A zirconia ceramic surface strongly bonded molybdenum disulfide-based coating and a preparation method and application thereof

Abstract

The application discloses a zirconia ceramic surface strong bonding force molybdenum disulfide-based coating and a preparation method and application thereof, and the coating is composed of a substrate surface modification layer, a Cr adhesive layer, a hard gradient transition layer and a molybdenum disulfide-based target layer, wherein the modification layer is formed by high-energy chromium ion implantation, and the hard gradient transition layer is composed of a chromium-doped amorphous carbon layer, a chromium and molybdenum co-doped amorphous carbon layer, a molybdenum-doped amorphous carbon layer and a molybdenum disulfide layer, that is, transition from the Cr metal layer to the MoS2, and the component detailed change is Cr / a-C, Cr / Mo / a-C, Mo / a-C, MoS2 / a-C and MoS2.The application can enhance the film-substrate bonding strength of the zirconia and the molybdenum disulfide-based coating, effectively improve the tribological performance of the zirconia ceramic, and provides technical support for realizing high performance and long service life of the zirconia friction pair.

Description

Technical Field

[0001] This invention belongs to the field of coating materials technology, specifically relating to a molybdenum disulfide-based coating with strong adhesion to zirconia ceramic surfaces, its preparation method, and its application. Background Technology

[0002] Zirconia (ZrO2) ceramics possess high hardness, high wear resistance, high temperature resistance, and corrosion resistance, and have been successfully applied in aerospace, biomedicine, and electronic information fields. However, the frictional stability of self-paired zirconia pairs still needs improvement. In atmospheric and vacuum environments, its sliding friction and dry friction coefficient gradually increase over time, directly affecting the performance and reliable service life of its friction pairs, failing to meet the long-life service requirements of high-end equipment under harsh operating conditions. Currently, research on zirconia ceramics mainly focuses on improving its mechanical properties, while research on enhancing its tribological stability is relatively limited.

[0003] Solid lubricant coatings are an effective method to improve the tribological properties of contact surfaces. Molybdenum disulfide-based coatings are a typical example of solid lubricant coatings, widely used in aerospace lubrication due to their stable ultra-low coefficient of friction (below 0.01) in vacuum or high vacuum environments. However, due to the good chemical inertness of zirconia ceramic surfaces, it is difficult for them to form strong chemical bonds with coating materials, resulting in poor bonding strength between the ceramic and molybdenum disulfide coatings. Consequently, they are prone to peeling and failure during reciprocating friction.

[0004] It is evident that the weak bonding strength between zirconia ceramics and molybdenum disulfide coatings is a key bottleneck restricting their application in harsh lubrication conditions. Therefore, enhancing the film-substrate adhesion between the inert surface of zirconia ceramics and molybdenum disulfide is of great significance for further expanding their application in high-end equipment. Summary of the Invention

[0005] In order to overcome the shortcomings of the prior art, the present invention aims to provide a molybdenum disulfide-based coating with strong adhesion to the surface of zirconia ceramics, its preparation method and application, so as to solve the technical problem of weak bonding strength between zirconia ceramics and molybdenum disulfide coating, thereby effectively improving the tribological properties of zirconia ceramics.

[0006] To achieve the above objectives, the present invention employs the following technical solution:

[0007] This invention discloses a design and preparation method of a molybdenum disulfide-based coating with strong adhesion to the surface of zirconia ceramics. The coating is a composite system consisting of a modified layer, a Cr bonding layer, a hard gradient transition layer, and a molybdenum disulfide-based target layer; wherein:

[0008] The modified layer is formed by implanting chromium metal ions into the zirconium oxide surface;

[0009] The hard transition layer consists of a chromium-doped amorphous carbon layer, a chromium and molybdenum co-doped amorphous carbon layer, a molybdenum-doped amorphous carbon layer, and a molybdenum disulfide layer.

[0010] Molybdenum disulfide-based target layers include pure molybdenum disulfide coatings, and molybdenum disulfide coatings doped with metals or compounds.

[0011] Preferably, the total thickness of the strong-adhesion molybdenum disulfide-based coating on the zirconia ceramic surface is 1.0 μm to 4.5 μm.

