Liquid discharge device and imprint device

JP2023123123A5Active Publication Date: 2025-02-04CANON KK
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Patent Information

Application Number
JP2022027006
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2022-02-24
Publication Date
2025-02-04
Estimated Expiration
2042-02-24

AI Technical Summary

Technical Problem

Existing liquid ejecting apparatuses struggle to effectively remove foreign matter from ejection ports and head channels, particularly when the foreign matter is larger than the ejection opening, leading to clogging and performance issues.

Method used

A liquid ejecting apparatus with a pressure control mechanism that adjusts pressure from a first negative pressure state to a higher negative pressure and then to a positive pressure state to remove foreign matter from ejection ports and surfaces, utilizing a flexible separation membrane and a circulation system to manage pressure and suction foreign matter.

Benefits of technology

The apparatus reliably removes foreign matter from ejection ports and surfaces, maintaining stable ejection performance by stabilizing the meniscus state and preventing clogging.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide a liquid discharge device that can more securely remove foreign matters inside and on the surface of a discharge outlet.SOLUTION: The liquid discharge device includes an accommodation unit for accommodating a discharge, a discharge port connected to the accommodation unit for discharging the discharge accommodated in the accommodation unit, and a pressure control unit for controlling the pressure of the discharge accommodated in the accommodation unit. The pressure control unit controls the pressure of the discharge to shift from a first negative pressure state to a second negative pressure state where the negative pressure is even greater than the first negative pressure state and thereafter to a third positive pressure state.SELECTED DRAWING: Figure 4
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Description

[Technical Field]

[0001] The present invention relates to a liquid ejection device. [Background technology]

[0002] A known liquid ejection device that ejects liquid uses a cartridge that integrates an ejection head that ejects liquid from a plurality of ejection ports and a storage container that stores the liquid. Such liquid ejection devices are equipped with a maintenance mechanism that maintains and restores the ejection performance of the ejection means by clearing clogging of the ejection ports provided in the ejection means and removing foreign matter adhering to the ejection surface on which the ejection ports are formed.

[0003] Patent Document 1 describes a device that has a wiper that moves along the ejection surface to wipe away liquid remaining on the ejection surface, and that sprays liquid from each ejection port of the ejection means to clean the inside of the ejection port. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-147365 Summary of the Invention [Problem to be solved by the invention]

[0005] However, the method described in Patent Document 1 can discharge foreign matter together with the liquid present on the ejection port surface, but cannot effectively remove foreign matter inside the ejection port and in the head flow path. Furthermore, in Patent Document 1, the cross-sectional area of ​​the ejection port is smaller than the cross-sectional area of ​​the flow path, so it is not possible to remove foreign matter that is larger than the ejection port and that is present in the flow path.

[0006] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a liquid ejection device that can more reliably remove foreign matter from inside the ejection ports and on the ejection port surface. [Means for solving the problem]

[0007] The liquid ejection device of the present invention comprises a storage section for storing the ejected material, an ejection port connected to the storage section and for ejecting the ejected material stored in the storage section, and a pressure control means for controlling the pressure of the ejected material stored in the storage section, and is characterized in that the pressure control means controls the pressure of the ejected material to transition from a first negative pressure state to a second negative pressure state having a negative pressure greater than that of the first negative pressure state, and then to a third positive pressure state. [Effects of the Invention]

[0008] According to the present invention, it is possible to provide a liquid ejection device that can more reliably remove foreign matter from inside the ejection ports and on the ejection port surface. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a diagram showing the arrangement of an imprint apparatus according to a first embodiment. [Figure 2] FIG. 1 is a diagram showing a liquid ejection apparatus according to a first embodiment. [Figure 3] FIG. [Figure 4] FIG. 10 is a diagram showing a change in pressure during a cleaning process. [Figure 5] FIG. 3 is a diagram showing a pressure control unit in the first embodiment. [Figure 6] 5 is a flowchart of a cleaning operation in the first embodiment. [Figure 7] FIG. 10 is a diagram showing a pressure control unit according to a second embodiment. [Figure 8] 10 is a flowchart of a cleaning operation in the second embodiment. [Figure 9] FIG. 10 is a diagram showing a pressure control unit according to a third embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0011] First Embodiment FIG. 1 is a diagram showing the configuration of an imprinting apparatus according to a first embodiment of the present invention. In this embodiment, an example of an apparatus will be described in which an ultraviolet-curable resin is used as the imprinting material and the ultraviolet-curable resin is cured by irradiating it with ultraviolet rays. However, the material of the imprinting material and the curing method are not limited to this. For example, a light irradiation device may be used to irradiate light with a wavelength other than ultraviolet light to cure a photocurable resin, or a thermosetting resin may be used to cure it with heat.

