to the switch valve V1 (V2 or V3), at least one of a flow rate regulating valve and a flow meter may be provided in each of the three pipings LN1 to LN3. In addition, the three pipings LN1 to LN3 are led out from the chemical liquid piping space 94 to the processing chamber 23 and connected to each of the nozzles 34A to 34C.

[0100] <2-1-3. Configuration of the switching mechanism 51 (exhaust structure of the processing unit 21)>

[0101] Reference Figure 4 The processing block 11 has three exhaust pipes 41, 42, and 43 in each processing unit 21. The exhaust pipes 41, 42, and 43 are all arranged outside the processing chamber 23. The exhaust pipes 41 to 43 are respectively arranged on the sides of the processing chamber 23. The exhaust pipes 41 to 43 pass through the positions on the sides of the processing chamber 23. The exhaust pipes 41 to 43 exhaust gases from the processing chamber 23 respectively.

[0102] The processing unit 21 includes a switching mechanism 51. The switching mechanism 51 is disposed on the side of the processing chamber 23. That is, the switching mechanism 51 is disposed at a height position substantially the same as that of the processing chamber 23. The switching mechanism 51 is connected to the processing chamber 23 via an exhaust port 52 (see Fig. 9 ) is communicated with the processing chamber 23 and is communicated with each of the three exhaust pipes 41 to 43. The switching mechanism 51 switches the exhaust path of the gas from the processing chamber 23 to any one of the three exhaust pipes 41 to 43.

[0103] like Figure 4 As shown, the processing block 11 has four exhaust pipe spaces 44 (44A, 44B, 44C, 44D). In the two processing units 21A and 21B, the exhaust pipe space 44, the processing chamber 23, and the liquid medicine piping space 94 are arranged in sequence from the side of the transfer and conveying part 3. The exhaust pipe space 44 is adjacent to the processing chamber 23, and the processing chamber 23 is adjacent to the liquid medicine supply space 94. In addition, in the two processing units 21C and 21D, the liquid medicine piping space 94, the processing chamber 23, and the exhaust pipe space 44 are arranged in sequence from the side of the transfer and conveying part 3.

[0104] The four exhaust pipe spaces 44 extend in the vertical direction Z. The four exhaust pipe spaces 44 extend from the processing unit 21 at the lowest level (first level) to the processing unit 21 at the highest level (sixth level). The four exhaust pipe spaces 44 accommodate three exhaust pipes 41 to 43 respectively. The three exhaust pipes 41 to 43 are arranged in the width direction Y.

[0105] Figure 6 is from Figure 4 A longitudinal sectional view of the substrate processing apparatus 1 observed along the arrow EE. The three exhaust pipes 41 to 43 extend from the same height position as the processing unit 21 of the lowest level (first level) to the same height position as the processing unit 21 of the highest level (sixth level). The three exhaust pipes 41 to 43 are connected to the processing chambers 23 of the six-level processing units 21 stacked in the vertical direction. The three exhaust pipes 41 to 43 exhaust the gas from each processing chamber 23 of the six-level processing units 21 stacked in the vertical direction. That is, there are four groups of the three exhaust pipes 41 to 43. The three exhaust pipes 41A to 43A of the first group (Group 1) are configured to exhaust each processing unit of the six-level processing unit 21A. The three exhaust pipes 41B to 43B of the second group are configured to exhaust each processing unit of the six-level processing unit 21B. Likewise, the three exhaust pipes 41C to 43C of the third group are responsible for exhausting the six-stage processing unit 21C, and the three exhaust pipes 41D to 43D of the fourth group are responsible for exhausting the six-stage processing unit 21D.

[0106] like Figure 6 to Figure 8As shown in FIG. 1 , the switching mechanism 51 is arranged at a height position substantially the same as that of the processing chamber 23. The switching mechanism 51 is arranged at a position that does not overlap with the holding portion 31 and the processing chamber 23 in a plan view. The switching mechanism 51 is arranged outside the processing chamber 23. Figure 4 As shown, the switching mechanism 51 is arranged in each of the four exhaust pipe spaces 44 (44A, 44B, 44C, and 44D).

[0107] Reference Fig. 9 The structure of the switching mechanism 51 will be described. The switching mechanism 51 includes an exhaust chamber (switching housing) 53. The exhaust chamber 53 is connected to the processing chamber 23. The exhaust chamber 53 is further connected to the exhaust pipes 41 to 43. The exhaust chamber 53 has a switching space 54 as an exhaust path therein.

[0108] The exhaust chamber 53 extends in the horizontal direction. The exhaust chamber 53 and the switching space 54 are bent in a substantially L-shape in a plan view. The exhaust chamber 53 includes an introduction portion 55 and a distribution portion 56. The introduction portion 55 is connected to the processing chamber 23. The introduction portion 55 is connected to the side wall 25b of the processing chamber 23. The introduction portion 55 extends from the processing chamber 23 in the front-rear direction X and is formed into a rectangular shape in a plan view.

[0109] The introduction part 55 is connected to the processing chamber 23. The introduction part 55 has a first end 55a and a second end 55b. The first end 55a is arranged inside the processing chamber 23 (that is, the processing space 24). The opening of the first end 55a constitutes the exhaust port 52. The second end 55b is arranged outside the processing chamber 23 (that is, the exhaust pipe space 44).

[0110] The distribution portion 56 is connected to the introduction portion 55. The distribution portion 56 extends in the width direction Y and is formed in a rectangular shape in a plan view. The distribution portion 56 is further connected to the exhaust pipes 41 to 43. The distribution portion 56 is connected to the outer side surfaces of the exhaust pipes 41 to 43.

[0111] The distribution part 56 is arranged outside the processing chamber 23 (that is, the exhaust pipe space 44). The distribution part 56 is arranged near the exhaust pipes 41 to 43. The exhaust pipes 41 to 43 are arranged between the side wall 25b and the distribution part 56.

