Optical film and application thereof

Abstract

The invention provides an optical film and application thereof. The optical film includes an interference layer and a first scratch resistant layer. The interference layer comprises a high-refractive-index film layer and a low-refractive-index film layer which are arranged in a stacked mode. The first scratch-resistant layer comprises at least three film layers which are stacked and have different refractive indexes, at least one layer is a diamond-like carbon film layer, at least one layer is a film layer with the refractive index larger than or equal to 1.8, and at least one layer is a film layer with the refractive index smaller than or equal to 1.5; the average reflectivity of the optical film within the wavelength of 400-700 nm is smaller than or equal to 2%, and the scratch depth of the optical film is smaller than or equal to 10 nm when the Mohs hardness of the optical film is 7 and the load smaller than or equal to 750 g is applied. The nanoindentation hardness of the optical film is greater than or equal to 14 GPa, so that the hardness and scratch resistance of the optical film are improved while the optical film keeps a relatively high anti-reflection effect and a color development effect at a wide angle.

Description

Technical Field

[0001] This application relates to the field of optical devices, specifically to an optical film and its applications. Background Technology

[0002] With the rapid development of electronic devices, consumers have increasingly higher demands for electronic products. For example, they require electronic products to have high display quality while improving the damage resistance of the display screen. To achieve better display quality, an anti-reflective coating is usually added to the surface of the glass substrate to reduce reflections on the display screen surface.

[0003] Anti-reflective coatings (ARCCs) reduce the reflectivity of lens substrates, such as glass and sapphire, and increase transmittance, finding wide application in display devices, optical components, and solar cells. ARCCs are primarily formed using the interference effect of light, also known as interference layers. This is achieved by utilizing the destructive interference of reflected light from the upper and lower surfaces of the ARCC. Interference layers are typically constructed from multilayer films with different refractive indices. At least one film in the interference layer has a refractive index higher than the substrate, and at least one film has a refractive index lower than the substrate. However, due to the relatively low hardness of the interference layer, it is not scratch-resistant and easily damages the screen. To address this scratch susceptibility, existing methods involve applying various high-hardness films, such as silicon nitride or diamond-like carbon, to the surface of the interference layer as scratch-resistant layers. However, adding scratch-resistant layers to the interference layer with existing structures leads to problems such as poor anti-reflection performance over wide viewing angles and large reflectivity fluctuations, resulting in abnormal color rendering. Summary of the Invention

[0004] This application provides an optical film and its application, which improves the hardness and scratch resistance of the optical film while maintaining high anti-reflection and color rendering effects over a wide angle.

[0005] In a first aspect, this application provides an optical film applied to a transparent substrate. The optical film includes an interference layer and a first scratch-resistant layer disposed on one side surface of the interference layer. The interference layer includes a high-refractive-index film layer and a low-refractive-index film layer stacked together. The high-refractive-index film layer has a refractive index greater than that of the transparent substrate, and the low-refractive-index film layer has a refractive index less than that of the transparent substrate. The first scratch-resistant layer includes at least three stacked film layers with different refractive indices. Among the at least three film layers with different refractive indices, at least one is a diamond-like carbon film layer, at least one is a film layer with a refractive index greater than or equal to 1.8, and at least one is a film layer with a refractive index less than or equal to 1.5. The optical film has an average reflectivity ≤2% in the wavelength range of 400-700 nm, and a scratch depth ≤10 nm under a Mohs hardness of 7 and a 750 g load. The nanoindentation hardness of the optical film is ≥14 GPa.

[0006] In this application, the nanoindentation hardness of the optical film is the hardness value corresponding to an indentation depth of 200 nm when pressure is applied to the optical film along a direction perpendicular to its surface. The nanoindentation hardness can be obtained using a nanoindentation tester.

[0007] In the optical film of this application, the interference layer is used to eliminate reflected light, thus playing a role in anti-reflection and light reduction. By providing a first scratch-resistant layer with a diamond-like carbon (DLC) film on one side surface of the interference layer, the hardness of the first scratch-resistant layer can be increased by the DLC film, thereby improving the scratch resistance of the optical film. Simultaneously, the remaining layers in the first scratch-resistant layer include at least two other layers with different refractive indices than the DLC film, which, in combination with the DLC film, further enhance the scratch resistance of the first scratch-resistant layer. Furthermore, at least one of the remaining layers in the first scratch-resistant layer has a refractive index greater than or equal to 1.8, and at least one has a refractive index less than or equal to 1.5. The combination of these remaining layers with the DLC film increases the transmittance of the first scratch-resistant layer and reduces its reflectivity. Therefore, the optical film of this application achieves an average reflectivity ≤2% in the 400-700nm wavelength range, a scratch depth ≤10nm under a Mohs hardness of 7 and a 750g load, and a nanoindentation hardness ≥14GPa. Testing revealed that the optical film with the structure described in this application exhibits a low-fluctuation reflection optical curve across a wide spectral band, achieving excellent anti-reflection effects at various angles. For example, when the incident light is within the 0-30° range, the reflectance fluctuation in the 400-700nm wavelength band can be controlled within 0.3%, thereby enabling the optical film to achieve excellent color rendering and resolving the issues of insufficient anti-reflection effects and color distortion in existing optical films over a wide spectral band.

[0008] In one implementation, the diamond-like carbon (DLC) film is an N-doped DLC film. N doping increases the density of the DLC film, thereby improving its wear resistance. Simultaneously, N doping can adjust the spp content in the DLC film. 3 / sp 2 The proportion of carbon bonds can improve the toughness of diamond-like carbon films while maintaining their high hardness, thus reducing the risk of cracking or peeling.

[0009] In one implementation, the mass percentage of nitrogen (N) in the diamond-like carbon (DLC) film is 1-20%, such as 1-15%, or even 5-15%. By adjusting the N doping ratio in the DLC film, the hardness and mechanical properties of the DLC film can be further improved, enabling the DLC film to have sufficient hardness and scratch resistance while maintaining a relatively thin thickness.

[0010] In one implementation, the thickness of the diamond-like carbon film is less than or equal to 5 nm, or for example, 2-4 nm. This thickness of the diamond-like carbon film can reduce the impact on the light transmittance of the optical film while ensuring sufficient scratch resistance.

[0011] In one implementation, the number of diamond-like carbon (DLC) film layers is ≥1. For example, the specific number of DLC film layers can be 1, 2, or 3 layers. Multiple DLC film layers can improve the hardness and toughness of the first scratch-resistant layer while avoiding deterioration of its optical properties.

[0012] In one implementation, the nanoindentation hardness of the diamond-like carbon (DLC) film is 30-45 GPa, and the refractive index of the DLC film is 2.1-2.3. The high hardness of the DLC film enables high scratch resistance. Simultaneously, its high refractive index allows it to work in conjunction with other layers of varying refractive indices in the first scratch-resistant layer to achieve low light reflection. Specifically, the nanoindentation hardness of the DLC film in this application is the hardness value corresponding to an indentation depth of 200 nm when pressure is applied to the DLC film surface along a direction perpendicular to its surface.

[0013] In one implementation, the total thickness of the first scratch-resistant layer is less than or equal to 130 nm, or for example, 60-120 nm. The overall thickness of the first scratch-resistant layer is controlled within 130 nm to reduce light loss caused by the first scratch-resistant layer.

[0014] In one implementation, among the first scratch-resistant layer with a refractive index greater than or equal to 1.8 and a refractive index less than or equal to 1.5, at least one layer has a thickness of less than or equal to 10 nm, and at least one layer has a thickness greater than 30 nm. This structural configuration can be combined with a thinner diamond-like carbon film to increase transmittance.

[0015] In one implementation, along the direction from the first scratch-resistant layer to the interference layer, the diamond-like carbon (DLC) film is disposed in either the first or second layer of the first scratch-resistant layer. The DLC film, disposed in either the first or second layer of the first scratch-resistant layer, can protect other layers within the first scratch-resistant layer from damage.

[0016] In one implementation, along the direction from the first scratch-resistant layer to the interference layer, a first layer of the first scratch-resistant layer has a refractive index of less than or equal to 1.5, and a diamond-like carbon (DLC) film is located in the second layer of the first scratch-resistant layer. The thickness of the first layer is 2-5 nm. The first layer can be a film with a refractive index of less than or equal to 1.5; for example, it can be a silicon dioxide film. In this configuration, the combination of a film with a refractive index of less than or equal to 1.5 and a DLC film can reduce light reflection and increase light transmittance in the first scratch-resistant layer. Furthermore, by placing other films in the first layer of the DLC film, the DLC film can be protected, reducing its damage rate.

[0017] In one implementation, the first scratch-resistant layer comprises a single diamond-like carbon (DLC) film layer, with 1-4 layers having a refractive index greater than or equal to 1.8, and 1-4 layers having a refractive index less than or equal to 1.5. Because the DLC film layer itself has a high refractive index, its number is limited to one layer to avoid excessive light reflection loss. By adjusting the stacking method between the DLC film layer and other film layers with different refractive indices, the first scratch-resistant layer can achieve high transmittance while maintaining high hardness.

[0018] The following are three different structural compositions of the first scratch-resistant layer. In one implementation, the first scratch-resistant layer has four layers: the first layer is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 2-4 nm; the second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm; the third layer is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 1-3 nm; and the fourth layer is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 80-100 nm. In another implementation, the first scratch-resistant layer has seven layers: the first layer is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 2-4 nm; the second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 25-35 nm; the fourth layer is an aluminum-containing silicon oxynitride film with a refractive index of 1.55-1.65 and a thickness of 15-25 nm; the fifth layer is an aluminum-containing silicon oxynitride film with a refractive index of 1.66-1.75 and a thickness of 15-25 nm; the sixth layer is an aluminum-containing silicon oxynitride film with a refractive index of 1.76-1.85 and a thickness of 15-25 nm; and the seventh layer is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 65-75 nm. In another implementation, the first scratch-resistant layer has a total of seven layers, wherein the first layer is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 2-4 nm; the second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm; the third layer is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 3-7 nm; and the fourth layer is a silicon dioxide film with a refractive index of 1.93-2.0 and a thickness of 3-7 nm. The refractive index of the fourth layer is 1.4-1.5, and the thickness of the fifth layer is 40-50 nm; the refractive index of the fifth layer is 1.56-1.65, and the thickness of the fifth layer is 12-18 nm; the refractive index of the sixth layer is 1.66-1.75, and the thickness of the sixth layer is 12-18 nm; the refractive index of the seventh layer is 1.76-1.85, and the thickness of the seventh layer is 12-18 nm.

[0019] In one implementation, the remaining layers in the first scratch-resistant layer, excluding the diamond-like carbon film layer, are each independently selected from one of a high-refractive-index high-hardness material, a high-refractive-index low-hardness material, or a low-refractive-index low-hardness material.

[0020] The high-refractive-index, high-hardness material is a material with a refractive index greater than or equal to 1.8 and a nanoindentation hardness greater than 14 GPa. Exemplarily, the high-refractive-index, high-hardness material includes at least one of silicon nitrides (such as silicon nitride), silicon oxides (such as silicon oxynitride), aluminum-containing nitrides (such as aluminum-containing silicon nitride), aluminum-containing silicon oxynitride, silicon carbides (such as silicon carbide), titanium nitrides (such as titanium nitride), and titanium-containing nitrides.

[0021] The high-refractive-index, low-hardness material is a material with a refractive index greater than or equal to 1.8 and a nanoindentation hardness less than 10 GPa. Exemplarily, the high-refractive-index, low-hardness material includes at least one of titanium oxide (such as titanium dioxide), niobium oxide (such as niobium pentoxide), zirconium oxide (such as zirconium dioxide), and tantalum oxide (such as tantalum dioxide).

[0022] The low-refractive-index, low-hardness material is a material with a refractive index less than or equal to 1.5 and a nanoindentation hardness less than 10 GPa. Exemplarily, the low-refractive-index, low-hardness material includes at least one of silicon oxides (such as silicon dioxide), aluminum-containing oxides, boron-containing oxides (such as boron oxide), magnesium fluoride, and aluminum-containing silicon oxynitride.

[0023] All of the above materials can be combined with diamond-like carbon film to form a first scratch-resistant layer with low reflectivity and high hardness.

[0024] In one implementation, the first scratch-resistant layer further includes a film layer with a refractive index greater than 1.5 and less than 1.8, and the thickness of each film layer with a refractive index greater than 1.5 and less than 1.8 is 10nm-50nm. By setting a film layer with a refractive index greater than 1.5 and less than 1.8, it can cooperate with other films in the first scratch-resistant layer to achieve an anti-reflection effect and avoid excessive light loss caused by the first scratch-resistant layer itself.

[0025] In one implementation, the number of film layers with a refractive index greater than 1.5 and less than 1.8 is 1-3. The number of film layers with a refractive index greater than 1.5 and less than 1.8 should not be excessive, as this will affect the transmittance of the first scratch-resistant layer, and consequently, the transmittance of the optical film.

[0026] In summary, by setting up diamond-like carbon film layers and other film layers of different thicknesses, the first scratch-resistant layer can have high hardness, effectively preventing scratches, while also having high transmittance and reducing reflection.

[0027] In one implementation, the optical film further includes a second scratch-resistant layer, which comprises at least one layer with a refractive index greater than or equal to 1.8. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or between the layers of the interference layer, or on the surface of the interference layer opposite to the first scratch-resistant layer. The thickness of the second scratch-resistant layer is greater than or equal to 300 nm and less than or equal to 3000 nm. A second scratch-resistant layer thickness greater than 3000 nm increases film stress and the risk of film cracking, peeling, and detachment. A second scratch-resistant layer thickness ≤ 300 nm significantly reduces the overall scratch resistance of the optical film. The first scratch-resistant layer can be used to increase the surface hardness of the optical film and resist surface scratches. By providing a second scratch-resistant layer inside the optical film, the optical film can have deep hardness to resist deep scratches. By providing a second scratch-resistant layer, the pressure resistance of the optical film can be further improved; for example, under greater pressure loads, the size of the indentation formed on the surface of the optical film is smaller, such as the width and depth of the indentation.

