Method for manufacturing substrate with cured film, substrate with cured film, photosensitive resin composition, cured film formed by curing photosensitive resin composition, and display device having cured film or substrate with cured film
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- NIPPON STEEL CHEM & MATERIAL CO LTD
- Filing Date
- 2024-09-25
- Publication Date
- 2026-06-12
AI Technical Summary
Existing photosensitive resin compositions for forming patterns on plastic substrates and organic devices suffer from insufficient film strength, solvent resistance, and adhesion issues, particularly when used at both high and low temperatures, leading to film thinning, surface roughness, and pattern peeling.
A photosensitive resin composition containing alkali-soluble resins with unsaturated groups, photopolymerizable monomers, and metal oxide fine particles is applied, exposed, and developed to form a cured film pattern, which is then cured at temperatures up to 150°C, ensuring excellent adhesion, solvent resistance, and light scattering properties.
The composition achieves a cured film with improved adhesion, solvent resistance, and light scattering properties, suitable for both high and low-temperature applications, enhancing the performance of display devices.
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