[0112] The exhaust chamber 53 communicates with the processing chamber 23. That is, the switching space 54 communicates with the processing space 24. The switching space 54 is open to the processing space 24 at the first end 55a. The exhaust chamber 53 further communicates with the exhaust pipes 41 to 43. That is, the switching space 54 communicates with the exhaust pipes 41 to 43 via the distribution unit 56.

[0113] The exhaust chamber 53 includes two switch portions 61, 62, three communication ports 63, 64, 65, and two distribution openings 67, 68. The switch portions 61, 62 are disposed inside the exhaust chamber 53. The first communication port 63 connects the distribution portion 56 with the first exhaust pipe 41. The second communication port 64 connects the distribution portion 56 with the second exhaust pipe 42. The third communication port 65 connects the distribution portion 56 with the third exhaust pipe 43. The first distribution opening 67 is formed between the two communication ports 63, 64 so as to block the distribution portion 56 extending in the Y direction. The second distribution opening 68 is formed between the two communication ports 64, 65 so as to block the distribution portion 56 extending in the Y direction.

[0114] The switch portion 61 has, for example, a substantially vertical flat plate shape. The switch portion 61 is configured to be able to swing around a rotation axis A7. The rotation axis A7 is an imaginary line parallel to the up-down direction Z. The rotation axis A7 passes through one end of the switch portion 61. The switch portion 61 is driven, for example, by an electric motor. The switch portion 62 also has the same structure as the switch portion 61.

[0115] The switch parts 61 and 62 operate independently of each other. The switch part 61 closes one of the first communication port 63 and the distribution opening 67. The switch part 62 closes one of the second communication port 64 and the distribution opening 68. Fig.11A For example, when the switch unit 61 closes the distribution opening 67, the gas from the processing chamber 23 is sent to the exhaust pipe 41 through the first communication port 63 regardless of the position of the switch unit 62. Fig. 11B When the switch unit 61 closes the first communication port 63 and the switch unit 62 closes the distribution opening 68, the gas from the processing chamber 23 is sent to the exhaust pipe 42 through the second communication port 64. Fig. 11C When the switch unit 61 closes the first communication port 63 and the switch unit 62 closes the second communication port 64 , the gas from the processing chamber 23 is sent to the exhaust pipe 43 through the third communication port 65 .

[0116] Back to Fig. 9 . The switching mechanism 51 includes a pressure sensor 71 and a pressure regulating mechanism 73. The pressure sensor 71 measures the pressure of the exhausted gas, i.e., the exhaust gas. The pressure regulating mechanism 73 regulates the pressure of the gas passing through the exhaust port 52. The pressure regulating mechanism 73 adjusts the pressure to a preset pressure based on the pressure measured by the pressure sensor 71. The pressure sensor 71 and the pressure regulating mechanism 73 are arranged inside the introduction part 55. The pressure regulating mechanism 73 is arranged between the exhaust port 52 and the distribution part 56 (two switch parts 61, 62), for example, near the exhaust port 52. The pressure sensor 71 is arranged between the exhaust port 52 and the pressure regulating mechanism 73. In addition, the pressure sensor 71 may also be arranged on the secondary side (downstream side) of the pressure regulating mechanism 73.

[0117] The pressure adjustment mechanism 73 is composed of, for example, an automatic damper (electric damper) and a fan. The automatic damper has a blade member (plate-shaped member) for changing the cross-sectional area of ​​the flow path, and adjusts the air volume (ventilation volume (volume / time)) in the introduction part 55. The automatic damper and the fan each have an electric motor.

[0118] Reference Fig.12 The pressure sensor 71 and the pressure adjustment mechanism 73 are provided in each processing unit 21. Therefore, it is easy to adjust the exhaust pressure (air volume) for each processing unit 21.

[0119] Reference Figure 6 , Fig.13 . The processing block 11 has three horizontal exhaust ducts 81A, 82A, and 83A. The three horizontal exhaust ducts 81A to 83A are arranged at a higher position than the two processing units 21A and 21B at the uppermost level (6th level). In other words, the three horizontal exhaust ducts 81A to 83A are arranged at a higher position than the 6th-level processing unit 21A and the 6th-level processing unit 21B. The three horizontal exhaust ducts 81A to 83A are arranged in a manner extending in the front-to-back direction (X direction) along the conveying space 12. In addition, the three horizontal exhaust ducts 81A to 83A are arranged in an aligned manner in the width direction (Y direction).

[0120] The first horizontal exhaust pipe 81A is connected to the exhaust pipe 41 (41A) for the processing unit 21A and the exhaust pipe 41 (41B) for the processing unit 21B. Similarly, the second horizontal exhaust pipe 82A is connected to the exhaust pipe 42 (42A) for the processing unit 21A and the exhaust pipe 42 (42B) for the processing unit 21B. The third horizontal exhaust pipe 83A is connected to the exhaust pipe 43 (43A) for the processing unit 21A and the exhaust pipe 43 (43B) for the processing unit 21B. The three horizontal exhaust pipes 81A to 83A are respectively arranged at positions overlapping the processing layers 23 of the processing units 21A and 21B in a plan view.

[0121] The horizontal exhaust pipe 81A exhausts the gas from the exhaust pipes 41A and 41B. The horizontal exhaust pipe 82A exhausts the gas from the exhaust pipes 42A and 42B. The horizontal exhaust pipe 83A exhausts the gas from the exhaust pipes 43A and 43B.

[0122] The processing block 11 includes horizontal exhaust ducts 81B, 82B, and 83B. The three horizontal exhaust ducts 81B, 82B, and 83B are configured in substantially the same manner as the three horizontal exhaust ducts 81A to 83A. The three horizontal exhaust ducts 81B to 83B are arranged at a position higher than the two processing units 21C and 21D at the uppermost stage (sixth stage). The three horizontal exhaust ducts 81B to 83B are arranged so as to extend in the front-rear direction X along the conveying space 12.

