Gas spray header and vapor deposition device
By providing a protruding portion on the surface of the gas tight element body of the gas spray head and a non-vertical surface on the side wall, the problem of gas transverse series caused by deformation of the gas spray head cooling plate is solved, and uniform transmission of the reaction gas and uniformity of the substrate are achieved.
Patent Information
- Application Number
- CN202311197573.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-15
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2043-09-15
AI Technical Summary
In the existing vapor deposition device, the cooling plate of the gas spray head is deformed due to heat conduction during the process processing, resulting in a gap between the gas distribution plate and the cooling plate, causing the reaction gas to be transversely connected, affecting the uniformity of the substrate and the process efficiency.
A gas spray head is designed, which includes a gas distribution plate and a cooling plate. Both are detachably connected, and are provided with an airtight member body and a protrusion. The protrusion remains in elastic contact with the gas distribution plate or the cooling plate to prevent the lateral flow of gas. The side walls of the airtight member body are non-vertical planes, which increase the gas flow path and increase the air resistance and reduce the lateral flow of gas.
Effectively block the lateral flow of reaction gas, improve the uniformity of reaction gas, and ensure the uniformity of substrate and the stability of process parameters.
Smart Images

Figure CN119640234A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of semiconductor equipment, and in particular to a gas shower head and a vapor deposition device. Background Art
[0002] In the field of semiconductor manufacturing, the vapor deposition device is one of the most important vacuum processing devices, which generates plasma through radio frequency coupled discharge, and then uses plasma to perform deposition, etching, sputtering and other processing techniques. Generally, the vapor deposition device is usually configured with an upper electrode and a lower electrode arranged opposite to the upper electrode. Among them, the gas shower head can be used as the upper electrode, and the lower electrode is used to carry the substrate to be processed. A source radio frequency power supply is connected to the upper electrode or the lower electrode, and a bias radio frequency power supply is connected to the lower electrode. The gas shower head is connected to an external reaction gas source through a gas supply pipeline, and the reaction gas is uniformly sprayed into the reaction area below. The reaction gas is dissociated by high-frequency radio frequency power to generate plasma, thereby realizing the process of processing the substrate to be processed.
[0003] like Figure 1 As shown, in the prior art, the gas shower head 110 includes a gas distribution plate 111 and a cooling plate 112, and the edges of the gas distribution plate 111 and the cooling plate 112 are fixed mechanically. Since the cooling plate 112 is deformed by the heat conduction of the substrate tray below during the process, a gap is generated between the gas distribution plate 111 and the cooling plate 112, thereby causing the reaction gas to flow along the gap during the transmission process, resulting in the defect of lateral cross-flow of the reaction gas, which ultimately affects the uniformity of the substrate and reduces the efficiency of the process. Therefore, there is an urgent need for a gas shower head that can prevent the reaction gas from flowing horizontally between the gas distribution plate 111 and the cooling plate 112 to improve the transmission uniformity of the reaction gas. Summary of the invention
[0004] The object of the present invention is to provide a gas shower head and a vapor deposition device to block the lateral flow of reaction gas in the gas shower head.
[0005] To achieve the above object, the present invention provides a gas shower head for transmitting a plurality of reaction gases into a gas deposition device, comprising:
[0006] Gas distribution plate;
[0007] A cooling plate located below the gas distribution plate and detachably connected to the gas distribution plate; a plurality of gas transmission channels are arranged in the gas distribution plate and the cooling plate;
[0008] A plurality of mounting grooves, each mounting groove comprising a first groove arranged on the gas distribution plate, and / or a second groove arranged on the cooling plate; the mounting groove is located between two adjacent gas transmission channels for conveying different reaction gases;
[0009] A plurality of airtight components are respectively embedded in each of the mounting grooves, and each airtight component comprises: an airtight component body, and a plurality of protrusions arranged on the airtight component body; the protrusions always maintain elastic contact with the gas distribution plate or the cooling plate to prevent different reaction gases in adjacent gas transmission channels from flowing between the gas distribution plate and the cooling plate.
[0010] Optionally, at least one deformation groove is provided on the airtight body; the vertical projection of at least one protrusion on the plane where the side wall of the deformation groove is located is located in the side wall area, and the deformation groove is used to provide space for the airtight body to deform when the protrusion is squeezed.
[0011] Optionally, the protrusion is arranged on the surface of the gas-sealing body; and at least one protrusion is arranged between the gas-sealing body and the gas distribution plate, and at least one protrusion is arranged between the gas-sealing body and the cooling plate.
[0012] Optionally, when the mounting groove includes a first groove and a second groove, the airtight component body includes an upper part and a lower part, the upper part is embedded in the first groove of the gas distribution plate, and the lower part is embedded in the second groove of the cooling plate, and the depth of the lower part embedded in the second groove is greater than the depth of the upper part embedded in the first groove.
[0013] Optionally, the protrusion is separately provided from the airtight component body, and the protrusion is respectively provided between the airtight component body and the gas distribution plate or the cooling plate, and the airtight component body squeezes the protrusion to form elastic contact with the gas distribution plate and the cooling plate respectively.
[0014] Optionally, the separately arranged raised portion includes a sealing ring and / or a sealing strip.
[0015] Optionally, a receiving groove is provided on the airtight component body for installing the sealing ring and providing a deformation space for the sealing ring.
[0016] Optionally, the cross-section of the sealing strip is "U"-shaped, and the opening groove thereof provides deformation space for the sealing strip.
[0017] Optionally, the gas-sealing component body is integrally provided with the gas distribution plate, and the gas-sealing component body is embedded in the second groove of the cooling plate.
