Graphite disc cleaning device for improving appearance of epitaxial wafer

Abstract

The utility model discloses a graphite disc cleaning device for improving the appearance of an epitaxial wafer, which belongs to the technical field of semiconductors, and can completely clean particulate matters which are attached to the surface of a graphite disc and are not easy to blow off through the blowing of high-pressure nitrogen and the cleaning of a brush rotating at a high speed, reduce the particle pollution of an epitaxial layer and improve the appearance yield. The device mainly comprises a machine table, a table plate is arranged on the machine table, a fixing frame is arranged on the machine table, a brush motor is arranged on the fixing frame, an output shaft of the brush motor is connected with a brush frame, a plurality of brush heads are arranged on the brush frame, the brush heads are located above the table plate, a dust cover is arranged in the area above the machine table, a nitrogen pipe is inserted into the dust cover, and a jet head is arranged at the end of the nitrogen pipe. The jet head is positioned above the center of the bedplate; a plurality of negative pressure exhaust holes are formed in a platen of the machine table, an exhaust cavity is formed below the platen, the negative pressure exhaust holes are communicated with the exhaust cavity, and the exhaust cavity is connected with an exhaust pipe. The graphite disc cleaning device is mainly used for cleaning graphite discs.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and more specifically, to a graphite disk cleaning device for improving the appearance of epitaxial wafers. Background Technology

[0002] LED chips are light-emitting semiconductor electronic components widely used in lighting and other fields. LED epitaxial wafers are solid-state light sources, light-emitting devices made using semiconductor PN junctions. When a forward current is applied, electrons and holes in the semiconductor recombine, releasing energy as photons or partially as photons. LED epitaxial wafer lighting has significant advantages such as high efficiency, energy saving, environmental friendliness, and long lifespan, and has been widely used in streetlights, displays, indoor lighting, and automotive lighting, among other applications.

[0003] The cleanliness of the graphite disk directly determines the crystal quality and doping uniformity of the epitaxial layer, which is a core guarantee for the optoelectronic performance of LED chips. By optimizing the cleaning process, material modification, and online monitoring, the risk of contamination can be reduced to a controllable range, providing a technological foundation for high-brightness, long-life LED products. Currently, graphite disks in epitaxial plants are generally cleaned at high temperatures using vacuum high-temperature ovens, which involves prolonged high-temperature baking, resulting in low cleaning efficiency and high costs. Utility Model Content

[0004] The purpose of this invention is to provide a graphite disk cleaning device for improving the appearance of epitaxial wafers. It can completely clean particles that are difficult to be blown off from the surface of the graphite disk by purging with high-pressure nitrogen gas and cleaning with a high-speed rotating brush, thereby reducing particulate contamination of the epitaxial layer and improving the appearance yield.

[0005] This utility model is achieved through the following technical solution:

[0006] A graphite disk cleaning device for improving the appearance of epitaxial wafers includes a machine base with a platform. A fixed frame is mounted on the machine base, and a brush motor is mounted on the fixed frame. The output shaft of the brush motor is connected to a brush holder. Several brush heads are mounted on the brush holder and are located above the platform. A dust cover is provided above the machine base, placing the platform, graphite disk, and brush heads in a semi-enclosed space. The dust cover has a discharge port and a nitrogen pipe inserted into it. An air jet nozzle is located at the end of the nitrogen pipe and is positioned above the center of the platform. Several negative pressure exhaust holes are provided on the platform, and an exhaust cavity is formed below the platform. The negative pressure exhaust holes communicate with the exhaust cavity, which is connected to an exhaust pipe.

[0007] Furthermore, the brush head is a replaceable brush head, and the replaceable brush head is equipped with bristles.

[0008] Furthermore, the jet nozzle has a cross-shaped outlet to accelerate the flow rate of nitrogen gas.

[0009] Compared with the prior art, the beneficial effects of this utility model are:

[0010] 1. By purging with high-pressure nitrogen and cleaning with a high-speed rotating brush, particles that are difficult to be blown off from the surface of the graphite disk can be completely cleaned, reducing particulate contamination of the epitaxial layer and improving the appearance yield.

