Coated glass, laminated glass and vehicles

Abstract

The present application relates to a kind of coated glass, laminated glass and vehicle.The above-mentioned coated glass includes: first glass substrate and the coating layer being arranged on at least one surface of first glass substrate, coating layer includes sequentially stacked first transparent conductive oxide layer, first low refractive index layer, intermediate dielectric layer, second low refractive index layer, second transparent conductive oxide layer and third low refractive index layer;Wherein, first transparent conductive oxide layer is closer to first glass substrate than third low refractive index layer, the refractive index of first transparent conductive oxide layer is greater than the refractive index of first low refractive index layer, the refractive index of second transparent conductive oxide layer is greater than the refractive index of third low refractive index layer, the refractive index of intermediate dielectric layer is greater than the refractive index of first low refractive index layer and second low refractive index layer.The above-mentioned coated glass has low emissivity, low visible light reflectance and color neutral, can be used in automobile glass.

Description

Technical Field

[0001] This invention relates to the field of glass, and in particular to a coated glass, laminated glass, and vehicles. Background Technology

[0002] Currently, automotive glass heat insulation technology is receiving increasing attention. By coating one or more thin films onto the windshield, it reflects external heat, effectively preventing heat from entering the vehicle (in summer) or causing heat loss from the interior (in winter). Panoramic sunroofs, in particular, are prone to heat radiation and conduction from the interior to the outside in winter due to their large surface area, resulting in poor insulation. Therefore, a heat-insulating coating is especially necessary on the sunroof, particularly on the side closest to the interior, to reduce heat loss and provide some insulation.

[0003] Currently, a common manufacturing process involves depositing a transparent conductive oxide layer (TCO layer) onto the glass surface. For example, chemical vapor deposition (CVD) can be used to deposit a fluorine-doped tin oxide (FTO) coating onto float glass, serving as the inner substrate of the sunroof glass, with the FTO layer located at the interface between the glass and the vehicle's interior air. To achieve a low emissivity, the thickness of the TCO layer is typically maximized. However, as the thickness of the TCO layer increases, its visible light reflectivity also increases, and optical properties such as color change, even deviating from neutral hues. For automotive glass, high reflectivity and a darker color can lead to passenger discomfort and negatively impact the vehicle's aesthetics. Summary of the Invention

[0004] Based on this, some embodiments of the present invention provide a coated glass that is applied in laminated glass, enabling the laminated glass to have low emissivity, low visible light reflectivity and neutral color.

[0005] Furthermore, some embodiments of the present invention also provide a laminated glass comprising the above-described coated glass and a vehicle.

[0006] A coated glass includes: a first glass substrate and a coating layer disposed on at least one surface of the first glass substrate, the coating layer comprising a first transparent conductive oxide layer, a first low refractive index layer, an intermediate dielectric layer, a second low refractive index layer, a second transparent conductive oxide layer and a third low refractive index layer stacked sequentially.

[0007] Wherein, the first transparent conductive oxide layer is closer to the first glass substrate than the third low refractive index layer, the refractive index of the first transparent conductive oxide layer is greater than the refractive index of the first low refractive index layer, the refractive index of the second transparent conductive oxide layer is greater than the refractive indices of the second low refractive index layer and the third low refractive index layer, and the refractive index of the intermediate dielectric layer is greater than the refractive indices of the first low refractive index layer and the second low refractive index layer.

[0008] In some embodiments, the visible light reflectance RL of the coated glass is less than or equal to 7%.

[0009] In some embodiments, the emissivity of the coated glass is less than or equal to 0.2.

[0010] In some embodiments, the reflected color of the surface of the coated glass having the coating layer has a color component L value of 0~30, a value of -6~3, and a value of -17~0 in the Lab color space.

[0011] In some embodiments, the total thickness of the coating layer is less than or equal to 300 nm.

[0012] In some embodiments, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first transparent conductive oxide layer and the second transparent conductive oxide layer is less than 50 nm.

[0013] In some embodiments, the thickness of at least one of the first low-refractive-index layer or the second low-refractive-index layer is greater than the thickness of the intermediate dielectric layer, or the thickness of the intermediate dielectric layer is greater than the thickness of both the first low-refractive-index layer and the second low-refractive-index layer.

[0014] In some embodiments, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first transparent conductive oxide layer and the second transparent conductive oxide layer is greater than or equal to 50 nm.

[0015] In some embodiments, the thickness of the intermediate dielectric layer is greater than or equal to the thickness of the first low-refractive-index layer and / or the thickness of the intermediate dielectric layer is greater than or equal to the thickness of the second low-refractive-index layer.

[0016] In some embodiments, the first transparent conductive oxide layer and the second transparent conductive oxide layer satisfy one or more of the following conditions:

[0017] (1) The first transparent conductive oxide layer and / or the second transparent conductive oxide layer are one or more of ITO film, ATO film, AZO film and FTO film;

[0018] (2) The refractive indices of the first transparent conductive oxide layer and the second transparent conductive oxide layer are each ≥1.7 independently;

[0019] (3) The thickness of the first transparent conductive oxide layer and the second transparent conductive oxide layer are each independently 30nm~120nm;

[0020] (4) The total thickness of the first transparent conductive oxide layer and the second transparent conductive oxide layer is 80nm~150nm.

[0021] In some embodiments, the first low-refractive-index layer, the second low-refractive-index layer, and the third low-refractive-index layer satisfy one or more of the following conditions:

[0022] (1) The refractive indices of the first low-refractive-index layer, the second low-refractive-index layer and the third low-refractive-index layer are each ≤1.7 independently;

[0023] (2) The materials of the first low refractive index layer, the second low refractive index layer and the third low refractive index layer each independently include an oxide of at least one element selected from Si, Al, B and Zr, or a fluoride containing at least one element selected from Mg, Al and Ba.

[0024] (3) The thickness of the first low-refractive-index layer is 3nm~50nm;

[0025] The thickness of the second low-refractive-index layer is 3nm~30nm;

[0026] The thickness of the third low-refractive-index layer is 30nm~150nm;

[0027] Optionally, the thickness of the first low-refractive-index layer is 5 nm to 35 nm;

[0028] The thickness of the second low-refractive-index layer is 5 nm to 20 nm;

[0029] The thickness of the third low-refractive-index layer is 50nm~100nm.

[0030] In some embodiments, the intermediate dielectric layer satisfies one or more of the following conditions:

[0031] (1) The refractive index of the intermediate medium layer is ≥1.7;

[0032] (2) The thickness of the intermediate dielectric layer is 5nm~80nm;

[0033] Optionally, the thickness of the intermediate dielectric layer is 10 nm to 50 nm.

[0034] In some embodiments, the intermediate dielectric layer is a single layer, and the material of the intermediate dielectric layer includes an oxide of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta, and Zr, or one or more nitrides and oxynitrides selected from Si, Zr, Al, and Ti; optionally, the material of the intermediate dielectric layer includes TiO2. x SiN x and ZnSnO x One or more of them; or,

[0035] The intermediate dielectric layer comprises a multilayer film consisting of alternating layers of high-refractive-index films and low-refractive-index films. The refractive index of the high-refractive-index film is greater than that of the low-refractive-index film. The refractive index of the high-refractive-index film is 1.7 to 2.5, and the refractive index of the low-refractive-index film is 1.4 to 1.7.

[0036] Optionally, the material of the high refractive index film includes an oxide of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta and Zr, or one or more of nitrides and oxynitrides selected from Si, Zr, Al and Ti. The material of the low refractive index film includes an oxide of at least one element selected from Si, Al and B, or a fluoride selected from Mg, Al and Ba.

[0037] In some embodiments, a barrier layer is further provided between the first transparent conductive oxide layer and the first glass substrate.