[0028] In one implementation, the second scratch-resistant layer consists of a film layer with a refractive index greater than or equal to 1.8. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or in the interlayer of the interference layer. Using a film layer with a refractive index greater than or equal to 1.8 as the second scratch-resistant layer avoids reducing the transmittance of the optical film by adding a second scratch-resistant layer, thus preventing a further reduction in the scratch resistance of the optical film while simultaneously improving its transmittance.

[0029] In another implementation, the second scratch-resistant layer comprises at least one film layer with a refractive index greater than or equal to 1.8 and at least one film layer with a refractive index less than or equal to 1.5, wherein the film layer with a refractive index greater than or equal to 1.8 and the film layer with a refractive index less than or equal to 1.5 are stacked, and the second scratch-resistant layer is disposed on the side surface of the interference layer opposite to the first scratch-resistant layer. In one implementation, the film layer with a refractive index greater than or equal to 1.8 and the film layer with a refractive index less than or equal to 1.5 may be stacked alternately. By combining the film layer with a refractive index greater than or equal to 1.8 and the film layer with a refractive index less than or equal to 1.5, the reflection of the second scratch-resistant layer can be reduced by interference, thereby improving the transmission performance of the optical film.

[0030] In one implementation, in the second scratch-resistant layer, the ratio of the total thickness of the film layer with a refractive index greater than or equal to 1.8 to the total thickness of the second scratch-resistant layer is greater than or equal to 70%. Increasing the proportion of the thickness of the film with a refractive index greater than or equal to 1.8 in the second scratch-resistant layer can help reduce the reflectivity of the optical film and improve the transmittance.

[0031] In one implementation, the number of layers of the film with a refractive index greater than or equal to 1.8 is at least two, and the film with a refractive index greater than or equal to 1.8 has at least two different hardnesses, which can further improve the scratch resistance of the optical film and enable the optical film to obtain smaller indentations under greater load.

[0032] In one implementation, in the second scratch-resistant layer, at least one of the films with a refractive index greater than or equal to 1.8 has a refractive index greater than or equal to 1.9, thereby improving the transmittance of the optical film.

[0033] In one implementation, the material of the second scratch-resistant layer with a refractive index greater than or equal to 1.8 includes at least one of silicon nitride, silicon oxide, aluminum nitride, aluminum oxide, aluminum-silicon oxide, diamond-like carbon, silicon carbide, titanium nitride, tantalum oxide, niobium oxide, titanium oxide, hafnium oxide, zirconium oxide, zinc sulfide, and lanthanum titanate. Using these materials, a film with a high refractive index, such as a refractive index greater than or equal to 1.8, can be formed.

[0034] In one implementation, the interference layer comprises 3-8 high-refractive-index and low-refractive-index films, respectively. The thickness of each high-refractive-index film is 5-300 nm, for example, 5-200 nm, or 10-180 nm; the thickness of each low-refractive-index film is 5-250 nm, for example, 5-200 nm, or 10-200 nm. Using this combination, the anti-reflection and anti-reflection effects on light can be primarily achieved.

[0035] In one implementation, the optical film of this application has an average transmittance of greater than or equal to 92% in the wavelength range of 400-700nm. In the (L*,a*,b*) chromaticity system, the color value a satisfies -2≤a≤2, and the color value b satisfies -2≤b≤2.

[0036] Secondly, an optical film of this application is applied to a transparent substrate, comprising an interference layer and a first scratch-resistant layer disposed on one side surface of the interference layer.

[0037] The interference layer comprises a high-refractive-index film layer and a low-refractive-index film layer stacked together; the total number of high-refractive-index and low-refractive-index film layers in the interference layer is 6-16 layers, the total thickness of the interference layer is less than or equal to 800 nm, the thickness of each high-refractive-index film layer is greater than or equal to 10 nm and less than or equal to 300 nm, the thickness of each low-refractive-index film layer is greater than or equal to 20 nm and less than or equal to 250 nm, and one of the low-refractive-index film layers has a thickness greater than or equal to 130 nm; the high-refractive-index film layer has a refractive index greater than that of the transparent substrate, and the low-refractive-index film layer has a refractive index less than that of the transparent substrate.

[0038] The first scratch-resistant layer comprises at least three layers stacked together with different refractive indices. Among the at least three layers with different refractive indices, one is a diamond-like carbon (DLC) layer, at least one is a layer with a refractive index greater than or equal to 1.8, and at least one is a layer with a refractive index less than or equal to 1.5. The number of layers with a refractive index greater than or equal to 1.8 is 1-4, and the number of layers with a refractive index less than or equal to 1.5 is 1-4. The thickness of the DLC layer is less than or equal to 5 nm. Among the layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than or equal to 1.5 in the first scratch-resistant layer, at least one layer has a thickness less than or equal to 10 nm, and at least one layer has a thickness greater than 30 nm. The remaining layers of the first scratch-resistant layer each have a thickness of 10-50 nm, and the total thickness of the first scratch-resistant layer is less than or equal to 130 nm.

[0039] In the optical film of this application, the interference layer is used to eliminate reflected light, thus achieving anti-reflection and anti-glare effects. By limiting the number of high-refractive-index layers and the thickness of each high-refractive-index layer, as well as the number of low-refractive-index layers and the thickness of each low-refractive-index layer, a good anti-reflection and anti-reflection effect can be achieved in the optical film. Furthermore, by controlling the total thickness of the interference layer to within 800 nm, a high-quality anti-reflection and anti-reflection effect is obtained while minimizing the thickness of the optical film.

[0040] By depositing a first scratch-resistant layer with a diamond-like carbon (DLC) film on one side of the interference layer, the hardness of the first scratch-resistant layer can be increased, thereby improving its scratch resistance. Simultaneously, the remaining layers in the first scratch-resistant layer include at least two other layers with different refractive indices than the DLC film, which, in combination with the DLC film, further enhance the scratch resistance of the first scratch-resistant layer. Furthermore, at least one of the remaining layers in the first scratch-resistant layer has a refractive index greater than or equal to 1.8, and at least one has a refractive index less than or equal to 1.5. When these remaining layers are combined with the DLC film, they can increase the transmittance and reduce the reflectance of the first scratch-resistant layer. The first scratch-resistant layer has a total thickness of less than or equal to 130 nm, the diamond-like carbon film has a thickness of less than or equal to 5 nm, and among the films with a refractive index greater than or equal to 1.8 and those with a refractive index less than or equal to 1.5, at least one film has a thickness of less than or equal to 10 nm and at least one film has a thickness greater than 50 nm. The remaining films in the first scratch-resistant layer have a thickness of 10-50 nm. This allows the first scratch-resistant layer to have high hardness, effectively providing scratch protection, while also ensuring high transmittance and reducing reflection. Testing shows that the optical film with this structure exhibits a low-fluctuation reflection optical curve in a wide-band spectrum, achieving good anti-reflection effects at different angles. For example, within the incident light range of 0-30°, the reflectance fluctuation value in the 400-700 nm wavelength band can be controlled within 0.3%, thus enabling the optical film to have good color rendering effects and solving the problems of insufficient anti-reflection effects and color distortion in existing optical films over a wide band.

[0041] In one implementation, the optical film further includes a second scratch-resistant layer, which is composed of a film layer with a refractive index greater than or equal to 1.9 and a thickness greater than or equal to 1000 nm and less than or equal to 3000 nm. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or between the interference layers. The second scratch-resistant layer can be disposed between the interference layer and the first scratch-resistant layer. By providing the second scratch-resistant layer, the pressure resistance of the optical film can be further improved; for example, under greater pressure loads, the size of the indentation formed on the surface of the optical film is smaller, such as the width and depth of the indentation. By providing a first scratch-resistant layer on the surface of the optical film and a second scratch-resistant layer inside the optical film, the surface hardness and deep hardness of the optical film can be synergistically improved, thereby increasing the overall hardness of the optical film.

[0042] In one implementation, the optical film further includes a second scratch-resistant layer disposed between the interference layers. The second scratch-resistant layer can be disposed between the interference layers, meaning it can divide the interference layer into two parts. The second scratch-resistant layer is composed of a high-refractive-index film layer with a thickness greater than or equal to 1000 nm and less than or equal to 3000 nm, and a refractive index greater than or equal to 1.85.

[0043] In one implementation, the optical film further includes a second scratch-resistant layer. This second scratch-resistant layer comprises stacked layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than 1.8. The number of layers with a refractive index greater than or equal to 1.8 is 2-4, and the number of layers with a refractive index less than 1.8 is 1-3. At least one of the layers with a refractive index greater than or equal to 1.8 has a refractive index greater than 1.9, and the thickness of the layer with a refractive index greater than 1.9 is greater than or equal to 500 nm. The second scratch-resistant layer is disposed on the side of the interference film opposite to the first scratch-resistant layer, and the layer with a refractive index greater than 1.9 is not disposed on the outermost layer of the second scratch-resistant layer in the direction opposite to the interference layer. When the second scratch-resistant layer comprises multiple layers, it can be disposed on the surface of the interference layer on the side opposite to the first scratch-resistant layer to improve the deep hardness of the optical film, reduce reflectivity, and increase transmittance.

[0044] In one implementation, the optical film further includes a fingerprint protection layer disposed on the surface of the first scratch-resistant layer opposite to the interference layer. The fingerprint protection layer may be composed of, for example, a fluorine-containing polymer material. By providing the fingerprint protection layer, surface contamination of the optical film can be reduced.

[0045] In one embodiment, the total thickness of the optical film is 500 nm to 5 μm. The thickness of the optical film should not be too thick or too thin. If the optical film is too thick, it will affect optical loss. If the optical film is too thin, high hardness and low reflectivity cannot be achieved.

[0046] Thirdly, this application provides an optical film for use on a transparent substrate, the optical film comprising a first layer to a twenty-third layer stacked sequentially; wherein:

[0047] The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0048] The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0049] The third layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm.

[0050] The fourth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fourth layer is 1.55-1.65, and the thickness of the fourth layer is 15-25 nm;

[0051] The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.66-1.75, and the thickness of the fifth layer is 15-25 nm;

[0052] The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.76-1.85, and the thickness of the sixth layer is 15-25 nm;

[0053] The seventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 65-75 nm.

[0054] The first layer to the seventh layer constitute the first scratch-resistant layer;

[0055] The eighth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 15-20 nm.

[0056] The ninth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 25-30 nm.

[0057] The tenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 150-160 nm.

[0058] The eleventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 17-22 nm.

[0059] The twelfth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm.

[0060] The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.93-2.0, and the thickness of the thirteenth layer is 1200-1800 nm;

[0061] The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 12-17 nm.

[0062] The fifteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 42-47 nm.

[0063] The sixteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 38-43 nm.

[0064] The seventeenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 35-40 nm.

[0065] The eighteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 35-40 nm.

[0066] The nineteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 57-62 nm.

[0067] The twentieth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm.

[0068] The twenty-first layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 43-49 nm.

[0069] The twenty-second layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 37-43 nm.

[0070] The twenty-third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-17 nm.

[0071] The thirteenth layer is the second scratch-resistant layer, and the remaining layers from the eighth to the twenty-third layer, excluding the thirteenth film layer, constitute the interference layer;

[0072] The first scratch-resistant layer is disposed on the surface of the interference layer, and the second scratch-resistant layer is disposed between the layers of the interference layer.

[0073] In one implementation, the first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0074] The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0075] The third layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 30 nm.

[0076] The fourth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.6 and a thickness of 20 nm.

[0077] The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.7, and the thickness of the fifth layer is 20 nm;

[0078] The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.8, and the thickness of the sixth layer is 20 nm;

[0079] The seventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 68.9 nm.

[0080] The eighth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 17.8 nm.

[0081] The ninth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 27.1 nm.

[0082] The tenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 155.4 nm.

[0083] The eleventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 18.7 nm.

[0084] The twelfth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 22.7 nm.

[0085] The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.96, and the thickness of the thirteenth layer is 1500 nm;

[0086] The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 14.2 nm.

[0087] The fifteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 44.3 nm.

[0088] The sixteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 40.8 nm.

[0089] The seventeenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 37.9 nm.

[0090] The eighteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37.9 nm.

[0091] The nineteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 59.5 nm.

[0092] The twentieth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 23.2 nm.

[0093] The 21st layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 46.6 nm.

[0094] The twentieth layer is a silicon dioxide film with a refractive index of 1.46 and a thickness of 39.5 nm.

[0095] The 23rd layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 14.9 nm.

[0096] Tests showed that the optical film with the above structure exhibited average reflectance of 0.4% and 0.6% in the 400-700nm wavelength range within an incident angle range of 0° to 30°, with optical fluctuations controlled at around 0.2%, resulting in a significant improvement in optical performance. The nanoindentation hardness reached 15GPa, which, compared to the intrinsic hardness of 9GPa for transparent substrates such as microcrystalline glass, effectively enhanced the panel's hardness.

[0097] Fourthly, this application provides an optical film applied to a transparent substrate, comprising a first layer to a sixteenth layer sequentially stacked; wherein:

[0098] The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0099] The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0100] The third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 3-7 nm.

[0101] The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 40-50 nm.

[0102] The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.56-1.65, and the thickness of the fifth layer is 12-18 nm;

[0103] The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.66-1.75, and the thickness of the sixth layer is 12-18 nm;

[0104] The seventh layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the seventh layer is 1.76-1.85, and the thickness of the seventh layer is 12-18 nm;

[0105] The first layer to the seventh layer constitute the first scratch-resistant layer;

[0106] The eighth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.88-1.92 and a thickness of 1200-1800 nm; the eighth layer constitutes the second scratch-resistant layer.

