Gas inlet device for a plasma etching machine
By designing a combined structure of dispersion nozzles and air inlet nozzles, the problems of uneven gas distribution and inaccurate flow control in the air inlet equipment of plasma etching machines were solved, achieving uniform gas distribution and flow regulation in the etching area, thereby improving etching accuracy and product quality consistency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- DEEPINSEMI CO LTD
- Filing Date
- 2025-04-30
- Publication Date
- 2026-07-07
AI Technical Summary
Traditional plasma etching machines suffer from uneven gas distribution and inaccurate flow control in their gas intake equipment, which affects etching precision and product quality consistency, making it difficult to meet modern production needs.
A plasma etching machine air intake device was designed. Through the combination of a dispersing nozzle, an air intake nozzle, and a limiting sleeve, uniform gas distribution and flow rate regulation are achieved. The spray direction and angle are adjusted by rotating the connecting rod to adapt to different etching process requirements.
This technology enables uniform gas distribution and precise flow control in the etching area, improving etching performance and product success rate, and meeting the requirements of high-precision etching processes.
Smart Images
Figure CN224472447U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of plasma etching machine component technology, and in particular to an air intake device for a plasma etching machine. Background Technology
[0002] In fields such as semiconductor manufacturing and micro-nano processing, plasma etching machines are key equipment for precision machining. The performance of their air intake equipment directly affects the etching effect and product quality. With the rapid development of related industries, the requirements for the uniformity of air intake and the accuracy of gas flow control of plasma etching machines are constantly increasing. However, traditional plasma etching machine air intake equipment has many shortcomings and cannot meet the needs of modern production.
[0003] Traditional plasma etching machines suffer from uneven gas distribution during gas delivery. After entering through the inlet pipe, the gas cannot be guaranteed to diffuse evenly within the etching area. This results in differences in gas concentration and flow rate at different locations on the surface of the material being etched, leading to inconsistent etching rates and affecting the consistency of etching accuracy and product quality.
[0004] Traditional gas inlet equipment lacks precise control over gas flow. Its flow regulation devices are typically simple in structure and struggle to accurately control flow according to the complex requirements of etching processes. In some high-precision etching processes, variations in gas flow can significantly impact the etching effect, leading to over- or under-etching, increasing production costs and product scrap rates. To improve the quality and efficiency of plasma etching and meet the evolving needs of the industry, developing a plasma etching machine gas inlet device capable of achieving uniform gas distribution and regulating gas flow has become a crucial problem to solve. Utility Model Content
[0005] In view of the above, in order to improve the quality and efficiency of plasma etching and meet the ever-evolving industrial demands, it is necessary to develop a plasma etching machine air intake device that can achieve uniform gas distribution and regulate gas flow rate. Therefore, this utility model is proposed.
[0006] Therefore, the purpose of this invention is to allow gas to enter the first gas buffer tank of the dispersion nozzle through the inlet pipe, be initially and evenly dispersed through the guide hole, and then further dispersed through the third and second gas buffer tanks and the porous dispersion tank of the inlet nozzle. Finally, the gas is ejected from the outlet nozzle, the side outlet, and the oblique nozzle. The rotating connecting rod is inserted into the rotating constraint groove of the limiting sleeve. External operation can drive the inlet nozzle to rotate and adjust the angle of the outlet nozzle and the oblique nozzle to achieve fine adjustment of the gas injection direction and distribution, thereby achieving uniform gas distribution, regulating gas flow, adapting to different etching process requirements, and improving the success rate of the product.
[0007] To solve the above technical problems, this utility model provides the following technical solution: an air intake device for a plasma etching machine, including a limiting and fixing plate and an air intake pipe on one side of the limiting and fixing plate, a rotating connecting rod on one side of the air intake pipe, and a positioning constraint plate on one side of the air intake pipe;
[0008] The fixing component includes a dispersion nozzle installed on one side of the positioning constraint plate, a first gas buffer slot is formed on the dispersion nozzle, and multiple guide holes are formed on the dispersion nozzle, each guide hole being connected to the corresponding first gas buffer slot.