[0012] This invention also discloses a method for preparing the above-mentioned molybdenum disulfide-based coating with strong adhesion to the surface of zirconia ceramics, comprising the following steps:

[0013] 1) The substrate surface is subjected to grinding, polishing, ultrasonic cleaning, and drying in sequence;

[0014] 2) Inject chromium metal ions into the surface of the dried substrate;

[0015] 3) Vacuum argon ion (Ar) ion treatment on the chromium ion implanted surface. + Etching;

[0016] 4) In Ar + A Cr bonding layer is deposited on the etched substrate surface;

[0017] 5) Deposit a hard gradient transition layer on the surface of the Cr bonding layer;

[0018] 6) Deposit a molybdenum disulfide-based target layer on the surface of the hard gradient transition layer.

[0019] Preferably, in step 1), the zirconium oxide substrate is polished to a roughness (Ra) of less than 0.1 μm.

[0020] Preferably, in step 2), chromium metal ion implantation is performed on the polished surface. The main process parameters are: implantation voltage of 30kV to 50kV, and implantation dose of 10 kJ / L. 17 ~10 18 ions / cm 2 .

[0021] Preferably, in step 3), the chromium ion implantation surface is subjected to vacuum argon ion (Ar) ion treatment. + Etching, the main process parameters are: substrate bias voltage of -600V to -750V, sample stage speed of 6rpm to 12rpm, and etching time of 10min to 20min.

[0022] Preferably, in step 5), a hard gradient transition layer is deposited on the surface of the Cr binder layer using a multi-target unbalanced magnetron sputtering system. The specific steps and process parameters are as follows:

[0023] 1) Set the chromium target current to 2.0A~3.5A and maintain it for 5min~15min.

[0024] 2) The chromium target current decreased linearly from 2.0A to 3.5A to 0A, while the Mo target current increased linearly from 0A to 0.3A to 0.6A and the graphite target current increased linearly from 0A to 2.0A to 3.5A. The change time of each target current was 10min to 30min.

[0025] 3) The target currents for the molybdenum target and the graphite target are maintained at 0.3A~0.6A and 2.0A~3.5A, respectively, for a duration of 5min~15min;

[0026] 4) The target currents of the molybdenum target and the graphite target decrease linearly to 0A, while the target current of the molybdenum disulfide target increases linearly from 0A to 0.6-1.0A. The change time of each target current is 5 min to 15 min.

[0027] Preferably, in steps 1) to 4), the bias voltage is -60V to -100V, the sample rotation speed is 6rpm to 12rpm, and the thickness of the hard gradient transition layer is 150nm to 500nm.

[0028] Preferably, in step 6), a molybdenum disulfide-based coating is deposited on the surface of the hard transition layer using a multi-target unbalanced magnetron sputtering system, and the thickness of the target layer is 0.5 μm to 3.5 μm.

[0029] Preferably, the matrix is ​​a zirconia-based ceramic.

[0030] Compared with the prior art, the present invention has the following beneficial effects:

[0031] The molybdenum disulfide-based coating with strong adhesion to zirconia ceramic surfaces disclosed in this invention comprises a substrate surface modification layer, a Cr bonding layer, a hard gradient transition layer, and a molybdenum disulfide-based target layer. The modification layer is formed by high-energy chromium ion implantation. The hard gradient transition layer consists of a chromium-doped amorphous carbon layer, a chromium and molybdenum co-doped amorphous carbon layer, a molybdenum-doped amorphous carbon layer, and a molybdenum disulfide layer, transitioning from a Cr metal layer to MoS2. The detailed compositional variations are Cr / aC, Cr / Mo / aC, Mo / aC, MoS2 / aC, and MoS2. Specific advantages include:

[0032] 1) Combining high-energy ion implantation technology with multi-target non-equilibrium magnetron sputtering technology, high-energy chromium ion implantation is performed on the zirconium oxide surface to reduce the chemical inertness of the coating surface, making it easy to form a metallurgical bond with the Cr bonding layer deposited by magnetron sputtering, with no obvious interface, significantly improving the film-substrate bonding strength between the zirconium oxide substrate and the coating.