[0107] The ninth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-20 nm.

[0108] The tenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm.

[0109] The eleventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 42-50 nm.

[0110] The twelfth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 22-30 nm.

[0111] The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.93-2.0, and the thickness of the thirteenth layer is 54-62 nm;

[0112] The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 34-40 nm.

[0113] The fifteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 20-28 nm.

[0114] The sixteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixteenth layer is 1.4-1.5, and the thickness of the sixteenth layer is 180-220 nm;

[0115] The ninth to the sixteenth layers constitute an interference layer, the second scratch-resistant layer is disposed between the first scratch-resistant layer and the interference layer, and the seventh layer of the first scratch-resistant layer is in contact with the second scratch-resistant layer.

[0116] In one implementation, the first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0117] The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0118] The third layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 5 nm.

[0119] The fourth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 45 nm.

[0120] The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.6, and the thickness of the fifth layer is 15 nm;

[0121] The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.7, and the thickness of the sixth layer is 15 nm;

[0122] The seventh layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the seventh layer is 1.8, and the thickness of the seventh layer is 15 nm;

[0123] The eighth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the eighth layer is 1.9, and the thickness of the eighth layer is 1500 nm;

[0124] The ninth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 16 nm.

[0125] The tenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 30 nm.

[0126] The eleventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 46 nm.

[0127] The twelfth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 26 nm.

[0128] The thirteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 57 nm.

[0129] The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37 nm.

[0130] The fifteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 24 nm.

[0131] The sixteenth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.45 and a thickness of 200 nm.

[0132] Tests showed that the optical film with the above structure increased the transmittance in the 400-700nm wavelength band from 90.5% to 93%, achieved a nanoindentation hardness of 18GPa, and showed no visible scratches when subjected to a 1000g load at a Mohs hardness of 7.

[0133] Fifthly, this application provides an optical film for use on a transparent substrate, the optical film comprising a first layer to a thirteenth layer stacked sequentially; wherein:

[0134] The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0135] The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0136] The third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 1-3 nm.

[0137] The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 80-100 nm.

[0138] The first layer to the fourth layer constitute the first scratch-resistant layer;

[0139] The fifth layer is a silicon oxynitride film layer, the refractive index of the fifth layer is 1.48-1.52, and the thickness of the fifth layer is 50-55 nm;

[0140] The sixth layer is a silicon oxynitride film layer, the refractive index of the sixth layer is 1.63-1.68, and the thickness of the sixth layer is 47-53 nm;

[0141] The seventh layer is a silicon oxynitride film layer with a refractive index of 1.78-1.82 and a thickness of 65-70 nm.

[0142] The eighth layer is a silicon oxynitride film layer, the refractive index of the eighth layer is 1.88-1.92, and the thickness of the eighth layer is 47-53.

[0143] The fifth to eighth layers form an interference layer;

[0144] The ninth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the ninth layer is 1.93-2.0, and the thickness of the ninth layer is 500-700 nm;

[0145] The tenth layer is a silicon oxynitride film layer with a refractive index of 1.88-1.92 and a thickness of 85-95 nm.

[0146] The eleventh layer is a silicon oxynitride film layer with a refractive index of 1.78-1.82 and a thickness of 82-86 nm.

[0147] The twelfth layer is a silicon oxynitride film layer with a refractive index of 1.62-1.68 and a thickness of 62-68 nm.

[0148] The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.46-1.52, and the thickness of the thirteenth layer is 7-12 nm;

[0149] The ninth to thirteenth layers constitute the second scratch-resistant layer.

[0150] In one implementation, the first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0151] The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0152] The third layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 2 nm.

[0153] The fourth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 90 nm.

[0154] The fifth layer is a silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 52 nm.

[0155] The sixth layer is a silicon oxynitride film layer, the refractive index of the sixth layer is 1.65, and the thickness of the sixth layer is 50 nm;

[0156] The seventh layer is a silicon oxynitride film layer, the refractive index of the seventh layer is 1.8, and the thickness of the seventh layer is 67 nm;

[0157] The eighth layer is a silicon oxynitride film layer, the refractive index of the eighth layer is 1.9, and the thickness of the eighth layer is 50.

[0158] The ninth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the ninth layer is 1.96, and the thickness of the ninth layer is 600 nm;

[0159] The tenth layer is a silicon oxynitride film layer with a refractive index of 1.9 and a thickness of 90 nm.

[0160] The eleventh layer is a silicon oxynitride film layer, the refractive index of the eleventh layer is 1.8, and the thickness of the eleventh layer is 84 nm;

[0161] The twelfth layer is a silicon oxynitride film layer, the refractive index of the twelfth layer is 1.65, and the thickness of the twelfth layer is 65 nm;

[0162] The thirteenth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 10 nm.

[0163] Tests showed that the optical film with the above structure had a transmittance of 90.5% to 93.7% in the 400-700nm wavelength range, and a nanoindentation hardness of 16.6GPa.

[0164] The methods for preparing the optical films according to the first to fifth aspects of this application may include the following steps:

[0165] Based on the preset number of layers and preset thickness, each film layer is sequentially deposited using physical deposition or chemical vapor deposition methods to obtain the optical film of this application.

[0166] Sixthly, this application provides a panel comprising a transparent substrate and an optical film of this application disposed on one surface of the transparent substrate. Exemplarily, the panel of this application may be a display panel or a back cover.

[0167] The panel of this application has an optical film on the surface of a transparent substrate. Since the optical film of this application has a wide band low wave reflection effect, the panel of this application also has the same performance, thereby obtaining a panel that is scratch-resistant, pressure-resistant and has better color rendering effect.

[0168] Transparent substrates include, but are not limited to, glass, sapphire, and polymer substrates.

[0169] The method for preparing the panel in this application may include the following steps:

[0170] Based on the preset number of layers and preset thickness, each film layer is sequentially deposited on one side surface of a transparent substrate using physical deposition or chemical vapor deposition methods, thereby obtaining the panel of this application.

[0171] In a seventh aspect, this application provides a display device, which includes the panel of this application.

[0172] The display devices of this application include, but are not limited to, mobile terminal devices with display panels, such as mobile phones, computers, tablets, electronic watches, and glasses, and may also include display terminal devices, such as outdoor advertising screens and vehicle displays. The panel of this application can be used as the display screen or back cover of the aforementioned display devices.

[0173] Eighthly, this application provides an optical device that includes the panel of this application.

[0174] The optical devices of this application include cameras, electronic devices with imaging functions, etc. The panel of this application can be used as a cover plate for the aforementioned optical devices.

[0175] The technical effects that can be achieved in the third to fifth aspects mentioned above can be referred to the corresponding effect descriptions in the first aspect mentioned above, and will not be repeated here.

[0176] In this application, the data in the various possible implementations, such as the refractive index and thickness of each film layer, should be understood as being within the range defined in this application, provided that the measurement is within the engineering measurement error range. Attached Figure Description

[0177] Figure 1 This is a schematic diagram of the panel structure according to one embodiment;

[0178] Figure 2 This is a schematic diagram of the structure of the first scratch-resistant layer according to an embodiment of this application;

[0179] Figure 3 This is a schematic diagram of the structure of the first scratch-resistant layer according to another embodiment of this application;

[0180] Figure 4 This is a schematic diagram of the structure of the first scratch-resistant layer according to another embodiment of this application;

[0181] Figure 5 This is a schematic diagram of the panel structure according to another embodiment;

[0182] Figure 6 This is a schematic diagram of the panel structure according to another embodiment of this application;

[0183] Figure 7 This is a schematic diagram of the panel structure according to another embodiment;

[0184] Figure 8 This is a schematic diagram of the structure of an optical film according to one embodiment;

[0185] Figure 9 This is a schematic diagram of the structure of an optical film according to one embodiment;

[0186] Figure 10 This is a schematic diagram of the structure of an optical film according to one embodiment;

[0187] Figure 11 This is a schematic diagram of the structure of an optical film according to another embodiment of this application;

[0188] Figure 12The reflectance curves of the panel in this embodiment at different incident angles are shown.

[0189] Figure 13 This is a load-displacement test curve during the nanoindentation process;

[0190] Figure 14 This is a schematic diagram illustrating the process of applying pressure using a pressure head;

[0191] Figure 15 This is a diagram showing the indentation after the pressure head has been removed.

[0192] Figure 16 For along Figure 15 The test image obtained after depth testing of the profile at point AA in the middle;

[0193] Figure 17 This is a transmittance test curve of the glass panel in this embodiment;

[0194] Figure 18 This is a load-displacement test curve during the nanoindentation process;

[0195] Figure 19 This is a schematic diagram illustrating the process of applying pressure using a pressure head;

[0196] Figure 20 This is a diagram showing the indentation after the pressure head has been removed.

[0197] Figure 21 For along Figure 20 The test image obtained after depth testing of the cross section at point BB;

[0198] Figure 22 This is a transmittance test curve of the glass panel in this embodiment;

[0199] Figure 23 This is a load-displacement test curve during the nanoindentation process.

[0200] Figure label:

[0201] 100-panel;

[0202] 10-Transparent substrate;

[0203] 20-Optical film;

[0204] 21-Interference layer; 22-First scratch-resistant layer; 23-Second scratch-resistant layer; 24-Fingerprint protection layer;

[0205] 101 - First floor; 102 - Second floor; 103 - Third floor; 104 - Fourth floor; 105 - Fifth floor; 106 - Sixth floor; 107 - Seventh floor;

[0206] 108 - Eighth Floor; 109 - Ninth Floor; 110 - Tenth Floor; 111 - Eleventh Floor; 112 - Twelfth Floor; 113 - Thirteenth Floor;

[0207] 114 - Fourteenth floor; 115 - Fifteenth floor; 116 - Sixteenth floor; 117 - Seventeenth floor; 118 - Eighteenth floor; 119 - Nineteenth floor;

[0208] 120 - 20th floor; 121 - 21st floor; 122 - 22nd floor; 123 - 23rd floor. Detailed Implementation

[0209] To make the objectives, technical solutions, and advantages of this application clearer, the application will now be described in further detail with reference to the accompanying drawings.

[0210] The terminology used in the following embodiments is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. As used in the specification and appended claims of this application, the singular expressions “a,” “an,” “the,” “the,” and “this” are intended to also include expressions such as “one or more,” unless the context clearly indicates otherwise.

[0211] References to "one embodiment" or "some embodiments" as described in this specification mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.

[0212] In the panels of electronic or optical devices, such as display panels of mobile phones, an optical film is typically deposited on the surface of a transparent substrate to achieve anti-reflection and anti-reflection effects. Existing anti-reflection films suffer from a lack of effective balance between abrasion resistance and anti-reflection properties; that is, achieving high light transmittance (e.g., transmittance ≥ 92%) while maintaining sufficient hardness, such as a nanoindentation hardness ≥ 14 GPa. To address this, this application provides an optical film that is a high-hardness, low-reflection optical film.

[0213] In this application, the nanoindentation hardness mentioned in the embodiments is defined as the hardness value corresponding to an indentation depth of 200 nm when pressure is applied to the test film layer along a direction perpendicular to the surface of the test film layer. The nanoindentation tester could be an Anton Paar NHT. 3 UNHT 3 Testers of various models.

[0214] Figure 1 This is a schematic diagram of the panel structure according to one embodiment. Wherein, Figure 1 (a) in the diagram is a schematic diagram of the external structure. Figure 1 (b) in the diagram is a schematic diagram of the cross-sectional structure. For example... Figure 1 As shown, the panel includes a transparent substrate 10 and an optical film 20 disposed on one side surface of the transparent substrate 10. The transparent substrate 10 may be, for example, glass, sapphire, or a transparent polymer. The optical film 20 is the optical film described in the following embodiments of this application.

[0215] like Figure 1 As shown, the optical film 20 in this embodiment of the application has an interference layer 21 and a first scratch-resistant layer 22. The interference layer 21 includes a high-refractive-index film layer and a low-refractive-index film layer stacked together. The high-refractive-index film layer has a refractive index greater than that of the transparent substrate 10, and the low-refractive-index film layer has a refractive index less than that of the transparent substrate 10. When the transparent substrate 10 is glass, the high-refractive-index film layer can have a refractive index greater than 1.5, such as greater than 1.8, and the low-refractive-index film layer can have a refractive index less than 1.5.

[0216] The material for the high refractive index film can be at least one of high refractive index and high hardness materials, or high refractive index and low hardness materials. The material for the high refractive index film can be selected from at least one of silicon-containing nitrides, silicon-containing oxides, aluminum-containing nitrides, silicon-aluminum oxides, diamond-like carbon, silicon carbide, titanium nitride, titanium-containing nitrides, Ta₂O₅, Nb₂O₅, TiO₂, hafnium oxide, zirconium oxide, zinc sulfide, and lanthanum titanate. The material for the low refractive index film can be at least one of low refractive index and high hardness materials. The material forming the low refractive index film can be selected from at least one of silicon dioxide, aluminum oxide, aluminum-containing oxides, silicon-containing nitrides, silicon-aluminum oxides, silicon-containing oxides, magnesium fluoride, aluminum fluoride, and cerium fluoride.

[0217] The interference layer 21 comprises 3-8 high-refractive-index and low-refractive-index films. The total number of high-refractive-index and low-refractive-index films in the interference layer 21 is 6-16, and the total thickness of the interference layer 21 is less than or equal to 800 nm. Each high-refractive-index film has a thickness greater than or equal to 10 nm and less than or equal to 300 nm, or alternatively, 10-200 nm or 10-150 nm. Each low-refractive-index film has a thickness greater than or equal to 20 nm and less than or equal to 250 nm, or alternatively, 20-200 nm or 30-200 nm. One of the low-refractive-index films has a thickness greater than or equal to 130 nm.

