Optical monomers and methods for their preparation, compositions, resin materials and methods for their preparation, applications

Abstract

The application discloses an optical monomer and a preparation method, a composition, a resin material and a preparation method and application thereof. The optical monomer mainly comprises a hydroquinone group, a benzotriazole group and a long-chain sulfur structure, so that the prepared resin material has high refractive index, good ultraviolet resistance and flexibility. The benzotriazole group has good ultraviolet resistance. In addition, the long-chain sulfur structure in the optical monomer can rotate freely, and the flexibility of the polymer is enhanced. In addition, the hydroxyl group in the optical monomer can form a hydrogen bond with a base material, so that the adhesion is improved. The optical monomer is rich in sulfur elements and benzene ring structures, and has high molar refractivity, so that the optical monomer has high refractive index.

Description

Technical Field

[0001] This application relates to the field of optical materials technology, and in particular to an optical monomer and its preparation method, composition, resin material and its preparation method, and application. Background Technology

[0002] In the waveguide technology of AR / VR glasses, the application of optical resins is indispensable. Current applications of AR / VR glasses not only require optical resins to have high refractive indices, but also require improved other properties, such as UV resistance and flexibility. However, existing optical resins are insufficient to meet these requirements.

[0003] Therefore, how to improve the overall performance of optical resins has become an urgent problem to be solved. Summary of the Invention

[0004] In view of this, this application proposes an optical monomer and its preparation method, composition, resin material and its preparation method, and application.

[0005] The first aspect of this application provides an optical monomer comprising: a hydroquinone group; two benzotriazole groups located at the ortho or meta position of the hydroquinone group; a long-chain sulfur structure connected to the benzotriazole group; and a first substituent group located on the long-chain sulfur structure.

[0006] The second aspect of this application discloses a method for preparing an optical monomer, comprising the following steps:

[0007] A third compound is generated by reacting the first compound with the second compound;

[0008] The structural formula of the first compound is:

[0009] The structural formula of the second compound is:

[0010] The structural formula of the third compound is:

[0011] The fifth compound is generated by reacting the third compound with the fourth compound;

[0012] The structural formula of the fourth compound is: The structural formula of the fifth compound is: The fifth compound and the sixth compound are used to generate the seventh compound;

[0013] The structural formula of the sixth compound is: The structural formula of the seventh compound is: The seventh compound and the eighth compound are used to generate the ninth compound;

[0014] The structural formula of the eighth compound is: The structural formula of the ninth compound is: The optical monomer is generated using the ninth compound;

[0015] The structural formula of the optical unit is: A third aspect of this application discloses a method for preparing an optical monomer, comprising the following steps:

[0016] A third compound is generated by reacting the first compound with the second compound;

[0017] The structural formula of the first compound is: The structural formula of the second compound is: The structural formula of the third compound is: The fifth compound is generated by reacting the third compound with the fourth compound;

[0018] The structural formula of the fourth compound is: The structural formula of the fifth compound is: The fifth compound and the sixth compound are used to generate the seventh compound;

[0019] The structural formula of the sixth compound is: The structural formula of the seventh compound is: The seventh compound and the eighth compound are used to generate the ninth compound;

[0020] The structural formula of the eighth compound is: The structural formula of the ninth compound is: The optical monomer is generated using the ninth compound;

[0021] The structural formula of the optical unit is: The fourth aspect of this application provides a method for preparing an optical monomer, comprising the following steps: generating a third compound by reacting a first compound with a second compound;

[0022] The structural formula of the first compound is: The structural formula of the second compound is: The structural formula of the third compound is: The fifth compound is generated by reacting the third compound with the fourth compound;

[0023] The structural formula of the fourth compound is: The structural formula of the fifth compound is: The fifth compound and the sixth compound are used to generate the seventh compound;

[0024] The structural formula of the sixth compound is: The structural formula of the seventh compound is: The seventh compound and the eighth compound are used to generate the ninth compound;

[0025] The structural formula of the eighth compound is: The structural formula of the ninth compound is: The optical monomer is generated using the ninth compound;

[0026] The structural formula of the optical unit is: The fifth aspect of this application discloses a method for preparing an optical monomer, comprising the following steps:

[0027] A third compound is generated by reacting the first compound with the second compound;

[0028] The structural formula of the first compound is: The structural formula of the second compound is: The structural formula of the third compound is: The fifth compound is generated by reacting the third compound with the fourth compound;

[0029] The structural formula of the fourth compound is: The structural formula of the fifth compound is: The fifth compound and the sixth compound are used to generate the seventh compound;

[0030] The structural formula of the sixth compound is:

[0031] The structural formula of the seventh compound is:

[0032] The seventh compound and the eighth compound are used to generate the ninth compound;

[0033] The structural formula of the eighth compound is:

[0034] The structural formula of the ninth compound is:

[0035] The optical monomer is generated using the ninth compound;

[0036] The structural formula of the optical unit is:

[0037] A sixth aspect of this application provides a composition comprising a solvent, a photoinitiator, a leveling agent, a silane coupling agent, and the aforementioned optical monomers.

[0038] A seventh aspect of this application provides a resin material obtained by curing the above-described composition.

[0039] The eighth aspect of this application provides a method for preparing a resin material, comprising the following steps: providing the above-described composition; mixing and filtering to form a mixture; coating the mixture onto a substrate; and curing the mixture coated on the substrate to obtain the resin material.

[0040] The ninth aspect of this application provides for the application of a resin material as described above in optical waveguide technology, said resin material being used as an adhesive, filter, display material, or anti-ultraviolet film layer.

