A storage device, wafer processing system, and liquid reagent delivery method

Abstract

This disclosure discloses a storage device, a wafer processing system, and a liquid reagent delivery method. The storage device includes a storage container for storing liquid reagents. The storage container has a first end and a second end opposite to each other. The storage container has a first inlet located at the first end and a first outlet located at the second end, both of which communicate with an internal cavity of the storage container. The storage device also includes a guide plate disposed on the inner wall of the storage container. The guide plate has a guide passage extending along the direction from the first end to the second end, and the guide passage has a second inlet and a second outlet. The first inlet is also in communication with the second inlet, and the second outlet is located near the second end. Therefore, the storage device, wafer processing system, and liquid reagent delivery method of this disclosure are used to reduce the possibility of liquid reagents remaining at the bottom of the storage container and deteriorating, thereby reducing the impact on the effect of subsequent cleaning pipelines and the impact on the wafer morphology within the wafer reaction chamber.

Description

Technical Field

[0001] This disclosure relates to the field of semiconductor manufacturing technology, and more particularly to a storage device, a wafer processing system, and a liquid reagent delivery method. Background Technology

[0002] Currently, dichloroethene (DCE) can be used as a cleaning agent or reaction reagent in semiconductor manufacturing processes. Generally, an inert gas is used to bubble dichloroethene, which simultaneously acts as a carrier to transport the dichloroethene to the cleaning pipeline or reaction apparatus.

[0003] In related technologies, a quartz tube is inserted into a dichloroethylene storage tank for bubbling. However, this method can easily leave dichloroethylene liquid residue in the dichloroethylene storage tank and cause deterioration, affecting subsequent cleaning or reactions. Summary of the Invention

[0004] A first aspect of the present disclosure provides a storage device including a storage container for storing a liquid reagent, the storage container having a first end and a second end opposite to each other, the storage container having a first inlet located at the first end and a first outlet located at the second end, the first inlet and the first outlet both communicating with an internal cavity of the storage container;

[0005] A guide plate is disposed on the inner wall of the storage container. The guide plate has a guide passage extending along a direction from the first end to the second end. The guide passage has a second inlet and a second outlet. The first inlet is also in communication with the second inlet, and the second outlet is close to the second end.

[0006] In the working mode, the first inlet is used to input bubbling gas into the internal cavity, and the first outlet is used to output bubbling gas carrying the liquid reagent from the internal cavity;

[0007] In the venting mode, the first inlet is used to transport the liquid reagent remaining in the internal cavity to the region of the internal cavity near the second end through the guide passage, and the first outlet is used to output the liquid reagent remaining in the internal cavity from the internal cavity.

[0008] A second aspect of this disclosure provides a wafer processing system, including a process cavity and a <24P10671CN>

[0009] In one aspect, the storage device has a process cavity with a third inlet, and the internal cavity of the storage container included in the storage device is connected to the third inlet.

[0010] A third aspect of this disclosure provides a liquid reagent delivery method using a storage device having a storage container and a guide plate. The storage container has a first inlet and a first outlet, and the guide plate is disposed on the inner wall of the storage container. The guide plate has a guide passage extending along a direction from a first end to a second end. The liquid reagent delivery method includes:

[0011] In the working mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas can output the liquid reagent in the internal cavity through the first outlet;

[0012] In the venting mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas transports the residual liquid reagent through the guide passage to the area near the first outlet, and the bubbling gas outputs the residual liquid reagent in the internal cavity through the first outlet.

[0013] In one or more technical solutions provided in this disclosure, a storage container has a first end and a second end opposite to each other. The storage container has an inlet located at the first end and an outlet located at the second end, both of which communicate with the internal cavity of the storage container. When the second end is located above the first end, the first inlet is located below the first outlet.

[0014] Based on this, the storage device of this embodiment further includes a guide plate disposed on the inner wall of the storage container. The guide plate has a guide passage extending along the direction from the first end to the second end. The first inlet is also connected to the second inlet, and the second outlet is close to the second end. Attached Figure Description

[0015] The accompanying drawings, which are included to provide a further understanding of this disclosure and form part of this disclosure, illustrate exemplary embodiments of the present disclosure and are used to explain the disclosure, but do not constitute an undue limitation of the disclosure. In the drawings:

[0016] Figure 1 This is a schematic diagram of the structure of a DCE storage device in related technologies;

[0017] Figure 2A A first cross-sectional view of a storage device provided as an exemplary embodiment of this disclosure;

[0018] Figure 2B A second cross-sectional view of a storage device provided as an exemplary embodiment of this disclosure;

[0019] Figure 2C A partial enlarged view of point A in a first cross-sectional view of a storage device provided for an exemplary embodiment of the present disclosure;

[0020] Figure 3This is a schematic diagram of the structure of a wafer processing system according to an embodiment of the present disclosure;

[0021] Figure 4 This is a schematic flowchart of a liquid reagent delivery method according to an embodiment of the present disclosure.

