Dynamic vacuum sealing system for physical vapor deposition sputtering applications

Abstract

A vacuum seal and sealing system is provided that includes a corresponding spacer ring and a corresponding sputter target. The seal and sealing system can be used in PVD sputtering applications. The seal can include a compressible portion and a rigid portion. The compressible portion can include two or more higher profile protrusions and two or more lower profile recesses that facilitate the formation of a vacuum seal by compression through and between the spacer ring and the sputter target. The seal can also include a removable and replaceable plasma shield that is attachable to a first end of the seal. The seal can also include an edge on a second end that selectively couples with a corresponding step portion of the spacer ring. The sputter target can have a continuous perimeter flange surface. In one embodiment, the seal and sealing system is self-centering.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority to U.S. Patent Application No. 63 / 367,914, filed July 8, 2022, entitled “Dynamic Vacuum Sealing System for Physical Vapor Deposition Sputtering Applications,” the entire contents of which are incorporated herein by reference. Technical Field

[0003] This disclosure generally relates to a dynamic vacuum sealing system for physical vapor deposition sputtering applications, and more specifically to a vacuum seal and sealing system comprising a corresponding isolation ring and a corresponding sputtering target that does not contain an O-ring and a corresponding groove or any vent or scallop. Background Technology

[0004] Physical vapor deposition (PVD) is a thin-film deposition technique used in manufacturing processes to create coatings and coating patterns on desired surface substrates. This technique can employ sputtering methods to transfer material from a solid source (such as a sputtering target) to a substrate surface in a vacuum environment. PVD can be used in a variety of applications, such as semiconductor manufacturing, glass coating, optical coating, solar cell coating, nanotechnology, etc., to deposit thin film layers. Sputtering in a vacuum environment can also be used to provide sputter cleaning, such as in ion plating.

[0005] In one example, PVD might involve bombarding a sputtering target with high-energy particles (such as ions or plasma) to eject atoms or molecules from the target surface, which are then vaporized in a vacuum chamber. The vaporized particles can then pass through the vacuum chamber and deposit onto a substrate surface, forming a thin film layer. The sputtering target is consumed and has a limited lifetime, depending on the erosion characteristics and available materials. The composition of the deposited film is determined by the material composition of the sputtering target and can be selected to provide desired properties such as conductivity, optical characteristics, adhesion, etc.

[0006] PVD processes typically require a high vacuum environment to minimize gas interference and unwanted reactions; however, achieving and maintaining a high vacuum environment is technically demanding and costly. Furthermore, the presence of residual gases or contaminants can affect the quality and properties of the deposited film. Proper sealing is necessary to maintain vacuum integrity and prevent air or other gases from entering or escaping the vacuum chamber and disrupting the controlled environment. This is essential to minimize system contamination, ensure the accuracy and reliability of the process performed in a high vacuum environment, and meet other considerations such as safety assurance and energy efficiency. Summary of the Invention

[0007] The following is an overview of this disclosure to provide a basic understanding of certain aspects. This overview is not intended to identify key or essential elements, nor is it intended to limit any aspects of the embodiments or claims. Furthermore, this overview provides a simplified summary of certain aspects that may be described in more detail in other parts of this disclosure. Any aspect described may be used alone or in combination with other described aspects without limitation, and will have the same effect as if described individually and explicitly in various possible combinations.

[0008] Disclosed is a vacuum seal and sealing system comprising a corresponding isolation ring and a corresponding sputtering target. This seal and sealing system can be used in PVD sputtering applications. In one embodiment, the seal and sealing system does not include an O-ring and a corresponding groove or any vent or fan-shaped groove, or other shape or feature with similar functionality. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher profile protrusions and two or more lower profile recesses, which facilitate the formation of a vacuum seal between the isolation ring and the sputtering target by compression. The rigid portion may be encapsulated by the same material as the compressible portion. The seal may also include a removable and replaceable plasma shield capable of being attached to a first end of the seal. The seal may also include an edge located at a second end that selectively engages with a corresponding stepped portion of the isolation ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system are self-centered. In one embodiment, the seal and sealing system provide an enlarged sealing surface or interface. In one embodiment, the seal and sealing system provide cushioning between the sputtering target and the isolation ring.

[0009] In one exemplary embodiment of the present invention, a sealing ring for a physical vapor deposition (PVD) vacuum chamber is disclosed, the sealing ring having: a compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; a rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs substantially encapsulated by an auxiliary material; an edge extending from a first surface of the sealing ring and configured to selectively engage with an isolation ring; and a removable shield configured to selectively engage with a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber.

[0010] In other aspects, the compressible portion is made of a fluorocarbon compound, a fluorinated elastomer, or a fluorinated rubber material. In another aspect, the auxiliary material is the same material as the compressible portion and the edge. Additionally, the at least one protrusion extends past the first surface and the second opposing surface of the sealing ring. In other aspects, the at least one recess terminates before the first surface and the second opposing surface of the sealing ring. Additionally, each of the at least one protrusion and each of the at least one recess alternates. In other aspects, the compressible material and the at least one recess are configured to entrain microparticles.

[0011] In addition, the ribs of the rigid portion are made of aluminum. In other aspects, the compressible portion and the rigid portion are approximately the same length. In addition, the shield is configured to snap-fit ​​with the first end of the compressible portion. In other aspects, the shield is configured to suppress plasma arcing and thermal degradation of the compressible portion. In addition, the shield comprises polytetrafluoroethylene (PTFE). In other aspects, the edge also includes a plurality of retaining tabs. In other aspects, the sealing ring is configured to selectively engage with the isolation ring by an interference fit, thereby forming a seal between the sealing ring and the isolation ring when installed in a PVD vacuum chamber.

[0012] In an additional aspect, the sealing ring is configured to self-align with the isolation ring using the plurality of retaining tabs on the edge and the approximately 90-degree stepped portion of the isolation ring. In another aspect, the second surface of the sealing ring is configured to selectively engage with the sputtering target, thereby forming a seal between the sealing ring and the sputtering target when mounted into a PVD vacuum chamber. In an additional aspect, the sputtering target has no grooves, vents, or fan-shaped slots and is configured to contact the sealing ring with a flat surface. In another aspect, the sealing ring is configured to provide cushioning between the sputtering target and the isolation ring.

[0013] In yet another embodiment, a sputtering target is disclosed having a first surface configured to selectively engage with a sealing ring on a PVD vacuum chamber, wherein the first surface has no grooves, vents, or fan-shaped slots and is configured to contact the sealing ring with a flat surface. In another aspect, the first surface is configured to be isolated from an isolation ring, wherein the isolation ring is configured to selectively engage with opposite sides of the sealing ring on the vacuum chamber when mounted into the PVD vacuum chamber. In other aspects,

[0014] In other embodiments, an isolation ring is provided, comprising: a first surface configured to selectively engage a compressible and a rigid portion of a sealing ring when mounted in a PVD vacuum chamber, wherein the first surface is generally flat; and a stepped portion configured to selectively engage an edge of the sealing ring when mounted in the PVD vacuum chamber. In yet another aspect, the stepped portion has a cut of approximately 90 degrees.

