Photocuring chamber and thin film deposition equipment
Through the combination of light source matrix and lens components, the problems of long curing time and uneven light in UV curing technology are solved, and a more efficient photocuring process is achieved, which improves production efficiency and curing quality.
CN119702396APending Publication Date: 2025-03-28PIOTECH (SHANGHAI) CO LTD
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Patent Information
- Application Number
- CN202411926826.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-24
- Publication Date
- 2025-03-28
AI Technical Summary
Technical Problem
In the existing UV curing technology, the curing time is long and the light is uneven, resulting in uneven curing quality, which affects production efficiency and product yield.
Method used
The light source matrix is combined with a lens assembly, which consists of multiple independent light sources. The lens assembly optimizes the distribution of light through refraction and convergence, ensuring that the light rays are evenly illuminated on the wafer surface.
Benefits of technology
It significantly improves light uniformity, shortens curing time, improves production efficiency, reduces production cycle, and improves curing quality.
✦ Generated by Eureka AI based on patent content.
Abstract
The invention discloses a photocuring chamber and thin film deposition equipment, the photocuring chamber comprises a light source matrix, a cavity and a lens assembly, the top of the cavity is provided with a window, the lens assembly is arranged in the window, the light source matrix is arranged above the lens assembly, and the light source matrix is arranged above the lens assembly. And a light beam emitted by the light source matrix penetrates through the lens assembly to irradiate a wafer to be cured in the cavity. According to the invention, due to the adoption of the structure of the light source matrix, the light can be uniformly distributed at different positions in the cavity, the uniformity of illumination is improved, and meanwhile, the lens assembly can refract, gather and scatter the incident light, so that a more uniform illumination area is formed on the surface of the wafer; the curing efficiency is greatly improved, the curing time is shortened, the overall production efficiency is improved, and the production cycle is shortened.
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