[0041] As can be seen from the above technical solution, the optical monomer proposed in this application mainly contains hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. The benzotriazole group, in combination with the hydroquinone group, achieves effective UV resistance. The principle is that the nitrogen in the benzotriazole group is close to the hydroxyl group on the hydroquinone group, easily forming intrinsic hydrogen bonds and a chelate ring. After absorbing UV light, the molecule undergoes thermal vibration, the internal hydrogen bonds break, the chelate ring opens, and the UV energy is converted into heat energy, thus improving UV resistance. Furthermore, the optical monomer contains a long-chain sulfur structure. In this structure, the bond angles and bond lengths between sulfur atoms can vary within a certain range, allowing the sulfur chain to stretch and bend like a spring. This free-rotation characteristic enhances the polymer's flexibility. Furthermore, the hydroxyl groups in the optical monomer can form hydrogen bonds with the substrate, improving adhesion. The optical monomer is rich in sulfur and has a benzene ring structure. Due to its high molar refractive index, the optical monomer has a very high refractive index. Attached Figure Description

[0042] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0043] Figure 1 This is one of the general structural formulas of the optical monomer proposed in this application;

[0044] Figure 2 This is another general structural formula for the optical monomer proposed in this application;

[0045] Figure 3 This is the structural formula of the first optical monomer proposed in this application;

[0046] Figure 4 This is the structural formula of the second optical unit proposed in this application;

[0047] Figure 5 This is the structural formula of the third optical unit proposed in this application;

[0048] Figure 6 This is the structural formula of the fourth optical unit proposed in this application;

[0049] Figure 7 This is a schematic diagram illustrating the reaction principle for preparing a third compound using the first and second compounds as proposed in this application;

[0050] Figure 8 This is a schematic diagram illustrating the reaction principle for preparing the fifth compound using the third and fourth compounds as proposed in this application;

[0051] Figure 9 This is a schematic diagram illustrating the reaction principle for preparing the seventh compound using the fifth and sixth compounds as proposed in this application;

[0052] Figure 10 This is a schematic diagram illustrating the reaction principle for preparing the ninth compound using the seventh and eighth compounds as proposed in this application;

[0053] Figure 11 This is a schematic diagram of the reaction principle for preparing optical monomers using the ninth compound as proposed in this application;

[0054] Figure 12 This is a schematic flowchart of the preparation method of the optical monomer proposed in this application;

[0055] Figure 13 This is a schematic flowchart of the method for preparing the resin material proposed in this application. Detailed Implementation

[0056] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0057] It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the scope of the application. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0058] It should also be further understood that the term “and / or” as used in this application specification and the appended claims means any combination of one or more of the associated listed items and all possible combinations, and includes such combinations.

[0059] Please see Figure 1 and Figure 2 This application provides an optical monomer comprising: a hydroquinone group; two benzotriazole groups located at the ortho or meta positions of the hydroquinone group; a long-chain sulfur structure connected to the benzotriazole group; and a first substituent group located on the long-chain sulfur structure. Exemplarily, the long-chain sulfur structure may include at least three connected sulfur groups. It is understood that the hydroquinone group in this application has two active hydroxyl groups at the para position, with one hydroxyl group adjacent to the meta position of the other, and vice versa. That is, the benzotriazole group is ortho to one of the hydroxyl groups of the hydroquinone group and meta to the other, such that the two benzotriazole groups are adjacent to one of the hydroxyl groups respectively, and are close enough to facilitate reaction.

[0060] The optical monomer proposed in this application mainly comprises hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. The benzotriazole group, in combination with the hydroquinone group, achieves effective UV protection. The principle is that the nitrogen in the benzotriazole molecule is close to the hydroxyl group on the hydroquinone group, easily forming intrinsic hydrogen bonds and a chelate ring. Upon absorbing UV light, the molecule undergoes thermal vibration, the internal hydrogen bonds break, the chelate ring opens, and the UV energy is converted into heat energy, thereby improving UV resistance.

[0061] Furthermore, the optical monomer contains a long-chain sulfur structure. In this structure, the bond angles and bond lengths between sulfur atoms can vary within a certain range, allowing the sulfur chains to stretch and bend like springs. This free-rotation property enhances the polymer's flexibility. Additionally, the hydroxyl groups in the optical monomer can form hydrogen bonds with the substrate, improving adhesion. The optical monomer is rich in sulfur and has a benzene ring structure. Due to its high molar refractive index, the optical monomer also possesses a very high refractive index.

[0062] In some embodiments, two benzotriazole groups are symmetrically disposed at the ortho or meta positions of the hydroquinone group, and each benzotriazole group is connected to a long-chain sulfur structure at the ortho or meta position. The first substituents on each long-chain sulfur structure are of the same type. Thus, the optical monomer of this embodiment forms a generally symmetrical structure centered on the hydroquinone group, with two benzotriazole groups symmetrically disposed at the ortho or meta positions of the hydroquinone group. This increases the benzotriazole content in the entire molecule, resulting in the formation of more chelate rings and the absorption of more ultraviolet light energy during photocuring, opening the chelate rings and improving UV resistance. Simultaneously, the increased content of the long-chain sulfur structures connected to the benzotriazole groups allows for the inclusion of more first substituents, enabling the grafting of more functional groups and increasing the curing rate and stress resistance of the molecule. The overall symmetrical molecular structure and the relatively uniform properties on both sides of the molecule enhance stress resistance in different directions.

[0063] For example, such as Figure 1 , Figure 3 and Figure 4 As shown, each benzotriazole group has a long-chain sulfur structure attached to the meta position of the benzene ring, which makes the symmetry of the entire optical monomer stronger.

[0064] For example, such as Figure 2 , Figure 5 and Figure 6 As shown, each benzotriazole group has a long-chain sulfur structure attached to the ortho position of the benzene ring, which gives the entire optical monomer extremely high symmetry.

[0065] In some embodiments, the first substituent group comprises a substituted or unsubstituted acrylate group. Exemplarily, the acrylate group is attached to the sulfur atom at the end of a long-chain sulfur structure. This acrylate group can link surrounding small molecules together to form a large network structure, thereby increasing the mixing rate of the optical monomer with other small molecules.

[0066] Please see Figure 1 and Figure 2 In some embodiments, the optical unit has the following general formula:

[0067] or,

[0068]

[0069] Among them, R1, R2, R3, R4, R5, and R6 are each independently selected from substituted or unsubstituted hydrogen, C 1-20 Alkylene, substituted or unsubstituted C 1-30 alkylene ether group, substituted or unsubstituted C 6-30 aryl and substituted or unsubstituted C7-30 One of the arylalkyl groups, wherein R1, R2, R3, R4, R5, and R6 may be the same structure or different structures.

[0070] R7 and R8 are each independently selected from hydrogen or methyl. R7 and R8 can be the same structure or different structures.

[0071] R9 and R10 are each independently selected from substituted or unsubstituted hydrogen, C 1-20 Alkyl, substituted or unsubstituted C 1-30 alkyl ether group, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 One of aralkyl and fluoroalkyl, wherein R9 and R10 may be the same structure or different structures.

[0072] n is a positive integer, 1≤n≤50.