[0022] Reference numerals: 110-DCE storage tank, 120-hollow quartz tube, 130-outlet, 210-storage container, <24P10671CN>

[0023] 211-First inlet, 212-First outlet, 220-Guide plate, 221-Second outlet, 230-Flow guide plate, 231-Flow guide port, 240-Control valve, 241-Bubble gas inlet, 242-Third outlet, 243-Fourth outlet, 310-Process chamber, 311-Third inlet, 320-Storage device. Detailed Implementation

[0024] To make the technical problems, technical solutions, and beneficial effects to be solved by this disclosure clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of this disclosure and are not intended to limit it.

[0025] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0026] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this disclosure, "a plurality of" means two or more, unless otherwise expressly and specifically defined. "Several" means one or more, unless otherwise expressly and specifically defined.

[0027] In the description of this disclosure, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this disclosure and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure.

[0028] In the description of this disclosure, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0029] In semiconductor manufacturing, the furnace tubes of equipment such as diffusion furnaces need to be cleaned regularly to remove residual impurities (such as metal ions). Some liquid reagents, such as dichloroethene (DCE), can be used as cleaning agents to remove metal ions and other impurities from the furnace tubes, preventing these impurities from adversely affecting the semiconductor manufacturing process. For example, bubbling gas can carry DCE vapor into the furnace tube heated to 950°C, where it reacts with oxygen entering the furnace simultaneously. Because the reaction occurs in a high-temperature environment... <24P10671CN>

[0030] The process takes place in an environment where the generated chlorine atoms are highly reactive and react with residual metal ions on the furnace tube wall to form stable chlorine metal salts. These chlorine metal salts are then carried out of the diffusion furnace by the airflow inside the furnace.

[0031] DCE can also serve as a chlorine source in the chlorine-doped oxidation process. For example, when DCE enters a high-temperature oxidation environment, it undergoes thermal decomposition, causing the chlorine-carbon bonds in the DCE molecules to break at high temperatures, releasing chlorine atoms. These chlorine atoms participate in the growth of the oxide film, reacting with silicon atoms on the silicon surface to form chlorine-containing intermediate compounds. These intermediate compounds further react with oxygen, accelerating the oxidation reaction and promoting oxide film growth. For instance, under the same temperature and oxygen flow conditions, the time required for chlorine-doped oxidation to form a silicon oxide film of a certain thickness is shorter than that of the traditional oxidation process. Therefore, it can improve the production efficiency of semiconductor manufacturing to some extent.

[0032] Figure 1 A schematic diagram of the structure of a DCE storage device in the related art is shown. For example... Figure 1 As shown, the DCE storage device in the related technology includes a storage tank 110, a hollow quartz tube 120 extending into the storage tank 110, and an outlet 130. The hollow quartz tube 120 is connected to a bubbling gas. The bubbling gas is used to bubble the DCE in the storage tank 100 and then carry the DCE out of the DCE storage tank 110 in a bubbling form to clean impurities in subsequent pipelines and to participate in the reaction in the wafer reaction chamber.

[0033] However, the inventors discovered that by inserting a quartz tube into the DCE storage tank 110 to bubble and carry the DCE out of the DCE storage tank 110 in a bubbling manner, the DCE liquid is prone to remain at the bottom of the DCE storage tank 110 and will deteriorate over time. Therefore, when emptying the DCE remaining in the DCE storage tank 110, the deteriorated DCE is easily transported to the subsequent pipelines and wafer reaction chamber, affecting the cleaning effect of the subsequent pipelines and easily introducing impurities into the wafer reaction chamber, affecting the morphology of the wafer.