[0033] 2) Studies have shown that the mechanical properties of the coating transition layer have a significant impact on the coating adhesion and load-bearing capacity. This invention designs a hard transition layer with high hardness, that is, introduces amorphous carbon, chromium and molybdenum carbide hard phases. Moreover, the composition of the hard transition layer is gradient-change, avoiding the generation of interfaces with abrupt changes in composition and physicochemical properties, which helps to improve the coating adhesion and load-bearing capacity.

[0034] 3) The present invention prepares a molybdenum disulfide-based coating with high bonding strength on the surface of zirconia ceramics, which can significantly improve the tribological properties of the substrate surface, exhibit a stable low coefficient of friction, and effectively improve the frictional stability of zirconia ceramics. Attached Figure Description

[0035] Figure 1 This is a schematic diagram of the molybdenum disulfide-based coating structure with strong adhesion to the surface of zirconia ceramics disclosed in this invention.

[0036] Figure 2 Schematic diagram of the target installation of the four-target unbalanced magnetron sputtering system prepared with coatings of Example 1, Example 2 and Comparative Example 1;

[0037] Figure 3 This is a schematic diagram of the target installation in the six-target unbalanced magnetron sputtering system prepared with the coatings of Examples 3 and 4.

[0038] Figure 4 Comparison of membrane-substrate bonding strength between Example 1 and Comparative Example 1 of the present invention. Detailed Implementation

[0039] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0040] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0041] The present invention will now be described in further detail with reference to the accompanying drawings:

[0042] Example 1

[0043] A method for preparing a highly adhesive MoS2 lubricating coating on a yttrium oxide-stabilized zirconia ceramic surface includes the following steps:

[0044] 1) Surface treatment of yttrium oxide stabilized zirconia substrate

[0045] The substrate surface was ground and polished until its roughness was less than 0.1 μm; then, it was ultrasonically cleaned with acetone and anhydrous ethanol solution for 15 min each, and the substrate surface was dried with dry nitrogen gas.

[0046] 2) Cr ion implantation

[0047] A metal vapor vacuum arc ion implantation system was used, with a high-purity Cr metal target installed and an accelerating voltage of 35 kV applied, to implant ions into the polished surface of a zirconia substrate. The implantation dose was 2 × 10⁻⁶. 17 ions / cm 2 .

[0048] 3) Argon ion etching

[0049] The ion-implanted zirconia substrate was mounted on the fixture of a four-target unbalanced magnetron sputtering system, and the vacuum was evacuated to below 1 × 10⁻⁶. -4 At Pa, the bias voltage was set to -650V, and argon ion etching was performed on the ion-implanted surface of the zirconia substrate for 1500s.

[0050] 4) Preparation of Cr bonding layer

[0051] A chromium metal binder layer was deposited on the etched surface of a zirconia substrate using a high-purity chromium metal target installed in a four-target unbalanced magnetron sputtering system. The process parameters were: chromium target current 3.0 A, Ar gas flow rate 15 sccm, bias voltage -100 V, sample rotation speed 10 rpm, and deposition time 600 s.

[0052] 5) Preparation of hard gradient transition layer (Cr→Cr / aC→Cr / Mo / aC→Mo / aC→MoS2)

[0053] A hard gradient transition layer Cr→Cr / aC→Mo / aC→MoS2 was prepared by controlling the target current of each target using a four-target unbalanced magnetron sputtering system equipped with high-purity chromium, graphite, molybdenum, and molybdenum disulfide targets. The process flow is as follows: First, the chromium target current is linearly reduced from 3.0 A to 0 A, while the Mo target current is linearly increased from 0 A to 0.4 A and the graphite target current is linearly increased from 0 A to 3.0 A; second, the molybdenum and graphite target currents are kept constant for 300 s; then, the molybdenum and graphite target currents are linearly reduced to 0 A, while the molybdenum disulfide target current is linearly increased from 0 A to 0.8 A; the change time for each target current is 300 s.

[0054] 6) Preparation of MoS2 layer

[0055] A MoS2 layer was deposited on the transition layer surface using a high-purity molybdenum disulfide target installed in a four-target unbalanced magnetron sputtering system. The process parameters were: molybdenum disulfide target current of 0.8 A and bias voltage of -60 V.

