Salt used as acid generator
The novel salt (Ia) addresses the resolution and exposure margin issues in chemically amplified photoresist compositions by enhancing the performance of acid generators, resulting in improved pattern formation in semiconductor microfabrication.
JP2010248174AInactive Publication Date: 2010-11-04SUMITOMO CHEM CO LTD
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Patent Information
- Application Number
- JP2010062109
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2009-03-26
- Filing Date
- 2010-03-18
- Publication Date
- 2010-11-04
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Technical Problem
Conventional acid generators in chemically amplified photoresist compositions do not provide sufficient resolution and exposure margin for pattern formation in semiconductor microfabrication.
Method used
A novel salt represented by formula (Ia) is used as an acid generator, comprising specific organic groups and counterions, incorporated into a chemically amplified photoresist composition along with a resin having acid-labile groups, and optionally combined with basic compounds to enhance performance.
Benefits of technology
The novel salt (Ia) enables the formation of patterns with improved resolution and exposure margin in semiconductor microfabrication, demonstrating superior performance compared to conventional acid generators.
✦ Generated by Eureka AI based on patent content.
Abstract
PROBLEM TO BE SOLVED: To provide a salt or the like used as an acid generator contained in a photoresist composition which forms a pattern having excellent resolution and exhibiting excellent exposure margin.SOLUTION: The salt is represented by formula (Ia). In formula (Ia), Q<SP>1< / SP>and Q<SP>2< / SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl group, R<SP>1< / SP>represents a 5-42C organic group having a β-ketoester structure and A<SP>+< / SP>represents an organic counter ion.
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