Resist composition, resist pattern forming method, compound, and acid generator

Abstract

This resist composition contains an alkali-soluble resin (A), an acid generator (B), and a crosslinking agent (C). The acid generator (B) contains a compound (B0) represented by general formula (b0). In the formula, X0 represents a nitrogen atom or CRX0. Y0 represents a nitrogen atom or CRY0. Z0 represents a nitrogen atom or CRZ0. C represents a carbon atom. RX0, RY0, RZ0, and R0 each independently represent a hydrogen atom or a substituent. Two or more of RX0, RY0, RZ0, and R0 may be bonded to each other to form a ring structure. m is an integer of 1 or greater, and Mm+ represents an m-valent cation.

Description

Resist composition, resist pattern formation method, compound, and acid generator 【0001】 The present invention relates to a resist composition, a resist pattern forming method, a compound, and an acid generator. This application claims priority under Japanese Patent Application No. 2024-211593, filed in Japan on December 4, 2024, the contents of which are incorporated herein by reference. 【0002】 In recent years, advances in lithography technology have led to rapid miniaturization of patterns in the manufacturing of semiconductor devices and liquid crystal display elements. Generally, miniaturization is achieved by shortening the wavelength (increasing the energy) of the exposure light source. 【0003】 Resist materials are required to possess lithography characteristics such as sensitivity to these exposure light sources and resolution capable of reproducing patterns of fine dimensions. Conventionally, chemically amplified resist compositions have been used as resist materials that satisfy these requirements, containing a base component whose solubility in the developer solution changes due to the action of acid, and an acid generator component that generates acid upon exposure. 【0004】 In chemically amplified resist compositions, resins with specific structural units are generally used as the base component to improve lithography properties. Furthermore, in the formation of resist patterns, the behavior of acids generated from acid generator components upon exposure is also considered a factor that significantly affects lithography properties. A wide variety of acid generators have been proposed for use in chemically amplified resist compositions. For example, onium salt-based acid generators such as iodonium salts and sulfonium salts, oxime sulfonate-based acid generators, diazomethane-based acid generators, nitrobenzyl sulfonate-based acid generators, iminosulfonate-based acid generators, and disulfone-based acid generators are known. 【0005】In the manufacturing of semiconductor packages, MEMS, etc., there is a process of forming a thick resist film on the surface of the workpiece to create a resist pattern and then performing etching, etc. When a chemically amplified resist composition is used in this process, as the thickness of the resist film increases, it becomes difficult to maintain sensitivity during exposure, the resolution for development decreases, and it becomes difficult to obtain the desired resist pattern shape. In addition, as the thickness of the resist film increases, cracks are more likely to occur in the resist pattern. 【0006】 Patent Document 1 proposes a resist composition containing a base component and a specific amount of polyether compound, with a solid content concentration of 25% by mass or more. It is disclosed that this resist composition can form a thick resist film, is less prone to cracking, and can form a resist pattern with good resolution. 【0007】 Japanese Patent Publication No. 2021-033158 【0008】 In conventional resists, there is a need for further improvements to enhance lithography characteristics such as high sensitivity, resolution, and CDU, regardless of the resist film thickness. 【0009】 The present invention has been made in view of the above circumstances, and aims to provide a resist composition that is highly sensitive and capable of forming a resist pattern with good resolution and CDU, a method for forming a resist pattern using the resist composition, a compound that can be used in the resist composition, and an acid generator that can be used in the resist composition. 【0010】 The present invention includes the following embodiments. The first embodiment of the present invention is a resist composition containing an alkali-soluble resin (A), an acid generator (B), and a crosslinking agent (C), wherein the acid generator (B) contains a compound (B0) represented by the following general formula (b0). 【0011】 [In the formula, X ０ is a nitrogen atom or CR Ｘ０ Represents Y ０ is a nitrogen atom or CR Ｙ０ It represents Z. ０ is a nitrogen atom or CRＺ０ represents. C represents a carbon atom. R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ each independently represents a hydrogen atom or a substituent. R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ two or more of may combine with each other to form a ring structure. m is an integer of 1 or more, and M ｍ＋ represents an m-valent cation. ] 【0012】 A second aspect of the present invention is a resist pattern forming method having a step of forming a resist film on a support using the resist composition according to the first aspect, a step of exposing the resist film, and a step of developing the exposed resist film to form a resist pattern. 【0013】 A third aspect of the present invention is a compound represented by the following general formula (b0-1). 【0014】 [In the formula, R ０１１ and R ０１２ each independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ represents an m-valent cation. ] 【0015】 A fourth aspect of the present invention is a compound represented by the following general formula (b0-2). 【0016】 [In the formula, z ０２１ and z ０２２ represent an oxygen atom or a sulfur atom. x ０２１ , x ０２２ , y ０２１ and y ０２２ each independently represents C(R ０２１ )(R ０２２ ), C=O or C=S. C represents a carbon atom. R ０２１ and R ０２２ each independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ represents an m-valent cation. ] 【0017】A fifth aspect of the present invention is an acid generator comprising a compound according to the third or fourth aspect. 【0018】 According to the present invention, it is possible to provide a resist composition capable of forming a resist pattern with good sensitivity, resolution, and CDU, a method for forming a resist pattern using the resist composition, a compound usable in the resist composition, and an acid generator usable in the resist composition. 【0019】 In this specification and in the claims, “aliphatic” is defined as a concept relative to aromatic, meaning a group, compound, etc. that does not possess aromaticity. Unless otherwise specified, “alkyl group” includes linear, branched, and cyclic monovalent saturated hydrocarbon groups. The same applies to alkyl groups in alkoxy groups. Unless otherwise specified, “alkylene group” includes linear, branched, and cyclic divalent saturated hydrocarbon groups. “Halogen atom” includes fluorine, chlorine, bromine, and iodine atoms. “Constituent unit” means a monomer unit (monomer unit) that constitutes a polymer compound (resin, polymer, copolymer). When it is stated that “may have substituents,” this refers to the substitution of a hydrogen atom (-H) with a monovalent group, or a methylene group (-CH ２ This includes both cases where the negative (-) is substituted with a divalent group. "Exposure" is a concept that includes all forms of radiation irradiation. 【0020】 Hereinafter, "resin," "polymer compound," or "polymer" refers to polymers with a molecular weight of 1000 or more. The molecular weight of polymers shall be the weight-average molecular weight on a polystyrene basis, calculated by GPC (gel permeation chromatography). Nonpolymers typically have a molecular weight of 500 or more and less than 4000. Hereinafter, "low molecular weight compound" refers to nonpolymers with a molecular weight of 500 or more and less than 4000. Polymers typically have a molecular weight of 1000 or more. 【0021】 "Induced structural units" refer to structural units formed by the cleavage of multiple bonds between carbon atoms, such as ethylenic double bonds. 【0022】The term "derivative" refers to a compound in which the α-position hydrogen atom of the target compound is substituted with another substituent such as an alkyl group or alkyl halide, as well as derivatives thereof. Examples of such derivatives include those in which the hydrogen atom of the hydroxyl group of the target compound (which may have the α-position hydrogen atom substituted with a substituent) is substituted with an organic group; and those in which a substituent other than a hydroxyl group is bonded to the target compound (which may have the α-position hydrogen atom substituted with a substituent). Unless otherwise specified, the α-position refers to the first carbon atom adjacent to the functional group. 