Substrate processing apparatus and substrate processing method

Abstract

This invention provides a substrate processing apparatus and method capable of accurately determining the processing liquid within a drain section. The substrate processing apparatus (100) includes a chamber (112), a substrate holding section (120), a processing liquid supply section (130), a drain section (190), at least one near-infrared light source (140), a near-infrared camera (150), and a control section (102). The substrate holding section is housed within the chamber. The substrate holding section holds a substrate (W). The processing liquid supply section supplies various processing liquids to the substrate at different timings. The drain section drains the various processing liquids out of the chamber. At least one near-infrared light source irradiates an area (AR1) containing at least a portion of the drain section using near-infrared light. The near-infrared camera captures images of the various processing liquids within the drain section irradiated by near-infrared light and generates captured images. The control section determines the type of processing liquid within the drain section based on the captured images.

Description

Technical Field

[0001] This invention relates to a substrate processing apparatus and a substrate processing method. Background Technology

[0002] A substrate processing apparatus is known to supply processing liquid to a substrate and perform substrate processing (see, for example, Patent Document 1). The substrate processing apparatus described in Patent Document 1 includes a substrate holding section, a processing liquid supply section, a common drain pipe, a switching valve, a cleaning liquid supply section, and a liquid detection section. The processing liquid supply section independently supplies multiple processing liquids to the substrate. The liquid detection section detects the presence of valve cleaning liquid at a detection position on the common drain pipe. This allows for easy cleaning of the inside of the switching valve.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2017-208404 Summary of the Invention

[0006] In the substrate processing apparatus described in Patent Document 1, for example, when the destination of the processing liquid is changed by switching the switching valve, the opening and closing state of the switching valve connected to the common drain pipe is changed. In this case, it is difficult to confirm whether the processing liquid on the common drain pipe and in the flow path of the switching valve (drain section) has been switched. Specifically, since the processing liquid used for substrate processing is usually transparent, a conventional CCD camera cannot detect the processing liquid. Therefore, it is sometimes impossible to determine the processing liquid on the common drain pipe and in the switching valve (drain section) with high accuracy.

[0007] The present invention was made in view of the above-mentioned problems, and its object is to provide a substrate processing apparatus and a substrate processing method capable of accurately determining the processing liquid in the drain section.

[0008] According to one aspect of the present invention, a substrate processing apparatus includes a chamber, a substrate holding section, a processing liquid supply section, a drain section, at least one near-infrared light source, a near-infrared camera, and a control section. The substrate holding section is housed within the chamber. The substrate holding section holds a substrate. The processing liquid supply section supplies multiple processing liquids to the substrate at different time intervals. The drain section discharges the multiple processing liquids out of the chamber. The at least one near-infrared light source irradiates an area containing at least a portion of the drain section using near-infrared light. The near-infrared camera captures images of the multiple processing liquids within the drain section irradiated by the near-infrared light and generates an image. The control section controls the near-infrared camera. The control section determines the type of processing liquid within the drain section based on the captured image.

[0009] In one embodiment, the control unit controls the discharge unit based on the determination of the type of the treatment liquid.

[0010] In one embodiment, the drainage section has an upstream pipe, a common pipe, and multiple downstream pipes. The upstream pipe allows the various treatment liquids discharged from the chamber to flow through. The common pipe is connected to the downstream end of the upstream pipe. The upstream ends of the multiple downstream pipes are connected to the common pipe.

[0011] In one embodiment, the drainage section further includes a switching section. The switching section switches the destination of the treatment fluid flowing in the common piping between the plurality of downstream piping sections.

[0012] In one embodiment, the near-infrared light source illuminates an area including at least a portion of the upstream piping. The near-infrared camera generates the captured image. The captured image is generated by photographing the various treatment liquids within the upstream piping illuminated by the near-infrared light. The control unit determines the type of treatment liquid within the upstream piping based on the captured image.

[0013] In one embodiment, the near-infrared light source illuminates an area including at least a portion of the shared piping. The near-infrared camera captures images of the various treatment liquids within the shared piping illuminated by the near-infrared light, generating the captured image. The control unit determines the type of treatment liquid within the shared piping based on the captured image.

[0014] In one embodiment, the control unit controls the switching timing for switching the flow destination of the treatment fluid flowing in the common piping based on the determination result of the type of treatment fluid.

[0015] In one embodiment, the at least one near-infrared light source is a plurality of sources. The plurality of near-infrared light sources emit near-infrared rays having different peak wavelengths. The control unit acquires type information indicating the type of the treated liquid. Based on the type information, the control unit changes the near-infrared light source used to irradiate the area including at least a portion of the drain section.

[0016] In one embodiment, the control unit controls the processing liquid supply unit based on the determination result of the type of processing liquid.

[0017] According to another aspect of the present invention, a substrate processing method includes the following steps: holding a substrate in a chamber; supplying a variety of processing liquids to the substrate at different time intervals; discharging the variety of processing liquids to the outside of the chamber via a drain section; irradiating an area including at least a portion of the drain section with near-infrared light; generating a photographic image of the variety of processing liquids in the drain section irradiated by the near-infrared light; and determining the type of processing liquid in the drain section based on the photographic image.

[0018] In one embodiment, the process further includes controlling the discharge section based on the determination of the type of the treatment liquid.

[0019] In one embodiment, the drainage section has an upstream pipe, a common pipe, and a downstream pipe. The upstream pipe allows the various treatment liquids discharged from the chamber to flow through. The common pipe is connected to the downstream end of the upstream pipe. The upstream ends of the plurality of downstream pipes are connected to the common pipe.

[0020] In one embodiment, during the process of controlling the drainage section, the destination of the treatment liquid flowing in the common piping is switched among the plurality of downstream piping.

[0021] In one embodiment, during the step of irradiation using near-infrared light, an area containing at least a portion of the upstream piping is irradiated using the near-infrared light. During the step of generating the image, the various treatment liquids within the upstream piping irradiated by the near-infrared light are photographed, and the image is generated. During the step of determining the type of treatment liquid, the type of treatment liquid within the upstream piping is determined based on the image.

[0022] In one embodiment, during the step of irradiation using near-infrared light, the area including the at least a portion of the area is irradiated using the near-infrared light. During the step of generating the captured image, the various treatment liquids within the shared piping irradiated with the near-infrared light are photographed to generate the captured image. During the step of determining the type of treatment liquid, the type of treatment liquid within the shared piping is determined based on the captured image.

[0023] In one embodiment, during the process of controlling the drainage section, the switching timing for switching the flow destination of the treatment liquid flowing in the common piping is controlled based on the determination result of the type of treatment liquid.

[0024] In one embodiment, during the irradiation process using the near-infrared light, one of a plurality of near-infrared light sources emitting near-infrared light having different peak wavelengths irradiates the area including at least a portion of the drain section using the near-infrared light. The substrate processing method further includes the steps of: obtaining type information indicating the type of the processing liquid; and changing the near-infrared light source used to irradiate the area including at least a portion of the drain section based on the type information.

[0025] In one embodiment, during different timed supply processes of the processing liquid, the processing liquid supplied to the substrate is switched based on the determination of the type of processing liquid.

[0026] Invention Effects

[0027] According to the present invention, a substrate processing apparatus and a substrate processing method are provided that can accurately determine the processing liquid in the drainage section. Attached Figure Description

[0028] Figure 1 This is a schematic top view of the substrate processing apparatus.

[0029] Figure 2 This is a schematic diagram of a substrate processing unit in a substrate processing apparatus.

[0030] Figure 3 This is a block diagram of a substrate processing apparatus.

[0031] Figure 4 This diagram illustrates an example of the configuration of a switching valve included in the substrate processing apparatus of this embodiment.

[0032] Figure 5 This is a block diagram showing the configuration of the control device and switching unit included in the substrate processing apparatus of this embodiment.

[0033] Figure 6 This is a flowchart of the substrate processing method.

[0034] Figure 7 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment.

[0035] Figure 8 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment.

[0036] Figure 9 This diagram illustrates an example of the configuration of a switching valve included in the substrate processing apparatus of this embodiment.

[0037] Figure 10This diagram illustrates an example of the configuration of a switching valve included in the substrate processing apparatus of this embodiment.

[0038] Figure 11 This diagram illustrates an example of the configuration of a switching valve included in the substrate processing apparatus of this embodiment.

[0039] Figure 12 This diagram illustrates an example of the configuration of a switching valve included in the substrate processing apparatus of this embodiment.

[0040] Figure 13 This is a schematic diagram of a substrate processing unit in a substrate processing apparatus equipped with multiple near-infrared light sources.

[0041] Figure 14 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment.

[0042] The reference numerals in the attached figures are explained as follows:

[0043] 12 Upstream Piping

[0044] 12b downstream end

[0045] 13Common piping

[0046] 14 Downstream Piping

[0047] 14a upstream end

[0048] 19 Switching Unit

[0049] 100 substrate processing apparatus

[0050] 102 Control Department

[0051] 112 chambers

[0052] 120 substrate holding section

[0053] 130 Processing Fluid Supply Department

[0054] 130a First Processing Fluid Supply Unit (Processing Fluid Supply Unit)

[0055] 130b Second Processing Fluid Supply Unit (Processing Fluid Supply Unit)

[0056] 130C Rinse Fluid Supply Department (Treatment Fluid Supply Department)

[0057] 140, 140a, 140b near-infrared light sources

[0058] 150 near-infrared camera

[0059] 190 drain part

[0060] AR1 area

[0061] AR2 area

[0062] W substrate

[0063] S120 steps (process using near-infrared irradiation), (process for generating captured images)

[0064] Step S125 (Process for obtaining type information)

[0065] Step S130 (a process of supplying multiple treatment solutions at different time intervals)

[0066] S140 Step (Drainage Process)

[0067] Step S160 (a process of supplying multiple treatment solutions at different time intervals)

[0068] S170 Step (Drainage Process)

[0069] S180 Step (Process for determining the type of treatment solution)

[0070] Step S205 (Process for Changing Near-Infrared Radiation)

[0071] Step S210 (a process of supplying multiple treatment solutions at different time intervals)

[0072] S220 Step (Drainage Process)

[0073] Step S230 (Process for determining the type of treatment fluid)

[0074] S250 Step (Process for Controlling the Drainage Section)

[0075] SB step (the process of holding the substrate) Detailed Implementation

[0076] Hereinafter, embodiments of the substrate processing apparatus and substrate processing method of the present invention will be described with reference to the accompanying drawings. It should be noted that in the drawings, the same or equivalent parts are labeled with the same reference numerals and are not described repeatedly. It should also be noted that in this specification, for ease of understanding of the invention, mutually orthogonal X-axis, Y-axis, and Z-axis are sometimes described. Typically, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0077] First, refer to Figure 1 The substrate processing apparatus 100 of this embodiment will be described. Figure 1 This is a schematic top view of the substrate processing apparatus 100.

