An apparatus for continuous deposition of carbon films on metal surfaces by capacitively coupled plasma
By using capacitively coupled plasma technology to continuously deposit carbon films on metal surfaces, the problems of low deposition efficiency, high cost, and poor bonding strength in existing technologies have been solved. This has enabled efficient and low-cost carbon film deposition, improved the performance of current collectors, and made it suitable for chemical energy storage devices such as secondary batteries and supercapacitors.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- TENGXIAN TOPTECH ELECTRONIC CO LTD
- Filing Date
- 2025-05-29
- Publication Date
- 2026-06-16
AI Technical Summary
Existing methods for depositing carbon films on current collector surfaces suffer from problems such as low deposition efficiency, high cost, low bonding strength, and high equipment maintenance costs, making it difficult to meet the needs of industrial continuous production.
Using capacitively coupled plasma technology, a vacuum system consisting of a vacuum chamber, an oil diffusion pump, a Roots pump, and a mechanical pump, combined with an asymmetric electrode and a mixing chamber, is used to achieve continuous deposition of carbon films, improve the uniformity of gas distribution and the temperature of the coating area, and enhance the adhesion between the carbon film and the metal strip.
It enables continuous roll-to-roll production of carbon films, improving production efficiency and carbon film quality, enhancing the corrosion resistance and conductivity of current collectors, meeting the requirements of high energy density and high power density energy storage devices, and extending battery life.
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