[0011] 2. After cleaning, the graphite disk surface and the inside of the pokect are smoother, which can reduce phenomena such as epitaxial wafer wavelength abnormalities caused by uneven graphite disk. Attached Figure Description

[0012] Figure 1 This is a structural schematic diagram of the main view of this utility model;

[0013] Figure 2 This is a structural schematic diagram of the side view of this utility model;

[0014] Figure 3 This is a schematic diagram of the jet hole structure of the jet head of this utility model.

[0015] In the diagram: 1. Fixture; 2. Brush motor; 3. Replaceable brush head; 4. Brush; 5. Graphite disc; 6. Exhaust pipe; 7. Negative pressure exhaust port; 8. Nitrogen pipe; 9. Jet nozzle; 10. Dust cover; 11. Table. Detailed Implementation

[0016] The present invention will be further described below with reference to the accompanying drawings.

[0017] like Figure 1 – Figure 3 As shown in Embodiment 1, a graphite disk cleaning device for improving the appearance of epitaxial wafers includes a machine base with a platform 11 on the machine base. A fixed frame 1 is provided on the machine base, and a brush motor 2 is provided on the fixed frame 1. The output shaft of the brush motor 2 is connected to a brush frame. The brush frame is provided with several brush heads, which are located above the platform 11. A dust cover 10 is provided in the upper area of ​​the machine base, so that the platform 11, graphite disk 5, brush heads, etc. are in a semi-enclosed space. A material discharge port is provided on the dust cover 10, and a nitrogen pipe 8 is inserted into the dust cover 10. The end of the nitrogen pipe 8 is provided with a jet nozzle 9, which is located above the center of the platform 11. Several negative pressure exhaust holes 7 are provided on the platform 11 of the machine base, and an exhaust cavity is formed below the platform 11. The several negative pressure exhaust holes 7 are connected to the exhaust cavity, and the exhaust cavity is connected to an exhaust pipe 6.

[0018] Example 2: A graphite disk cleaning device for improving the appearance of epitaxial wafers, wherein the brush head is a replaceable brush head 3, and the replaceable brush head 3 is provided with a bristle brush 4; the jet nozzle 9 has a cross-shaped air outlet to accelerate the flow rate of nitrogen gas and blow away particulate matter on the surface of the graphite disk, and the rest is the same as in Example 1.

[0019] The graphite disc 5 to be installed is placed in the center of the table 11, forming a semi-enclosed space inside the dust cover 10. High-purity nitrogen is introduced from the top through the nitrogen pipe 8 as a cleaning gas. The brush motor 2 drives the brush head to clean the graphite disc 5. The exhaust cavity and exhaust pipe 6 form a negative pressure to remove particulate matter from the device in time, so as to keep the space inside the device and the graphite disc 5 clean.

[0020] Before placing the baked graphite disk 5 at the center of the table plate 11 to grow the epitaxial layer, the present invention adds a structure to clean the particles that are difficult to blow off the surface of the graphite disk, thereby reducing the impact of particles on the growth of the epitaxial layer and improving the appearance of the epitaxial wafer.

Claims

1. A graphite disk cleaning device for improving the appearance of epitaxial wafers, comprising a machine base, wherein a platform (11) is provided on the machine base, characterized in that: The machine platform is provided with a fixed frame (1), and a brush motor (2) is provided on the fixed frame (1). The output shaft of the brush motor (2) is connected to the brush frame. The brush frame is provided with several brush heads. The brush heads are located above the platform (11). A dust cover (10) is provided in the upper area of ​​the machine platform. A nitrogen pipe (8) is inserted into the dust cover (10). A jet nozzle (9) is provided at the end of the nitrogen pipe (8). The jet nozzle (9) is located above the center of the platform (11). A number of negative pressure exhaust holes (7) are provided on the platform (11) of the machine platform. An exhaust cavity is formed below the platform (11). The number of negative pressure exhaust holes (7) are connected to the exhaust cavity. The exhaust cavity is connected to the exhaust pipe (6).

2. The graphite disk cleaning device for improving the appearance of epitaxial wafers according to claim 1, characterized in that: The brush head is a replaceable brush head (3), and the replaceable brush head (3) is provided with a bristle brush (4).

3. The graphite disk cleaning device for improving the appearance of epitaxial wafers according to claim 1, characterized in that: The jet nozzle (9) has a cross-shaped air outlet.

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