A raw material mixing device for photoresist production and processing

Abstract

This invention discloses a raw material mixing device for photoresist production and processing. It avoids introducing contaminants and ensures that residues from the previous batch do not affect the accuracy of the next batch. Furthermore, it ensures thorough mixing and dissolution without causing breakage of the raw material molecular chains. The invention employs a mixing main pipe with a two-dimensional / three-dimensional wavy mixing and dissolution section. An upstream inlet pipe and a slurry inlet pipe respectively supply quantitative amounts of liquid raw material and solid slurry. The mixing and dissolution section uniformly distributes multiple mixing and lifting units, including dome-shaped protrusions, studs collinear with the protrusions, a reset elastic element, and a locking mechanism. During the mixing stage, the studs are locked, and the protrusions are tightly attached to the inner wall of the main pipe. During the cleaning stage, the locking mechanism is released, and the liquid flow impacts the spiral ribs, causing the protrusions to rotate and displace axially. The reset elastic element accumulates potential energy, and returns to its original position after the liquid flow stops.

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