[0078] like Figure 1As shown, the substrate processing apparatus 100 processes the substrate W. The substrate processing apparatus 100 processes the substrate W by at least one of etching, surface treatment, property imparting, forming a processing film, removing at least a portion of the film, and cleaning.

[0079] Substrate W is used as a semiconductor substrate. Substrate W contains a semiconductor wafer. For example, substrate W is generally circular. Here, substrate processing apparatus 100 processes substrate W one sheet at a time.

[0080] like Figure 1 As shown, the substrate processing apparatus 100 includes multiple substrate processing units 110, a fluid cabinet 10A, a fluid tank 10B, multiple loading ports LP, an indexing robot IR, a central robot CR, and a control device 101. The control device 101 controls the loading ports LP, the indexing robot IR, the central robot CR, and the substrate processing units 110.

[0081] Each loading port LP holds multiple substrates W stacked together. A sorting robot IR transfers substrates W between the loading port LP and the central robot CR. It should be noted that the device can also be configured such that a temporary mounting platform (transfer unit) for placing substrates W is provided between the sorting robot IR and the central robot CR, and substrates W are indirectly transferred between the sorting robot IR and the central robot CR via this platform. The central robot CR transfers substrates W between the sorting robot IR and the substrate processing unit 110. Each substrate processing unit 110 sprays processing liquid onto the substrates W to process them. A fluid tank 10A contains the processing liquid. It should be noted that the fluid tank 10A can also contain gas.

[0082] Multiple substrate processing units 110 form multiple towers TWs arranged to surround the central robot arm CR when viewed from above. Figure 1 There are four tower TWs in the middle. Each tower TW contains a substrate processing unit 110 stacked on top of each other (in Figure 1 The three substrate processing units 110 are shown in the diagram. Fluid tanks 10B correspond to multiple towers TW. The processing liquid in the fluid tank 10A is supplied via a fluid tank 10B to all the substrate processing units 110 contained in the tower TW corresponding to the fluid tank 10B. Additionally, the gas in the fluid tank 10A is supplied via a fluid tank 10B to all the substrate processing units 110 contained in the tower TW corresponding to the fluid tank 10B.

[0083] The control device 101 controls various operations of the board processing device 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 may have a central processing unit (CPU), for example. Alternatively, the control unit 102 may have a general-purpose arithmetic unit.

[0084] Storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. Storage unit 104 may also include a removable medium. Control unit 102 executes the computer program stored in storage unit 104 to perform board processing operations.

[0085] Storage unit 104 stores data. The data includes process data. The process data contains information representing multiple processes. Each process specifies the processing content and steps for the substrate W.

[0086] Alternatively, the storage unit 104 may also store the brightness value or lightness of the reference processing fluid. Or, the storage unit 104 may also store a reference image obtained by photographing the reference processing fluid.

[0087] Next, refer to Figure 2 This section describes the substrate processing unit 110 in the substrate processing apparatus 100 of this embodiment. Figure 2 This is a schematic diagram of the substrate processing unit 110 in the substrate processing apparatus 100.

[0088] The substrate processing unit 110 includes a chamber 112, a substrate holding section 120, and a processing liquid supply section 130. The chamber 112 houses the substrate holding section 120 and the processing liquid supply section 130.

[0089] The chamber 112 is a generally box-shaped structure with an internal space. The chamber 112 houses the substrate W. Here, the substrate processing unit 110 is a monolithic type that processes the substrate W one by one, housing one substrate W in the chamber 112 at a time. The substrate W is housed in the chamber 112 and processed within the chamber 112.

[0090] The substrate holding portion 120 holds the substrate W. The substrate holding portion 120 holds the substrate W horizontally with its upper surface (surface) Wt facing upwards and its back surface (lower surface) Wr facing vertically downwards. Alternatively, the substrate holding portion 120 rotates the substrate W while holding it. The upper surface Wt of the substrate W may also be planarized. Alternatively, a device surface or a columnar laminate with grooves may be provided on the upper surface Wt of the substrate W. The substrate holding portion 120 rotates the substrate W while holding it.

[0091] For example, the substrate holding portion 120 may also be a clamping type that clamps the end of the substrate W. Alternatively, the substrate holding portion 120 may also have any mechanism for holding the substrate W from the back surface Wr of the substrate W. For example, the substrate holding portion 120 may also be a vacuum type. In this case, the substrate holding portion 120 holds the substrate W horizontally by adsorbing the central portion of the back surface Wr of the substrate W, which is a non-device forming surface, onto the upper surface. Alternatively, the substrate holding portion 120 may also combine a vacuum type and a clamping type that contacts the peripheral end face of the substrate W.

[0092] For example, the substrate holding portion 120 includes a rotating base 121, a chuck component 122, a shaft 123, an electric motor 124, and a housing 125. The chuck component 122 is disposed on the rotating base 121. The chuck component 122 clamps the substrate W. Typically, a plurality of chuck components 122 are provided on the rotating base 121.

[0093] Shaft 123 is a hollow shaft. Shaft 123 extends vertically along the rotation axis Ax. A rotating base 121 is attached to the upper end of shaft 123. A substrate W is placed above the rotating base 121.

[0094] The rotating base 121 is circular. A chuck component 122 horizontally supports the base plate W. A shaft 123 extends downward from the center of the rotating base 121. An electric motor 124 imparts rotational force to the shaft 123. By rotating the shaft 123 in the rotational direction, the electric motor 124 rotates the base plate W and the rotating base 121 around the rotation axis Ax. A housing 125 surrounds the shaft 123 and the electric motor 124.

[0095] The processing liquid supply unit 130 supplies various processing liquids to the substrate W at different time intervals. Typically, the processing liquid supply unit 130 supplies processing liquid to the upper surface Wt of the substrate W held by the substrate holding unit 120.

[0096] The processing solution can also be an etching solution used to etch the substrate W. Examples of etching solutions include fluoronitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching solution is not particularly limited; for example, it can be acidic or alkaline.

[0097] Alternatively, the treatment fluid can also be a rinsing fluid. Examples of rinsing fluids include deionized water (DIW), carbonated water, electrolyzed water, ozone water, ammonia water, hydrochloric acid water with a dilution concentration (e.g., around 10 ppm to 100 ppm), and reduced water (hydrogen water).

[0098] Alternatively, the treatment fluid can also be an organic solvent. Typically, organic solvents are more volatile than rinsing fluids. Examples of organic solvents include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoroether (HFE), propylene glycol ethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0099] In this embodiment, the processing liquid supply unit 130 includes a first processing liquid supply unit 130a, a second processing liquid supply unit 130b, and a rinsing liquid supply unit 130c. The first processing liquid supply unit 130a supplies a first processing liquid to the substrate W. The second processing liquid supply unit 130b supplies a second processing liquid, different from the first processing liquid, to the substrate W. The rinsing liquid supply unit 130c supplies rinsing liquid to the substrate W.

[0100] The first processing liquid supply unit 130a includes a pipe 132a, a valve 134a, a nozzle 136a, and a moving mechanism 1381. The first processing liquid flows from a supply source to the pipe 132a. The valve 134a opens and closes the flow path within the pipe 132a. The nozzle 136a is connected to the pipe 132a. By allowing the first processing liquid to flow through the nozzle 136a, the nozzle 136a sprays the first processing liquid onto the upper surface Wt of the substrate W. Preferably, the nozzle 136a is configured to be movable relative to the substrate W.

[0101] Pipe 132a and nozzle 136a are made of resin. Pipe 132a and nozzle 136a are not particularly limited, for example, they are formed of PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0102] The moving mechanism 1381 moves the nozzle 136a in both the horizontal and vertical directions. Specifically, the moving mechanism 1381 moves the nozzle 136a circumferentially about a rotation axis extending in the vertical direction. Additionally, the moving mechanism 1381 causes the nozzle 136a to move vertically up and down.

[0103] The moving mechanism 1381 has an arm 138a, a shaft 138b, and a drive unit 138c. The arm 138a extends horizontally. A nozzle 136 is disposed at the front end of the arm 138a. The nozzle 136 is disposed at the front end of the arm 138a in an orientation that allows it to supply processing liquid toward the upper surface Wt of the substrate W held by the chuck member 122. Specifically, the nozzle 136a is coupled to the front end of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is coupled to the shaft 138b. The shaft 138b extends vertically.

[0104] The drive unit 138c has a rotary drive mechanism and a lifting drive mechanism. The rotary drive mechanism of the drive unit 138c rotates the shaft 138b about its rotation axis, and rotates the arm 138a along a horizontal plane about the shaft 138b. As a result, the nozzle 136a moves along the horizontal plane. Specifically, the nozzle 136a moves circumferentially around the shaft 138b. The rotary drive mechanism of the drive unit 138c may include, for example, a motor capable of rotating in both directions.

[0105] The lifting drive mechanism of the drive unit 138c causes the shaft 138b to move up and down in the vertical direction. By raising and lowering the shaft 138b via the lifting drive mechanism of the drive unit 138c, the nozzle 136 also moves up and down in the vertical direction. The lifting drive mechanism of the drive unit 138c includes a drive source such as a motor and a lifting mechanism; the shaft 138b is raised or lowered by driving the lifting mechanism via the drive source. The lifting mechanism may include, for example, a rack and pinion mechanism or a ball screw.

[0106] The second processing liquid supply unit 130b includes a pipe 132b, a valve 134b, a nozzle 136b, and a moving mechanism 1382. The second processing liquid flows from a supply source to the pipe 132b. The valve 134b opens and closes the flow path within the pipe 132b. The nozzle 136b is connected to the pipe 132b. By allowing the second processing liquid to flow through the nozzle 136b, the nozzle 136b sprays the second processing liquid onto the upper surface Wt of the substrate W. Preferably, the nozzle 136b is configured to be movable relative to the substrate W.

[0107] Pipe 132b and nozzle 136b are made of resin. Pipe 132b and nozzle 136b are not particularly limited, for example, they may be formed of PFA or PTFE.

[0108] The moving mechanism 1382 moves the nozzle 136b in both the horizontal and vertical directions. Since the moving mechanism 1382 has the same configuration as the moving mechanism 1381, its description is omitted.

[0109] The flushing fluid supply unit 130c includes a pipe 132c, a valve 134c, and a nozzle 136c. Fluid flows from a supply source to the pipe 132c. The valve 134c opens and closes the flow path within the pipe 132c. The nozzle 136c is connected to the pipe 132c. By allowing flushing fluid to flow through the nozzle 136c, the nozzle 136c sprays flushing fluid onto the upper surface Wt of the substrate W. The nozzle 136c is fixed to the substrate W.