[0012] In Figure 1, the imprinting apparatus 100 is configured to include a liquid ejection system 101, a stage 6 supported by a base frame 5, a mold 1, a mold driving mechanism 2 held by a structure 3, and an ultraviolet irradiation device 7.

[0013] The liquid ejection system 101 has a liquid ejection device 10 and a pressure control unit 13, and the liquid ejection device 10 has a ejection unit 11 that ejects the imprint material and a storage unit 12 that stores the imprint material.

[0014] As shown in FIG. 1(b), a substrate 4 is placed on a stage 6, and an imprint material 8 is discharged (applied) onto the substrate 4 from a discharge unit 11. As shown in FIG. 1(c), a mold 1 having a fine uneven pattern or the like is brought into contact with the imprint material 8 discharged onto the substrate 4, and the imprint material 8 is filled so as to fill the unevenness of the mold 1. In this state, ultraviolet light 9 is irradiated onto the imprint material 8 from an ultraviolet irradiation device 7, and the imprint material 8 is hardened. When the mold 1 is moved upward (released), the imprint material 8 is in a molded state in which the pattern of the mold 1 has been transferred. In this manner, a pattern is formed in the imprint material 8.

[0015] The liquid ejection device 10 is detachable, and when the imprint material 8 inside is completely consumed, the liquid ejection device 10 can be replaced with a new one, allowing the imprint device 100 to be used immediately.

[0016] The stage 6 is movable on the base frame 5 while holding the substrate 4. A mold driving mechanism 2 that drives the mold 1 up and down is held by the structure 3, and can bring the mold 1 into contact with the imprint material 8 dispensed onto the substrate 4.

[0017] An ultraviolet irradiation device 7 is disposed above the mold 1, and irradiates the imprint material 8 with ultraviolet rays 9 through the mold 1. The ultraviolet rays 9 may be emitted from a light source such as a halogen lamp that emits i-rays or g-rays. The ultraviolet irradiation device 7 may also have a function of focusing and shaping the light emitted by the light source.

[0018] Next, the imprint operation using the imprint apparatus 100 will be described in detail.

[0019] First, the substrate 4 is mounted on the stage 6. The substrate 4 is moved by the stage 6 to a position below the discharge unit 11 of the liquid discharge device 10. Then, the imprint material 8 is discharged onto the substrate 4 from the discharge unit 11 while the stage 6 is being moved.

[0020] Next, the stage 6 moves the portion of the substrate 4 onto which the imprint material 8 has been dispensed to below the mold 1. Furthermore, the mold 1 is lowered by the mold driving mechanism 2, bringing the mold 1 and the substrate 4 into close proximity. In this state, the alignment marks on the mold 1 and the alignment marks on the substrate 4 are aligned using an alignment scope or the like, and the relative positions of the two are adjusted.

[0021] After adjusting the relative position, the mold 1 is further lowered toward the substrate 4 by the mold driving mechanism 2, and the mold 1 is brought into contact with the imprint material 8. This state is maintained, and the imprint material 8 is filled into the uneven portions of the mold 1. Thereafter, ultraviolet light 9 is irradiated from the ultraviolet irradiation device 7, and the ultraviolet light 9 that has passed through the mold 1 is irradiated onto the imprint material 8. As a result, a photo-curing reaction occurs in the imprint material 8, and the imprint material 8 hardens.

[0022] Finally, the mold 1 is raised by the mold driving mechanism 2 and peeled off from the hardened imprint material 8 .

[0023] Through the above steps, it is possible to form a patterned imprint material 8 on the substrate 4. An imprint device used in semiconductor manufacturing may form a pattern in the entire area on the substrate 4, in which case a series of imprint operations is repeated while changing the area on the substrate 4.

[0024] Next, FIG. 2 is a diagram showing the configuration of the liquid ejection device 10. As shown in FIG.