[0056] Example 2

[0057] A method for preparing a highly adhesive MoS2-based lubricating coating on a yttrium oxide-stabilized zirconia ceramic surface includes the following steps:

[0058] 1) Surface treatment of yttrium oxide stabilized zirconia substrate

[0059] The substrate surface was ground and polished until its roughness was less than 0.1 μm; then, it was ultrasonically cleaned with acetone and anhydrous ethanol solution for 15 min in sequence, and the substrate surface was dried with dry nitrogen gas.

[0060] 2) Cr ion implantation

[0061] A metal vapor vacuum arc ion implantation system was used, with a high-purity Cr metal target installed and an accelerating voltage of 35 kV applied, to implant ions into the polished surface of a zirconia substrate. The implantation dose was 4 × 10⁻⁶. 17 ions / cm 2 .

[0062] 3) Argon ion etching

[0063] The ion-implanted zirconia substrate was mounted on the fixture of a four-target unbalanced magnetron sputtering system, and the vacuum was evacuated to below 1 × 10⁻⁶. -4 At Pa, the bias voltage was set to -600V, and argon ion etching was performed on the ion-implanted surface of the zirconia substrate for 1500s.

[0064] 4) Preparation of Cr bonding layer

[0065] A chromium metal binder layer was deposited on the etched surface of a zirconia substrate using a high-purity chromium metal target installed in a four-target unbalanced magnetron sputtering system. The process parameters were: chromium target current 3.0 A, Ar gas flow rate 15 sccm, bias voltage -100 V, sample rotation speed 10 rpm, and deposition time 600 s.

[0066] 5) Preparation of hard gradient transition layer (Cr→Cr / aC→Cr / Mo / aC→Mo / aC→MoS2)

[0067] A hard gradient transition layer Cr→Cr / aC→Mo / aC→MoS2 was prepared by controlling the target current of each target using a four-target unbalanced magnetron sputtering system equipped with high-purity chromium, graphite, molybdenum, and molybdenum disulfide targets. The process flow is as follows: First, the chromium target current is linearly reduced from 3.0 A to 0 A, while the Mo target current is linearly increased from 0 A to 0.4 A and the graphite target current is linearly increased from 0 A to 3.0 A; second, the molybdenum and graphite target currents are kept constant for 300 s; then, the molybdenum and graphite target currents are linearly reduced to 0 A, while the molybdenum disulfide target current is linearly increased from 0 A to 0.8 A; the change time for each target current is 300 s.

[0068] 6) Preparation of Cr-doped MoS2 layer

[0069] A Ti-doped MoS2 target layer was deposited on the surface of a hard gradient transition layer using a high-purity molybdenum disulfide target mounted in a four-target unbalanced magnetron sputtering system. The process parameters were: Cr target sputtering current of 0.3 A, molybdenum disulfide target current of 0.8 A, bias voltage of -70 V, and sample stage rotation speed of 10 rpm.

[0070] Example 3

[0071] A method for preparing a highly adhesive MoS2-based lubricating coating on a yttrium oxide-stabilized zirconia ceramic surface includes the following steps:

[0072] 1) Surface treatment of yttrium oxide stabilized zirconia substrate

[0073] The substrate surface was ground and polished until its roughness was less than 0.1 μm; then, it was ultrasonically cleaned with acetone and anhydrous ethanol solution for 15 min each, and the substrate surface was dried with dry nitrogen gas.

[0074] 2) Cr ion implantation

[0075] A metal vapor vacuum arc ion implantation system was used, with a high-purity Cr metal target installed and an accelerating voltage of 40 kV applied, to implant ions into the polished surface of a zirconia substrate. The implantation dose was 5 × 10⁻⁶. 17 ions / cm 2 .

[0076] 3) Argon ion etching

[0077] The ion-implanted zirconia substrate was mounted on the fixture of a four-target unbalanced magnetron sputtering system, and the vacuum was evacuated to below 1 × 10⁻⁶. -4 At Pa, the bias voltage was set to -700V, and argon ion etching was performed on the ion-implanted surface of the zirconia substrate for 1500s.