[0110] Pipe 132c and nozzle 136c are made of resin. Pipe 132b and nozzle 136b are not particularly limited, for example, they may be made of PFA or PTFE.

[0111] In this specification, piping 132a, piping 132b, and piping 132c are sometimes collectively referred to as piping 132. Also, valves 134a, 134b, and 134c are sometimes collectively referred to as valve 134. Furthermore, nozzles 136a, 136b, and 136c are sometimes collectively referred to as nozzle 136. Additionally, moving mechanisms 1381 and 1382 are sometimes collectively referred to as moving mechanism 138.

[0112] The substrate processing apparatus 100 also includes a cup body 180. The cup body 180 collects processing liquid that spills from the substrate W. The cup body 180 moves up and down. For example, the cup body 180 rises vertically upwards until it is to the side of the substrate W during the entire period when the processing liquid supply unit 130 supplies processing liquid to the substrate W. In this case, the cup body 180 collects processing liquid that spills from the substrate W due to the rotation of the substrate W. In addition, the cup body 180 descends vertically downwards from the side of the substrate W at the end of the period when the processing liquid supply unit 130 supplies processing liquid to the substrate W.

[0113] Next, refer to Figure 2 Further explanation of the substrate processing apparatus 100. For example... Figure 2 As shown, the substrate processing apparatus 100 also includes a drain section 190, at least one near-infrared light source 140, and a near-infrared imaging section 150. In this embodiment, the substrate processing apparatus 100 includes a near-infrared light source 140.

[0114] The drainage section 190 drains various processing liquids to the outside of the chamber 112. The drainage section 190 is disposed outside the chamber 112. For example, the drainage section 190 is disposed below the chamber 112. The drainage section 190 has an upstream pipe 12, a common pipe 13, multiple downstream pipes 14, a switching section 19, a first port P1, a second port P2, a third port P3, and a fourth port P4.

[0115] Upstream piping 12 allows the flow of various processing liquids discharged from chamber 112. Upstream piping 12 is a tubular component extending from the inside of chamber 112 to the outside. One end 12a of upstream piping 12 is connected to the bottom of cup 180. More specifically, a drain hole is provided at the bottom of cup 180. Upstream piping 12 is connected to the bottom of cup 180 in communication with the drain hole. As a result, the processing liquid collected in cup 180 after substrate processing flows into upstream piping 12 due to its own weight. In other words, the discharged liquid collected in cup 180 flows into upstream piping 12 due to its own weight.

[0116] The common piping 13 is connected to the downstream end 12b of the upstream piping 12. The common piping 13 is a tubular component. The common piping 13 is located outside the chamber 112.

[0117] The upstream ends 14a of a plurality of downstream piping 14 are connected to a common piping 13. The plurality of downstream piping 14 are tubular components. In this embodiment, the plurality of downstream piping 14 includes a first piping 141, a second piping 142, a third piping 143, and a fourth piping 144.

[0118] The switching unit 19 switches the destination of the processed fluid flowing in the common piping 13 (the destination of the processed fluid within the common piping 13) between multiple downstream piping 14. Specifically, the switching unit 19 is controlled by the control device 101 (control unit 102). The control device 101 (control unit 102) controls the switching unit 19 to switch the destination of the processed fluid flowing in the common piping 13 between multiple downstream piping 14. Hereinafter, the destination of the processed fluid flowing in the common piping 13 will sometimes be referred to as "the destination of the processed fluid".

[0119] In this embodiment, the switching unit 19 switches the destination of the processing liquid flowing in the common piping 13 between the first piping 141 and the fourth piping 144.

[0120] In detail, the switching unit 19 includes a switching valve 191. The switching valve 191 includes a first switching valve 191a to a fourth switching valve 191d. The first switching valves 191a to the fourth switching valve 191d are arranged in a straight line. That is, the first switching valve 191a is adjacent to the second switching valve 191b, the second switching valve 191b is adjacent to the third switching valve 191c, and the third switching valve 191c is adjacent to the fourth switching valve 191d. Therefore, the first switching valve 191a is connected to the second switching valve 191b. Similarly, the second switching valve 191b is connected to the third switching valve 191c, and the third switching valve 191c is connected to the fourth switching valve 191d. In this embodiment, the switching valve 191 extends in a straight line with a generally horizontal orientation. In this embodiment, a multi-connection valve is formed by the common piping 13 and the first switching valves 191a to the fourth switching valves 191d.

[0121] The downstream end 12b of the upstream piping 12 is connected to the first switching valve 191a. More specifically, in this embodiment, the upstream piping 12 includes a horizontally extending portion 12c, one end of which is connected to the first switching valve 191a. The first switching valve 191a is also connected to one end of the first piping 141. The other end of the first piping 141 is connected to the first port P1. The processing fluid flowing in the upstream piping 12 flows in a generally horizontal direction in the horizontal portion 12c.

[0122] One end of the second piping 142 is connected to the second switching valve 191b. The other end of the second piping 142 is connected to the second port P2. One end of the third piping 143 is connected to the third switching valve 191c. The other end of the third piping 143 is connected to the third port P3. One end of the fourth piping 144 is connected to the fourth switching valve 191d. The other end of the fourth piping 144 is connected to the fourth port P4.

[0123] Control device 101 (control unit 102) controls the first switching valve 191a to the fourth switching valve 191d to switch the flow destination of the processing fluid between the first pipe 141 and the fourth pipe 144. In other words, control device 101 (control unit 102) switches the flow destination of the processing fluid between the first port P1 and the fourth port P4. For example, when the first pipe 141 (first port P1) is selected as the flow destination of the processing fluid, the processing fluid flows into the first pipe 141 via the switching valve 191 and is guided from the first pipe 141 to the first port P1.

[0124] Ports P1, P2, P3, and P4 are connected, for example, to drainage lines (not shown). These drainage lines are laid in the factory where the substrate processing apparatus 100 is located. It should be noted that ports P1, P2, P3, and P4 can also be connected via piping (not shown) to a drainage tank (not shown) provided with the substrate processing apparatus 100.

[0125] The upstream piping 12, the common piping 13, the multiple downstream piping 14, and the switching section 19 are made of resin. The upstream piping 12, the common piping 13, the multiple downstream piping 14, and the switching section 19 transmit near-infrared light emitted from the near-infrared light source 140. Details of the near-infrared light source 140 will be described later. In this embodiment, the upstream piping 12, the common piping 13, the multiple downstream piping 14, and the switching section 19 transmit near-infrared light emitted from the near-infrared light source 140. The upstream piping 12, the common piping 13, the multiple downstream piping 14, and the switching section 19 are not particularly limited and may be formed, for example, of PFA or PTFE.

[0126] Near-infrared light source 140 emits at least near-infrared rays. Near-infrared light source 140 irradiates at least a portion of the area including the drain section 190 using near-infrared rays. Near-infrared light source 140 is located outside chamber 112 and irradiates at least a portion of the area including the drain section 190 using near-infrared rays. Specifically, near-infrared light source 140 irradiates at least a portion of the area including the common piping 13. Here, near-infrared light source 140 emits near-infrared rays towards the entire area of ​​the common piping 13.

[0127] For example, the near-infrared light source 140 emits near-infrared light with wavelengths ranging from 800 nm to 2.5 μm. Typically, the near-infrared light source 140 emits near-infrared light with wavelengths ranging from 800 nm to 1.5 μm. It should be noted that the near-infrared light source 140 may also emit visible light while emitting near-infrared light.

[0128] For example, the near-infrared light emitted from the near-infrared light source 140 travels in a straight line along the optical axis. Alternatively, the near-infrared light emitted from the near-infrared light source 140 travels while spreading out around the optical axis. Preferably, the near-infrared light source 140 is configured such that the optical axis of the near-infrared light source 140 passes through the center of the common piping 13.

[0129] The near-infrared imaging unit 150 has multiple pixels. The near-infrared imaging unit 150 has photosensitivity at least relative to near-infrared light. The near-infrared imaging unit 150 generates an image by photographing various processing liquids within the drainage section 190 irradiated with near-infrared light. Specifically, the near-infrared imaging unit 150 generates an image by receiving the components of near-infrared light emitted from the near-infrared light source 140 that are transmitted and / or reflected from components within the drainage section 190. Here, the near-infrared imaging unit 150 receives the components of near-infrared light emitted from the near-infrared light source 140 that are transmitted and / or reflected from the common piping 13.

[0130] The near-infrared camera 150 captures images of at least a portion of the drainage section 190. The near-infrared camera 150 is located outside the chamber 112 and captures images of at least a portion of the drainage section 190. The near-infrared camera 150 may also capture images of the entire drainage section 190. Alternatively, the near-infrared camera 150 may capture images of a portion of the drainage section 190. In this case, the near-infrared camera 150 may switch between capturing images of the drainage section 190. Alternatively, the near-infrared camera 150 may switch between capturing images of the entire drainage section 190 and a portion of the area within the chamber 112. The area captured by the near-infrared camera 150 may also differ from the area illuminated by the near-infrared light source 140.

[0131] In the near-infrared camera unit 150, the frame rate can be 30fps or 60fps. Alternatively, the frame rate can be 120fps.

[0132] The near-infrared camera unit 150 may also include a SWIR (Short Wavelength Infrared) image sensor. In this case, the near-infrared camera unit 150 detects at least near-infrared light in the wavelength range of 800 nm to 2.5 μm.

[0133] It should be noted that the near-infrared camera unit 150 may also have sensitivity not only to near-infrared light but also to visible light. Alternatively, the near-infrared camera unit 150 may switch between receiving near-infrared light and visible light.

[0134] The near-infrared camera 150 captures images around a central imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the image captured by the near-infrared camera 150 may be located at the center of the common piping 13. In this case, the imaging optical axis of the near-infrared camera 150 is located at the center of the common piping 13. Alternatively, the center of the image captured by the near-infrared camera 150 may also be located at the upstream piping 12.

[0135] The near-infrared camera 150 generates an image of an area including at least a portion of the drain section 190. The type of treatment fluid within the drain section 190 is determined based on the image. For example, it is preferable to determine the type of treatment fluid flowing in the common piping 13 based on the image. Alternatively, it is preferable to determine the type of treatment fluid flowing in the upstream piping 12 based on the image.

[0136] When viewing the substrate processing unit 110 vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 pass through the drain section 190. Furthermore, when viewing the substrate processing unit 110 vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may be aligned or parallel. Alternatively, when viewing the substrate processing unit 110 vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may not be parallel.

[0137] Here, the near-infrared light source 140 and the near-infrared camera 150 are positioned near the drain section 190. More specifically, the near-infrared light source 140 and the near-infrared camera 150 are positioned near the common piping 13. The near-infrared light source 140 and the near-infrared camera 150 can also be fixedly arranged together.