[0123] The fourth horizontal exhaust pipe 81B is connected to each of the exhaust pipe 41 (41C) for the processing unit 21C and the exhaust pipe 41 (41D) for the processing unit 21D. Similarly, the fifth horizontal exhaust pipe 82B is connected to each of the exhaust pipe 42 (42C) for the processing unit 21C and the exhaust pipe 42 (42D) for the processing unit 21D. The sixth horizontal exhaust pipe 83B is connected to each of the exhaust pipe 43 (43C) for the processing unit 21C and the exhaust pipe 43 (43D) for the processing unit 21D. In addition, the three horizontal exhaust pipes 81B to 83B are arranged in the width direction Y. For example, the horizontal exhaust pipe 81B exhausts gas from the exhaust pipes 41C and 41D.

[0124] The three horizontal exhaust pipes 81A to 83A are configured to be longer than the three horizontal exhaust pipes 81B to 83B. The horizontal exhaust pipes 81A, 82A, and 83A have front ends 81Af, 82Af, and 83Af, respectively. The horizontal exhaust pipes 81B, 82B, and 83B have front ends 81Bf, 82Bf, and 83Bf, respectively. The front end 81Af is arranged further forward than the front ends 81Bf, 82Bf, and 83Bf. Similarly, the front ends 82Af and 83Af are arranged further forward than the front ends 81Bf, 82Bf, and 83Bf, respectively.

[0125] The six front ends 81Af to 83Af and 81Bf to 83Bf are open to the outside of the substrate processing apparatus 1 (for example, a clean room where the substrate processing apparatus 1 is installed). The six horizontal exhaust pipes 81A to 83A and 81A to 83A can inhale the external atmosphere from the six front ends 81Af to 83Af and 81Bf to 83Bf, respectively.

[0126] The gas flows backward in the horizontal exhaust pipe 81A. Similarly, the gas flows backward in the five horizontal exhaust pipes 82A, 83A, 81B to 83B. The horizontal exhaust pipes 81A, 82A, 83A have rear ends 81Ab, 82Ab, 83Ab, respectively. The horizontal exhaust pipes 81B, 82B, 83B have rear ends 81Bb, 82Bb, 83Bb, respectively. The six rear ends 81Ab to 83Ab, 81Bb to 83Bb are connected to, for example, the exhaust equipment of a factory. The exhaust equipment of the factory sucks the gas in the six horizontal exhaust pipes 81A to 83A, 81B to 83B through the six rear ends 81Ab to 83Ab, 81Bb to 83Bb at a preset pressure.

[0127] The processing block 11 includes six pressure sensors 85, six front-end pressure regulating mechanisms 87, and six rear-end pressure regulating mechanisms 89. That is, each of the six horizontal exhaust pipes 81A to 83A and 81B to 83B includes a pressure sensor 85, a front-end pressure regulating mechanism 87, and a rear-end pressure regulating mechanism 89.

[0128] Reference Fig.13 . The horizontal exhaust pipe 81A is used as an example for explanation. The pressure adjustment mechanism 87 on the front end side is arranged between the connection part of the front end 81Af and the exhaust pipe 41A. In addition, the pressure adjustment mechanism 87 can be arranged at a position closer to the front end 81Af than the connection part of the exhaust pipe 41A. The pressure adjustment mechanism 87 adjusts the pressure (air volume) of the external atmosphere flowing in from the front end 81Af. The pressure adjustment mechanism 87 is the same as the pressure adjustment mechanism 73, for example, composed of one of an automatic damper and a fan. The automatic damper and the fan are each driven by an electric motor.

[0129] The pressure adjustment mechanism 89 on the rear end side is arranged between the connection part of the exhaust pipe 41B and the rear end 81Ab. In addition, the pressure adjustment mechanism 89 can be arranged at a position closer to the rear end 81Ab than the connection part of the exhaust pipe 41B. The pressure adjustment mechanism 89 adjusts the pressure of the gas sent to the outside of the substrate processing device 1 (for example, the exhaust equipment of the factory). The pressure adjustment mechanism 89, for example, has a plate-shaped blade component and a dial for adjusting the inclination of the blade component, and the operator manually adjusts the inclination of the blade component by turning the dial. In addition, the pressure adjustment mechanism 89 is the same as the pressure adjustment mechanism 73, for example, it can be composed of one of an automatic damper and a fan. The pressure adjustment mechanism 89 is adjusted, for example, when the substrate processing device 1 is set.

[0130] The pressure sensor 85 is disposed between the connection portion of the exhaust pipe 41B and the pressure regulating mechanism 89 at the rear end. The pressure sensor 85 measures the pressure in the horizontal exhaust pipe 81A where the two exhaust pipes 41A and 41B are gathered. The pressure regulating mechanism 87 at the front end adjusts the pressure of the gas in the horizontal exhaust pipe 81A to a preset value based on the pressure measured by the pressure sensor 85.

[0131] Similar to the horizontal exhaust pipe 81A, the remaining five horizontal exhaust pipes 82A, 83A, 81B to 83B are provided with a pressure sensor 85 and two pressure adjustment mechanisms 87 and 89. The pressure adjustment mechanism 87 at the front end adjusts the pressure (air volume) of the gas in each horizontal exhaust pipe 82A, 83A, 81B to 83B to a preset value based on the pressure measured by the pressure sensor 85.

[0132] <2-2. Commonality of the processing unit 21>

[0133] Reference Figure 4Each processing unit 21 has the same structure. Therefore, in all processing units 21, the processing chamber 23, the liquid medicine piping space 94 and the switching mechanism 51 (or the exhaust chamber 53) are arranged along the conveying space 12. In addition, in all processing units 21, when viewed from the conveying space 12 side, the liquid medicine piping space 94 is arranged on one side of the processing chamber 23, and the switching mechanism 51 is arranged in a manner opposite to the liquid medicine piping space 94 across the processing chamber 23. This aspect will be described in detail.

[0134] First, the "left-hand side" and "right-hand side" in this description are the same as Figure 4 The "left" and "right" of the width direction Y shown are irrelevant. Figure 4 As shown, the transfer and conveying section 3 and the processing block 11 are arranged horizontally. When viewed from the conveying space 12 side, the processing units 21A and 21B are both configured with a liquid piping space 94 on the right hand side of the processing chamber 23, and a switching mechanism 51 on the left hand side of the processing chamber 23. Figure 4 When viewed from the transfer space 12 side, the processing units 21C and 21D are both provided with the liquid pipe space 94 on the right hand side of the processing chamber 23 and the switching mechanism 51 on the left hand side of the processing chamber 23 .