[0009] The rotating assembly has an air inlet nozzle on one side of the dispersing nozzle, a No. 3 gas buffer tank on one side of the air inlet nozzle, and multiple porous dispersing tanks on the inner side of the air inlet nozzle, each porous dispersing tank being connected to the No. 3 gas buffer tank.
[0010] As a preferred embodiment of the air intake device of the plasma etching machine described in this utility model, wherein: a first sealing block is provided on one side of the limiting and fixing plate, a bellows is provided on one side of the limiting and fixing plate, the first sealing block is sleeved inside the bellows, a second sealing block is provided inside the bellows, a flange limiting plate is provided on one side of the second sealing block, a flange fixing plate is provided on one side of the flange limiting plate, and a limiting sleeve is provided on one side of the flange fixing plate.
[0011] As a preferred embodiment of the air intake device of the plasma etching machine described in this utility model, the flange fixing plate has multiple internal threads, the limiting fixing plate has multiple fixing studs on one side, each fixing stud has one end passing through the flange limiting plate and the flange fixing plate and then suspended, each fixing stud is connected to the flange fixing plate by internal threads, and the inner side of the air intake pipe is connected to the first gas buffer tank.
[0012] As a preferred embodiment of the air intake device of the plasma etching machine described in this utility model, wherein: a plug-in constraint block is provided on one side of the dispersing nozzle, a plug-in constraint groove is opened on the air intake nozzle, one end of the plug-in constraint block is inserted into the inner side of the plug-in constraint groove, a first gas connection hole is opened on the air intake nozzle, a second gas connection hole is opened on the dispersing nozzle, the second gas connection hole is connected to the first gas connection hole, and the second gas connection hole is connected to the first gas buffer groove.
[0013] As a preferred embodiment of the air intake device of the plasma etching machine described in this utility model, the air intake nozzle has a second gas buffer groove inside, the air intake nozzle has multiple air outlet nozzles, each air outlet nozzle is connected to the second gas buffer groove, each second gas buffer groove is connected to the first gas connection hole, the air intake nozzle has multiple rotating connecting rods on one side, and the limiting sleeve has multiple side air outlet holes.
[0014] As a preferred embodiment of the air intake device of the plasma etching machine of this utility model, each of the side air outlets is connected to a corresponding porous dispersion groove, a plurality of guide grooves are opened on one side of the limiting sleeve, each of the guide grooves is connected to a corresponding side air outlet, a plurality of No. 4 gas buffer grooves are opened on each air intake nozzle, and a plurality of oblique spray holes are opened on each air intake nozzle.
[0015] As a preferred embodiment of the air intake device of the plasma etching machine described in this utility model, each of the oblique nozzles is connected to the corresponding No. 4 gas buffer tank, each of the No. 4 gas buffer tanks is connected to the corresponding guide tank, the limiting sleeve has multiple rotation constraint slots, and each of the rotation connecting rods is inserted into the inner side of the corresponding rotation constraint slot.
[0016] The beneficial effects of this utility model are as follows: Gas enters the first gas buffer tank of the dispersion nozzle through the air inlet pipe, is initially and evenly dispersed through the guide hole, and is further dispersed through the third and second gas buffer tanks and the multi-hole dispersion tank of the air inlet nozzle. Finally, it is ejected from the gas outlet, the side gas outlet, and the oblique spray hole. The rotating connecting rod is inserted into the rotating constraint groove of the limiting sleeve. External operation can drive the air inlet nozzle to rotate and adjust the angle of the gas outlet and the oblique spray hole, so as to achieve fine adjustment of the gas injection direction and distribution, thereby achieving uniform gas distribution, regulating gas flow, adapting to different etching process requirements, and improving the success rate of products. Attached Figure Description
[0017] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. Among them:
[0018] Figure 1 This is a schematic diagram of the overall structure of this utility model.
[0019] Figure 2 This is a schematic diagram of the internal side view structure of this utility model.
[0020] Figure 3 This is a schematic diagram of the air intake nozzle structure of this utility model.