[0025] The liquid discharge device 10 is mainly composed of a discharge part 11, a storage container 12 that stores a discharged material 8 (liquid), and a pressure control part 13. Inside the storage container 12, which can store a liquid, there is provided a separation membrane 14 made of a flexible material that separates the space inside the storage part. The thickness of the separation membrane 14 is preferably 10 μm or more and 200 μm or less, and it is preferably made of a material that has low permeability to liquids and gases. The separation membrane 14 can be made of, for example, a film of a fluororesin material such as PFA, or a composite multilayer film that combines a fluororesin material and a plastic material.

[0026] The storage container 12 is divided by a separation membrane 14 into storage sections 15, one of which contains the discharge material 8, and storage section 16, the other of which contains the filling liquid 8a. Storage section 15 and storage section 16 are separated by the separation membrane 14. Storage section 16 is connected to the pressure control section 13 via a pipe 17, and storage section 15 is connected to the discharge section 11.

[0027] The pressure control unit 13 is equipped with a filling liquid tank, piping, a pressure sensor, a pump, a valve, etc., and is configured to be able to control the pressure inside the storage unit 16. By controlling the pressure of the filling liquid 8a inside the storage unit 16 with the pressure control unit 13, the pressure of the discharge material 8 inside the storage unit 15 can be controlled via the separation membrane 14.

[0028] When the discharge of the material 8 from the discharge part 11 is repeated, the material 8 inside the storage part 15 is consumed and reduced, and the separation membrane 14 gradually deforms in the +X direction. As the separation membrane 14 deforms, the pressure control part 13 replenishes the filling liquid 8a from the filling liquid tank to the storage part 16. This stabilizes the shape of the meniscus in the discharge part 11, and the material 8 can be discharged with good reproducibility.

[0029] Next, the circulation unit 40 will be described. The circulation unit 40 includes a joint 42, a pump 44, a filter 41 that filters the discharged material 8, and a flow path 45 that connects the joint 43, and is connected to the storage container 12 via the joint 42 and the joint 43. By driving the pump 44, the discharged material 8 inside the storage unit 15 can be sucked into the flow path 45 via the joint 43, and the discharged material from which foreign matter has been removed by the filter 41 can be returned to the storage unit 15 via the filter 41 and the joint 43. This circulation unit 40 makes it possible to remove foreign matter that has become mixed in the discharged material 8 inside the storage unit 15.

[0030] Furthermore, in consideration of the possibility that dust generated by pump 44 may cause foreign matter to be discharged, it is preferable to place filter 41 downstream of pump 44. Pump 44 is preferably provided inside flow path 45, but may also be provided outside this flow path.

[0031] 3 is an enlarged cross-sectional view of the ejection unit 11. The ejection unit 11 includes a common liquid chamber 56 and a module substrate 57. The module substrate 57 includes a supply port 21 for supplying the material 8 to the module substrate 57, a plurality of ejection nozzles 54 each having an ejection port 19 capable of ejecting the material 8, and an energy generating element 18 provided inside the ejection nozzle 54 and generating energy for ejecting the material 8.

[0032] Here, the surface of module substrate 57 on which supply port 21 is provided is referred to as supply port side surface 59, and the surface on which discharge port 19 is provided is referred to as discharge surface 58. The opening area of ​​discharge port 19 is smaller than the opening area of ​​supply port 21, and the cross-sectional area of ​​the flow path in discharge nozzle 54 is the smallest.

[0033] Examples of the energy generating element 18 include a piezoelectric element and a heating resistor. Since the material 8 often contains a large amount of resin, a piezoelectric element is used as the energy generating element 18 here. The supply port 21 communicates with the discharge port 19 inside the module substrate 57. By controlling the energy generating element 18 with a controller (not shown), the material 8 supplied from the supply port 21 to a small liquid chamber 20 between the energy generating element 18 and the discharge port 19 is discharged from the discharge port 19. The discharge unit 11 is preferably a discharge head such as is used in an inkjet head or the like. Alternatively, a control valve or the like may be used to control the supply and stop of the material.

[0034] Next, detection of clogging of the ejection orifice 19 due to foreign matter (ejection abnormality) will be described. The energy generating element 18 can also be used to determine the clogging state of the ejection orifice 19 (ejection abnormality detection). In the liquid ejection device of this embodiment, a voltage of 30% to 70% of the voltage applied to the energy generating element 18 when ejecting the ejection material 8 is applied, thereby fluctuating the volume of the small liquid chamber 20 (hereinafter referred to as inspection oscillation) and vibrating the ejection material 8 in the small liquid chamber 20. With this level of voltage fluctuation, the ejection material 8 in the small liquid chamber 20 vibrates, but does not break the meniscus of the ejection orifice 19 and be ejected from the ejection section 11. On the other hand, a counter electromotive force is generated in the energy generating element 18 due to the vibration in the small liquid chamber 20, and if the ejection orifice is clogged with accumulated matter or if air bubbles have entered the small liquid chamber 20, a waveform different from the standard state (waveform when a meniscus is formed) can be detected.