[0015] In an additional embodiment, a sealing kit for a vacuum chamber is provided, the sealing kit comprising:

[0016] A sealing ring, comprising: a compressible portion; a rigid portion adjacent to the compressible portion; and an edge extending perpendicularly from the rigid portion. An isolation ring configured to selectively engage a first mating surface of the isolation ring including the edge, wherein the isolation ring includes a notch configured to selectively receive and contact the edge of the sealing ring, thereby forming a seal between the isolation ring and the sealing ring upon mounting into a PVD vacuum chamber. A sputtering target including a substantially planar first mating surface configured to selectively engage a second mating surface of the sealing ring, thereby forming a seal between the sputtering target and the sealing ring upon mounting into a PVD vacuum chamber.

[0017] On the other hand, the first mating surface of the sputtering target has no O-ring grooves, ventilation slots, or fan-shaped grooves. In yet another aspect, the compressible portion includes at least one protrusion and at least one recess, wherein each of the at least one protrusion and each of the at least one recess alternates. In other aspects, the ribs of the rigid portion are suspended in the same material comprising the compressible material and the edge. In yet another aspect, the sealing ring further includes a plasma shield configured to attach to the inner peripheral side of the compressible portion.

[0018] In other respects, both the sputtering target and the isolation ring are sealed to the sealing ring. In another respect, the sputtering target and the isolation ring are isolated from each other by the sealing ring.

[0019] In another embodiment, a method for assembling a sealing kit is provided, the method comprising: placing an isolation ring on a PVD vacuum chamber, wherein the isolation ring includes a step on a mating surface; placing a sealing ring on the mating surface of the isolation ring, the sealing ring having a first mating surface and a second mating surface located on opposite sides of the first mating surface, wherein the first mating surface of the sealing ring includes an edge configured to selectively engage with the step of the isolation ring, and wherein the first mating surface of the sealing ring contacts the mating surface of the isolation ring; placing a sputtering target on the second mating surface of the sealing ring, wherein the sealing ring includes a compressible portion and a shield, and wherein the sputtering target is configured to compress the compressible portion and the shield of the sealing ring; wherein the isolation ring and the sealing ring form a seal when installed in the PVD vacuum chamber, and the sealing ring and the sputtering target form a seal when installed in the PVD vacuum chamber. In other aspects, the sputtering target and the isolation ring are isolated from each other by the sealing ring.

[0020] A sealing kit for a physical vapor deposition (PVD) vacuum chamber is also disclosed, the sealing kit having a sealing ring for the PVD vacuum chamber, the sealing ring having: a compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; a rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs, the ribs being substantially encapsulated by an auxiliary material; an edge extending from a first surface of the sealing ring and configured to selectively engage with an isolation ring; and a removable shield configured to selectively engage with a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber.

[0021] An isolation ring having a first surface configured to selectively engage with the compressible and rigid portions of the sealing ring when mounted in a PVD vacuum chamber, wherein the first surface is generally flat; and a stepped portion configured to selectively engage with the edge of the sealing ring when mounted in a PVD vacuum chamber. A sputtering target having a first surface having an outer peripheral flange surface configured to engage with the sealing ring when mounted in a PVD vacuum chamber, wherein the outer peripheral flange surface of the first surface has no O-ring grooves, ventilation slots, or fan-shaped grooves, and is configured to contact the sealing ring with a flat surface.

[0022] The following description and accompanying drawings disclose various illustrative aspects. Some improvements and novel aspects may be explicitly pointed out, while others may be obvious from the description and accompanying drawings. Attached Figure Description

[0023] This teaching can be better understood by referring to the following detailed description in conjunction with the accompanying drawings, in which the same reference numerals denote the same parts throughout the text, wherein:

[0024] Figure 1A An embodiment of a conventional vacuum chamber and seal is shown, which includes an O-ring inserted into a dovetail groove machined in a sputtering target;

[0025] Figure 1B It shows Figure 1A An enlarged view of a conventional vacuum chamber and seals, including an O-ring inserted into a dovetail groove machined in a sputtering target;

[0026] Figures 1C to 1F An embodiment of a conventional vacuum chamber and seal is shown, which includes an O-ring inserted into a dovetail groove machined in a sputtering target, and also includes an inner ventilation groove (i), a fan-shaped groove (ii), a cross-shaped gland ventilation groove (iii), and an outer ventilation groove (iv).

[0027] Figures 2A to 2F It shows Figures 1A to 1C Examples of potential arcing events, oxidation, nodule formation, wear, and redeposition that can occur in traditional vacuum chambers and seals;

[0028] Figure 3A Embodiments of seals and sealing systems are shown, including an isolation ring and a sputtering target assembled on a vacuum chamber according to the aspects disclosed herein;

[0029] Figure 3B Embodiments of seals and sealing systems are shown, including an isolation ring and a sputtering target assembled on a vacuum chamber according to the aspects disclosed herein;

[0030] Figure 4A A top view of an embodiment of a seal according to the aspects disclosed herein is shown. Figure 4B A bottom view of an embodiment of a seal according to the aspects disclosed herein is shown;

[0031] Figure 5A An enlarged top view of an embodiment of a seal according to the aspects disclosed herein is shown. Figure 5B An enlarged bottom view of an embodiment of a seal according to the aspects disclosed herein is shown;

[0032] Figure 6A A cross-sectional top view of an embodiment of a seal according to the aspects disclosed herein is shown. Figure 6B A sectional bottom view of an embodiment of a seal according to the aspects disclosed herein is shown, and Figure 6C A cross-sectional side view of an embodiment of a seal according to the aspects disclosed herein is shown;

[0033] Figure 7 A perspective view of an embodiment of a sputtering target according to the aspects disclosed herein is shown;

[0034] Figure 8A A top view of an embodiment of an isolation ring according to the aspects disclosed herein is shown. Figure 8B A cross-sectional side view of an embodiment of an isolation ring according to the aspects disclosed herein is shown. Figure 8C An enlarged cross-sectional side view of an embodiment of an isolation ring according to the aspects disclosed herein is shown;

[0035] Figure 9A and 9B An embodiment of an isolation ring assembled on a vacuum chamber according to the aspects disclosed herein is shown;

[0036] Figure 10A and 10B An embodiment of a seal assembled on an isolation ring and a vacuum chamber according to the aspects disclosed herein is shown;

[0037] Figure 11 An embodiment of a sputtering target assembled on a seal, a separation ring, and a vacuum chamber according to the aspects disclosed herein is shown;

[0038] Figure 12A An embodiment of a vacuum chamber according to the aspects disclosed herein is shown. Figure 12B An embodiment of a sputtering target according to the aspects disclosed herein is shown;

[0039] Figure 13A and 13B An example of sputtering a target after the end of the life of the seal and sealing system is shown, according to the aspects disclosed herein;

[0040] Figures 14A to 14D An example of sputtering a target after the end of the life of the seal and sealing system is shown, according to the aspects disclosed herein;

[0041] Figures 15A to 15E Experimental data on the use of the seals and sealing systems according to the aspects disclosed herein are shown.

