A remote plasma reaction chamber and a remote plasma source system

Abstract

The utility model discloses a kind of remote plasma reaction chambers and remote plasma source systems.The remote plasma reaction chamber includes: first flange, first flange includes air inlet;Cavity structure, located in the side of first flange, cavity structure includes first hollow metal cylinder, first hollow insulating cylinder, second hollow metal cylinder and second hollow insulating cylinder;Wherein, first hollow insulating cylinder is located in the inner wall side of first hollow metal cylinder, second hollow metal cylinder is located in the inner wall side of first hollow insulating cylinder, second hollow insulating cylinder is located in the inner wall side of second hollow metal cylinder and the inner cavity of second hollow insulating cylinder is communicated with air inlet;First hollow metal cylinder and second hollow metal cylinder are used to ionize process gas in cavity structure into plasma.The utility model provides a kind of remote plasma reaction chamber and remote plasma source system, simple structure, can improve the problem of gas leakage in cavity structure, also can improve the reliability of ionized process gas.

Description

Technical Field

[0001] This utility model relates to the field of plasma technology, and in particular to a remote plasma reaction chamber and a remote plasma source system. Background Technology

[0002] Remote Plasma Sources (RPS) offer several significant advantages that have led to their widespread adoption in high-end etching equipment. First, RPS reduces physical damage to material surfaces. Since high-energy ions are filtered out before reaching the process chamber, this effectively minimizes physical damage to the treated surface, thus protecting the integrity of the material surface. Second, RPS offers high selectivity, making it suitable for complex structures. This allows it to excel in processing materials with intricate structures, enabling precise process control and minimizing errors and damage. Furthermore, RPS improves process uniformity. By optimizing plasma transport and distribution, process uniformity is ensured, enhancing overall processing quality.

[0003] A remote plasma source system is a system used to generate plasma outside a process chamber and supply it to the chamber remotely. The most representative semiconductor manufacturing process utilizing a remote plasma source system is the cleaning process inside the process chamber; however, it is also used in other semiconductor manufacturing processes.

[0004] Currently, remote plasma source systems include cavity structures made of ceramic. These ceramic cavity structures are prone to breakage during use and transportation, leading to gas leakage within the cavity, affecting performance, and posing safety hazards. Furthermore, existing cavity structures suffer from poor reliability and complex structures. Utility Model Content

[0005] This invention provides a remote plasma reaction chamber and a remote plasma source system. The structure is simple, which can improve the problem of gas leakage in the chamber structure and improve the reliability of ionization process gas.

[0006] According to one aspect of the present invention, a remote plasma reaction chamber is provided, the remote plasma reaction chamber comprising:

[0007] A first flange, the first flange including an air inlet;

[0008] A cavity structure is located on one side of the first flange. The cavity structure includes a first hollow metal cylinder, a first hollow insulating cylinder, a second hollow metal cylinder, and a second hollow insulating cylinder. The first hollow insulating cylinder is located on the inner wall side of the first hollow metal cylinder, the second hollow metal cylinder is located on the inner wall side of the first hollow insulating cylinder, and the inner cavity of the second hollow insulating cylinder is connected to the air inlet.

[0009] The first hollow metal cylinder is reused as the first electrode, and the second hollow metal cylinder is reused as the second electrode. The first hollow metal cylinder and the second hollow metal cylinder are used to ionize the process gas in the cavity structure into plasma.

[0010] The second flange is located on the side of the cavity structure away from the first flange. The second flange includes an air outlet, which communicates with the inner cavity of the second hollow insulating cylinder.

[0011] Optionally, the second hollow metal cylinder is fixed to the outer wall side of the second hollow insulating cylinder;

[0012] The first hollow metal cylinder, the first hollow insulating cylinder, and the second hollow insulating cylinder are all located on the second flange.

[0013] Optionally, the inner wall of the first hollow insulating cylinder and the outer wall of the second hollow metal cylinder are spaced at a predetermined distance.

[0014] Optionally, the thickness of the first hollow insulating cylinder is greater than the thickness of the second hollow insulating cylinder;

[0015] The thickness of the first hollow metal cylinder is greater than the thickness of the second hollow metal cylinder;

[0016] The thickness of the first hollow metal cylinder ranges from 8mm to 12mm;

[0017] The thickness of the second hollow metal cylinder ranges from 3mm to 5mm.