[0035] Typically, a liquid ejection device has a normal ejection position for ejecting liquid toward an ejection target, and a standby position for performing maintenance on the liquid ejection device. The liquid ejection device is mounted on a stage (not shown) and moved between the ejection position and the standby position. Detecting clogging of the ejection port 19 at the standby position can prevent erroneous ejection at the ejection position due to malfunction of the inspection oscillation. When ejection operation is not being performed, the ejection port 19 is inspected for clogging by the inspection oscillation of the energy generating element 18, and if an abnormality is found, the device proceeds to a cleaning process. If no abnormality is found, the device is returned to the ejection position and the desired ejection is performed.

[0036] Furthermore, although defective ejection nozzles are detected by inspection oscillation here, defective ejection nozzles may also be detected by measuring the presence or absence of landing, landing position, speed, and amount using an impact inspection device (not shown).

[0037] One end of the discharge part 11 is open to the atmosphere through the discharge port 19, but the diameter of the discharge port 19 is several μm to several tens of μm, and the discharged material 8 does not leak out by its own weight due to capillary action. The liquid surface near the discharge port 19 is maintained in a concave, so-called meniscus state.

[0038] Next, the cleaning process will be described. If the inspection oscillation determines that foreign matter is attached to the discharge port 19, the cleaning process is performed. The cleaning process is also performed in the standby position, similar to the detection of clogging of the discharge port 19. If it is determined that foreign matter is attached to the discharge port 19, the pressure control unit 13 is set to a negative pressure greater than the meniscus force, for example, -30 kPa. This causes the discharge material 8 in the discharge port 19 and the small liquid chamber 20, and any foreign matter attached nearby, to be sucked through the discharge port 19 as a gas-liquid mixture together with the surrounding air, and the attached foreign matter is moved into the storage unit 15. The pump 44 of the circulation unit 40 is then driven, and the foreign matter is removed by the filter 41. The pressure control unit 13 is then set to a positive pressure, for example, +30 kPa, to expel any air remaining in the small liquid chamber 20, discharge port 19, etc., along with the discharge material 8. The pressure control unit 13 is then set to a normal slightly negative pressure state, which allows the meniscus state of the discharge material 8 to be stably maintained.

[0039] FIG. 4 shows pressure changes during the cleaning process. Before the cleaning process, as shown in FIG. 4(a), the pressure control unit 13 maintains a first negative pressure state (a normal slightly negative pressure state) that can stably maintain the meniscus of the discharged material 8 at the discharge port 19. If foreign matter 200 is attached to the discharge port 19, the pressure control unit 13 generates a second negative pressure state, such as −30 kPa, which is a negative pressure greater than the first negative pressure state (greater than the meniscus force), as shown in FIGS. 4(b) and 4(c). This moves the discharged material 8 in the discharge port 19 and the small liquid chamber 20, and the foreign matter 200 attached nearby, into the storage unit 15 along with the surrounding air. After the foreign matter 200 is removed by the filter 41, the pressure control unit 13 generates a third positive pressure state, such as +30 kPa, as shown in FIG. 4(d). This allows air remaining in the small liquid chamber 20, the discharge port 19, and the like to be expelled along with the discharged material 8. After these steps are completed, the pressure control unit 13 returns the pressure to the first negative pressure state (normal slightly negative pressure state) as shown in Fig. 4(e). This allows the meniscus of the ejection material 8 to be stably formed again. In this manner, the cleaning step is performed.

[0040] Thus, in the liquid ejection device 10 of this embodiment, in addition to a slight negative pressure state that can stably maintain the meniscus state of the ejection material 8, a negative pressure state that can suck foreign matter into the small liquid chamber 20 and the storage portion 15 by gas-liquid mixture, and a positive pressure state that can discharge the ejection material 8 from the ejection port 19 are created. The negative pressure state is adjusted by a negative pressure source (pressure generating portion) 131, and the positive pressure state is adjusted by a positive pressure source (pressure generating portion) 132 (see FIG. 5 described later).