[0042] This invention may be embodied in various forms without departing from its spirit or essential characteristics. The scope of this invention is defined by the appended claims rather than the foregoing detailed description. Therefore, all embodiments falling within the meaning and equivalent scope of the claims are intended to be included in the claims. Detailed Implementation

[0043] Reference will now be made in detail to exemplary embodiments of this teaching, examples of which are illustrated in the accompanying drawings, wherein like numbers denote common features throughout. It should be understood that other embodiments may be used, and changes to structure and function may be made, without departing from the corresponding scope of this teaching. Furthermore, features of the various embodiments may be combined or changed without departing from the scope of this teaching. Therefore, the following description is presented by way of illustration only and should not in any way limit the various alternatives and modifications that may be made to the illustrated embodiments, which remain within the spirit and scope of this teaching.

[0044] Throughout this disclosure, numerous specific details have been provided to give a comprehensive understanding of the subject matter. It should be understood that various aspects of this disclosure may be implemented through other embodiments, etc., not necessarily including all aspects described herein.

[0045] As used herein, the terms “example” and “exemplary” refer to instances or illustrations. The terms “example” and “exemplary” do not indicate key or preferred aspects or embodiments. Unless the context otherwise requires, the word “or” is intended to be inclusive rather than exclusive. For example, the phrase “A uses B or C” includes any inclusive combination (e.g., A uses B; A uses C; or A uses both B and C). Additionally, the articles “a” and “an” are generally intended to mean “one or more” unless the context otherwise requires.

[0046] Furthermore, unless the context otherwise suggests otherwise, a description of a shape (e.g., a circle, rectangle, triangle, etc.) refers to a shape that conforms to the definition of such a shape and is a general representation of such a shape. For example, a triangle or a general triangle may include a shape with three sides and three vertices, or may include a shape that is a general representation of a triangle, such as a shape with three main sides that may or may not have straight sides, a triangle-like shape with rounded vertices, etc.

[0047] The disclosed vacuum seal and sealing system include a corresponding isolation ring and a corresponding sputtering target. This seal and sealing system can be used in PVD sputtering applications. PVD sputtering applications utilize sputtering targets to provide material transfer under vacuum conditions. By bombarding the sputtering target with high-energy particles, material from the sputtering target can be vaporized, and the vaporized material can be deposited as a thin film layer on a substrate surface. During this process, the sputtering target may be consumed.

[0048] For semiconductor applications, in one example, the sputtering target can be a suitable material that is vaporized and deposited onto a substrate, such as, but not limited to, copper. A vacuum chamber can be used to vaporize the material from the sputtering target and deposit it onto the substrate, such as forming copper traces on a wafer. The material transfer from the sputtering target to the substrate can be used to create conductive paths, insulating layers, or provide barrier properties, and can also be used to manufacture circuit boards or other electrical components. The vacuum conditions and sealing between the sputtering target and the vacuum chamber are extremely important for PVD and for delivering viable final products.

[0049] like Figures 1A to 1F As shown, conventional seals in PVD sputtering processes typically include an O-ring 13 inserted into an O-ring groove (such as, but not limited to, a dovetail groove) machined into the flange of the sputtering target 255. During assembly and the PVD process, this O-ring may twist and rotate within the groove, resulting in an inadequate and unreliable seal of the vacuum chamber 5 throughout the lifespan and use of the sputtering target 255, and before the sputtering target 255 is consumed. Furthermore, the flange of the sputtering target 255 typically includes ventilation slots and / or fan-shaped grooves intersecting the sealing surface, or may include other shapes with similar functionality, see [reference needed]. Figures 1C to 1F Examples of the inner ventilation slot 21, the fan-shaped slot 22, the cross-shaped pressure cap ventilation slot 23, and the outer ventilation slot 24 are shown.

[0050] However, these conventional features weaken the flange of the sputtering target 255 and provide a source of leakage between the sputtering environment and the atmosphere within the vacuum chamber 5, especially under elevated and sustained pressure. As the sputtering target is consumed and its quality decreases, the physical properties of the assembly may also be affected. Arcing events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation frequently occur near or adjacent to O-ring seals, vents, and / or fan grooves, for example, see [link to relevant documentation]. Figures 2A to 2F This can lead to inefficiency and failure of the system seals. Moreover, the single O-ring 13, which relies on a single discrete contact point, can cause a single-point fulcrum effect with the bottom contact surface 15a of the isolation ring 15 during the dynamic cycling of the sputtering target (A). This, in turn, leads to a single stress point, making the seal prone to wear and failure.

[0051] There is a need for improved vacuum chamber and vacuum sealing mechanisms for sputtering applications. An improved vacuum seal is required to provide one or more (or all) of the following: preventing leakage and maintaining a vacuum seal throughout the life and service life of the sputtering target; minimizing or preventing arcing events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and PVD-related failures due to these events) throughout the life and service life of the sputtering target; being less susceptible to variations or fluctuations in use (e.g., twisting); providing component stability and consistent application; enabling self-leveling and self-alignment during assembly; minimizing or eliminating vents and / or fan slots; minimizing or eliminating grooves on the sputtering target surface; eliminating the single-point pivot effect of conventional systems; providing an increased sealing surface or interface; including an inherent occlusion mechanism to capture and eliminate potential particles that may enter the vacuum chamber during dynamic cycling; including an integrated plasma shield to protect the seal from attack and thermal degradation by high-energy ionized gases (plasma); providing buffering between the sputtering target and the isolation ring; and so on.

[0052] In one embodiment, the seal and sealing system do not require an O-ring and corresponding grooves or any ventilation slots or fan-shaped grooves in the sputtering target, such as a backing plate in a non-monolithic sputtering target or a flange in a monolithic sputtering target. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system are self-centering. In one embodiment, the seal and sealing system provide an enlarged sealing surface or interface. In one embodiment, the seal and sealing system provide cushioning between the sputtering target and the isolation ring.

[0053] The disclosed seals and sealing systems may provide one or more (or all) of the following: prevent leakage and maintain a vacuum seal during the life and use of the sputtering target; minimize or prevent arcing events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and associated PVD failures due to these events) during the life and use of the sputtering target; be resistant to variations or fluctuations in use (e.g., torsion); provide stability and consistent application of the component; enable self-leveling and self-alignment during assembly; minimize or eliminate vent slots and / or fan slots; minimize or eliminate grooves on the surface of the sputtering target; eliminate the single-point pivot effect of conventional systems; provide an enlarged sealing surface or interface; include an intrinsic occlusion mechanism to capture and eliminate potential particles that may enter the vacuum chamber during dynamic cycling; include an integrated plasma shield to protect the seal from attack and thermal degradation by high-energy ionized gases (plasma); provide buffering between the sputtering target and the isolation ring; and so on.

[0054] Turning to Figures 3 through 6, a sealing ring 100 is shown that can be used as part of a sealing system 400, which includes a corresponding isolation ring 210 and / or a corresponding sputtering target 255. The isolation ring 210 can be selectively engaged with a vacuum chamber 5. The sealing ring 100 can be selectively engaged with the isolation ring 210. The sputtering target 255 can be selectively engaged with the sealing ring 100. Assembling the isolation ring 210, the sealing ring 100, and the sputtering target 255 (including the sealing system 400) onto the vacuum chamber 5 provides a vacuum seal between the sputtering target 255 and the vacuum chamber 5, thereby enabling PVD processes to be performed while containing plasma within the vacuum chamber 5.