[0018] Optionally, the gas-sealing member body is integrally provided with the cooling plate, and the gas-sealing member body is embedded in the first groove of the gas distribution plate.
[0019] Optionally, the side wall of the airtight member body is a non-vertical surface.
[0020] Optionally, the non-vertical surface is composed of one or more of an inclined surface, a step surface, and a curved surface.
[0021] Optionally, the airtight member body is made of polytetrafluoroethylene or stainless steel.
[0022] Optionally, the protrusion is made of polytetrafluoroethylene or rubber.
[0023] Optionally, each of the gas transmission channels includes a first gas through hole arranged on the gas distribution plate and a second gas through hole arranged on the cooling plate, and the first gas through hole is aligned with the second gas through hole.
[0024] Furthermore, the present invention also provides a vapor deposition device, which includes: a reaction chamber; a gas shower head as described above, which is arranged at the upper part of the reaction chamber; a base, which is arranged at the lower part of the reaction chamber, opposite to the gas shower head, and is used to carry the substrate to be processed; multiple gas sources, which are connected to the gas shower head and transport multiple reaction gases into the reaction chamber; a heating device, which is located below the base and is used to make the process reaction reach the required temperature.
[0025] In summary, compared with the prior art, a gas shower head and a vapor deposition device provided by the present invention have the following beneficial effects: by arranging a plurality of protrusions on the surface of the gas-tight body, the protrusions are squeezed and always maintain elastic contact with the gas distribution plate or the cooling plate, thereby blocking the path of the reaction gas flowing laterally along the gap; in addition, the side wall of the gas-tight body is set as a non-vertical surface to increase the gas flow route. Since the flow path is non-straight, the gas resistance of the gas flow is also increased, thereby weakening the lateral flow of the gas, thereby ensuring the stability of the reaction gas process parameters.
[0026] Furthermore, by providing a deformation groove on the airtight component body, and the protrusion is arranged opposite to the side wall of the deformation groove, on the one hand, the deformation groove provides the deformation space required by the airtight component body when the protrusion is squeezed; on the other hand, even if the cooling plate or the gas distribution plate is deformed during the process, increasing the gap between the gas distribution plate and the cooling plate, the deformation groove can provide an elastic force toward the cooling plate or the gas distribution plate, so that the protrusion always maintains elastic contact with the gas distribution plate and the cooling plate, thereby preventing the gas from flowing horizontally between different gas transmission channels, thereby achieving the purpose of preventing gas from flowing horizontally. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] Figure 1 It is a structural schematic diagram of a vapor deposition device in the prior art;
[0028] Figure 2 for Figure 1 A partial enlarged view of a gas shower head in a reaction chamber;
[0029] Figure 3 A partial enlarged side view of a gas shower head according to a first embodiment of the present invention;
[0030] Figure 4 is a partial enlarged side view of a gas shower head according to a second embodiment of the present invention;
[0031] Figure 5 It is a partial enlarged side view of a gas shower head according to a third embodiment of the present invention;
[0032] Figure 6 A partial enlarged side view of another gas shower head according to a third embodiment of the present invention;
[0033] Figure 7 A partial enlarged side view of another gas shower head according to a second embodiment of the present invention;
[0034] Figure 8 A partial enlarged side view of another gas shower head according to the first embodiment of the present invention;
[0035] Fig. 9 A partial enlarged side view of a gas shower head according to a fourth embodiment of the present invention;
[0036] Fig.10 A partial enlarged side view of another gas shower head according to a fourth embodiment of the present invention;
[0037] Fig.11 is a partial enlarged side view of a gas shower head according to a fifth embodiment of the present invention;
[0038] Fig.12 A partial enlarged side view of another gas shower head according to a fifth embodiment of the present invention;
[0039] Fig.13 is a schematic top view of a gas shower head according to an embodiment of the present invention;
[0040] Fig.14 FIG. 1 is a schematic top view of a gas shower head according to another embodiment of the present invention. DETAILED DESCRIPTION
[0041] The following will be combined with the embodiments of the present invention Figure 1 to Figure 14 , the technical solutions, structural features, objectives achieved and effects in the embodiments of the present invention are described in detail.
[0042] It should be noted that the drawings are in a very simplified form and use non-precise proportions. They are only used to conveniently and clearly assist in explaining the embodiments of the present invention, and are not used to limit the conditions for the implementation of the present invention. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size, without affecting the effects and purposes that can be achieved by the present invention, should still fall within the scope of the technical content disclosed by the present invention.
[0043] It should be noted that, in the present invention, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only the elements explicitly listed, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.
[0044] Figure 1 The present invention is a schematic structural diagram of a vapor deposition device in the prior art when performing a deposition process, comprising a reaction chamber 100, a gas shower head 110 is arranged at the upper part of the reaction chamber 100, a rotatable base 120 is arranged below the gas shower head 110, the base 120 is opposite to the gas shower head 110, and a substrate W is placed on the base 120. Figure 1 A plurality of substrates W are arranged on the base 120 in the process. Several heating devices 130 are arranged under the base 120, and the substrates W are heated by heating the base 120 so that the substrates reach the reaction temperature. The gas shower head 110 is connected to an external reaction gas source through a gas supply pipeline, and is used to transport a plurality of reaction gases to the top of the substrate for deposition reaction. Usually, the gas shower head 110 includes a gas distribution plate 111 and a cooling plate 112. When the deposition reaction is carried out, the heat of the base 120 will radiate upward to the cooling plate 112, causing the cooling plate 112 to expand. Since the edges of the cooling plate 112 and the gas distribution plate 111 are fixed, the cooling plate 112 will form a small arch downward when expanding, resulting in a gap between the cooling plate 112 and the gas distribution plate 111.