【0023】 In this specification and in the claims, depending on the structure represented by the chemical formula, an asymmetric carbon may be present, and enantioisomers and diastereoisomers may exist. In such cases, a single chemical formula will represent all of these isomers. These isomers may be used individually or as a mixture. 【0024】 (Resist Composition) The resist composition of this embodiment contains an alkali-soluble resin (A) (hereinafter also referred to as "component (A)"), an acid generator (B) (hereinafter also referred to as "component (B)"), and a crosslinking agent (C) (hereinafter also referred to as "component (C)"). 【0025】 When a resist film is formed using the resist composition of this embodiment and selectively exposed to light, acid is generated from component (B) in the exposed areas of the resist film. Due to the action of this acid, components (A) are linked together via component (C), and the solubility of the exposed areas of the resist film in alkaline developer decreases. Therefore, when a resist film obtained by coating a support with the resist composition of this embodiment is selectively exposed to light during the formation of a resist pattern, the exposed areas of the resist film become poorly soluble in alkaline developer, while the unexposed areas of the resist film remain soluble in alkaline developer. Thus, a negative-type resist pattern is formed by developing with alkaline developer. 【0026】<Component (A)> Component (A) is a base material component whose solubility in the developer changes due to the action of an acid. In the present invention, the "base material component" is an organic compound having film-forming ability, and preferably an organic compound with a molecular weight of 500 or more is used. By having a molecular weight of 500 or more of the organic compound, the film-forming ability is improved, and in addition, it becomes easier to form nano-level resist patterns. Organic compounds used as base material components are broadly classified into nonpolymers and polymers. Nonpolymers usually have a molecular weight of 500 or more and less than 4000. Hereinafter, "low molecular weight compound" refers to a nonpolymer with a molecular weight of 500 or more and less than 4000. Polymers usually have a molecular weight of 1000 or more. Hereinafter, "resin," "high molecular weight compound," or "polymer" refers to a polymer with a molecular weight of 1000 or more. As for the molecular weight of the polymer, the weight-average molecular weight in terms of polystyrene obtained by GPC (gel permeation chromatography) shall be used. 【0027】 In the resist composition of this embodiment, component (A) includes at least a polymer compound (A1) having a constituent unit (a10) represented by the general formula (a0-1), and other polymer compounds and / or low molecular weight compounds may be used in combination. When a resist film is formed using a resist composition containing at least component (A1), and the resist film is selectively exposed, acid is generated from component (B1) in the exposed area of ​​the resist film. Due to the action of this acid, crosslinking occurs between components (A1) via the crosslinkable constituent unit (a10), and as a result, the solubility of the exposed area of ​​the resist film in alkaline developer decreases. Therefore, when a resist film obtained by coating the resist composition of this embodiment onto a support is selectively exposed during the formation of a resist pattern, the exposed area of ​​the resist film becomes poorly soluble in alkaline developer, while the unexposed area of ​​the resist film remains soluble in alkaline developer. Thus, a negative-type resist pattern is formed by developing with alkaline developer. 【0028】 Constituent unit (a10): Constituent unit (a10) is a constituent unit represented by the following general formula (a10-1). 【0029】 [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. Ya ｘ１ Wa is a single bond or a divalent linking group. ｘ１ n is an aromatic hydrocarbon group which may have substituents. ａｘ１ [ is an integer greater than or equal to 1.] 【0030】 In formula (a10-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. The alkyl group having 1 to 5 carbon atoms in R is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, specifically including methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups. The halogenated alkyl group having 1 to 5 carbon atoms in R is a group in which some or all of the hydrogen atoms of the alkyl group having 1 to 5 carbon atoms are substituted with halogen atoms. The halogen atom is particularly preferably a fluorine atom. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms, and from the perspective of industrial availability, a hydrogen atom, a methyl group, or a trifluoromethyl group is more preferred, a hydrogen atom or a methyl group is even more preferred, and a hydrogen atom is particularly preferred. 【0031】 In the above formula (a10-1), Ya ｘ１ is a single bond or a divalent linking group. In the above chemical formula, Ya ｘ１ The divalent linking group in this is not particularly limited, but suitable examples include divalent hydrocarbon groups which may have substituents, and divalent linking groups which contain heteroatoms. 【0032】 - Divalent hydrocarbon groups which may have substituents: Divalent hydrocarbon groups which may have substituents may be aliphatic hydrocarbon groups or aromatic groups. 【0033】...Aliphatic hydrocarbon group An aliphatic hydrocarbon group means a hydrocarbon group that does not possess aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferred to be saturated. Examples of the aliphatic hydrocarbon group include linear or branched aliphatic hydrocarbon groups, or aliphatic hydrocarbon groups that contain a ring in their structure. 【0034】 ...Linear or branched aliphatic hydrocarbon group The linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferred, specifically a methylene group [-CH ２ -], ethylene group [- (CH ２ ) ２ -], trimethylene group [-(CH ２ ) ３ -], tetramethylene group [-(CH ２ ) ４ -], pentamethylene group [-(CH ２ ) ５ Examples include -]. The branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, even more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. A branched alkylene group is preferred as the branched aliphatic hydrocarbon group, specifically -CH(CH ３ )-,-CH(CH ２ CH ３ )-,-C(CH ３ ) ２ -, -C(CH ３ ) (CH ２ CH ３ )-,-C(CH ３ ) (CH ２ CH ２ CH ３ )-,-C(CH ２ CH ３ ) ２ - Alkyl methylene groups such as -CH(CH ３ )CH ２ -, -CH(CH ３ )CH(CH ３)-,-C(CH ３ ) ２ CH ２ -, -CH(CH ２ CH ３ )CH ２ -, -C(CH ２ CH ３ ) ２ -CH ２ - Alkyl ethylene groups such as -CH(CH ３ )CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ - Alkyl trimethylene groups such as -CH(CH ３ )CH ２ CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ CH ２ Examples include alkylalkylene groups such as alkyltetramethylene groups. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred. 【0035】 The linear or branched aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms substituted with fluorine atoms, and carbonyl groups. 【0036】...Aliphatic hydrocarbon groups containing a ring in their structure Examples of aliphatic hydrocarbon groups containing a ring in their structure include cyclic aliphatic hydrocarbon groups (groups obtained by removing two hydrogen atoms from an aliphatic hydrocarbon ring), which may contain substituents containing heteroatoms in their ring structure; groups in which the cyclic aliphatic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group; and groups in which the cyclic aliphatic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group are the same as those described above. The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably has 3 to 12 carbon atoms. The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. As a monocyclic alicyclic hydrocarbon group, a group obtained by removing two hydrogen atoms from a monocycloalkane is preferred. As a monocycloalkane, those having 3 to 6 carbon atoms are preferred, and specifically examples include cyclopentane and cyclohexane. As for the polycyclic alicyclic hydrocarbon group, a group obtained by removing two hydrogen atoms from a polycycloalkane is preferred, and as the polycycloalkane, those having 7 to 12 carbon atoms are preferred, specifically adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ Examples include decane and tetracyclododecane. 【0037】The cyclic aliphatic hydrocarbon group may or may not have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, and the like. The alkyl group as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. The alkoxy group as the substituent is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, or a tert-butoxy group, and even more preferably a methoxy group or an ethoxy group. The halogen atom as the substituent is preferably a fluorine atom. The halogenated alkyl group as the substituent includes a group in which some or all of the hydrogen atoms of the alkyl group are substituted with the halogen atom. The cyclic aliphatic hydrocarbon group may have a part of the carbon atoms constituting its ring structure substituted with a substituent containing a hetero atom. Examples of the substituent containing a hetero atom include -O-, -C(=O)-O-, -S-, -S(=O) ２ -, -S(=O) ２ -O- is preferred. 