[0038] In some embodiments, the barrier layer satisfies one or more of the following conditions:

[0039] (1) The thickness of the barrier layer is ≥3nm;

[0040] (2) The material of the barrier layer includes one or more of the oxides, nitrides and oxynitrides of at least one element selected from Si, B, Zn, Sn, Ti, Si, Al, Nb, Zr, Ni, Mg, Cr and Ta;

[0041] Optionally, the material of the barrier layer includes one or more of the nitrides, oxides and oxynitrides of at least one element selected from Si, Al, Zr, B and Ti;

[0042] Optionally, the material of the barrier layer includes SiO2. x and SiN x One or more of them.

[0043] A laminated glass includes the above-described coated glass, an adhesive layer, and a second glass substrate, wherein the second glass substrate is disposed on the side surface of the first glass substrate away from the coated layer via the adhesive layer.

[0044] In some embodiments, the visible light transmittance of the first glass substrate and / or the second glass substrate is ≤50%; or,

[0045] The visible light transmittance of the first glass substrate and / or the second glass substrate is ≥70%.

[0046] In some embodiments, an infrared reflective film is also included, which is disposed between the coated glass and the adhesive layer, and / or between the second glass substrate and the adhesive layer.

[0047] In some embodiments, the visible light transmittance of the adhesive layer is ≤30%; or, the visible light transmittance of the adhesive layer is ≥70%.

[0048] In some embodiments, the laminated glass satisfies one or more of the following conditions:

[0049] (1) The visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤6%. Optionally, the visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤4%. Optionally, the visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤2%.

[0050] (2) The visible light transmittance of the laminated glass is ≤20%, and optionally, the visible light transmittance of the laminated glass is ≤10%;

[0051] Alternatively, the visible light transmittance of the laminated glass is ≥60%, and optionally, the visible light transmittance of the laminated glass is ≥70%.

[0052] (3) The color component a of the laminated glass is measured from inside the vehicle and the color component b is measured to be -6 to 3 and -15 to 0.

[0053] A vehicle comprising the aforementioned coated glass or laminated glass.

[0054] The aforementioned coated glass comprises two transparent conductive oxide layers. The first and second transparent conductive oxide layers reflect or absorb infrared radiation, reducing heat radiation emitted into the room and preventing heat radiation from the room to the outside, thus minimizing heat loss and providing a certain degree of insulation. By setting a first low-refractive-index layer, an intermediate dielectric layer, a second low-refractive-index layer, and a third low-refractive-index layer between the first and second transparent conductive oxide layers and on the surface of the second transparent conductive oxide layer, the coating can form multiple high / low refractive index anti-reflection stacked structures. This is beneficial for maintaining low emissivity while reducing visible light reflectivity and preserving a neutral color. Experiments have shown that, through optimization of the coating layers, the aforementioned coated glass, when applied in laminated glass, exhibits low emissivity, low visible light reflectivity, and a neutral color. Attached Figure Description

[0055] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0056] Figure 1 This is a schematic diagram of a structure of coated glass in some embodiments of the present invention;

[0057] Figure 2 This is a schematic diagram of a laminated glass structure in some embodiments of the present invention;

[0058] Explanation of the labels in the attached drawings:

[0059] Laminated glass 10, coated glass 100, first glass substrate 110, barrier layer 120, first transparent conductive oxide layer 130, first low refractive index layer 140, intermediate dielectric layer 150, second low refractive index layer 160, second transparent conductive oxide layer 170, third low refractive index layer 180, adhesive layer 200, and second glass substrate 300. Detailed Implementation

[0060] To facilitate understanding of the present invention, a more comprehensive description of the invention will be provided below in conjunction with specific embodiments. Preferred embodiments of the invention are given in the specific embodiments. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of the present invention.

[0061] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0062] Unless otherwise stated or in case of contradiction, the terms or phrases used in this invention shall have the following meanings:

[0063] In this invention, terms such as "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features.

[0064] In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0065] When a numerical range is disclosed in this invention, the range is considered continuous and includes the minimum and maximum values ​​of the range, as well as every value between the minimum and maximum values. Further, when the range refers to an integer, it includes every integer between the minimum and maximum values ​​of the range. Moreover, when multiple ranges are provided to describe a feature or characteristic, the ranges may be combined. In other words, unless otherwise specified, all ranges disclosed in this invention should be understood to include any and all subranges to which they are incorporated.

[0066] The names of the various film materials mentioned in this invention are not limited to their chemical formulas; they may refer to the main elemental components contained in each film layer, or abbreviations of the main components, such as "SiO2". x "It can be SiO2, "SiN" x "It can be Si3N4, TiO2" x "It can be TiO2, "ZnSnO" x "It can be ZnSnO4, etc., but this application does not limit it."

[0067] Please see Figure 1 The first aspect of the present invention provides a coated glass 100, comprising: a first glass substrate 110 and a coating layer disposed on at least one surface of the first glass substrate 110, the coating layer comprising a first transparent conductive oxide layer 130, a first low refractive index layer 140, an intermediate dielectric layer 150, a second low refractive index layer 160, a second transparent conductive oxide layer 170 and a third low refractive index layer 180 disposed sequentially.

[0068] In this configuration, the first transparent conductive oxide layer 130 is closer to the first glass substrate 110 than the third low-refractive-index layer 180. The refractive index of the first transparent conductive oxide layer 130 is greater than that of the first low-refractive-index layer 140, the refractive index of the second transparent conductive oxide layer 170 is greater than that of the second low-refractive-index layer 160 and the third low-refractive-index layer 180, and the refractive index of the intermediate dielectric layer 150 is greater than that of the first low-refractive-index layer 140 and the second low-refractive-index layer 160.

[0069] It is understood that in this article, the stacking arrangement only indicates the stacking order between the layers, but is not limited to the layers mentioned above. Other layers may also be stacked between the layers.

[0070] exist Figure 1 In this process, the first transparent conductive oxide layer 130 is closer to the surface of the first glass substrate 110 than the second transparent conductive oxide layer 170.

[0071] In some embodiments, the first transparent conductive oxide layer 130 and / or the second transparent conductive oxide layer 170 are one or more of ITO (indium tin oxide) film, ATO (antimony-doped tin oxide) film, AZO (aluminum-doped zinc oxide) film, and FTO (fluorine-doped tin oxide) film. Preferably, both the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 include an ITO film.

[0072] In some embodiments, the refractive indices of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 are each independently ≥1.7. Further, the refractive indices of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 range from 1.9 to 2.1. In some further embodiments, the refractive index of the first transparent conductive oxide layer 130 and / or the second transparent conductive oxide layer 170 is 2.0. Specifically, the refractive index of the first transparent conductive oxide layer 130 is greater than that of the first low-refractive-index layer 140, and the refractive index of the second transparent conductive oxide layer 170 is greater than that of the second low-refractive-index layer 160 and the third low-refractive-index layer 180. The first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 have high refractive indices and can serve as high-refractive-index stacks, forming a high / low refractive-index anti-reflection stack structure with the first low-refractive-index layer 140 and the third low-refractive-index layer 180. With proper film design, this can further reduce visible light reflectivity.

[0073] In some embodiments, the thickness of the first transparent conductive oxide layer 130 is 30 nm to 120 nm. For example, the thickness of the first transparent conductive oxide layer 130 may be, but is not limited to, 30 nm, 40 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, or any combination of these values. Optionally, the thickness of the first transparent conductive oxide layer 130 may be 30 nm to 100 nm, 30 nm to 80 nm, 40 nm to 120 nm, 40 nm to 100 nm, 40 nm to 80 nm, 50 nm to 120 nm, 50 nm to 100 nm, 50 nm to 80 nm, 50 nm to 70 nm, 55 nm to 120 nm, 55 nm to 100 nm, 55 nm to 80 nm, 55 nm to 70 nm, etc.

[0074] In some embodiments, the thickness of the second transparent conductive oxide layer 170 is 30 nm to 120 nm. For example, the thickness of the second transparent conductive oxide layer 170 may be, but is not limited to, 30 nm, 40 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, or any combination of these values. Optionally, the thickness of the second transparent conductive oxide layer 170 may be 30 nm to 100 nm, 30 nm to 80 nm, 40 nm to 120 nm, 40 nm to 100 nm, 40 nm to 80 nm, 50 nm to 120 nm, 50 nm to 100 nm, 50 nm to 80 nm, 50 nm to 70 nm, 55 nm to 120 nm, 55 nm to 100 nm, 55 nm to 80 nm, 55 nm to 70 nm, etc.

