An adaptive ion beam correction deflection plate

Abstract

The present invention relates to an adaptive ion beam correction deflection plate, comprising: two electrode plates arranged opposite to each other, and an incident beam channel is formed between the two electrode plates; the electrode plate comprises a secondary particle suppression module array, a suppression module insulating card seat and a plurality of high-value resistors; the secondary particle suppression module array is composed of a plurality of secondary particle suppression modules arranged side by side on the suppression module insulating card seat, each of the secondary particle suppression modules is grounded through a high-value resistor, and another high-value resistor is connected between the two secondary particle suppression modules. The present invention can be widely used in the field of ion beam transmission correction.

Description

Technical Field

[0001] The invention relates to an adaptive ion beam correction deflection plate, belonging to the field of ion beam transmission correction. Background Art

[0002] Ion beams produced by accelerators are not only powerful tools for exploring the mysteries of the microscopic world, but also have important applications in modern industry, agriculture, and medicine, including material irradiation modification, biotechnology breeding, and cancer treatment. During beam transport, the inevitable electromagnetic parameter drift of various transport devices often causes the beam to deviate from its original trajectory. If not corrected promptly, phase space mismatch will occur, ultimately leading to loss. Therefore, beam correction devices are essential and crucial for achieving beam phase space stability.

[0003] Common beam correction devices include electrostatic deflection plates and correction magnets, which work with high-precision and high-stability power supply systems to make subtle adjustments to the position and direction of the beam, thereby ensuring that the beam moves along the preset trajectory.

[0004] These beam correction devices adjust the beam's position and direction based on the electrostatic or magnetic fields they provide. The correction amount is determined during the commissioning and optimization phases based on the diagnostic results of the beam diagnostic system. During operation, the electromagnetic field within the device cannot adaptively follow the beam's real-time path to ensure the beam follows the pre-set trajectory at the center of the device. Furthermore, the correction device introduces new uncertainties due to its inherent geometry and the stability of its power supply system. Summary of the Invention

[0005] In response to the above problems, the purpose of the present invention is to provide an adaptive ion beam correction deflection plate. By setting an inclined deep groove array on the correction deflection plate, it can effectively suppress the secondary charged particles from diffusing between the correction electrode plates or sputtering to the opposite side plates, thereby maintaining its high correction capability.

[0006] To achieve the above object, the present invention adopts the following technical solutions:

[0007] An adaptive ion beam correction deflection plate, comprising:

[0008] Two electrode plates are arranged opposite to each other, and an incident beam channel is formed between the two electrode plates;

[0009] The electrode plate includes a secondary particle suppression module array, a suppression module insulation card seat and a number of high-value resistors;

[0010] The secondary particle suppression module array is composed of a plurality of secondary particle suppression modules arranged side by side on the suppression module insulating card seat. Each of the secondary particle suppression modules is grounded through a high-value resistor, and another high-value resistor is connected between each pair of the secondary particle suppression modules.

[0011] Furthermore, the secondary particle suppression module includes a base and several metal sheets; the upper end of the base is provided with several inclined steps, and the lower end of the base is inserted into the insulating holder of the suppression module; each of the metal sheets is fixedly arranged in each of the inclined steps, and an inclined groove is formed between each of the metal sheets.

[0012] Furthermore, the opening direction of the inclined slot is the same as the incident direction of the beam.

[0013] Furthermore, the depth of the inclined groove is ten times its width.

[0014] Furthermore, the high-value resistor is a resistor in the MΩ-GΩ range.

[0015] Furthermore, the two electrode plates are fixed by a plurality of electrode plate support columns of equal height.

[0016] Furthermore, a plurality of fixing holes are provided on the insulating base of the suppression module, and bolt holes matching the fixing holes are provided in each of the electrode plate support columns to achieve fixation of the two electrode plates.

[0017] The present invention has the following advantages due to the adoption of the above technical solution:

[0018] 1. The correction deflection plate provided by the present invention does not require coordination with a power supply system, thus avoiding the introduction of unstable factors such as ripple and drift of the power supply system. It is also not limited by sensitivity and can adaptively compensate for extremely small and slow drift of the beam.

[0019] 2. The present invention provides an inclined deep groove array on the electrode plate, which can prevent the secondary charged particles generated by the interaction between the beam and the deep groove sheet from sputtering to the opposite electrode plate, thereby keeping the opposite correction electrode plate at a low potential, and ultimately making the correction voltage in the kilovolt range or even higher.

[0020] 3. The correction voltage of the present invention is generated by the charge deposited by the beam itself on the electrode plate and discharged through a high-value resistor. It can adaptively change according to the real-time incident angle of the beam to ensure that the outgoing beam moves along the preset track in the center of the deflection plate.

[0021] Therefore, the present invention can be widely applied to the field of ion beam transmission correction. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiment below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present invention. Throughout the drawings, the same reference numerals are used to denote the same components. In the drawings:

[0023] Figure 1 1 is a schematic diagram of the structure of an adaptive ion beam correction deflection plate provided in an embodiment of the present invention;

[0024] Figure 2 Schematic diagram of the electrode plate structure provided by an embodiment of the present invention;

[0025] The symbols in the accompanying drawings represent the following:

[0026] 1. Electrode plate; 11. Secondary particle suppression module; 111. Deep groove metal sheet base; 112. Metal sheet; 12. Secondary particle suppression module insulation holder; 121. Module fixing slot; 122. Fixing hole; 13. High-resistance resistor; 2. Electrode plate support column; 3. Incident beam channel. DETAILED DESCRIPTION

[0027] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the described embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field are within the scope of protection of the present invention.

[0028] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, they indicate the presence of features, steps, operations, devices, components and / or combinations thereof.

