Inner circle polishing device

By designing the positioning mechanism for positioning slide rails and rotary bearings in the inner circle polishing device, the problems of displacement and safety hazards of long cylindrical workpieces during the polishing process are solved, and high-precision polishing and wide adaptability are achieved.

CN222680571UActive Publication Date: 2025-03-28WEIHAI HAICHAO MASCH CO LTD
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Patent Information

Application Number
CN202421407889.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-19
Publication Date
2025-03-28
Estimated Expiration
2034-06-19

AI Technical Summary

Technical Problem

When the existing inner circle polishing device handles long-size cylindrical workpieces, it is easy to cause the workpiece to be displaced in the axial direction, the polishing quality is uneven, and there are safety hazards; at the same time, the pressing roller mechanism increases the equipment height and complex installation and arrangement.

Method used

An inner circle polishing device is designed, and a polishing mechanism, a rotary support mechanism and a positioning mechanism are provided with an organic frame. The positioning mechanism includes a positioning slide rail, a positioning slide, a positioning rod and a positioning rotary bearing. By adjusting the position of the positioning slide, the positioning rod and the rotary bearing are ensured to stably contact the workpiece and avoid displacement.

Benefits of technology

It realizes precise positioning of the cylindrical workpiece during rotation, improves polishing accuracy, avoids safety hazards of workpiece drop, and adapts to the treatment of workpieces of different sizes, expands the application range.

✦ Generated by Eureka AI based on patent content.
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Abstract

The utility model relates to the technical field of machine manufacturing and polishing machines, in particular to an inner circle polishing device which is provided with a rack, the rack is provided with a polishing mechanism, a rotary supporting mechanism and a positioning mechanism, the positioning mechanism comprises a positioning sliding rail, the positioning sliding rail is provided with two positioning sliding blocks, the positioning sliding blocks are provided with positioning rods, and the positioning rods are connected with the polishing mechanism. The positioning rods are provided with positioning rotating bearings, the positioning sliding blocks can move along the positioning sliding rails and are locked on the positioning sliding rails, the two positioning rods are located at the two ends of the cylindrical workpiece respectively and are locked by adjusting the positions of the positioning sliding blocks on the positioning sliding rails, and the cylindrical workpiece can be positioned through the positioning rods and the positioning rotating bearings. By means of the structure, accurate positioning of the cylindrical workpiece in the rotating process is guaranteed, the cylindrical workpiece is prevented from moving in the axial direction, the polishing precision is improved, and potential safety hazards caused by the fact that the cylindrical workpiece falls off from the rotating supporting mechanism are effectively prevented.
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