[0075] In some embodiments, the total thickness of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 is 80 nm to 150 nm. For example, the total thickness of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 may be, but is not limited to, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, or any combination of these values. Optionally, the total thickness of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 may be 80 nm to 140 nm, 80 nm to 135 nm, 90 nm to 150 nm, 90 nm to 140 nm, 90 nm to 135 nm, 100 nm to 150 nm, 100 nm to 140 nm, 100 nm to 135 nm, 110 nm to 150 nm, 110 nm to 140 nm, 110 nm to 135 nm, etc.

[0076] In some embodiments, the total thickness of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 is at least ≥80 nm. However, in order to obtain a low emissivity value for the glass, such as an emissivity value ≤0.3 or even ≤0.2, it is necessary to increase the thickness of the transparent conductive oxide layer as much as possible. However, as the thickness of the transparent conductive oxide layer increases, its visible light reflectivity also increases, and optical indicators such as color will also change, even deviating from neutral color. For automotive glass, high reflectivity and dark color can cause discomfort to passengers and affect the aesthetics of the vehicle, which is disadvantageous. In order to further reduce the reflectivity of glass coated with a low-emissivity film and adjust the color, in some embodiments of the present invention, the transparent conductive oxide layer is layered to form the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170. Under the premise that the total thickness of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 is not much different from the thickness of a single transparent conductive oxide layer structure, or even the total thickness is reduced, combined with the corresponding film design, it is possible to further reduce the emissivity and visible light reflectivity of the coated glass 100.

[0077] In some embodiments, the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 are formed on the surface of the first glass substrate 110 using PVD (physical vapor deposition) or CVD (chemical vapor deposition).

[0078] In the coated glass 100, the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 reflect or absorb infrared radiation, reducing heat radiation emitted from the glass into the room and preventing heat radiation from the room to the outside, thus reducing heat loss and providing a certain degree of insulation. Simultaneously, the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 have high visible light transmittance. During heat treatment, the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 undergo partial oxidation and crystallization. Their transparent conductive oxides possess high visible light transmittance, high refractive index, and relatively high carrier concentration and conductivity, further contributing to reduced emissivity.

[0079] In some embodiments, the first low-refractive-index layer 140 is located on the surface of the first transparent conductive oxide layer 130 away from the first glass substrate 110. The refractive index of the first low-refractive-index layer 140 is ≤1.7. Optionally, the refractive index of the first low-refractive-index layer 140 is 1.4 to 1.7. For example, the refractive index of the first low-refractive-index layer 140 may be, but is not limited to, 1.4, 1.5, 1.6, 1.7, or a range consisting of any two of these values.

[0080] Specifically, the material of the first low refractive index layer 140 includes an oxide of at least one element selected from Si, Al, B, and Zr, or a fluoride including at least one element selected from Mg, Al, and Ba. In one embodiment, the material of the first low refractive index layer 140 includes SiO2. x .

[0081] In some embodiments, the thickness of the first low-refractive-index layer 140 is 3 nm to 50 nm. Optionally, the thickness of the first low-refractive-index layer 140 may be, but is not limited to, 5 nm, 6 nm, 7 nm, 8 nm, 10 nm, 12 nm, 14 nm, 15 nm, 16 nm, 18 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 50 nm, or any combination of these values. Preferably, the thickness of the first low-refractive-index layer 140 is 5 nm to 35 nm.

[0082] The first low-refractive-index layer 140 can protect the first transparent conductive oxide layer 130 from incomplete oxidation during heat treatment, preventing localized or minor oxidation. This is beneficial for improving the conductivity and transmittance of the first transparent conductive oxide layer 130, while also providing some mechanical protection for the entire transparent conductive oxide layer. Furthermore, the first low-refractive-index layer 140 can form a high / low refractive index anti-reflection stack structure with the first transparent conductive oxide layer 130. With proper film design, this can further reduce visible light reflectivity.

[0083] In some embodiments, the refractive index of the intermediate dielectric layer 150 is ≥1.7. For example, the refractive index of the intermediate dielectric layer 150 may be, but is not limited to, 1.7, 1.8, 1.9, 2, 2.1, 2.2, 2.3, 2.4, 2.5, or a range of any two of these values. Preferably, the refractive index of the intermediate dielectric layer 150 is ≥2.0.

[0084] Specifically, in some embodiments, the intermediate dielectric layer 150 is a single-layer structure. The material of the intermediate dielectric layer 150 includes oxides of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta, and Zr, or one or more nitrides and oxynitrides containing at least one element selected from Si, Zr, Al, and Ti. In one embodiment, the material of the intermediate dielectric layer 150 includes TiO2. x SiN x and ZnSnO x One or more of them.

[0085] In other embodiments, the intermediate dielectric layer 150 comprises a multilayer film consisting of alternating layers of high-refractive-index films and low-refractive-index films. The refractive index of the high-refractive-index films is greater than that of the low-refractive-index films, with the high-refractive-index films having a refractive index of 1.7 to 2.5 and the low-refractive-index films having a refractive index of 1.4 to 1.7. The high-refractive-index films are made of oxides of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta, and Zr, or one or more of nitrides and oxynitrides selected from Si, Zr, Al, and Ti. The low-refractive-index films are made of oxides of at least one element selected from Si, Al, and B, or fluorides selected from Mg, Al, and Ba.

[0086] In some embodiments, the thickness of the intermediate dielectric layer 150 is 5 nm to 80 nm. For example, the thickness of the intermediate dielectric layer 150 may be, but is not limited to, 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, or any combination of these values. Preferably, the thickness of the intermediate dielectric layer 150 is 10 nm to 50 nm.

[0087] In some embodiments, the refractive index of the second low-refractive-index layer 160 is ≤1.7. For example, the refractive index of the second low-refractive-index layer 160 may be, but is not limited to, 1.4, 1.5, 1.6, 1.7, or a range consisting of any two of these values. Specifically, the material of the second low-refractive-index layer 160 includes an oxide of at least one element selected from Si, Al, B, and Zr, or a fluoride including at least one element selected from Mg, Al, and Ba. In one embodiment, the material of the second low-refractive-index layer 160 includes SiO2. x .

[0088] In some embodiments, the thickness of the second low-refractive-index layer 160 is 3 nm to 30 nm. For example, the thickness of the second low-refractive-index layer 160 may be, but is not limited to, 3 nm, 5 nm, 6 nm, 7 nm, 8 nm, 10 nm, 12 nm, 14 nm, 15 nm, 16 nm, 18 nm, 20 nm, 22 nm, 24 nm, 25 nm, 26 nm, 28 nm, 30 nm, or any combination of these values. Optionally, the thickness of the second low-refractive-index layer 160 is 5 nm to 20 nm.

[0089] It is understandable that the material of the first low-refractive-index layer 140 can be the same as or different from the material of the second low-refractive-index layer 160.

[0090] In some embodiments, the refractive index of the third low-refractive-index layer 180 is ≤1.7. The material of the third low-refractive-index layer 180 includes an oxide of at least one element selected from Si, Al, B, and Zr, or a fluoride including at least one element selected from Mg, Al, and Ba. In one embodiment, the material of the third low-refractive-index layer 180 includes SiO₂. x .

[0091] Specifically, the thickness of the third low-refractive-index layer 180 is 30 nm to 150 nm. For example, the thickness of the third low-refractive-index layer 180 may be, but is not limited to, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 120 nm, 140 nm, 150 nm, or any combination of these values. Preferably, the thickness of the third low-refractive-index layer 180 is 50 nm to 100 nm.

[0092] The third low-refractive-index layer 180 protects the second transparent conductive oxide layer 170 from incomplete oxidation during heat treatment, preventing localized or minor oxidation. This improves the conductivity and transmittance of the second transparent conductive oxide layer 170 and provides mechanical protection for the entire transparent conductive oxide layer. Furthermore, the third low-refractive-index layer 180 forms a high / low refractive index anti-reflection stack structure with the second transparent conductive oxide layer 170, further reducing visible light reflectivity.