[0041] In addition, the liquid ejection device of this embodiment has been described as having the pressure control unit 13 connected to the storage unit 15 by a single pipe, but this is not limited to this, and the liquid ejection device may be configured to be connected by multiple pipes in order to control the slight negative pressure state, negative pressure state, and positive pressure state, respectively.

[0042] In this embodiment, the pressure is set to -30 kPa and +30 kPa, but the suction amount and discharge amount may be set to 3 cc or more and 10 cc or less, respectively.

[0043] Furthermore, a degassing device (not shown) may be disposed in the circulation section 40, and air bubbles sucked in together with the discharged material 8 during suction may be removed by driving the circulation section 40.

[0044] After the discharged material 8 is discharged from the discharge port 19, a suction nozzle (not shown) is used to suction and remove the discharged material 8 adhering to the discharge surface 58. The suction nozzle, which is directly connected to a negative pressure source, is brought within 100 μm of the discharge surface 58 and suction begins. While maintaining a distance from the discharge surface 58, the suction nozzle is scanned over the discharge surface 58 to suck up any droplets remaining on the discharge surface 58. The gap between the suction port of the suction nozzle is set to several tens to several hundred μm, and the remaining liquid momentarily causes electrical conduction between the discharge surface 58 and the tip of the suction nozzle. Therefore, to prevent the risk of metal contamination, a resin such as PTFE is used as the material for the suction nozzle.

[0045] After the remaining liquid on the ejection surface is collected, inspection oscillation is used to confirm that the foreign matter has been removed from the ejection port 19. If the foreign matter has not been removed, the cleaning process is carried out again, and if the problem persists even after multiple attempts, the liquid ejection device 10 is replaced.

[0046] In the liquid discharge device 10 of this embodiment, pressure control has been described as being performed via the separation membrane 14 inside the storage container 12. However, the separation membrane 14 may not be provided, and a storage section that stores only the discharge material 8 may be provided, and the pressure of the discharge material 8 may be controlled by the pressure control section 13. In this case, the circulation section 40 described in this embodiment may be provided in the pressure control section 13 to remove foreign matter.

[0047] In the field of inkjet recording devices, other methods have been devised to maintain the discharged material 8 at a certain range of negative pressure in order to stabilize the meniscus shape at the discharge port 19 of the discharged material 8. For example, a method is known in which a porous body is formed inside the container to hold the liquid and the capillary force inside the porous body is used to create negative pressure. Other methods include creating negative pressure inside the container by combining a mechanical element such as a spring with a balloon-shaped membrane, and controlling negative pressure using a control valve and air pressure. In the present invention, the pressure in the container may be controlled by these methods.

[0048] FIG. 5 is a diagram showing the configuration of the pressure control unit 13 in this embodiment.

[0049] 5, in the pressure control unit 13 of this embodiment, the meniscus control unit 27, the negative pressure source 131, and the positive pressure source 132 are each independently connected to the storage unit 16. A first control valve 133, a second control valve 134, and a third control valve 135 are provided between these elements and the storage unit 16, respectively.

[0050] Since the supply tank 26 constituting the meniscus control section 27 also contains the filling liquid 8a, the liquid level of the filling liquid 8a is controlled to be lower than the liquid level at the discharge port 19. Specifically, the liquid level of the filling liquid 8a is set to be lower than the discharge port 19 by ΔH. In order to maintain the meniscus state, it is preferable to control the internal pressure of the discharge material 8 to a value (slight negative pressure) that is 0.40±0.04 kPa lower than the external atmospheric pressure, and ΔH is controlled to be 40±4 mm. For example, the discharge material 8 has a density approximately equal to that of water.

[0051] Next, the cleaning process in this embodiment will be described with reference to a flowchart of FIG.

[0052] First, in the normal discharge operation state of the liquid discharger 10 without performing the discharge surface cleaning operation of step S1, the first control valve 133 is open, and the second control valve 134 and the third control valve 135 are closed.

[0053] From there, as already explained, the liquid ejection device 10 is moved to the standby position, and the state of clogging of the ejection ports 19 is inspected by the inspection oscillation of the energy generating elements 18 at a timing when the ejection operation is not being performed. If an abnormality is found, the process proceeds to a cleaning process. If no abnormality is found, the device is returned to the ejection position and the desired ejection is performed.