[0018] Optionally, both the first flange and the second flange are made of metallic materials;

[0019] Both the first flange and the second flange are fixedly connected to the first hollow metal cylinder;

[0020] The first hollow metal cylinder, the first flange, and the second flange are reused as the first electrode, and the first electrode is grounded.

[0021] Optionally, the first hollow metal cylinder includes a first through hole;

[0022] The first hollow insulating cylinder includes a second through hole;

[0023] The first through hole is connected to the second through hole;

[0024] The first through hole and the second through hole are used to accommodate the wire structure that electrically connects the radio frequency power module to the second hollow metal cylinder.

[0025] Optionally, the material of the first hollow insulating cylinder includes ceramic or quartz;

[0026] The material of the second hollow insulating cylinder includes ceramic or quartz;

[0027] The material of the first hollow metal cylinder includes at least one of aluminum, copper, stainless steel, and nickel;

[0028] The material of the second hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel.

[0029] Optionally, the first flange surrounds at least a portion of the outer wall of the first hollow metal cylinder and is seamlessly connected to the surrounded first hollow metal cylinder; the second flange surrounds at least a portion of the outer wall of another first hollow metal cylinder and is seamlessly connected to the surrounded first hollow metal cylinder.

[0030] According to another aspect of the present invention, a remote plasma source system is provided, which includes a radio frequency power supply module, an impedance matching module, and a remote plasma reaction chamber provided in any embodiment of the present invention.

[0031] The radio frequency power module is electrically connected to the impedance matching module, and the impedance matching module is electrically connected to the second hollow metal cylinder in the remote plasma reaction chamber.

[0032] Optionally, the impedance matching module includes an impedance matching unit, a protective cover, and at least one heat dissipation unit;

[0033] The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover;

[0034] The first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the second hollow metal cylinder.

[0035] The protective cover is detachably connected to the remote plasma reaction chamber.

[0036] This invention provides a remote plasma reaction chamber, comprising a first flange, a cavity structure, and a second flange. In the cavity structure, a first hollow insulating cylinder is positioned between a first hollow metal cylinder and a second hollow metal cylinder, preventing short circuits between them. Both the first and second hollow metal cylinders are made of metal, ensuring they are not easily broken, thus preventing leakage of harmful gases due to cavity structure rupture. The first hollow metal cylinder can be reused as a first electrode, and the second hollow metal cylinder can be reused as a second electrode. The electric field generated between the first and second hollow metal cylinders ionizes the process gas within the cavity structure into plasma. Therefore, there is no need for an additional capacitor structure for ionizing the process gas within the cavity structure, simplifying the structure and saving internal space. Furthermore, this embodiment of the invention also includes a second hollow insulating cylinder on the inner wall side of the second hollow metal cylinder. This second hollow insulating cylinder prevents short circuits between the inner cavity of the second hollow metal cylinder and the main body of the second hollow metal cylinder, thus avoiding impact on the ionization effect of the process gas and improving the reliability of the remote plasma reaction chamber. In summary, the remote plasma reaction chamber provided by this embodiment of the invention has a simple structure, improves the problem of gas leakage within the cavity structure, and enhances the reliability of ionizing process gases.

[0037] It should be understood that the description in this section is not intended to identify key or essential features of the embodiments of this utility model, nor is it intended to limit the scope of this utility model. Other features of this utility model will become readily apparent from the following description. Attached Figure Description

[0038] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0039] Figure 1 This is a schematic diagram of the overall structure of a remote plasma reaction chamber according to an embodiment of the present invention;

[0040] Figure 2 This is a front view schematic diagram of a cavity structure and a second flange connection according to an embodiment of the present utility model;

[0041] Figure 3 This is a schematic cross-sectional view of a cavity structure and a second flange connection according to an embodiment of the present utility model.

