Mask assembly
By employing releasable and engageable mounting hardware and a gap design in the mask assembly, the problem of mask assembly contamination is solved, achieving higher cleanliness and stability, and enhancing the cleanliness and replaceability of the pattern forming apparatus.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ASML NETHERLANDS BV
- Filing Date
- 2015-11-16
- Publication Date
- 2026-06-16
AI Technical Summary
Existing mask components are susceptible to particulate contamination during photolithography processes, and it is difficult to effectively avoid contaminant generation caused by friction between the pattern forming device and the mask frame.
The design employs a releasable and attachable mounting bracket, allowing a gap between the film frame and the pattern forming device, and enabling a motion connection through elastic components and locking members, reducing friction and contaminant generation while providing a gas flow path to clean the surface.
It effectively reduces the risk of contamination of mask components, improves the cleanliness and replaceability of mask components, reduces the possibility of particulate contamination, and enhances the cleanliness and stability of the pattern forming apparatus.
Smart Images
Figure CN115840333B_ABST