[0034] To address the aforementioned issues, this disclosure provides a storage device, a wafer processing system, and a liquid reagent delivery method. The storage device utilizes bubbling gas to expel residual liquid reagents from the bottom of the storage container, reducing the likelihood of liquid reagents remaining at the bottom and deteriorating. This also minimizes contamination of subsequent pipelines and the wafer reaction chamber, reducing the impact on the effectiveness of subsequent cleaning pipelines and the morphology of the wafers within the wafer reaction chamber.

[0035] In practical applications, the storage device of this disclosure embodiment can be used in a wafer processing system. This storage device is used to deliver bubbling liquid reagents into the pipelines and process chambers of the wafer processing system. On one hand, the bubbling liquid reagents can clean the pipelines in the wafer processing system. On the other hand, the bubbling liquid reagents can enter the process chamber and participate in the growth process of the oxide film of the semiconductor device, promoting oxide film growth. For example, when the storage device is in operating mode, it can be used to deliver bubbling liquid reagents into the pipelines and process chambers of the wafer processing system. When the storage device needs to be periodically emptied <24P10671CN>

[0036] At this time, the liquid reagent remaining at the bottom of the storage container can be emptied into the pipelines and process chambers of the wafer processing system to deliver the bubbling liquid reagent.

[0037] Figure 2A A first cross-sectional view of a storage device provided for an exemplary embodiment of this disclosure. (See also...) Figure 2A As shown, the storage device of this embodiment includes a storage container 210 for storing a liquid reagent. The storage container 210 has a first end and a second end opposite to each other. The storage container 210 has a first inlet 211 located at the first end and a first outlet 212 located at the second end. Both the first inlet 211 and the first outlet 212 are in communication with the internal cavity of the storage container 210. It should be noted that during use, the second end can be positioned above the first end, that is, the position of the first inlet 211 of the storage container 210 is lower than the position of the first outlet 212 of the storage container 210. The liquid reagent may include dichloroethylene.

[0038] In practical applications, such as Figure 2A As shown, when the second end is above the first end, the first inlet 211 is below the first outlet 212. In this case, if the storage device is in operating mode, external bubbling gas can be introduced into the internal cavity of the storage container 210 through the lower first inlet 211, thereby bubbling the liquid reagent in the internal cavity. Then, the bubbling gas carrying the liquid reagent is output from the upper first outlet 212 to the subsequent cleaning pipeline or wafer process chamber. It is evident that placing the first inlet 211 below the storage container 210 allows the bubbling gas to bubble and discharge the liquid reagent at the bottom of the storage container 210, reducing the possibility of liquid reagent residue remaining at the bottom of the storage container 210. This reduces the likelihood of contaminating subsequent pipelines and the wafer reaction chamber, and minimizes the impact of residual deteriorated liquid reagent on the effectiveness of subsequent cleaning pipelines and the wafer morphology within the wafer reaction chamber.

[0039] It should be noted that the bubbling gas mentioned above may include an inert gas. When the bubbling gas includes an inert gas, the inert gas may include at least one of nitrogen (N2) and argon (Ar).

[0040] In one feasible way, such as Figure 2A As shown, the conveying device of this embodiment further includes a guide plate 220, which is disposed on the inner wall of the storage container 210. The guide plate 220 has a guide passage extending along a direction from a first end to a second end. The guide passage has a second inlet (not shown) and a second outlet 221. The first inlet 211 is also in communication with the second inlet, and the second outlet 221 is close to the second end. It should be understood that the second outlet 221 is close to the first outlet 212, and the second outlet 221 is in communication with the internal cavity of the storage container 210.

[0041] In practical applications, when the storage device is in evacuation mode, due to gravity, the residual liquid reagent in the storage container 210 will sink to the bottom of the storage container 210. At this time, external bubbling gas can be introduced into the internal cavity and the guide passage of the guide plate 220 through the first inlet 211 located at the bottom, and the bubbling gas will purify the liquid in the internal cavity and guide passage at the bottom of the storage container 210.

[0042] The reagent is bubbled, and then the bubbling gas carrying the liquid reagent is delivered through a guide passage to the area near the second port of the internal cavity, thereby outputting the liquid reagent remaining at the bottom of the storage container 210 from the first outlet 212 located above. Therefore, the bubbling gas entering from below can be used to simultaneously evacuate the liquid reagent remaining at the bottom of the storage container 210 through the internal cavity and the guide passage, further reducing the possibility of liquid reagent residue in the storage container. At the same time, it is less likely to contaminate subsequent pipelines and the wafer reaction chamber, further reducing the impact of residual liquid reagent deterioration and continued discharge on the effectiveness of subsequent cleaning pipelines and the impact on the wafer morphology within the wafer reaction chamber.