[0055] For example, Figure 9 to Figure 11 The diagram illustrates the assembly of an isolation ring 210 onto a vacuum chamber 5, followed by the assembly of a sealing ring 100 onto the isolation ring 210, and then the assembly of a sputtering target 255 onto the sealing ring 100. In one embodiment, each of the sealing ring 100, the isolation ring 210, and the sputtering target 255 may be substantially concentric, and their dimensions and shapes are configured to fit into a vacuum chamber such as the vacuum chamber 5. In one embodiment, each of the sealing ring 100, the isolation ring 210, and the sputtering target 255 may be attached in an interference fit or a friction fit. Note: Other attachment mechanisms may also be used. The assembly of the sealing ring 100, the isolation ring 210, and the sputtering target 255 can be rapid, for example, within 5 minutes, within 1 minute, 30 seconds, etc. Components of the sealing ring 100, the isolation ring 210, and the sputtering target 255 (such as edge portions 140 with retaining tabs 144, etc.) facilitate rapid assembly and have features such as self-centering and self-leveling.

[0056] The sealing ring 100 generally includes a planar portion 148 and an edge portion 140. The planar portion 148 has a first side (or surface) 102 and a second side (or surface) 104. In one embodiment, the first side 102 of the sealing ring 100 can be understood as the isolation ring facing side, which can selectively engage with a corresponding side of the isolation ring 210. In one embodiment, the second side 104 of the sealing ring 100 can be understood as the sputtering target facing side, which can selectively engage with a corresponding side of the sputtering target 255. Note: The first side 102 can also be referred to as the lower side of the sealing ring 100, and the second side 104 can also be referred to as the top side of the sealing ring 100. During assembly, the first side (or surface) 102 can contact (engage) with the isolation ring 210, and the second side (or surface) 104 can contact (engage) with the sputtering target 255. In one embodiment, the sealing ring 100 can serve as a buffer and separator between the isolation ring 210 and the sputtering target 255, so that the isolation ring 210 and the sputtering target 255 do not come into contact with each other when assembled in the vacuum chamber 5.

[0057] The planar portion 148 of the sealing ring 100 may include a compressible portion 110 extending toward the center of the sealing ring 100. In one embodiment, the compressible portion 110 may include one or more higher profile protrusions, such as protrusions 113, extending away from a horizontal axis 150 of the sealing ring 100. The planar portion 148 includes a horizontal axis 150. In one embodiment, the horizontal axis 150 is located midway between the peak of the protrusion 113 on the first side 102 and the peak of the protrusion 113 on the second side 104, and the compressible portion 110 may include one or more lower profile recesses (e.g., recesses 116) that narrow toward the horizontal axis 150 of the sealing ring 100. In one embodiment, the compressible portion 110 may include two or more higher profile protrusions 113. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. In one embodiment, the compressible portion 110 may include two or more lower profile recesses 116. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc., lower contour recesses 116. Protrusions 113 and recesses 116 may alternate. In one embodiment, the compressible portion 110 may include n protrusions 113 and n-1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and one recess 116. One recess 116 may be located between two protrusions 113. In one embodiment, the compressible portion 110 may include n protrusions 113 and n+1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and three recesses 116. One recess 116 may be located between two protrusions 113, and each of the other two recesses 116 may be located on the opposite side of each protrusion 113, so that the formed pattern resembles recesses, protrusions, recesses, protrusions, and recesses. Note: Other numbers, positions and patterns of protrusions 113 and recesses 116 may also be used in the compressible portion 110.

[0058] In one embodiment, the protrusion 113 may extend beyond the contour of the remaining portion of the sealing ring 100 on the second side 104. In other words, the protrusion 113 may extend further away from the horizontal axis 150 than any other feature of the sealing ring 100 on the first side 102. Furthermore, except for the edge portion 140, the protrusion 113 may extend beyond the contour of the remaining portion of the sealing ring 100 on the first side 102. In other words, except for the edge portion 140, the protrusion 113 may extend further away from the horizontal axis 150 than any other feature of the sealing ring 100 on the second side 104. In one exemplary embodiment, the height or diameter of the protrusion 113 may be greater than the contour of the remaining portion of the sealing ring 100 (excluding the edge portion 140). In one embodiment, the recess 116 may terminate before the contour of the remaining portion of the sealing ring 100. In one exemplary embodiment, the protrusion 113 may extend past the first surface 102. In one exemplary embodiment, the protrusion 113 may extend through the second surface 104. In one exemplary embodiment, the protrusion 113 may extend through the first surface 102 and the second surface 104. In one exemplary embodiment, the protrusion 113 may be generally rounded or circular. Note: Other shapes may be used unless the context or this disclosure otherwise suggests. In one exemplary embodiment, the recess 116 may terminate before the first surface 102. In one example, the recess 116 may terminate before the second surface 104. In one exemplary embodiment, the recess 116 may terminate before both the first surface 102 and the second surface 104. Furthermore, in one exemplary embodiment, the recess 116 may extend below the first surface 102 toward the horizontal axis 150 of the sealing ring 100. In one exemplary embodiment, the recess 116 may terminate below the second surface 104 toward the horizontal axis 150 of the sealing ring 100. In one exemplary embodiment, the recess 116 may terminate below both the first surface 102 and the second surface 104 toward the horizontal axis 150 of the sealing ring 100. In one exemplary embodiment, the recess 116 may be generally rounded or concave. Note: Other shapes may be used unless the context or this disclosure otherwise suggests.

[0059] The compressible portion 110 may include any compressible material or combination of materials to achieve a desired or suitable specific purpose or intended application. In one embodiment, the compressible portion 110 may include a composition of fluorocarbons, fluorinated elastomers, or fluorinated rubber materials (FKM). In one example, the material may be selected based on its hardness. In one example, the material may be selected based on its compressibility and / or resilience. In one example, the material may be selected based on its heat resistance. Other materials may include, but are not limited to: polymers such as polyurethane, ethylene propylene diene monomer, styrene-butadiene rubber, thermoplastic elastomers, etc.; other natural rubbers or silicone rubbers, neoprene rubber, expanded polytetrafluoroethylene, foam materials such as polyurethane foam; combinations of two or more of these materials; and so on.

[0060] The protrusion 113 can serve as a contact point or compression point that selectively contacts a corresponding surface of the isolation ring 210 and / or a corresponding surface of the sputtering target 255, wherein the corresponding surface of the isolation ring 210 and / or the corresponding surface of the sputtering target 255 selectively compresses the protrusion 113 until the corresponding surface of the isolation ring 210 and / or the corresponding surface of the sputtering target 255 contacts the remaining body portion of the sealing ring 100 (e.g., rigid portion 130, shielding portion 190, etc.). The recess 116 can typically provide a gap for the compressed protrusion 113 and can compress the protrusion 113 into the recess 116 to achieve a vacuum seal. The compressible portion 110 can typically facilitate the formation of a vacuum seal through compression of the protrusion 113 by the isolation ring 210 and / or the sputtering target 255, and compression of the protrusion 113 between the isolation ring 210 and / or the sputtering target 255.

[0061] The sealing ring 100 can provide a radially concentric seal that separates the high vacuum (sputtering) environment (e.g., within the vacuum chamber 5 where sputtering occurs) from the atmosphere during the dynamic cycles that occur throughout the PVD process.