[0045] Specifically, Figure 2 As shown, Figure 2The figure is a partial enlarged view of the gas shower head after thermal expansion. The gas shower head 110 is provided with a plurality of gas transmission channels 113. Each of the gas transmission channels 113 includes a first gas through hole 1131 provided on the gas distribution plate 111 and a second gas through hole 1132 provided on the cooling plate 112. The first gas through hole 1131 is aligned with the second gas through hole 1132 to form a connected gas transmission channel 113. In order to make the substrate under the gas shower head 110 react uniformly, a plurality of gas transmission channels 113 for introducing the same gas are arranged in non-adjacent intervals, while the gas transmission channels 113 for conveying different reaction gases are arranged in adjacent arrangements. When a reaction gas flows downward through one of the first gas through holes 1131 to the junction of the cooling plate 112 and the gas distribution plate 111, due to the gap between the cooling plate 112 and the gas distribution plate 111, the reaction gas will flow laterally along the gap to the adjacent gas transmission channel 113.
[0046] In the prior art, an air barrier strip 114 is provided between two adjacent gas transmission channels 113 in order to block the path of the reaction gas flowing laterally along the gap. However, as the use time of the gas shower head 110 increases, the deformation of the cooling plate 112 increases, resulting in a larger gap between the air barrier strip 114 and the gas distribution plate 111. The reaction gas may flow in the gap between the air barrier strip 114 and the gas distribution plate 111 (e.g., Figure 2 ), and thus lateral cross-gas phenomenon will still occur. On the one hand, the reaction gas will react with other types of reaction gases transmitted by the adjacent gas transmission channel 113, and deposit into polymers in the gaps. The polymers will adhere to the side walls of the gas transmission channel 113 and affect the gas flow. At the same time, the polymers may also follow the reaction gas flow from the gas transmission channel 113 into the reaction chamber 100, and fall on the substrate W to cause contamination; on the other hand, after the reaction gas diffuses at the gap, the gas flow out of the second gas through hole 1132 will differ from the gas flow set by the process conditions, which will have a negative impact on the deposition rate and uniformity of the substrate, resulting in fluctuations in process parameters and deposition effects.
[0047] like Figure 3The figure shows a partially enlarged side schematic diagram of a gas shower head according to a first embodiment of the present invention, which includes a gas distribution plate 211. The reaction gas is transmitted to the gas distribution plate 211 through a gas supply pipeline for preliminary diffusion, so that the reaction gas is transmitted into a plurality of gas transmission channels 213 at a relatively uniform gas flow rate. The gas transmission channels 213 include a first gas through hole 2131 arranged on the gas distribution plate 211 and a second gas through hole 2132 arranged on the cooling plate 212. The first gas through hole 2131 is aligned with the second gas through hole 2132 to form a connected gas transmission channel 213. Two adjacent columns of gas transmission channels 213 on the gas distribution plate 211 are used to transmit different reaction gases. A cooling plate 212 is provided below the gas distribution plate 211 for controlling the temperature of the gas shower head to maintain a relatively low temperature and prevent the reaction gas from starting to decompose before reaching the substrate surface. In some embodiments, a plurality of fluid channels are provided in the cooling plate 112, and a cooling medium is introduced into the fluid channels to circulate and cool the gas shower head. The cooling plate 212 and the gas distribution plate 211 are assembled into one body by a detachable mechanical method, which is convenient for individual replacement or repair. At least one mounting groove 214 is provided between two adjacent gas transmission channels 213 for conveying different reaction gases, and each mounting groove 214 is embedded with a gas-tight component 215, and the gas-tight component 215 includes a gas-tight component body 2151 and a plurality of protrusions 216 provided on the gas-tight component body 2151.
[0048] Specifically, in Figure 3 In the first embodiment, the number of mounting grooves 214 between gas transmission channels 213 for conveying different reaction gases is 1, and the mounting groove 214 includes a first groove 2141 arranged on the gas distribution plate 211, and a second groove 2142 arranged on the cooling plate 212; further, the airtight body 2151 includes an upper part and a lower part, the upper part is embedded in the first groove 2141 and has two first protrusions 2161 on the surface, and the lower part is embedded in the second groove 2142 and has two second protrusions 2162 on the surface, the first protrusion 2161 is deformed by the squeezing of the gas distribution plate 211, and always maintains elastic contact with the gas distribution plate 211, the second protrusion 2162 is deformed by the squeezing of the gas distribution plate 212, and always maintains elastic contact with the cooling plate 212, thereby blocking the lateral gas transmission path between adjacent gas transmission channels, and effectively preventing different reaction gases in adjacent gas transmission channels 213 from flowing between the gas distribution plate 211 and the cooling plate 212. It should be noted that Figure 3 The two adjacent columns of gas transmission channels 213 shown in the figure are not limited to linear columns. For the convenience of description, each ring of other circular ring-shaped intervals is also included in the description of the column. Figure 3 The two pairs of protrusions shown in the figure are respectively arranged on the left and right sides of the airtight body 2151. In other embodiments, they can also be arranged on the upper and lower sides of the airtight body 2151. In addition, the number of protrusions is not limited to two pairs, for example, multiple pairs can be arranged on the upper and lower sides and the left and right sides of the airtight body 2151.