[0043] In one example, such as Figure 2A As shown, the internal cavity of this embodiment includes an inlet region and an outlet region. The radial dimension of the inlet region gradually decreases along the direction near the first end of the storage container 210, and the radial dimension of the outlet region gradually decreases along the direction near the second end of the storage container 210.

[0044] It should be noted that the aforementioned inlet region can be located below the outlet region, meaning the first inlet 211 is lower than the first outlet 212. Since the radial dimension of the inlet region gradually decreases along the direction near the first end of the storage container 210, and the radial dimension of the outlet region gradually decreases along the direction near the second end of the storage container 210, the walls of both the inlet and outlet regions are inclined walls. In this case, the portion with the smallest radial dimension at the first end can be designated as the first inlet 211, and the portion with the smallest radial dimension at the second end can be designated as the first outlet 212.

[0045] In practical applications, the liquid reagent in the aforementioned inlet area can accumulate at the part with the smallest radial dimension at the first end (i.e., the first inlet 211) under the action of gravity. Therefore, compared with other shapes of storage containers 210, such as cuboid storage containers 210, when a small amount of liquid reagent remains in the storage container 210, the bottom area of ​​the cuboid storage container 210 is larger, resulting in a shallower depth of the liquid reagent remaining at the bottom, making it less likely to bubble. In this embodiment of the present disclosure, the first inlet 211 of the storage container 210 is the part with the smallest radial dimension at the first end. Therefore, when there is residual liquid reagent in the storage container 210, the residual liquid reagent of the same volume will be at a higher depth at the first inlet 211, making it easier to bubble. Thus, it is easy to use bubbling gas to bubble the residual liquid reagent gathered at the first inlet 211 and discharge it from the upper outlet area, which greatly reduces the residue of liquid reagent in the storage container 210, making it less likely to contaminate the subsequent pipelines and wafer reaction chamber. It also reduces the impact of residual liquid reagent deteriorating and continuing to be discharged on the effect of subsequent cleaning pipelines and the impact on the wafer morphology in the wafer reaction chamber.

[0046] Based on this, when bubbling gas is bubbled into the storage container 210, the rising action of the gas can transport the bubbling gas carrying the liquid reagent to the outlet area. At this time, compared to other shapes of storage containers 210, such as cuboid storage containers 210, the cuboid storage container 210 has a larger top area, resulting in a slower accumulation rate of the bubbling gas carrying the liquid reagent at the first outlet 212 at the top. <24P10671CN>

[0047] This results in a slower rate at which the bubbling gas carrying the liquid reagent exits the storage container 210. In this embodiment, the first outlet 212 of the storage container 210 is the part with the smallest radial dimension at the second end. Therefore, the inclined wall of the outlet region has a collecting function, which can collect the bubbling gas carrying the liquid reagent at the part with the smallest radial dimension at the second end. This allows the bubbling gas carrying the liquid reagent to exit the storage container 210 at a faster rate, thereby increasing the flow rate of the bubbling gas carrying the liquid reagent output from the first outlet 212 into subsequent pipelines and wafer process chambers, improving the efficiency of pipeline cleaning and the rate of wafer reaction.

[0048] It is understood that the shapes of the aforementioned inlet and outlet regions can include cones or other feasible shapes. If the inlet and outlet regions are cones, then the first inlet 211 and the first outlet 212 can be located at the apex of the cone. Setting the inlet and outlet regions as cones results in a relatively simple structure without many complex corner structures. Compared to cuboid or other angular storage tanks where liquid tends to remain in the corners, this effectively reduces the residue of liquid reagents on the inner wall of the storage container 210. The apex of the cone, serving as the inlet and outlet for bubbling gas, not only allows the residual liquid reagent to reach a higher depth at the first inlet 211, making bubbling easier, but also allows the bubbling gas carrying the liquid reagent to be collected at the first outlet 212, resulting in a faster discharge rate from the storage container 210.

[0049] In one example, the storage container 210 of this disclosure embodiment further includes a flow guiding region located between the inlet region and the outlet region. The flow guiding region can be a section of equal diameter, and the shape of the flow guiding region can include a columnar shape. The columnar flow guiding region can also reduce the possibility of liquid reagent residues remaining on the inner wall of the internal cavity.

