Electron beam focusing method of micro-channel plate, micro-channel plate and image intensifier

By setting an insulating dielectric layer and a modulation electrode outside the output electrode of the microchannel plate, an electric field is formed to focus the electron beam, which solves the electron beam spot expansion effect, improves the spatial resolution and electronic gain of the image intensifier, and ensures the stability of the image intensifier.

CN120613252APending Publication Date: 2025-09-09XIAN INST OF OPTICS & PRECISION MECHANICS CHINESE ACAD OF SCI
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Patent Information

Application Number
CN202510720262.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-30
Publication Date
2025-09-09

AI Technical Summary

Technical Problem

Existing microchannel plates are prone to electron beam spot expansion, resulting in a decrease in the spatial resolution of the image intensifier, and are prone to discharge at high operating voltages, affecting stability.

Method used

An insulating dielectric layer and a modulation electrode are set outside the output electrode of the microchannel plate. By applying different working voltages to form an electric field, the insulating dielectric layer and the modulation electrode are used to form a miniature electric lens to focus the electron beam emitted by each microchannel individually and reduce the degree of beam spot dispersion.

Benefits of technology

The spatial resolution and electronic gain of the image intensifier are improved, while the discharge phenomenon between electrodes under high operating voltage is avoided, ensuring the stability and reliability of the image intensifier.

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Abstract

The invention relates to a micro-channel plate, in particular to an electron beam focusing method of the micro-channel plate, the micro-channel plate and an image intensifier, and solves the technical problem that the spatial resolution of the image intensifier is reduced due to the fact that the existing micro-channel plate is easy to generate an electron beam spot expansion effect. According to the electron beam focusing method of the micro-channel plate provided by the invention, the insulating dielectric layer and the modulation electrode are arranged outside the output electrode of the existing micro-channel plate, and different working voltages are applied to the output electrode and the modulation electrode, so that an electric field with electron beam focusing capability is formed between the two electrodes; the electron beams emitted by each micro-channel are focused and shaped, so that the size of an electron beam spot is reduced, and the spatial resolution is improved. Meanwhile, the modulation electrode changes the electric field distribution condition at the output electrode, so that more multiplied electrons can be emitted, and the electron gain of the micro-channel plate can be improved.
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