[0049] Among them, when the cooling plate 212 is heated and arches downward to expand the gap between it and the gas distribution plate 211, the airtight body 2151 can block the single reaction gas from flowing horizontally to the adjacent gas transmission channel; at the same time, the raised portion 216 arranged on the airtight body 2151 can further block the transmission path of different reaction gases along the gap. The raised portion 216 is respectively squeezed by the corresponding cooling plate 212 and the gas distribution plate 211 and deformed, so that the raised portion 216 always maintains elastic contact with the corresponding cooling plate 212 or the gas distribution plate 211, thereby blocking the gap between the airtight body 2151 and the gas distribution plate 211 or between the airtight body 2151 and the cooling plate 212. When the gap between the airtight component body 2151 and the cooling plate 212 or the gas distribution plate 211 becomes larger, the deformation of the corresponding protrusion 216 also becomes smaller due to the smaller extrusion pressure, so that the protrusion 216 always maintains elastic contact with the corresponding cooling plate 212 or the gas distribution plate 211, thereby preventing different reaction gases from flowing through the gap between the airtight component body 2151 and the cooling plate 212 or the gas distribution plate 211.
[0050] Furthermore, in a preferred embodiment, since the cooling plate 212 is subjected to a large amount of heat radiation and thus generates a large amount of deformation, the depth at which the lower portion of the gas-sealing body 2151 is embedded in the second groove 2142 is greater than the depth at which the upper portion of the gas-sealing body 2151 is embedded in the first groove 2141. When the cooling plate 212 is heated and deforms downward and arches to a large extent, since the lower portion of the gas-sealing body 2151 extends deeply into the second groove 2142, the lower portion of the gas-sealing body 2151 can be kept in the second groove 2142, thereby blocking the lateral transmission path of the reaction gas.
[0051] In the second embodiment, the mounting groove provided between two adjacent gas transmission channels 213 for conveying different reaction gases is located on the gas distribution plate 211 or the cooling plate 212. Specifically, as Figure 4As shown, when the mounting groove is provided on the gas distribution plate 211, that is, the gas distribution plate 211 is provided with a first groove 2141, and the first groove 2141 is embedded with a gas-sealing body 2151, and at least one protrusion 216 (the number in this embodiment is 2) is provided on the surface of the gas-sealing body 2151 opposite to the cooling plate 212, and at least one protrusion 216 (the number in this embodiment is 2) is also provided on the surface of the gas-sealing body 2151 opposite to the side wall of the first groove 2141. ), the side walls of the first groove 2141 and the cooling plate 212 respectively squeeze the corresponding protrusions 216 to deform them. When the gap between the airtight component body 2151 and the cooling plate 212 or the side walls of the first groove 2141 becomes larger, the deformation of the protrusions 216 arranged opposite to the side walls of the cooling plate 212 or the first groove 2141 becomes smaller, so that the protrusions 216 always maintain elastic contact with the side walls of the cooling plate 212 or the first groove 2141, blocking the path of the reaction gas transmitted laterally along the gap. Similarly, when the mounting groove is set on the cooling plate 212, that is, the cooling plate 212 is provided with a second groove 2142, and the second groove 2142 is embedded with a gas-sealing body 2151, and at least one protrusion 216 (the number in this embodiment is 2) is provided on the surface of the gas-sealing body 2151 opposite to the gas distribution plate 211, and at least one protrusion 216 (the number in this embodiment is 2) is also provided on the surface of the gas-sealing body 2151 opposite to the side wall of the second groove 2142, and the second The side walls of the groove 2142 and the gas distribution plate 211 squeeze the corresponding protrusions 216 to deform them. When the gap between the gas-sealing body 2151 and the side walls of the gas distribution plate 211 or the second groove 2142 becomes larger, the deformation of the protrusions 216 arranged opposite to the side walls of the gas distribution plate 211 or the second groove 2142 becomes smaller, so that the protrusions 216 always maintain elastic contact with the side walls of the cooling plate 212 or the second groove 2142, blocking the path of the reaction gas being transmitted laterally along the gap. In this embodiment, the mounting grooves are respectively arranged on the gas distribution plate or the cooling plate, and then the gas-sealing assembly is embedded in the corresponding mounting groove (i.e., the first groove or the second groove). The installation process does not require the first groove and the second groove on the gas distribution plate and the cooling plate to be aligned before inserting the gas-sealing assembly, making the installation more convenient and efficient. Under the premise of preventing lateral gas cross-talk, the installation efficiency of the gas shower head is improved. Furthermore, in other embodiments, the mounting grooves may all be arranged on the gas distribution plate 211 or all be arranged on the cooling plate 212, and the airtight component 215 may be embedded in each mounting groove. With such arrangement, when the deformation of the gas distribution plate 211 or the cooling plate 212 exceeds the allowable range, the gas distribution plate 211 or the cooling plate 212 may be replaced separately to reduce the replacement cost.
[0052] Figure 5 A third embodiment of the present invention is as follows: Figure 5 As shown, at least one deformation groove 3152 is provided on the gas-sealing body 3151 in the gas shower head; the protrusion 316 is provided on the surface of the gas-sealing body 3151 opposite to the side wall of the mounting groove 314, and the protrusion 316 is arranged opposite to the side wall of the deformation groove 3152, that is, the vertical projection of the protrusion 316 on the plane where the side wall of the deformation groove is located is located in the side wall area of the deformation groove, so that the deformation groove 3152 can provide the deformation space required by the gas-sealing body 3151 when the protrusion 316 is squeezed.
