Direct drawing apparatus and direct drawing method

By using multiple exposure heads and selective band technology of optical modulation elements in the exposure device, effective exposure is achieved in the case of defective optical modulation elements, solving the problem of exposure failure in a single exposure head device and ensuring the continuity and integrity of the exposure process.

CN120704070APending Publication Date: 2025-09-26SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
CN202510268675.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-03-25
Filing Date
2025-03-07
Publication Date
2025-09-26

AI Technical Summary

Technical Problem

The prior art is unable to effectively handle the defective condition of the optical modulation element in an exposure device having a single exposure head, resulting in exposure failure.

Method used

By using multiple exposure heads and optical modulation elements, and selecting elements without defects as selection bands, multiple exposures are performed to ensure effective exposure of the entire exposure area, and the sub-exposure area is moved and exposed multiple times using the light modulated by the selection bands.

Benefits of technology

Even in the event of a partial malfunction of the optical modulation element, effective substrate exposure can continue, avoiding the need to replace or repair the optical modulation element and ensuring the continuity and integrity of the exposure process.

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Abstract

The invention provides a direct drawing apparatus and a direct drawing method, which can continue exposure even if an optical modulation element has a failure. The direct drawing device includes: an optical modulation element having a plurality of elements arranged in correspondence with a sub-scanning direction, and for modulating light of a light source; and an exposure head for exposing the substrate with the light modulated by the optical modulation element, the control unit relatively moving the exposure head in the main scanning direction so as to expose the sub-exposure region with the light modulated by the selection element, and after the sub-exposure region is exposed, the exposure head moves the sub-exposure region with the light modulated by the selection element. The exposure head is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width.
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