[0218] In the optical film 20 of this embodiment, the interference layer 21 is used to eliminate reflected light, thus achieving anti-reflection and anti-glare effects. By controlling the number of high-refractive-index layers and the thickness of each high-refractive-index layer, as well as the number of low-refractive-index layers and the thickness of each low-refractive-index layer, a good anti-reflection and anti-reflection effect can be achieved. Furthermore, by controlling the total thickness of the interference layer to within 800 nm, the thickness of the optical film is minimized while obtaining a high-quality anti-reflection and anti-reflection effect.

[0219] Continue to refer to Figure 1 In the optical film 20 of the panel in this embodiment, the first scratch-resistant layer 22 is disposed on one side surface of the interference layer 21 to improve the surface hardness of the optical film 20.

[0220] The first scratch-resistant layer 22 may include at least three layers stacked together with different refractive indices. Among the at least three layers with different refractive indices, at least one is a diamond-like carbon (DLC) layer, at least one has a refractive index greater than or equal to 1.8, and at least one has a refractive index less than or equal to 1.5. The optical film with the structure of this application has an average reflectivity ≤2% in the wavelength range of 400-700 nm, a scratch depth ≤10 nm under a Mohs hardness of 7 and a load of ≤750 g, and a nanoindentation hardness ≥14 GPa.

[0221] In the first scratch-resistant layer 22, the diamond-like carbon (DLC) film is a high-refractive-index film with a refractive index of 2.1-2.3. The DLC film is an amorphous carbon-based thin film material with properties similar to diamond, possessing excellent properties such as high hardness, low coefficient of friction, and chemical inertness. Its chemical bonds contain sp... 3 carbon bonds and sp 2 Carbon bond, where sp 3 Carbon bonds, similar to those in diamond, provide high hardness and wear resistance. 2Carbon bonds, similar to graphite, impart a certain degree of lubricity to the film. By providing a first scratch-resistant layer 22 with a diamond-like carbon film on one side surface of the interference layer 21, the hardness of the first scratch-resistant layer 22 can be increased using the diamond-like carbon film, thereby improving the scratch resistance of the optical film 20. In one embodiment, the nanoindentation hardness of the diamond-like carbon film is 30-45 GPa to provide high hardness to the optical film 20.

[0222] In one embodiment, the diamond-like carbon (DLC) film layer may be a single layer to reduce its impact on light transmittance. Alternatively, the DLC film layer may have two, three, or more layers. Multiple DLC film layers can improve the hardness and toughness of the first scratch-resistant layer 22 while avoiding deterioration of its optical performance.

[0223] In one embodiment, the diamond-like carbon film can be an nitrogen-doped diamond-like carbon (N-DLC) film. N-doped diamond-like carbon is an amorphous carbon material modified by introducing nitrogen, combining the high hardness of diamond-like carbon with the unique properties brought by nitrogen doping. Nitrogen doping can adjust the sp... 3 / sp 2 The carbon bond ratio, while maintaining high hardness, enhances toughness and reduces the risk of film cracking or peeling. The introduction of nitrogen forms a denser cross-linked structure, significantly improving the wear resistance of the diamond-like carbon (DLC) film, thereby enhancing the scratch resistance of the optical film 20. Since the first scratch-resistant layer 22 is mainly disposed on the surface of the optical film 20, its surface hardness and scratch resistance can be significantly improved. The mass percentage of nitrogen (N) in the DLC film can be 1-20%, such as 1-15%, or even 5-15%. By adjusting the N doping ratio in the DLC film, the hardness and mechanical properties of the DLC film can be further improved, enabling the DLC film to achieve sufficient hardness and scratch resistance while maintaining a relatively thin thickness.

[0224] In one embodiment, the thickness of the diamond-like carbon film is less than or equal to 5 nm, or for example, greater than or equal to 2 nm, or for example, 2-4 nm. For example, the thickness of the diamond-like carbon film can be any value between two of the following: 2 nm, 2.5 nm, 3 nm, 3.5 nm, 4 nm, 4.5 nm, or 5 nm or more.

[0225] In the optical film 20 of this embodiment, the first scratch-resistant layer 22 includes a diamond-like carbon (DLC) film layer, and the remaining film layers also include at least two other film layers with different refractive indices than the DLC film layer. The combination of these remaining film layers with the DLC film layer helps to improve the scratch resistance of the first scratch-resistant layer 22. Furthermore, the combination of film layers with a refractive index greater than or equal to 1.8 and film layers with a refractive index less than or equal to 1.5 with the DLC film layer in the first scratch-resistant layer 22 can increase the transmittance and reduce the reflectivity of the first scratch-resistant layer 22.

[0226] In one embodiment, the number of layers with a refractive index greater than or equal to 1.8 in the first scratch-resistant layer 22 can be 1 to 4. For example, the number of layers with a refractive index greater than or equal to 1.8 in the first scratch-resistant layer 22 can be 1, 2, 3 or 4.

[0227] In one embodiment, the number of layers with a refractive index less than or equal to 1.5 in the first scratch-resistant layer 22 may be 1 to 4. For example, the number of layers with a refractive index less than or equal to 1.5 in the first scratch-resistant layer 22 may be 1, 2, 3 or 4.

[0228] In one embodiment, among the layers of the first scratch-resistant layer 22 with a refractive index greater than or equal to 1.8 and layers with a refractive index less than or equal to 1.5, at least one layer has a thickness less than or equal to 10 nm, for example, less than or equal to 7 nm, or even less than or equal to 5 nm. Exemplarily, the specific thickness of the layer with a thickness less than or equal to 10 nm can be any value between 1 nm, 2 nm, 3 nm, 4 nm, 5 nm, 7 nm, 8 nm, or 10 nm or more. Furthermore, among the layers of the first scratch-resistant layer 22 with a refractive index greater than or equal to 1.8 and layers with a refractive index less than or equal to 1.5, at least one layer has a thickness greater than 30 nm, for example, greater than or equal to 50 nm, or even greater than or equal to 60 nm, or even greater than or equal to 70 nm. Exemplarily, the thickness of the layer with a thickness greater than 30 nm can be any value between 40 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm or more. The above structural design can be combined with a thinner diamond-like carbon film layer to increase transmittance.

[0229] In the remaining layers of the first scratch-resistant layer 22, excluding the aforementioned thickness, the thickness of each layer can be 10-50 nm, and the total thickness of the first scratch-resistant layer 22 is less than or equal to 130 nm, for example, it can be 60-120 nm. For example, the thickness of each remaining layer of the first scratch-resistant layer 22 can be any two values ​​between 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, or 50 nm.

[0230] By controlling the total thickness of the first scratch-resistant layer 22 to be less than or equal to 130 nm, and controlling the thickness of each remaining film layer in the first scratch-resistant layer 22 to be in the range of 10-50 nm, the first scratch-resistant layer 22 can have high hardness while having a low total thickness, effectively playing a scratch-resistant role, while also having high transmittance and reducing reflection.

[0231] Continue to refer to Figure 1 In addition to a film layer with a refractive index greater than or equal to 1.8 and a film layer with a refractive index less than or equal to 1.5, the first scratch-resistant layer 22 may also include a film layer with a refractive index greater than 1.5 and less than 1.8. The thickness of each film layer with a refractive index greater than 1.5 and less than 1.8 may be 10nm-50nm. For example, the thickness of each film layer may be any two values ​​between 10nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm or 50nm or more.

[0232] In the first scratch-resistant layer 22, the number of film layers with a refractive index greater than 1.5 and less than 1.8 can be 1 to 3, for example, 1, 2 or 3 layers. The number of film layers with a refractive index greater than 1.5 and less than 1.8 should not be too large, as too many layers will affect the transmittance of the first scratch-resistant layer 22, and thus affect the transmittance of the optical film 20.

[0233] Among them, the remaining films in the first scratch-resistant layer 22, excluding the diamond-like carbon film layer, namely the film layer with a refractive index greater than or equal to 1.8, the film layer with a refractive index less than or equal to 1.5, and the film layer with a refractive index greater than 1.5 and less than 1.8, can be independently selected from one of the following: high-refractive-index high-hardness materials, high-refractive-index low-hardness materials, or low-refractive-index low-hardness materials.

[0234] Among them, high-refractive-index and high-hardness materials are those with a refractive index greater than or equal to 1.8 and a nanoindentation hardness greater than 14 GPa. High-refractive-index and high-hardness materials may include at least one of silicon nitrides (such as silicon nitride), silicon oxides (such as silicon oxynitride), aluminum-containing nitrides (such as aluminum-containing silicon nitride), aluminum-containing silicon oxynitride, silicon carbides (such as silicon carbide), titanium nitrides (such as titanium nitride), and titanium-containing nitrides.

[0235] High-refractive-index, low-hardness materials are those with a refractive index greater than or equal to 1.8 and a nanoindentation hardness less than 10 GPa. High-refractive-index, low-hardness materials may include at least one of the following: titanium oxide (e.g., titanium dioxide), niobium oxide (e.g., niobium pentoxide), zirconium oxide (e.g., zirconium dioxide), and tantalum oxide (e.g., tantalum dioxide).

[0236] Low-refractive-index and low-hardness materials are materials with a refractive index of less than or equal to 1.5 and a nanoindentation hardness of less than 10 GPa; low-refractive-index and low-hardness materials may include at least one of silicon oxides (such as silicon dioxide), aluminum oxides, boron oxides (such as boron oxide), magnesium fluoride, and aluminum-containing silicon oxynitride.

[0237] In this embodiment of the application, the thickness of the film formed by the high-refractive-index and high-hardness material in the first scratch-resistant layer 22 should be as high as possible, for example, greater than 50%, or greater than 60%, or greater than 70%, etc., in order to achieve a higher surface hardness.

[0238] The materials listed above can be selected based on the specific design requirements for the refractive index and hardness of the film. It is understandable that some of the listed materials, such as aluminum-containing silicon oxynitride, can be used as both high-refractive-index, high-hardness materials and low-refractive-index, low-hardness materials, mainly because the specific contents of Al, Si, N, and O in aluminum-containing silicon oxynitride vary. Film materials with different refractive indices and hardnesses can be obtained by adjusting the constituent elements.

[0239] The above explains the types of films that can be included in the first scratch-resistant layer, the selection of various films, the number of layers, and the thickness. The following will combine... Figures 2 to 4 The location of each layer in the first scratch-resistant layer is explained.

[0240] In the first scratch-resistant layer 22, the diamond-like carbon film, the film with a refractive index less than or equal to 1.5, the film with a refractive index greater than or equal to 1.8, and the film with a refractive index greater than 1.5 and less than 1.8 are disposed in various positions and have varying thicknesses according to specific design requirements. However, in order to achieve better surface hardness and protect more film layers from damage, in one embodiment of this application, along the direction from the first scratch-resistant layer 22 to the interference layer 21, the diamond-like carbon film is disposed in the first layer 101 or the second layer 102 of the first scratch-resistant layer 22.

[0241] Figure 2 This is a schematic diagram of the structure of the first scratch-resistant layer in one embodiment. Figure 2 Taking the orientation shown as an example, the interference layer 21 is located below the optical film 20. See also... Figure 1 and Figure 2Along the direction from the first scratch-resistant layer 22 to the interference layer 21, the first layer 101 of the first scratch-resistant layer 22 has a refractive index of less than or equal to 1.5, and a diamond-like carbon (DLC) film is located in the second layer 102 of the first scratch-resistant layer 22. The thickness of the film in the first layer 101 of the optical film 20 is 2-5 nm. In this configuration, the combination of a film with a refractive index of less than or equal to 1.5 and a DLC film can reduce light reflection and increase light transmittance in the first scratch-resistant layer 22. Furthermore, by setting other films on the surface of the DLC film, the DLC film can be protected, reducing the damage rate of the DLC film.

[0242] In one embodiment, the film layer of the first layer 101 located in the first scratch-resistant layer 22 may be a silicon dioxide layer. The refractive index of this film layer may be less than 1.5, such as 1.47, 1.46, 1.15, 1.44, etc.

[0243] by Figure 2 Taking the orientation shown as an example, below the diamond-like carbon (DLC) film, layers with a refractive index less than or equal to 1.5, layers with a refractive index greater than 1.5 and less than 1.8, and layers with a refractive index greater than or equal to 1.8 can be sequentially arranged. The layer with a refractive index less than or equal to 1.5 consists of one layer, the layer with a refractive index greater than 1.5 and less than 1.8 consists of three layers, and the layer with a refractive index greater than or equal to 1.8 consists of two layers. From the DLC film downwards, the refractive index of each layer increases sequentially.

[0244] For example, such as Figure 2 As shown, the first scratch-resistant layer 22 may include a first layer 101 to a seventh layer 107. The first layer 101 is located on the top layer of the first scratch-resistant layer 22, and the seventh layer 107 is connected to the interference layer 21. The refractive index of the first layer 101 is 1.4-1.5, and the thickness of the first layer 101 is 2-4 nm. The second layer 102 is a diamond-like carbon film layer, with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The refractive index of the third layer 103 is 1.4-1.5, and the thickness of the third layer 103 is 25-35 nm. The refractive index of the fourth layer 104 is 1.55-1.65, and the thickness of the fourth layer 104 is 15-25 nm. The refractive index of the fifth layer 105 is 1.66-1.75, and the thickness of the fifth layer 105 is 15-25 nm. The sixth layer, 106, has a refractive index of 1.76-1.85 and a thickness of 15-25 nm. The seventh layer, 107, has a refractive index of 1.93-2.0 and a thickness of 65-75 nm.