[0135] In other words, the processing units 21C and 21D are equivalent to the processing units 21A and 21B rotated 180 degrees around an axis parallel to the vertical direction Z. In addition, for example, the relative arrangement of the processing chamber 23, the holding unit 31, and the liquid supply unit 33 is the same among the processing units 21A, 21B, 21C, and 21D.

[0136] <2-3. Control system of substrate processing apparatus 1>

[0137] The substrate processing apparatus 1 includes a control unit 97 (see Figure 4 ). The control unit 97 controls each component of the substrate processing apparatus 1. For example, the control unit 97 controls the conveying mechanisms 6 and 16, the processing unit 21, the switch valves V1 to V3, the switching mechanism 51, the pressure sensor (e.g., reference numeral 71), and the pressure adjustment mechanism (e.g., reference numeral 73). The control unit 97 can be connected to these elements in a communicative manner.

[0138] The control unit 97 is implemented by a central processing unit (CPU) that executes various processing, and a storage medium such as a RAM (Random-Access Memory) or a fixed disk that serves as a work area for the processing. The storage medium stores programs required for the operation of the substrate processing apparatus 1.

[0139] In addition, the transport space 12 corresponds to the transport path of the present invention. The transport mechanism 16 corresponds to the substrate transport mechanism of the present invention. The holding portion 31 and the rotation drive portion 32 correspond to the holding and rotating portion of the present invention. The switch portions 61 and 62 correspond to the opening and closing mechanism of the present invention. The chemical liquid piping space 94 corresponds to the chemical liquid piping portion of the present invention. The piping LN1 to LN3 correspond to the chemical liquid piping of the present invention.

[0140] <3. Operation of substrate processing apparatus 1 >

[0141] Reference Figure 4 The operation of the substrate processing apparatus 1 is briefly described. The transport mechanism 6 of the transfer conveyor 3 transports the substrate W from the carrier C on the carrier loading section 4 to, for example, the substrate loading section 14A of the two substrate loading sections 14A and 14B. The transport mechanism 16A of the processing block 11 transports the substrate W from the substrate loading section 14A to any one of the 12 processing units 21 on the upper side. Specifically, the transport mechanism 16A enters the interior of the processing chamber 23 through the substrate transport port 27, and then places the substrate W on the holding section 31 of the processing unit 21.

[0142] The processing unit 21 performs liquid treatment on the substrate W in the processing chamber 23 (that is, the processing space 24). Specifically, the liquid supply unit 33 supplies liquid to the substrate W held on the holding unit 31. After the substrate W is processed, the transport mechanism 16A transports the substrate W from the holding unit 31 of the processing unit 21 to the substrate mounting unit 14A. The transport mechanism 6 transports the substrate W from the substrate mounting unit 14A to the carrier C on the carrier mounting unit 4.

[0143] <3-1. Exhaust Operation of Each Processing Unit 21>

[0144] Reference Fig. 9 The transport mechanism 16A of the processing block 11 transports the substrate W to the holding portion 31 of the processing unit 21. The holding portion 31 holds the substrate W. In addition, the three exhaust pipes 41 to 43 (41A to 43A) are used, for example, as follows. The exhaust pipe 41 is used for acid exhaust. In addition, the exhaust pipe 42 is used for alkali exhaust, and the exhaust pipe 43 is used for organic exhaust.

[0145] First, the case where an acid-based chemical solution is supplied to the substrate W for chemical treatment will be described. Fig.11A As shown, the switch unit 61 of the switching mechanism 51 closes the distribution opening 67 of the first communication port 63 and the distribution opening 67. Thus, the distribution unit 56 of the exhaust chamber 53 is switched to the exhaust pipe 41. Thereafter, the gas from the processing chamber 23 is sent to the exhaust pipe 41.

[0146] Afterwards, Fig. 9The base portion 37A of the liquid supply unit 33 shown in FIG. 1 rotates the nozzle 34A around the rotation axis A4. As a result, the tip portion 35A of the nozzle 34A moves from a standby position outside the substrate W to a predetermined position (liquid discharge position) above the substrate W. Then, by opening and closing the valve V1 (see FIG. 1 ), the nozzle 34A is rotated about the rotation axis A4. Fig.10 ) is turned on, and an acid solution is supplied to the substrate W from a discharge port (not shown) of the front end portion 35A. In addition, the rotation drive portion 32 rotates the holding portion 31 holding the substrate W around the rotation axis A3 as needed. When the acid solution is discharged, vapor of the acid solution is generated in the processing chamber 23. The gas containing the vapor of the acid solution is discharged from the exhaust port 52. The gas passing through the exhaust port 52 is sequentially sent to the introduction portion 55 and the distribution portion 56, and then sent to the exhaust pipe 41 connected to the distribution portion 56.

[0147] Next, the case where an alkaline chemical solution is supplied to the substrate W for chemical treatment will be described. Fig. 11B As shown, the switch portion 61 of the switching mechanism 51 closes the first communication port 63 and the first distribution opening 67. Furthermore, the switch portion 62 closes the second communication port 64 and the second distribution opening 68. Thus, the distribution portion 56 of the exhaust chamber 53 is switched to the exhaust pipe 42. Thereafter, the gas from the processing chamber 23 is sent to the exhaust pipe 42.

[0148] Afterwards, Fig. 9 The base portion 37B of the liquid supply unit 33 shown in FIG. 1 moves the tip portion 35B of the nozzle 34B from the standby position to the liquid discharge position above the substrate W. Then, by opening and closing the valve V2 (see FIG. 1 ), the liquid supply unit 33 is turned on and off. Fig.10 ) is opened, and an alkaline chemical solution is supplied from a nozzle (not shown) of the front end portion 35B to the substrate W. When the alkaline chemical solution is supplied, vapor of the alkaline chemical solution is generated in the processing chamber 23. The gas containing the vapor of the alkaline chemical solution is exhausted from the exhaust port 52. The gas passing through the exhaust port 52 is sent to the exhaust pipe 42.