[0073] For example, n can be 1, 2, 3, 4, 5, 7, 8, 9, 10, 11, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, or 50.

[0074] The optical monomer proposed in this application mainly comprises hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material high refractive index, good UV resistance, and flexibility. The benzotriazole group exhibits excellent UV resistance; the principle is that nitrogen and hydroxyl groups in the molecule can form intrinsic hydrogen bonds, creating a chelate ring. Upon absorbing UV light, the molecule undergoes thermal vibration, the internal hydrogen bonds break, the chelate ring opens, and UV energy is converted into heat energy, thus enhancing UV resistance.

[0075] In this embodiment, the optical monomer is generally symmetrically structured with a hydroquinone group at its center. Two benzotriazole groups are symmetrically positioned at the ortho or meta positions of the hydroquinone group, thereby increasing the benzotriazole content in the molecule. This results in the formation of more chelate rings within the molecule, allowing for the absorption of more UV light energy during photocuring, opening the chelate rings, and thus improving UV resistance. Simultaneously, the content of long-chain sulfur structures connected to the benzotriazole groups is also increased, allowing for the inclusion of more first-substituent groups and the grafting of more functional groups, increasing the curing rate and the molecule's stress resistance. The overall symmetrical molecular structure and uniform properties on both sides of the molecule enhance stress resistance in different directions.

[0076] Furthermore, the optical monomer contains a long-chain sulfur structure. In this structure, the bond angles and bond lengths between sulfur atoms can vary within a certain range, allowing the sulfur chains to stretch and bend like springs. This free-rotation property enhances the polymer's flexibility. Additionally, the hydroxyl groups in the optical monomer can form hydrogen bonds with the substrate, improving adhesion. The optical monomer is rich in sulfur and has a benzene ring structure. Due to its high molar refractive index, the optical monomer also possesses a very high refractive index.

[0077] As one implementation method, n can be 1, which can make the synthesis more convenient and reduce production costs while maintaining a high refractive index, good flexibility and UV resistance.

[0078] In an optional embodiment, the optical unit may include a first optical unit (such as...) Figure 3 As shown), the second optical unit (such as Figure 4 As shown), the third optical unit (such as...) Figure 5 (as shown) and the fourth optical unit (as shown) Figure 6 Any one of the following (shown). Of course, in other embodiments, the optical monomer can also be other structures, mainly including hydroquinone groups, benzotriazole groups and long-chain sulfur structures, within the range of the above general formula.

[0079] As one implementation method, the structural formula of the first optical unit can be:

[0080]

[0081] The first optical monomer contains hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. In the field of AR glasses displays, the resin material obtained by the first optical monomer has a refractive index greater than 1.7. A higher refractive index can effectively improve light efficiency, reduce lens thickness, lower costs, and achieve a better wearing experience.

[0082] As one implementation method, the structural formula of the second optical unit can be:

[0083]

[0084] The second optical monomer contains hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. In the field of AR glasses displays, the resin material obtained by the second optical monomer has a refractive index greater than 1.7. A higher refractive index can effectively improve light efficiency, reduce lens thickness, lower costs, and achieve a better wearing experience.

[0085] As one implementation method, the structural formula of the third optical unit can be:

[0086]

[0087] The third optical monomer contains hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, as well as good UV resistance and flexibility. In the field of AR glasses displays, the resin material obtained by the third optical monomer has a refractive index greater than 1.7. A higher refractive index can effectively improve light efficiency, reduce lens thickness, lower costs, and achieve a better wearing experience.

[0088] As one implementation method, the structural formula of the fourth optical unit can be:

[0089]

[0090] The fourth optical monomer contains hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. In the field of AR glasses displays, the resin material made with the fourth optical monomer has a refractive index greater than 1.7. A higher refractive index can effectively improve light efficiency, reduce lens thickness, lower costs, and provide a better wearing experience.

[0091] In some embodiments, the absorption wavelength of the optical monomer is 300nm-400nm. Since light with wavelengths less than 400nm has high energy, it can break chemical bonds and affect the stability of the compound. However, the optical monomer in this application has an absorption wavelength of 300nm-400nm, which avoids breaking chemical bonds after absorbing ultraviolet light, thus improving the stability of the optical monomer. Furthermore, the resin material obtained using the optical monomer of this application does not become colored and is therefore less prone to yellowing.

[0092] In the prior art, organic materials absorb blue light in the 450nm-490nm wavelength range and violet light in the 400nm-450nm wavelength range. The remaining light mixes and appears yellow, which is called yellowing. However, the optical monomer of the present application has an absorption wavelength of 300nm-400nm. It does not absorb violet light with a wavelength greater than 400nm, nor does it absorb blue light with a wavelength of 450-490nm, nor does it absorb natural light with a longer wavelength. Therefore, the resin material made will not be colored and is not prone to yellowing.

[0093] Please see Figures 7 to 12 This application also provides a method for preparing an optical monomer, comprising the following steps:

[0094] S1, using the first compound and the second compound to generate the third compound;

[0095] The structural formula of the first compound is:

[0096] The structural formula of the second compound is:

[0097] The structural formula of the third compound is:

[0098] For example, in step S1, the first compound (33.6 g, 200 mmol) was added to 800 ml of acetic acid solvent and stirred at room temperature for 10 min. Then the second compound (40.2 g, 200 mmol) was added and stirred for 60 min until a slurry appeared. Stirring was continued overnight. Stirring was stopped, brine was added, and the mixture was extracted with diethyl ether and purified by column chromatography to obtain an orange-yellow solid. The solid was recrystallized with ethanol to obtain the third compound (64.26 g, 140 mmol, 70% yield).

[0099] S2, using the third compound and the fourth compound to generate the fifth compound;

[0100] The structural formula of the fourth compound is:

[0101] The structural formula of the fifth compound is:

[0102] For example, in step S2, a third compound (64.26 g, 140 mmol), ethanol (1000 ml), and sodium hydroxide solution (4 N, 1000 ml) are added to a reaction vessel and heated to 80 °C. Then, a fourth compound (66.5 g, 4.4 eq) is added and stirred for 15 min to obtain a colorless solid suspension. The fourth compound (33.3 g, 2.2 eq) is then added to obtain a pale yellow liquid. The reaction is stopped, and brine is added. The mixture is extracted with diethyl ether and purified by column chromatography to obtain a fifth compound (52.36 g, 85% yield).

