Ion beam forming module for flat glass and ion implantation system and method

By combining multiple ion source devices and magnetic field treatment, a parallel ribbon ion beam with extremely high effective height is formed, which solves the problems of ion concentration and uniformity in large-area flat glass substrates, realizes efficient and uniform ion implantation, and supports the development of the ultra-large area flat panel display industry.

CN116344302BActive Publication Date: 2026-02-06芯嵛半导体(上海)有限公司
2 Cites 0 Cited by

Patent Information

Application Number
CN202310375247.0
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-04-10
Publication Date
2026-02-06
Estimated Expiration
2043-04-10

AI Technical Summary

Technical Problem

Existing ion implantation machines cannot meet the ion concentration and uniformity requirements of large-area flat glass substrates, especially glass substrates of generation 8.5 and above, resulting in the inability to achieve efficient and uniform ion implantation.

Method used

An ion beam forming module was designed, comprising an ion source combination unit, an ion beam mass and charge ratio analysis magnetic field unit, an extension magnet combination unit, and a collimation magnet combination unit. Through the combination of multiple ion source devices and magnetic field deflection, extension, and collimation processing, a parallel strip-shaped ion beam with extremely high effective height is formed to meet the ion implantation requirements of large-area glass substrates.

Benefits of technology

It has achieved high-dose and uniform ion implantation on large-area flat glass substrates, providing reliable technical support, laying a technical foundation for the development of the ultra-large area flat panel display industry, and improving production efficiency and product yield.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The application provides an ion beam forming module for flat glass, an ion implantation system and a method, wherein the ion beam forming module for flat glass comprises ion source combination units, ion beam mass and charge ratio analysis magnetic field units, expansion magnet combination units and collimating magnet combination units which are sequentially connected; the ion source combination units comprise a plurality of ion source devices arranged side by side, and the input end of the ion source device is connected with an energy supply and material supply device; the expansion magnet combination units comprise a plurality of groups of expansion magnets, and the position of each group of expansion magnets corresponds to the two sides of the ion beam generated by one ion source device; the collimating magnet combination units are located at the intersection of a plurality of ion beams generated by the plurality of ion source devices after deflection by the ion beam mass and charge ratio analysis magnetic field units. The parallel strip-shaped ion beam obtained by the scheme has a very high effective height, and the beam width of the ion beam is small, the ion density is high and the uniformity is good.
Need to check novelty before this filing date? Find Prior Art