Integrated circuit device and method
By designing obliquely configured IO patterns and via electrical coupling technology in integrated circuits, the problem of integration difficulty of different modules is solved, and more efficient integrated circuit manufacturing and adaptability are achieved.
Patent Information
- Application Number
- CN202110472896.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2021-01-04
- Filing Date
- 2021-04-29
- Publication Date
- 2022-05-06
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Integration of modules built by different designers in integrated circuit (IC) devices is difficult, mainly due to the different metal design specifications used by different designers, which makes integration and coupling difficult.
Adopt an IC device design that includes a substrate, a circuit area, and an input/output (IO) pattern, where the IO pattern is tilted along a specific direction and electrically coupled through vias and metal layers, using automated configuration and routing tools (APR) Overlap the access pattern and IO pattern to achieve electrical contact and form an acute-angle structure.
It improves the integration and coupling efficiency of different modules, simplifies the manufacturing process of integrated circuits, enhances the flexibility and adaptability of IC devices, and is compatible with different metal design specifications.