[0103] S3, using the fifth compound and the sixth compound to generate the seventh compound;

[0104] The structural formula of the sixth compound is:

[0105] The structural formula of the seventh compound is:

[0106] Exemplarily, in step S3, under a nitrogen atmosphere, compound six (14 g, 143 mmol), triethylamine (15.8 g, 157 mmol), and 1000 ml of anhydrous methanol were added and stirred for 1 h. Then, compound five (52.36 g, 119 mmol) was added at 0 °C and stirred for 1 h. The mixture was then brought back to room temperature and stirred for another 18 h. After the reaction was complete, saturated brine was added to the system, and the mixture was extracted with dichloromethane. The organic layer was dried over magnesium sulfate. The solvent was removed under reduced pressure, and the mixture was purified by column chromatography to give compound seven (40.27 g, 60% yield).

[0107] S4, using the seventh compound and the eighth compound to generate the ninth compound;

[0108] The structural formula of the eighth compound is:

[0109] The structural formula of the ninth compound is:

[0110] For example, in step S4, the seventh compound (40.27 g, 71.4 mmol) and the eighth compound (14.13 g, 157 mmol) were reacted in dichloromethane solvent with triethylamine for 18 h to give the ninth compound (38.38 g, 80% yield).

[0111] S5, using the ninth compound to generate an optical monomer;

[0112] The structural formula of the optical unit is:

[0113] For example, in step S5, the ninth compound (38.38 g, 57.12 mmol), 540 ml of hydrobromic acid and 420 ml of acetic acid were added to the reaction flask, and the mixture was boiled and refluxed for 28 h to obtain the first optical monomer (27.58 g, 75% yield).

[0114] This application also provides a method for preparing an optical monomer, comprising the following steps:

[0115] S1, using the first compound and the second compound to generate the third compound;

[0116] The structural formula of the first compound is:

[0117] The structural formula of the second compound is:

[0118] The structural formula of the third compound is:

[0119] For example, in step S1, the first compound (33.6 g, 200 mmol) was added to 800 ml of acetic acid solvent and stirred at room temperature for 10 min. Then the second compound (40.2 g, 200 mmol) was added and stirred for 60 min until a slurry appeared. Stirring was continued overnight. Stirring was stopped, brine was added, and the mixture was extracted with diethyl ether and purified by column chromatography to obtain an orange-yellow solid. The solid was recrystallized with ethanol to obtain the third compound (64.26 g, 140 mmol, 70% yield).

[0120] S2, using the third compound and the fourth compound to generate the fifth compound;

[0121] The structural formula of the fourth compound is:

[0122] The structural formula of the fifth compound is:

[0123] For example, in step S2, a third compound (64.26 g, 140 mmol), ethanol (1000 ml), and sodium hydroxide solution (4 N, 1000 ml) are added to a reaction vessel and heated to 80 °C. Then, a fourth compound (66.5 g, 4.4 eq) is added and stirred for 15 min to obtain a colorless solid suspension. The fourth compound (33.3 g, 2.2 eq) is then added to obtain a pale yellow liquid. The reaction is stopped, and brine is added. The mixture is extracted with diethyl ether and purified by column chromatography to obtain a fifth compound (52.36 g, 85% yield).

[0124] S3, using the fifth compound and the sixth compound to generate the seventh compound;

[0125] The structural formula of the sixth compound is:

[0126] The structural formula of the seventh compound is:

[0127] Exemplarily, in step S3, under a nitrogen atmosphere, compound six (14 g, 143 mmol), triethylamine (15.8 g, 157 mmol), and 1000 ml of anhydrous methanol were added and stirred for 1 h. Then, compound five (52.36 g, 119 mmol) was added at 0 °C and stirred for 1 h. The mixture was then brought back to room temperature and stirred for another 18 h. After the reaction was complete, saturated brine was added to the system, and the mixture was extracted with dichloromethane. The organic layer was dried over magnesium sulfate. The solvent was removed under reduced pressure, and the mixture was purified by column chromatography to give compound seven (40.27 g, 60% yield).

[0128] S4, using the seventh compound and the eighth compound to generate the ninth compound;

[0129] The structural formula of the eighth compound is:

[0130] The structural formula of the ninth compound is:

[0131] For example, in step S4, the seventh compound (40.27 g, 71.4 mmol) and the eighth compound (14.13 g, 157 mmol) were reacted in dichloromethane solvent with triethylamine for 18 h to give the ninth compound (38.38 g, 80% yield).

[0132] S5, using the ninth compound to generate an optical monomer;

[0133] The structural formula of the optical unit is:

[0134] For example, in step S5, the ninth compound (38.38 g, 57.12 mmol), 540 ml of hydrobromic acid and 420 ml of acetic acid were added to the reaction flask, and the mixture was boiled and refluxed for 28 h to obtain the second optical monomer (27.58 g, 75% yield).

[0135] This application also provides a method for preparing an optical monomer, comprising the following steps:

[0136] S1, using the first compound and the second compound to generate the third compound;

[0137] The structural formula of the first compound is:

[0138] The structural formula of the second compound is:

[0139] The structural formula of the third compound is:

[0140] For example, in step S1, the first compound (33.6 g, 200 mmol) was added to 800 ml of acetic acid solvent and stirred at room temperature for 10 min. Then the second compound (40.2 g, 200 mmol) was added and stirred for 60 min until a slurry appeared. Stirring was continued overnight. Stirring was stopped, brine was added, and the mixture was extracted with diethyl ether and purified by column chromatography to obtain an orange-yellow solid. The solid was recrystallized with ethanol to obtain the third compound (64.26 g, 140 mmol, 70% yield).

[0141] S2, using the third compound and the fourth compound to generate the fifth compound;

[0142] The structural formula of the fourth compound is:

[0143] The structural formula of the fifth compound is:

[0144] For example, in step S2, a third compound (64.26 g, 140 mmol), ethanol (1000 ml), and sodium hydroxide solution (4 N, 1000 ml) are added to a reaction vessel and heated to 80 °C. Then, a fourth compound (66.5 g, 4.4 eq) is added and stirred for 15 min to obtain a colorless solid suspension. The fourth compound (33.3 g, 2.2 eq) is then added to obtain a pale yellow liquid. The reaction is stopped, and brine is added. The mixture is extracted with diethyl ether and purified by column chromatography to obtain a fifth compound (52.36 g, 85% yield).