[0062] In one embodiment, the greater the distance or length of the compressible portion 110 extending toward the center of the sealing ring 100 and the more protrusions 113 or contact points there are, the larger the contact area. The protrusions 113 may be semi-circular in shape. A larger contact area can provide a longer vacuum seal life and can provide additional rigidity and structure to the sealing ring 100. Multiple contact points, such as multiple protrusions 113, can provide repeatability of the vacuum seal, thereby allowing the vacuum seal to be maintained and reducing the likelihood of defects such as leakage during the use and life of the sputtering target 255. In one exemplary embodiment, the protrusions 113 may be spaced approximately 0.150 inches apart. In other words, when measured along the horizontal axis 150, such as when traveling along the horizontal axis 150 from the outer wall 147 to the center of the sealing ring 100, the vertical axes 113a of each consecutive protrusion 113 may be spaced approximately 0.150 inches apart. Each protrusion 113a has a vertical axis 113a. Furthermore, in one exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the sealing ring 100) may be located approximately 0.255 inches from the end 190a of the shield 190. Additionally, in one exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the sealing ring 100) may be located approximately 0.255 inches from the inner diameter of the shield 190. In one exemplary embodiment, when measured vertically along the vertical axis 113a from the top 113b to the bottom 113c, the protrusion 113 may have a height of approximately 0.114 inches to 0.124 inches.

[0063] Additionally, multiple contact points (e.g., multiple protrusions 113) can provide a closure mechanism to entrain gas and particles within the annular space of the sealing ring 100 and the compressible portion 110, while allowing sufficiently high contact forces to form a vacuum seal. The sealing ring 100 can increase the contact area on the flange portion of the sputtering target 255, while allowing sufficient contact forces on the sealing ring 100, which can help reduce sputtering target flange movement during the service life of the sputtering target 255. In one embodiment, a flat gasket-type seal may require impractical contact forces to seal, which the vacuum force itself cannot provide.

[0064] The sealing ring 100 may also include a rigid portion 130. In one embodiment, the rigid portion 130 may be located near the compressible portion 110. In one embodiment, the rigid portion 130 may be positioned further away from the center of the sealing ring 100 (e.g., towards the surrounding environment) than the location of the compressible portion 110, while the compressible portion 110 may be positioned closer to the center of the sealing ring 100 (e.g., towards the interior of the vacuum chamber 5) than the location of the rigid portion 130.

[0065] The rigid portion 130 may be more rigid than the compressible portion 110. Ribs 131 may be present in the rigid portion to provide rigidity. Ribs 131 may comprise any rigid material or combination of materials to achieve the desired or suitable specific purpose or intended application. In one embodiment, rib 131 may comprise aluminum. Note: Any other nonmagnetic material with suitable mechanical properties may also be used. In one example, the material may be selected based on its hardness. In another example, the material may be selected based on its rigidity, nonmagnetic properties, electrical conductivity, etc. Other materials may include, but are not limited to, certain grades of stainless steel, titanium, brass, carbon fiber reinforced polymers, ceramics such as alumina and zirconium oxide, glass fiber, etc.

[0066] Ribs 131 of the rigid portion 130 may be encapsulated or suspended within the same material as the compressible portion 110. Ribs 131 may be encapsulated or suspended within a similar material to the compressible portion 110. Ribs 131 may be completely encapsulated by compressible material. Ribs 131 may be substantially encapsulated by compressible material. Ribs 131 may be partially encapsulated by compressible material. The horizontal axis of the rigid portion 130 may be positioned along the horizontal axis 150 of the sealing ring 100. Furthermore, the horizontal axis of the ribs 131 may be positioned along the horizontal axis 150 of the sealing ring 100. For example, ribs 131 may be completely encapsulated by compressible material, except for a few cuts or holes 120 for suspending ribs 131 in the mold to apply compressible material thereon. In one embodiment, ribs 131 may be exposed through cuts or holes 120 in the compressible material of the rigid portion 130. The coating or encapsulation can prevent or minimize arcing between the rigid portion 130 and the sputtering target 255. In one embodiment, the thickness of the coating or encapsulation at the rigid portion 130 (each side above and below the rib 131) can be about 0.084 inches to 0.096 inches. In other embodiments, the thickness of the coating or encapsulation at the rigid portion can be about 0.080 inches to 0.010 inches. In other exemplary embodiments, the thickness of the coating or encapsulation at the rigid portion can be about 0.076 inches to 0.014 inches.

[0067] In other embodiments, the thickness of the coating or encapsulation at the rigid portion 130 (each side above and below rib 131) may be about 0.014 inches. In other embodiments, the thickness of the coating or encapsulation at the rigid portion 130 between the top surface 131a of rib 131 and the second side 104 may be about 0.014 inches, and the thickness of the coating or encapsulation at the rigid portion 130 between the bottom surface 131b of rib 131 and the first side 102 may be about 0.013 inches. In another exemplary embodiment, the thickness of the coating or encapsulation at the rigid portion 130 between the bottom surface 131b of rib 131 and the first side 102 may be about 0.008 inches to 0.018 inches. In other embodiments, the thickness of the coating or encapsulation between the rear surface 131d of rib 131 and the second end 108 of sealing ring 100 may be about 0.07 inches. The coating or encapsulation can prevent or minimize wear from the isolation ring 210 and / or sputtering target 255. In one embodiment, the width of the rigid portion 130 may be approximately the same as that of the opposing compressible portion 110. In one embodiment, the length of the rigid portion 130 may be less than that of the compressible portion 110. In one embodiment, the length of the rigid portion 130 may be greater than that of the compressible portion 110. The thickness of the rib 131 may be 0.063 inches (the distance between the top surface 131a and the bottom surface 131b of the rib portion 131). The rib 131 may also have a width of approximately 0.45 inches (the distance between the inner surface 131c and the outer surface 131d along the horizontal cross-section of the rigid portion 130 (or rib 131) (or along the horizontal axis 150).

[0068] The rigid portion 130 can provide support, rigidity, and / or stability to the sealing ring 100. The rigid portion 130 can provide strength to the sealing ring 100 during dynamic sputtering cycles and can help eliminate excessive movement of the flanged sputtering target 255 to the isolation ring 210. The rigid portion 130 can eliminate or minimize mechanical wear and particle generation resulting from the proximity movement of the flange of the sputtering target 255 (the flange of the backing plate 260 of a non-monolithic sputtering target 255 or the peripheral flange of a monolithic sputtering target 255) and the isolation ring 210. In one exemplary embodiment, the inner diameter of the rib 131, measured from its inner surface 131c, can be approximately 19.57 inches to 19.63 inches, and the outer diameter of the rib 131, measured from its outer surface 131d, can be approximately 20.47 inches to 20.53 inches.