[0053] Specifically, Figure 5 This is a partially enlarged view of a gas shower head of the third embodiment. In the gas shower head, a deformation groove 3152 is vertically arranged at the upper part of the gas-tight component body located in the first groove 3141 and the lower part of the gas-tight component body located in the second groove 3142, respectively. The opening of the deformation groove 3152 located at the upper part faces the bottom wall of the first groove 3141, and the opening of the deformation groove 3152 located at the lower part faces the bottom wall of the second groove 3142. A protrusion 316 is provided on the surface of the airtight body 3151 opposite to the side wall of each deformation groove 3152. When the airtight body 3151 is embedded in the mounting groove 314, each protrusion 316 is squeezed by the side wall of the first groove 3141 or the second groove 3142, so that the deformation groove 3152 shrinks inward, that is, the opening of the deformation groove 3152 becomes smaller, thereby making each protrusion 316 maintain close elastic contact with the side wall of the first groove 3141 or the second groove 3142. These protrusions 316 block the gap between the airtight body 3151 and the gas distribution plate 311 or the cooling plate 312, thereby preventing the reaction gas from flowing laterally along the gap. When the deformation of the gas distribution plate 311 or the cooling plate 312 increases, the extrusion pressure on the deformation groove 3152 decreases, and the deformation groove 3152 recovers outward, that is, the opening of the deformation groove 3152 becomes larger, so that each protrusion 316 always maintains elastic contact with the side wall of the first groove 3141 or the second groove 3142, effectively avoiding the generation of gaps between the protrusion 316 and the installation groove 314, which may cause lateral cross-flow of reaction gas.
[0054] like Figure 6 As shown, Figure 6FIG. 4 is a partial enlarged view of another gas shower head of the third embodiment. In the gas shower head, two deformation grooves 4152 are respectively arranged transversely on the gas-sealing body 4151, and the opening of each deformation groove 4152 faces the side wall of the mounting groove 414. At the same time, at least one protrusion 416 (two are arranged in this embodiment) is arranged on the surface of the gas-sealing body 4151 opposite to the bottom wall of the mounting groove 414, and the protrusion 416 is arranged opposite to the side wall of the deformation groove 4152, that is, the protrusion 416 is arranged on the side wall of the deformation groove. The vertical projection of the plane is located in the side wall area of the deformation groove; when the airtight body 4151 is embedded in the installation groove 414, each protrusion 416 is squeezed by the bottom wall of the installation groove 414, causing the deformation groove 4152 to shrink inward, that is, the opening of the deformation groove 4152 becomes smaller, so that each protrusion 416 maintains a close elastic contact with the bottom wall of the installation groove 414, and these protrusions 416 block the gap between the airtight body 4151 and the gas distribution plate 411 or the cooling plate 412, preventing the reaction gas from flowing laterally along the gap. In other embodiments, deformation grooves can be set vertically and horizontally on the airtight body at the same time, such as Figure 7 As shown, the protrusions in all directions can be subjected to the elastic force provided by the deformation grooves and always maintain elastic contact with the gas distribution plate or the cooling plate.
[0055] like Figure 7 As shown, Figure 7 This is a partial enlarged view of another gas shower head formed by combining the second embodiment and the third embodiment. In the gas shower head, the mounting groove arranged between two adjacent gas transmission channels 213 for conveying different reaction gases is located on the gas distribution plate 211 or the cooling plate 212, and each mounting groove is embedded with an airtight body 2151 with at least one protrusion 216 on the surface; at the same time, each airtight body 2151 is provided with at least one deformation groove 2152; in this embodiment, each airtight body 2151 is provided with a vertical deformation groove 2152 and two transverse deformation grooves 2152; the opening of the vertical deformation groove 2152 faces the gas distribution plate 211, and the opening of the transverse deformation groove faces the side wall of the second groove 2142. The protrusion 216 is arranged on the surface of the airtight component body 2151 opposite to the side wall of each deformation groove 2152, that is, the vertical projection of the protrusion 216 on the plane where the side wall of the deformation groove is located is located in the side wall area of the deformation groove, so that each deformation groove 2152 can provide the deformation space required by the airtight component body 2151 when the corresponding protrusion 216 is squeezed.
[0056] Specifically, Figure 7As shown, when the gas distribution plate 211 and the cooling plate 212 are tightly fitted, the gas distribution plate 211 squeezes the raised portion 216 located at the top of the airtight body 2151, and the raised portion 216 at the top is deformed after being squeezed, and at the same time, an extrusion force is applied to the corresponding transverse deformation groove 2152, and the opening of each transverse deformation groove 2152 becomes smaller, and the transverse deformation groove 2152 is in an extruded state, so that the raised portion 316 at the top of the airtight body 2152 maintains a close elastic contact with the gas distribution plate 211, thereby blocking the transverse path of the reaction gas transmitted along the gap. When the cooling plate 212 is heated and arches downward to be deformed, the gap between the gas distribution plate 211 and the cooling plate 212 becomes larger. At this time, the extrusion pressure on the protrusion 216 and the transverse deformation groove 2152 becomes smaller, the deformation of the protrusion 216 becomes smaller, and the deformation of the transverse deformation groove 2152 also becomes smaller, that is, the opening of the transverse deformation groove 2152 becomes larger, and the transverse deformation groove 2152 provides an upward elastic force to the protrusion 216 at the top of the airtight body, so that the protrusions 216 always maintain elastic contact with the gas distribution plate 211, thereby blocking the transverse path of the reaction gas transmitted along the gap, and effectively preventing the lateral gas cross-talk phenomenon between adjacent gas transmission channels. Similarly, the vertically arranged deformation groove 2152 and the corresponding protrusion 216 are deformed by being squeezed by the side wall of the second groove 2142. The deformation groove 2152 provides the corresponding protrusion 216 with an elastic force toward the side wall of the second groove 2142, so that the protrusion 216 always maintains elastic contact with the side wall of the second groove 2142, thereby blocking the reaction gas from flowing along the gap between the airtight part body 2151 and the second groove 2142.