[0145] S3, using the fifth compound and the sixth compound to generate the seventh compound;

[0146] The structural formula of the sixth compound is:

[0147] The structural formula of the seventh compound is:

[0148] Exemplarily, in step S3, under a nitrogen atmosphere, compound six (14 g, 143 mmol), triethylamine (15.8 g, 157 mmol), and 1000 ml of anhydrous methanol were added and stirred for 1 h. Then, compound five (52.36 g, 119 mmol) was added at 0 °C and stirred for 1 h. The mixture was then brought back to room temperature and stirred for another 18 h. After the reaction was complete, saturated brine was added to the system, and the mixture was extracted with dichloromethane. The organic layer was dried over magnesium sulfate. The solvent was removed under reduced pressure, and the mixture was purified by column chromatography to give compound seven (40.27 g, 60% yield).

[0149] S4, using the seventh compound and the eighth compound to generate the ninth compound;

[0150] The structural formula of the eighth compound is:

[0151] The structural formula of the ninth compound is:

[0152] For example, in step S4, the seventh compound (40.27 g, 71.4 mmol) and the eighth compound (14.13 g, 157 mmol) were reacted in dichloromethane solvent with triethylamine for 18 h to give the ninth compound (38.38 g, 80% yield).

[0153] S5, using the ninth compound to generate an optical monomer;

[0154] The structural formula of the optical unit is:

[0155] For example, in step S5, the ninth compound (38.38 g, 57.12 mmol), 540 ml of hydrobromic acid and 420 ml of acetic acid were added to the reaction flask, and the mixture was boiled and refluxed for 28 h to obtain the first optical monomer (27.58 g, 75% yield).

[0156] This application also provides a method for preparing an optical monomer, comprising the following steps:

[0157] S1, using the first compound and the second compound to generate the third compound;

[0158] The structural formula of the first compound is:

[0159] The structural formula of the second compound is:

[0160] The structural formula of the third compound is:

[0161] For example, in step S1, the first compound (33.6 g, 200 mmol) was added to 800 ml of acetic acid solvent and stirred at room temperature for 10 min. Then the second compound (40.2 g, 200 mmol) was added and stirred for 60 min until a slurry appeared. Stirring was continued overnight. Stirring was stopped, brine was added, and the mixture was extracted with diethyl ether and purified by column chromatography to obtain an orange-yellow solid. The solid was recrystallized with ethanol to obtain the third compound (64.26 g, 140 mmol, 70% yield).

[0162] S2, using the third compound and the fourth compound to generate the fifth compound;

[0163] The structural formula of the fourth compound is:

[0164] The structural formula of the fifth compound is:

[0165] For example, in step S2, a third compound (64.26 g, 140 mmol), ethanol (1000 ml), and sodium hydroxide solution (4 N, 1000 ml) are added to a reaction vessel and heated to 80 °C. Then, a fourth compound (66.5 g, 4.4 eq) is added and stirred for 15 min to obtain a colorless solid suspension. The fourth compound (33.3 g, 2.2 eq) is then added to obtain a pale yellow liquid. The reaction is stopped, and brine is added. The mixture is extracted with diethyl ether and purified by column chromatography to obtain a fifth compound (52.36 g, 85% yield).

[0166] S3, using the fifth compound and the sixth compound to generate the seventh compound;

[0167] The structural formula of the sixth compound is:

[0168] The structural formula of the seventh compound is:

[0169] Exemplarily, in step S3, under a nitrogen atmosphere, compound six (14 g, 143 mmol), triethylamine (15.8 g, 157 mmol), and 1000 ml of anhydrous methanol were added and stirred for 1 h. Then, compound five (52.36 g, 119 mmol) was added at 0 °C and stirred for 1 h. The mixture was then brought back to room temperature and stirred for another 18 h. After the reaction was complete, saturated brine was added to the system, and the mixture was extracted with dichloromethane. The organic layer was dried over magnesium sulfate. The solvent was removed under reduced pressure, and the mixture was purified by column chromatography to give compound seven (40.27 g, 60% yield).

[0170] S4, using the seventh compound and the eighth compound to generate the ninth compound;

[0171] The structural formula of the eighth compound is:

[0172] The structural formula of the ninth compound is:

[0173] For example, in step S4, the seventh compound (40.27 g, 71.4 mmol) and the eighth compound (14.13 g, 157 mmol) were reacted in dichloromethane solvent with triethylamine for 18 h to give the ninth compound (38.38 g, 80% yield).

[0174] S5, using the ninth compound to generate an optical monomer;

[0175] The structural formula of the optical unit is:

[0176] For example, in step S5, the ninth compound (38.38 g, 57.12 mmol), 540 ml of hydrobromic acid and 420 ml of acetic acid were added to the reaction flask, and the mixture was boiled and refluxed for 28 h to obtain the first optical monomer (27.58 g, 75% yield).

[0177] This application also provides a composition comprising a solvent, a photoinitiator, a leveling agent, a silane coupling agent, and the aforementioned optical monomer. Thus, a resin material with a high refractive index and good UV resistance and flexibility can be prepared from the composition containing the aforementioned optical monomer.

[0178] In an optional embodiment, the composition may include the following components by weight percentage: solvent 10%-80%; photoinitiator 0.1%-10%; leveling agent 0.1%-5%; silane coupling agent 0.1%-5%; optical monomer 10%-80%.

[0179] In an optional embodiment, the composition may include the following components by weight percentage: 10% solvent; 5% photoinitiator; 3% leveling agent; 2% silane coupling agent; and 80% optical monomer.

[0180] In an optional embodiment, the composition may include the following components by weight percentage: 80% solvent; 5% photoinitiator; 3% leveling agent; 2% silane coupling agent; and 10% optical monomer.

[0181] In an optional embodiment, the composition may include the following components by weight percentage: 50% solvent; 0.1% photoinitiator; 0.5% leveling agent; 0.4% silane coupling agent; and 49% optical monomer.

[0182] In an optional embodiment, the composition may include the following components by weight percentage: 50% solvent; 0.5% photoinitiator; 0.1% leveling agent; 0.4% silane coupling agent; and 49% optical monomer.

[0183] In an optional embodiment, the composition may include the following components by weight percentage: 50% solvent; 0.5% photoinitiator; 0.4% leveling agent; 0.1% silane coupling agent; and 49% optical monomer.