[0245] As an example, Figure 2In the optical film 20 with the structure shown, the first layer 101 can be a silicon dioxide film, the second layer 102 can be a diamond-like carbon film, the third layer 103 can be a silicon dioxide film, the fourth layer 104 can be an aluminum-containing silicon oxynitride film, the fifth layer 105 can be an aluminum-containing silicon oxynitride film, the sixth layer 106 can be an aluminum-containing silicon oxynitride film, and the seventh layer 107 can be a silicon nitride film.

[0246] Figure 3 This is a schematic diagram of the structure of the first scratch-resistant layer according to another embodiment of this application. Figure 3 As shown, the first scratch-resistant layer 22 includes a first layer 101 to a seventh layer 107. A diamond-like carbon (DLC) film layer is a single layer located in the second layer 102. Exemplarily, the first layer 101 has a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer 102 is a DLC film layer with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer 103 has a refractive index of 1.93-2.0 and a thickness of 3-7 nm. The fourth layer 104 has a refractive index of 1.4-1.5 and a thickness of 40-50 nm. The fifth layer 105 has a refractive index of 1.56-1.65 and a thickness of 12-18 nm. The sixth layer 106 has a refractive index of 1.66-1.75 and a thickness of 12-18 nm. The refractive index of the seventh 107 layer is 1.76-1.85, and the thickness of the seventh 107 layer is 12-18 nm.

[0247] As an example, Figure 3 In the optical film 20 with the structure shown, the first layer 101 can be a silicon dioxide film, the second layer 102 can be a diamond-like carbon film, the third layer 103 can be a silicon nitride film, the fourth layer 104 can be a silicon dioxide film, the fifth layer 105 can be an aluminum-containing silicon oxynitride film, the sixth layer 106 can be an aluminum-containing silicon oxynitride film, and the seventh layer 107 can be an aluminum-containing silicon oxynitride film.

[0248] Figure 4 This is a schematic diagram of the structure of the first scratch-resistant layer according to another embodiment of this application. Figure 4 As shown, the first scratch-resistant layer 22 comprises layers 101 to 104. The diamond-like carbon (DLC) film is a single layer. The refractive index of layer 101 is 1.4-1.5, and its thickness is 2-4 nm. The second layer 102 is a DLC film, with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The refractive index of layer 103 is 1.93-2.0, and its thickness is 1-3 nm. The refractive index of layer 104 is 1.4-1.5, and its thickness is 80-100 nm.

[0249] As an example, Figure 4 In the optical film 20 with the structure shown, the first layer 101 can be a silicon dioxide film, the second layer 102 can be a diamond-like carbon film, the third layer is a silicon nitride film, and the fourth layer 104 is a silicon dioxide film.

[0250] Figures 2 to 4 The structure of the first scratch-resistant layer 22 shown is merely an illustrative example of this application. Figures 2 to 4 Based on the structure shown, other deformations can be made to meet the requirements of optical film scratch resistance and low reflection.

[0251] The optical film 20 of this embodiment can achieve improved surface hardness and low reflection performance by providing a first scratch-resistant layer 22. Furthermore, the deep hardness of the optical film 20 can be further improved by providing a second scratch-resistant layer 23 within the optical film 20. The second scratch-resistant layer 23 may include at least one film layer with a refractive index greater than or equal to 1.8, thereby further enhancing the hardness of the optical film 20.

[0252] Figure 5 This is a schematic diagram of the panel structure according to another embodiment. Figure 5 As shown, the panel 100 includes a transparent substrate 10 and an optical film 20 disposed on the surface of the transparent substrate 10. The transparent substrate 10 and... Figure 1 The transparent substrate 10 in the illustrated embodiment is the same. In addition to the interference layer 21 and the first scratch-resistant layer 22, the optical film 20 may also include a second scratch-resistant layer 23. The structures of the interference layer 21 and the first scratch-resistant layer 22 can be the same as... Figure 1 The same features as those in the illustrated embodiment will not be repeated here. The second scratch-resistant layer 23 may be formed by a single film layer or by multiple film layers.

[0253] When the second scratch-resistant layer 23 is formed by a film layer, the film layer forming the second scratch-resistant layer 23 can be a film layer with a refractive index greater than or equal to 1.8, or for example, a film layer with a refractive index greater than or equal to 1.85, or for example, a film layer with a refractive index greater than or equal to 1.9.

[0254] Reference Figure 5 When the second scratch-resistant layer 23 is formed by a film layer with a refractive index greater than or equal to 1.8, the second scratch-resistant layer 23 can be disposed between the first scratch-resistant layer 22 and the interference layer 21.

[0255] Figure 6 This is a schematic diagram of the panel structure according to another embodiment of this application. Figure 6 As shown, the optical film 20 in the panel 100 also includes an interference layer 21, a first scratch-resistant layer 22, and a second scratch-resistant layer 23. The structures of the interference layer 21 and the first scratch-resistant layer 22 are comparable to... Figure 1The same applies to the illustrated embodiment and will not be repeated here. The second scratch-resistant layer 23 is also formed of a film layer with a refractive index greater than or equal to 1.8. (Similar to...) Figure 5 The difference in the optical film 20 in the illustrated embodiment is that, Figure 6 In the illustrated embodiment, the second scratch-resistant layer 23 is disposed between the interlayers of the interference layer 21. The second scratch-resistant layer 23 divides the interference layer 21 into two parts. One part is disposed above the second scratch-resistant layer 23, and the other part is disposed below the second scratch-resistant layer 23.

[0256] Reference Figure 5 and Figure 6 The thickness of the second scratch-resistant layer 23 can be 300-3000 nm, for example, 500 nm-2500 nm, or 1000-2000 nm. For example, the thickness of the second scratch-resistant layer 23 can be 500 nm, 800 nm, 1000 nm, 1200 nm, 1500 nm, 1800 nm, 2000 nm, 2500 nm, or 3000 nm. A second scratch-resistant layer 23 thickness > 3000 nm increases film stress and the risk of film cracking, peeling, and detachment. A second scratch-resistant layer 23 thickness ≤ 300 nm significantly reduces the overall scratch resistance of the optical film 20. By providing a second scratch-resistant layer 23, the pressure resistance of the optical film 20 can be further improved; for example, under greater pressure loads, the size of the indentation formed on the surface of the optical film 20 is smaller, such as the width and depth of the indentation.

[0257] Figure 7 This is a schematic diagram of the panel structure according to another embodiment. Figure 7 As shown, in the optical film 20 of this embodiment, the second scratch-resistant layer 23 is formed of multiple film layers. When the second scratch-resistant layer 23 is composed of multiple film layers, the second scratch-resistant layer 23 can be disposed on the side surface of the interference layer 21 facing away from the first scratch-resistant layer 22. That is, the second scratch-resistant layer 23 can be disposed between the interference layer 21 and the transparent substrate 10. The second scratch-resistant layer 23 may include at least one film layer with a refractive index greater than or equal to 1.8 and at least one film layer with a refractive index less than or equal to 1.5. The film layer with a refractive index greater than or equal to 1.8 and the film layer with a refractive index less than 1.5 are stacked, and exemplarily, they can be stacked alternately.

[0258] In one embodiment, the number of layers with a refractive index greater than or equal to 1.8 is at least two; exemplarily, the number of layers with a refractive index greater than or equal to 1.8 can be 2-4. Among the layers with a refractive index greater than or equal to 1.8, at least two layers have different hardnesses. In the second scratch-resistant layer 23, at least one layer with a refractive index greater than or equal to 1.8 has a refractive index greater than or equal to 1.9. Furthermore, the layers with a refractive index greater than or equal to 1.8 are disposed close to the interference layer 21. Exemplarily, the layers with a refractive index greater than or equal to 1.9 can be disposed closer to the interference layer 21 than the layers with a refractive index greater than or equal to 1.8 but less than 1.9.

[0259] In one embodiment, the number of layers with a refractive index less than or equal to 1.5 may be 1-2. Alternatively, in one embodiment, the second scratch-resistant layer 23 may further include a layer with a refractive index greater than 1.5 and less than 1.8. The number of layers with a refractive index greater than 1.5 and less than 1.8 may be 1-3.

[0260] When the second scratch-resistant layer 23 is composed of multiple layers, its total thickness can be 300-3000 nm, or for example, 500 nm-2500 nm, or 1000-2000 nm. The ratio of the total thickness of layers with a refractive index greater than or equal to 1.8 to the total thickness of the second scratch-resistant layer 23 is greater than or equal to 70%. For example, the total thickness of layers with a refractive index greater than or equal to 1.8 can be 70%, 72%, 75%, 78%, 80%, 82%, 85%, 88%, or 90% of the total thickness of the second scratch-resistant layer 23. The layer with the highest refractive index can have a larger thickness. For example, the thickness of the layer with the highest refractive index can exceed 500 nm, such as 600 nm, 700 nm, or 800 nm.

[0261] In this embodiment of the application, the material of the film layer with a refractive index greater than or equal to 1.8 in the second scratch-resistant layer 23 includes at least one of silicon nitride, silicon oxide, aluminum nitride, aluminum oxide, aluminum-containing silicon oxide, diamond-like carbon, silicon carbide, titanium nitride, tantalum oxide, niobium oxide, titanium oxide, hafnium oxide, zirconium oxide, zinc sulfide, and lanthanum titanate.

[0262] Since the second scratch-resistant layer 23 is composed of a high refractive index film layer, it is easier to reduce the production difficulty and facilitate the control of optical properties. Therefore, in the embodiments of this application, the second scratch-resistant layer 23 can be formed by selecting a film layer of a certain material, and its thickness can preferably be controlled to be above 1000nm.

[0263] With the above settings, the optical film 20 of this embodiment has an average reflectivity ≤2% in the 400-700nm wavelength range, and a scratch depth ≤10nm under a Mohs hardness of 7 and a load of ≤750g; the nanoindentation hardness of the optical film 20 is ≥14GPa. Furthermore, testing shows that the optical film 20 with the structure of this embodiment exhibits a low-fluctuation reflectance optical curve in a wide-band spectrum, achieving good anti-reflection effects at different angles. For example, when the incident light is within the 0-30° range, the reflectivity fluctuation in the 400-700nm band can be controlled within 0.3%, thereby enabling the optical film 20 to have good color rendering effects and solving the problems of insufficient anti-reflection effects and color distortion in existing optical films 20 in a wide band. The optical film 20 of this application has an average transmittance greater than or equal to 92% in the 400-700nm wavelength range. In the (L*,a*,b*) chromaticity system, the color value a satisfies -2≤a≤2, and the color value b satisfies -2≤b≤2.

[0264] The average reflectance within the wavelength range of 400-700nm can be tested using a spectrophotometer such as the CM3600 and an Olympus spectrometer.

[0265] The scratch depth test of the optical film 20 under a Mohs hardness of 7 and a load of ≤750g can be performed by applying a pressure of 750g to the optical film 20 with an indenter of Mohs hardness of 7 and by using an optical instrument, such as a white light interferometer, to test the lateral indentation depth.

[0266] Nanoindentation hardness is the pressure applied to the optical film 20 along the direction perpendicular to the surface of the optical film 20, and the pressure corresponding to an indentation depth of 200 nm on the surface of the optical film 20.

[0267] Combined Figures 1 to 7 An optical film 20 according to one embodiment of this application can be applied to a transparent substrate 10 to form a panel 100. The optical film 20 may include an interference layer 21 and a first scratch-resistant layer 22 disposed on one side surface of the interference layer 21.

[0268] The interference layer 21 includes stacked high-refractive-index films and low-refractive-index films. The total number of high-refractive-index and low-refractive-index films in the interference layer 21 is 6-16. The total thickness of the interference layer 21 is less than or equal to 800 nm. The thickness of each high-refractive-index film is greater than or equal to 10 nm and less than or equal to 300 nm, or for example, 5-200 nm, or for example, 10-180 nm. The thickness of each low-refractive-index film is greater than or equal to 20 nm and less than or equal to 250 nm, or for example, 5-200 nm, or for example, 10-200 nm. One of the low-refractive-index films has a thickness greater than or equal to 130 nm. The high-refractive-index film has a refractive index greater than that of the transparent substrate 10, and the low-refractive-index film has a refractive index less than that of the transparent substrate 10.

[0269] The first scratch-resistant layer 22 comprises at least three layers stacked together with different refractive indices. Among the at least three layers with different refractive indices, one is a diamond-like carbon (DLC) layer, at least one is a layer with a refractive index greater than or equal to 1.8, and at least one is a layer with a refractive index less than or equal to 1.5. The number of layers with a refractive index greater than or equal to 1.8 is 1-4, and the number of layers with a refractive index less than or equal to 1.5 is 1-4. The thickness of the DLC layer is less than or equal to 5 nm. Among the layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than or equal to 1.5 in the first scratch-resistant layer 22, at least one layer has a thickness less than or equal to 10 nm, and at least one layer has a thickness greater than 30 nm. The remaining layers of the first scratch-resistant layer 22 have a thickness of 10-50 nm, and the total thickness of the first scratch-resistant layer 22 is less than or equal to 130 nm.

[0270] In one embodiment, the optical film 20 further includes a second scratch-resistant layer 23, which is composed of a film layer with a refractive index greater than or equal to 1.9, and the thickness of the second scratch-resistant layer 23 is greater than or equal to 1000 nm and less than or equal to 3000 nm. The second scratch-resistant layer 23 is disposed between the interference layer 21 and the first scratch-resistant layer 22, or between the layers of the interference layer 21.