[0050] In practical applications, when bubbling gas is bubbled into the storage container 210, the bubbling gas can be input from the inlet area of ​​the storage container 210. The bubbling gas carries the liquid reagent through the above-mentioned guide area and then enters the outlet area, and is then transported to the subsequent pipeline and wafer process chamber through the first outlet 212.

[0051] For example, when the inlet region and outlet region are cone-shaped, the angle between the side surface of the cone in the inlet region and the top surface of the guide region is an acute angle. For example, the angle between the side surface of the cone in the inlet region and the bottom surface of the guide region is 10° to 80°, preferably 30° to 50°, and more preferably 30°. The angle between the side surface of the cone in the outlet region and the top surface of the guide region is also an acute angle. For example, the angle between the side surface of the cone in the outlet region and the top surface of the guide region is 10° to 80°, preferably 30° to 50°, and more preferably 30°.

[0052] <24P10671CN>

[0053] For example, in this embodiment of the present disclosure, the highest liquid level of the liquid reagent can be the top surface of the guiding region. In this case, the outlet region can provide sufficient space for the bubbling gas carrying the liquid reagent to facilitate output from the first outlet 212.

[0054] In one alternative approach, such as Figure 2A As shown, the exit of the guide path in this embodiment is located in the exit area.

[0055] In practical applications, when the storage device is in evacuation mode, external bubbling gas can be introduced into the guide passage through the inlet to bubble the residual liquid reagent in the guide passage. The bubbling gas carrying the liquid reagent is then conveyed to the outlet area, allowing the residual liquid reagent in the storage container 210 to be discharged from the first outlet located in the outlet area. Therefore, the residual liquid reagent in the storage container 210 can be evacuated through the guide passage, further reducing the possibility of residual liquid reagent in the storage container 210. This also further reduces the impact of continued discharge of deteriorated residual liquid reagent on the effectiveness of subsequent cleaning pipelines and on the wafer morphology within the wafer reaction chamber.

[0056] For example, if the shape of the aforementioned outlet area is a cone, then the outlet of the guide passage is located in the region near the apex within the cone. Therefore, when the storage device is in venting mode, the bubbling gas carrying liquid reagents that needs to be discharged from the guide passage can be transported to the region near the apex of the outlet area, i.e., the first outlet 212, thereby quickly outputting the bubbling gas carrying liquid reagents.

[0057] In one feasible way, such as Figure 2A As shown, the storage device of this embodiment further includes a plurality of guide plates 230 located in the internal cavity, and the plurality of guide plates 230 are spaced apart on the guide plate 220 along the direction from the first end to the second end.

[0058] In practical applications, when external bubbling gas is introduced into the internal cavity through the first inlet 211, the spaced-apart guide plates 230 prevent the gas from directly passing through the internal cavity, altering the flow path of the bubbling gas. The spaced-apart guide plates 230 form a longer flow channel, increasing the distance the bubbling gas travels within the internal cavity, thus allowing for more thorough contact between the bubbling gas and the liquid reagent. Therefore, the liquid reagent content in the bubbling gas is more uniformly distributed, making process control easier.

[0059] In one example, in this embodiment of the present disclosure, the distance between the end of each guide plate 230 near the inner wall of the storage container 210 and the first end is equal to a first distance h1, and the distance between the end of the guide plate 230 away from the inner wall of the storage container 210 and the first end is equal to a second distance h2, wherein the first distance h1 is less than the second distance h2. For example, the end of the guide plate 230 near the inner wall of the storage container 210 can be defined as the first end of the guide plate 230, and the end of the guide plate 230 away from the inner wall of the storage container 210 can be defined as the second end of the guide plate 230.

[0060] <24P10671CN>

[0061] In practical applications, when the first distance h1 is less than the second distance h2, and the second end of each guide plate 230 is higher than the first end in the vertical direction, it indicates that each guide plate 230 is inclined upwards on the guide plate 220. On the one hand, this allows the flow path of the bubbling gas to be longer. On the other hand, since the bubbling gas moves upwards, the inclined upwards guide plate 230 can guide the movement direction of the bubbling gas upwards, thus facilitating the upward movement of the bubbling gas.