[0138] The near-infrared light source 140 and the near-infrared camera unit 150 can also be moved relative to the drain section 190. For example, it is preferable that the near-infrared light source 140 and the near-infrared camera unit 150 can move in the horizontal and / or vertical directions along a moving mechanism controlled by the control unit 102. When the near-infrared light source 140 and the near-infrared camera unit 150 move, they can also move independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared camera unit 150 can also move as a single unit.

[0139] The processing liquid may also contain organic matter. For example, in organic matter, the bonds of CH, CO, CN, CF, etc., absorb specific wavelengths of near-infrared light. The amount of absorption of a specific wavelength of near-infrared light is directly proportional to the amount of the component with a specific bonding group, so the amount of a specific component of the substrate W can be determined based on the near-infrared light transmitted and / or reflected from the drain section 190. Therefore, the type of processing liquid flowing in the drain section 190 can be determined.

[0140] As described above, the control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 controls the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared camera unit 150, the cup body 180, and / or the draining unit 190. In one example, the control unit 102 controls the electric motor 124, valves 134a, 134b, and 134c, the moving mechanism 1381, the moving mechanism 1382, the near-infrared light source 140, the near-infrared camera unit 150, the cup body 180, and / or the draining unit 190.

[0141] According to the substrate processing apparatus 100 of this embodiment, a near-infrared imaging unit 150 captures images of a processing liquid within a chamber 112 irradiated by near-infrared light from a near-infrared light source 140. Typically, the processing liquid is transparent and transmits visible light. On the other hand, processing liquids generally exhibit strong absorption in the near-infrared region. Furthermore, processing liquids generally exhibit unique absorption characteristics in the near-infrared region depending on their type. Therefore, the type of processing liquid can be determined from the captured image obtained by the near-infrared imaging unit 150 capturing the processing liquid within the drain section 190.

[0142] It should be noted that when the processing liquid has a relatively high absorbance relative to near-infrared light, it is preferable that the near-infrared light source 140 emits near-infrared light and visible light. This allows the captured image to show the processing liquid within the drain section 190 with high brightness.

[0143] Alternatively, since the wavelength exhibiting strong absorption varies depending on the processing liquid, the near-infrared light source 140 can also vary the wavelength of the emitted near-infrared light. This makes it easy to determine the outer edge and type of the processing liquid.

[0144] The substrate processing apparatus 100 of this embodiment is suitable for fabricating semiconductor devices having semiconductors. Typically, in a semiconductor device, a conductive layer and an insulating layer are stacked on a substrate. During the fabrication of a semiconductor device, the substrate processing apparatus 100 is suitable for cleaning and / or processing (e.g., etching, property modification, etc.) of the conductive layer and / or the insulating layer.

[0145] Next, refer to Figures 1-3 The substrate processing apparatus 100 of this embodiment will be described. Figure 3This is a block diagram of the substrate processing apparatus 100.

[0146] like Figure 3 As shown, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexing robot IR, the central robot CR, the substrate holding section 120, the processing liquid supply section 130, the near-infrared light source 140, the near-infrared camera 150, the cup 180, and the drain section 190. Specifically, the control device 101 controls the indexing robot IR, the central robot CR, the substrate holding section 120, the processing liquid supply section 130, the near-infrared light source 140, the near-infrared camera 150, the cup 180, and the drain section 190 by sending control signals to them.

[0147] In addition, the storage unit 104 stores computer programs and data. The data includes process data. The process data contains information representing multiple processes. Each process specifies the processing content, processing steps, and substrate processing conditions for the substrate W. The control unit 102 executes the computer program stored in the storage unit 104 to perform substrate processing actions.

[0148] In addition, the process data includes type information indicating the type of processing liquid supplied from nozzle 136 to substrate W. Furthermore, the storage unit 104 pre-stores data that correlates the type of processing liquid with the brightness or lightness of the processing liquid in a reference image.

[0149] The control unit 102 controls the indexing robot IR to perform the transfer of the substrate W using the indexing robot IR.

[0150] The control unit 102 controls the central robot CR to transfer the substrate W. For example, the central robot CR accepts the unprocessed substrate W and moves the substrate W into one of the multiple chambers 112. In addition, the central robot CR accepts the processed substrate W from the chamber 112 and moves the substrate W out.

[0151] The control unit 102 controls the substrate holding unit 120 to control the start of rotation of the substrate W, the change of rotation speed, and the stop of rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0152] The control unit 102 can control the valve 134 of the processing fluid supply unit 130, switching the state of the valve 134 between an open state and a closed state. Specifically, the control unit 102 can control the valve 134 of the processing fluid supply unit 130 to set the valve 134 to the open state, thereby allowing the processing fluid flowing in the piping 132 toward the nozzle 136 to pass through. Alternatively, the control unit 102 can control the valve 134 of the processing fluid supply unit 130 to the closed state, thereby stopping the supply of processing fluid flowing in the piping 132 toward the nozzle 136.

[0153] The control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136. Specifically, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 above the upper surface Wt of the substrate W. In addition, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 to a retracted position away from the upper surface Wt of the substrate W.

[0154] The control unit 102 controls the near-infrared light source 140 and the near-infrared camera 150 to capture an image of at least a portion of the area containing the drainage section 190. The control unit 102 controls the near-infrared light source 140 to illuminate the area containing at least a portion of the drainage section 190 with near-infrared light. Furthermore, the control unit 102 controls the near-infrared camera 150 to capture an image of the area containing at least a portion of the drainage section 190.

[0155] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared camera unit 150 to emit near-infrared rays from the near-infrared light source 140 toward the common piping 13, and to receive the near-infrared rays transmitted or reflected from each component in the near-infrared camera unit 150 and measure the brightness value. It should be noted that the control unit 102 can also control the near-infrared light source 140 and the near-infrared camera unit 150 to move them relative to the common piping 13.

[0156] Furthermore, the control unit 102 determines the type of processing liquid within the drainage section 190 based on the captured image. Specifically, the control unit 102 determines the type of processing liquid in the captured image based on the brightness value within the captured image. Alternatively, the control unit 102 determines the type of processing liquid in the captured image based on both the brightness value within the captured image and the brightness value of a reference processing liquid stored in the storage unit 104.

[0157] The control unit 102 can also control the cup body 180 to move relative to the substrate W. Specifically, during the entire period when the processing liquid supply unit 130 supplies processing liquid to the substrate W, the control unit 102 raises the cup body 180 vertically upward to the side of the substrate W. In addition, at the end of the period when the processing liquid supply unit 130 supplies processing liquid to the substrate W, the control unit 102 lowers the cup body 180 vertically downward from the side of the substrate W.

[0158] The substrate processing apparatus 100 of this embodiment is suitable for forming semiconductor elements. For example, the substrate processing apparatus 100 is suitable for processing a substrate W used as a semiconductor element with a stacked structure. The semiconductor element is a so-called 3D structured memory (storage device). As an example, the substrate W is suitable for use as a NAND flash memory.

[0159] Furthermore, the control unit 102 controls the drainage unit 190 based on the determination of the type of treatment fluid. For example, the control unit 102 controls the switching timing for switching the flow destination of the treatment fluid flowing in the common piping 13 based on the determination of the type of treatment fluid.

[0160] Next, refer to Figure 4 This illustrates an example of the configuration of the switching valve 191. Figure 4 This is a diagram showing an example of the configuration of the switching valve 191 included in the substrate processing apparatus 100 of this embodiment.

[0161] like Figure 4 As shown, the switching valve 191 may also have a first valve core 193a to a fourth valve core 193d, a common flow path MR, and a first branch flow path BR1 to a fourth branch flow path BR4. The first valve core 193a and the first branch flow path BR1 are included in the first switching valve 191a. The second valve core 193b and the second branch flow path BR2 are included in the second switching valve 191b. The third valve core 193c and the third branch flow path BR3 are included in the third switching valve 191c. The fourth valve core 193d and the fourth branch flow path BR4 are included in the fourth switching valve 191d.

[0162] The common flow path MR extends in a straight line with a roughly horizontal orientation. One end of the common flow path MR is open, and the other end is closed. The upstream pipe 12 is connected to one end of the common flow path MR, and the flow path R1 of the upstream pipe 12 is connected to the common flow path MR.

[0163] Branch flow paths BR1 to BR4 are flow paths that branch off from the common flow path MR and are connected to the common flow path MR. Branch flow paths BR1 to BR4 extend in directions that intersect the extension direction of the common flow path MR.

[0164] One end of the first branch flow path BR1 is connected to the common flow path MR. The other end of the first pipe 141 is connected to the first branch flow path BR1, and the flow path R2a of the first pipe 141 is connected to the first branch flow path BR1.

[0165] One end of the second branch flow path BR2 is connected to the common flow path MR. The other end of the second pipe 142 is connected to the second branch flow path BR2, and the flow path R2b of the second pipe 142 is connected to the second branch flow path BR2.

[0166] One end of the third branch flow path BR3 is connected to the common flow path MR. The other end of the third pipe 143 is connected to the third branch flow path BR3, and the flow path R2c of the third pipe 143 is connected to the third branch flow path BR3.

[0167] One end of the fourth branch flow path BR4 is connected to the common flow path MR. The other end of the fourth pipe 144 is connected to the fourth branch flow path BR4, and the flow path R2d of the fourth pipe 144 is connected to the fourth branch flow path BR4.

[0168] The first valve core 193a is movable between a closed position and an open position. The closed position of the first valve core 193a indicates that the first valve core 193a closes one end of the first branch flow path BR1. The open position of the first valve core 193a indicates that the first valve core 193a opens one end of the first branch flow path BR1, thereby connecting the first branch flow path BR1 with the common flow path MR.

[0169] When the first valve core 193a moves from the open position to the closed position, one end of the first branch flow path BR1 closes, and the first branch flow path BR1 is not connected to the common flow path MR. Therefore, the first branch flow path BR1 is not connected to the flow path R1 of the upstream piping 12. On the other hand, when the first valve core 193a moves from the closed position to the open position, one end of the first branch flow path BR1 opens, and the first branch flow path BR1 is connected to the common flow path MR. That is, the first branch flow path BR1 is connected to the flow path R1 of the upstream piping 12.

[0170] Like the first valve core 193a, the second valve core 193b is movable between a closed position and an open position. The closed position of the second valve core 193b indicates that the second valve core 193b closes one end of the second branch flow path BR2. The open position of the second valve core 193b indicates that the second valve core 193b opens one end of the second branch flow path BR2, thus connecting the second branch flow path BR2 with the common flow path MR.