[0054] If an abnormality is detected, in step S2, the negative pressure source 131 is set so that the pressure of the material 8 is -30 kPa, which is greater than the meniscus force. After the first control valve 133 is closed, the second control valve 134 is opened. As a result, the pressure of the material 8, which had been controlled to a range that could maintain the meniscus at the discharge port 19, is temporarily reduced to -30 kPa. Then, the meniscus collapses as a gas-liquid mixture is sucked from the discharge port 19. At this time, foreign matter present in the discharge port 19 and the small liquid chamber 20 moves into the storage section 15 together with the gas and liquid.

[0055] Next, in step S3, pressure is applied to the material 8. After the second control valve 134 is closed, only the third control valve 135 is opened, and the pressure of the positive pressure source 132 is applied to the material 8 via the filling liquid 8a, filling the small liquid chamber 20 with the material 8, and the material 8 is discharged from the discharge port 19.

[0056] Thereafter, the pump 44 of the circulation unit 40 is driven to remove foreign matter by the filter 41. Alternatively, the removal of foreign matter by the circulation unit 40 may be performed between steps S2 and S3. Thereafter, the pressure is set to return to the normal slightly negative pressure state, which can stably maintain the meniscus state of the discharged material 8.

[0057] <Second embodiment> In the first embodiment, a configuration was described in which the slightly negative pressure state that can stably maintain the meniscus state of the discharged material 8, the negative pressure state that sucks a gas-liquid mixture into the small liquid chamber 20 and the storage portion 15, and the positive pressure state that discharges the discharged material 8 from the discharge port 19 are controlled by pressure sources that are independently connected to the storage portion 16. In contrast, in the present embodiment, there is only one pipe that connects the storage portion 16 and the pressure control portion 13. This makes it possible to reduce the size of the device and simplify the design and manufacture.

[0058] In the first embodiment, the negative pressure source 131 and the positive pressure source 132 are each configured to be switched by a single control valve. In contrast, in this embodiment, separate control valves are provided at the ends of the respective control valves, and the pressure between the control valves is compressed or expanded, and then the control valves are opened to change the pressure in one go. This improves the responsiveness of the pressure control.

[0059] FIG. 7 is a diagram showing the configuration of the pressure control unit 13 in this embodiment.

[0060] 7, a negative pressure source 131 and a positive pressure source 132 are connected to the meniscus control unit 27. The negative pressure source 131 and the positive pressure source 132 are arranged in parallel, and a third control valve 135 and a fourth control valve 136 are connected to them, respectively. Furthermore, a second control valve 134 is arranged between the third control valve 135 and the fourth control valve 136 and the meniscus control unit 27. A first control valve 133 is also arranged in the meniscus control unit 27.

[0061] Next, the cleaning process in this embodiment will be described with reference to a flowchart of FIG.

[0062] First, in the normal ejection operation state of the liquid ejection device 10 without performing the cleaning operation of the ejection surface in step S11, the first control valve 133 is open, and the second control valve 134, the third control valve 135, and the fourth control valve 136 are closed.

[0063] From there, as already explained, the liquid ejection device 10 is moved to the standby position, and the state of clogging of the ejection ports 19 is inspected by the inspection oscillation of the energy generating elements 18 at a timing when the ejection operation is not being performed. If an abnormality is found, the process proceeds to a cleaning process. If no abnormality is found, the device is returned to the ejection position and the desired ejection is performed.

[0064] In the cleaning process, preparation for suction is performed in step S12. The second control valve 134 and the fourth control valve 136 are kept closed, and the third control valve 135 is opened. At this time, the negative pressure source 131 is set so that the second pressure sensor 141, which indicates the pressure in the pipe connecting the second control valve 134, the third control valve 135, and the fourth control valve 136, indicates -30 kPa, for example.

[0065] Next, in step S13, suction is performed. After closing the first control valve 133 and the third control valve 135, only the second control valve 134 is opened. As a result, the pressure of the discharge material 8, which had been controlled to a range that could maintain the meniscus at the discharge port 19, is temporarily reduced to -30 kPa. Then, the meniscus is collapsed by suctioning the gas-liquid mixture from the discharge port 19. At this time, foreign matter present in the discharge port 19 and the small liquid chamber 20 moves into the storage section 15 together with the gas and liquid.

[0066] Next, in step S14, preparation for pressurization is performed. After closing the second control valve 134, only the fourth control valve 136 is opened. At this time, the positive pressure source 132 is set so that the second pressure sensor 141, which indicates the pressure in the pipe connecting the second control valve 134, the third control valve 135, and the fourth control valve 136, indicates +30 kPa, for example.