[0057] Figure 8 A partial enlarged view of another gas shower head according to the first embodiment of the present invention is shown in FIG. Figure 8 As shown, in the gas shower head, the side wall of the gas seal body 515 disposed in the mounting groove 514 is a non-vertical surface. The non-vertical surface includes one or more of an inclined surface, a stepped surface or a curved surface. Figure 8The airtight body 5151 shown on the left in the middle has an upper side wall of an inclined surface and a lower side wall of a stepped surface. In other embodiments, the upper and lower side walls of the airtight body 5151 can be inclined surfaces, stepped surfaces, or curved surfaces. By setting the side wall of the airtight body as a non-vertical surface, the path of gas flow can be increased. Since the flow path is non-linear, the gas resistance of gas flow is also increased, thereby reducing the lateral flow of gas. On the other hand, since the cooling plate 512 and the gas distribution plate 511 are fixedly connected at both ends of the edges, when the cooling plate 512 arches downward due to heat radiation, the gap between the cooling plate 512 and the gas distribution plate 511 forms a shape that is wide in the middle and narrow on both sides, causing the airtight body 5151 disposed in the mounting groove 514 to tilt, so that one top corner of the airtight body 5151 contacts the side wall of the mounting groove 514, thereby blocking the gas flow gap between the airtight body 5151 and the mounting groove 514, and preventing the reaction gas from flowing along the gap.
[0058] Further, if Figure 8 The gas-tight body 5151 shown in the middle has an upper side wall that is an inclined surface, a lower side wall that is a stepped surface, and a protrusion 516 disposed on the surface of the gas-tight body 5151. In this embodiment, the protrusions 516 are respectively located at the top of the upper part and the lower side wall of the gas-tight body 5151. The protrusions 516 are respectively in elastic contact with the side walls of the mounting groove 514 to block the flow path of the reaction gas. By setting the side wall of the gas-tight body 5151 as a non-vertical surface and combining the protrusions 516 disposed on the surface of the gas-tight body 5151, the gas resistance of the gas flow is increased and the flow path of the gas is blocked, further preventing the lateral cross-flow of adjacent reaction gases.
[0059] Going further, Figure 8 The airtight component body 5151 shown on the right has an inclined surface on the upper part and a stepped surface on the lower part. The airtight component body 5151 is provided with transverse and vertical deformation grooves 5152, and protrusions 516 are respectively provided on the top of the upper part and the side walls of the lower part of the airtight component body 5151 opposite to the side walls of the deformation grooves 5152. The protrusions 516 are respectively subjected to the extrusion force of the mounting groove 514 and the elastic force of the deformation groove 5152, and always maintain elastic contact with the side walls of the mounting groove 514, thereby blocking the flow path of the reaction gas. Even if the cooling plate 512 is subjected to heat radiation and causes the deformation of the mounting groove 514 to increase (such as the width or depth of the mounting groove increases), since the deformation groove 5152 is provided on the airtight part body 5151, the deformation groove 5152 can provide an elastic force toward the side wall of the mounting groove, so that the protrusion 516 always maintains elastic contact with the side wall of the mounting groove 514, thereby blocking the flow path of the reaction gas along the gap.
[0060] Fig. 9 A partial enlarged view of a gas shower head according to a fourth embodiment of the present invention is shown in FIG. Fig. 9 As shown, in the gas shower head, the protrusion 616 is separately provided from the gas-sealing body 6151, and the protrusion 616 is respectively provided between the gas-sealing body 6151 and the gas distribution plate 611 or between the gas-sealing body 6151 and the cooling plate 612, and the gas-sealing body 6151 squeezes the protrusion 616 to form elastic contact with the gas distribution plate 611 or the cooling plate 612. Further, as Fig. 9 The airtight component body 6151 is shown on the left, and a receiving groove 6153 is arranged at the top of the airtight component body 6151 for accommodating the protrusion 616. The protrusion 616 arranged along the receiving groove 6153 is a sealing ring, and the cross-sectional shape of the sealing ring is circular. The receiving groove 6153 provides a deformation space for the sealing ring; the protrusion 616 arranged below the airtight component body 6151 is a sealing strip, and the cross-sectional shape of the sealing strip is an open "U" shape, and its open groove 6161 provides a deformation space for the sealing strip.
[0061] Specifically, when the separately arranged airtight component body 6151 and the raised portion 616 are embedded in the mounting groove 614, the sealing ring on the top of the airtight component body 6151 is squeezed by the gas distribution plate 611 and compressed, and the deformation of the sealing ring is accommodated by the accommodating groove 6153, so that the sealing ring is in close elastic contact with the gas distribution plate 611; similarly, the sealing strip below the airtight component body 6151 is squeezed by the cooling plate 612 and deformed, and the opening groove 6161 of the sealing strip is compressed, that is, the opening of the opening groove 6161 becomes smaller, thereby ensuring that the sealing strip is in close elastic contact with the cooling plate. When the cooling plate 612 is deformed by arching downward, on the one hand, the elastic property of the sealing ring itself will restore the deformation, and at the same time, the accommodating groove 6153 provides an upward elastic force to keep the sealing ring in elastic contact with the gas distribution plate 611; on the other hand, the deformation of the opening groove 6161 of the sealing strip is reduced, so that the sealing strip maintains elastic contact with the cooling plate 611, thereby always maintaining the blocking state of the gap between the gas distribution plate 611 and the cooling plate 612. In other embodiments, such as Fig. 9 As shown in the middle and right of the figure, the raised parts 616 arranged at the top and bottom of the gas-sealing body 6151 can be of the same shape, for example, the raised parts 616 in the middle are all sealing rings, and the raised parts 616 on the right are all sealing strips. This embodiment has the advantage of easy installation by separating the raised parts 616 from the gas-sealing body 6151; at the same time, raised parts made of different elastic materials can be replaced according to process requirements to ensure that the deformation of the raised parts can keep the raised parts in elastic contact with the gas distribution plate or the cooling plate at all times, thereby blocking the lateral flow gap of the reaction gas.