[0093] In some embodiments, a barrier layer 120 is further provided between the first transparent conductive oxide layer 130 and the first glass substrate 110. Specifically, the thickness of the barrier layer 120 is ≥3nm. Optionally, the thickness of the barrier layer 120 may be, but is not limited to, 3nm, 5nm, 6nm, 7nm, 8nm, 9nm, 10nm, 11nm, 12nm, 13nm, 14nm, 15nm, 16nm, 18nm, 20nm, or any combination of these values. Alternatively, the thickness of the barrier layer 120 may be 3nm~30nm, 3nm~25nm, 3nm~20nm, 5nm~30nm, 5nm~25nm, 5nm~20nm, etc.

[0094] In some embodiments, the material of the barrier layer 120 includes one or more of the oxides, nitrides, and oxynitrides of at least one element selected from Si, B, Zn, Sn, Ti, Si, Al, Nb, Zr, Ni, Mg, Cr, and Ta. Preferably, the material of the barrier layer 120 includes one or more of the nitrides, oxides, and oxynitrides of at least one element selected from Si, Al, Zr, B, and Ti.

[0095] In one embodiment, the material of the barrier layer 120 includes SiO2. x and SiNx One or more of them.

[0096] A barrier layer 120 is provided between the first transparent conductive oxide layer 130 and the first glass substrate 110. During the heat treatment process, it can effectively prevent the diffusion and migration of alkali metal ions in the first glass substrate 110 from damaging the first transparent conductive oxide layer 130 and causing the loss of the function of the first transparent conductive oxide layer 130.

[0097] In some embodiments, the total thickness of the coating layer is less than or equal to 300 nm. Within the above thickness range, through the design and optimization of each film layer, the coated glass 100 can achieve advantages such as an emissivity value of ≤0.2, a visible light transmittance of >85%, a visible light reflectance of <6% on a single film surface, and aesthetically pleasing color.

[0098] In some embodiments, the total thickness of the first low-refractive-index layer 140, the intermediate dielectric layer 150, and the second low-refractive-index layer 160 located between the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 is less than 50 nm.

[0099] In some embodiments, the thickness of at least one of the first low-refractive-index layer 140 or the second low-refractive-index layer 160 is greater than the thickness of the intermediate dielectric layer 150. Specifically, the thickness of the first low-refractive-index layer 140 is greater than the thickness of the intermediate dielectric layer 150, and the thickness of the second low-refractive-index layer 160 is greater than the thickness of the intermediate dielectric layer 150.

[0100] Alternatively, the thickness of the intermediate dielectric layer 150 may be greater than the thickness of both the first low-refractive-index layer 140 and the second low-refractive-index layer 160.

[0101] In some embodiments, the total thickness of the first low-refractive-index layer 140, the intermediate dielectric layer 150, and the second low-refractive-index layer 160 located between the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 is greater than or equal to 50 nm.

[0102] In some embodiments, the thickness of the intermediate dielectric layer 150 is greater than or equal to the thickness of the first low-refractive-index layer 140 and / or the thickness of the intermediate dielectric layer 150 is greater than or equal to the thickness of the second low-refractive-index layer 160. Specifically, the thickness of the intermediate dielectric layer 150 is simultaneously greater than the thickness of both the first low-refractive-index layer 140 and the second low-refractive-index layer 160.

[0103] In some embodiments, the coated glass 100 includes a glass substrate and a coating layer sequentially stacked on the surface of the glass substrate. The coating layer includes a barrier layer 120, a first transparent conductive oxide layer 130, a first low refractive index layer 140, an intermediate dielectric layer 150, a second low refractive index layer 160, a second transparent conductive oxide layer 170, and a third low refractive index layer 180, which are sequentially stacked. The barrier layer 120 has a thickness ≥3 nm and is made of SiO2. x or SiN x The thicknesses of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 are each independently 30 nm to 120 nm, with a refractive index ≥ 1.7. The refractive indices of the first low-refractive-index layer 140, the second low-refractive-index layer 160, and the third low-refractive-index layer 180 are all ≤ 1.7, and the material includes SiO₂. x The thicknesses are 3nm~50nm, 3nm~30nm, and 30nm~150nm, respectively. The refractive index of the intermediate dielectric layer 150 is ≥1.7, and the material includes TiO2. x or SiN x or ZnSnO x The thickness ranges from 5nm to 80nm.

[0104] Preferably, the coated glass 100 includes a glass substrate and a coating layer sequentially stacked on the surface of the glass substrate. The coating layer includes a barrier layer 120, a first transparent conductive oxide layer 130, a first low refractive index layer 140, an intermediate dielectric layer 150, a second low refractive index layer 160, a second transparent conductive oxide layer 170, and a third low refractive index layer 180. The barrier layer 120 has a thickness ≥3 nm and is made of SiO₂. x or SiN x The thicknesses of the first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 are each independently 30 nm to 120 nm, with a total thickness of 80 nm to 150 nm and a refractive index ≥ 1.7. The refractive indices of the first low-refractive-index layer 140, the second low-refractive-index layer 160, and the third low-refractive-index layer 180 are all ≤ 1.7, and the material includes SiO2. x The thicknesses are 5nm~35nm, 5nm~20nm, and 50nm~100nm, respectively. The refractive index of the intermediate dielectric layer 150 is ≥1.7, and the material includes TiO2. x or SiN x The thickness is 10nm~50nm.

[0105] In some embodiments, the coated glass 100 may be tempered or heat-treated at 500°C to 700°C.

[0106] In some embodiments, the visible light transmittance of the coated glass 100 is ≥70%. For example, the visible light transmittance of the coated glass 100 may be, but is not limited to, 70%, 72%, 74%, 76%, 78%, 80%, 82%, 84%, 86%, 88%, 90%, or any range of two of these values. Preferably, the visible light transmittance of the coated glass 100 is >80%. In other embodiments, the visible light transmittance of the coated glass 100 is ≤30%.

[0107] In some embodiments, the visible light reflectance RL of the coated glass 100 is ≤7%. For example, the visible light reflectance of the coated glass 100 may be, but is not limited to, 7%, 6.5%, 6%, 5.5%, 5%, 4.5%, 4%, 3.5%, 3%, 2.5%, 2%, 1.5%, 1%, or any range of two of these values. Preferably, the visible light reflectance RL of the coated glass 100 is ≤6%.

[0108] In some embodiments, the emissivity of the coated glass 100 is less than or equal to 0.2. For example, the emissivity of the coated glass 100 may be, but is not limited to, 0.2, 0.19, 0.18, 0.17, 0.16, 0.15, 0.14, 0.12, 0.1, or a range of any two of these values.

[0109] In some embodiments, the reflected color of the surface of the coated glass 100 with the coating layer is described using the CIELab color space, where dimension L represents brightness, a and b represent opposite color dimensions, color component a represents the component from green to red, and color component b represents the component from blue to yellow. In this application, the color component L value is 0~30, the color component a value is -6~3, and the color component b value is -17~0. For example, the color component L value is 0, 5, 10, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, or any two of these values. The color component a value may be, but is not limited to, -6, -5, -4, -3, -2.5, 2, -1.5, -1, -0.5, 0, 1, 1.5, 2, 3, or any two of these values. The color component b value can be, but is not limited to, -17, -15, -14, -13, -12, -10, -9, -8, -7, -6, -5, -4, -3, -2, 0, or any range of two of these values. Furthermore, in some specific embodiments, the color component L value is 15 to 30, the color component a value is -3 to 2, and the color component b value is -15 to -2.

[0110] In some embodiments, the sheet resistance R of the coating layer of the coated glass 100 is ≤40Ω / square. Preferably, the sheet resistance R is ≤30Ω / square, and more preferably, the sheet resistance R is ≤20Ω / square.