[0069] The sealing ring 100 typically includes a first end 106 and a second end 108. In one embodiment, the first end 106 may be an inner peripheral end of the sealing ring 100 positioned toward the center of the sealing ring 100. In one embodiment, the second end 108 may be an outer peripheral end of the sealing ring 100 opposite to the first end 106 and positioned away from the center of the sealing ring 100. The first end 106 may extend from a compressible portion 110 toward the center of the sealing ring 100. The first end 106 may be attached to and adjacent to the compressible portion 110 of the sealing ring 100. The first end 106 may include the same or similar material as the compressible portion 110. In one embodiment, the compressible portion 110 may be located between the rigid portion 130 and the first end 106. The first end 106 may be configured to selectively receive a shield 190. The shield 190 may be configured to cover all or at least a portion of the first end 106. The shield 190 can be configured to isolate and protect the compressible portion 110 and the remainder of the sealing ring 100 from the vacuum environment of the vacuum chamber 5, such as providing protection against the effects of plasma in the vacuum chamber 5. The shield 190 can be selectively removed from the compressible portion 110 of the sealing ring 100 and can be replaced. The first end 106 can be configured to selectively receive the shield 190 in a snap-fit ​​engagement manner. Note: Other connection mechanisms may also be used to achieve the desired or suitable specific purpose or intended application. In one embodiment, the first end 106 of the sealing ring 100 may be tapered. In one embodiment, the first end 106 of the sealing ring 100 may be referred to as a C-shape. In one embodiment, the first end 106 of the sealing ring 100 may be referred to as a snakehead shape. In one example, the first end 106 of the sealing ring 100 may include a gradually increasing ramp rising portion and a groove. In one example, the shield 190 may include: a hollow portion, the size and shape of which generally corresponds to the tapered or snake-head shape of the first end 106 of the sealing ring 100; and snap-fit ​​fingers configured to insert into a groove. The snap-fit ​​fingers may be inserted onto a gradually increasing ramped portion of the first end 106 of the sealing ring 100 until the snap-fit ​​fingers are inserted and locked into the groove. The shape of the shield 190 may be configured such that the shield 190 is clamped onto the first end 106 of the sealing ring 100 during assembly of the sealing system 400 and when pressure is applied to the sputtering target 255 and the isolation ring 210. In an exemplary embodiment, the shield 190 may have an inner diameter of approximately 18.585 inches to 18.645 inches when measured from the end 190a of the shield 190. In one exemplary embodiment, when measured from the base 190b of the shield 190, the shield 190 may have an inner diameter of approximately 19.095 inches to 19.155 inches.

[0070] like Figure 3A As shown, the shielding portion 190 may have a curved or rounded C-shaped shape, which has a relatively slender profile, and its size and shape correspond to the first end 106 of the sealing ring 100. Figure 3B As shown, the shield 190 may have an elongated teardrop shape that extends toward the center of the sealing ring 100 into the interior of the vacuum chamber 5. In one embodiment, the elongated teardrop shape of the shield 190 may extend onto and beyond the inner edge of the isolation ring 210. Note: The shield 190 may also have other shapes, thicknesses, and sizes. In one exemplary embodiment, the width of the shield 190 along the horizontal axis 150 is 0.130 inches when measured from end 190a to base 190b. In another exemplary embodiment, the shield 190 may have a height of approximately 0.114 inches to 0.124 inches when measured in a vertical direction perpendicular to the horizontal axis 150 (parallel to the vertical axis 113a).

[0071] The shielding portion 190 may include any plasma suppression material or combination of materials that can achieve the desired or suitable specific purpose or intended application. In one embodiment, the shielding portion 190 may include a plasma-suppressing polytetrafluoroethylene (PTFE) material, which is a synthetic fluoropolymer of tetrafluoroethylene. Note: Any other material that suppresses plasma and thermal damage may also be used. In one embodiment, the material may be selected based on its low coefficient of friction. Other materials may include, but are not limited to, polyimides, ceramics such as alumina and boron nitride, molybdenum disulfide, fluorinated ethylene propylene, etc.

[0072] In one embodiment, the shielding portion 190 may be referred to as a plasma shielding portion. In one embodiment, the shielding portion 190 can provide plasma arc suppression and protect the vacuum seal by suppressing plasma arcs and thermal degradation of the vacuum sealing material.

[0073] Therefore, the planar portion 148 of the sealing ring 100 has a shielding portion 190, a compressible portion 110, and a rigid portion 130 as it travels outward from the center of the sealing ring 100 along the horizontal axis 150.

[0074] The sealing ring 100 may further include an edge portion 140 located on the first surface 102 and forming an "L" shape with the planar portion 148. The edge portion 140 has: an inner wall 142 oriented perpendicularly to the first surface 102 toward the center of the sealing ring 100; an outer wall 147 located on the outer periphery of the sealing ring 100 perpendicular to the first surface; and a bottom wall 146 connecting the bottom 142a of the inner wall 142 and the bottom 147a of the outer wall 147. The inner wall 142 may be oriented toward the center of the sealing ring 100. The bottom wall 146 may be oriented perpendicularly to the inner wall 142 and the outer wall 147 to form a "U" shape. When measured along the horizontal axis 150 of the planar portion 148, the outer wall 147 and the second end 108 may form a continuous surface linearly equidistant from the first end 106. In an exemplary embodiment, the edge portion 140 may be positioned adjacent to a rigid portion 130 of the planar portion 148. In one exemplary embodiment, the edge portion 140 may be positioned at a second end 108 of the sealing ring 100. In one exemplary embodiment, the edge portion 140 may extend vertically from the rigid portion 130 and the compressible portion 110 to the isolation ring facing the first surface 102 of the sealing ring 100. In one exemplary embodiment, the sealing ring 100 may be L-shaped. The edge portion 140, the rigid portion 130, and the compressible portion 110 may be provided as a single attachment unit. The edge portion 140 may include the same material as the compressible portion 110. The edge portion 140 may include a material similar to the compressible portion 110. The edge portion 140 may be configured to selectively engage with a corresponding stepped portion 213 of the isolation ring 210. The inner wall 142 and the bottom wall 146 (or the inner wall 142, the retaining tab 144, and / or the bottom wall 146) may both selectively engage with a corresponding wall of the stepped portion 213 of the isolation ring 210.

[0075] In one exemplary embodiment, the thickness of the sealing ring 100, when measured at the edge portion 140, can be approximately 0.270 inches. In other words, in one exemplary embodiment, the distance between the bottom wall 146 and the second side 104 of the sealing ring 100 can be approximately 0.270 inches. Furthermore, in another exemplary embodiment, the thickness of the sealing ring 100 at the rigid portion 130 can be approximately 0.085 inches to 0.095 inches. In other words, in one exemplary embodiment, the distance between the first side 102 and the second side 104 of the sealing ring 100 at the rigid portion 130 can be approximately 0.085 inches to 0.095 inches. In other exemplary embodiments, the diameter of the second end 108 of the sealing ring 100 can be approximately 20.585 inches to 20.645 inches. In another exemplary embodiment, where the retaining tab 144 is not present, the diameter of the inner wall 142 of the sealing ring 100 can be approximately 20.325 inches to 20.385 inches.

[0076] The edge portion 140 may further include one or more retaining tabs 144 located on the inner wall 142 and extending from the inner wall 142 along the inner periphery of the edge portion 140 toward the center of the sealing ring 100. In one exemplary embodiment, a plurality of retaining tabs 144 may be equidistantly arranged along the circumference of the inner wall 142. In one exemplary embodiment, a plurality of retaining tabs 144 may be positioned at different distances along the circumference of the inner wall 142. In one exemplary embodiment, the edge portion 140 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, 30, etc., retaining tabs 144. The retaining tabs 144 may be semi-circular in shape and extend from the bottom wall 146 (or the bottom of the inner wall 142a) to the first side 102. The retaining tabs 144 may have a chamfer near the bottom wall 146 (or the bottom of the inner wall 142a) to facilitate placement of the sealing ring 100 onto the isolation ring 210. In one exemplary embodiment, the inner surface 144a of the retaining tab 144 may be approximately 10.10 inches from the center of the sealing ring 100. The inner surface 144a is the surface of the tab 144 that is closest to the center of the sealing ring 100 when traveling along the horizontal axis 150.