[0184] In an optional embodiment, the composition may include the following components by weight percentage: 50% solvent; 0.3% photoinitiator; 0.3% leveling agent; 0.4% silane coupling agent; and 49% optical monomer.

[0185] In an optional embodiment, the composition may include the following components by weight percentage: 40% solvent; 10% photoinitiator; 5% leveling agent; 5% silane coupling agent; and 40% optical monomer.

[0186] In an optional embodiment, the composition may include the following components by weight: 10g solvent; 10g optical monomer; 0.3g photoinitiator; 0.03g leveling agent; and 0.05g silane coupling agent.

[0187] In optional embodiments, the solvent is at least one selected from propylene glycol methyl ether acetate, ethyl acetate, dichloromethane, ethanol, isopropanol, butyl acetate, tetrahydrofuran, dimethyl sulfoxide, N,N-dimethylformamide, tetramethylethylenediamine, and carbon tetrachloride.

[0188] In an optional embodiment, the photoinitiator has an absorption wavelength of 368 nm-420 nm. This allows the photoinitiator to initiate the polymerization reaction under light irradiation without affecting the overall light transmittance of the resin material.

[0189] In optional embodiments, the photoinitiator is thioxanone, thioxanone derivatives, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxyl chloride, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxy-2-methyl ester, diethoxyacetophenone, 4-tert-butyltrichloroacetophenone, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, 2-dimethylaminoethylbenzoate, 4,6-trimethylbenzoyl-dimethoxyphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, benzoyl diphenylphosphine oxide, 2,4,6-trimethylbenzoyl-diethoxyphenylphosphine oxide, benzoyl diethoxyphosphine oxide, benzophenone, benzophenone derivatives, benzoin, benzoin derivatives, anthraquinone, anthraquinone derivatives, benzoin, benzoin methyl The following are included: benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, p-dimethylaminoethyl benzoate, diphenyl disulfide, camphorquinone, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxylic acid, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxy-2-bromoethyl ester, 2-methyl-1-[4-(methylthio)phenyl13-yl]-2-morpholinylpropane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-1-butanone, α-aminoalkylphenyl ketone derivatives, phenyl-glyoxylic acid-methyl ester or oxy-phenyl-acetic acid 2-[2-oxy-2-phenyl-ethoxy-ethoxy]-ethyl ester and oxy-phenyl-acetic acid 2-[2-hydroxy-ethoxy]-ethyl ester.

[0190] In an optional embodiment, the leveling agent is one of BYK331, BYK370, BYK3505, and BYK348. Specifically, BYK331, BYK370, BYK3505, and BYK348 are leveling agents manufactured by BYK AG, Germany. The BYK series of leveling agents have excellent leveling properties.

[0191] In an optional embodiment, the silane coupling agent is one of KH570, KH550, and KH560. Specifically, KH570, KH550, and KH560 are silane coupling agents produced by the Chinese Academy of Sciences.

[0192] KH570, also known as γ-methacryloyloxypropyltrimethoxysilane, is an organic functional group silane coupling agent. KH570 is used to improve the mechanical and electrical properties of resin materials.

[0193] KH550, also known as γ-aminopropyltriethoxysilane, can enhance the adhesion of resin materials and improve the mechanical, water-resistant, and anti-aging properties of products.

[0194] KH560, also known as γ-glycidyl etheroxypropyltrimethoxysilane, can improve the strength properties of resin materials.

[0195] This application also provides a resin material obtained by curing the above-described composition. Since the resin material is made from the above-described composition, which includes the aforementioned optical monomers, the resin material proposed in this application has a high refractive index, as well as good UV resistance and flexibility.

[0196] Please see Figure 13 This application also provides a method for preparing a resin material, comprising the following steps:

[0197] S10, providing the above-described composition, which involves placing the solvent, photoinitiator, leveling agent, silane coupling agent, and optical monomer in a reaction vessel.

[0198] S20, after mixing and filtration, forms a mixed liquid.

[0199] S30, the mixture is coated onto the substrate.

[0200] S40, the mixture coated on the substrate is cured to obtain a resin material.

[0201] In the preparation method of the resin material in this application embodiment, the selection of solvent, photoinitiator, leveling agent and silane coupling agent can refer to the above embodiment, and will not be repeated here. The optical monomer can be any one of the first optical monomer, the second optical monomer, the third optical monomer and the fourth optical monomer.

[0202] The optical monomers mainly contain hydroquinone groups, benzotriazole groups, and long-chain sulfur structures to give the resulting resin material a high refractive index, good UV resistance, and flexibility. Photoinitiators are used to initiate the polymerization reaction under light irradiation, while leveling agents help the mixture spread evenly on the substrate, reducing bubbles and surface defects. Silane coupling agents enhance the adhesion between materials, thereby improving the overall performance of the resulting resin material.

[0203] In an optional embodiment, step S30, coating the mixture onto the substrate, includes: coating the mixture onto the wafer and performing spin coating, with a spin coating speed of 1000rpm-10000rpm and a spin coating time of 10s-300s. Exemplarily, the spin coating speed can be 1000rpm, 2000rpm, 3000rpm, 4000rpm, 5000rpm, 6000rpm, 7000rpm, 8000rpm, 9000rpm, or 10000rpm, etc., and the spin coating time can be 10s, 20s, 30s, 40s, 50s, 60s, 70s, 80s, 90s, 100s, 2000s, or 300s, etc.

[0204] In an optional embodiment, in step S20, the mixture can be vigorously mixed for 2 hours under light-protected conditions, and then filtered using a 0.45µm needle filter to obtain the mixture.

[0205] In an optional embodiment, in step S30, the mixture can be spin-coated onto a 4-inch wafer at a spin speed of 3000 rpm for 60 seconds. Since the spin speed and spin time affect the thickness and uniformity of the resulting film, this embodiment sets the spin speed to 3000 rpm and the spin time to 60 seconds to coat the mixture onto the wafer to obtain better film thickness and uniformity.

[0206] In an optional embodiment, in step S40, ultraviolet curing (365nm) can be performed under oxygen-free conditions to obtain a resin film with a high refractive index.