[0171] When the second valve core 193b moves from the open position to the closed position, one end of the second branch flow path BR2 closes, and the second branch flow path BR2 becomes disconnected from the common flow path MR. Therefore, the second branch flow path BR2 becomes disconnected from the flow path R1 of the upstream piping 12. On the other hand, when the second valve core 193b moves from the closed position to the open position, one end of the second branch flow path BR2 opens, and the second branch flow path BR2 becomes connected to the common flow path MR. That is, the second branch flow path BR2 becomes connected to the flow path R1 of the upstream piping 12.

[0172] Like the first valve core 193a and the second valve core 193b, the third valve core 193c is movable between a closed position and an open position. The closed position of the third valve core 193c indicates that the third valve core 193c closes one end of the third branch flow path BR3. The open position of the third valve core 193c indicates that the third valve core 193c opens one end of the third branch flow path BR3, thus connecting the third branch flow path BR3 with the common flow path MR.

[0173] When the third valve core 193c moves from the open position to the closed position, one end of the third branch flow path BR3 closes, and the third branch flow path BR3 becomes disconnected from the common flow path MR. Therefore, the third branch flow path BR3 becomes disconnected from the flow path R1 of the upstream piping 12. On the other hand, when the third valve core 193c moves from the closed position to the open position, one end of the third branch flow path BR3 opens, and the third branch flow path BR3 becomes connected to the common flow path MR. That is, the third branch flow path BR3 becomes connected to the flow path R1 of the upstream piping 12.

[0174] Like the first to third valves 193a and 193c, the fourth valve core 193d is movable between a closed position and an open position. The closed position of the fourth valve core 193d indicates that it closes one end of the fourth branch flow path BR4. The open position of the fourth valve core 193d indicates that it opens one end of the fourth branch flow path BR4, thus connecting the fourth branch flow path BR4 with the common flow path MR.

[0175] When the fourth valve core 193d moves from the open position to the closed position, one end of the fourth branch flow path BR4 closes, and the fourth branch flow path BR4 becomes disconnected from the common flow path MR. Therefore, the fourth branch flow path BR4 becomes disconnected from the flow path R1 of the upstream piping 12. On the other hand, when the fourth valve core 193d moves from the closed position to the open position, one end of the fourth branch flow path BR4 opens, and the fourth branch flow path BR4 becomes connected to the common flow path MR. That is, the fourth branch flow path BR4 becomes connected to the flow path R1 of the upstream piping 12.

[0176] Figure 4Example: A switching valve 191 in which the first valve core 193a is in the open position and the second valve cores 193b to the fourth valve cores 193d are in the closed position. In this case, the first piping 141 becomes the destination for the treatment fluid (drainage) flowing in the common piping 13.

[0177] Next, refer to Figure 5 The substrate processing apparatus 100 of this embodiment will be described. Figure 5 This is a block diagram showing the configuration of the control device 101 and the switching unit 19 included in the substrate processing apparatus 100 of this embodiment.

[0178] like Figure 5 As shown, the switching valve 191 further includes a first valve actuation unit 192a to a fourth valve actuation unit 192d. The first valve actuation unit 192a is included in the first switching valve 191a. Similarly, the second valve actuation unit 192b to the fourth valve actuation unit 192d are included in the second switching valve 191b to the fourth switching valve 191d, respectively.

[0179] The first valve drive unit 192a is controlled by the control device 101 (control unit 102) to move the first valve core 193a between a closed position and an open position. The first valve drive unit 192a may, for example, include a motor as the power source for the first valve core 193a.

[0180] Similarly, the second valve drive unit 192b is controlled by the control device 101 (control unit 102) to move the second valve core 193b between a closed position and an open position. The third valve drive unit 192c is controlled by the control device 101 (control unit 102) to move the third valve core 193c between a closed position and an open position. The fourth valve drive unit 192d is controlled by the control device 101 (control unit 102) to move the fourth valve core 193d between a closed position and an open position. The second valve drive unit 192b to the fourth valve drive unit 192d may, for example, each include a motor as the power source for the second valve core 193b to the fourth valve core 193d.

[0181] Next, refer to Figures 1-6 The substrate processing method of this embodiment is explained. Figure 6 This is a flowchart of a substrate processing method. It should be noted that step SB is an example of the "substrate holding process" of this invention.

[0182] like Figure 6 As shown, in step SA, the substrate W is moved into the substrate processing apparatus 100. Specifically, the substrate W is moved into the chamber 112 of the substrate processing unit 110 by means of the indexing robot IR and the central robot CR.

[0183] In step SB, the substrate W is held. Specifically, the substrate holding part 120 holds the substrate W in the chamber. When the substrate W is moved into the chamber 112, the substrate W is held by the substrate holding part 120.

[0184] In step SC, the substrate W is processed. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holding unit 120 rotates to hold the substrate W in a state, and the processing liquid supply unit 130 supplies processing liquid to the substrate W.

[0185] In this embodiment, a near-infrared light source 140 emits near-infrared rays. The near-infrared rays emitted from the near-infrared light source 140 are used to irradiate at least a portion of the area containing the drain section 190. For example, the common piping 13 is irradiated using the near-infrared rays emitted from the near-infrared light source 140. A near-infrared camera 150 captures an image of the area containing at least a portion of the drain section 190 that has been irradiated with near-infrared rays. For example, the near-infrared camera 150 captures an image of the common piping 13 that has been irradiated with near-infrared rays. By capturing an image of the area containing at least a portion of the drain section 190 that has been irradiated with near-infrared rays from the near-infrared camera 150, the processing liquid within the drain section 190 can be captured with high precision.

[0186] In step SD, the substrate W is released from holding. Specifically, the substrate holding section 120 releases the substrate W from holding.

[0187] In step SE, substrate W is removed. Substrate W is removed from substrate processing apparatus 100. Specifically, substrate W is removed from chamber 112 of substrate processing unit 110 by means of central robot CR and indexing robot IR.

[0188] According to this embodiment, the near-infrared camera 150 captures images of the treatment liquid irradiated by near-infrared light from the near-infrared light source 140. In most cases, the treatment liquid exhibits unique absorption in the near-infrared region depending on its type. Therefore, the type of treatment liquid can be determined from the captured image obtained by the near-infrared camera 150 capturing the treatment liquid within the drain section 190.

[0189] Next, refer to Figures 1 to 11 The substrate processing steps in the substrate processing method of this embodiment are explained. Figure 7 and Figure 8 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment. Figures 9-11 This is a diagram showing an example of the configuration of the switching valve 191 included in the substrate processing apparatus 100 of this embodiment.

[0190] exist Figure 7 and Figure 8In this invention, step S120 is an example of the "process of irradiating with near-infrared light," the "process of generating an image," and the "process of changing the near-infrared light source." Step S125 is an example of the "process of acquiring type information." Steps S130, S160, and S210 are examples of the "process of supplying multiple treatment solutions at different time intervals." Steps S140, S170, and S220 are examples of the "process of draining liquid." Steps S180 and S230 are examples of the "process of determining the type of treatment solution." Step S250 is an example of the "process of controlling the draining unit."

[0191] exist Figure 9 In this diagram, region AR1 represents the area illuminated by the near-infrared light source 140. Region AR2 represents the area captured by the near-infrared camera 150. In this embodiment, region AR1 and region AR2 are the same.

[0192] like Figure 7 As shown, in step S110, the substrate W is rotated while being held. Specifically, the substrate holding part 120 rotates the substrate W while holding it. For example, the rotation speed of the substrate W is 10 rpm to 1500 rpm. The process proceeds to step S120.

[0193] In step S120, the near-infrared light source 140 irradiates at least a portion of the area containing the drain section 190 with near-infrared light, and the near-infrared imaging unit 150 captures an image of the area containing at least a portion of the drain section 190 irradiated with near-infrared light. The near-infrared light source 140 irradiates at least a portion of the area containing the drain section 190 with near-infrared light, and the near-infrared imaging unit 150 captures an image of the area containing at least a portion of the drain section 190 irradiated with near-infrared light. The control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to emit near-infrared light from the near-infrared light source 140 toward the area containing at least a portion of the drain section 190, and to capture an image of the area containing at least a portion of the drain section 190 by the near-infrared imaging unit 150. It should be noted that the timing of the near-infrared light source 140 starting to emit near-infrared light and the timing of the near-infrared imaging unit 150 starting to capture an image of the substrate W can be the same or different. Furthermore, the timing at which the near-infrared light source 140 begins emitting near-infrared light can be earlier or later than the timing at which the near-infrared imaging unit 150 begins imaging the substrate W. The process proceeds to step S125.

[0194] In step S125, type information indicating the type of processing liquid is acquired. Specifically, the control unit 102 acquires type information indicating the type of processing liquid from the process data stored in the storage unit 104. In this embodiment, the type of processing liquid is, for example, SC1 (ammonia hydrogen peroxide aqueous solution), DIW, and IPA. Additionally, the control unit 102 acquires data from the process data stored in the storage unit 104 that correlates the type of processing liquid with the brightness or lightness of the processing liquid in the reference image. The process proceeds to step S130.

[0195] In step S130, a first processing liquid La is supplied to the upper surface Wt of the substrate W. Specifically, the first processing liquid supply unit 130a begins supplying the first processing liquid La to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the first processing liquid supply unit 130a to begin supplying the first processing liquid La to the upper surface Wt of the substrate W. The first processing liquid La is, for example, SC1. The process proceeds to step S140.

[0196] It should be noted that the supply of the processing liquid in step S130 can begin before or after the near-infrared irradiation and / or the imaging by the near-infrared camera unit 150 in step S120.

[0197] In step S140, the drain section 190 discharges the processing liquid after substrate processing to the outside of the chamber 112. Here, the drain section 190 discharges the first processing liquid La after substrate processing to the outside of the chamber 112. Here, as... Figure 9 As shown, in the switching valve 191, the first valve core 193a is in the open position, and the second valve core 193b to the fourth valve core 193d are in the closed position. In this case, the first piping 141 becomes the destination for the first processing liquid La flowing in the common piping 13. Therefore, the first processing liquid La after substrate processing flows in the upstream piping 12, then in the common piping 13, and then in the first piping 141. It should be noted that the valve can be driven in such a way that the first valve core 193a is in the open position and the second valve core 193b to the fourth valve core 193d are in the closed position at the timing in step S140. If the first valve core 193a is in the open position and the second valve core 193b to the fourth valve core 193d are in the closed position in advance, this state can also be maintained. The process proceeds to step S150.

[0198] In step S150, the supply of the first processing liquid La is stopped. Specifically, the first processing liquid supply unit 130a stops the supply of the first processing liquid La to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the first processing liquid supply unit 130a to stop the supply of the first processing liquid La after a predetermined period has elapsed since the start of its supply. The predetermined period is, for example, 30 seconds. The predetermined period, i.e., the time from the start of the supply of the first processing liquid La to the stop of its supply, is determined according to the process data stored in the storage unit 104. The process proceeds to step S160.

