Method for igniting and / or maintaining plasma with pulsed high-frequency signal, power generator and plasma device
By using frequency and amplitude scanning of pulsed high-frequency signals in the plasma process, the process parameters are monitored, and the reliable ignition and stable operation of the plasma is achieved, the problem of difficulty in ignition and impedance matching in the prior art is solved, and process efficiency and stability are improved.
CN119698683APending Publication Date: 2025-03-25TRUMPF PATENTABTEILUNG
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Patent Information
- Application Number
- CN202380055432.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2022-07-21
- Filing Date
- 2023-07-21
- Publication Date
- 2025-03-25
AI Technical Summary
Technical Problem
In the prior art, it is difficult to achieve reliable ignition and impedance matching when ignitioning and maintaining plasma, and process parameters optimization relies on labor and is inefficient.
Method used
By generating a pulsed high-frequency signal and scanning frequency and amplitude within the first time interval, monitoring plasma process parameters, adjusting the scanning to reach a predetermined value or range, reliable ignition and stable operation of the plasma are achieved.
Benefits of technology
It improves the reliability and stability of plasma ignition, realizes automated process parameter optimization, reduces manual intervention, and improves process efficiency.
✦ Generated by Eureka AI based on patent content.
Abstract
The invention relates to a method for igniting and / or maintaining a plasma with a pulsed high-frequency signal, comprising the following method steps: i. Generating a pulsed high-frequency signal, ii. Changing the frequency of the high-frequency signal as a function of a frequency scan and / or the amplitude of the high-frequency signal as a function of a power scan during a predetermined first time interval (I) within a pulse (10), the method comprises the following steps: i. Carrying out scans, iii. Monitoring at least one process parameter of the plasma process, i. Determining a relationship between the process parameter and the carried-out scans, and ii. Detecting whether the monitored one or more process parameters associated with one or more scans each have a predetermined value or are within a predetermined value range.
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