[0021] Figure 4 This is a schematic diagram of the limiting sleeve structure of this utility model.
[0022] Figure 5 This is a schematic diagram of the corrugated pipe structure of this utility model.
[0023] Figure 6 This is a schematic diagram of the dispersion nozzle structure of this utility model.
[0024] Explanation of reference numerals in the attached diagram: 1. Limiting and fixing plate; 2. Air inlet pipe; 3. Positioning constraint plate; 4. No. 1 sealing block; 5. Bellows; 6. Flange limiting plate; 7. No. 2 sealing block; 8. Dispersion nozzle; 9. No. 1 gas buffer tank; 10. Guide hole; 11. Insertion constraint block; 12. Limiting sleeve; 13. Flange fixing plate; 14. Internal thread; 15. Rotation constraint groove; 16. Side air outlet; 17. Guide groove; 18. Air inlet nozzle; 19. No. 3 gas buffer tank; 20. Insertion constraint groove; 21. No. 1 gas connection hole; 22. No. 2 gas buffer tank; 23. Air outlet nozzle; 24. Multi-hole dispersion groove; 25. No. 4 gas buffer tank; 26. Angled nozzle; 27. Rotating connecting rod; 28. Fixing stud; 29. No. 2 gas connection hole. Detailed Implementation
[0025] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.
[0026] Example 1
[0027] Reference Figure 1-4 This is the first embodiment of the present invention, which provides an air intake device for a plasma etching machine, including a limiting and fixing plate 1 and an air intake pipe 2 on one side of the limiting and fixing plate 1. A rotating connecting rod 27 is provided on one side of the air intake pipe 2, and a positioning constraint plate 3 is provided on one side of the air intake pipe 2. A dispersion nozzle 8 is installed on one side of the positioning constraint plate 3. A first gas buffer groove 9 is opened on the dispersion nozzle 8. A plurality of guide holes 10 are opened on the dispersion nozzle 8, and each guide hole 10 is connected to the corresponding first gas buffer groove 9. A first sealing block 4 is provided on one side of the limiting and fixing plate 1, and a bellows 5 is provided on one side of the limiting and fixing plate 1. The first sealing block 4 is sleeved inside the bellows 5. A second sealing block 7 is provided inside the bellows 5. A flange limiting plate 6 is provided on one side of the second sealing block 7. A flange fixing plate 13 is provided on one side of the flange limiting plate 6, and a limiting sleeve 12 is provided on one side of the flange fixing plate 13.
[0028] Multiple internal threads 14 are provided on the flange fixing plate 13. Multiple fixing studs 28 are provided on one side of the limiting fixing plate 1. Each fixing stud 28 is suspended after passing through the flange limiting plate 6 and the flange fixing plate 13 at one end. Each fixing stud 28 is connected to the flange fixing plate 13 by the internal threads 14. The inner side of the air inlet pipe 2 is connected to the first gas buffer tank 9. A plug-in constraint block 11 is provided on one side of the dispersion nozzle 8. A plug-in constraint groove 20 is provided on the air inlet nozzle 18. One end of the plug-in constraint block 11 is inserted into the inner side of the plug-in constraint groove 20. A first gas connection hole 21 is provided on the air inlet nozzle 18. A second gas connection hole 29 is provided on the dispersion nozzle 8. The second gas connection hole 29 is connected to the first gas connection hole 21. The second gas connection hole 29 is connected to the first gas buffer tank 9.
[0029] Example 2
[0030] Reference Figure 3-6 This is the second embodiment of the present invention. The difference between this embodiment and the first embodiment is that: an air inlet nozzle 18 is provided on one side of the dispersion nozzle 8, a third gas buffer groove 19 is opened on one side of the air inlet nozzle 18, a plurality of porous dispersion grooves 24 are opened on the inner side of the air inlet nozzle 18, each porous dispersion groove 24 is connected to the third gas buffer groove 19, a second gas buffer groove 22 is opened on the inner side of the air inlet nozzle 18, a plurality of air outlet nozzles 23 are opened on the air inlet nozzle 18, each air outlet nozzle 23 is connected to the second gas buffer groove 22, each second gas buffer groove 22 is connected to the first gas connection hole 21, a plurality of rotating connecting rods 27 are provided on one side of the air inlet nozzle 18, and a plurality of side air outlet holes 16 are opened on the limiting sleeve 12.