[0111] The aforementioned coated glass 100 includes two transparent conductive oxide layers. The first transparent conductive oxide layer 130 and the second transparent conductive oxide layer 170 reflect or absorb infrared radiation, reducing heat radiation emitted from the glass into the room and preventing heat radiation from the room to the outside, thus reducing heat loss and providing a certain degree of insulation. By setting a first low-refractive-index layer 140, an intermediate dielectric layer 150, a second low-refractive-index layer 160, and a third low-refractive-index layer 180 between the first and second transparent conductive oxide layers 130 and on the surface of the second transparent conductive oxide layer 170, the coating layer can form multiple high / low refractive index anti-reflection stacked structures, which is beneficial for reducing visible light reflectivity and maintaining a neutral color while ensuring low emissivity. Experiments have shown that the aforementioned coated glass 100, through optimization of the film layers, exhibits low emissivity, low visible light reflectivity, and a neutral color when applied in laminated glass.

[0112] In addition, the above-mentioned coated glass 100 also has the advantages of high visible light transmittance and simple manufacturing process.

[0113] Please see Figure 2 The second aspect of the present invention provides a laminated glass 10, comprising a coated glass 100, a second glass substrate 300 and an adhesive layer 200 provided in the first aspect above, wherein the second glass substrate 300 is disposed on the side surface of the first glass substrate 110 away from the coated layer via the adhesive layer 200.

[0114] Specifically, the laminated glass 10 includes a first glass substrate 110 and a second glass substrate 300, with an adhesive layer 200 disposed between the first glass substrate 110 and the second glass substrate 300. A coating layer is disposed on the surface of the first glass substrate 110 away from the second glass substrate 300. The coating layer includes a barrier layer 120, a first transparent conductive oxide layer 130, a first low refractive index layer 140, an intermediate dielectric layer 150, a second low refractive index layer 160, a second transparent conductive oxide layer 170, and a third low refractive index layer 180, stacked sequentially. The barrier layer 120 is closer to the first glass substrate 110 than the third low refractive index layer 180. That is, the third low refractive index layer 180 is the layer furthest from the first glass substrate 110.

[0115] In some embodiments, the first glass substrate 110 and the second glass substrate 300 are not particularly limited and can be colorless and transparent or colored glass substrates, such as silicate glass, borate glass, and plexiglass such as PC (polycarbonate) and PMMA (polymethyl methacrylate).

[0116] In some embodiments, the visible light transmittance of the first glass substrate 110 and / or the second glass substrate 300 is ≤50%. For example, the first glass substrate 110 and / or the second glass substrate 300 is gray glass. In other embodiments, the visible light transmittance of the first glass substrate 110 and / or the second glass substrate 300 is ≥70%. For example, the first glass substrate 110 and / or the second glass substrate 300 is green glass (green glass) or clear glass (clear glass). Preferably, the visible light transmittance of the first glass substrate 110 and / or the second glass substrate 300 is ≥90%.

[0117] In some embodiments, the laminated glass 10 further includes an infrared reflective film disposed between the coated glass 100 and the adhesive layer 200, and / or between the second glass substrate 300 and the adhesive layer 200. The infrared reflective film may contain at least one silver layer or silver alloy layer. By providing an infrared reflective film to reflect infrared rays in sunlight, the heat insulation capability of the laminated glass 10 is further improved, and the total solar transmittance of the laminated glass 10 is reduced.

[0118] In some embodiments, the infrared reflective film may include two silver layers or silver alloy layers, three silver layers or silver alloy layers, or four silver layers or silver alloy layers.

[0119] In some embodiments, the second glass substrate 300 is transparent glass with a visible light transmittance ≥70%. An infrared reflective film is also disposed between the second glass substrate 300 and the adhesive layer 200. The infrared reflective film may include at least one silver layer or silver alloy layer. By providing an infrared reflective film to reflect infrared rays in sunlight, the heat insulation capability of the laminated glass 10 is further improved, and the total solar energy transmittance of the laminated glass 10 is reduced.

[0120] In some embodiments, the infrared reflective film may include two silver layers or silver alloy layers, three silver layers or silver alloy layers, or four silver layers or silver alloy layers.

[0121] In some embodiments, the adhesive layer 200 may be a colorless and transparent or colored low-transmittance polymer layer. Specifically, the material of the adhesive layer 200 includes one or more of PVB (polyvinyl butyral), PU (polyurethane), EVA (ethylene-ethyl acetate copolymer), and SGP (ionic interlayer).

[0122] In some embodiments, the visible light transmittance of the adhesive layer 200 is ≤30%. For example, the adhesive layer 200 comprises a gray PVB adhesive layer. The visible light transmittance of the gray PVB adhesive layer is 10±2%. In other embodiments, the visible light transmittance of the adhesive layer 200 is ≥70%. For example, the adhesive layer 200 comprises a transparent PVB adhesive layer. The visible light transmittance of the transparent PVB adhesive layer is >90%.

[0123] Specifically, when the laminated glass 10 is used in a sunroof, the transmittance of the sunroof is low, and the visible light transmittance of the adhesive layer 200 is ≤30%. When the laminated glass 10 is used in a side window or windshield, the transmittance of the side window or windshield is high, and the visible light transmittance of the adhesive layer 200 is ≥70%.

[0124] To meet the light adjustment requirements of the laminated glass 10 and adapt to different scenarios, a dimming element is also provided between the first glass substrate 110 and the second glass substrate 300. In some embodiments, the dimming element can be one commonly used in the art, such as PDLC (polymer dispersed liquid crystal) dimming film, SPD (suspended particle) dimming film, EC (electrochromic) dimming film, etc.

[0125] In some embodiments, the laminated glass 10 can be installed on a vehicle, and the coated glass 100 is located inside the vehicle.

[0126] In some embodiments, the visible light reflectance of the laminated glass 10, measured from inside the vehicle, is ≤6% (0-degree angle test). For example, the visible light reflectance of the laminated glass 10, measured from inside the vehicle, may be, but is not limited to, 6%, 5.5%, 5%, 4.5%, 4%, 3.5%, 3%, 2.5%, 2%, 1.5%, 1%, or a range of any two of these values. Preferably, the visible light reflectance of the laminated glass 10, measured from inside the vehicle, is ≤4%; more preferably, the visible light reflectance of the laminated glass 10, measured from inside the vehicle, is ≤2%.

[0127] In some embodiments, the visible light transmittance of the laminated glass 10 is ≤20%. For example, the visible light transmittance of the laminated glass 10 may be, but is not limited to, 20%, 18%, 16%, 15%, 14%, 12%, 10%, 9%, 8%, 7%, 6%, 5%, or any combination of these values. Preferably, the visible light transmittance of the laminated glass 10 is ≤10%.

[0128] In other embodiments, the visible light transmittance of the laminated glass 10 is ≥60%. For example, the visible light transmittance of the laminated glass 10 may be, but is not limited to, 60%, 62%, 64%, 66%, 68%, 70%, 72%, 74%, 76%, 78%, 80%, or any combination of these values. Preferably, the visible light transmittance of the laminated glass 10 is ≥70%.

[0129] In some embodiments, the color component a of the laminated glass 10, measured from inside the vehicle, has a value of -6 to 3 and a color component b has a value of -15 to 0. For example, the color component a value may be, but is not limited to, -6, -5, -4, -3, -2, -1, 0, 1, 2, 3, or any combination thereof. The color component b value may be, but is not limited to, -15, -14, -13, -12, -11, -10, -9, -8, -7, -6, -5, -4, -3, -2, -1, 0, or any combination thereof. Within these ranges, the laminated glass 10 has a more aesthetically pleasing neutral color.

[0130] It is understood that in some embodiments, when the laminated glass 10 is used as automotive window glass, the second glass substrate 300 refers to the glass substrate of the laminated glass 10 adjacent to the air surface outside the vehicle, also known as the outer glass substrate, and the first glass substrate 110 refers to the glass substrate of the laminated glass 10 adjacent to the air surface inside the vehicle, also known as the inner glass substrate. The "outer surface of the glass substrate" refers to the interface of the laminated glass 10 in contact with the air surface, and the "inner surface of the glass substrate" refers to the interface of the laminated glass 10 in contact with the adhesive layer 200.