[0029] Some embodiments of the present invention provide an adaptive ion beam correction deflector. When the beam deviates from a preset trajectory, it enters the correction deflector at grazing incidence. A small portion of the beam is blocked by the correction electrode, causing charge to accumulate on the plate surface. Simultaneously, this accumulated charge is discharged through a high-value resistor connected to the plate. When charge accumulation and discharge reach equilibrium, a correction electric field is formed within the deflector. This electric field adaptively adjusts its position and intensity distribution within the deflector based on the beam's incident direction, ultimately causing the grazing-incidence beam to follow the preset trajectory at the center of the deflector.

[0030] Example 1

[0031] like Figure 1 、 Figure 2 As shown, the present invention provides an adaptive ion beam correction deflection plate, which includes a pair of parallel, mirror-image electrode plates 1, secured by a plurality of electrode plate support columns 2 of equal height to form an incident beam channel 3. The electrode plates 1 include a secondary particle suppression module array 11, a suppression module insulating holder 12, and a plurality of high-value resistors 13. The secondary particle suppression module array 11 is composed of a plurality of secondary particle suppression modules arranged side by side on the suppression module insulating holder 12. Each secondary particle suppression module is grounded via a high-value resistor 13, and a high-value resistor 13 is connected between each pair of secondary particle suppression modules.

[0032] Preferably, if Figure 2 As shown, the secondary particle suppression module is made of metal and includes a base 111 and several metal sheets 112. The upper end of the base 111 is provided with several inclined steps. The lower end of the base 111 is inserted into a fixed slot 121 reserved on the suppression module insulating base 12 and fixed with screws. Each metal sheet 112 is fixedly mounted in each inclined step, forming an inclined groove between each pair of metal sheets 112.

[0033] Preferably, the metal sheet 112 can be fixed in each inclined step by welding or other means.

[0034] Preferably, the opening direction of the inclined slot is the same as the incident direction of the beam.

[0035] Preferably, the depth d of the inclined groove is about ten times the width w (e.g. Figure 2 As shown), the thickness of the metal sheet 112 constituting the inclined groove is much smaller than the width of the inclined step.

[0036] Preferably, the high-value resistor 13 is a resistor in the MΩ-GΩ range.

[0037] Preferably, the insulating holder 12 is further provided with a plurality of fixing holes 122 , and each electrode plate support column 2 is provided with a bolt hole matching the fixing holes 122 for assembling the two electrode plates 1 .

[0038] The operating principle of the present invention is as follows: The secondary particle suppression module is equipped with an array of inclined deep grooves composed of metal sheets 112, with the grooves facing the beam's incident direction. When the beam deviates from the preset trajectory and enters the correction deflection plates at grazing incidence, a small portion of the beam scrapes against the deep groove array. This portion of the beam is discharged through a high-value resistor connected to the suppression module, generating a correction voltage. At the same time, the interaction between this portion of the beam and the deep groove sheets produces a large number of secondary charged particles that are trapped by the deep grooves and prevented from diffusing into the center of the deflection plates or sputtering onto the opposite plate, thereby charging it. This maintains a large voltage difference between the two correction electrode plates, preserving the corrective deflection capability.

[0039] In the present invention, the electrode plate is equivalent to a simulated insulating plate, the resistance between the suppression modules is equivalent to the surface resistance of the insulating plate, and the grounding resistance is equivalent to the bulk resistance of the insulating plate. When the beam ions deviate from the ideal orbit, they will hit the electrode plate in a grazing incidence manner, and a portion of the beam will be deposited on the electrode plate. These deposited ions will be discharged to the ground through the resistor. The ion flow through the resistor will generate an electric potential, and the electric potential will generate an electric field between the two electrode plates, thereby playing the role of correcting the deflection plate. However, such a correction deflection plate does not have a power supply system, and the generation of its electric field depends on the interaction between it and the beam. The equivalent resistance value R of the resistor network depends on the acceleration voltage U of the beam. a , the angle of deflection θ and the flow intensity I deposited on the electrode plate d , which satisfies I d R≈U a sin 2 θ. For example, if U a At 10 kV, θ is 5°, I d If the current is 100nA, the equivalent resistance value R of the resistor network is 760MΩ.

[0040] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present invention.

Claims

1. An adaptive ion beam correction deflection plate, characterized in that: include: Two electrode plates are arranged opposite to each other, and an incident beam channel is formed between the two electrode plates; The electrode plate includes a secondary particle suppression module array, a suppression module insulation card seat and a number of high-value resistors; The secondary particle suppression module array is composed of a plurality of secondary particle suppression modules arranged side by side on the suppression module insulating card seat, each of the secondary particle suppression modules is grounded through a high value resistor, and another high value resistor is connected between each of the secondary particle suppression modules; The secondary particle suppression module comprises a base and a plurality of metal sheets; the upper end of the base is provided with a plurality of inclined steps, and the lower end of the base is inserted into the insulation holder of the suppression module; each of the metal sheets is fixedly arranged in each of the inclined steps, and an inclined groove is formed between two of the metal sheets; The opening direction of the inclined slot is the same as the incident direction of the beam; The high-value resistor is a resistor of the MΩ-GΩ order of magnitude.

2. An adaptive ion beam correction deflection plate as claimed in claim 1, characterized in that: The depth of the inclined groove is ten times the width.

3. The adaptive ion beam correction deflection plate according to claim 1, characterized in that: The two electrode plates are fixed by a plurality of electrode plate supporting columns of equal height.

4. The adaptive ion beam correction deflection plate according to claim 3, characterized in that: The insulation base of the suppression module is also provided with a plurality of fixing holes, and each of the electrode plate support columns is provided with a bolt hole matching the fixing holes, so as to fix the two electrode plates.

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