[0077] In one exemplary embodiment, during the assembly of the sealing system 400, the edge portion 140 can conveniently align the sealing ring 100 onto the isolation ring 210. In one exemplary embodiment, the retaining tab 144 can center the sealing ring 100 onto the isolation ring 210. In one exemplary embodiment, the retaining tab 144 can clamp onto the isolation ring 210 and can secure the sealing ring 100 to the isolation ring 210. In one exemplary embodiment, the sealing ring 100 can be applied, for example, invertedly, onto the isolation ring 210 located above the sealing ring 100, and the retaining tab 144 can hold and secure the sealing ring 100 to the inverted isolation ring 210 (e.g., when the isolation ring 210 and the sealing ring 100 are inverted such that the isolation ring 210 is oriented above the sealing ring 100 and the sealing ring 100 is pulled away from the isolation ring 210 under gravity, the retaining tab can hold and secure the sealing ring 100 to the isolation ring 210).

[0078] Transfer to Figure 7 The image shows a sputtering target 255 including a sealing mating surface 259. As previously described, the sealing mating surface 259 can be a generally continuous and / or smooth flange surface, i.e., a surface without any grooves, vents, fan-shaped slots, or other shapes or features with similar functions. See also... Figure 3A and 3BIn one exemplary embodiment, the flange (sealing mating surface 259) of the backing plate 260 of the sputtering target 255 has no features. In one embodiment, the sputtering target 255 does not have Figures 1A to 1F The conventional O-ring seals, grooves, ventilation slots, sector grooves, and other shapes or features with similar functions shown may be prone to appearing. Figures 2A to 2F The faults illustrated include arcing events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation, which often occur near or adjacent to O-ring seals, vents, and / or fan slots. In one exemplary embodiment, the sputtering target 255 also eliminates the radial single-point pivot point in conventional sputtering target vacuum chamber assemblies, which could cause mechanical movement of the components during dynamic sputtering cycles of the sputtering target 255.

[0079] The sealing mating surface 259 of the sputtering target 255 (e.g., the flange of the backing plate 260 of a non-monolithic sputtering target 255 or the peripheral flange of a monolithic sputtering target 255) can be configured to selectively engage with the sealing ring 100. The sealing mating surface 259 of the sputtering target 255 can be configured to selectively engage with a second side 104 of the sealing ring 100, the second side including a compressible portion 110, a rigid portion 130 (encapsulated by a compressible material), and a shielding portion 190. The sputtering target 255 can provide a vacuum seal with the sealing ring 100.

[0080] The sputtering target 255 may include any material or combination of materials that can achieve the desired or suitable specific purpose or intended application. In one embodiment, the sputtering target 255 may include copper, titanium, gold, etc. Note: Any other metal, its alloys, its oxides, and its nitrides may also be used. In one embodiment, the material may be selected based on its sputtering capability. Other materials may include, but are not limited to, aluminum, tungsten, nickel, silicon, germanium, etc.

[0081] Transfer to Figures 8A to 8CThe diagram illustrates an isolation ring 210 including a sealing mating surface 216 and an edge mating step 213. As described above, the sealing mating surface 216 (top surface) can be a generally continuous and / or smooth surface, and the edge mating step 213 can provide a step on the outer circumference of the isolation ring 210. The edge mating step 213 can be configured to selectively engage the inner wall 142 and bottom wall 146 (or the inner wall 142 and the retaining tab 144) of the edge portion 140. The edge mating step 213 can typically have a cut of approximately 90 degrees. In one exemplary embodiment, the step 213 can be formed by cutting vertically and horizontally into the top of the outer diameter of the isolation ring 210. In other words, in one exemplary embodiment, the step 213 can be formed in the mating surface 216 and the outer surface 217 of the isolation ring 210, thereby creating a vertical surface 218 and a horizontal surface 219 of the step 213. In one exemplary embodiment, once the step 213 is formed in the isolation ring, the vertical surface 218 can be offset from the outer surface 217 by approximately 0.200 inches, and the horizontal surface 219 can be offset from the mating surface 216 by approximately 0.200 inches. In one exemplary embodiment, the inner diameter of the isolation ring 210 can be approximately 18.505 inches when measured at the inner surface 220 of the isolation ring 210. In another exemplary embodiment, the outer diameter of the isolation ring 210 can be approximately 20.625 inches when measured at the outer surface 217 of the isolation ring 210. In a further exemplary embodiment, the diameter of the isolation ring 210 can be approximately 20.225 inches when measured at the vertical surface 218 of the step 213 of the isolation ring 210. In another exemplary embodiment, the thickness of the isolation ring 210 can be approximately 0.538 inches when measured from the mating surface 216 to the bottom surface 221 of the isolation ring 210. In an additional exemplary embodiment, the thickness of the isolation ring 210 may be approximately 0.338 inches when measured from the horizontal plane 219 to the bottom surface 221 of the isolation ring 210. In another exemplary embodiment, the width of the isolation ring 210 may be approximately 1.06 inches when measured from the outer surface 217 to the inner surface 220. The outer surface 217 is positioned relative to the inner surface 220.

[0082] The sealing mating surface 216 of the isolation ring 210 can be configured to selectively engage with the sealing ring 100. The sealing mating surface 216 of the isolation ring 210 can be configured to selectively engage with a first side 102 of the sealing ring 100, the first side including a compressible portion 110, a rigid portion 130 (encapsulated by a compressible material), a shielding portion 190, and an edge portion 140. The isolation ring 210 can form a vacuum seal with the sealing ring 100. The sealing ring 100, the sputtering target 255, and the isolation ring 210 can also collectively provide an increased sealing surface or interface and a buffer between the sputtering target 255 and the isolation ring 210.

[0083] The isolation ring 210 may comprise any material or combination of materials to achieve a desired or suitable specific purpose or intended application. In one embodiment, the isolation ring 210 may comprise a highly polished ceramic dielectric material. Note: Any other material capable of electrically isolating the sputtering target 255 from the vacuum chamber 5 may also be used. In one example, the material may be selected based on its electrical insulation properties. Other materials may include, but are not limited to, glass, plastics, and polymers, such as polyethylene (PE), polypropylene (PP), polycarbonate (PC), polyimide (PI), and polytetrafluoroethylene (PTFE), mica, epoxy resin, polyethylene terephthalate (PET), etc.

[0084] Figure 13A and 13B as well as Figures 14A to 14D The end-of-life sputtering target 255 using sealing ring 100 and sealing system 400 is shown. The formed sputtering target 255 showed no signs of arcing, particles, or flange wear. Additionally, the formation of sidewall oxides was also continuously controlled.