[0207] This application also provides an application of resin materials in optical waveguide technology. The resin material is used as an adhesive, filter, display material, or anti-UV film layer. For example, when the resin material is used as an adhesive, after coating and light curing, it exhibits strong adhesion and bonding force, resulting in good adhesion to the substrate. When the resin material is used as a filter, it can absorb a certain amount of ultraviolet light after curing, preventing ultraviolet light transmission. When the resin material is used as a display material, it has high light transmittance and can be attached to a display screen without affecting light transmission. When the resin material is used as an anti-UV film layer, it can achieve greater absorption of ultraviolet light, effectively preventing ultraviolet light transmission and reducing the likelihood of yellowing.

[0208] For example, when resin materials are used in AR glasses displays, optical waveguide technology based on the principle of diffraction utilizes the resin material as a substrate and a grating with a specific structure to achieve the coupling, total internal reflection, and coupling out of light, thereby transmitting the light signal emitted by the image source to the human eye to form a virtual image. In the field of AR glasses displays, the high refractive index of resin materials can effectively improve light efficiency, reduce lens thickness, lower costs, and achieve a good wearing experience.

[0209] The optical monomers and resin materials of this application will be further described below with reference to specific embodiments and test data.

[0210] Example 1

[0211] Propylene glycol methyl ether acetate (10 g), first optical monomer (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions with ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0212] Example 2

[0213] Propylene glycol methyl ether acetate (10 g), second optical monomer (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions using ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0214] Example 3

[0215] Propylene glycol methyl ether acetate (10 g), third optical monomer (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions using ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0216] Example 4

[0217] Propylene glycol methyl ether acetate (10 g), fourth optical monomer (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions with ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0218] Comparative Example 1

[0219] The diluent monomer o-phenylphenoxyethyl acrylate (OPPEA) purchased from Sartoma was used instead of the optical monomer, while the rest of the preparation process remained unchanged.

[0220] Propylene glycol methyl ether acetate (10 g), OPPEA (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions using ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0221] Comparative Example 2

[0222] The optical monomer was replaced with ETERMER 2206 (bifunctional acrylate) purchased from Changxing Chemical, while the rest of the preparation process remained unchanged.

[0223] Propylene glycol methyl ether acetate (10 g), ETERMER 2206 (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions using ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0224] Comparative Example 3

[0225] The optical monomer was replaced with the diluent monomer 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene purchased from Tokyo Chemical Industry Co., Ltd. (TCI), while the rest of the preparation process remained unchanged.

[0226] Propylene glycol methyl ether acetate (10 g), 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene (10 g), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (0.3 g), BYK370 (0.03 g), and KH570 (0.05 g) were added to a 50 mL volumetric flask. The mixture was vigorously mixed for 2 h under light-protected conditions, and then filtered through a 0.45 μm syringe filter to obtain a high-refractive-index resin mixture. The mixture was then homogenized on a 4-inch glass wafer (3500 rpm, 60 s) and cured under anaerobic conditions using ultraviolet light (365 nm) to obtain a high-refractive-index resin film.

[0227] The high-refractive-index resin films prepared in Examples 1 to 4 and Comparative Examples 1 to 3 were subjected to performance tests, and the test results are shown in Table 1.

[0228] The performance testing methods and standards are as follows:

[0229] (1) Refractive index: Tested using an ellipsometer (ME-L Muller matrix spectral ellipsometer, Yiguang Technology);

[0230] (2) Light transmittance: High-precision haze meter (HM-150, Murakami Color MCRL);

[0231] (3) Yellowness: High-precision haze meter (HM-150, Murakami Color MCRL);

[0232] (4) Haze: High-precision haze meter (HM-150, Murakami Color MCRL);

[0233] (5) Adhesion: Cross-cut adhesion test;

[0234] (6) Ultraviolet aging: Ultraviolet aging test chamber (light source power 650mw, irradiation for 4h, stop for 4h as one cycle, total 24 cycles);

[0235] (7) Bending test: Bending test machine (LW-1225 Suzhou Feitang Testing Equipment Co., Ltd.).

[0236] Table 1

[0237]

[0238] As can be seen from Examples 1-4 and Comparative Examples 1-3 in Table 1, the high-refractive-index resin films prepared in Examples 1 to 4 of this application have a significantly higher refractive index than the high-refractive-index resin films prepared in Comparative Examples 1 to 3. This is because the optical monomers in Examples 1 to 4 of this application contain benzene rings and long-chain thioalkyl groups, which have very high molar refractive indices, thus resulting in high molecular refractive indices.

[0239] The high-refractive-index resin films prepared in Examples 1 to 4 of this application exhibit significantly higher UV resistance than those prepared in Comparative Examples 1 to 3. This is because the benzotriazole group in the optical monomer molecules of Examples 1 to 4 of this application possesses excellent UV resistance. The principle behind this is that nitrogen and hydroxyl groups in the molecule can form intrinsic hydrogen bonds, resulting in a chelate ring. Upon absorbing UV light, the molecule undergoes thermal vibration, the internal hydrogen bonds break, the chelate ring opens, and the UV energy is converted into heat energy and released.

[0240] The high-refractive-index resin films prepared in Examples 1 to 4 of this application have significantly higher adhesion than the high-refractive-index resin films prepared in Comparative Examples 1 to 3. This is because the optical monomers in Examples 1 to 4 of this application contain hydroxyl structures, which can form hydrogen bonds with the substrate, thereby achieving chemical bonding.

[0241] The high-refractive-index resin films prepared in Examples 1 to 4 of this application exhibit significantly higher bending resistance than those prepared in Comparative Examples 1 to 3. This is because the optical monomers in Examples 1 to 4 of this application have long-chain structures, allowing their chemical bonds to rotate freely, thus achieving excellent impact resistance. In contrast, commercially available high-refractive-index resins are mostly composed of stacked benzene rings, exhibiting high rigidity and restricted chemical bond rotation, making them prone to film breakage when subjected to external destructive impacts.

[0242] Therefore, the optical monomers of this application, through the hydroquinone groups, benzotriazole groups and long-chain sulfur structures in their molecules, enable the resulting resin materials to have high refractive index, good UV resistance and flexibility.

[0243] Without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of the different embodiments or examples.

[0244] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. An optical unit, characterized in that, The optical unit has the following general formula: ;or, ； Among them, R1, R2, R3, R4, R5, and R6 are each independently selected from hydrogen or C. 1-20 Alkylene; R7 and R8 are each independently selected from hydrogen or methyl; R9 and R10 are each independently selected from hydrogen or C. 1-20 alkyl; n=1。 2. The optical unit as described in claim 1, characterized in that, The structural formula of the optical unit is as follows: ;or, ;or, ;or, 。 3. The optical unit as described in claim 1 or 2, characterized in that, The absorption wavelength of the optical monomer is 300 nm-400 nm.