[0149] Next, the case where an organic chemical solution is supplied to the substrate W for chemical treatment will be described. Fig. 11C As shown, the switch unit 61 of the switching mechanism 51 closes the first communication port 63. Furthermore, the switch unit 62 closes the second communication port 64 and the second communication port 64 in the second distribution opening 68. As a result, the distribution unit 56 of the exhaust chamber 53 is switched to the exhaust pipe 43. Thereafter, the gas from the processing chamber 23 is sent to the exhaust pipe 43.

[0150] Afterwards, Fig. 9 The base portion 37C of the liquid supply unit 33 shown in FIG. 1 moves the tip portion 35C of the nozzle 34C from the standby position to the liquid discharge position above the substrate W. Then, by opening and closing the valve V3 (see FIG. 1 ), the liquid supply unit 33 is turned on and off. Fig.10) is opened, and an organic chemical solution is supplied from a nozzle (not shown) of the front end portion 35C to the substrate W. When the organic chemical solution is supplied, vapor of the organic chemical solution is generated in the processing chamber 23. Gas containing the vapor of the organic chemical solution is exhausted from the exhaust port 52. The gas passing through the exhaust port 52 is sent to the exhaust pipe 43.

[0151] A pressure sensor 71 measures the pressure of the gas near the exhaust port 52. The pressure adjustment mechanism 73 adjusts the pressure (air volume) of the gas sucked from the exhaust port 52 to a preset value based on the pressure measured by the pressure sensor 71.

[0152] <3-2. Exhaust Operation of Processing Units 21A and 21B>

[0153] Reference Fig.12 The switching mechanism 51 (exhaust chamber 53) of each of the six-stage processing units 21A is connected to the three exhaust pipes 41A, 42A, and 43A. In addition, the switching mechanism 51 of each of the six-stage processing units 21B is connected to the three exhaust pipes 41B, 42B, and 43B. In addition, the two exhaust pipes 41A and 41B are connected to the first horizontal exhaust pipe 81A. The two exhaust pipes 42A and 42B are connected to the second horizontal exhaust pipe 82A, and the two exhaust pipes 43A and 43B are connected to the third horizontal exhaust pipe 83A.

[0154] The 12 switching mechanisms 51 independently perform switching actions. For example, liquid treatment is performed as follows. The 6-stage processing unit 21A supplies an acidic liquid to the substrate W. In addition, the processing unit 21B of the upper 4 stages supplies an alkaline liquid to the substrate W, and the processing unit 21B of the lower 2 stages supplies an organic liquid to the substrate W. In this case, the switching mechanism 51 of each of the 6-stage processing units 21A switches the exhaust path of the gas from the processing chamber 23 to the exhaust pipe 41A. In addition, the switching mechanism 51 of each of the processing units 21B of the upper 4 stages switches the exhaust path of the gas from the processing chamber 23 to the exhaust pipe 42B, and the switching mechanism 51 of each of the processing units 21B of the lower 2 stages switches the exhaust path of the gas from the processing chamber 23 to the exhaust pipe 43B.

[0155] The gas from the 6-stage processing unit 21A is sent to the outside from the rear end 81Ab through the exhaust pipe 41A and the horizontal exhaust pipe 81A. In addition, the gas from the upper 4-stage processing unit 21B is sent to the outside from the rear end 82Ab through the exhaust pipe 42B and the horizontal exhaust pipe 82A, and the gas from the lower 2-stage processing unit 21B is sent to the outside from the rear end 83Ab through the exhaust pipe 43B and the horizontal exhaust pipe 83A.

[0156] Fig.12In the embodiment, the 12 pressure regulating mechanisms 73 of the 12 processing units 21A and 21B independently adjust the pressure based on the pressure measured by the corresponding pressure sensor 71. In addition, the three pressure regulating mechanisms 87 provided in the three horizontal exhaust pipes 81A to 83A independently adjust the pressure based on the pressure measured by the corresponding pressure sensor 85. Fig.12 In the embodiment, the three pressure adjustment mechanisms 87 are controlled independently of the twelve pressure adjustment mechanisms 73 .

[0157] For example, the pressure regulating mechanism 87 of the first horizontal exhaust pipe 81A measures the pressure of the gas (e.g., gas containing vapor of an acidic chemical solution) delivered from the sixth-stage processing unit 21A through the exhaust pipe 41A using the pressure sensor 85, and performs pressure regulation. Similarly, the pressure regulating mechanism 87 of the second horizontal exhaust pipe 82A measures the pressure of the gas (e.g., gas containing vapor of an alkaline chemical solution) delivered from the fourth-stage processing unit 21B through the exhaust pipe 42B using the pressure sensor 85, and performs pressure regulation. In addition, the pressure regulating mechanism 87 of the third horizontal exhaust pipe 83A measures the pressure of the gas (e.g., gas containing vapor of an organic chemical solution) delivered from the second-stage processing unit 21B through the exhaust pipe 43B using the pressure sensor 85, and performs pressure regulation.

[0158] in addition, Fig.12 In the six-stage processing unit 21A shown, for example, regarding the distance from the exhaust pipe 41A to the horizontal exhaust pipe 81A, the processing unit 21A at the lowest stage (first stage) is longer than the processing unit 21A at the highest stage (sixth stage), so the opening of the pressure adjustment mechanism 73 (for example, the automatic damper) is increased toward the lowest stage processing unit 21A. In other words, the air volume is increased. In addition, for example, because the horizontal exhaust pipe 81A is longer than the horizontal exhaust pipe 81B, the opening of the pressure adjustment mechanism 73 (for example, the automatic damper) is increased.