[0131] The aforementioned laminated glass 10 has low emissivity, low visible light reflectivity, and an aesthetically pleasing neutral color, making it suitable for both architectural and automotive glass applications, particularly in the automotive glass sector. Furthermore, the aforementioned laminated glass 10 also boasts the advantage of a simple manufacturing process.

[0132] A third aspect of the present invention provides a vehicle comprising the coated glass provided in the first aspect or the laminated glass provided in the second aspect.

[0133] To make the objectives and advantages of the present invention clearer, the coated glass and its effects of the present invention are further described in detail below with reference to specific embodiments. It should be understood that the specific embodiments described herein are only for explaining the present invention and should not be used to limit the present invention. Unless otherwise specified, the following embodiments do not include components other than unavoidable impurities. Unless otherwise specified, the drugs and instruments used in the embodiments are conventional choices in the art. Experimental methods in the embodiments that do not specify specific conditions are implemented according to conventional conditions, such as those described in literature, books, or methods recommended by the manufacturer.

[0134] Comparative Example 1

[0135] Comparative Example 1 provides a laminated glass comprising: an outer glass substrate and an inner glass substrate, both of which are made of 2mm thick transparent glass (white glass). The inner glass substrate has a 15nm thick SiN layer sequentially deposited on its inner surface using magnetron sputtering. x Barrier layer, 120nm ITO transparent conductive oxide layer and 56nm SiO x The outermost layer, the outer glass substrate and the inner glass substrate after coating deposition, are both heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together with a gray PVB adhesive layer with a transmittance of 10±2%.

[0136] Comparative Example 2

[0137] Comparative Example 2 provides a laminated glass comprising an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (white glass). The inner surface of the inner glass substrate is sequentially deposited with SiN layers of 15nm thickness using magnetron sputtering. x Barrier layer, 90nm ITO transparent conductive oxide layer and 56nm SiO x The outermost layer, the outer glass substrate and the inner glass substrate after coating deposition, are both heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together with a gray PVB adhesive layer with a transmittance of 10±2%.

[0138] Comparative Example 3

[0139] Comparative Example 3 provides a laminated glass comprising an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (white glass). The inner surface of the inner glass substrate is sequentially deposited with SiN with a thickness of 6nm using magnetron sputtering. x 49nm SiO x 15nm ITO transparent conductive oxide layer, 30nm SiO x 110nm ITO transparent conductive oxide layer, 27nm SiN x and 80nm SiO x Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together with a gray PVB adhesive layer with a transmittance of 10±2%.

[0140] Comparative Example 4

[0141] Comparative Example 4 provides a laminated glass comprising an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (white glass). The inner surface of the inner glass substrate is sequentially deposited with SiO2 with a thickness of 70nm using magnetron sputtering. x 20nm SiN x 50nm ITO transparent conductive oxide layer, 10nm SiO x 50nm ITO transparent conductive oxide layer and 35nm SiO x Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together with a gray PVB adhesive layer with a transmittance of 10±2%.

[0142] Example 1

[0143] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (clear glass). The inner surface of the inner glass substrate has 10nm SiN deposited sequentially using magnetron sputtering. x Barrier layer, 55nm ITO first transparent conductive oxide layer, 18nm SiO x First low-refractive-index layer, 15nm TiO x Intermediate high refractive index dielectric layer, 11nm SiO x A second low-refractive-index layer, a 55nm ITO second transparent conductive oxide layer, and a 65nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a gray PVB adhesive layer with a transmittance of 10±2%.

[0144] Example 2

[0145] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (clear glass). The inner surface of the inner glass substrate is sequentially deposited with SiO₂ with a thickness of 13nm using magnetron sputtering. x Barrier layer, 65nm ITO first transparent conductive oxide layer, 10nm SiO x First low-refractive-index layer, 14nm TiO x Intermediate high refractive index dielectric layer, 18nm SiO x A second low-refractive-index layer, a 55nm ITO second transparent conductive oxide layer, and a 58nm SiO layer. xThe third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a gray PVB adhesive layer with a transmittance of 10±2%.

[0146] Example 3

[0147] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (clear glass). The inner surface of the inner glass substrate is sequentially deposited with SiN layers of 5nm thickness using magnetron sputtering. x Barrier layer, 65nm ITO first transparent conductive oxide layer, 15nm SiO x First low-refractive-index layer, 10nm TiO x Intermediate high refractive index dielectric layer, 6nm SiO x A second low-refractive-index layer, a 70nm ITO second transparent conductive oxide layer, and a 65nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a gray PVB adhesive layer with a transmittance of 10±2%.

[0148] Example 4

[0149] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (clear glass). The inner surface of the inner glass substrate is sequentially deposited with SiN layers of 5nm thickness using magnetron sputtering. x Barrier layer, 65nm ITO first transparent conductive oxide layer, 10nm SiO x First low-refractive-index layer, 45nm SiN x Intermediate high refractive index dielectric layer, 5nm SiO x A second low-refractive-index layer, a 65nm ITO second transparent conductive oxide layer, and a 65nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a gray PVB adhesive layer with a transmittance of 10±2%.

[0150] Example 5

[0151] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick transparent glass (clear glass). The inner surface of the inner glass substrate is sequentially deposited with SiN layers of 10nm thickness using magnetron sputtering.x Barrier layer, 50nm ITO first transparent conductive oxide layer, 10nm SiO x First low-refractive-index layer, 50nm ZnSnO x Intermediate high refractive index dielectric layer, 10nm SiO x A second low-refractive-index layer, a 60nm ITO second transparent conductive oxide layer, and a 56nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition are heat-treated at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a gray PVB adhesive layer with a transmittance of 10±2%.

[0152] Example 6

[0153] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick green glass with a transmittance of 80%~85%. The inner glass substrate has an 8nm thick SiN layer sequentially deposited on its inner surface using magnetron sputtering. x Barrier layer, 60nm ITO first transparent conductive oxide layer, 5nm SiO x First low-refractive-index layer, 13nm TiO x Intermediate high refractive index dielectric layer, 5nm SiO x A second low-refractive-index layer, a 50nm ITO second transparent conductive oxide layer, and an 86nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition undergo heat treatment at 600℃~750℃. The outer glass substrate and the inner glass substrate are bonded together using a transparent PVB adhesive layer with a transmittance of >90%.

[0154] Example 7

[0155] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick green glass with a transmittance of 80%~85%. The inner glass substrate has a 10nm thick SiN layer sequentially deposited on its inner surface using magnetron sputtering. x Barrier layer, 50nm ITO first transparent conductive oxide layer, 10nm SiO x First low-refractive-index layer, 50nm ZnSnO x Intermediate high refractive index dielectric layer, 7nm SiO x A second low-refractive-index layer, a 60nm ITO second transparent conductive oxide layer, and a 62nm SiO layer. xThe third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition undergo heat treatment at 600℃~750℃. The outer glass substrate and the inner glass substrate are bonded together using a transparent PVB adhesive layer with a transmittance of >90%.

[0156] Example 8

[0157] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick gray glass with a transmittance of 30±2%. The inner glass substrate has a 10nm thick SiN layer sequentially deposited on its inner surface using magnetron sputtering. x Barrier layer, 55nm ITO first transparent conductive oxide layer, 18nm SiO x First low-refractive-index layer, 15nm TiO x Intermediate high refractive index dielectric layer, 11nm SiO x A second low-refractive-index layer, a 55nm ITO second transparent conductive oxide layer, and a 65nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition undergo heat treatment at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a transparent PVB adhesive layer with a transmittance of >90%.