[0031] Each side air outlet 16 is connected to the corresponding porous dispersion groove 24. Multiple guide grooves 17 are opened on one side of the limiting sleeve 12, and each guide groove 17 is connected to the corresponding side air outlet 16. Multiple No. 4 gas buffer grooves 25 are opened on each air inlet nozzle 18. Multiple oblique spray holes 26 are opened on each air inlet nozzle 18, and each oblique spray hole 26 is connected to the corresponding No. 4 gas buffer groove 25. Each No. 4 gas buffer groove 25 is connected to the corresponding guide groove 17. Multiple rotation constraint grooves 15 are opened on the limiting sleeve 12, and each rotation connecting rod 27 is inserted into the inner side of the corresponding rotation constraint groove 15.
[0032] When installing the air intake device, first connect the flange fixing plate 13 to the limiting fixing plate 1 using the fixing stud 28. After one end of the fixing stud 28 passes through the flange limiting plate 6 and the flange fixing plate 13, it is tightened using the internal thread 14 on the flange fixing plate 13 to ensure the stability of the entire structure. The limiting sleeve 12 is installed on one side of the flange fixing plate 13. The bellows 5, the first sealing block 4, and the second sealing block 7 cooperate with each other to play a sealing role, prevent gas leakage, and ensure the normal operation of the air intake device.
[0033] The air inlet pipe 2 is connected to the limiting and fixing plate 1, and its inner side is connected to the first gas buffer tank 9 on the dispersing nozzle 8, providing a channel for gas to enter the equipment. After the gas enters from the air inlet pipe 2, it first flows into the first gas buffer tank 9 of the dispersing nozzle 8. The first gas buffer tank 9 plays the role of buffering and initially distributing the gas evenly. Then the gas flows out through multiple guide holes 10 on the dispersing nozzle 8. These guide holes 10 are connected to the first gas buffer tank 9, which enables the gas to enter the subsequent air intake path in a more uniform manner, thus initially improving the gas distribution.
[0034] The dispersed gas enters the inlet nozzle 18 through the second gas connection hole 29 and the first gas connection hole 21. The gas entering through the first gas connection hole 21 flows to the second gas buffer tank 22 and then is ejected through multiple outlet nozzles 23 to supply gas to the etching area. The third gas buffer tank 19 on one side of the inlet nozzle 18 buffers and adjusts the incoming gas again. Then the gas flows into the porous dispersion tank 24 inside the inlet nozzle 18. The porous dispersion tank 24 is connected to the third gas buffer tank 19 to further disperse the gas.
[0035] Part of the gas is ejected through the side vent 16, while the other part is connected to the side vent 16 through the guide groove 17 on one side of the limiting sleeve 12. After entering the guide groove 17, the gas is ejected through the fourth gas buffer tank 25 and the oblique nozzle 26. The oblique nozzle 26 is connected to the fourth gas buffer tank 25, and the fourth gas buffer tank 25 is connected to the guide groove 17. This structural design allows the gas to be ejected from different angles, which further promotes the uniform distribution of gas in the etching area and meets the requirements of plasma etching machine for gas uniformity.
[0036] When fine adjustments are needed to the air intake angle or gas distribution, this can be achieved by rotating the connecting rod 27. The connecting rod 27 is inserted into the rotation constraint groove 15 of the limiting sleeve 12. By externally rotating the connecting rod 27, the air intake nozzle 18 can be rotated, thereby changing the angle of the air outlet nozzle 23, the oblique nozzle 26, etc., to adjust the direction and distribution of gas injection to adapt to different etching process requirements.
[0037] The remaining structure is the same as that in Example 1.