[0159] According to the present embodiment, in all the processing units 21, the processing chamber 23, the chemical liquid piping space 94, and the exhaust chamber 53 (switching mechanism 51) are arranged along the transport space 12, and when viewed from the transport space 12 side, the chemical liquid piping space 94 is arranged on one side of the processing chamber 23, and the exhaust chamber 53 is arranged so as to face the chemical liquid piping space 94 across the processing chamber 23. Since the exhaust chamber 53 is arranged so as to face the chemical liquid piping space 94 across the processing chamber 23, it is possible to prevent the exhaust pipe from obstructing the passage through which the pipe for supplying the chemical liquid to the substrate W held on the holding portion 31 passes. In addition, when viewed from the transport space 12 side, all the processing units 21 are arranged so as to face the chemical liquid piping space 94 across the processing chamber 23. Therefore, in the past, two types of processing units were used, but in the present invention, one type of processing unit 21 can solve the problem. Therefore, the parts can be made common among all the processing units 21 .

[0160] in addition, Figure 4 In the embodiment, the widths of the exhaust chamber 53, the processing chamber 23, and the liquid medicine piping space 94 in the front-to-back direction X are different from each other. In this case, for example, when two processing chambers 23 are arranged in a manner facing each other across the conveying space 12, an extra area will be generated, thereby increasing the equipment footprint, that is, the occupied area, of the processing block 11 in the front-to-back direction X. In this regard, according to the present embodiment, the processing chambers 23 of the four processing units 21A to 21D are arranged in a so-called staggered manner (zigzag shape) along the conveying space 12. In other words, these processing chambers are arranged in a manner that minimizes the generation of the extra area. Therefore, the occupied area of ​​the processing block 11 can be reduced.

[0161] The exhaust chamber 53 communicates with three exhaust pipes 41 to 43 extending in the vertical direction. The exhaust chamber 53 includes switch units 61 and 62 for switching the exhaust path of the gas from the processing chamber 23 to any one of the three exhaust pipes 41 to 43 .

[0162] The exhaust chamber 53 (switching mechanism 51) is arranged on the side of the processing chamber 23. Therefore, the switch parts 61 and 62 can switch the exhaust near the processing chamber 23. In other words, the flow path between the processing chamber 23 and the switch parts 61 and 62 of the exhaust chamber 53 can be appropriately shortened. Therefore, compared with the case where the exhaust is switched at a position higher than the uppermost processing unit 21 as in the prior art, the responsiveness of the switching is improved.

[0163] in addition, Figure 2In the case of the conventional exhaust pipe 241 shown, a common exhaust pipe is formed between the processing chamber 223 and the exhaust switching device 251. Therefore, when acidic and alkaline liquid treatments are continuously performed, crystals (salts) caused by exhaust mixing will be generated and accumulated. Therefore, the deposits will hinder exhaust, and it is necessary to regularly clean the exhaust pipe with a cleaning liquid. During the cleaning of the exhaust pipe, the exhaust pressure will become unstable, so substrate processing may not be performed, resulting in a reduction in the production capacity of the substrate processing device 1. According to the switching mechanism 51 of the present embodiment, the mixing of, for example, acid and alkali in the exhaust pipe can be suppressed to a minimum. Therefore, it is possible to appropriately suppress the flow path between the processing chamber 23 and the exhaust chamber 53 from being contaminated.

[0164] In addition, since the exhaust chamber 53 is arranged on the side of the processing chamber 23, the height of the processing unit 21 can be suppressed. In addition, since the switch parts 61 and 62 can switch the exhaust near the processing chamber 23, the common exhaust pipes 41 to 43 can be arranged for a plurality of processing units 21 stacked in a row in the vertical direction. Therefore, the three exhaust pipes 41 to 43 on the side of the processing chamber 23 can be compactly arranged.

[0165] In addition, the processing chamber 23 is further provided with a liquid supply unit 33 for supplying a chemical solution to the substrate W held by the holding unit 31. When the liquid supply unit 33 supplies an acidic chemical solution, the switch units 61 and 62 switch the exhaust path of the gas from the processing chamber 23 to the first exhaust pipe 41 among the three exhaust pipes 41 to 43. When the liquid supply unit 33 supplies an alkaline chemical solution, the switch units 61 and 62 switch the exhaust path of the gas from the processing chamber 23 to the second exhaust pipe 42 among the three exhaust pipes 41 to 43. When the liquid supply unit 33 supplies an organic chemical solution, the switch units 61 and 62 switch the exhaust path of the gas from the processing chamber 23 to the third exhaust pipe 43 among the three exhaust pipes 41 to 43.

[0166] Thus, the switch parts 61 and 62 can switch the exhaust from the processing chamber 23 to the first exhaust pipe 41 , the second exhaust pipe 42 and the third exhaust pipe 43 according to the acidic, alkaline and organic chemical solutions supplied by the liquid supply part 33 .

[0167] In addition, the processing chamber 23 has a side wall 25c so as to face the substrate transfer port 27 via the holding portion 31 in a plan view. The holding portion 31 is arranged in the processing chamber 23 at a position closer to the substrate transfer port 27 than the side wall 25c. Fig. 9, the distance DT1 between the substrate transfer port 27 and the rotation axis A3 of the holding portion 31 is shorter than the distance DT2 between the rotation axis A3 of the holding portion 31 and the side wall 25c (DT1<DT2). The three exhaust pipes 41 to 43 are arranged in a row in the horizontal direction (width direction Y) perpendicular to the extending direction of the transfer space 12, and the exhaust port 52 of the exhaust chamber 53 is arranged closer to the transfer space 12 than the three exhaust pipes 41 to 43.

[0168] In the processing chamber 23, since the nozzle 34B and the like are arranged on the side wall 25c, the holding part 31 tends to be arranged near the substrate transfer port 27. The exhaust port 52 of the exhaust chamber 53 is arranged closer to the transfer space 12 than the three exhaust pipes 41 to 43. Thus, the installation area of ​​the exhaust chamber 53 and the three exhaust pipes 41 to 43 in a plan view can be suppressed to be small, and the exhaust port 52 can be arranged closer to the holding part 31. Therefore, the vapor of the chemical solution around the holding part 31 can be sent to the exhaust chamber 53 relatively smoothly.

