Photocuring body holographic polymer material, grating and preparation method thereof
By using a fluorine-containing first monomer in the bulk holographic grating material, the surface tension of the material is reduced, and the problem of irregular microstructure of the existing bulk holographic grating is solved, thereby achieving better imaging effects and structural regularity.
CN119684517APending Publication Date: 2025-03-25SEEV OPTOELECTRONICS TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202311231430.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-22
- Publication Date
- 2025-03-25
AI Technical Summary
Technical Problem
The microstructure of the existing bulk holographic grating is irregular, resulting in poor imaging results and the inability to effectively evaluate the state of the overall grating.
Method used
The first monomer containing fluorine is used as a component of the photocured holographic polymer material to reduce the surface tension of the material, thereby promoting the migration of liquid crystals and the formation of phase separation structures, and realizing a regular microstructure.
Benefits of technology
By reducing the surface tension, a phase separation structure with regular structure is formed, the imaging effect of the grating is improved, and the imaging problems caused by irregular microstructure of the grating are avoided.
✦ Generated by Eureka AI based on patent content.
Abstract
The embodiment of the invention provides a photocuring body holographic polymer material, a grating and a preparation method of the photocuring body holographic polymer material, and the photocuring body holographic polymer material comprises the following components in percentage by mass: 20-45% of liquid crystal; 0.01 to 2% of a photoinitiator; 0.5%-5% of a co-initiator; 5%-40% of a first monomer; 10%-50% of a second monomer; 1%-10% of a third monomer; the second monomer and / or the third monomer contains ethyoxyl; the first monomer is selected from one or more of hexafluorobutyl methacrylate, 2, 2, 2-trifluoroethyl acrylate, 2-(trifluoromethyl) acrylic acid, 2, 2, 2-trifluoroethyl acrylate, 2-(trifluoromethyl) acrylic acid and hexafluorobutyl acrylate; and the second monomer is selected from one or more of hexafluorobutyl methacrylate, 2, 2, 2-trifluoroethyl acrylate, 2-(trifluoromethyl) acrylic acid and hexafluorobutyl acrylate. According to the technical scheme provided by the embodiment of the invention, the fluorine-containing first monomer is selected, so that the surface tension of the material can be reduced, and the photocuring holographic polymer material can form a microstructure with a regular structure.
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