[0078] 4) Preparation of Cr bonding layer

[0079] A chromium metal binder layer was deposited on the etched surface of a zirconia substrate using a high-purity chromium metal target mounted in a six-target unbalanced magnetron sputtering system. The process parameters were: chromium target current 3.0 A, Ar gas flow rate 15 sccm, bias voltage -100 V, sample rotation speed 10 rpm, and deposition time 600 s.

[0080] 5) Preparation of hard gradient transition layer (Cr→Cr / aC→Cr / Mo / aC→Mo / aC→MoS2)

[0081] A hard gradient transition layer Cr→Cr / aC→Mo / aC→MoS2 was prepared by controlling the target current of each target using a six-target unbalanced magnetron sputtering system equipped with high-purity chromium, graphite, molybdenum, and molybdenum disulfide targets. The process flow is as follows: First, the chromium target current is linearly reduced from 3.0 A to 0 A, while the Mo target current is linearly increased from 0 A to 0.4 A and the graphite target current is linearly increased from 0 A to 3.0 A; second, the molybdenum and graphite target currents are kept constant for 300 s; then, the molybdenum and graphite target currents are linearly reduced to 0 A, while the molybdenum disulfide target current is linearly increased from 0 A to 0.8 A; the change time for each target current is 300 s.

[0082] 6) Preparation of Ti / MoS2 layer

[0083] A Ti / MoS2 target layer was co-sputtered onto the transition layer surface using a high-purity titanium metal target and a molybdenum disulfide target mounted in a six-target unbalanced magnetron sputtering system. The process parameters were: titanium metal target current of 0.3 A, molybdenum disulfide target current of 0.8 A, bias voltage of -70 V, and sample stage rotation speed of 10 rpm.

[0084] Example 4

[0085] A method for preparing a highly adhesive MoS2-based lubricating coating on a yttrium oxide-stabilized zirconia ceramic surface includes the following steps:

[0086] 1) Surface treatment of yttrium oxide stabilized zirconia substrate

[0087] The substrate surface was ground and polished until its roughness was less than 0.1 μm; then, it was ultrasonically cleaned with acetone and anhydrous ethanol solution for 15 min each, and the substrate surface was dried with dry nitrogen gas.

[0088] 2) Cr ion implantation

[0089] A metal vapor vacuum arc ion implantation system was used, with a high-purity Cr metal target installed and an accelerating voltage of 35 kV applied, to implant ions into the polished surface of a zirconia substrate. The implantation dose was 7.5 × 10⁻⁶. 17 ions / cm 2 .

[0090] 3) Argon ion etching

[0091] The ion-implanted zirconia substrate was mounted on the fixture of a four-target unbalanced magnetron sputtering system, and the vacuum was evacuated to below 1 × 10⁻⁶. -4 At Pa, the bias voltage was set to -700V, and argon ion etching was performed on the ion-implanted surface of the zirconia substrate for 1500s.

[0092] 4) Preparation of Cr bonding layer

[0093] A chromium metal binder layer was deposited on the etched surface of a zirconia substrate using a high-purity chromium metal target mounted in a six-target unbalanced magnetron sputtering system. The process parameters were: chromium target current 3.0 A, Ar gas flow rate 15 sccm, bias voltage -100 V, sample rotation speed 10 rpm, and deposition time 600 s.

[0094] 5) Preparation of hard gradient transition layer (Cr→Cr / aC→Cr / Mo / aC→Mo / aC→MoS2)

[0095] A hard gradient transition layer Cr→Cr / aC→Mo / aC→MoS2 was prepared by controlling the target current of each target using a six-target unbalanced magnetron sputtering system equipped with high-purity chromium, graphite, molybdenum, and molybdenum disulfide targets. The process flow is as follows: First, the chromium target current is linearly reduced from 3.0 A to 0 A, while the Mo target current is linearly increased from 0 A to 0.4 A and the graphite target current is linearly increased from 0 A to 3.0 A; second, the molybdenum and graphite target currents are kept constant for 300 s; then, the molybdenum and graphite target currents are linearly reduced to 0 A, while the molybdenum disulfide target current is linearly increased from 0 A to 0.8 A; the change time for each target current is 300 s.

