Nanoimprint template for manufacturing photoelectric detector and preparation method of nanoimprint template

By designing a nanoimprint template for a table-type photodetector and its preparation method, a one-time imprint molding of a three-dimensional photodetector is achieved, which solves the problems of high process complexity and increased cost in the existing technology, is compatible with semiconductor processes, and improves production efficiency.

CN120686535APending Publication Date: 2025-09-23PUYU TECHNOLOGY (SUZHOU) CO LTD
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Patent Information

Application Number
CN202511038833.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-07-28
Publication Date
2025-09-23

AI Technical Summary

Technical Problem

The existing photodetector manufacturing process requires multiple exposures when producing three-dimensional structures, resulting in high process complexity and increased costs, and the existing nanoimprint templates are not compatible with semiconductor processes.

Method used

Provided are a nanoimprint template and a preparation method thereof. A quartz template is used to form a three-dimensional photodetector structure by one-time imprinting. The mesa-type photodetector design comprises recessed first, second and third depth platforms, and an imprinting unit is provided on the mesa. The mesa-type photodetector comprises a photosensitive mesa and a symmetrical electrode area, and can be directly used in semiconductor processes.

Benefits of technology

The one-time imprinting molding of the three-dimensional photodetector structure is achieved, which avoids the overlay error and high cost problems caused by multiple exposures, simplifies the process flow, is compatible with semiconductor processes, and improves production efficiency.

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Abstract

The embodiment of the invention provides a nanoimprint template for manufacturing a photoelectric detector and a preparation method of the nanoimprint template, and relates to the field of micro-nano machining. The nanoimprint template comprises a raised table top and a plurality of nanoimprint electrodes, at least one impressing unit is arranged on the table board; each imprinting unit comprises a first concave depth platform, a second concave depth platform and a third concave depth platform; the first depth platform is located between the second depth platform and the third depth platform; the second depth platform and the third depth platform are directly adjacent to the first depth platform, and the depth suddenly changes to form a step shape; the concave depth of the second depth platform and the concave depth of the third depth platform are both smaller than the concave depth of the first depth platform. The nano imprinting template obtained by the nano imprinting template and the preparation method provided by the embodiment of the invention can be used for manufacturing a photoelectric detector, one-time imprinting forming can be carried out on a three-dimensional photoelectric detector structure, the manufacturing period of the photoelectric detector is shortened, and the problems of overlay errors and high cost caused by multiple exposure in a projection type photoetching process are avoided.
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