[0199] In step S160, rinsing fluid Lb is supplied to the upper surface Wt of the substrate W. Specifically, the rinsing fluid supply unit 130c begins supplying rinsing fluid Lb to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the rinsing fluid supply unit 130c to begin supplying rinsing fluid Lb to the upper surface Wt of the substrate W. By supplying rinsing fluid Lb to the upper surface Wt of the substrate W, the first processing fluid La covering the upper surface Wt of the substrate W is replaced by rinsing fluid Lb. The rinsing fluid Lb is, for example, DIW. The process proceeds to step S170.

[0200] In step S170, the drain section 190 discharges the processing liquid after substrate processing to the outside of the chamber 112. Here, the drain section 190 discharges the rinsing liquid Lb after substrate processing to the outside of the chamber 112. Here, as... Figure 10 As shown, in the switching valve 191, the first valve core 193a is in the open position, and the second valve core 193b to the fourth valve core 193d are in the closed position. In this case, the first piping 141 becomes the destination for the rinsing fluid Lb flowing in the common piping 13. Therefore, the rinsing fluid Lb after substrate processing flows in the upstream piping 12, then in the common piping 13, and then in the first piping 141 of the downstream piping 14. The first processing fluid La flowing in the drain section 190 is gradually diluted by the rinsing fluid Lb. That is, regarding the processing fluid flowing in the drain section 190, the proportion of the first processing fluid La decreases and the proportion of the rinsing fluid Lb increases over time. It should be noted that the valve can also be driven in a manner where the first valve core 193a is in the open position and the second valve core 193b to the fourth valve core 193d are in the closed position at the timing in step S170. If the valve is already in the open position with the first valve core 193a in the open position and the second valve core 193b to the fourth valve core 193d in the closed position, this state can also be maintained. The process proceeds to step S180.

[0201] In step S180, the type of processing liquid in the captured image is determined based on the image generated by the near-infrared camera 150. The control unit 102 determines the type of processing liquid in the captured image based on the captured image. In this embodiment, the control unit 102 determines the type of processing liquid in the common piping 13 based on the captured image. It should be noted that the control unit 102 may also determine the type of processing liquid in the upstream piping 12 based on the captured image.

[0202] More specifically, the control unit 102 determines the type of processing liquid in the captured image based on the brightness value or lightness within the captured image generated by the near-infrared camera unit 150. Alternatively, the control unit 102 determines the type of processing liquid in the captured image based on the brightness value or lightness within the captured image and the brightness value or lightness of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the type of processing liquid in the captured image based on the captured image and the reference image.

[0203] Furthermore, the control unit 102 determines the position of the rinsing fluid Lb (processing fluid) in the captured image based on the brightness value or lightness and type information within the captured image. Additionally, the control unit 102 identifies the area containing the first processing fluid La and the area containing the rinsing fluid Lb within a specified area of ​​the captured image (e.g., the area corresponding to the common piping 13) based on the brightness value or lightness within the captured image, the brightness value or lightness of the reference processing fluid stored in the storage unit 104, and type information. Furthermore, for example, the control unit 102 may also calculate the proportion of pixels with a brightness value or lightness corresponding to the first processing fluid La within the specified area of ​​the captured image (e.g., the area corresponding to the common piping 13) to the total number of pixels in the specified area. It should be noted that the control unit 102 may also calculate the sum of the brightness values ​​or lightness of all pixels in the specified area.

[0204] For example, if the area containing the rinsing fluid Lb is a predetermined area for image capture (e.g., the area corresponding to the common piping 13) with a predetermined value (e.g., 99%) or higher, the control unit 102 determines the type of processing fluid as rinsing fluid Lb. Alternatively, for example, if the calculated percentage is a predetermined value (e.g., 99%) or higher, the control unit 102 determines the type of processing fluid as rinsing fluid Lb. It should be noted that the control unit 102 may also determine the type of processing fluid as rinsing fluid Lb if the calculated total is a predetermined value or higher.

[0205] In step S190, the control unit 102 determines whether the determined type of the treatment fluid is rinsing fluid Lb. If the control unit 102 determines that the determined type of the treatment fluid is not rinsing fluid Lb (it was determined not in step S190), the process returns to step S180. Thus, the determination of the type of treatment fluid and the determination of whether the determined type of the treatment fluid is rinsing fluid Lb are repeated until the treatment fluid flowing in the drain section 190 is replaced by rinsing fluid Lb from the first treatment fluid La. On the other hand, if the control unit 102 determines that the determined type of the treatment fluid is rinsing fluid Lb (it was determined yes in step S190), the process proceeds to step S190.

[0206] In step S200, the supply of rinsing fluid Lb is stopped. Specifically, the rinsing fluid supply unit 130c stops supplying rinsing fluid Lb to the upper surface Wt of the substrate W. More specifically, the control unit 102 controls the rinsing fluid supply unit 130c (processing fluid supply unit 130) to stop the supply of rinsing fluid Lb based on the determination of the type of processing fluid. Specifically, if the control unit 102 determines that the determined type of processing fluid is rinsing fluid Lb (yes in step S190), the control unit 102 controls the rinsing fluid supply unit 130c (processing fluid supply unit 130) to stop the supply of rinsing fluid Lb. Therefore, the supply of rinsing fluid Lb is stopped after the processing fluid flowing in the drain section 190 has been sufficiently replaced by rinsing fluid Lb from the first processing fluid La. Therefore, the supply of rinsing fluid Lb can be stopped at an appropriate timing. As a result, the amount of rinsing fluid Lb used can be suppressed. Processing proceeds to... Figure 8 Step S210 is shown.

[0207] like Figure 8 As shown, in step S210, a second processing liquid Lc is supplied to the upper surface Wt of the substrate W. Specifically, the second processing liquid supply unit 130b begins supplying the second processing liquid Lc to the upper surface Wt of the substrate W. Here, the supply of the second processing liquid Lc begins simultaneously with the cessation of the supply of rinsing liquid Lb to the substrate W. The second processing liquid Lc is, for example, isopropyl alcohol (IPA). The process proceeds to step S220.

[0208] In step S220, the drain section 190 discharges the processing liquid after substrate processing to the outside of chamber 112. Here, the drain section 190 discharges the second processing liquid Lc after substrate processing to the outside of chamber 112. Here, as... Figure 10 As shown, in the switching valve 191, the first valve core 193a is in the open position, and the second valve core 193b to the fourth valve core 193d are in the closed position. Regarding the processing liquid flowing in the drain section 190, over time, the proportion of the rinsing liquid Lb decreases, and the proportion of the second processing liquid Lc increases. The process proceeds to step S230.

[0209] In step S230, the type of processing liquid in the captured image is determined based on the captured image generated by the near-infrared camera unit 150. The control unit 102 determines the type of processing liquid in the captured image based on the captured image. For example, the control unit 102 determines the type of processing liquid in the captured image based on the captured image.

[0210] Furthermore, the control unit 102 determines the type of processing liquid in the captured image based on the brightness value within the captured image. Alternatively, the control unit 102 determines the type of processing liquid in the captured image based on the brightness value within the captured image and the brightness value of a reference processing liquid stored in the storage unit 104.

[0211] In step S240, the control unit 102 determines whether the determined type of the treatment fluid is the second treatment fluid Lc. If the control unit 102 determines that the determined type of the treatment fluid is not the second treatment fluid Lc (it was determined not in step S240), the process returns to step S230. Thus, the determination of the type of treatment fluid and the determination of whether the determined type of the treatment fluid is the second treatment fluid Lc are repeated until the treatment fluid flowing in the drain section 190 is replaced by the second treatment fluid Lc from the rinsing fluid Lb. On the other hand, if the control unit 102 determines that the determined type of the treatment fluid is the second treatment fluid Lc (it was determined yes in step S240), the process proceeds to step S250.

[0212] In step S250, the control unit 102 controls the drainage unit 190 based on the determination of the type of treatment fluid. Specifically, the control unit 102 switches the flow destination of the treatment fluid flowing in the common piping 13 among multiple downstream piping 14. More specifically, if the control unit 102 determines in step S240 that the determined type of treatment fluid is the second treatment fluid Lc (determined as yes in step S240), the control unit 102 controls the switching valve 191 to drain the fluid from the common piping 13. Figure 10 As shown, in the switching valve 191, the state changes as follows: the first valve core 193a is in the open position, and the second valve core 193b to the fourth valve core 193d are in the closed position. Figure 11 The diagram shows the state in which the second valve core 193b is in the open position and the first valve core 193a, the second valve core 193b, and the fourth valve core 193d are in the closed position in the switching valve 191. As a result, the destination of the processing liquid flowing in the common piping 13 is switched from the first piping 141 to the second piping 142. Therefore, the second processing liquid Lc after substrate processing flows through the upstream piping 12, then through the common piping 13, and finally through the second piping 142. The process proceeds to step S260.

[0213] In step S260, the drain section 190 drains the processing liquid after substrate processing out of the chamber 112. Here, the drain section 190 drains the second processing liquid Lc after substrate processing out of the chamber 112. In step S250, the destination of the processing liquid flowing in the common piping 13 is switched from the first piping 141 to the second piping 142. Therefore, the second processing liquid Lc is discharged via the second piping 142.

[0214] In step S270, the supply of the second processing liquid Lc is stopped. Specifically, the second processing liquid supply unit 130b stops supplying the second processing liquid Lc to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the second processing liquid supply unit 130b to stop the supply of the second processing liquid Lc after a predetermined period has elapsed since the start of the supply. The predetermined period is, for example, 4 seconds. The predetermined period, that is, the time from the start of the supply of the second processing liquid Lc to the stop of the supply, is determined by the process data stored in the storage unit 104. The process proceeds to step S280.

[0215] In step S280, the rotation of the substrate W is stopped. Specifically, the control unit 102 controls the substrate holding unit 120 to stop the rotation of the substrate W. The process ends.

[0216] In this embodiment, an area including at least a portion of the drain section 190 is photographed using near-infrared light irradiated by the near-infrared camera 150. The near-infrared light is selectively absorbed by the processing liquid. Therefore, the processing liquid within the drain section 190 can be photographed with high precision. Consequently, the type of processing liquid within the drain section 190 can be determined. As a result, the control unit 102 can control the processing of the drain section 190 based on the type of processing liquid within the drain section 190.

[0217] As described above, the near-infrared light source 140 can also switch between emitting visible light and near-infrared light. Furthermore, the near-infrared camera unit 150 can switch between capturing images in the visible and near-infrared regions.