【0038】...Aromatic group The aromatic group is a group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic, polycyclic, or have substituents that substitute for hydrogen atoms on the aromatic ring. Examples of aromatic rings include aromatic hydrocarbon rings and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. The number of carbon atoms in the aromatic hydrocarbon ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms on the aromatic hydrocarbon ring. Specific examples of aromatic hydrocarbon rings include benzene, naphthalene, anthracene, phenanthrene, etc. The number of carbon atoms in the aromatic heterocycle is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12. However, the number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms in the aromatic heterocycle. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. Specific examples of aromatic groups include groups obtained by removing two hydrogen atoms from the aromatic hydrocarbon ring or the aromatic heterocycle (arylene group or heteroarylene group); groups obtained by removing two hydrogen atoms from aromatic compounds containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and groups in which one hydrogen atom of an aryl group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or the aromatic heterocycle (aryl group or heteroaryl group) is substituted with an alkylene group (e.g., groups obtained by removing one more hydrogen atom from the aryl group in arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aryl group or heteroaryl group is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. 【0039】The aromatic group may have a hydrogen atom thereof substituted with a substituent. For example, a hydrogen atom bonded to an aromatic ring in the aromatic group may be substituted with a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, etc. The alkyl group as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. Examples of the alkoxy group, the halogen atom, and the halogenated alkyl group as the substituent include those exemplified as the substituent for substituting a hydrogen atom of the cyclic aliphatic hydrocarbon group. 【0040】 - A divalent linking group containing a heteroatom: Examples of the divalent linking group containing a heteroatom include -O-, -C(=O)-O-, -O-C(=O)-, -C(=O)-, -O-C(=O)-O-, -C(=O)-NH-, -NH-, -NH-C(=NH)-(H may be substituted with a substituent such as an alkyl group or an acyl group), -S-, -S(=O) ２ -, -S(=O) ２ -O-, general formula -Y ２１ -O-Y ２２ -, -Y ２１ -O-, -Y ２１ -C(=O)-O-, -C(=O)-O-Y ２１ -, -[Y ２１ -C(=O)-O] ｍ” -Y ２２ -, -Y ２１ -O-C(=O)-Y ２２ - or -Y ２１ -S(=O) ２ -O-Y ２２ - represented by the formula [wherein Y ２１ and Y ２２Each of these is a divalent hydrocarbon group which may independently have substituents, O is an oxygen atom, and m'' is an integer from 1 to 3. For example, when the divalent linking group containing the heteroatom is -C(=O)-NH-, -C(=O)-NH-C(=O)-, -NH-, -NH-C(=NH)-, the H may be substituted with substituents such as alkyl groups or acyl groups. The substituent (alkyl group, acyl group, etc.) preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and particularly preferably 1 to 5. General formula -Y ２１ -O-Y ２２ -, -Y ２１ -O-, -Y ２１ -C(=O)-O-, -C(=O)-O-Y ２１ -, -[Y ２１ -C (=O) -O] ｍ” -Y ２２ -, -Y ２１ -OC(=O)-Y ２２ - or - Y ２１ -S (=O) ２ -O-Y ２２ - Middle, Y ２１ and Y ２２ Each of these is independently a divalent hydrocarbon group which may have substituents. Examples of such divalent hydrocarbon groups are those described above. ２１ Preferably, a linear aliphatic hydrocarbon group is preferred, a linear alkylene group is more preferred, a linear alkylene group having 1 to 5 carbon atoms is even more preferred, and a methylene group or ethylene group is particularly preferred. ２２ Preferably, the group is a linear or branched aliphatic hydrocarbon group, more preferably a methylene group, an ethylene group, or an alkylmethylene group. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group. Formula - [Y ２１ -C (=O) -O] ｍ” -Y ２２ In the base represented by -, m'' is an integer from 1 to 3, preferably 1 or 2, and more preferably 1. That is, formula -[Y ２１ -C (=O) -O] ｍ”-Y ２２ As a base represented by -, see formula -Y ２１ -C(=O)-O-Y ２２ Groups represented by - are particularly preferred. Among them, the group represented by formula - (CH ２ ) ａ’ -C(=O)-O-(CH ２ ) ｂ’ A base represented by - is preferred. In the formula, a' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1. b' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1. 【0041】 Ya ｘ１ Preferred members include single bonds, ester bonds [-C(=O)-O-, -O-C(=O)-], ether bonds (-O-), linear or branched alkylene groups, or combinations thereof, with single bonds and ester bonds [-C(=O)-O-, -O-C(=O)-] being more preferred. 【0042】 In the above formula (a10-1), Wa ｘ１ It is an aromatic group. Wa ｘ１ The aromatic group in this case is an aromatic ring which may have substituents (n ａｘ１ A group with 1+1 hydrogen atoms removed is an example. The aromatic ring here is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons. The number of carbon atoms in the aromatic ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. Wa ｘ１ The number of carbon atoms in the aromatic group is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12.ｘ１ The aromatic group in this can be an aromatic compound containing an aromatic ring which may have two or more substituents (e.g., biphenyl, fluorene, etc.) (n ａｘ１ A group with 1) hydrogen atoms removed can also be cited. Among the above, Wa ｘ１ For example, (n ａｘ１ A group with (+1) hydrogen atoms removed is preferred, and (n ａｘ１ A group with (+1) hydrogen atoms removed is more preferable, and from benzene (n ａｘ１ A group with 1) hydrogen atoms removed is even more preferable. 【0043】 Wa ｘ１ The aromatic group in may or may not have substituents. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, and alkyl halides. Examples of alkyl groups, alkoxy groups, halogen atoms, and alkyl halides as substituents include Ya ｘ１ Examples of substituents for cyclic aliphatic hydrocarbon groups in the above are similar to those listed above. The substituents are preferably linear or branched alkyl groups having 1 to 5 carbon atoms, more preferably linear or branched alkyl groups having 1 to 3 carbon atoms, even more preferably ethyl or methyl groups, and particularly preferably methyl groups. Wa ｘ１ In this case, the aromatic group preferably has no substituents. 【0044】 In the above formula (a10-1), n ａｘ１ is an integer of 1 or more, preferably an integer from 1 to 10, more preferably an integer from 1 to 5, even more preferably 1, 2, or 3, and particularly preferably 1 or 2. 【0045】 The following are specific examples of the constituent unit (a10) represented by the above formula (a10-1). In each of the following formulas, R α represents a hydrogen atom, a methyl group, or a trifluoromethyl group. 【0046】 【0047】 【0048】 【0049】 The constituent unit (a10) of component (A1) may be one type or two or more types. Component (A1) may or may not have constituent unit (a10), but it is preferable that it has constituent unit (a10). When component (A1) has constituent unit (a10), the proportion of constituent unit (a10) in component (A1) is preferably 40 to 100 mol%, more preferably 50 to 100 mol%, and even more preferably 60 to 100 mol%, relative to the total (100 mol%) of all constituent units that make up component (A1). Setting the proportion of constituent unit (a10) above the lower limit improves resolution and CDU. On the other hand, setting it below the upper limit makes it easier to balance with other constituent units. 【0050】 <Other constituent units> Component (A1) may have other constituent units as needed, in addition to the constituent unit (a10) described above. Examples of other constituent units include a constituent unit (a11) derived from compounds containing an aromatic ring (excluding aromatic rings to which a hydroxyl group is attached) in the side chain, and the constituent unit (a12) described later. 【0051】 Constituent unit (a11): Constituent unit (a11) is derived from compounds containing an aromatic ring (excluding aromatic rings to which a hydroxyl group is attached) in the side chain. Suitable examples of compounds containing an aromatic ring (excluding aromatic rings to which a hydroxyl group is attached) in the side chain include compounds represented by the following general formula (a11-1). 