[0096] 6) Preparation of Ti / Pb / MoS2 layer

[0097] A Ti / Pb / MoS2 target layer was co-sputtered onto the transition layer surface using high-purity titanium, lead, and molybdenum disulfide targets installed in a six-target unbalanced magnetron sputtering system. The process parameters were: titanium target current 0.15A, lead target current 0.15A, molybdenum disulfide target current 0.8A, and bias voltage -100V.

[0098] Comparative Example 1

[0099] A method for preparing a conventional MoS2 lubricating coating on a yttrium oxide-stabilized zirconia ceramic surface includes the following steps:

[0100] 1) Surface treatment of yttrium oxide stabilized zirconia substrate

[0101] The substrate surface was ground and polished until its roughness was less than 0.1 μm; then, it was ultrasonically cleaned with acetone and anhydrous ethanol solution for 15 min each, and the substrate surface was dried with dry nitrogen gas.

[0102] 2) Argon ion etching

[0103] The dried zirconia substrate was mounted on the fixture of a four-target unbalanced magnetron sputtering system, and the vacuum was evacuated to below 1 × 10⁻⁶. -4 At Pa, the bias voltage was set to -650V, and argon ion etching was performed on the ion-implanted surface of the zirconia substrate for 1500s.

[0104] 3) Preparation of Cr bonding layer

[0105] A chromium metal binder layer was deposited on the etched surface of a zirconia substrate using a high-purity chromium metal target installed in a four-target unbalanced magnetron sputtering system. The process parameters were: chromium target current 3.0 A, Ar gas flow rate 15 sccm, bias voltage -100 V, sample rotation speed 10 rpm, and deposition time 600 s.

[0106] 4) Preparation of gradient transition layer (Cr→Cr / MoS2→MoS2)

[0107] A gradient transition layer Cr→Cr / MoS2→MoS2 was prepared using a four-target unbalanced magnetron sputtering system with high-purity chromium and molybdenum disulfide targets. The process flow was as follows: the chromium target current was linearly reduced from 3.0 A to 0 A, while the molybdenum disulfide target current was linearly increased from 0 A to 0.8 A, with the change time for each target current being 300 s.

[0108] 5) Preparation of MoS2 layer

[0109] A MoS2 layer was deposited on the surface of a gradient transition layer (Cr→Cr / MoS2→MoS2) using a high-purity molybdenum disulfide target installed in a four-target unbalanced magnetron sputtering system. The process parameters were: molybdenum disulfide target current of 0.8 A and bias voltage of -60 V.

[0110] Figure 1 This diagram shows the structure of the molybdenum disulfide-based coating with strong adhesion to the zirconia ceramic surface according to the present invention. Figure 2 The relative positions of the targets installed in the four-target unbalanced magnetron sputtering system used in Examples 1, 2, and 1 are shown. Figure 3 The relative positions of the targets installed in the six-target unbalanced magnetron sputtering system used in Examples 3 and 4 are shown.

[0111] like Figure 4 As shown, the adhesion strength of the coatings in Example 1 and Comparative Example 1 is compared. Using the same scratch test and parameters, the results show that the average adhesion strength of Example 1 is more than 63.6% higher than that of Comparative Example 1, indicating that the molybdenum disulfide coating prepared in the examples has significantly better adhesion strength to the zirconium oxide substrate.

[0112] In summary, the method disclosed in this invention utilizes a combination of a high-energy ion implantation system and a multi-target magnetron sputtering system for fabrication. The process sequentially includes polishing a zirconia ceramic substrate, chromium ion implantation, deposition of a chromium metal bonding layer and a hard gradient transition layer (Cr→Cr / aC→Cr / Mo / aC→Mo / aC→MoS2) on the substrate surface, and deposition of a molybdenum disulfide-based coating on the transition layer surface. This composite molybdenum disulfide-based coating exhibits higher bonding strength with the zirconia ceramic substrate.

[0113] The above content is only for illustrating the technical concept of the present invention and should not be construed as limiting the scope of protection of the present invention. Any modifications made to the technical solution based on the technical concept proposed in this invention shall fall within the scope of protection of the claims of this invention.