[0169] In addition, three (a plurality of) horizontal exhaust pipes 81A, 82A, and 83A are provided at a higher position than the 24 processing units 21 and along the conveying space 12. The three horizontal exhaust pipes 81A, 82A, and 83A are connected to the exhaust chambers 53 of the six processing units 21 stacked in a row in the vertical direction via the three exhaust pipes 41, 42, and 43. In each processing unit 21, the switch parts 61 and 62 are provided in the exhaust chamber 53 on the side of the processing chamber 23, so that the structure of the connection part between the three horizontal exhaust pipes 81A, 82A, and 83A and the three exhaust pipes 41, 42, and 43 can be simplified.

[0170] In addition, the exhaust chamber 53 is provided with a pressure regulating mechanism 73. The pressure regulating mechanism 73 is provided near the exhaust port 52, and regulates the pressure of the gas passing through the exhaust port 52. Thus, the pressure regulation of the exhaust gas can be performed in each processing unit 21. For example, compared with the case where the pressure regulation of the exhaust gas is performed uniformly after the exhaust gas from a plurality of processing units 21 is gathered, the pressure regulation of the exhaust gas of each processing unit 21 is easier.

[0171] The present invention is not limited to the above-described embodiment, and can be modified as follows.

[0172] (1) In the embodiment described above, Figure 4 As shown, three exhaust pipes 41 to 43 are connected to the processing chamber 23 and arranged in parallel in the Y direction. Fig.14 As shown in FIG. 1 , the three exhaust pipes 41 to 43 and the processing chamber 23 may also be arranged with the distribution portion 56 interposed therebetween. Fig.15 As shown, a gap GP may be formed between the three exhaust pipes 41 to 43 and the processing chamber 23 .

[0173] (2) In the embodiment and variation (1), Fig. 9 The distribution unit 56 of the switching mechanism 51 shown in FIG. 1 includes two switch units 61 and 62. The two switch units 61 and 62 are formed in a flat plate shape (I-type). Fig.16 As shown, the two switch parts 161 and 162 may also be formed into a shape having a flat plate and an arm extending to the rotation axis A7, that is, a T-shaped cross section. Fig. 9 The distribution unit 56 shown may include three switch units for opening or closing the three communication ports 63 , 64 , and 65 , respectively.

[0174] (3) In the embodiments and variations described above, Fig. 9 As shown in FIG. 1 , three exhaust pipes 41 to 43 are connected to a distribution portion 56 as an exhaust path. Fig.17 As shown, each of the three exhaust pipes 41 to 43 may include an exhaust passage 156. In addition, reference numeral 162 denotes a third switch unit.

[0175] (4) In the embodiments and variations described above, Figure 5 As shown, the processing block 11 includes two conveying mechanisms 16A and 16B. The upper conveying mechanism 16A conveys substrates W to the upper three-stage processing units 21 (21A to 21D), and the lower conveying mechanism 16B conveys substrates W to the lower three-stage processing units 21. Therefore, even if the number of stages of the processing units 21 is large (for example, 6 stages), the substrate conveyance can be shared by the two conveying mechanisms 16A and 16B. Here, the processing block 11 is not limited to two conveying mechanisms 16, and may include one or more than three conveying mechanisms 16. The three or more conveying mechanisms 16 convey substrates W to a plurality of processing units of a predetermined stage among a plurality of processing units 21 stacked in the vertical direction.

[0176] (5) In the above-described embodiment and various variations, the switching mechanism 51 is provided on the side of the processing chamber 23, that is, at substantially the same height as the processing chamber 23. Fig.18 As shown, the switching exhaust mechanism 151 can also be provided in the three horizontal exhaust pipes 81A to 83A as needed. In this case, the liquid medicine piping space 94 is arranged in contact with the processing chamber 23. The exhaust chamber 53 is arranged in a manner opposite to the liquid medicine piping space 94 across the processing chamber 23. The exhaust chamber 53 is communicated with the processing chamber 23 and is communicated with one exhaust pipe 41.

[0177] In the case of this variation, on the side of the processing unit 21 at the uppermost stage (the sixth stage), in the exhaust pipe space 44 (see Fig. 9 ) are provided with 6 exhaust pipes 41. Therefore, the exhaust pipe space 44 will be compressed. Fig. 9In the processing unit 21 shown, the switching mechanism 51 (exhaust chamber 53) is connected to the three common exhaust pipes 41 to 43, so even if the number of stages of the processing unit 21 is increased, the number of exhaust pipes (three) extending in the vertical direction does not change. As a result, the three exhaust pipes 41 to 43 on the side of the processing chamber 23 can be compactly arranged.

[0178] (6) In the above-described embodiment and each variation, the liquid supply unit 33 supplies acidic, alkaline, and organic liquid medicines. In this regard, the liquid supply unit 33 may also supply one or more liquid medicines other than acidic, alkaline, and organic liquid medicines. In this case, four or more common exhaust pipes extending in the vertical direction are connected to the exhaust chamber 53. In addition, the liquid supply unit 33 may also be configured to supply two different liquid medicines among acidic, alkaline, and organic liquid medicines. In this case, two common exhaust pipes extending in the vertical direction are connected to the exhaust chamber 53.

[0179] (7) In the above-described embodiment and various variations, the rotation axis A3 (see Fig. 9 ) is not arranged at the center of the processing unit 21 in the front-rear direction X. In this regard, the rotation axis A3 of the holding portion 31 may also be arranged at the center of the processing unit 21 in the front-rear direction X.

[0180] (8) In the above-described embodiment and various variations, the processing unit 21 is located at the substrate transfer port 27 Fig. 9 In the case of the upper side of the paper, Fig. 9 The liquid medicine piping space 94, the processing chamber 23, and the switching mechanism 51 are sequentially arranged from the left side of the paper. Fig. 9 The components of the processing unit 21 shown in the figure may also be arranged in a reverse manner (see Fig.19 ). In this case, it is assumed that the substrate transfer port 27 is located at Fig. 9 When the paper is on the upper side, it becomes Fig. 9 The switching mechanism 51, the processing chamber 23, and the chemical liquid piping space 94 are sequentially arranged from the left side of the paper. In addition, the 24 processing units 21 of the processing block 11 are composed of one type of processing unit in which each component is arranged inverted left and right.