[0085] Figures 15A to 15E Various experimental data obtained during the lifetime of the sputtering target 255 using the sealing ring 100 and sealing system 400 are shown. For example, Figure 15A The observed baking phenomenon is shown. Figure 15B No helium leak was observed at the seal. Figure 15C The gas load remained stable during the processing of sputtering target 255. Figure 15D The results showed that no arc discharge events were detected during the 255-year lifespan of the sputtering target. Figure 15E The results show that the idle mode chamber pressure remained stable throughout the entire lifespan of the sputtering target 255.

[0086] Although embodiments of this teaching have been shown in the accompanying drawings and described in the foregoing detailed description, it should be understood that this teaching is not limited to the disclosed embodiments, but rather that many rearrangements, modifications, and substitutions are possible with respect to the teaching described herein without departing from the scope of the appended claims. The appended claims are intended to cover all modifications and alterations, provided they fall within the scope of the claims or their equivalents.

Claims

1. A sealing kit for a physical vapor deposition (PVD) vacuum chamber, the sealing kit comprising: A sealing ring for a PVD vacuum chamber, the sealing ring comprising: A compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs, the ribs being encapsulated by an auxiliary material; An edge, which extends from the first surface of the sealing ring and is configured to selectively engage with an isolation ring; A removable shield is configured to be selectively connected to a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber; The isolation ring, the isolation ring comprising: A first surface, when installed in the PVD vacuum chamber, is configured to selectively engage with the compressible portion and the rigid portion of the sealing ring, wherein the first surface is flat. The stepped portion, when installed in the PVD vacuum chamber, is configured to selectively engage with the edge of the sealing ring; and Sputtering target, the sputtering target comprising: The peripheral flange surface of the first surface, when installed in the PVD vacuum chamber, is configured to engage with the sealing ring, wherein the peripheral flange surface has no O-ring grooves, ventilation slots, or fan-shaped slots, and is configured to contact the sealing ring with a flat surface.

2. A sealing ring for a physical vapor deposition (PVD) vacuum chamber, the sealing ring comprising: A compressible portion, wherein the compressible portion includes at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, wherein the rigid portion has ribs, the ribs being encapsulated by an auxiliary material; An edge that extends from a first surface of the sealing ring and is configured to selectively engage with an isolation ring; A removable shield is configured to be selectively coupled to a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber.

3. The sealing ring according to claim 2, wherein, The compressible portion includes fluorocarbons, fluorinated elastomers, and / or fluorinated rubber materials.

4. The sealing ring according to claim 2 or 3, wherein, The auxiliary material is the same material as the compressible portion and the edge.

5. The sealing ring according to claim 2 or 3, wherein, The at least one protrusion extends through the first surface and the second opposing surface of the sealing ring.

6. The sealing ring according to claim 2 or 3, wherein, The at least one recess terminates before the first surface and the second opposing surface of the sealing ring.

7. The sealing ring according to claim 2 or 3, wherein, Each of the at least one protrusion and each of the at least one recess alternate.

8. The sealing ring according to claim 2 or 3, wherein, The compressible portion and at least one recess are configured to entrain microparticles.

9. The sealing ring according to claim 2 or 3, wherein, The ribs of the rigid portion are made of aluminum.

10. The sealing ring according to claim 2 or 3, wherein, The compressible portion and the rigid portion have the same length.

11. The sealing ring according to claim 2 or 3, wherein, The shielding portion is configured to engage with the first end of the compressible portion via a snap-fit ​​mechanism.

12. The sealing ring according to claim 2 or 3, wherein, The shielding portion is configured to suppress plasma arcing and thermal degradation of the compressible portion.

13. The sealing ring according to claim 2 or 3, wherein, The shielding part includes polytetrafluoroethylene.

14. The sealing ring according to claim 2 or 3, wherein, The edge also includes multiple retaining tabs.

15. The sealing ring according to claim 2 or 3, wherein, The sealing ring is configured to selectively engage with the isolation ring by an interference fit, thereby forming a seal between the sealing ring and the isolation ring when installed in a PVD vacuum chamber.

16. The sealing ring according to claim 2 or 3, wherein, The sealing ring is configured to self-align with the isolation ring by means of the plurality of retaining tabs on the edge and the stepped portion of the 90-degree isolation ring cutout.

17. The sealing ring according to claim 2 or 3, wherein, The second surface of the sealing ring is configured to selectively engage with the sputtering target, thereby forming a seal between the sealing ring and the sputtering target when installed in a PVD vacuum chamber.

18. The sealing ring according to claim 17, wherein, The sputtering target has no grooves, ventilation slots, or fan-shaped slots and is configured to contact the sealing ring with a flat surface.

19. The sealing ring according to claim 17, wherein, The sealing ring is configured to provide a buffer between the sputtering target and the isolation ring.

20. A sealing kit for a vacuum chamber, the sealing kit comprising: A sealing ring, wherein the sealing ring includes: a compressible portion; a rigid portion adjacent to the compressible portion; and an edge extending perpendicularly from the rigid portion, wherein the compressible portion includes at least one protrusion and at least one recess; An isolation ring configured to selectively engage with a first mating surface of the sealing ring including the edge, wherein the isolation ring includes a cutout configured to selectively receive and contact the edge of the sealing ring, thereby forming a seal between the isolation ring and the sealing ring when mounted into a PVD vacuum chamber; A sputtering target, the sputtering target including a planar first mating surface configured to selectively engage with a second mating surface of the sealing ring, thereby forming a seal between the sputtering target and the sealing ring when mounted in a PVD vacuum chamber. The first mating surface of the plane has a peripheral flange surface, which has no O-ring grooves, ventilation slots, or fan-shaped slots, and is configured to contact the sealing ring with a flat surface.

21. The sealing kit of claim 20, wherein each of the at least one protrusion and each of the at least one recess alternate.

22. The sealing kit according to claim 20 or 21, wherein, The rigid portion also includes ribs suspended in the same material comprising the compressible portion and the edge.

23. The sealing kit according to claim 20 or 21, wherein, The sealing ring also includes a plasma shielding portion configured to be attached to the inner peripheral side of the compressible portion.

24. The sealing kit according to claim 20 or 21, wherein, Both the sputtering target and the isolation ring form a seal with the sealing ring.

25. The sealing kit according to claim 20 or 21, wherein, The sputtering target and the isolation ring are isolated from each other by the sealing ring.

26. A method for assembling the sealing kit of claim 20, the method comprising: A separation ring is placed on the PVD vacuum chamber, wherein the separation ring includes a step located on the mating surface; A sealing ring is placed on the mating surface of the isolation ring, the sealing ring having a first mating surface and a second mating surface located on the opposite side of the first mating surface, wherein the first mating surface of the sealing ring includes an edge configured to selectively engage with the step of the isolation ring, and wherein the first mating surface of the sealing ring contacts the mating surface of the isolation ring. A sputtering target is placed on the second mating surface of the sealing ring, wherein the sealing ring includes a compressible portion and a shielding portion, and wherein the sputtering target is configured to compress the compressible portion and the shielding portion of the sealing ring; The isolation ring and the sealing ring form a seal when installed in the PVD vacuum chamber, and the sealing ring and the sputtering target form a seal when installed in the PVD vacuum chamber.

27. The method according to claim 26, wherein, The sputtering target and the isolation ring are isolated from each other by the sealing ring.

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