[0062] Fig.10 A partial enlarged view of another gas shower head according to the fourth embodiment of the present invention is shown in FIG. Fig.10 As shown, in the gas shower head, the receiving groove 6153 is arranged on the side wall of the gas-sealing body 6151, and a sealing ring is arranged in the receiving groove 6153; a sealing strip is arranged between the gas-sealing body 6151 and the side wall of the mounting groove 614. In this embodiment, the sealing ring and the sealing strip are respectively arranged on both sides of the gas-sealing body 6151. In other embodiments, the sealing ring and the sealing strip can also be arranged on the same side of the gas-sealing body 6151, as long as the sealing ring and the sealing strip (i.e., the protrusion 616) are always in elastic contact with the gas distribution plate 611 and the cooling plate 612. The lateral gas flow path of the reaction gas flowing along the gap is blocked by the elastic contact between the sealing ring and the sealing strip and the gas distribution plate 611 and the cooling plate 612.
[0063] Fig.11 A partial enlarged view of a gas shower head according to a fifth embodiment of the present invention is shown in FIG. Fig.11 As shown, in the gas shower head, the airtight body 7151 is integrally arranged with the gas distribution plate 711, and the lower part of the airtight body 7151 passes through the interface between the gas distribution plate 711 and the cooling plate 712 and penetrates into the second groove 7142 of the cooling plate 712. A protrusion 716 is arranged on the lower side wall of the airtight body 7151, and a deformation groove 7152 is vertically arranged on the airtight body 7151, and the opening of the deformation groove 7152 faces the bottom wall of the second groove 7142. In this way, the gap between the airtight body 7151 and the gas distribution plate 711 can be completely blocked, and when the cooling plate 712 is deformed, the protrusion 716 can always maintain elastic contact with the cooling plate 712, thereby always blocking the flow gap of the reaction gas. Similarly, in the case of Fig.12 In the embodiment shown in , the airtight body 7151 is integrally arranged with the cooling plate 712, the upper part of the airtight body 7151 is inserted into the first groove 7141 of the gas distribution plate 711, and a deformation groove 7152 is vertically arranged on the airtight body 7151, and the opening of the deformation groove 7152 faces the bottom wall of the first groove 7141.
[0064] Preferably, in the present invention, the protrusion described in any embodiment is made of polytetrafluoroethylene or rubber, which has good compression rebound performance and can ensure the elastic contact between the protrusion and the cooling plate or the gas distribution plate. At the same time, the airtight body can be made of a high temperature and corrosion resistant material, so that it can withstand the heat radiation from the base below and the corrosion from the side of the gas while maintaining a stable chemical state without generating polluting particles. For example, polytetrafluoroethylene or stainless steel can be selected. Specifically, when the protrusion and the airtight body are integrally formed, the protrusion and the airtight body can be made of polytetrafluoroethylene; when the protrusion and the airtight body are separately set, in order to ensure a better sealing effect, the protrusion can be made of rubber and the airtight body can be made of stainless steel.
[0065] Fig.13 FIG. 1 is a partial top view of a gas shower head embodiment of the present invention, wherein a plurality of gas transmission paths 817 are provided on the gas transmission channels 813A and 813B indicated by dashed lines. The plurality of gas transmission paths 817 on a single gas diffusion channel are composed of a first gas through hole and a second gas through hole aligned and connected to each other, and are used to introduce the same reaction gas. Fig.13 In the embodiment, the gas transmission path 817 is arranged along a long strip, and accordingly, the airtight component 815 is a strip structure, which is arranged between two rows of gas transmission channels 813A and 813B that convey different gases. The alternating arrangement between the rows of the plurality of gas transmission channels described in the present invention is not limited to a straight line arrangement, and may also be an arrangement of rows in other shapes. Fig.14 FIG. 1 is a partial top view of another embodiment of a gas shower head of the present invention, which is different from the above-mentioned embodiment in that a plurality of gas transmission paths 917 are provided on the gas transmission channels 913A and 913B indicated by dashed lines, and the plurality of gas transmission paths 917 on a single gas diffusion channel are also composed of a first gas through hole and a second gas through hole aligned and connected to each other, and are used to introduce the same reaction gas. Fig.14 In the embodiment, the gas transmission paths are arranged along a circle, so that the constructed gas transmission channels 913A and 913B are ring-shaped. Accordingly, the airtight component 915 is also configured as a ring-shaped structure, which is disposed between two circles of gas transmission channels 913A and 913B that transport different gases.
[0066] Furthermore, the present invention also provides a vapor deposition device, which includes: a reaction chamber; a gas shower head as provided in any of the above embodiments is arranged at the upper part of the reaction chamber; a base, which is arranged at the lower part of the reaction chamber, opposite to the gas shower head, and is used to carry the substrate to be processed; multiple gas sources, which are connected to the gas shower head and transport multiple reaction gases into the reaction chamber; a heating device, located below the base, the heating device can be a resistance wire heating, and can also be a coil heating, the base is heated by heat radiation to the base, and the heat conduction between the base and the substrate is used to make the substrate reach the temperature required by the process.