【0052】 [In formula (a11-1), Ra ｘ２ Wa is a polymerizable group-containing group. ｘ２ is, (n ａｘ２ It is a +1) valent aromatic group. However, Ra ｘ２ and Wa ｘ２ A condensed ring structure may be formed. Ra ｘ０２ Wa ｘ２ These are substituents that substitute for hydrogen atoms that make up an aromatic hydrocarbon group. ａｘ２ n is an integer between 0 and 3. ａｘ２ If there are two or more, multiple Ra ｘ０２These may bond to each other to form a ring structure. 【0053】 In the above formula (a11-1), Ra ｘ２ Ra is a polymerizable group-containing group. ｘ２ In this context, "polymerizable group" refers to a group that enables a compound having a polymerizable group to be polymerized by radical polymerization or the like, and includes, for example, a group containing multiple bonds between carbon atoms, such as an ethylenic double bond. Examples of polymerizable groups include vinyl group, allyl group, acryloyl group, methacryloyl group, fluorovinyl group, difluorovinyl group, trifluorotrifluoromethylvinyl group, trifluoroallyl group, perfluoroallyl group, trifluoromethylacryloyl group, nonylfluorobutylacryloyl group, vinyl ether group, fluorine-containing vinyl ether group, allyl ether group, fluorine-containing allyl ether group, styryl group, vinylnaphthyl group, fluorine-containing styryl group, fluorine-containing vinylnaphthyl group, norbornyl group, fluorine-containing norbornyl group, and silyl group. A polymerizable group-containing group may be a group composed solely of polymerizable groups, or a group composed of a polymerizable group and other groups other than the polymerizable group. Other groups besides the polymerizable group include divalent hydrocarbon groups which may have substituents, and divalent linking groups which contain heteroatoms. 【0054】 Ra ｘ２ For example, the chemical formula is CH ２ = C(R) - Ya ｘ０ A group represented by - is preferably mentioned. In this chemical formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms, and Ya ｘ０ It is a divalent linking group. 【0055】 In the above formula (a11-1), Wa ｘ２ is, (n ａｘ２ It is a +1) valent aromatic group, and Wa in (a10-1) ｘ１ Similar examples include the above. 【0056】 However, Ra ｘ２ and Wa ｘ２ A condensed ring structure may be formed. Ra ｘ２ and Wa ｘ２When a condensed ring structure is formed with, the condensed ring structure contains Wa ｘ２ It contains aromatic rings derived from Ra ｘ２ The multiple bonds between carbon atoms in the polymerizable group derived from cleave to form the main chain of component (A1). In other words, some of the carbon atoms constituting the fused ring constitute the main chain of component (A1). 【0057】 In the above formula (a11-1), Ra ｘ０２ Wa ｘ２ It is a substituent that substitutes for a hydrogen atom constituting an aromatic group. ｘ０２ Examples of substituents in this include alkyl groups, alkoxy groups, and acyloxy groups. ｘ０２ The alkyl group used as a substituent in is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, ethyl group, propyl group, n-butyl group, or tert-butyl group. ｘ０２ The alkoxy group used as a substituent in is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, ethoxy group, n-propoxy group, iso-propoxy group, n-butoxy group, or tert-butoxy group, and particularly preferably a methoxy group or an ethoxy group. ｘ０２ The acyloxy group as a substituent in CH is preferably one that has 2 to 6 carbon atoms. ３ C(=O)-O-(acetoxy group), C ２ H ５ C(=O)-O- is more preferred, CH ３ C(=O)-O-(acetoxy group) is particularly preferred. 【0058】 In the above formula (a11-1), n ａｘ２ n is an integer between 0 and 3, preferably 0, 1, or 2, and more preferably 0 or 1. ａｘ２ If there are two or more, multiple Ra ｘ０２ These may bond to each other to form a ring structure. The ring structure formed here may be a hydrocarbon ring or a heterocycle. For example, Wa ｘ２ Two Ra that are bonded to the same aromatic ring in ｘ０２ And these two Ra ｘ０２ The aromatic ring (Wa ｘ２One example is a ring structure formed by one side (bond between carbon atoms) of the ) and . 【0059】 Suitable examples of such constituent units (a11) include those represented by the following general formulas (a11-u1-1) to (a11-u1-6). 【0060】 [In the formula, R α R is a hydrogen atom, a methyl group, or a trifluoromethyl group. β n is an alkyl group, an alkoxy group, or an acyloxy group. ａｘ２ n is an integer between 0 and 3. ａｘ２ If there are two or more, multiple R β These elements may bond to each other to form a ring structure. ２１ , n ２２ , n ２４ and n ２５ Each of these is independently either 0 or 1. ２３ and n ２６ Each of these is independently either 1 or 2. 【0061】 In the above equations (a11-u1-1) to (a11-u1-6), R β The alkyl group, alkoxy group, and acyloxy group in formula (a11-1) are Ra ｘ０２ The substituents in the above are the same as the alkyl groups, alkoxy groups, and acyloxy groups exemplified above. 【0062】 The following are specific examples of constituent units (constituent unit (a11)) derived from the compound represented by the general formula (a11-1). In each of the following formulas, R α This represents a hydrogen atom, a methyl group, or a trifluoromethyl group. 【0063】 【0064】 【0065】 【0066】 【0067】 【0068】Among the above examples, the constituent unit (a11) is preferably at least one selected from the group consisting of constituent units represented by general formulas (a11-u1-1) to (a11-u1-3), with the constituent unit represented by general formula (a11-u1-1) being more preferred. Among these, the constituent unit (a11) is preferably a constituent unit represented by any of the chemical formulas (a11-u1-11), (a11-u1-21), or (a11-u1-31). 【0069】 The constituent unit (a11) of component (A1) may be one type or two or more types. When component (A1) has constituent unit (a11), the proportion of constituent unit (a11) in component (A1) is preferably 1 to 50 mol%, more preferably 1 to 40 mol%, even more preferably 1 to 35 mol%, and particularly preferably 1 to 30 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). Setting the proportion of constituent unit (a11) above the lower limit improves resolution and CDU. On the other hand, setting it below the upper limit makes it easier to balance with other constituent units. 【0070】Constituent unit (a12): Compounds that derive constituent unit (a12) include, for example, monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, and itaconic acid; methacrylic acid derivatives having a carboxyl group and ester bond, such as 2-methacryloyloxyethyl succinic acid, 2-methacryloyloxyethyl maleic acid, 2-methacryloyloxyethyl phthalic acid, and 2-methacryloyloxyethyl hexahydrophthalic acid; methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, adamantyl (meth)acrylate, norbornyl (meth)acrylate, isobornyl (meth)acrylate, tricyclodecyl (meth)acrylate, tetracyclodecyl Examples include alkyl (meth)acrylates such as siltetracyclododecyl (meth)acrylate; hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate; aryl (meth)acrylates such as phenyl (meth)acrylate and benzyl (meth)acrylate; dicarboxylic acid diesters such as diethyl maleate and dibutyl fumarate; vinyl group-containing aliphatic compounds such as vinyl acetate; conjugated diolefins such as butadiene and isoprene; polymerizable compounds containing nitrile groups such as acrylonitrile and methacrylonitrile; chlorine-containing polymerizable compounds such as vinyl chloride and vinylidene chloride; polymerizable compounds containing amide bonds such as acrylamide and methacrylamide; and polymerizable compounds containing epoxy groups. 【0071】 In particular, the constituent unit (a12) represented by the following general formula (a12-1) is more preferred. 【0072】 [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. Ra １２ is an alkyl group or -(R １２１ ) ( OR １２２ ) is R １２１ This is an alkylene group. １２２ It is an alkyl group. 【0073】 In the above formula (a12-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Preferably, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. More preferably, due to the ease of industrial availability, a hydrogen atom, a methyl group, or a trifluoromethyl group, even more preferably a hydrogen atom or a methyl group, and particularly preferably a hydrogen atom. 【0074】 In the above formula (a12-1), Ra １２ Examples of alkyl groups include linear or branched alkyl groups and cyclic alkyl groups. Linear or branched alkyl groups with 1 to 5 carbon atoms are preferred, with methyl, ethyl, or butyl groups being more preferred. Cyclic alkyl groups are preferably cyclopentyl, cyclohexyl, adamantyl, norbornyl, isobornyl, tricyclodecyl, or tetracyclododecyltetracyclododecyl groups, with cyclohexyl or adamantyl groups being more preferred. 【0075】 In the above formula (a12-1), R １２１ The alkylene group in this is Ra １２ Examples include groups obtained by removing one hydrogen atom from alkyl groups. １２２ As for alkyl groups in this case, Ra １２ Examples of alkyl groups similar to the above include: 【0076】 The constituent unit (a12) of component (A1) may be one type or two or more types. When component (A1) has constituent unit (a12), the proportion of constituent unit (a12) in component (A1) is preferably 1 to 60 mol%, more preferably 1 to 50 mol%, even more preferably 1 to 45 mol%, and particularly preferably 1 to 40 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). Setting the proportion of constituent unit (a12) above the lower limit improves resolution and CDU. On the other hand, setting it below the upper limit makes it easier to balance with other constituent units. 