[0062] In one example, Figure 2B Another cross-sectional view of an embodiment of this disclosure is shown. (See figure) Figure 2B As shown, each guide plate 230 in this embodiment of the present disclosure has multiple flow ports 231 at one end near the guide plate 220, and each flow port 231 communicates with the internal cavity. Therefore, when there is liquid reagent residue on the guide plate 230, the residual liquid reagent can flow from the second end of the guide plate 230 to the first end of the guide plate 230 under the action of gravity, thereby collecting the residual liquid reagent on the guide plate 230 to the first end of the guide plate 230, and then flowing into the bottom of the internal cavity from the multiple flow ports 231 at the first end under the action of gravity. Therefore, the residual liquid reagent at the bottom can be bubbled and then output in either the working mode or the venting mode.

[0063] In another example, the sidewall of the guide plate 220 of this embodiment has a liquid collection port communicating with the guide passage, and each guide port 231 is communicating with the liquid collection port.

[0064] In practical applications, when there is residual liquid reagent on the guide plate 230, the residual liquid reagent can flow from the second end of the guide plate 230 to the first end under the action of gravity. This allows the residual liquid reagent to be collected at the first end of the guide plate 230 and enter the collection port through the multiple guide ports 231 of the guide plate 230, thus allowing the residual liquid reagent to enter the guiding passage. When the storage device is in venting mode, bubbling gas can be connected to the inlet of the guiding passage to bubble the residual liquid reagent in the guiding passage and transport it to the outlet area, thereby reducing the possibility of liquid reagent residue on the guide plate 230.

[0065] The aforementioned flow guide 231 can be a notch opened at one end of the flow guide plate 230 near the guide plate 220, and the liquid collection port is located in the area enclosed by the notch and the flow guide plate 230. Of course, the liquid collection port can also be located in the area enclosed by the notch and the flow guide plate 230.

[0066] In one feasible way Figure 2C A partial enlarged view of point A in a first cross-sectional view of a storage device provided for an exemplary embodiment of this disclosure. (See image below.) Figure 2A and Figure 2C As shown, the storage device in this embodiment further includes a control valve 240 communicating with the first inlet 211. The control valve 240 has a bubbling gas inlet 241, a third outlet 242 communicating with the second inlet, and a fourth outlet 243 communicating with the internal cavity. It should be understood that the control valve 240 can be a multi-port valve, and there can be multiple third outlets 242 communicating with the second inlet. The guiding passage can include multiple sub-passages, and each third outlet 242 is respectively connected to a corresponding sub-passage.

[0067] The passage is connected. The multi-way valve may include a three-way valve. When the multi-way valve is a three-way valve, the three-way valve has two third outlets 242. At this time, the guide passage can be set as two sub-passages, and the two third outlets 242 are respectively connected to the two sub-passages.

[0068] In practical applications, when the storage device is in operating mode, external bubbling gas can be introduced into the internal cavity of the storage container 210 through the bubbling gas inlet of the aforementioned valve, thereby bubbling the liquid reagent in the internal cavity. The bubbling gas carrying the liquid reagent is then output from the first outlet 212 to subsequent cleaning pipelines or wafer process chambers. When the storage device is in venting mode, external bubbling gas can be introduced into the internal cavity through the bubbling gas inlet of the aforementioned valve and into the guide passage of the guide plate 220 through the third outlet 242 of the aforementioned valve, thereby bubbling the liquid reagent in the internal cavity and the guide passage. The bubbling gas carrying the liquid reagent in the guide passage is then conveyed to the outlet 212 for output. Therefore, the valve can flexibly adjust the bubbling gas entering the target channel when the storage device is in different modes, meeting the bubbling requirements of different modes.

[0069] This disclosure also provides a wafer processing system. Figure 3 A schematic diagram of the structure of a wafer processing system according to an embodiment of this disclosure is shown. Figure 3 As shown, the wafer processing system includes a process chamber 310 and a storage device 320 according to an embodiment of this disclosure. The process chamber has a third inlet 311, and the internal cavity of the storage container included in the storage device 320 is connected to the third inlet 311 of the process chamber through a first outlet. The process chamber 310 can be a furnace tube process chamber, which can be applied to various possible semiconductor processes such as diffusion, deposition, and oxidation.

[0070] In practical applications, the storage device 320 of this embodiment can be used to deliver liquid reagents such as dichloroethylene into the process chamber 310 in a bubbling manner, thereby accelerating the oxidation reaction in the process chamber 310 and promoting the growth of the oxide film.