[0218] In this embodiment, as described above, the control unit 102 determines the type of treatment fluid in the area containing at least a portion of the drainage section 190 based on the captured image. Therefore, it is possible to confirm, for example, whether the treatment fluid in the drainage section 190 has been switched.

[0219] Furthermore, in this embodiment, after the control unit 102 determines that the determined type of processing liquid is the second processing liquid Lc (e.g., IPA) (determined as yes in step S240), the control unit 102 controls the drainage section 190 (step S250). Specifically, for example, after the processing liquid in the drainage section 190 is sufficiently replaced with the second processing liquid Lc, the flow destination of the processing liquid flowing through the common piping 13 is switched between the downstream piping 14. Therefore, the mixing of processing liquid in the downstream piping 14 can be suppressed. For example, the mixing of the first processing liquid La (e.g., SC1) and the second processing liquid Lc (e.g., IPA) can be suppressed in the downstream piping 14.

[0220] Furthermore, the time from the start of supplying the rinsing fluid (step S160) to the stop of supplying the rinsing fluid (step S200) is typically preset. Generally, it is preferable to continuously supply rinsing fluid Lb to the substrate W from the rinsing fluid supply section 130c until the processing fluid flowing in the drain section 190 is sufficiently replaced by rinsing fluid. However, the time required for the processing fluid to be sufficiently replaced by rinsing fluid in the drain section 190 typically varies depending on factors such as temperature. Therefore, the time from the start of supplying rinsing fluid Lb to the substrate W to the stop of supplying rinsing fluid Lb to the substrate W is set to be relatively long. In this embodiment, a supply setting time representing the time from the start of supplying rinsing fluid Lb to the substrate W to the stop of supplying rinsing fluid to the substrate W is also set in the process. In the following description, the time from the start of supplying rinsing fluid Lb to the substrate W to the stop of supplying rinsing fluid to the substrate W will sometimes be referred to as the "rinsing fluid supply period". In addition, the time from the start of supplying rinsing fluid Lb to the substrate W to the stop of supplying rinsing fluid to the substrate W will sometimes be referred to as the "rinsing fluid supply setting time".

[0221] In this embodiment, in step S190, if the control unit 102 determines that the determined type of processing fluid is rinsing fluid Lb, the process proceeds to step S200 regardless of whether the rinsing fluid supply setting time has elapsed. In this case, for example, the control unit 102 rewrites the process according to the timing of determining that the determined type of processing fluid is rinsing fluid Lb, so as to shorten the rinsing fluid supply setting time (e.g., 15 seconds). It should be noted that, for example, the control unit 102 may also rewrite the process according to the timing of determining that the determined type of processing fluid is rinsing fluid Lb, so as to increase the rinsing fluid supply setting time (e.g., 15 seconds).

[0222] In this way, since it is possible to confirm whether the processing liquid in the drain section 190 has been switched, the supply of processing liquid (e.g., rinsing liquid Lb) from the processing liquid supply section 130 is stopped at the time when it is confirmed that the processing liquid in the drain section 190 has been switched, regardless of whether the rinsing liquid supply set time has elapsed. This shortens the substrate processing time. Furthermore, since the amount of rinsing liquid Lb used can be reduced, the environmental impact can be decreased. Additionally, by shortening the substrate processing time, the amount of processing liquid discharged after substrate processing can be reduced. If the amount discharged increases, the burden on the factory increases. According to this embodiment, the burden on the factory can be reduced by decreasing the amount of liquid discharged.

[0223] Furthermore, as described above, the processing liquid supply unit 130 supplies multiple processing liquids to the substrate W at different times. In this way, the present invention is particularly effective when multiple processing liquids are supplied to the substrate W at different times, that is, when the draining unit 190 drains the multiple processing liquids.

[0224] Furthermore, as described above, the control unit 102 controls the processing fluid supply unit 130 based on the determination of the type of processing fluid. Therefore, it is possible to easily switch the flow destination of the processing fluid flowing in the drainage unit 190 according to the condition of the processing fluid in the drainage unit 190.

[0225] Furthermore, as described above, the drainage section 190 includes an upstream pipe 12, a common pipe 13, and a downstream pipe 14. The upstream pipe 12 allows flow of various types of treatment fluids discharged from the chamber 112. The common pipe 13 is connected to the downstream end 12b of the upstream pipe 12. The downstream pipe 14 is connected to the upstream end 14a of the common pipe 13. In this way, when multiple types of treatment fluids flow in the upstream pipe 12, the present invention is particularly effective in determining the type of treatment fluid.

[0226] Furthermore, as described above, the control unit 102 determines the type of treatment fluid in the area including the shared piping 13 based on the captured images. Therefore, the condition of the treatment fluid in the shared piping 13 can be easily confirmed. For example, it can be easily confirmed whether the treatment fluid in the shared piping 13 has been switched. That is, it can be easily confirmed whether the treatment fluid in the drain section 190 has been switched.

[0227] Furthermore, as described above, the drain section 190 includes a switching section 19. The switching section 19 switches the flow destination of the treatment liquid flowing in the common piping 13 between multiple downstream piping sections 14. Therefore, the treatment liquid can be discharged separately to different downstream piping sections 14. As a result, the mixing of treatment liquids in the downstream piping sections 14 can be suppressed. For example, in the downstream piping sections 14, the mixing of the first treatment liquid La (e.g., SC1) and the second treatment liquid Lc (e.g., IPA) can be suppressed.

[0228] Furthermore, as described above, the control unit 102 can also determine the type of treatment fluid in the area including the upstream piping 12 based on the captured images. Therefore, the condition of the treatment fluid in the upstream piping 12 can be easily confirmed. For example, it can be easily confirmed whether the treatment fluid in the upstream piping 12 has been switched. That is, it can be easily confirmed whether the treatment fluid in the drain section 190 has been switched.

[0229] It should be noted that, in reference Figures 9 to 11 In the illustrated example, the near-infrared irradiated area AR1 is an area that includes at least a portion of the shared piping 13, but is not limited thereto. For example, the near-infrared irradiated area AR1 could also be an area that includes at least a portion of the upstream piping 12.

[0230] In addition, in reference Figures 9 to 11 In the illustrated example, the area AR2 captured by the near-infrared camera 150 is an area that includes at least a portion of the shared piping 13, but is not limited thereto. For example, the area AR2 captured by the near-infrared camera 150 could also be an area that includes at least a portion of the upstream piping 12.

[0231] Figure 12 This diagram illustrates an example of the configuration of the switching valve 191 included in the substrate processing apparatus 100 of this embodiment. Figure 12 In the diagram, region AR1 represents the area illuminated by the near-infrared light source 140. Region AR2 represents the area captured by the near-infrared camera 150. For example... Figure 12 As shown, the area AR1 irradiated with near-infrared light is an area that includes at least a portion of the upstream piping 12. The area AR2 captured by the near-infrared camera 150 is also an area that includes at least a portion of the upstream piping 12.

[0232] In this embodiment, region AR1 and region AR2 are the same. Preferably, region AR1 and region AR2 are located on the downstream end 12b side of the upstream piping 12 (see...). Figure 2 In other words, it is preferable that zones AR1 and AR2 be located near the common piping 13. By positioning zones AR1 and AR2 near the common piping 13, the time it takes for the processed liquid in zones AR1 and AR2 to reach the common piping 13 can be shortened. Therefore, unwanted processed liquid contamination into the common piping 13 can be prevented.

[0233] In this embodiment, the near-infrared light source 140 irradiates the region AR1, which includes at least a portion of the upstream piping 12, with near-infrared light. The near-infrared camera 150 captures images of various processing liquids within the upstream piping 12 irradiated with near-infrared light to generate images. The control unit 102 determines the type of processing liquid within the upstream piping 12 based on the captured images. Therefore, it is possible to confirm whether the processing liquid within the upstream piping 12 has been switched.

[0234] It should be noted that the near-infrared irradiated area AR1 may also include area AR1 containing at least a portion of the shared piping 13 and area AR1 containing at least a portion of the upstream piping 12. Additionally, the area AR2 captured by the near-infrared camera 150 may also include area AR1 containing at least a portion of the shared piping 13 and area AR1 containing at least a portion of the upstream piping 12.

[0235] Next, refer to Figure 13 Examples of near-infrared light source 140 are described. Here, examples of near-infrared light source 140 including near-infrared light source 140a and near-infrared light source 140b are described. Figure 13 This is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 equipped with multiple near-infrared light sources 140 (near-infrared light source 140a and near-infrared light source 140b). Figure 13 The substrate processing unit 110 shown has multiple near-infrared light sources 140, and also has... Figure 2 The substrate processing unit 110 shown has the same configuration, and repeated descriptions are omitted to avoid being too lengthy.

[0236] like Figure 13 As shown, the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b. The near-infrared light source 140a and the near-infrared light source 140b emit near-infrared rays with different peak wavelengths.

[0237] The control unit 102 obtains process data from the storage unit 104, and from the process data obtains type information indicating the type of processing liquid supplied to the substrate W by the processing liquid supply units 130 (first processing liquid supply unit 130a, second processing liquid supply unit 130b, and rinsing liquid supply unit 130c). Additionally, for example, the process data may also include information indicating the type of near-infrared light source 140 corresponding to the type of processing liquid. Furthermore, for example, the control unit 102 obtains type information indicating the type of processing liquid supplied by the processing liquid supply units 130 (first processing liquid supply unit 130a, second processing liquid supply unit 130b, and rinsing liquid supply unit 130c) from user input information.

[0238] The control unit 102 changes the near-infrared light source 140 that irradiates at least a portion of the area including the drain section 190 based on the acquired type information. For example, when the rinsing liquid supply unit 130c supplies DIW to the substrate W, that is, when DIW is drained from the drain section 190, the control unit 102 irradiates with the near-infrared light source 140a. On the other hand, when the control unit 102 supplies IPA to the substrate W by the second processing liquid supply unit 130b, that is, when IPA is drained from the drain section 190, the control unit 102 irradiates with the near-infrared light source 140b.

[0239] Reference Figure 7 , Figure 13 and Figure 14 This describes the substrate processing steps in a substrate processing method when multiple near-infrared light sources 140 are provided. Figure 14 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment. Figure 14 The flowchart, apart from changing the near-infrared light source 140, is similar to... Figure 8 The flowchart is the same, and repeated descriptions are omitted to avoid being too lengthy. It should be noted that step S205 in the example where the near-infrared light source 140 has multiple features is an example of the "process of changing near-infrared light" of the present invention.

[0240] like Figure 7 As shown, steps S110 to S200 are performed. In this embodiment, after step S200 is completed, the process proceeds to... Figure 14 The step S205 is shown.