4. A method for preparing an optical monomer, characterized in that, Includes the following steps: A third compound is generated by reacting the first compound with the second compound; The structural formula of the first compound is: ; The structural formula of the second compound is: ; The structural formula of the third compound is: ; The fifth compound is generated by reacting the third compound with the fourth compound; The structural formula of the fourth compound is: ; The structural formula of the fifth compound is: ; The fifth compound and the sixth compound are used to generate the seventh compound; The structural formula of the sixth compound is: ; The structural formula of the seventh compound is: ; The seventh compound and the eighth compound are used to generate the ninth compound; The structural formula of the eighth compound is: ; The structural formula of the ninth compound is: ; The optical monomer is generated using the ninth compound; The structural formula of the optical unit is: .

5. A method for preparing an optical monomer, characterized in that, Includes the following steps: A third compound is generated by reacting the first compound with the second compound; The structural formula of the first compound is: ; The structural formula of the second compound is: ; The structural formula of the third compound is: ; The fifth compound is generated by reacting the third compound with the fourth compound; The structural formula of the fourth compound is: ; The structural formula of the fifth compound is: ; The fifth compound and the sixth compound are used to generate the seventh compound; The structural formula of the sixth compound is: ; The structural formula of the seventh compound is: ; The seventh compound and the eighth compound are used to generate the ninth compound; The structural formula of the eighth compound is: ; The structural formula of the ninth compound is: ; The optical monomer is generated using the ninth compound; The structural formula of the optical unit is: .

6. A method for preparing an optical monomer, characterized in that, Includes the following steps: A third compound is generated by reacting the first compound with the second compound; The structural formula of the first compound is: ; The structural formula of the second compound is: ; The structural formula of the third compound is: ; The fifth compound is generated by reacting the third compound with the fourth compound; The structural formula of the fourth compound is: ; The structural formula of the fifth compound is: ; The fifth compound and the sixth compound are used to generate the seventh compound; The structural formula of the sixth compound is: ; The structural formula of the seventh compound is: ; The seventh compound and the eighth compound are used to generate the ninth compound; The structural formula of the eighth compound is: ; The structural formula of the ninth compound is: ; The optical monomer is generated using the ninth compound; The structural formula of the optical unit is: .

7. A method for preparing an optical monomer, characterized in that, Includes the following steps: A third compound is generated by reacting the first compound with the second compound; The structural formula of the first compound is: ; The structural formula of the second compound is: ; The structural formula of the third compound is: ; The fifth compound is generated by reacting the third compound with the fourth compound; The structural formula of the fourth compound is: ; The structural formula of the fifth compound is: ; The fifth compound and the sixth compound are used to generate the seventh compound; The structural formula of the sixth compound is: ; The structural formula of the seventh compound is: ; The seventh compound and the eighth compound are used to generate the ninth compound; The structural formula of the eighth compound is: ; The structural formula of the ninth compound is: ; The optical monomer is generated using the ninth compound; The structural formula of the optical unit is: .

8. A composition, characterized in that, The composition comprises a solvent, a photoinitiator, a leveling agent, a silane coupling agent, and an optical monomer as described in any one of claims 1 to 3.

9. The composition according to claim 8, characterized in that, The composition comprises the following components by weight percentage: Solvent 10% - 80%; Photoinitiator 0.1%-10%; Leveling agent 0.1%-5%; Silane coupling agent 0.1%-5%; The optical monomers as described in any one of claims 1 to 3 comprise 10%-80%.

10. The composition according to claim 8, characterized in that, The solvent is at least one selected from propylene glycol methyl ether acetate, ethyl acetate, dichloromethane, ethanol, isopropanol, butyl acetate, tetrahydrofuran, dimethyl sulfoxide, N,N-dimethylformamide, tetramethylethylenediamine, and carbon tetrachloride; and / or, The photoinitiator has an absorption wavelength of 368nm-420nm; and / or, The photoinitiator is thioxanone, thioxanone derivatives, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxyl chloride, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxy-2-methyl ester, diethoxyacetophenone, 4-tert-butyltrichloroacetophenone, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, 2-dimethylaminoethylbenzoate, 4,6-trimethylbenzoyldimethoxyphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, benzoyldiphenylphosphine oxide, 2,4 ,6-Trimethylbenzoyldiethoxyphenylphosphine oxide, benzoyldiethoxyphosphine oxide, benzophenone, benzophenone derivatives, benzoyl, benzoyl derivatives, anthraquinone, anthraquinone derivatives, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, p-dimethylaminoethyl benzoate, diphenyl disulfide, camphorquinone, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxylic acid, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxylic acid, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxylic acid. .1] at least one of heptane-1-carboxy-2-bromoethyl ester, 2-methyl-1-[4-(methylthio)phenyl-13-yl]-2-morpholinylpropane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-1-butanone, α-aminoalkylphenyl ketone derivatives, phenyl-glyoxylic acid-methyl ester or oxy-phenyl-acetic acid 2-[2-oxy-2-phenyl-ethoxy-ethoxy]-ethyl ester and oxy-phenyl-acetic acid 2-[2-hydroxy-ethoxy]-ethyl ester; and / or, The leveling agent is one of BYK331, BYK370, BYK3505, and BYK348; and / or, The silane coupling agent is one of KH570, KH550, and KH560.

11. A resin material, characterized in that, The resin material is obtained by curing the composition according to any one of claims 8 to 10.

12. A method for preparing a resin material, characterized in that, Includes the following steps: Provide the composition as claimed in any one of claims 8 to 10; After mixing and filtration, a mixture is formed. The mixture is coated onto a substrate; The resin material is obtained by curing the mixture coated on the substrate.

13. The preparation method according to claim 12, characterized in that, The step of coating the mixture onto the substrate includes: coating the mixture onto the wafer and performing a spin coater, with a spin coater speed of 1000 rpm-10000 rpm and a spin coater time of 10s-300s.

14. An application of the resin material as described in claim 11 in optical waveguide technology, characterized in that, The resin material is used in adhesives, filters, display materials, or UV-resistant film layers.

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