[0042] Figure 4 This is a schematic diagram of a remote plasma source system according to an embodiment of the present invention;

[0043] Figure 5 This is a schematic diagram of the structure of another remote plasma source system provided according to an embodiment of the present utility model;

[0044] Figure 6 yes Figure 5 A schematic diagram of the structure of a remote plasma source system from another angle is shown. Detailed Implementation

[0045] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0046] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this utility model are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the utility model described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0047] Figure 1 This is a schematic diagram of the overall structure of a remote plasma reaction chamber according to an embodiment of the present invention. Figure 2 This is a front view schematic diagram of a cavity structure and a second flange connection according to an embodiment of the present utility model. Figure 3 This is a cross-sectional structural diagram of a cavity structure and a second flange connection according to an embodiment of the present invention, for reference. Figures 1-3The remote plasma reaction chamber provided in this embodiment includes: a first flange 110, a cavity structure 120, and a second flange 130. The first flange 110 includes an air inlet 101; the cavity structure 120 is located on one side of the first flange 110, and includes a first hollow metal cylinder 121, a first hollow insulating cylinder 122, a second hollow metal cylinder 123, and a second hollow insulating cylinder 124; wherein the first hollow insulating cylinder 122 is located on the inner wall side of the first hollow metal cylinder 121, the second hollow metal cylinder 123 is located on the inner wall side of the first hollow insulating cylinder 122, and the second hollow insulating cylinder 124 is located on the inner wall side of the second hollow metal cylinder 123. The inner cavity 201 of the hollow insulating cylinder 124 is connected to the air inlet 101; the first hollow metal cylinder 121 is reused as the first electrode, and the second hollow metal cylinder 123 is reused as the second electrode. The first hollow metal cylinder 121 and the second hollow metal cylinder 123 are used to ionize the process gas in the cavity structure 120 into plasma; the second flange 130 is located on the side of the cavity structure 120 away from the first flange 110, and the second flange 130 includes an air outlet 102, which is connected to the inner cavity 201 of the second hollow insulating cylinder 124.

[0048] Specifically, the first hollow metal cylinder 121 in the cavity structure 120 can be fixedly connected to the first flange 110 and the second flange 130 by welding. The connection between the first flange 110 and the first hollow metal cylinder 121, as well as the connection between the second flange 130 and the first hollow metal cylinder 121, are sealed to prevent leakage of process gas and plasma from the cavity structure 120. Both the first flange 110 and the second flange 130 can be made of metal. The materials of both the first flange 110 and the second flange 130 can be the same as those of the first hollow metal cylinder 121. The shapes of the first hollow metal cylinder 121, the first hollow insulating cylinder 122, the second hollow metal cylinder 123, and the second hollow insulating cylinder 124 can all be hollow cylinders. The second flange 130 may also include an ignition connection hole 301 for connecting an ignition device.

[0049] The first hollow insulating cylinder 122 can be adjacent to the inner wall of the first hollow metal cylinder 121 without any gap, and the second hollow insulating cylinder 124 can be adjacent to the inner wall of the second hollow metal cylinder 123 without any gap. This arrangement can improve the problem that the first hollow insulating cylinder 122 and the second hollow insulating cylinder 124 are prone to displacement and breakage during use or transportation of the remote plasma reaction chamber.

[0050] Both the first hollow insulating cylinder 122 and the second hollow insulating cylinder 124 have insulating functions. The first hollow insulating cylinder 122 is located between the first hollow metal cylinder 121 and the second hollow metal cylinder 123, which can prevent the first hollow metal cylinder 121 and the second hollow metal cylinder 123 from being short-circuited. The second hollow insulating cylinder 124 is located on the inner wall side of the second hollow metal cylinder 123, which can prevent the inner cavity of the second hollow metal cylinder 123 from being short-circuited with the second hollow metal cylinder 123 and generating arc discharge phenomenon, which would affect the ionization effect of the process gas.

[0051] The remote plasma reaction chamber provided in this embodiment includes an inlet 101 and an outlet 102. The inlet 101 is used to receive process gas, such as argon. The process gas enters the cavity structure 120 and is ionized to generate plasma under the action of the electric field generated by the first hollow metal cylinder 121 and the second hollow metal cylinder 123. The plasma can be located in the inner cavity 201 of the second hollow insulating cylinder 124. The plasma in the remote plasma reaction chamber can enter the process chamber through the outlet 102 to clean the device to be cleaned in the process chamber.

[0052] In this embodiment, the first hollow metal cylinder 121 and the second hollow metal cylinder 123 in the cavity structure 120 are both made of metal materials, which are not easy to break during use and transportation. This can improve the problem of gas leakage in the cavity structure 120 due to its easy breakage, and thus avoid the problem of harmful gas leakage in the cavity structure 120 causing harm to the health of workers due to the breakage of the cavity structure 120.