【0077】In the resist composition of this embodiment, component (A) includes a polymer compound (A1) having a constituent unit (a10) (component (A1)). Preferred components of (A1) include polymer compounds having at least a constituent unit (a10). Specifically, polymer compounds having a repeating structure of constituent unit (a10) (homopolymers consisting of constituent unit (a10)); polymer compounds having a repeating structure of constituent unit (a10) and constituent unit (a11); and polymer compounds having a repeating structure of constituent unit (a10) and constituent unit (a12) are preferred. 【0078】 In a polymer compound having a repeating structure of constituent units (a10) and constituent units (a11), the proportion of constituent units (a10) is preferably 40 to 99 mol%, more preferably 50 to 99 mol%, and even more preferably 60 to 99 mol%, based on the total amount (100 mol%) of all constituent units constituting the polymer compound. Furthermore, the proportion of constituent units (a11) in the polymer compound is preferably 1 to 60 mol%, more preferably 1 to 50 mol%, and even more preferably 1 to 40 mol%, based on the total amount (100 mol%) of all constituent units constituting the polymer compound. 【0079】 In a polymer compound having a repeating structure of constituent units (a10) and constituent units (a12), the proportion of constituent units (a10) is preferably 40 to 99 mol%, more preferably 50 to 99 mol%, and even more preferably 60 to 99 mol%, based on the total amount (100 mol%) of all constituent units constituting the polymer compound. Furthermore, the proportion of constituent units (a12) in the polymer compound is preferably 1 to 60 mol%, more preferably 1 to 50 mol%, and even more preferably 1 to 40 mol%, based on the total amount (100 mol%) of all constituent units constituting the polymer compound. 【0080】The weight-average molecular weight (Mw) of component (A1) (based on polystyrene equivalent by gel permeation chromatography (GPC)) is not particularly limited, but is preferably 500 to 50,000, more preferably 1,000 to 30,000, and even more preferably 1,000 to 20,000. If the Mw of component (A1) is below the preferred upper limit of this range, it has sufficient solubility in the resist solvent for use as a resist, and if it is above the preferred lower limit of this range, the resolution and CDU are better. 【0081】 (A1) The degree of dispersion (Mw / Mn) of component is not particularly limited, but is preferably 1.0 to 4.0, more preferably 1.0 to 3.0, and particularly preferably 1.0 to 2.5. Mn represents the number-average molecular weight. 【0082】 Such component (A1) can be produced by dissolving monomers that induce each constituent unit in a polymerization solvent, and then adding a radical polymerization initiator such as azobisisobutyronitrile (AIBN) or dimethyl azobisisobutyrate (e.g., V-601) and polymerizing the mixture. Alternatively, such component (A1) can be produced by dissolving monomers that induce constituent unit (a10) and, if necessary, monomers that induce constituent units other than constituent unit (a10) in a polymerization solvent, adding a radical polymerization initiator as described above and polymerizing the mixture, and then carrying out a deprotection reaction. Note that during polymerization, for example, HS-CH ２ -CH ２ -CH ２ -C(CF ３ ) ２ By using a chain transfer agent such as -OH in combination, -C (CF) can be attached to the terminal. ３ ) ２-OH groups may also be introduced. Copolymers into which hydroxyalkyl groups, in which some of the hydrogen atoms of the alkyl group are replaced with fluorine atoms, are introduced are effective in reducing development defects and LER (line edge roughness: uneven unevenness of the line sidewall). In addition, component (A1) can also be produced by anionic polymerization using organoalkali metals such as n-butyllithium, s-butyllithium, t-butyllithium, ethyllithium, ethylsodium, 1,1-diphenylhexyllithium, and 1,1-diphenyl-3-methylpentyllithium as polymerization initiators. 【0083】 Regarding component (A2), the resist composition of this embodiment may also include, as component (A), a base component that does not fall under component (A1) and whose solubility in the developer changes due to the action of an acid (hereinafter referred to as "component (A2)"). Component (A2) is not particularly limited and may be arbitrarily selected from a large number of base components conventionally known for chemically amplified resist compositions. Component (A2) may be a single polymer compound or a low molecular weight compound, or two or more may be used in combination. 【0084】 The proportion of component (A1) in component (A) is preferably 25% by mass or more, more preferably 50% by mass or more, even more preferably 75% by mass or more, and may be 100% by mass, based on the total mass of component (A). When the proportion is 25% by mass or more, it becomes easier to form a resist pattern that is excellent in various lithography characteristics such as high sensitivity, resolution, and roughness improvement. 【0085】 In the resist composition of this embodiment, the content of component (A) may be adjusted according to the resist film thickness to be formed. 【0086】 Compound (B0) Compound (B0) is a compound represented by the following general formula (b0). 【0087】 [In the formula, X ０ is a nitrogen atom or CR Ｘ０ Represents Y ０ is a nitrogen atom or CR Ｙ０ It represents Z. ０ is a nitrogen atom or CRＺ０ This represents C, where C represents a carbon atom. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Each of these independently represents a hydrogen atom or a substituent. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Two or more of these may be linked together to form a ring structure. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 【0088】 {Anion part} In the above formula (b0), X ０ , Y ０ , and Z ０ These may all be nitrogen atoms, two of them may be nitrogen atoms, or one of them may be a nitrogen atom. ０ , Y ０ , and Z ０ One or more of these are CR Ｘ０ CR Ｙ０ or CR Ｚ０ Preferably, two or more of these are CR Ｘ０ CR Ｙ０ or CR Ｚ０ It is more preferable that all of these are CR Ｘ０ CR Ｙ０ or CR Ｚ０ It is even more preferable that this be the case. 【0089】 In the above formula (b0), R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The substituents in include halogen atoms, alkoxy groups, acyl groups, cyano groups, hydroxyl groups, nitro groups, amino groups, carboxyl groups, hydrocarbon groups which may have substituents, and Ra ｘ５ These are some examples. Here, Ra ｘ５ is, -R Ｐ２ -O-R Ｐ１ , -R Ｐ２ -CO-R Ｐ１ , -R Ｐ２ -CO-OR Ｐ１ , -R Ｐ２ -O-CO-RＰ１ , -R Ｐ２ -OH, -R Ｐ２ -CN or -R Ｐ２ -COOH. R Ｐ１ This is a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Also, R Ｐ２ R is a single bond, a divalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms. However, R Ｐ１ and R Ｐ２ Some or all of the hydrogen atoms in the chain-like saturated hydrocarbon group, aliphatic cyclic saturated hydrocarbon group, and aromatic hydrocarbon group may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of the substituents individually, or it may have one or more of each of the substituents. Examples of monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups. Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl groups; bicyclo[2.2.2]octanyl group, tricyclo[5.2.1.0 ２，６ ] Decanyl group, tricyclo[3.3.1.1 ３，７ ] Decanyl group, tetracyclo[6.2.1.1 ３，６ . 0 ２，７ Examples include polycyclic aliphatic saturated hydrocarbon groups such as dodecanyl groups and adamantyl groups. Examples of monovalent aromatic groups with 6 to 30 carbon atoms include groups obtained by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene. 【0090】 The aforementioned R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０Examples of halogen atoms in this compound include fluorine, bromine, and iodine atoms, with iodine being preferred. 【0091】 The aforementioned R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The alkoxy and acyl groups in these compounds may be linear or branched. Linear alkoxy or acyl groups preferably have 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms. Branched alkoxy or acyl groups preferably have 3 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and even more preferably 3 or 4 carbon atoms. 【0092】 The aforementioned R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The hydrocarbon group which may have substituents in the above may be a hydrocarbon group which may have substituents and has 1 to 30 carbon atoms. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The hydrocarbon group which may have substituents in the above-mentioned compound may be an aliphatic hydrocarbon group which may have substituents, or an aromatic group which may have substituents. 【0093】 The aliphatic hydrocarbon group may be saturated or unsaturated. The aliphatic hydrocarbon group may be a chain-like aliphatic hydrocarbon group or may include a ring structure. 【0094】The linear aliphatic hydrocarbon group may be linear or branched. A linear alkyl group is preferred as the linear aliphatic hydrocarbon group. The linear alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms. A branched alkyl group is preferred as the branched aliphatic hydrocarbon group. The branched alkyl group preferably has 3 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and even more preferably 3 or 4 carbon atoms. Specific examples of branched alkyl groups include isopropyl, isobutyl, tert-butyl, isopentyl, neopentyl, 1,1-diethylpropyl, and 2,2-dimethylbutyl groups. 【0095】 The chain-like aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include halogen atoms, cyano groups, hydroxyl groups, nitro groups, amino groups, and carboxyl groups. 【0096】 Examples of aliphatic hydrocarbon groups containing a ring structure include cyclic aliphatic hydrocarbon groups (groups obtained by removing one hydrogen atom from an aliphatic hydrocarbon ring), groups in which the cyclic aliphatic hydrocarbon group is bonded to the end of a chain-like aliphatic hydrocarbon group, and groups in which the cyclic aliphatic hydrocarbon group is interposed in the middle of a chain-like aliphatic hydrocarbon group. The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms. The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. Examples of monocyclic groups include groups obtained by removing one hydrogen atom from a monocycloalkane having 3 to 6 carbon atoms. Examples of the monocycloalkane include cyclopentane and cyclohexane. Examples of polycyclic groups include groups obtained by removing one hydrogen atom from a polycycloalkane having 7 to 12 carbon atoms. Examples of the polycycloalkane include adamantane, norbornane, isobornane, and tricyclo[5.2.1.0 ２，６Examples include decane, tetracyclododecane, etc. The cyclic aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include alkyl groups, formyl groups, alkoxy groups, acyl groups, halogen atoms, alkyl halides, cyano groups, hydroxyl groups, hydroxyalkyl groups, nitro groups, amino groups, carboxyl groups, etc. The alkyl groups, acyl groups, alkoxy groups, alkyl halides, and hydroxyalkyl groups as substituents on the cyclic aliphatic hydrocarbon group may be linear or branched, preferably having 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 or 2 carbon atoms. The cyclic aliphatic hydrocarbon group may have one or more carbon atoms constituting its ring structure substituted with substituents containing heteroatoms. Examples of substituents containing heteroatoms include -O-, -C(=O), -C(=O)-O-, -S-, and -S(=O). ２ -, -S (=O) ２ -O- is an example. Examples of cyclic aliphatic hydrocarbon groups containing heteroatoms include lactone-containing cyclic groups represented by the following general formulas (a2-r-1) to (a2-r-7), and -SO- represented by the following general formulas (b5-r-1) to (b5-r-4). ２ - Examples include cyclic groups and heterocyclic groups represented by the following chemical formulas (r-hr-7) to (r-hr-16). 【0097】 [In the formula, Ra' ２１ Each of these is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group; R'' is a hydrogen atom, an alkyl group, or a lactone-containing cyclic group; A'' is an alkylene group having 1 to 5 carbon atoms, which may contain an oxygen atom (-O-) or a sulfur atom (-S-), an oxygen atom, or a sulfur atom, where n' is an integer from 0 to 2, and m' is 0 or 1. * indicates a bond (the same applies below). 【0098】 In the general formulas (a2-r-1) to (a2-r-7), Ra' ２１The alkyl group in is preferably an alkyl group having 1 to 6 carbon atoms. The alkyl group is preferably linear or branched. Specifically, examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, hexyl group, etc. Among these, the methyl group or ethyl group is preferred, and the methyl group is particularly preferred. Ra' ２１ The alkoxy group in is preferably an alkoxy group having 1 to 6 carbon atoms. The alkoxy group is preferably linear or branched. Specifically, the Ra' ２１ Examples of alkyl groups in this context include groups formed by linking an alkyl group with an oxygen atom (-O-). ２１ In this, a fluorine atom is preferred as the halogen atom. Ra' ２１ The halogenated alkyl group in is the Ra' ２１ Examples include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with the halogen atoms. Fluorinated alkyl groups are preferred as the halogenated alkyl group, and perfluoroalkyl groups are particularly preferred. 【0099】 Ra' ２１In -COOR'' and -OC(=O)R'', R'' is a hydrogen atom, an alkyl group, or a lactone-containing cyclic group. The alkyl group in R'' may be linear, branched, or cyclic, and preferably has 1 to 15 carbon atoms. If R'' is a linear or branched alkyl group, it preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and is particularly preferably a methyl group or an ethyl group. If R'' is a cyclic alkyl group, it preferably has 3 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. Specifically, examples include a group obtained by removing one or more hydrogen atoms from a monocycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group; and a group obtained by removing one or more hydrogen atoms from a polycycloalkane such as bicycloalkanes, tricycloalkanes, or tetracycloalkanes. More specifically, groups obtained by removing one or more hydrogen atoms from monocycloalkanes such as cyclopentane and cyclohexane; adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ Examples include groups obtained by removing one or more hydrogen atoms from polycycloalkanes such as decane and tetracyclododecane. Examples of lactone-containing cyclic groups in R'' include those similar to the groups represented by the general formulas (a²-r-1) to (a²-r-7) above. Ra' ２１ The hydroxyalkyl group in is preferably one having 1 to 6 carbon atoms, specifically the Ra' ２１ Examples include groups in which at least one hydrogen atom of the alkyl group is substituted with a hydroxyl group. 【0100】 Ra' ２１ Among the above, it is preferable that each is independently a hydrogen atom or a cyano group. 【0101】In the general formulas (a2-r-2), (a2-r-3), and (a2-r-5), the alkylene group having 1 to 5 carbon atoms in A'' is preferably a linear or branched alkylene group, such as a methylene group, ethylene group, n-propylene group, isopropylene group, etc. When the alkylene group contains an oxygen atom or a sulfur atom, a specific example is a group in which -O- or -S- is interposed at the end or between carbon atoms of the alkylene group, for example, -O-CH ２ -ien-CH ２ -O-CH ２ -, -S-CH ２ -ien-CH ２ -S-CH ２ Examples include the following. A'' is preferably an alkylene group or -O- having 1 to 5 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and most preferably a methylene group. 【0102】 The following are specific examples of the groups represented by the general formulas (a²-r-1) to (a²-r-7). 【0103】 【0104】 【0105】 [In the formula, Rb' ５１ Each of these is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group; R'' is a hydrogen atom, an alkyl group, a lactone-containing cyclic group, or -SO ２ - It is a cyclic group containing; B'' is an alkylene group having 1 to 5 carbon atoms, which may contain an oxygen atom or a sulfur atom, an oxygen atom or a sulfur atom, and n' is an integer from 0 to 2. * indicates a bond. 【0106】 In the general formulas (b5-r-1) to (b5-r-2) above, B'' is an alkylene group having 1 to 5 carbon atoms, which may contain an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom. B'' is preferably an alkylene group having 1 to 5 carbon atoms or -O-, more preferably an alkylene group having 1 to 5 carbon atoms, and even more preferably a methylene group. 【0107】 In the above general formulas (b5-r-1) to (b5-r-4), Rb' ５１ Each of these is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group, and among these, each is preferably independently a hydrogen atom or a cyano group. 【0108】 Specific examples of the groups represented by the general formulas (b5-r-1) to (b5-r-4) are given below. In the formulas, "Ac" represents an acetyl group. 