Claims

1. A zirconia ceramic surface strongly bonded molybdenum disulfide-based coating, characterized in that, The coating is a composite coating consisting of a modified layer, a chromium metal binder layer, a hard gradient transition layer, and a molybdenum disulfide-based target layer sequentially disposed on the surface of zirconia ceramic; wherein: The modified layer is formed by implanting chromium metal ions into the zirconium oxide surface; The hard gradient transition layer consists of a chromium-doped amorphous carbon layer, a chromium and molybdenum co-doped amorphous carbon layer, a molybdenum-doped amorphous carbon layer, and a molybdenum disulfide layer, that is, a transition from a Cr metal layer to MoS2, with detailed changes in composition of Cr, Cr / aC, Cr / Mo / aC, Mo / aC, and MoS2. The molybdenum disulfide-based target layer is a pure molybdenum disulfide coating, a molybdenum disulfide coating doped with metal or a compound.

2. The zirconia ceramic surface strong bond molybdenum disulfide-based coating of claim 1, wherein, The total thickness of the coating ranges from 1.0 μm to 4.5 μm.

3. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 1 or 2, characterized in that, Includes the following steps: 1) The surface of the zirconia ceramic substrate is subjected to grinding, polishing, ultrasonic cleaning, and drying in sequence; 2) Inject chromium metal ions into the dried zirconia ceramic surface; 3) Vacuum argon ion Ar sputtering of the surface to implant chromium metal ions + etching; 4) in Ar + The substrate surface after etching is deposited with a Cr adhesive layer; 5) Deposit a hard gradient transition layer on the surface of the Cr bonding layer; 6) Deposit a molybdenum disulfide-based target layer on the surface of the hard gradient transition layer to complete the coating preparation.

4. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 3, characterized in that, In step 1), the zirconia ceramic substrate is polished until the roughness Ra is less than 0.1 μm.

5. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 3, characterized in that, In step 2), the process parameters for implanting chromium metal ions are: implantation voltage of 30 kV~50 kV, implantation dose of 10 17 ~10 18 ions / cm 2 .

6. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 3, characterized in that, In step 3), the chromium ion implantation surface is subjected to vacuum argon ionization (Ar). + The etching process parameters are as follows: substrate bias voltage is -600 V to -750 V, stage rotation speed is 6 rpm to 12 rpm, and etching time is 15 min to 30 min.

7. The method for preparing a molybdenum disulfide-based coating with strong adhesion to the surface of zirconia ceramics according to claim 3, characterized in that, In step 5), a hard gradient transition layer is deposited on the surface of the Cr binder layer using a multi-target unbalanced magnetron sputtering system, including the following steps: S1: Set the chromium target current to 2.0 A~3.5 A and maintain it for 5 min~30 min. S2: The chromium target current linearly decreases from 2.0 A to 3.5 A to 0 A, while the Mo target current linearly increases from 0 A to 0.3 A to 0.6 A and the graphite target current linearly increases from 0 A to 2.0 A to 3.5 A. The change time of each target current is 5 min to 15 min. S3: The target currents for the molybdenum target and the graphite target are maintained at 0.3 A~0.6 A and 2.0 A~3.5 A, respectively, for a duration of 5 min~15 min; S4: The target currents of the molybdenum target and the graphite target decrease linearly to 0 A, while the target current of the molybdenum disulfide target increases linearly from 0 A to 0.6~1.0 A, with the target current change time being 5 min~15 min.

8. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 7, characterized in that, In S1 to S4, the bias voltage is -60 V to -100 V, the sample rotation speed is 6 rpm to 12 rpm, and the thickness of the hard gradient transition layer is 150 nm to 500 nm.

9. The method of producing a zirconia ceramic surface strongly bonded molybdenum disulfide-based coating according to claim 1, characterized in that, In step 6), a molybdenum disulfide-based coating is deposited on the surface of the hard transition layer using a multi-target unbalanced magnetron sputtering system. The thickness of the molybdenum disulfide-based target layer is 0.5 μm to 3.5 μm.

10. The application of the molybdenum disulfide-based coating with strong adhesion to zirconia ceramic surfaces as described in claim 1 or 2 in the field of high-end aerospace equipment.

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