[0067] In summary, a gas shower head and a vapor deposition device of the present invention are provided. The gas shower head is provided with a plurality of protrusions on the surface of the gas-tight body. The protrusions are squeezed and always maintain elastic contact with the gas distribution plate or the cooling plate, thereby blocking the path of the reaction gas flowing laterally along the gap. In addition, the side wall of the gas-tight body is set as a non-vertical surface to increase the gas flow route. Since the flow path is non-straight, the gas resistance of the gas flow is also increased, thereby weakening the lateral flow of the gas, thereby ensuring the stability of the reaction gas process parameters.
[0068] Furthermore, by providing a deformation groove on the airtight component body, and the protrusion is arranged opposite to the side wall of the deformation groove, on the one hand, the deformation groove provides the deformation space required by the airtight component body when the protrusion is squeezed; on the other hand, even if the cooling plate or the gas distribution plate is deformed during the process, increasing the gap between the gas distribution plate and the cooling plate, the deformation groove can provide an elastic force toward the cooling plate or the gas distribution plate, so that the protrusion always maintains elastic contact with the gas distribution plate and the cooling plate, thereby preventing the gas from flowing horizontally between different gas transmission channels, thereby achieving the purpose of preventing gas from flowing horizontally.
[0069] Although the content of the present invention has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the present invention. After reading the above content, it will be apparent to those skilled in the art that various modifications and substitutions of the present invention will occur. Therefore, the protection scope of the present invention should be limited by the appended claims.
Claims
1. A gas shower head for transmitting a plurality of reaction gases into a vapor deposition device, characterized in that: include: Gas distribution plate; A cooling plate located below the gas distribution plate and detachably connected to the gas distribution plate; a plurality of gas transmission channels are arranged in the gas distribution plate and the cooling plate; A plurality of mounting grooves, each mounting groove comprising a first groove arranged on the gas distribution plate, and / or a second groove arranged on the cooling plate; the mounting groove is located between two adjacent gas transmission channels for conveying different reaction gases; A plurality of airtight components are respectively embedded in each of the mounting grooves, and each airtight component comprises: an airtight component body, and a plurality of protrusions arranged on the airtight component body; the protrusions always maintain elastic contact with the gas distribution plate or the cooling plate to prevent different reaction gases in adjacent gas transmission channels from flowing between the gas distribution plate and the cooling plate.
2. The gas shower head according to claim 1, characterized in that: The airtight body is provided with at least one deformation groove; the vertical projection of at least one protrusion on the plane where the side wall of the deformation groove is located is located in the side wall area, and the deformation groove is used to provide space for the airtight body to deform when the protrusion is squeezed.
3. The gas shower head according to claim 1 or 2, characterized in that: The protrusion is arranged on the surface of the airtight member body; At least one protrusion is provided between the gas-sealing body and the gas distribution plate, and at least one protrusion is provided between the gas-sealing body and the cooling plate.
4. The gas shower head according to claim 1 or 2, characterized in that: When the mounting groove includes a first groove and a second groove, the airtight component body includes an upper part and a lower part, the upper part is embedded in the first groove of the gas distribution plate, and the lower part is embedded in the second groove of the cooling plate, and the depth of the lower part embedded in the second groove is greater than the depth of the upper part embedded in the first groove.
5. The gas shower head according to claim 1 or 2, characterized in that: The protrusion is separately arranged from the airtight body, and the protrusion is respectively arranged between the airtight body and the gas distribution plate or the cooling plate. The airtight body squeezes the protrusion to form elastic contact with the gas distribution plate and the cooling plate respectively.
6. The gas shower head according to claim 5, characterized in that: The separately arranged raised portion includes a sealing ring and / or a sealing strip.
7. The gas shower head according to claim 6, characterized in that: The airtight component body is provided with a receiving groove for installing the sealing ring and providing a deformation space for the sealing ring.
8. The gas shower head according to claim 6, wherein: The cross section of the sealing strip is "U" shaped, and its opening groove provides deformation space for the sealing strip.
9. The gas shower head according to claim 1 or 2, characterized in that: The gas-sealing component body is integrally arranged with the gas distribution plate, and the gas-sealing component body is embedded in the second groove of the cooling plate.
10. The gas shower head according to claim 1 or 2, characterized in that: The gas-sealing component body is integrally arranged with the cooling plate, and the gas-sealing component body is embedded in the first groove of the gas distribution plate.
11. The gas shower head according to claim 1 or 2, characterized in that: The side wall of the airtight member body is a non-vertical surface.
12. The gas shower head according to claim 11, wherein: The non-vertical surface is composed of one or more of an inclined surface, a step surface, and a curved surface.
13. The gas shower head according to claim 1, wherein: The airtight component body is made of polytetrafluoroethylene or stainless steel.
14. The gas shower head according to claim 1, wherein: The protrusion is made of polytetrafluoroethylene or rubber.
15. The gas shower head according to claim 1, wherein: Each of the gas transmission channels includes a first gas through hole disposed on the gas distribution plate and a second gas through hole disposed on the cooling plate, wherein the first gas through hole is aligned with the second gas through hole.
16. A vapor deposition device, characterized in that: include: Reaction chamber; A gas shower head as claimed in any one of claims 1 to 15 disposed on the upper part of the reaction chamber; A base, which is arranged at the lower part of the reaction chamber, opposite to the gas shower head, and is used to carry the substrate to be processed; A plurality of gas sources connected to the gas shower head to deliver a plurality of reaction gases into the reaction chamber; The heating device is located below the susceptor and is used to make the process reaction reach a desired temperature.
Citation Information
Patent Citations
Seal device
CN102549320A
Gas spray header and chemical vapor deposition equipment
CN115478261A
Spray header assembly, plasma reaction device, spray header and mounting base
CN213184198U
Gas spray header and chemical vapor deposition equipment
CN215976033U
Sealing structure and horizontal screw centrifuge
CN217519225U