[0071] In one feasible embodiment, this disclosure also provides a method for delivering liquid reagents. Figure 4 A schematic flowchart of a liquid reagent delivery method according to an embodiment of this disclosure is shown. Figure 4 As shown, the liquid reagent delivery method of this disclosure includes:

[0072] Step 401: In the working mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas outputs the liquid reagent in the internal cavity through the outlet of the storage container.

[0073] In practical applications, if the storage device is in operating mode, external bubbling gas can be introduced into the internal cavity of the storage container through the first inlet located at the bottom, thereby bubbling the liquid reagent in the internal cavity. The bubbling gas carrying the liquid reagent is then output from the first outlet located at the top to subsequent cleaning pipelines or wafer process chambers. Therefore, placing the first inlet of the storage container at the storage <24P10671CN>

[0074] Below the container, bubbling gas can be used to bubble and discharge the liquid reagent at the bottom of the storage container, reducing the possibility of liquid reagent residue at the bottom of the storage container. This makes it less likely to contaminate subsequent pipelines and wafer reaction chambers, and reduces the impact of residual liquid reagent deteriorating and continuing to be discharged on the effect of subsequent cleaning pipelines and on the wafer morphology in the wafer reaction chamber.

[0075] Step 402: In the venting mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas transports the residual liquid reagent through the guide passage to the area near the first outlet, and the bubbling gas outputs the residual liquid reagent in the internal cavity through the first outlet.

[0076] In practical applications, when the storage device is in evacuation mode, residual liquid reagents in the storage container will sink to the bottom due to gravity. At this time, external bubbling gas can be introduced into the internal cavity and the guide passage of the guide plate through the first inlet located at the bottom. The bubbling gas will bubble the residual liquid reagents at the bottom of the internal cavity, and then the bubbling gas carrying the liquid reagents will be transported through the guide passage to the area near the second port of the internal cavity, thereby outputting the residual liquid reagents at the bottom of the storage container from the first outlet located at the top. Therefore, the bubbling gas entering from the bottom can be used to simultaneously evacuate the residual liquid reagents at the bottom of the storage container through the internal cavity and the guide passage, further reducing the possibility of residual liquid reagents at the bottom of the storage container. At the same time, it further reduces the impact of residual liquid reagents deteriorating and continuing to be discharged, which would affect the effect on subsequent cleaning pipelines and the wafer morphology in the wafer reaction chamber.

[0077] In one possible implementation, the liquid reagent delivery method of this disclosure further includes: first, in venting mode, the liquid reagent remaining on the guide plate enters the guide passage through the liquid collection port of the guide plate. Second, the bubbling gas also carries the liquid reagent remaining on the guide plate to a region near the outlet of the storage container, so that the bubbling gas carries the liquid reagent remaining on the guide plate out of the outlet of the storage container.

[0078] In practical applications, when the storage device is in evacuation mode, external bubbling gas can be introduced into the guide passage through the second inlet to bubble the residual liquid reagent in the guide passage. The bubbling gas carrying the liquid reagent is then conveyed to the outlet area, thus expelling the residual liquid reagent from the storage container through the outlet. Therefore, the residual liquid reagent in the storage container can be evacuated through the guide passage, further reducing the possibility of residual liquid reagent in the storage container. This also further reduces the impact of continued discharge of deteriorated residual liquid reagent on the effectiveness of subsequent cleaning pipelines and on the wafer morphology within the wafer reaction chamber.

[0079] In summary, the storage device, wafer processing system, and liquid reagent delivery method of this disclosure can utilize bubbling gas to bubble the liquid reagent remaining at the bottom of the storage container and then release it from the storage container.

[0080] Top discharge reduces the possibility of liquid reagents remaining at the bottom of the storage container and deteriorating, making it less likely to contaminate subsequent pipelines and wafer reaction chambers, thus reducing the impact on the effectiveness of subsequent cleaning pipelines and the wafer morphology within the wafer reaction chamber.

[0081] The above description is merely a specific embodiment of the present invention. Obviously, various modifications and combinations can be made without departing from the spirit and scope of the present invention. Accordingly, this specification and accompanying drawings are merely exemplary descriptions of the invention as defined by the appended claims, and are considered to cover any and all modifications, variations, combinations, or equivalents within the scope of the present invention. Clearly, those skilled in the art can make various alterations and modifications to the present invention without departing from its spirit and scope. Thus, if these modifications and variations of the present invention fall within the scope of the claims and their equivalents, the intent of the present invention includes these modifications and variations. Any changes or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in the present invention should be included within the protection scope of the present invention. Therefore, the protection scope of the present invention should be determined by the scope of the claims.