[0053] In this embodiment, the first hollow metal cylinder 121 and the second hollow metal cylinder 123 can form a capacitor structure for ionizing process gas, eliminating the need to set up a capacitor structure for ionizing gas inside the cavity structure 120 again, thus freeing up the internal space of the cavity structure 120 and enabling the cavity structure 120 to be further developed towards miniaturization.

[0054] This embodiment provides a remote plasma reaction chamber, which includes a first flange, a cavity structure, and a second flange. In the cavity structure, a first hollow insulating cylinder is positioned between a first hollow metal cylinder and a second hollow metal cylinder to prevent short circuits between them. Since both the first and second hollow metal cylinders are made of metal, they are less prone to breakage, thus preventing leakage of harmful gases from the cavity structure due to breakage. The first hollow metal cylinder can be reused as a first electrode, and the second hollow metal cylinder can be reused as a second electrode. The electric field generated between the first and second hollow metal cylinders ionizes the process gas within the cavity structure into plasma. Therefore, there is no need to additionally construct a capacitor structure for ionizing the process gas within the cavity structure, simplifying the structure and saving internal space. Furthermore, this embodiment also includes a second hollow insulating cylinder on the inner wall side of the second hollow metal cylinder. This second hollow insulating cylinder prevents short circuits between the inner cavity of the second hollow metal cylinder and the main body of the second hollow metal cylinder, thus avoiding impact on the ionization effect of the process gas and improving the reliability of the remote plasma reaction chamber. In summary, the remote plasma reaction chamber provided in this embodiment has a simple structure, improves the problem of gas leakage within the chamber structure, and enhances the reliability of ionizing the process gas.

[0055] Optional, continue to refer to Figure 3 The second hollow metal cylinder 123 is fixed to the outer wall side of the second hollow insulating cylinder 124; the first hollow metal cylinder 121, the first hollow insulating cylinder 122 and the second hollow insulating cylinder 124 are all located on the second flange 130.

[0056] Specifically, the second hollow metal cylinder 123 can be fitted onto the outer wall of the second hollow insulating cylinder 124, eliminating the need to weld the second hollow metal cylinder 123 onto the second hollow insulating cylinder 124, thus simplifying the process. The second hollow metal cylinder 123 does not contact the second flange 130. To prevent the second hollow metal cylinder 123 from shifting downwards, this embodiment may also include a support portion in the first hollow insulating cylinder 122 to support the second hollow metal cylinder 123, thereby avoiding welding the second hollow metal cylinder 123 onto the second hollow insulating cylinder 124 and further simplifying the process.

[0057] The height of the first hollow insulating cylinder 122 can be greater than the height of the first hollow metal cylinder 121, and the height of the second hollow insulating cylinder 124 can be greater than the height of the first hollow insulating cylinder 122.

[0058] In this embodiment, the first hollow metal cylinder 121, the first hollow insulating cylinder 122, and the second hollow insulating cylinder 124 are all located on the second flange 130, so that the second flange 130 supports the first hollow metal cylinder 121, the first hollow insulating cylinder 122, and the second hollow insulating cylinder 124, thereby better fixing the first hollow metal cylinder 121, the first hollow insulating cylinder 122, and the second hollow insulating cylinder 124.

[0059] The second flange 130 also surrounds a portion of the outer wall of the first hollow metal cylinder 121 and is fixedly connected to the outer wall of the surrounded first hollow metal cylinder 121.

[0060] Optional, continue to refer to Figure 3 The inner wall of the first hollow insulating cylinder 122 is spaced at a predetermined distance from the outer wall of the second hollow metal cylinder 123. This arrangement facilitates the placement of the second hollow metal cylinder 123 and the second hollow insulating cylinder 124 into the inner wall of the first hollow insulating cylinder 122.

[0061] Specifically, the set distance can be one-quarter, one-fifth, or one-sixth of the thickness of the second hollow metal cylinder 123, etc.

[0062] Optionally, the thickness of the first hollow insulating cylinder is greater than the thickness of the second hollow insulating cylinder; the thickness of the first hollow metal cylinder is greater than the thickness of the second hollow metal cylinder; the thickness of the first hollow metal cylinder ranges from 8mm to 12mm; and the thickness of the second hollow metal cylinder ranges from 3mm to 5mm.