[0158] Example 9

[0159] This embodiment provides a laminated glass, including an outer glass substrate and an inner glass substrate. Both the outer and inner glass substrates are made of 2mm thick gray glass with a transmittance of 30±2%. The inner glass substrate has an 8nm thick SiN layer sequentially deposited on its inner surface using magnetron sputtering. x Barrier layer, 50nm ITO first transparent conductive oxide layer, 10nm SiO x First low-refractive-index layer, 50nm ZnSnO x Intermediate high refractive index dielectric layer, 7nm SiO x A second low-refractive-index layer, a 55nm ITO second transparent conductive oxide layer, and a 52nm SiO layer. x The third low-refractive-index layer. Both the outer glass substrate and the inner glass substrate after coating deposition undergo heat treatment at 550℃~650℃. The outer glass substrate and the inner glass substrate are bonded together using a transparent PVB adhesive layer with a transmittance of >90%.

[0160] The visible light reflectance, interior reflectance color, and emissivity of the coated glass and laminated glass of Comparative Examples 1-4 and Examples 1-9 were measured, and the measurement results are recorded in Tables 1 and 2.

[0161] Table 1: Experimental data of coated glass and laminated glass in Comparative Examples 1-4 and Example 1

[0162]

[0163] As can be seen from Table 1, Comparative Example 1 and Comparative Example 2 use a layer of ITO transparent conductive oxide and a layer of SiO2. x In Comparative Example 1, the transparent conductive oxide layer has a relatively high thickness, resulting in a high visible light reflectance, greater than 6%. Compared to Comparative Example 1, Comparative Example 2 has a reduced ITO film thickness, which further reduces visible light reflectance and increases visible light transmittance, while also achieving a better reflected color. However, with the reduction in ITO film thickness, its sheet resistance and emissivity also increase, which is detrimental to the glass's heat insulation performance.

[0164] Comparative Examples 3 and 4 both employ two layers of transparent conductive oxide, with only one layer of SiO placed between the two transparent conductive oxide layers. x Low refractive index layer. In Comparative Example 3, the thickness difference between the two ITO layers is greater than 90 nm. The visible light reflectance of the inner glass substrate measured from one side of the film layer is still greater than 6%, and the b-value of the film color of the inner glass substrate is greater than 5, indicating a severe yellowish defect.

[0165] Among them, the visible light reflectance of the inner glass substrate measured from the film layer side of Comparative Example 4 is greater than 7%, which is still too high.

[0166] Example 1 uses two transparent conductive oxide layers, and SiO is disposed between the two transparent conductive oxide layers. x First low-refractive-index layer, TiO x Intermediate dielectric layer, SiO x The three-layer structure of the second low-refractive-index layer, with a total thickness close to or even lower than Comparative Example 4, still achieves an emissivity value of less than 0.2, a visible light transmittance of greater than 85%, a visible light reflectance of less than 6% on a single film surface, and aesthetically pleasing color. As shown in Table 1, Example 1, with a lower total thickness than Comparative Examples 3 and 4, exhibits superior emissivity, visible light transmittance, and visible light reflectance on a single film surface compared to Comparative Examples 3 and 4.

[0167] Table 2: Measurement results of coated glass and laminated glass in Examples 2-9

[0168]

[0169] As can be seen from Table 2, the total film thickness in Examples 2-9 is lower than that in Comparative Example 3, and the total film thickness in most examples is lower than that in Comparative Example 4. The total film thickness in Example 4 is close to that in Comparative Example 4. Under these circumstances, the emissivity of the inner glass substrate in Examples 2-9 can all reach below 0.2. At the same time, the visible light reflectivity of the inner glass substrate in Examples 2-9 is below 6%, which is better than the visible light reflectivity of each film system in Comparative Examples 1-4.

[0170] The coated glasses in Examples 2-5 achieve advantages such as an emissivity value of <0.2, visible light transmittance of >85%, visible light reflectance of <6% for a single film surface, and aesthetically pleasing colors. The laminated glass of Examples 1-5 can be applied to skylights. Compared to Comparative Examples 3 and 4, the coated glasses prepared in Examples 1-5, while possessing an emissivity value of <0.2 and visible light transmittance of >85%, exhibit significantly reduced visible light reflectance per film.

[0171] As can be seen from Example 2, compared with Comparative Example 4, the total thickness of the film layer in Example 2 is lower, the thickness of the two transparent conductive oxide layers is similar, and the total thickness of the first low refractive index layer, the intermediate dielectric layer, and the second low refractive index layer located between the first and second transparent conductive oxide layers is less than 50 nm. The visible light reflectance of the inner glass substrate can reach less than 6%, and the visible light reflectance of the overall laminated glass can reach less than 2%.

[0172] As can be seen from Examples 3 and 4, by adopting the technical solution of the present invention, even with a further increase in the thickness of the transparent conductive oxide layer, it is still possible to obtain color component a and color component b values ​​that are more inclined towards neutral colors. In particular, compared with Comparative Example 3, there is no yellowish defect.

[0173] As can be seen from Example 5, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first and second transparent conductive oxide layers is greater than 50 nm, and ZnSnO is present in the latter layer. x As an intermediate dielectric layer, its thickness is greater than that of SiO. x The first low refractive index layer and SiO x The second low-refractive-index layer can still maintain the emissivity of the inner glass substrate within 0.2, and obtain a lower visible light reflectance of the inner glass substrate as well as color component a and color component b values ​​that are more biased towards neutral colors.

[0174] As can be seen from Examples 6 and 7, the laminated glass is a combination of green glass and transparent PVB, with visible light transmittance exceeding 70%, making it suitable for windshields or rear windows, side windows, sunroofs, etc., where high transmittance is required. Furthermore, Examples 6 and 7 still achieve emissivity below 0.2 and visible light reflectance values ​​of the inner glass substrate below 5%. In addition, in Example 7, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first and second transparent conductive oxide layers is greater than 50 nm, and ZnSnO... x As an intermediate dielectric layer, its thickness is greater than that of SiO. x The first low refractive index layer and SiO x The second low-refractive-index layer can still obtain color component a and color component b values ​​that are more biased towards neutral colors.

[0175] As can be seen from Examples 8 and 9, the technical solutions of the embodiments of the present invention can still be applied to glass sheets of different colors and transmittances, and low emissivity and visible light reflectivity, as well as aesthetically pleasing reflective color indices. In particular, when using a combination of gray glass and transparent PVB, the visible light reflectivity can be further reduced to within 2%. Meanwhile, in Example 8, the color component a value is only -1.1 and the color component b value is only -3.6, which is more inclined towards neutral colors.

[0176] Furthermore, as can be seen from the above embodiments, there is at least a two-layer film structure between the first transparent conductive oxide layer and the second transparent conductive oxide layer. As can be seen from embodiments 1, 2, 3, 6, and 8, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first and second transparent conductive oxide layers is less than 50 nm. Based on this, in embodiments 1 and 8, the thickness of the first low-refractive-index layer is greater than the thickness of the intermediate dielectric layer; in embodiments 2 and 3, the thickness of the second low-refractive-index layer is greater than the thickness of the intermediate dielectric layer; and in embodiment 6, the thickness of the intermediate dielectric layer is greater than both the thickness of the first and second low-refractive-index layers.

[0177] As can be seen from Examples 4, 5, 7, and 9, the total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first and second transparent conductive oxide layers is greater than or equal to 50 nm. Furthermore, in Examples 4, 5, 7, and 9, the thickness of the intermediate dielectric layer is simultaneously greater than the thickness of both the first and second low-refractive-index layers.

[0178] As can be seen from the above experimental results, by reasonably adjusting the design of each film layer, the technical solution of the present invention can achieve better visible light transmittance, low radiation value and visible light reflectance, as well as beautiful reflective color.

[0179] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0180] The above-described embodiments are merely illustrative of several implementation methods of the present invention, facilitating a detailed understanding of the technical solutions of the present invention, but should not be construed as limiting the scope of protection of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the scope of protection of the present invention. It should be understood that technical solutions obtained by those skilled in the art based on the technical solutions provided by the present invention through logical analysis, reasoning, or limited experimentation are all within the scope of protection of the appended claims. Therefore, the scope of protection of this invention patent should be determined by the content of the appended claims, and the specification and drawings can be used to interpret the content of the claims.