[0067] Next, in step S15, pressure is applied to the material 8. After the fourth control valve 136 is closed, only the second control valve 134 is opened, and the pressure of the positive pressure source 132 is applied to the material 8 via the filling liquid 8a, filling the small liquid chamber 20 with the material 8, and the material 8 is discharged from the discharge port 19.

[0068] Thereafter, the pump 44 of the circulation unit 40 is driven to remove the foreign matter by the filter 41. Alternatively, the removal of the foreign matter by the circulation unit 40 may be carried out between steps S13 and S14.

[0069] It has been described that the liquid ejection device 10 of this embodiment executes the cleaning operation in the order of steps S12 to S15. However, instead, the following may be done. First, the first control valve 133 is closed and the second control valve 134 is switched to open. Then, during suction, the third control valve 135 is switched to open while the fourth control valve 136 is closed. Furthermore, during pressurization, the fourth control valve 136 is switched to open while the third control valve 135 is closed. In this case, the first pressure sensor 140 is set to temporarily read -30 kPa during suction and temporarily read +30 kPa during pressurization.

[0070] Furthermore, in the liquid ejection device 10 of this embodiment, the pipes connected from the negative pressure source 131 and the positive pressure source 132 are located above the liquid surface in the supply tank 26. However, they may be connected to the liquid in the supply tank 26. In other words, the fluid in the pipes is not limited to gas, and may be liquid.

[0071] Furthermore, instead of using the third and fourth control valves, one three-way valve may serve both functions.

[0072] After step S15, the process returns to step S11, which is the normal slightly negative pressure state.

[0073] <Third embodiment> In the second embodiment, gas is supplied into the piping connecting the second control valve 134, the third control valve 135, and the fourth control valve 136. In contrast, in this embodiment, liquid is supplied into the piping. Gas, which is a compressible fluid, changes its internal volume, but liquid, which is an incompressible fluid, hardly changes its internal volume. This improves the responsiveness of pressure control compared to when the piping is filled with gas.

[0074] FIG. 9 is a diagram showing the configuration of the pressure control unit 13 in this embodiment.

[0075] 9, a negative pressure source 131 and a positive pressure source 132 are arranged in parallel with the meniscus control unit 27. A first control valve 133 is provided between the meniscus control unit 27 and the storage unit 16. Separate from the meniscus control unit 27, the negative pressure source 131 and the positive pressure source 132 are connected in parallel to the end of a pipe connected to the storage unit 15. A third control valve 135 and a fourth control valve 136 are provided for the negative pressure source 131 and the positive pressure source 132, respectively, and the sources join at the end. A second control valve 134 is provided between the meniscus control unit 27 and the storage unit 16.

[0076] The role of the first control valve 133 in this embodiment is the same as that of the second embodiment in that it closes the meniscus control section 27, which maintains a slightly negative pressure state, from a state open to the atmosphere in order to switch between a negative pressure state and a positive pressure state. The other pressure control sections have the same basic role as those in the second embodiment, except that the fluid supplied into the piping is either gas or liquid.

[0077] Therefore, the flowchart of the cleaning operation is the same as that of the second embodiment shown in FIG.

[0078] (Other embodiments) The present invention can also be realized by supplying a program that realizes one or more functions of the above-described embodiments to a system or device via a network or a storage medium, and having one or more processors in the computer of the system or device read and execute the program.The present invention can also be realized by a circuit (e.g., ASIC) that realizes one or more functions.

[0079] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0080] 8: Discharged material, 10: Liquid discharge device, 11: Discharge section, 12: Storage container, 13: Pressure control section, 14: Separation membrane, 15, 16: Storage section, 18: Energy generating element, 19: Discharge port, 20: Small liquid chamber, 21: Supply port

Claims

1. A storage section for storing the discharged material; A discharge port communicating with the storage portion and configured to discharge the material stored in the storage portion; a small liquid chamber that communicates the discharge port and the storage portion; a pressure control means for controlling the pressure of the discharge material contained in the container; The liquid ejection device is characterized in that the pressure control means controls the pressure of the ejection material to transition from a first negative pressure state to a second negative pressure state having a greater negative pressure than the first negative pressure state, and then to a third positive pressure state.

2. 2. The liquid ejection device according to claim 1, wherein the first negative pressure state is a state in which a negative pressure for maintaining a meniscus of the ejection material at the ejection port is generated.