[0063] Specifically, setting the thickness of the first hollow insulating cylinder to be greater than the thickness of the second hollow insulating cylinder can improve the insulation effect between the first and second hollow metal cylinders. Since the first hollow metal cylinder is located on the outermost side, setting its thickness to be greater than that of the second hollow metal cylinder can improve the quality of the remote plasma reaction chamber. Setting the thickness of the first hollow metal cylinder to be in the range of 8mm to 12mm and the thickness of the second hollow metal cylinder to be in the range of 3mm to 5mm can reduce the volume of the remote plasma reaction chamber while ensuring that plasma is generated.

[0064] Optional, continue to refer to Figure 1 The materials of the first flange 110 and the second flange 130 are both metal materials; the first flange 110 and the second flange 130 are both fixedly connected to the first hollow metal cylinder 121; the first hollow metal cylinder 121, the first flange 110 and the second flange 130 are reused as the first electrode, and the first electrode is grounded.

[0065] Specifically, the first hollow metal cylinder 121 and the first flange 110 are fixedly connected by welding. The first flange 110 can contact the upper half of the outer wall of the first hollow metal cylinder 121, and the second flange 130 can contact the lower half of the outer wall of the first hollow metal cylinder 121. This arrangement can improve the stability of the connection between the first hollow metal cylinder 121 and the first flange 110 and the second flange 130.

[0066] The second hollow metal cylinder 123 is not in contact with the first flange 110, the second flange 130, or the first hollow metal cylinder 121. The second hollow metal cylinder 123 can be suspended in the depth direction.

[0067] When the first hollow metal cylinder 121, the first flange 110, and the second flange 130 are reused as the first electrode, and the second hollow metal cylinder 123 is reused as the second electrode, the ionization effect of the process gas can be improved.

[0068] Optional, continue to refer to Figure 1 The first hollow metal cylinder 121 includes a first through hole 103; the first hollow insulating cylinder 122 includes a second through hole; the first through hole 103 communicates with the second through hole; the first through hole 103 and the second through hole are used to accommodate the wire structure that is electrically connected to the radio frequency power module and the second hollow metal cylinder 123.

[0069] Specifically, the first through hole 103 and the second through hole can expose the second hollow metal cylinder 123.

[0070] Since the second hollow metal cylinder 123 is reused as the second electrode, it needs to be electrically connected to the RF power module, which can provide RF energy to the second hollow metal cylinder 123. When the first electrode is grounded, the second hollow metal cylinder 123 can transmit RF energy to the inner cavity of the second hollow insulating cylinder 124 to ionize the process gas and generate plasma.

[0071] A first through hole 103 is provided on the side wall of the first hollow metal cylinder 121, and a second through hole is provided on the side wall of the first hollow insulating cylinder 122. This allows the wire structure that electrically connects the radio frequency power module and the second hollow metal cylinder 123 to pass through the first through hole 103 and the second through hole and be electrically connected to the second hollow metal cylinder 123, thereby realizing the electrical connection between the second hollow metal cylinder 123 and the radio frequency power module.

[0072] It should be noted that the conductor structure is insulated from the first hollow metal cylinder 121. The remaining area of ​​the first hollow metal cylinder 121, except for the first through hole 103, is sealed, thereby preventing leakage of plasma and process gas.

[0073] Optionally, the material of the first hollow insulating cylinder includes ceramic or quartz; the material of the second hollow insulating cylinder includes ceramic or quartz; the material of the first hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel; and the material of the second hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel.

[0074] Specifically, ceramics and quartz have good insulation properties, are readily available, and are inexpensive. Setting the materials of the first and second hollow insulating cylinders to be ceramics or quartz can reduce the cost of the first and second hollow insulating cylinders while ensuring their insulation performance.

[0075] The material of the first hollow metal cylinder can be the same as that of the second hollow metal cylinder. The material of the first hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel, and the material of the second hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel. This can improve the ionization effect of the ionization process gas in the remote plasma reaction chamber and reduce the cost of manufacturing the remote plasma reaction chamber.

[0076] Optional, continue to refer to Figures 1-3 The first flange 110 surrounds at least a portion of the outer wall of the first hollow metal cylinder 121 and is seamlessly connected to the surrounded first hollow metal cylinder 121; the second flange 130 surrounds at least a portion of the outer wall of another first hollow metal cylinder 121 and is seamlessly connected to the surrounded first hollow metal cylinder 121.

[0077] Specifically, the regions 121 surrounding the first hollow metal cylinder are different for the first flange 110 and the second flange 130. By having the first flange 110 surround at least a portion of the first hollow metal cylinder 121, and the second flange 130 surround another at least a portion of the first hollow metal cylinder 121, the sealing performance between the first flange 110 and the first hollow metal cylinder 121 can be improved, as can the sealing performance between the second flange 130 and the first hollow metal cylinder 121, thereby preventing leakage of process gases and plasma components within the cavity structure 120.

[0078] Figure 4 This is a schematic diagram of a remote plasma source system according to an embodiment of the present invention, with reference to... Figure 4 The remote plasma source system provided in this embodiment includes a radio frequency power supply module 200, an impedance matching module 300, and a remote plasma reaction chamber 100 provided in any embodiment of this utility model; the radio frequency power supply module 200 is electrically connected to the impedance matching module 300, and the impedance matching module 300 is electrically connected to the second hollow metal cylinder in the remote plasma reaction chamber 100.

[0079] Specifically, the output frequency range of the RF power supply module 200 can be 400kHz to 40MHz. An impedance matching module 300 is connected between the RF power supply module 200 and the remote plasma reaction chamber 100. The RF power supply module 200 provides RF energy to the remote plasma reaction chamber 100 to ionize the process gas and generate plasma. The impedance matching module 300 achieves impedance matching between the RF power supply module 200 and the remote plasma reaction chamber 100. The impedance matching module 300 may include a fixed capacitor and a fixed inductor connected in series, or it may include a fixed inductor and an adjustable capacitor connected in series.

[0080] The remote plasma source system provided in this embodiment includes the remote plasma reaction chamber 100 provided in any embodiment of this utility model. Therefore, it has the beneficial effects of the remote plasma reaction chamber 100 provided in any embodiment of this utility model, which will not be described in detail here.

[0081] Optionally, the remote plasma source system provided in this embodiment further includes a directional coupling module and a control module; the control module is electrically connected to the directional coupling module and the radio frequency power supply module; the directional coupling module is used to detect the reverse power in the remote plasma source system; the control module is used to adjust the output frequency of the radio frequency power supply module according to the reverse power.

[0082] Specifically, the directional coupling module can be electrically connected between the RF power supply module and the impedance matching module. The directional coupling module can send the detected reverse power to the control module. The reverse power can characterize the impedance matching between the RF power supply module and the remote plasma reaction chamber. A large reverse power indicates that the impedance matching between the RF power supply module and the remote plasma reaction chamber does not meet the set requirements.

[0083] The control module can determine the impedance matching between the RF power module and the remote plasma reaction chamber based on the reverse power, and adjust the output power of the RF power module when the reverse power is large in order to reduce the reverse power and thus improve the impedance matching between the RF power module and the remote plasma reaction chamber.

[0084] Optional, Figure 5 This is a schematic diagram of another remote plasma source system provided according to an embodiment of the present invention. Figure 6 yes Figure 5 A schematic diagram of the remote plasma source system from another angle is shown below. (Refer to...) Figure 5 and Figure 6The impedance matching module 300 includes an impedance matching unit, a protective cover 310, and at least one heat dissipation unit 320; the impedance matching unit is located inside the protective cover 310, and the heat dissipation unit 320 is located outside the protective cover 310; the first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the second hollow metal cylinder; the protective cover 310 is detachably connected to the remote plasma reaction chamber 100.

[0085] For more details, please refer to the following: Figure 1 The remote plasma reaction chamber also includes a connection component 410 for detachable connection with the protective cover 310.

[0086] The impedance matching unit may include a fixed capacitor and a fixed inductor connected in series, or a fixed inductor and an adjustable capacitor connected in series. The impedance matching unit is located inside a protective cover 310, which protects the impedance matching unit from damage by external objects. The protective cover 310 may also include multiple heat dissipation holes.

[0087] The impedance matching module 300 may include two heat dissipation units 320, which are used to reduce the temperature of the impedance matching unit in the impedance matching module. The heat dissipation unit 320 may be a fan.

[0088] It should be understood that the various forms of the process shown above can be used, with steps reordered, added, or deleted. For example, the steps described in this utility model can be executed in parallel, sequentially, or in different orders, as long as the desired result of the technical solution of this utility model can be achieved, and this is not limited herein.

[0089] The specific embodiments described above do not constitute a limitation on the scope of protection of this utility model. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the scope of protection of this utility model.

Claims

1. A remote plasma reaction chamber, characterized in that, include: A first flange, the first flange including an air inlet; A cavity structure is located on one side of the first flange. The cavity structure includes a first hollow metal cylinder, a first hollow insulating cylinder, a second hollow metal cylinder, and a second hollow insulating cylinder. The first hollow insulating cylinder is located on the inner wall side of the first hollow metal cylinder, the second hollow metal cylinder is located on the inner wall side of the first hollow insulating cylinder, and the inner cavity of the second hollow insulating cylinder is connected to the air inlet. The first hollow metal cylinder is reused as the first electrode, and the second hollow metal cylinder is reused as the second electrode. The first hollow metal cylinder and the second hollow metal cylinder are used to ionize the process gas in the cavity structure into plasma. The second flange is located on the side of the cavity structure away from the first flange. The second flange includes an air outlet, which communicates with the inner cavity of the second hollow insulating cylinder.

2. The remote plasma reaction chamber according to claim 1, characterized in that, The second hollow metal cylinder is fixed to the outer wall side of the second hollow insulating cylinder; The first hollow metal cylinder, the first hollow insulating cylinder, and the second hollow insulating cylinder are all located on the second flange.

3. The remote plasma reaction chamber according to claim 1, characterized in that, The inner wall of the first hollow insulating cylinder is spaced at a predetermined distance from the outer wall of the second hollow metal cylinder.

4. The remote plasma reaction chamber according to claim 1, characterized in that, The thickness of the first hollow insulating cylinder is greater than the thickness of the second hollow insulating cylinder; The thickness of the first hollow metal cylinder is greater than the thickness of the second hollow metal cylinder; The thickness of the first hollow metal cylinder ranges from 8mm to 12mm; The thickness of the second hollow metal cylinder ranges from 3mm to 5mm.

5. The remote plasma reaction chamber according to claim 1, characterized in that, Both the first flange and the second flange are made of metallic materials; Both the first flange and the second flange are fixedly connected to the first hollow metal cylinder; The first hollow metal cylinder, the first flange, and the second flange are reused as the first electrode, and the first electrode is grounded.

6. The remote plasma reaction chamber according to claim 1, characterized in that, The first hollow metal cylinder includes a first through hole; The first hollow insulating cylinder includes a second through hole; The first through hole is connected to the second through hole; The first through hole and the second through hole are used to accommodate the wire structure that electrically connects the radio frequency power module to the second hollow metal cylinder.

7. The remote plasma reaction chamber according to claim 1, characterized in that, The material of the first hollow insulating cylinder includes ceramic or quartz; The material of the second hollow insulating cylinder includes ceramic or quartz; The material of the first hollow metal cylinder includes at least one of aluminum, copper, stainless steel, and nickel; The material of the second hollow metal cylinder includes at least one of aluminum, copper, stainless steel and nickel.

8. The remote plasma reaction chamber according to any one of claims 1-7, characterized in that, The first flange surrounds at least a portion of the outer wall of the first hollow metal cylinder and is seamlessly connected to the surrounded first hollow metal cylinder; the second flange surrounds at least a portion of the outer wall of another first hollow metal cylinder and is seamlessly connected to the surrounded first hollow metal cylinder.

9. A remote plasma source system, characterized in that, Includes a radio frequency power supply module, an impedance matching module, and a remote plasma reaction chamber as described in any one of claims 1-8; The radio frequency power module is electrically connected to the impedance matching module, and the impedance matching module is electrically connected to the second hollow metal cylinder in the remote plasma reaction chamber.

10. The remote plasma source system according to claim 9, characterized in that, The impedance matching module includes an impedance matching unit, a protective cover, and at least one heat dissipation unit. The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover; The first end of the impedance matching unit is electrically connected to the radio frequency power module, and the second end of the impedance matching unit is electrically connected to the second hollow metal cylinder. The protective cover is detachably connected to the remote plasma reaction chamber.

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