【0109】 【0110】 【0111】 【0112】 【0113】The aromatic group is a group having at least one aromatic ring. The aromatic ring may be monocyclic or polycyclic, and may have substituents that substitute for hydrogen atoms on the aromatic ring. Examples of aromatic rings include aromatic hydrocarbon rings and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. The aromatic hydrocarbon ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20 carbon atoms, even more preferably 6 to 15 carbon atoms, and particularly preferably 6 to 12 carbon atoms. However, the carbon number does not include the carbon atoms in substituents that substitute for hydrogen atoms on the aromatic hydrocarbon ring. Examples of aromatic hydrocarbon rings include benzene, naphthalene, anthracene, phenanthrene, and the like. The aromatic heterocycle preferably has 4 to 30 carbon atoms, more preferably 4 to 20 carbon atoms, even more preferably 4 to 15 carbon atoms, and particularly preferably 4 to 12 carbon atoms. However, the carbon number does not include the carbon atoms in substituents that substitute for hydrogen atoms on the aromatic heterocycle. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Examples of aromatic heterocycles include pyridine rings, thiophene rings, and heterocyclic groups represented by formulas (r-hr-1) to (r-hr-6) described later. Examples of aromatic groups include groups obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or the aromatic heterocycle (aryl group or heteroaryl group); groups obtained by removing one hydrogen atom from aromatic compounds containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and groups in which one of the hydrogen atoms of the aromatic hydrocarbon ring or the aromatic heterocycle is substituted with an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The alkylene group bonded to the aryl group or heteroaryl group preferably has 1 to 4 carbon atoms, more preferably 1 to 2 carbon atoms, and even more preferably 1 carbon atom. 【0114】The aromatic group may have its hydrogen atoms substituted with substituents. For example, the hydrogen atoms bonded to the aromatic ring in the aromatic group may be substituted with substituents. Examples of substituents are the same as those listed for substituents on cyclic aliphatic hydrocarbon groups. 【0115】 R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Two or more of these may be bonded to each other to form a ring structure. This ring structure may be an aliphatic ring, an aromatic ring, or a fused ring of an aliphatic ring and an aromatic ring. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ When two or more of these elements bond to each other to form a ring structure, the ring structure, together with the nitrogen-containing five-membered ring in formula (b0), forms a condensed ring. 【0116】 R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ When the ring structure formed by the mutual bonding of two or more of the elements is an aliphatic ring, the aliphatic ring may be monocyclic or polycyclic. The aliphatic ring may be saturated or unsaturated. A specific example of the aliphatic ring is the R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same examples as those listed for cases where is a cyclic aliphatic hydrocarbon group are given. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ When the ring structure formed by the mutual bonding of two or more of the elements is an aromatic ring, the aromatic ring may be monocyclic or polycyclic. A specific example of the aromatic ring is the R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same examples as those listed for when the group is an aromatic group can be cited. 【0117】 R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０R is a cyano group, a hydroxyl group, a chain-like aliphatic hydrocarbon group which may have substituents, or Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ It is preferable that two or more of these groups bond to each other to form a ring structure. Among these, when forming a thin resist film (for example, less than 2 μm), a cyano group, a hydroxyl group, or R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ It is preferable that two or more of these are bonded to each other to form a ring structure, R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ It is more preferable that two or more of these elements bond to each other to form a ring structure. Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ However, a cyano group, a hydroxyl group, or R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ When two or more of these elements bond to each other to form a ring structure, the acid strength of the acid generated by exposure is high and the diffusion length of the acid is small, thus improving resolution and CDU. 【0118】 The acid strength (pKa) of the acid generated by exposure of compound (B0) is preferably -4.0 or less. When forming a thin resist film (e.g., less than 2 μm), the acid strength (pKa) of the acid generated by exposure is more preferably -6.0 or less, even more preferably -8.0 or less, and particularly preferably -10.0 or less. 【0119】 Examples of compound (B0) include the compound represented by the following general formula (b0-1) (hereinafter also referred to as "compound (B01)"), the compound represented by the following general formula (b0-2) (hereinafter also referred to as "compound (B02)"), and so on. 【0120】 [In the formula, R ０１１ and R ０１２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 【0121】 [In the formula, z ０２１ and z ０２２ x represents an oxygen atom or a sulfur atom. ０２１ , x ０２２ , y ０２１ and y ０２２ Each of them independently, C(R ０２１ ) (Caution ０２２ ), represents C=O or C=S. C represents a carbon atom. R ０２１ and R ０２２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 【0122】 ≪Compound (B01)≫ In the above formula (b0-1), R ０１１ and R ０１２ The substituents in include halogen atoms, alkoxy groups, acyl groups, cyano groups, hydroxyl groups, nitro groups, amino groups, carboxyl groups, hydrocarbon groups which may have substituents, and the above-mentioned Ra ｘ５ These are some examples. 【0123】 R ０１１ and R ０１２ Examples of halogen atoms in this compound include fluorine, bromine, and iodine atoms, with iodine being preferred. 【0124】 R ０１１ and R ０１２ The alkoxy group and acyl group in formula (b0) are R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Examples of groups similar to those listed above include the methoxy group and the ethoxy group, with the methoxy group being preferred. Examples of acyl groups include the formyl group and the acetyl group. 【0125】 R ０１１ and R ０１２ The hydrocarbon group which may have substituents in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０Examples of hydrocarbon groups that may have substituents in the above are similar to those listed above. ０１１ and R ０１２ Preferably, the hydrocarbon group which may have substituents is a linear or branched alkyl group, an aliphatic hydrocarbon group containing a cyclic structure, or an aromatic hydrocarbon group. More preferably, a linear alkyl group having 1 to 10 carbon atoms which may have substituents, a branched alkyl group having 3 to 10 carbon atoms which may have substituents, a cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms which may have substituents, or an aromatic hydrocarbon group having 5 to 30 carbon atoms which may have substituents. 【0126】 R ０１１ and R ０１２ The linear alkyl group in is preferably one with 1 to 5 carbon atoms, more preferably one to 3 carbon atoms, and more preferably one or two carbon atoms. ０１１ and R ０１２ The branched alkyl group in the formula preferably has 3 to 5 carbon atoms, and more preferably 3 or 4 carbon atoms. The linear or branched alkyl group may or may not have substituents. Examples of substituents include halogen atoms, cyano groups, hydroxyl groups, nitro groups, amino groups, and carboxyl groups. Among these, a hydroxyl group is preferred as a substituent that the linear or branched alkyl group may have. 【0127】 R ０１１ and R ０１２ The aliphatic hydrocarbon group containing a ring structure in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. ０１１ and R ０１２ The aromatic hydrocarbon group containing a ring structure in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. ０１１ and R ０１２In this context, aryl groups or heteroaryl groups are preferred as aromatic hydrocarbon groups. Specific examples of aryl groups include phenyl groups and naphthyl groups. Heteroatoms in heteroaryl groups include oxygen atoms, nitrogen atoms, and sulfur atoms. Specific examples of heteroaryl groups include furyl groups, thienyl groups, pyrrolyl groups, pyridyl groups, pyranyl groups, and thiopranyl groups. 【0128】 R ０１１ and R ０１２ The aliphatic hydrocarbon group and aromatic hydrocarbon group containing the ring structure in the above formula (b0) may or may not have substituents. The substituent is R in the above formula (b0). Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. 【0129】 R ０１１ and R ０１２ Preferred members include linear or branched alkyl groups, hydroxyl groups, and cyano groups. When forming a thin resist film (e.g., less than 2 μm), hydroxyl groups and cyano groups are more preferred. ０１１ and R ０１２ However, with hydroxyl and cyano groups, the acid strength of the acid generated by exposure is high and the diffusion length of the acid is small, thus improving resolution and CDU. 【0130】 Specific examples of the anionic portion of compound (B01) are shown below, but are not limited to these. 