Etching solution information display area and processing result display area of the graphical user interface for data display of the wafer surface processing analysis device
CN309449733SActive Publication Date: 2025-08-19SCREEN HOLDINGS CO LTD
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Patent Information
- Application Number
- CN202430593834.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2024-06-26
- Filing Date
- 2024-09-18
- Publication Date
- 2025-08-19
- Estimated Expiration
- 2039-09-18
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Figure 000001_ABST
Abstract
1. Name of the product of this design: Etching solution information display area and processing result display area of the graphical user interface for data display of a wafer surface processing and analysis device. 2. Purpose of this design product: used for chip surface processing and analysis equipment. 3. The key design point of this design product lies in the graphical user interface. 4. The picture or photo that best illustrates the key points of the design: Main view of Design 1. 5. The wafer surface processing and analysis device is of conventional design, and other figures are omitted. 6. Designate Design 1 as the base design. 7. Purpose of the graphical user interface: The graphical user interface as a whole is used to display data of an apparatus for predicting and analyzing the processing results of a wafer etching process, and the portion for which protection is sought is used to display information such as the type and amount of etching solution used in the etching process, as well as the processing results based on such conditions. 8. Human-computer interaction method of graphical user interface: In the graphical user interfaces of designs 1 to 3, a chart showing the conditions such as the type and usage amount of the etching solution is arranged on the left, and a chart showing the predicted processing results is arranged on the right. Selecting the type of etching solution displayed on the left or changing the usage (or processing time) by operating the slider (or pull-down menu) will change the processing result on the right. This allows you to predict the processing result based on any conditions. Furthermore, when the graph showing the processing results on the right is operated (or the target processing result selection button is operated), the usage amount of each etching solution on the left changes accordingly, so the necessary conditions can also be predicted according to the desired processing result. 9. Other circumstances that require explanation: Protection is requested for part of the design of this design product. The part that is not requested for protection is indicated by dotted lines in the design picture.
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