[0181] in addition, Figure 4 The horizontal moving portion 8b of the transport mechanism 6 shown moves in the width direction Y relative to the rail 8a. Therefore, the vertical moving portion 8c can move in the width direction Y. In this regard, Fig.19The vertical moving part 108 of the transport mechanism 106 shown may not move in the width direction Y, but may be fixed to the bottom of the transport space 5. In this case, the transport mechanism 106 includes the vertical moving part 108, two multi-joint arms 109a, 109b and two hands 107a, 107b. The vertical moving part 108 moves vertically in the up-down direction Z and rotates around the rotation axis A1. The vertical moving part 108 supports the two multi-joint arms 109a, 109b. The first hand 107a is installed at the front end of the first multi-joint arm 109a, and the second hand 107b is installed at the front end of the second multi-joint arm 109b. The transport mechanism 106 can access each carrier C on the four carrier loading parts 4.

[0182] The present invention may be embodied in other specific forms without departing from the spirit or essence thereof and, accordingly, reference should be made to the appended claims, rather than to the foregoing description, as indicating the scope of the invention.

[0183] [Explanation of Symbols]

[0184] 1 Substrate processing device

[0185] 3. Transfer and conveying unit

[0186] 5 Transport space

[0187] 11 Processing Blocks

[0188] 12(12A, 12B) Transport space

[0189] 16(16A, 16B) Transport mechanism

[0190] 21 (21A, 21B, 21C, 21D) Processing unit

[0191] 23. Processing Room

[0192] 25c Sidewall

[0193] 27 Substrate transfer port

[0194] 31. Maintaining part

[0195] 32 Rotation drive unit

[0196] 33 Liquid supply unit

[0197] 41 (41A, 41B, 41C, 41D) Exhaust pipe

[0198] 42 (42A, 42B, 42C, 42D) Exhaust pipe

[0199] 43 (43A, 43B, 43C, 43D) Exhaust pipe

[0200] 51 Switching mechanism

[0201] 52 Exhaust port

[0202] 53 Exhaust Chamber

[0203] 61, 62 switch part

[0204] 73 Pressure adjustment mechanism

[0205] 81A, 82A, 83A horizontal exhaust pipe

[0206] 81B, 82B, 83B horizontal exhaust pipe

[0207] 94: Space for chemical liquid piping.

Claims

1. A substrate processing device, characterized in that have: A substrate transport mechanism transports the substrate; and A plurality of processing units perform specific chemical liquid processing on the substrate transported by the substrate transport mechanism; and The plurality of processing units are arranged along a transport path of the substrate transport mechanism, and are arranged to face each other across the transport path, and are further arranged in a stacked manner in the vertical direction, and Each of the processing units comprises: The processing chamber is an area in which a holding and rotating unit is arranged to rotate while holding a substrate, and the substrate held and rotated by the holding and rotating unit is subjected to liquid treatment, and the substrate is exchanged with the substrate transfer mechanism via a substrate transfer port; A chemical liquid piping section is a region where a chemical liquid piping for supplying chemical liquid to the processing chamber and an on-off valve provided on the chemical liquid piping are arranged; and An exhaust chamber, which is connected to the processing chamber via an exhaust port to exhaust the processing chamber and is connected to an exhaust pipe extending in a vertical direction; In all the processing units, the processing chamber, the chemical liquid piping section and the exhaust chamber are arranged horizontally along the transport path, and when viewed from the transport path side, the chemical liquid piping section is arranged on one side of the processing chamber, and the exhaust chamber is arranged in a manner opposite to the chemical liquid piping section across the processing chamber.

2. The substrate processing device according to claim 1, characterized in that: The exhaust pipe is a plurality of exhaust pipes, The exhaust chamber is communicated with the plurality of exhaust pipes extending in the up-down direction, and The exhaust chamber includes an opening and closing mechanism for switching an exhaust path of the gas from the processing chamber to any one of the plurality of exhaust pipes.

3. The substrate processing device according to claim 2, characterized in that: The processing chamber further includes a liquid supply unit for supplying a chemical solution to the substrate held by the holding and rotating unit. The opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the first exhaust pipe among the plurality of exhaust pipes when the acid-based chemical solution is supplied from the liquid supply unit. The opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the second exhaust pipe among the plurality of exhaust pipes when the alkaline chemical solution is supplied from the liquid supply unit. The opening and closing mechanism switches the exhaust path of the gas from the processing chamber to the third exhaust pipe among the plurality of exhaust pipes when the liquid supply unit supplies the organic chemical solution.

4. The substrate processing device according to claim 2 or 3, characterized in that: The processing chamber has a side wall so as to face the substrate transfer port across the holding and rotating portion in a plan view. The holding and rotating portion is arranged in the processing chamber at a position closer to the substrate transfer port than the side wall. The plurality of exhaust pipes are arranged in a row in a horizontal direction perpendicular to the direction in which the conveying path extends. The exhaust port of the exhaust chamber is arranged closer to the transport path than the plurality of exhaust pipes.

5. The substrate processing device according to claim 2 or 3, characterized in that: A horizontal exhaust duct is further provided which is located higher than the plurality of processing units and is provided along the conveying path. The horizontal exhaust duct communicates with the exhaust chambers of the plurality of processing units stacked in a row in the vertical direction via the exhaust duct.

6. The substrate processing apparatus according to claim 1, characterized in that: The exhaust chamber includes a pressure regulating mechanism that is provided near the exhaust port and regulates the pressure of the gas passing through the exhaust port.

7. The substrate processing apparatus according to claim 1, characterized in that: The substrate transport mechanism includes a plurality of substrate transport mechanisms. Each of the plurality of substrate transfer mechanisms transfers a substrate to a plurality of processing units at a predetermined stage among a plurality of processing units stacked in the vertical direction.

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