[0241] like Figure 14 As shown, in step S205, the control unit 102 changes the near-infrared light source 140 that irradiates at least a portion of the area containing the drainage section 190 based on the type information. Specifically, the control unit 102 changes the near-infrared light source 140 that irradiates at least a portion of the area containing the drainage section 190 from near-infrared light source 140a to near-infrared light source 140b based on the type information. The process proceeds to step S210.

[0242] Steps S220 to S280 and Figure 8 The steps S220 to S280 shown are the same.

[0243] In this embodiment, as described above, the control unit 102 acquires type information indicating the type of the treatment liquid, and changes the near-infrared light source 140 that irradiates at least a portion of the area including the drain section 190 based on the acquired type information. Therefore, since the near-infrared light used for irradiation can be changed according to the absorbance (also known as light absorption rate) of the treatment liquid, the type of treatment liquid can be determined more accurately even when the type of treatment liquid is changed.

[0244] Specifically, the absorbance of a processing liquid varies depending on its type. Therefore, for example, by irradiating the second processing liquid with light of a wavelength with higher absorbance and photographing the processing liquid, the contrast in brightness or lightness between the area representing the second processing liquid and the area outside the second processing liquid in the photographed image can be improved. This allows for a more accurate determination of the type of processing liquid based on the photographed image.

[0245] The near-infrared light source 140 features multiple examples of other effects and uses. Figures 1-12 The substrate processing apparatus 100 described above has the same effect.

[0246] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments and can be implemented in various ways without departing from its spirit. Furthermore, various inventions can be formed by appropriately combining the multiple constituent elements disclosed in the above embodiments. For example, some constituent elements may be deleted from all the constituent elements shown in the embodiments. In addition, constituent elements from different embodiments may be appropriately combined. For ease of understanding, the accompanying drawings mainly schematically show each constituent element; for ease of drawing, the thickness, length, number, spacing, etc., of each constituent element shown may sometimes differ from the actual dimensions. Furthermore, the material, shape, size, etc., of each constituent element shown in the above embodiments are examples and are not particularly limited; various modifications can be made without substantially departing from the effects of the present invention.

[0247] For example, the above embodiments illustrate the application of the present invention in a substrate processing step to shorten substrate processing time, but the present invention is not limited thereto. For example, the present invention can also be applied when a set rinse fluid supply time (e.g., 10 seconds) is set (during process creation). In this case, process creation time can be shortened. Furthermore, similar to the above embodiments, since the amount of rinse fluid Lb used can be reduced, environmental impact can be decreased.

[0248] Furthermore, in the above embodiment, an example is shown where the drain section 190 has a switching section 19, but the present invention is not limited thereto. For example, the drain section 190 may not have a switching section 19.

[0249] Industrial availability

[0250] This invention can be applied to the field of substrate processing apparatus.

Claims

1. A substrate processing apparatus, characterized in that, include: chamber; A substrate holding portion that holds the substrate is housed within the cavity; The processing liquid supply unit supplies various processing liquids to the substrate at different time intervals; The drainage section discharges the various treatment liquids to the outside of the chamber. At least one near-infrared light source that uses near-infrared light to illuminate the area including at least a portion of the drainage section; A near-infrared camera unit that captures images of the various treatment liquids within the drainage section irradiated by the near-infrared rays by receiving the near-infrared rays transmitted through components within the drainage section and / or reflected by them, and generates captured images. as well as The control unit controls the near-infrared camera unit. The control unit determines the type of the processing liquid in the drainage section based on the brightness value, lightness, or image of the captured image and the reference processing liquid.

2. A substrate processing apparatus, characterized in that, include: chamber; A substrate holding portion that holds the substrate is housed within the cavity; The processing liquid supply unit supplies various processing liquids to the substrate at different time intervals; The drainage section discharges the various treatment liquids to the outside of the chamber. At least one near-infrared light source that uses near-infrared light to illuminate the area including at least a portion of the drainage section; A near-infrared camera unit captures images of the various treatment liquids within the drainage section that are irradiated by the near-infrared light, and generates captured images; and The control unit controls the near-infrared camera unit. The drainage section has: Upstream piping for the flow of the various treatment fluids discharged from the chamber; A shared piping connection, which is connected to the downstream end of the upstream piping; and Multiple downstream piping units, the upstream ends of which are connected to the shared piping unit. The near-infrared light source illuminates the area including at least a portion of the shared piping using near-infrared light. The near-infrared camera captures images of the various treatment liquids within the shared piping that are irradiated by the near-infrared light, and generates the captured images. The control unit determines the type of treatment fluid in the shared piping based on the captured images.

3. A substrate processing apparatus, characterized in that, include: chamber; A substrate holding portion that holds the substrate is housed within the cavity; The processing liquid supply unit supplies various processing liquids to the substrate at different time intervals; The drainage section discharges the various treatment liquids to the outside of the chamber. At least one near-infrared light source that uses near-infrared light to illuminate the area including at least a portion of the drainage section; A near-infrared camera unit captures images of the various treatment liquids within the drainage section that are irradiated by the near-infrared light, and generates captured images; and The control unit controls the near-infrared camera unit. The at least one near-infrared light source can be multiple. The multiple near-infrared light sources emit near-infrared rays with different peak wavelengths. The control unit determines the type of the treatment liquid in the drainage section based on the captured image. The control unit acquires type information indicating the type of the treatment liquid. The control unit changes the near-infrared light source that irradiates the area including at least a portion of the drainage section based on the type information.

4. A substrate processing apparatus, characterized in that, include: chamber; A substrate holding portion that holds the substrate is housed within the cavity; The processing liquid supply unit supplies various processing liquids to the substrate at different time intervals; The drainage section discharges the various treatment liquids to the outside of the chamber. At least one near-infrared light source that uses near-infrared light to illuminate the area including at least a portion of the drainage section; A near-infrared camera unit that captures images of the various treatment liquids within the drainage section that are irradiated by the near-infrared light and generates captured images; as well as The control unit controls the near-infrared camera unit. The control unit determines the type of the treatment liquid in the drainage section based on the captured image. The control unit controls the processing liquid supply unit based on the determination of the type of processing liquid.

5. The substrate processing apparatus according to any one of claims 1 to 4, characterized in that, The control unit controls the discharge unit based on the determination of the type of the treatment liquid.

6. The substrate processing apparatus according to any one of claims 1, 3, and 4, characterized in that, The drainage section has: Upstream piping for the flow of the various treatment fluids discharged from the chamber; A shared piping connection, which is connected to the downstream end of the upstream piping; and Multiple downstream piping units have their upstream ends connected to the common piping unit.

7. The substrate processing apparatus according to claim 6, characterized in that, The drainage section also includes a switching section that switches the destination of the treatment liquid flowing in the common piping between the plurality of downstream piping sections.

8. The substrate processing apparatus according to claim 6, characterized in that, The near-infrared light source illuminates an area including at least a portion of the upstream piping using near-infrared light. The near-infrared camera captures images of the various treatment liquids within the upstream piping that are irradiated by the near-infrared light, and generates the captured images. The control unit determines the type of the treatment fluid in the upstream piping based on the captured images.

9. The substrate processing apparatus according to claim 7, characterized in that, The control unit controls the switching timing for changing the flow destination of the treatment fluid flowing in the common piping, based on the determination result of the type of treatment fluid.

10. A substrate processing method, characterized in that, Include: The process of holding the substrate within the cavity; A process of supplying various processing liquids to the substrate at different time intervals; The process of discharging the various treatment liquids outside the chamber by the drainage section; A process of irradiating an area including at least a portion of the drainage section with near-infrared light; A process of generating an image of the various treatment liquids within the drainage section irradiated by near-infrared light, obtained by receiving near-infrared light transmitted through components within the drainage section and / or reflected by the near-infrared light; and The process of determining the type of the treatment liquid in the drainage section based on the captured image and the brightness value, lightness, or image of the reference treatment liquid.

11. A substrate processing method, characterized in that, Include: The process of holding the substrate within the cavity; A process of supplying various processing liquids to the substrate at different time intervals; The process of discharging the various treatment liquids outside the chamber by the drainage section; A process in which one of a plurality of near-infrared light sources emitting near-infrared rays with different peak wavelengths irradiates an area including at least a portion of the drain section with the near-infrared rays. A process of taking images of the various treatment liquids in the drainage section that are irradiated by the near-infrared rays to obtain images; The process of determining the type of treatment liquid in the drainage section based on the captured images; The process of obtaining type information indicating the type of the treatment liquid; and The process of modifying the near-infrared light source that irradiates at least a portion of the area including the drainage section based on the aforementioned type information.

12. A substrate processing method, characterized in that, Include: The process of holding the substrate within the cavity; A process of supplying various processing liquids to the substrate at different time intervals; The process of discharging the various treatment liquids outside the chamber by the drainage section; A process of irradiating an area including at least a portion of the drainage section with near-infrared light; The process of capturing images of the various treatment liquids within the drainage section that have been irradiated by the near-infrared light; and the process of obtaining images by photographing the images; The process of determining the type of treatment liquid in the drainage section based on the captured images. In different timed processes of supplying the processing liquid, the processing liquid supplied to the substrate is switched based on the determination of the type of processing liquid.

13. The substrate processing method according to any one of claims 10 to 12, characterized in that, It also includes a process for controlling the discharge section based on the determination of the type of the treatment liquid.

14. The substrate processing method according to claim 13, characterized in that, The drainage section has: Upstream piping, which supplies the flow of the various treatment fluids discharged from the chamber; A shared piping connection, which is connected to the downstream end of the upstream piping; and Multiple downstream piping units have their upstream ends connected to the common piping unit.

15. The substrate processing method according to claim 14, characterized in that, In the process of controlling the drainage section, the destination of the treatment liquid flowing in the common piping is switched among the multiple downstream piping sections.

16. The substrate processing method according to claim 14, characterized in that, In the process of irradiation using the near-infrared rays, the area including at least a portion of the upstream piping is irradiated using the near-infrared rays. In the process of generating the captured image, the various treatment liquids in the upstream piping irradiated by the near-infrared light are photographed and the captured image is generated. In the process of determining the type of the treatment fluid, the type of treatment fluid in the upstream piping is determined based on the captured image.

17. The substrate processing method according to claim 14, characterized in that, In the process of irradiation using the near-infrared rays, the area including at least a portion of the shared piping is irradiated using the near-infrared rays. In the process of generating the captured image, the various treatment liquids within the shared piping irradiated by the near-infrared light are photographed and the captured image is generated. In the process of determining the type of the treatment fluid, the type of the treatment fluid in the shared piping is determined based on the captured images.

18. The substrate processing method according to claim 15, characterized in that, In the process of controlling the drainage section, based on the determination result of the type of the treatment liquid, the switching timing for switching the flow destination of the treatment liquid flowing in the common piping is controlled.

Images