Claims

1. A coated glass, characterized in that, include: A first glass substrate and a coating layer disposed on at least one surface of the first glass substrate, the coating layer comprising a first transparent conductive oxide layer, a first low refractive index layer, an intermediate dielectric layer, a second low refractive index layer, a second transparent conductive oxide layer and a third low refractive index layer stacked sequentially. Wherein, the first transparent conductive oxide layer is closer to the first glass substrate than the third low refractive index layer, the refractive index of the first transparent conductive oxide layer is greater than the refractive index of the first low refractive index layer, the refractive index of the second transparent conductive oxide layer is greater than the refractive indices of the second low refractive index layer and the third low refractive index layer, and the refractive index of the intermediate dielectric layer is greater than the refractive indices of the first low refractive index layer and the second low refractive index layer. The visible light reflectance RL of the coated glass is less than or equal to 7%.

2. The coated glass according to claim 1, characterized in that, The visible light reflectance RL of the coated glass is less than 6%.

3. The coated glass according to claim 1, characterized in that, The emissivity of the coated glass is less than or equal to 0.

2.

4. The coated glass according to claim 1, characterized in that, The reflected color of the surface of the coated glass with the coating layer has a color component L value of 0~30, a value of -6~3, and a value of -17~0 in the Lab color space.

5. The coated glass according to claim 1, characterized in that, The total thickness of the coating layer is less than or equal to 300 nm.

6. The coated glass according to claim 1, characterized in that, The total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first transparent conductive oxide layer and the second transparent conductive oxide layer is less than 50 nm.

7. The coated glass according to claim 6, characterized in that, The thickness of at least one of the first low-refractive-index layer or the second low-refractive-index layer is greater than the thickness of the intermediate dielectric layer, or the thickness of the intermediate dielectric layer is greater than the thickness of both the first low-refractive-index layer and the second low-refractive-index layer.

8. The coated glass according to claim 1, characterized in that, The total thickness of the first low-refractive-index layer, the intermediate dielectric layer, and the second low-refractive-index layer located between the first transparent conductive oxide layer and the second transparent conductive oxide layer is greater than or equal to 50 nm.

9. The coated glass according to claim 8, characterized in that, The thickness of the intermediate medium layer is greater than or equal to the thickness of the first low refractive index layer and / or the thickness of the intermediate medium layer is greater than or equal to the thickness of the second low refractive index layer.

10. The coated glass according to claim 1, characterized in that, The first transparent conductive oxide layer and the second transparent conductive oxide layer satisfy one or more of the following conditions: (1) The first transparent conductive oxide layer and / or the second transparent conductive oxide layer are one or more of ITO film, ATO film, AZO film and FTO film; (2) The refractive indices of the first transparent conductive oxide layer and the second transparent conductive oxide layer are each ≥1.7 independently; (3) The thickness of the first transparent conductive oxide layer and the second transparent conductive oxide layer are each independently 30nm~120nm; (4) The total thickness of the first transparent conductive oxide layer and the second transparent conductive oxide layer is 80nm~150nm.

11. The coated glass according to claim 1, characterized in that, The first low-refractive-index layer, the second low-refractive-index layer, and the third low-refractive-index layer satisfy one or more of the following conditions: (1) The refractive indices of the first low-refractive-index layer, the second low-refractive-index layer and the third low-refractive-index layer are each ≤1.7 independently; (2) The materials of the first low refractive index layer, the second low refractive index layer and the third low refractive index layer each independently include an oxide of at least one element selected from Si, Al, B and Zr, or a fluoride containing at least one element selected from Mg, Al and Ba. (3) The thickness of the first low refractive index layer is 3nm~50nm; the thickness of the second low refractive index layer is 3nm~30nm; and the thickness of the third low refractive index layer is 30nm~150nm.

12. The coated glass according to claim 1, characterized in that, The thickness of the first low-refractive-index layer is 5nm~35nm; the thickness of the second low-refractive-index layer is 5nm~20nm; and the thickness of the third low-refractive-index layer is 50nm~100nm.

13. The coated glass according to claim 1, characterized in that, The intermediate dielectric layer satisfies one or more of the following conditions: (1) The refractive index of the intermediate medium layer is ≥1.7; (2) The thickness of the intermediate dielectric layer is 5nm~80nm.

14. The coated glass according to claim 1, characterized in that, The thickness of the intermediate dielectric layer is 10nm~50nm.

15. The coated glass according to claim 13, characterized in that, The intermediate dielectric layer is a single layer, and the material of the intermediate dielectric layer includes an oxide of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta and Zr, or one or more nitrides and oxynitrides selected from at least one element selected from Si, Zr, Al and Ti.

16. The coated glass according to claim 15, characterized in that, The material of the intermediate dielectric layer includes TiO2. x SiN x and ZnSnO x One or more of them.

17. The coated glass according to claim 13, characterized in that, The intermediate medium layer comprises a multilayer film consisting of alternating layers of high-refractive-index films and low-refractive-index films. The refractive index of the high-refractive-index film is greater than that of the low-refractive-index film. The refractive index of the high-refractive-index film is 1.7 to 2.5, and the refractive index of the low-refractive-index film is 1.4 to 1.

7.

18. The coated glass according to claim 17, characterized in that, The high refractive index film is made of an oxide of at least one element selected from Zn, Sn, Nb, Ti, Ni, Cr, Ta and Zr, or one or more of nitrides and oxynitrides selected from Si, Zr, Al and Ti. The low refractive index film is made of an oxide of at least one element selected from Si, Al and B, or a fluoride selected from Mg, Al and Ba.

19. The coated glass according to claim 1, characterized in that, A barrier layer is also provided between the first transparent conductive oxide layer and the first glass substrate.

20. The coated glass according to claim 19, characterized in that, The barrier layer satisfies one or more of the following conditions: (1) The thickness of the barrier layer is ≥3nm; (2) The material of the barrier layer includes oxides or nitrides or nitrogen oxides of at least one of the following elements: Si, B, Zn, Sn, Ti, Si, Al, Nb, Zr, Ni, Mg, Cr and Ta.

21. The coated glass according to claim 20, characterized in that, The material of the barrier layer includes one or more of the nitrides, oxides, and oxynitrides of at least one element selected from Si, Al, Zr, B, and Ti.

22. The coated glass according to claim 21, characterized in that, The material of the barrier layer includes SiO. x and SiN x One or more of them.

23. A laminated glass, characterized in that, The first glass substrate includes the coated glass, the adhesive layer, and the second glass substrate as described in any one of claims 1 to 22, wherein the second glass substrate is disposed on the side of the first glass substrate away from the coated layer via the adhesive layer.

24. The laminated glass according to claim 23, characterized in that, The visible light transmittance of the first glass substrate and / or the second glass substrate is ≤50%; or, the visible light transmittance of the first glass substrate and / or the second glass substrate is ≥70%.

25. The laminated glass according to claim 23, characterized in that, It also includes an infrared reflective film disposed between the coated glass and the adhesive layer, and / or disposed between the second glass substrate and the adhesive layer.

26. The laminated glass according to claim 23, characterized in that, The visible light transmittance of the adhesive layer is ≤30%; or the visible light transmittance of the adhesive layer is ≥70%.

27. The laminated glass according to any one of claims 23 to 26, characterized in that, The laminated glass satisfies one or more of the following conditions: (1) The visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤6%; (2) The visible light transmittance of the laminated glass is ≤20%; Alternatively, the visible light transmittance of the laminated glass is ≥60%; (3) The color component a of the laminated glass is measured from inside the vehicle and the color component b is measured to be -6 to 3 and -15 to 0.

28. The laminated glass according to claim 27, characterized in that, The visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤4%.

29. The laminated glass according to claim 28, characterized in that, The visible light reflectance of the laminated glass, measured from inside the vehicle, is ≤2%.

30. The laminated glass according to claim 27, characterized in that, The visible light transmittance of the laminated glass is ≤10%; Alternatively, the visible light transmittance of the laminated glass is ≥70%.

31. A vehicle, characterized in that, It includes the coated glass according to any one of claims 1 to 22 or the laminated glass according to any one of claims 23 to 30.

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