Polarization pixel unit, preparation method thereof and image sensor

CN122180245APending Publication Date: 2026-06-09WUHAN CHUXING TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WUHAN CHUXING TECH CO LTD
Filing Date
2024-12-06
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

Existing image sensors cannot effectively utilize the polarization characteristics of light for imaging, especially in low-light environments where they are difficult to operate normally. Furthermore, existing methods for preparing periodic microstructures on the surface of perovskite thin films are prone to damaging other structures, making large-scale production difficult.

Method used

Periodically arranged grooves are etched on the surface of the first transport layer, and the photoactive layer is filled by photolithography or directional self-assembly to form a periodic microstructure polarization pixel unit. Polarization imaging is achieved by utilizing the excellent light absorption performance and charge separation capability of perovskite material.

Benefits of technology

This improved the imaging quality and recognition capabilities of image sensors, reduced the risk of damage during the manufacturing process, and enabled large-scale production and efficient photoelectric conversion.

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Abstract

This disclosure provides a polarization pixel unit and its fabrication method, as well as an image sensor, relating to the field of semiconductor technology. It prevents damage to other film structures within the polarization pixel unit during fabrication, improves yield, enables large-scale production, and achieves efficient photoelectric conversion, thereby improving image quality and recognition capabilities. The polarization pixel unit includes a first transport layer, a photoactive layer, and a second transport layer. A first surface of the first transport layer has multiple grooves penetrating the first surface, arranged in parallel at equal intervals. The photoactive layer covers the first surface and fills the multiple grooves. The second transport layer is disposed on the side of the photoactive layer away from the first transport layer.
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