[0271] In another embodiment, the second scratch-resistant layer 23 in the optical film 20 includes stacked layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than 1.8. The number of layers with a refractive index greater than or equal to 1.8 is 2-4, and the number of layers with a refractive index less than 1.8 is 1-3. At least one of the layers with a refractive index greater than or equal to 1.8 has a refractive index greater than 1.9, and the thickness of the layer with a refractive index greater than 1.9 is greater than or equal to 500 nm. The second scratch-resistant layer 23 is disposed on the side of the interference film opposite to the first scratch-resistant layer 22, and the layer with a refractive index greater than 1.9 is not disposed on the outermost layer of the second scratch-resistant layer 23 in the direction opposite to the interference layer 21. Further, the layer with a refractive index greater than 1.9 may be disposed adjacent to the interference layer 21.

[0272] Figure 8 This is a schematic diagram of the structure of an optical film according to one embodiment. Figure 8 As shown, in one embodiment, the optical film 20 of this application may include a first layer 101 to a twenty-third layer 123 stacked sequentially as follows:

[0273] The first layer 101 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0274] The second layer 102 is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0275] The third layer 103 is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 25-35 nm.

[0276] The fourth layer, 104, is an aluminum-containing silicon oxynitride film. The refractive index of the fourth layer, 104, is 1.55-1.65, and the thickness of the fourth layer, 104, is 15-25 nm.

[0277] The fifth layer 105 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.66-1.75 and a thickness of 15-25 nm.

[0278] The sixth layer 106 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.76-1.85 and a thickness of 15-25 nm.

[0279] The seventh layer, 107, is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 65-75 nm.

[0280] The first layer 101 to the seventh layer 107 constitute the first scratch-resistant layer 22;

[0281] The eighth layer, 108, is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 15-20 nm.

[0282] The ninth layer 109 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 25-30 nm.

[0283] The tenth layer 110 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 150-160 nm.

[0284] The eleventh layer, 111, is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 17-22 nm.

[0285] The twelfth layer 112 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm.

[0286] The thirteenth layer 113 is an aluminum-containing silicon oxynitride film layer. The refractive index of the thirteenth layer 113 is 1.93-2.0, and the thickness of the thirteenth layer 113 is 1200-1800nm.

[0287] The fourteenth layer 114 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 12-17 nm.

[0288] The fifteenth layer 115 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 42-47 nm.

[0289] The sixteenth layer 116 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 38-43 nm.

[0290] The seventeenth layer, 117, is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 35-40 nm.

[0291] The eighteenth layer, 118, is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 35-40 nm.

[0292] The nineteenth layer, 119, is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 57-62 nm.

[0293] The twentieth layer 120 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm.

[0294] The twenty-first layer 121 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 43-49 nm.

[0295] The twenty-second layer 122 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 37-43 nm.

[0296] The twenty-third layer 123 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-17 nm.

[0297] Among them, the thirteenth layer 113 is the second scratch-resistant layer 23, and the remaining layers from the eighth layer 108 to the twenty-third layer 123, excluding the thirteenth film layer, constitute the interference layer 21;

[0298] The first scratch-resistant layer 22 is disposed on the surface of the interference layer 21, and the second scratch-resistant layer 23 is disposed between the layers of the interference layer 21.

[0299] For example, refer to Figure 8 As shown, the first layer 101 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0300] The second layer 102 is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0301] The third layer 103 is a silicon dioxide film with a refractive index of 1.46 and a thickness of 30 nm.

[0302] The fourth layer 104 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.6 and a thickness of 20 nm.

[0303] The fifth layer 105 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.7 and a thickness of 20 nm.

[0304] The sixth layer 106 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.8 and a thickness of 20 nm.

[0305] The seventh layer, 107, is a silicon nitride film with a refractive index of 1.96 and a thickness of 68.9 nm.

[0306] The eighth layer, 108, is a silicon dioxide film with a refractive index of 1.46 and a thickness of 17.8 nm.

[0307] The ninth layer 109 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 27.1 nm.

[0308] The tenth layer 110 is a silicon dioxide film with a refractive index of 1.46 and a thickness of 155.4 nm.

[0309] The eleventh layer, 111, is a silicon nitride film with a refractive index of 1.96 and a thickness of 18.7 nm.

[0310] The twelfth layer 112 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 22.7 nm.

[0311] The thirteenth layer 113 is an aluminum-containing silicon oxynitride film layer. The refractive index of the thirteenth layer 113 is 1.96, and the thickness of the thirteenth layer 113 is 1500nm.

[0312] The fourteenth layer 114 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 14.2 nm.

[0313] The fifteenth layer 115 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 44.3 nm.

[0314] The sixteenth layer 116 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 40.8 nm.

[0315] The seventeenth layer 117 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 37.9 nm.

[0316] The eighteenth layer 118 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37.9 nm.

[0317] The nineteenth layer, 119, is a silicon nitride film with a refractive index of 1.96 and a thickness of 59.5 nm.

[0318] The twentieth layer 120 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 23.2 nm.

[0319] The twenty-first layer 121 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 46.6 nm.

[0320] The twenty-second layer 122 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 39.5 nm.

[0321] The twenty-third layer 123 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 14.9 nm.

[0322] Figure 9 This is a schematic diagram of the structure of an optical film according to one embodiment. Figure 9 As shown, in one embodiment, the optical film 20 of this application may include a first layer 101 to a sixteenth layer 116 stacked sequentially as follows. The distribution of each film layer is as follows:

[0323] The first layer 101 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0324] The second layer 102 is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0325] The third layer 103 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 3-7 nm.

[0326] The fourth layer, 104, is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 40-50 nm.

[0327] The fifth layer 105 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.56-1.65 and a thickness of 12-18 nm.

[0328] The sixth layer 106 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.66-1.75 and a thickness of 12-18 nm.

[0329] The seventh layer, 107, is an aluminum-containing silicon oxynitride film. The refractive index of the seventh layer, 107, is 1.76-1.85, and the thickness of the seventh layer, 107, is 12-18 nm.

[0330] The first layer 101 to the seventh layer 107 constitute the first scratch-resistant layer 22;

[0331] The eighth layer 108 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.88-1.92 and a thickness of 1200-1800 nm; the eighth layer 108 forms the second scratch-resistant layer 23.

[0332] The ninth layer 109 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-20 nm.

[0333] The tenth layer 110 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm.

[0334] The eleventh layer, 111, is a silicon nitride film with a refractive index of 1.93-2.0 and a thickness of 42-50 nm.

[0335] The twelfth layer 112 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 22-30 nm.

[0336] The thirteenth layer 113 is an aluminum-containing silicon oxynitride film layer. The refractive index of the thirteenth layer 113 is 1.93-2.0, and the thickness of the thirteenth layer 113 is 54-62nm.

[0337] The fourteenth layer 114 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 34-40 nm.

[0338] The fifteenth layer 115 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 20-28 nm.

[0339] The sixteenth layer 116 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.4-1.5 and a thickness of 180-220 nm.

[0340] The ninth layer 109 to the sixteenth layer 116 constitute the interference layer 21. The second scratch-resistant layer 23 is disposed between the first scratch-resistant layer 22 and the interference layer 21. The seventh layer 107 of the first scratch-resistant layer 22 is in contact with the second scratch-resistant layer 23.

[0341] For example, refer to Figure 9 As shown, the first layer 101 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0342] The second layer 102 is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0343] The third layer 103 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 5 nm.

[0344] The fourth layer 104 is a silicon dioxide film with a refractive index of 1.46 and a thickness of 45 nm.

[0345] The fifth layer 105 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.6 and a thickness of 15 nm.

[0346] The sixth layer 106 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.7 and a thickness of 15 nm.

[0347] The seventh layer 107 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.8 and a thickness of 15 nm.

[0348] The eighth layer, 108, is an aluminum-containing silicon oxynitride film. The refractive index of the eighth layer, 108, is 1.9, and the thickness of the eighth layer, 108, is 1500 nm.

[0349] The ninth layer 109 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 16 nm.

[0350] The tenth layer 110 is a silicon dioxide film with a refractive index of 1.46 and a thickness of 30 nm.

[0351] The eleventh layer, 111, is a silicon nitride film with a refractive index of 1.96 and a thickness of 46 nm.

[0352] The twelfth layer 112 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 26 nm.

[0353] The thirteenth layer 113 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 57 nm.

[0354] The fourteenth layer 114 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37nm.

[0355] The fifteenth layer 115 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 24 nm.

[0356] The sixteenth layer, 116, is an aluminum-containing silicon oxynitride film. The refractive index of the sixteenth layer, 116, is 1.45, and the thickness of the sixteenth layer, 116, is 200 nm.

[0357] Figure 10 This is a schematic diagram of the structure of an optical film according to one embodiment. Figure 10 As shown, in one embodiment, the optical film 20 of this application may include a first layer 101 to a thirteenth layer 113 stacked sequentially as follows. The distribution of each film layer is as follows:

[0358] The first layer 101 is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm.

[0359] The second layer 102 is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm.

[0360] The third layer 103 is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 1-3 nm.

[0361] The fourth layer, 104, is a silicon dioxide film with a refractive index of 1.4-1.5 and a thickness of 80-100 nm.

[0362] The first layer 101 to the fourth layer 104 constitute the first scratch-resistant layer 22;

[0363] The fifth layer, 105, is a silicon oxynitride film with a refractive index of 1.48-1.52 and a thickness of 50-55 nm.

[0364] The sixth layer, 106, is a silicon oxynitride film with a refractive index of 1.63-1.68 and a thickness of 47-53 nm.

[0365] The seventh layer, 107, is a silicon oxynitride film. The refractive index of the seventh layer, 107, is 1.78-1.82, and the thickness of the seventh layer, 107, is 65-70 nm.

[0366] The eighth layer, 108, is a silicon oxynitride film. The refractive index of the eighth layer, 108, is 1.88-1.92, and the thickness of the eighth layer, 108, is 47-53.

[0367] Interference layer 21 is formed from the fifth layer 105 to the eighth layer 108;

[0368] The ninth layer 109 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.93-2.0 and a thickness of 500-700 nm.

[0369] The tenth layer, 110, is a silicon oxynitride film with a refractive index of 1.88-1.92 and a thickness of 85-95 nm.

[0370] The eleventh layer, 111, is a silicon oxynitride film. The refractive index of the eleventh layer, 111, is 1.78-1.82, and the thickness of the eleventh layer, 111, is 82-86 nm.

[0371] The twelfth layer 112 is a silicon oxynitride film layer with a refractive index of 1.62-1.68 and a thickness of 62-68 nm.

[0372] The thirteenth layer 113 is an aluminum-containing silicon oxynitride film layer. The refractive index of the thirteenth layer 113 is 1.46-1.52, and the thickness of the thirteenth layer 113 is 7-12nm.

[0373] The ninth layer (109) to the thirteenth layer (113) constitute the second scratch-resistant layer (23).

[0374] For example, such as Figure 10 As shown, the first layer 101 is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm.

[0375] The second layer 102 is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm.

[0376] The third layer 103 is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 2nm.

[0377] The fourth layer 104 is a silicon dioxide film with a refractive index of 1.46 and a thickness of 90 nm.

[0378] The fifth layer 105 is a silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 52 nm.

[0379] The sixth layer, 106, is a silicon oxynitride film with a refractive index of 1.65 and a thickness of 50 nm.

[0380] The seventh layer, 107, is a silicon oxynitride film with a refractive index of 1.8 and a thickness of 67 nm.

[0381] The eighth layer, 108, is a silicon oxynitride film. The refractive index of the eighth layer, 108, is 1.9, and the thickness of the eighth layer, 108, is 50.

[0382] The ninth layer 109 is an aluminum-containing silicon oxynitride film with a refractive index of 1.96 and a thickness of 600 nm.

[0383] The tenth layer 110 is a silicon oxynitride film layer with a refractive index of 1.9 and a thickness of 90 nm.

[0384] The eleventh layer, 111, is a silicon oxynitride film with a refractive index of 1.8 and a thickness of 84 nm.

[0385] The twelfth layer 112 is a silicon oxynitride film layer with a refractive index of 1.65 and a thickness of 65 nm.

[0386] The thirteenth layer 113 is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 10 nm.

[0387] In the optical film 20 with the above-listed structure, the outer surface of the first scratch-resistant layer 22 can be in direct contact with air, or an oleophobic layer can be provided on the surface of the first scratch-resistant layer 22 to achieve anti-fouling effect.

[0388] Figure 11 This is a schematic diagram of the structure of an optical film according to another embodiment of this application. Figure 11 As shown, in one embodiment, to reduce fingerprint residue, the optical film 20 further includes a fingerprint protection layer 24, which is disposed on the side of the first scratch-resistant layer 22 facing away from the interference layer 21. The fingerprint protection layer 24 can serve as the outermost layer of the optical film 20 to reduce fingerprint oil residue on the surface of the optical film 20 during touch. The fingerprint protection layer 24 can be a fluorinated polymer layer, such as perfluoropolyether.

[0389] It should be noted that, Figures 2 to 11 In the structure shown, the thickness of each layer is only for illustrative purposes. The ratio between the thicknesses of each layer in the actual product is not directly related to the ratio shown in the figure.

[0390] The optical film of this application embodiment can be used to form a panel. The structure of the panel can be referred to... Figure 1 As shown. This panel can be either a display panel or a back cover. When the panel is a display panel, it can be used as the display screen of a display device. When the panel is a back cover, it can be used as the back cover of a display device, serving an encapsulating function.

[0391] By optimizing the structure and composition of the optical film, better anti-reflection effect and appearance characteristics can be achieved. The optical film 20 of this application can exhibit better anti-reflection effect and color rendering effect in the bandwidth range of 400-800nm.

[0392] When preparing the optical film of the embodiments of this application, each film layer can be sequentially deposited on the surface of the transparent substrate by physical vapor deposition or chemical vapor deposition method according to the number and type of film layers designed, thereby obtaining a panel with the optical film of the embodiments of this application.

[0393] For example, plasma-enhanced magnetron sputtering can be selected in physical vapor deposition processes. Plasma-enhanced magnetron sputtering can include vacuuming, plasma treatment, ion sputtering of the target, and oxidation / nitriding treatments. The thickness of each film layer is mainly determined by the deposition time, target sputtering rate, gas flow rates (oxygen, nitrogen, argon, etc.), and the ionization rate assisted by inductively coupled plasma (ICP). Vacuuming is typically completed within 5-60 minutes, and the vacuum level is generally around 10. -3 Pa. The deposition rate is typically 8-15 nm / min. Following a stacked structure, each film layer is sequentially deposited on the glass-ceramic substrate.

[0394] For the same technical purpose, this application also provides a display device, which includes the panel 100 of this application embodiment. The display device of this application includes, but is not limited to, mobile terminal devices with display panels, such as mobile phones, computers, tablets, electronic watches, glasses, etc., and may also include display terminal devices, such as outdoor advertising screens, vehicle displays, etc.

[0395] For the same technical purpose, this application also provides an optical device, which includes the panel 100 of this application embodiment. The optical device of this application includes a camera, an electronic device with imaging function, etc.

[0396] The optical film of the embodiments of this application has been explained above. The performance of the panel of the embodiments of this application will be further explained below with reference to specific embodiments.

[0397] The glass panels of the following embodiments and comparative examples can be tested using the following methods.

[0398] Optical testing can be performed using spectrophotometers such as the CM3600 and Olympus spectrophotometers.

[0399] Hardness can be measured using nanoindentation hardness and Mohs hardness. Nanoindentation testing is a micro- and nanoscale mechanical testing technique used to measure the hardness of materials. A tiny probe is pressed into the sample surface, and the load-displacement curve is recorded to calculate the mechanical properties. The specific testing process involves applying a load at a constant rate (e.g., 0.05 mN / s) into the material, while simultaneously recording the load (P) and displacement (h) to form a loading curve.

[0400] Scratch resistance can be tested using a sand vibration test.

[0401] Example 1

[0402] This embodiment is a glass panel, including a glass substrate and an optical film disposed on the surface of the glass substrate. Its structure can be referred to... Figure 8The glass substrate is made of glass-ceramic, and its parameter characteristics are listed in Table 1. In this embodiment, the first scratch-resistant layer 22 of the optical film 20 is located on the surface of the optical film 20, and the second scratch-resistant layer 23 is composed of a high-refractive-index film layer and is located between the interference layers 21. The specific film structure and film composition of the optical film 20 are listed in Table 1.

[0403] Table 1

[0404]

[0405]

[0406] The optical performance and pressure and scratch resistance of the panel in the embodiments of this application were tested.

[0407] Figure 12 The image shows the reflectance curves of the panel in this embodiment at different incident angles. Figure 12 As shown, within the 400-680nm wavelength range, the average reflectance at an incident angle of 0° is approximately 0.4%, and the average reflectance at an incident angle of 30° is approximately 0.6%. The reflectance at an incident angle of 60° is below 5%. Through the above comparison, it can be seen that the panel of Embodiment 1 of this application, within the 400-680nm wavelength range, exhibits relatively small fluctuations in reflectance across different incident angle ranges, particularly within the 0-30° angle range, thereby improving color rendering quality.

[0408] Figure 13 This is a load-displacement test curve during the nanoindentation process. The horizontal axis represents the displacement of the indenter, which also represents the indentation depth. The vertical axis represents the applied load, which is the pressure exerted by the indenter on the surface of the test sample. Figure 13 As shown, calculations show that the glass panel of this embodiment achieves a nanoindentation hardness of 15 GPa under a 200 nm indentation. The intrinsic hardness of the microcrystalline glass is approximately 9 GPa. Therefore, the hardness of the glass panel with the optical film of this embodiment can be significantly improved.

[0409] A 750g load was applied to the sample using an indenter with a Mohs hardness of 7, and the indentation depth was measured. Figure 14 This is a schematic diagram of the process of applying pressure using a pressure head. Figure 15 This is a schematic diagram of the indentation after the pressure head has been removed. Figure 16 For along Figure 15 The test image was obtained after measuring the surface dimensions and height at point AA. Figure 16 The test equipment corresponding to the test diagram shown can be a white light interferometer.

[0410] Figure 16In the diagram, at the indentation site of the sample, the horizontal axis represents the test sites on both sides of the indentation. The vertical axis represents the surface height dimension of the sample, such as... Figure 16 As shown, when a 750g load is applied to the sample using an indenter with a Mohs hardness of 7, the depth of the indentation (as shown) Figure 16 The area indicated by the middle arrow is much smaller than the dimensional fluctuation of the sample surface after being compressed.

[0411] Example 2

[0412] This embodiment is a glass panel, including a glass substrate and an optical film disposed on the surface of the glass substrate. Its structure can be referred to... Figure 9 The glass substrate is made of glass-ceramic, and its parameters are listed in Table 2. In this embodiment, the first scratch-resistant layer 22 is located on the surface of the optical film 20, and the second scratch-resistant layer 23, consisting of a high-refractive-index film, is located between the first scratch-resistant layer 22 and the interference layer 21. The specific film structure and composition of the optical film are listed in Table 2.

[0413] Table 2

[0414]

[0415]

[0416] The optical performance and pressure and scratch resistance of the panel in this embodiment of the application are tested. The testing process can be referred to the testing process in Embodiment 1.

[0417] Figure 17 This is a transmittance test curve for the glass panel in this embodiment. Figure 17 As shown, the glass panel of this embodiment has a transmittance of over 92% in the 400-700nm wavelength range, with an average transmittance of 93%. Compared to the 90.5% transmittance of a purely transparent substrate, the transmittance of the panel in this embodiment can be increased to 93%.

[0418] Figure 18 This is a load-displacement test curve during the nanoindentation process. Calculations show that the nanoindentation hardness of the glass panel in this embodiment can reach 18 GPa.

[0419] A 1000g load was applied to the sample using an indenter with a Mohs hardness of 7, and the indentation depth was measured. Figure 19 This is a schematic diagram of the process of applying pressure using a pressure head. Figure 20 This is a schematic diagram of the indentation after the pressure head has been removed. Figure 21 For along Figure 20 The test image is obtained after measuring the surface dimensions and height in the direction of BB. Figure 21 The test equipment corresponding to the test diagram shown can be a white light interferometer. Figure 21In the diagram, at the indentation site of the sample, the horizontal axis represents the test sites on both sides of the indentation. The vertical axis represents the surface height dimension of the sample, such as... Figure 21 As shown, when a 750g load is applied to the sample using an indenter with a Mohs hardness of 7, the depth of the indentation (as shown) Figure 21 The area indicated by the middle arrow is much smaller than the dimensional fluctuation of the sample surface after being compressed. Therefore, the glass panel of this embodiment shows no visible scratches when subjected to a 1000g load at a Mohs hardness of 7.

[0420] Example 3

[0421] This embodiment is a glass panel, including a glass substrate and an optical film disposed on the surface of the glass substrate. Its structure can be referred to... Figure 10 The glass substrate is made of glass-ceramic, and its parameter characteristics are listed in Table 3. In this embodiment, the first scratch-resistant layer 22 is located on the surface of the optical film 20, and the second scratch-resistant layer 23, composed of multiple high-refractive-index and low-refractive-index layers, is located between the interference layer 21 and the glass substrate. The specific film structure and composition of the optical film are listed in Table 3.

[0422] Table 3

[0423]

[0424]

[0425] Figure 22 This is a transmittance test curve for the glass panel in this embodiment. Figure 22 As shown, the glass panel of this embodiment has a transmittance of over 93% in the 400-700nm wavelength range, with some wavelengths reaching over 94% and an average transmittance of 93.7%. Compared to the 90.5% transmittance of a purely transparent substrate, the transmittance of the panel in this embodiment can be increased to 93%.

[0426] Figure 23 This is a load-displacement test curve during the nanoindentation process. Calculations show that the nanoindentation hardness of the glass panel in this embodiment can reach 16.6 GPa.

[0427] Comparative Example 1

[0428] Comparative Example 1 is a glass panel whose structure includes microcrystalline glass and an optical film disposed on one side surface of the microcrystalline glass. The structural composition of the optical film in Comparative Example 1 is listed in Table 4.

[0429] Table 4

[0430]

[0431]

[0432] The performance parameters of the glass panel of Comparative Example 1 were tested according to the test method of Example 1. The test results are as follows.

[0433] The glass panel in Comparative Example 1 has an average transmittance of 91.5% in the 400-700 nm wavelength range, a scratch depth of approximately 30 nm under a Mohs hardness of 7 and a load of ≤750 g, and a nanoindentation hardness of approximately 14 GPa. This indicates that when the first scratch-resistant layer contains only DLC, both optical and hardness properties decrease significantly.

[0434] The above are merely specific embodiments of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. An optical film applied to a transparent substrate, characterized in that, It includes an interference layer and a first scratch-resistant layer disposed on one side surface of the interference layer; The interference layer includes a high refractive index film layer and a low refractive index film layer stacked together. The high refractive index film layer has a refractive index greater than that of the transparent substrate, and the low refractive index film layer has a refractive index less than that of the transparent substrate. The first scratch-resistant layer includes at least three layers stacked together with different refractive indices. Among the at least three layers with different refractive indices, at least one is a diamond-like carbon layer, at least one is a layer with a refractive index greater than or equal to 1.8, and at least one is a layer with a refractive index less than or equal to 1.

5. The optical film has an average reflectivity of ≤2% in the wavelength range of 400-700nm, a scratch depth of ≤10nm under a Mohs hardness of 7 and a load of ≤750g, and a nanoindentation hardness of ≥14GPa.

2. The optical film according to claim 1, characterized in that, The diamond-like carbon film is an N-doped diamond-like carbon film.

3. The optical film according to claim 2, characterized in that, The mass percentage of N in the diamond-like carbon film is 1%-20%.

4. The optical film according to any one of claims 1-3, characterized in that, The thickness of the diamond-like carbon film is less than or equal to 5 nm.

5. The optical film according to any one of claims 1-4, characterized in that, The thickness of the diamond-like carbon film is 2-4 nm.

6. The optical film according to any one of claims 1-5, characterized in that, The nanoindentation hardness of the diamond-like carbon film is 30-45 GPa, and the refractive index is 2.1-2.

3.

7. The optical film according to any one of claims 1-6, characterized in that, The total thickness of the first scratch-resistant layer is less than or equal to 130 nm.

8. The optical film according to claim 7, characterized in that, The total thickness of the first scratch-resistant layer is 60-120 nm.

9. The optical film according to any one of claims 1-8, characterized in that, In the first scratch-resistant layer, among the film layers with a refractive index greater than or equal to 1.8 and the film layers with a refractive index less than or equal to 1.5, at least one film layer has a thickness of less than or equal to 10 nm and at least one film layer has a thickness greater than 30 nm.

10. The optical film according to any one of claims 1-9, characterized in that, The remaining layers in the first scratch-resistant layer, excluding the diamond-like carbon film layer, are each independently selected from one of a high-refractive-index high-hardness material, a high-refractive-index low-hardness material, or a low-refractive-index low-hardness material. The high-refractive-index high-hardness material is a material with a refractive index greater than or equal to 1.8 and a nano-indentation hardness greater than 14 GPa. The high-refractive-index low-hardness material is a material with a refractive index greater than or equal to 1.8 and a nano-indentation hardness less than 10 GPa. The low-refractive-index low-hardness material is a material with a refractive index less than or equal to 1.5 and a nano-indentation hardness less than 10 GPa. The high-refractive-index and high-hardness material includes at least one of silicon nitride, silicon oxide nitride, aluminum-containing nitride, aluminum-containing silicon oxynitride, silicon carbide, titanium nitride, and titanium-containing nitride. The high-refractive-index, low-hardness material includes at least one of titanium oxide, niobium oxide, zirconium oxide, and tantalum oxide. The low-refractive-index, low-hardness material includes at least one of silicon oxide, aluminum oxide, boron oxide, magnesium fluoride, and aluminum-containing silicon oxynitride.

11. The optical film according to any one of claims 1-10, characterized in that, Along the direction from the first scratch-resistant layer to the interference layer, in the first scratch-resistant layer, the diamond-like carbon film layer is disposed in the first layer or the second layer of the first scratch-resistant layer.

12. The optical film according to claim 11, characterized in that, Along the direction from the first scratch-resistant layer to the interference layer, the first layer of the first scratch-resistant layer has a refractive index of less than or equal to 1.5, the diamond-like carbon film is located in the second layer of the first scratch-resistant layer, and the thickness of the film in the first layer is 2-5 nm.

13. The optical film according to claim 12, characterized in that, The first layer of the first scratch-resistant layer is a silicon dioxide film.

14. The optical film according to claim 13, characterized in that, The first scratch-resistant layer has a total of four layers, of which: The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third film layer is a silicon nitride film layer, the refractive index of the third layer is 1.93-2.0, and the thickness of the third layer is 1-3 nm; The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 80-100 nm.

15. The optical film according to claim 13, characterized in that, The first scratch-resistant layer has a total of seven layers; among which, The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm. The fourth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fourth layer is 1.55-1.65, and the thickness of the fourth layer is 15-25 nm; The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.66-1.75, and the thickness of the fifth layer is 15-25 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.76-1.85, and the thickness of the sixth layer is 15-25 nm; The seventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 65-75 nm.

16. The optical film according to claim 13, characterized in that, The first scratch-resistant layer has a total of seven layers, of which, The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 3-7 nm. The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 40-50 nm. The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.56-1.65, and the thickness of the fifth layer is 12-18 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.66-1.75, and the thickness of the sixth layer is 12-18 nm; The seventh layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.76-1.85 and a thickness of 12-18 nm.

17. The optical film according to any one of claims 1-16, characterized in that, The first scratch-resistant layer also includes a film layer with a refractive index greater than 1.5 and less than 1.8, and the thickness of each film layer with a refractive index greater than 1.5 and less than 1.8 is 10nm-50nm.

18. The optical film according to claim 17, characterized in that, The number of layers of the film with a refractive index greater than 1.5 and less than 1.8 is 1-3.

19. The optical film according to any one of claims 1-18, characterized in that, In the first scratch-resistant layer, the diamond-like carbon film layer is one layer, the number of film layers with a refractive index greater than or equal to 1.8 is 1-4 layers, and the number of film layers with a refractive index less than or equal to 1.5 is 1-4 layers.

20. The optical film according to any one of claims 1-19, characterized in that, The optical film further includes a second scratch-resistant layer, which includes at least one film layer with a refractive index greater than or equal to 1.

8. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or between the layers of the interference layer, or on the surface of the interference layer opposite to the first scratch-resistant layer. The thickness of the second scratch-resistant layer is greater than or equal to 300 nm and less than or equal to 3000 nm.

21. The optical film according to claim 20, characterized in that, The second scratch-resistant layer consists of a film layer with a refractive index greater than or equal to 1.

8. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or in the interlayer of the interference layer.

22. The optical film according to claim 20, characterized in that, The second scratch-resistant layer includes at least one film layer with a refractive index greater than or equal to 1.8 and at least one film layer with a refractive index less than or equal to 1.5, wherein the film layer with a refractive index greater than or equal to 1.8 and the film layer with a refractive index less than 1.5 are stacked, and the second scratch-resistant layer is disposed on the side surface of the interference layer opposite to the first scratch-resistant layer.

23. The optical film according to claim 22, characterized in that, In the second scratch-resistant layer, the ratio of the total thickness of the film layer with a refractive index greater than or equal to 1.8 to the total thickness of the second scratch-resistant layer is greater than or equal to 70%.

24. The optical film according to claim 22 or 23, characterized in that, The number of layers of the film with a refractive index greater than or equal to 1.8 is at least two, and the film with a refractive index greater than or equal to 1.8 contains at least two layers with different hardnesses.

25. The optical film according to any one of claims 21-24, characterized in that, In the second scratch-resistant layer, at least one of the films with a refractive index greater than or equal to 1.8 has a refractive index greater than or equal to 1.

9.

26. The optical film according to any one of claims 21-25, characterized in that, The material of the film layer with a refractive index greater than or equal to 1.8 in the second scratch-resistant layer includes at least one of silicon nitride, silicon oxide, aluminum nitride, aluminum oxide, aluminum-containing silicon oxide, diamond-like carbon, silicon carbide, titanium nitride, tantalum oxide, niobium oxide, titanium oxide, hafnium oxide, zirconium oxide, zinc sulfide, and lanthanum titanate.

27. The optical film according to any one of claims 1-26, characterized in that, The interference layer contains 3-8 high-refractive-index films and 3-8 low-refractive-index films, with each high-refractive-index film having a thickness of 5-300 nm and each low-refractive-index film having a thickness of 5-250 nm.

28. An optical film applied to a transparent substrate, characterized in that, It includes an interference layer and a first scratch-resistant layer disposed on one side surface of the interference layer; The interference layer comprises a high-refractive-index film layer and a low-refractive-index film layer stacked together; the total number of high-refractive-index and low-refractive-index film layers in the interference layer is 6-16 layers, the total thickness of the interference layer is less than or equal to 800 nm, the thickness of each high-refractive-index film layer is greater than or equal to 10 nm and less than or equal to 300 nm, the thickness of each low-refractive-index film layer is greater than or equal to 20 nm and less than or equal to 250 nm, and one of the low-refractive-index film layers has a thickness greater than or equal to 130 nm; the high-refractive-index film layer has a refractive index greater than that of the transparent substrate, and the low-refractive-index film layer has a refractive index less than that of the transparent substrate; The first scratch-resistant layer comprises at least three layers stacked together with different refractive indices. Among the at least three layers with different refractive indices, one is a diamond-like carbon (DLC) layer, at least one is a layer with a refractive index greater than or equal to 1.8, and at least one is a layer with a refractive index less than or equal to 1.

5. The number of layers with a refractive index greater than or equal to 1.8 is 1-4, and the number of layers with a refractive index less than or equal to 1.5 is 1-4. The thickness of the DLC layer is less than or equal to 5 nm. Among the layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than or equal to 1.5 in the first scratch-resistant layer, at least one layer has a thickness less than or equal to 10 nm, and at least one layer has a thickness greater than 30 nm. The remaining layers of the first scratch-resistant layer each have a thickness of 10-50 nm, and the total thickness of the first scratch-resistant layer is less than or equal to 130 nm.

29. The optical film according to claim 28, characterized in that, The optical film further includes a second scratch-resistant layer, which is composed of a film layer with a refractive index greater than or equal to 1.9, and the thickness of the second scratch-resistant layer is greater than or equal to 1000 nm and less than or equal to 3000 nm. The second scratch-resistant layer is disposed between the interference layer and the first scratch-resistant layer, or between the interference layers.

30. The optical film according to claim 28, characterized in that, The optical film further includes a second scratch-resistant layer, which comprises layers with a refractive index greater than or equal to 1.8 and layers with a refractive index less than 1.8 stacked together. The number of layers with a refractive index greater than or equal to 1.8 is 2-4, and the number of layers with a refractive index less than 1.8 is 1-3. At least one of the layers with a refractive index greater than or equal to 1.8 has a refractive index greater than 1.9, and the thickness of the layer with a refractive index greater than 1.9 is greater than or equal to 500 nm. The second scratch-resistant layer is disposed on the side of the interference film opposite to the first scratch-resistant layer, and the film layer with a refractive index greater than 1.9 is not disposed on the outermost layer of the second scratch-resistant layer in the direction opposite to the interference layer.

31. An optical film applied to a transparent substrate, characterized in that, The optical film comprises a first layer to a twenty-third layer stacked sequentially; wherein: The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm. The fourth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fourth layer is 1.55-1.65, and the thickness of the fourth layer is 15-25 nm; The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.66-1.75, and the thickness of the fifth layer is 15-25 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.76-1.85, and the thickness of the sixth layer is 15-25 nm; The seventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 65-75 nm. The first layer to the seventh layer constitute the first scratch-resistant layer; The eighth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 15-20 nm. The ninth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 25-30 nm. The tenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 150-160 nm. The eleventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 17-22 nm. The twelfth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm. The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.93-2.0, and the thickness of the thirteenth layer is 1200-1800 nm; The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 12-17 nm. The fifteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 42-47 nm. The sixteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 38-43 nm. The seventeenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 35-40 nm. The eighteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 35-40 nm. The nineteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 57-62 nm. The twentieth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 20-25 nm. The twenty-first layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 43-49 nm. The twenty-second layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 37-43 nm. The twenty-third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-17 nm. The thirteenth layer is the second scratch-resistant layer, and the remaining layers from the eighth to the twenty-third layer, excluding the thirteenth film layer, constitute the interference layer; The first scratch-resistant layer is disposed on the surface of the interference layer, and the second scratch-resistant layer is disposed between the layers of the interference layer.

32. The optical film according to claim 31, characterized in that, The first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm. The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm. The third layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 30 nm. The fourth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.6 and a thickness of 20 nm. The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.7, and the thickness of the fifth layer is 20 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.8, and the thickness of the sixth layer is 20 nm; The seventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 68.9 nm. The eighth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 17.8 nm. The ninth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 27.1 nm. The tenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 155.4 nm. The eleventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 18.7 nm. The twelfth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 22.7 nm. The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.96, and the thickness of the thirteenth layer is 1500 nm; The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 14.2 nm. The fifteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 44.3 nm. The sixteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 40.8 nm. The seventeenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 37.9 nm. The eighteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37.9 nm. The nineteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 59.5 nm. The twentieth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 23.2 nm. The 21st layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 46.6 nm. The twentieth layer is a silicon dioxide film with a refractive index of 1.46 and a thickness of 39.5 nm. The 23rd layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 14.9 nm.

33. An optical film applied to a transparent substrate, characterized in that, Including the first to sixteenth layers arranged in a stacked manner; wherein: The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 3-7 nm. The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 40-50 nm. The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.56-1.65, and the thickness of the fifth layer is 12-18 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.66-1.75, and the thickness of the sixth layer is 12-18 nm; The seventh layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the seventh layer is 1.76-1.85, and the thickness of the seventh layer is 12-18 nm; The first layer to the seventh layer constitute the first scratch-resistant layer; The eighth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.88-1.92 and a thickness of 1200-1800 nm; the eighth layer constitutes the second scratch-resistant layer. The ninth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 12-20 nm. The tenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 25-35 nm. The eleventh layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 42-50 nm. The twelfth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 22-30 nm. The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.93-2.0, and the thickness of the thirteenth layer is 54-62 nm; The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 34-40 nm. The fifteenth layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 20-28 nm. The sixteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixteenth layer is 1.4-1.5, and the thickness of the sixteenth layer is 180-220 nm; The ninth to the sixteenth layers constitute an interference layer, the second scratch-resistant layer is disposed between the first scratch-resistant layer and the interference layer, and the seventh layer of the first scratch-resistant layer is in contact with the second scratch-resistant layer.

34. The optical film according to claim 33, characterized in that, The first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm. The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm. The third layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 5 nm. The fourth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 45 nm. The fifth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the fifth layer is 1.6, and the thickness of the fifth layer is 15 nm; The sixth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the sixth layer is 1.7, and the thickness of the sixth layer is 15 nm; The seventh layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the seventh layer is 1.8, and the thickness of the seventh layer is 15 nm; The eighth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the eighth layer is 1.9, and the thickness of the eighth layer is 1500 nm; The ninth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 16 nm. The tenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 30 nm. The eleventh layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 46 nm. The twelfth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 26 nm. The thirteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 57 nm. The fourteenth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 37 nm. The fifteenth layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 24 nm. The sixteenth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.45 and a thickness of 200 nm.

35. An optical film applied to a transparent substrate, characterized in that, The optical film comprises layers one through thirteen stacked sequentially; wherein: The first layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 2-4 nm. The second layer is a diamond-like carbon film with a refractive index of 2.1-2.3 and a thickness of 2-4 nm. The third layer is a silicon nitride film layer with a refractive index of 1.93-2.0 and a thickness of 1-3 nm. The fourth layer is a silicon dioxide film layer with a refractive index of 1.4-1.5 and a thickness of 80-100 nm. The first layer to the fourth layer constitute the first scratch-resistant layer; The fifth layer is a silicon oxynitride film layer, the refractive index of the fifth layer is 1.48-1.52, and the thickness of the fifth layer is 50-55 nm; The sixth layer is a silicon oxynitride film layer, the refractive index of the sixth layer is 1.63-1.68, and the thickness of the sixth layer is 47-53 nm; The seventh layer is a silicon oxynitride film layer with a refractive index of 1.78-1.82 and a thickness of 65-70 nm. The eighth layer is a silicon oxynitride film layer, the refractive index of the eighth layer is 1.88-1.92, and the thickness of the eighth layer is 47-53. The fifth to eighth layers form an interference layer; The ninth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the ninth layer is 1.93-2.0, and the thickness of the ninth layer is 500-700 nm; The tenth layer is a silicon oxynitride film layer with a refractive index of 1.88-1.92 and a thickness of 85-95 nm. The eleventh layer is a silicon oxynitride film layer with a refractive index of 1.78-1.82 and a thickness of 82-86 nm. The twelfth layer is a silicon oxynitride film layer with a refractive index of 1.62-1.68 and a thickness of 62-68 nm. The thirteenth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the thirteenth layer is 1.46-1.52, and the thickness of the thirteenth layer is 7-12 nm; The ninth to thirteenth layers constitute the second scratch-resistant layer.

36. The optical film according to claim 35, characterized in that, The first layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 3 nm. The second layer is a diamond-like carbon film with a refractive index of 2.2 and a thickness of 3 nm. The third layer is a silicon nitride film layer with a refractive index of 1.96 and a thickness of 2 nm. The fourth layer is a silicon dioxide film layer with a refractive index of 1.46 and a thickness of 90 nm. The fifth layer is a silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 52 nm. The sixth layer is a silicon oxynitride film layer, the refractive index of the sixth layer is 1.65, and the thickness of the sixth layer is 50 nm; The seventh layer is a silicon oxynitride film layer, the refractive index of the seventh layer is 1.8, and the thickness of the seventh layer is 67 nm; The eighth layer is a silicon oxynitride film layer, the refractive index of the eighth layer is 1.9, and the thickness of the eighth layer is 50. The ninth layer is an aluminum-containing silicon oxynitride film layer, the refractive index of the ninth layer is 1.96, and the thickness of the ninth layer is 600 nm; The tenth layer is a silicon oxynitride film layer with a refractive index of 1.9 and a thickness of 90 nm. The eleventh layer is a silicon oxynitride film layer, the refractive index of the eleventh layer is 1.8, and the thickness of the eleventh layer is 84 nm; The twelfth layer is a silicon oxynitride film layer, the refractive index of the twelfth layer is 1.65, and the thickness of the twelfth layer is 65 nm; The thirteenth layer is an aluminum-containing silicon oxynitride film layer with a refractive index of 1.5 and a thickness of 10 nm.

37. The optical film according to any one of claims 1-36, characterized in that, The optical film also includes a fingerprint protection layer, which is disposed on the side surface of the first scratch-resistant layer opposite to the interference layer.

38. A panel, characterized in that, It includes a transparent substrate and an optical film as described in any one of claims 1-37 disposed on one side surface of the transparent substrate.

39. A display device, characterized in that, Includes the panel as described in claim 38.

40. An optical device, characterized in that, Includes the panel as described in claim 38.

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