[0082] The embodiments of this disclosure have been described above. However, these embodiments are for illustrative purposes only and are not intended to limit the scope of this disclosure. The scope of this disclosure is defined by the appended claims and their equivalents. Various substitutions and modifications can be made by those skilled in the art without departing from the scope of this disclosure, and all such substitutions and modifications should fall within the scope of this disclosure.

Claims

1. A storage device, characterized in that, include: A storage container for storing liquid reagents, the storage container having a first end and a second end opposite to each other, the storage container having a first inlet located at the first end and a first outlet located at the second end, the first inlet and the first outlet both communicating with the internal cavity of the storage container; A guide plate is disposed on the inner wall of the storage container. The guide plate has a guide passage extending along a direction from the first end to the second end. The guide passage has a second inlet and a second outlet. The first inlet is also in communication with the second inlet, and the second outlet is close to the second end. In the working mode, the first inlet is used to input bubbling gas into the internal cavity, and the first outlet is used to output bubbling gas carrying the liquid reagent from the internal cavity; In the venting mode, the first inlet is used to transport the liquid reagent remaining in the internal cavity to the region of the internal cavity near the second end through the guide passage, and the first outlet is used to output the liquid reagent remaining in the internal cavity from the internal cavity.

2. The storage device according to claim 1, characterized in that, The internal cavity includes: The inlet region, the radial dimension of which gradually decreases along the direction approaching the first end; and The outlet region has a radial dimension that gradually decreases along the direction closer to the second end.

3. The storage device according to claim 2, characterized in that, The second exit is located in the exit area.

4. The storage device according to claim 1, characterized in that, The storage device further includes a plurality of guide plates located in the internal cavity, the plurality of guide plates being spaced apart on the guide plate along the direction from the first end to the second end.

5. The storage device according to claim 4, characterized in that, The distance between the end of each guide plate near the inner wall of the storage container and the first end is equal to a first distance, and the distance between the end of each guide plate away from the inner wall of the storage container and the first end is equal to a second distance, wherein the first distance is less than the second distance.

6. The storage device according to claim 4, characterized in that, Each of the flow guide plates has multiple flow guide ports at one end near the guide plate, and each flow guide port is connected to the internal cavity.

7. The storage device according to claim 6, characterized in that, The sidewall of the guide plate has a liquid collection port that communicates with the guide passage, and each of the guide ports is connected to the liquid collection port.

8. The storage device according to any one of claims 1 to 7, characterized in that, The storage device further includes a flow valve communicating with the inlet of the storage container, the flow valve having a bubbling gas inlet, a third outlet communicating with the second inlet, and a fourth outlet communicating with the internal cavity.

9. A wafer processing system, characterized in that, The device includes a process cavity and a storage device according to any one of claims 1 to 7, wherein the process cavity has a third inlet, and the internal cavity of the storage container included in the storage device is in communication with the third inlet.

10. A method for delivering liquid reagents, characterized in that, A storage device having a storage container and a guide plate, the storage container having a first inlet and a first outlet, the guide plate being disposed on the inner wall of the storage container, the guide plate having a guiding passage extending along a direction from a first end to a second end, the liquid reagent delivery method comprising: In the working mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas can output the liquid reagent in the internal cavity through the first outlet; In the venting mode, bubbling gas is introduced into the internal cavity through the first inlet, so that the bubbling gas transports the residual liquid reagent through the guide passage to the area near the first outlet, and the bubbling gas outputs the residual liquid reagent in the internal cavity through the first outlet.

11. The liquid reagent delivery method according to claim 10, characterized in that, The storage device further includes a plurality of guide plates disposed on the inner wall of the storage container, each guide plate having a plurality of guide ports at one end near the guide plate, and the side wall of the guide plate having a liquid collection port communicating with the guide passage, each guide port communicating with the liquid collection port, and the liquid reagent delivery method further includes: In the draining mode, the liquid reagent remaining on the guide plate enters the guide passage through the liquid collection port on the guide plate; The bubbling gas also carries the liquid reagent remaining on the guide plate to a region near the first outlet, so that the bubbling gas carrying the liquid reagent remaining on the guide plate is output from the first outlet.

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