3. 3. The liquid ejection apparatus according to claim 1, wherein the second negative pressure state is a state in which a negative pressure greater than a meniscus force of the ejection port is generated.

4. 4. The liquid ejection device according to claim 1, wherein the third positive pressure state is a state in which a positive pressure for ejecting the ejection material from the ejection port is generated.

5. A liquid ejection device as described in any one of claims 1 to 4, characterized in that the pressure control means has a first pressure generating unit for generating the first negative pressure state, a second pressure generating unit connected to the storage unit independently of the first pressure generating unit for generating the second negative pressure state, and a third pressure generating unit connected to the storage unit independently of the first and second pressure generating units for generating the third positive pressure state.

6. A liquid ejection device as described in claim 5, characterized in that a first control valve is arranged between the first pressure generating unit and the storage unit, a second control valve is arranged between the second pressure generating unit and the storage unit, and a third control valve is arranged between the third pressure generating unit and the storage unit.

7. The liquid ejection device according to claim 6, characterized in that the pressure control means forms the second negative pressure state by closing the first control valve and the third control valve and opening the second control valve, and forms the third positive pressure state by closing the first control valve and the second control valve and opening the third control valve.

8. A liquid ejection device as described in any one of claims 1 to 4, characterized in that the pressure control means has a first pressure generating unit for generating the first negative pressure state, a second pressure generating unit connected to the first pressure generating unit for generating the second negative pressure state, and a third pressure generating unit connected to the first pressure generating unit for generating the third positive pressure state.

9. The liquid ejection device according to claim 8, characterized in that the second pressure generating unit has a second pipe, the third pressure generating unit has a third pipe, and a first pipe formed by joining the second pipe and the third pipe is connected to the first pressure generating unit.

10. 10. The liquid ejection device according to claim 9, wherein a third control valve is disposed in the second pipe, a fourth control valve is disposed in the third pipe, and a second control valve is disposed in the first pipe.

11. The liquid ejection device according to claim 10, characterized in that the pressure control means creates the second negative pressure state by closing the second control valve and the fourth control valve, opening the third control valve, then closing the third control valve, and then opening the second control valve.

12. The liquid ejection device according to claim 10, characterized in that the pressure control means forms the third positive pressure state by closing the second control valve and the third control valve, opening the fourth control valve, thereafter closing the fourth control valve, and then opening the second control valve.

13. 13. The liquid ejection apparatus according to claim 9, further comprising a first detection unit for detecting an internal pressure of the first pressure generating portion.

14. 14. The liquid ejection device according to claim 9, further comprising a second detection means for detecting a pressure inside the first pipe.

15. A liquid ejection device as described in any one of claims 1 to 4, characterized in that the pressure control means has a first pressure generating unit for generating the first negative pressure state, a second pressure generating unit connected to the storage unit independently of the first pressure generating unit for generating the second negative pressure state, and a third pressure generating unit connected to the storage unit independently of the first pressure generating unit for generating the third positive pressure state.

16. The liquid ejection device according to claim 15, characterized in that the second pressure generating unit has a second pipe, the third pressure generating unit has a third pipe, and a first pipe formed by joining the second pipe and the third pipe is connected to the storage unit.

17. 17. The liquid ejection device according to claim 16, wherein a third control valve is disposed in the second pipe, a fourth control valve is disposed in the third pipe, and a second control valve is disposed in the first pipe.

18. 18. The liquid ejection apparatus according to claim 16, wherein the first to third pipes are supplied with liquid.

19. 19. The liquid ejection device according to claim 1, further comprising: a pump connected to the container for circulating the material to be ejected; and a filter for filtering the material to be ejected.

20. 20. The liquid ejection apparatus according to claim 1, further comprising a degassing unit for degassing the ejection material.

21. 21. The liquid ejection device according to claim 1, further comprising a recovery unit that recovers residual liquid on an ejection surface having the ejection ports after transitioning from the third positive pressure state to the first negative pressure state.

22. 22. The liquid ejection apparatus according to claim 1, further comprising an abnormality detection unit that detects abnormality in ejection from the ejection port.

23. A liquid ejection device according to any one of claims 1 to 22, a molding means for pressing a mold having a pattern against the imprint material applied onto the substrate by the liquid ejection device to mold the imprint material, hardening the imprint material, and then releasing the mold; An imprint apparatus comprising: