External low disturbance gas circulation filtering system for czochralski crystal growth furnace

CN224370986UActive Publication Date: 2026-06-19HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES
Filing Date
2025-06-24
Publication Date
2026-06-19

AI Technical Summary

Technical Problem

The existing gas circulation filtration system of single crystal furnace is integrated inside the furnace chamber, which requires shutdown and cooling to replace the filter element, affecting production efficiency. The built-in filter has a short lifespan and is susceptible to high temperature. Airflow disturbance causes instability at the crystal growth interface and rare earth element volatiles contaminate the crystal.

Method used

An external, low-disturbance gas circulation filtration system is adopted, which includes an external filter unit, multi-stage filter elements and a regulating fan. It is connected to the furnace through pipelines to achieve gas purification, and uses a gas flow meter and controller to automatically switch filter elements to ensure airflow stability and convenient filter element replacement.

Benefits of technology

It achieves efficient gas purification without affecting the stability of airflow in the furnace, extends filter life, reduces airflow disturbance, ensures the stability of crystal growth interface, reduces volatile deposition, and improves crystal optical performance.

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Abstract

This invention discloses an external, low-disturbance gas circulation and filtration system for a Czochralski crystal growth single crystal furnace. The system includes a filtration unit located outside the furnace chamber, with its inlet and outlet connected to the furnace chamber via pipes. This invention utilizes an external filtration unit, achieving efficient gas purification without affecting the stability of the airflow within the furnace chamber. The external design facilitates filter unit replacement and maintenance, effectively extending its lifespan, reducing airflow disturbance within the furnace chamber, ensuring a stable crystal growth interface free from turbulence interference, and employing multi-stage filtration to effectively prevent crystal contamination and improve crystal optical performance.
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