Self-cleaning method and operation method of IMP machine
By applying a cleaning voltage higher than the working voltage on the ion source cathode of the IMP machine to remove deposits and strips, the problems of short service life and frequent maintenance of the IMP machine are solved, and the effect of extending service life and reducing maintenance costs is achieved.
CN119694868APending Publication Date: 2025-03-25QINGDAO AUCMA YUNLIAN INFORMATION TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202311231387.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-22
- Publication Date
- 2025-03-25
AI Technical Summary
Technical Problem
In the semiconductor process, the ion source life of the IMP machine is short, resulting in frequent equipment maintenance and high maintenance costs.
Method used
The cutting and stripping are removed using tip discharge or electrical heating effects to reduce the leakage current of the feedthrough by applying a cleaning voltage greater than the operating voltage on the cathode of the ion source.
Benefits of technology
It extends the service life of the ion source, reduces the frequency of equipment maintenance, and reduces maintenance costs.
✦ Generated by Eureka AI based on patent content.
Abstract
The invention provides a self-cleaning method and an operation method of an IMP machine table, and the self-cleaning method comprises the steps that the IMP machine table comprises an ion source used for generating plasma, and the ion source comprises a cathode, a feed-through and a suppression spring connected with the cathode and the feed-through; a cleaning voltage greater than the operating voltage is applied to the cathode to self-clean at least one of the feedthrough, the cathode, or the suppression spring. Working voltage is applied to the cathode in the plasma generation process of the ion source, the voltage on the cathode is increased to cleaning voltage when self-cleaning needs to be carried out on the IMP machine table, and the cleaning voltage is larger than the working voltage. Therefore, a large amount of heat generated by point discharge or / and an electric heating effect is used for removing sediments or stripping substances on at least one of the cathode, the feed-through or the suppression spring, so that the leakage current of the feed-through is reduced, the service life of the ion source is prolonged, and the frequency of equipment maintenance is reduced.
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