[0038] It should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although this utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solution of this utility model without departing from the spirit and scope of the technical solution of this utility model, and all such modifications or substitutions should be covered within the scope of the claims of this utility model.
Claims
1. An air intake device for a plasma etching machine, characterized in that: It includes a limiting and fixing plate (1) and an air inlet pipe (2) on one side of the limiting and fixing plate (1). A rotating connecting rod (27) is provided on one side of the air inlet pipe (2), and a positioning constraint plate (3) is provided on one side of the air inlet pipe (2). The fixing component includes a dispersion nozzle (8) installed on one side of the positioning constraint plate (3), a first gas buffer slot (9) is opened on the dispersion nozzle (8), and a plurality of guide holes (10) are opened on the dispersion nozzle (8), each guide hole (10) being connected to the corresponding first gas buffer slot (9); The rotating assembly has an air inlet nozzle (18) on one side of the dispersing nozzle (8), a third gas buffer tank (19) on one side of the air inlet nozzle (18), and multiple porous dispersing tanks (24) on the inner side of the air inlet nozzle (18). Each porous dispersing tank (24) is connected to the third gas buffer tank (19).
2. The air intake device for a plasma etching machine according to claim 1, characterized in that: The limiting and fixing plate (1) has a first sealing block (4) on one side, and a bellows (5) on one side. The first sealing block (4) is sleeved inside the bellows (5). The bellows (5) has a second sealing block (7) inside. The second sealing block (7) has a flange limiting plate (6) on one side, and a flange fixing plate (13) on one side. The flange fixing plate (13) has a limiting sleeve (12) on one side.
3. The air intake device for a plasma etching machine according to claim 2, characterized in that: The flange fixing plate (13) has multiple internal threads (14), and the limiting fixing plate (1) has multiple fixing studs (28) on one side. Each fixing stud (28) is suspended after passing through the flange limiting plate (6) and the flange fixing plate (13) at one end. Each fixing stud (28) is connected to the flange fixing plate (13) by the internal thread (14). The inside of the air inlet pipe (2) is connected to the first gas buffer tank (9).
4. The air intake device for a plasma etching machine according to claim 3, characterized in that: The dispersing nozzle (8) is provided with a plug-in constraint block (11) on one side. The air inlet nozzle (18) is provided with a plug-in constraint groove (20). One end of the plug-in constraint block (11) is inserted into the inside of the plug-in constraint groove (20). The air inlet nozzle (18) is provided with a first gas connection hole (21). The dispersing nozzle (8) is provided with a second gas connection hole (29). The second gas connection hole (29) is connected to the first gas connection hole (21). The second gas connection hole (29) is connected to the first gas buffer groove (9).
5. The air intake device for a plasma etching machine according to claim 4, characterized in that: The air inlet nozzle (18) has a second gas buffer slot (22) inside. The air inlet nozzle (18) has multiple air outlet nozzles (23). Each air outlet nozzle (23) is connected to the second gas buffer slot (22). Each second gas buffer slot (22) is connected to the first gas connection hole (21). The air inlet nozzle (18) has multiple rotating connecting rods (27) on one side. The limiting sleeve (12) has multiple side air outlet holes (16).
6. The air intake device for a plasma etching machine according to claim 5, characterized in that: Each of the side air outlets (16) is connected to the corresponding porous dispersion groove (24). The limiting sleeve (12) has multiple guide grooves (17) on one side. Each guide groove (17) is connected to the corresponding side air outlet (16). Each air inlet nozzle (18) has multiple No. 4 gas buffer grooves (25). Each air inlet nozzle (18) has multiple oblique spray holes (26).
7. The air intake device for a plasma etching machine according to claim 6, characterized in that: Each of the oblique nozzles (26) is connected to the corresponding No. 4 gas buffer slot (25), and each of the No. 4 gas buffer slots (25) is connected to the corresponding guide slot (17). Multiple rotation constraint slots (15) are opened on the limiting sleeve (12), and each of the rotation connecting rods (27) is inserted into the inner side of the corresponding rotation constraint slot (15).