【0131】 【0132】 【0133】 ≪Compound (B02)≫ In the above formula (b0-2), R ０２１ and R ０２２ The substituents in include halogen atoms, alkoxy groups, acyl groups, cyano groups, hydroxyl groups, nitro groups, amino groups, carboxyl groups, hydrocarbon groups which may have substituents, and the above-mentioned Ra ｘ５ These are some examples. 【0134】 R ０２１ and R０２２ Examples of halogen atoms in this compound include fluorine, bromine, and iodine atoms, with iodine being preferred. 【0135】 R ０２１ and R ０２２ The alkoxy group and acyl group in formula (b0) are R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Examples of groups similar to those listed above include the methoxy group and the ethoxy group, with the methoxy group being preferred. Examples of acyl groups include the formyl group and the acetyl group. 【0136】 R ０２１ and R ０２２ The hydrocarbon group which may have substituents in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ Examples of hydrocarbon groups that may have substituents in the above are similar to those listed above. ０２１ and R ０２２ Preferably, the hydrocarbon group which may have substituents is a linear or branched alkyl group, an aliphatic hydrocarbon group containing a cyclic structure, or an aromatic group, with a linear alkyl group having 1 to 10 carbon atoms which may have substituents, a branched alkyl group having 3 to 10 carbon atoms which may have substituents, a cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms which may have substituents, or an aromatic group having 5 to 30 carbon atoms which may have substituents. 【0137】 R ０２１ and R ０２２ The linear alkyl group in is preferably one with 1 to 5 carbon atoms, more preferably one to 3 carbon atoms, and more preferably one or two carbon atoms. ０１１ and R ０１２The branched alkyl group in the formula preferably has 3 to 5 carbon atoms, and more preferably 3 or 4 carbon atoms. The linear or branched alkyl group may or may not have substituents. Examples of substituents include halogen atoms, cyano groups, hydroxyl groups, nitro groups, amino groups, and carboxyl groups. Among these, a hydroxyl group is preferred as a substituent that the linear or branched alkyl group may have. 【0138】 R ０２１ and R ０２２ The aliphatic hydrocarbon group containing a ring structure in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. ０２１ and R ０２２ The aromatic group containing a ring structure in formula (b0) is R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. ０１１ and R ０１２ In this context, aryl groups or heteroaryl groups are preferred as aromatic groups. Specific examples of aryl groups include phenyl groups and naphthyl groups. Heteroatoms in heteroaryl groups include oxygen, nitrogen, and sulfur atoms. Specific examples of heteroaryl groups include furyl groups, thienyl groups, pyrrolyl groups, pyridyl groups, pyranyl groups, and thiopranyl groups. 【0139】 R ０２１ and R ０２２ The aliphatic hydrocarbon group and aromatic group containing the ring structure in the above formula (b0) may or may not have substituents. The substituent is R in the above formula (b0). Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ The same items listed above can be cited. 【0140】 x ０２１ , x ０２２ , y ０２１ and y ０２２As such, C=O or C=S is preferred. ０２１ , x ０２２ , y ０２１ and y ０２２ However, if C=O or C=S, the acid strength of the acid generated by exposure is high and the acid diffusion length is small, resulting in improved resolution and CDU. 【0141】 Specific examples of the anionic portion of compound (B02) are shown below, but are not limited to these. 【0142】 【0143】 {Cation part} In the above formulas (b0), (b0-1), and (b0-2), M ｍ＋ In this case, a sulfonium cation or an iodonium cation is preferred as the m-valence cation. 【0144】 As the cation portion, a cation represented by the following general formula (b0-ca) is preferred. 【0145】 [In the formula, Rb ０１ ~Rb ０３ Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０２ and Rb ０３ These atoms may bond to each other, forming a ring structure with the sulfur atom in the formula. Lb ０１ This is a single bond or a divalent linking group. 【0146】 Rb ０１ ~Rb ０３ In this compound, the aryl group is preferably an aryl group having 6 to 20 carbon atoms, and more preferably a phenyl group or a naphthyl group. ０１ ~Rb ０３ Examples of alkyl groups in this context include linear or cyclic alkyl groups, with alkyl groups having 1 to 30 carbon atoms being preferred. ０１ ~Rb ０３ In this context, an alkenyl group having 2 to 10 carbon atoms is preferred. 【0147】 Rb ０１ ~Rb ０３Examples of substituents that the aryl group, alkyl group, and alkenyl group in the above may have include alkyl groups, halogen atoms, alkyl halides, carbonyl groups, cyano groups, amino groups, aryl groups, and groups represented by the following general formulas (ca-r-1) to (ca-r-7). 【0148】 [In the formula, R' ２０１ Each of these is independently a hydrogen atom, an optionally substituted cyclic group, an optionally substituted linear alkyl group, or an optionally substituted linear alkenyl group. 【0149】 A cyclic group which may have substituents: The cyclic group is preferably a cyclic hydrocarbon group, which may be an aromatic group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group means a hydrocarbon group that does not have aromaticity. Furthermore, the aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferred to be saturated. 【0150】 R' ２０１The aromatic group in this formula is a group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic, polycyclic, or have substituents that substitute for the hydrogen atoms of the aromatic ring. Examples of aromatic rings include aromatic hydrocarbon rings and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. The number of carbon atoms in the aromatic hydrocarbon ring is preferably 5 to 30, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for the hydrogen atoms of the aromatic hydrocarbon ring. Specific examples of aromatic hydrocarbon rings include benzene, fluorene, naphthalene, anthracene, phenanthrene, and biphenyl. The number of carbon atoms in the aromatic heterocycle is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms in the aromatic heterocycle. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. R' ２０１ Specific examples of aromatic groups in this context include groups obtained by removing one hydrogen atom from the aromatic ring (aryl groups: for example, phenyl groups, naphthyl groups, etc.), and groups in which one of the hydrogen atoms of the aromatic ring is replaced by an alkylene group (for example, arylalkyl groups such as benzyl groups, phenethyl groups, 1-naphthylmethyl groups, 2-naphthylmethyl groups, 1-naphthylethyl groups, and 2-naphthylethyl groups). The number of carbon atoms in the alkylene group (alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. 【0151】 R' ２０１The cyclic aliphatic hydrocarbon group in this context refers to an aliphatic hydrocarbon group that contains a ring in its structure. Examples of aliphatic hydrocarbon groups containing a ring in their structure include alicyclic hydrocarbon groups (groups from which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), groups in which an alicyclic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which an alicyclic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms. The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group from which one or more hydrogen atoms have been removed from a monocycloalkane. The preferred monocycloalkane has 3 to 6 carbon atoms, and specifically includes cyclopentane and cyclohexane. A preferred polycyclic alicyclic hydrocarbon group is a group from which one or more hydrogen atoms have been removed from a polycycloalkane, and the preferred polycycloalkane has 7 to 30 carbon atoms. Among these, the polycycloalkanes include adamantane, norbornane, isobornane, and tricyclo[5.2.1.0 ２，６ Polycycloalkanes having a cross-linked ring system polycyclic skeleton, such as decane and tetracyclododecane; polycycloalkanes having a fused ring system polycyclic skeleton, such as a cyclic group having a steroid skeleton, are more preferred. 【0152】 Among them, R' ２０１ The cyclic aliphatic hydrocarbon group in is preferably a monocycloalkane or polycycloalkane from which one or more hydrogen atoms have been removed, more preferably a polycycloalkane from which one hydrogen atom has been removed, with adamantyl and norbornyl groups being particularly preferred, and the adamantyl group being the most preferred. 【0153】 The linear or branched aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms. A linear alkylene group is preferred as the linear aliphatic hydrocarbon group, specifically a methylene group [-CH₂]. ２-], ethylene group [- (CH ２ ) ２ -], trimethylene group [-(CH ２ ) ３ -], tetramethylene group [-(CH ２ ) ４ -], pentamethylene group [-(CH ２ ) ５ Examples include -CH(CH ３ )-,-CH(CH ２ CH ３ )-,-C(CH ３ ) ２ -, -C(CH ３ ) (CH ２ CH ３ )-,-C(CH ３ ) (CH ２ CH ２ CH ３ )-,-C(CH ２ CH ３ ) ２ - Alkyl methylene groups such as -CH(CH ３ )CH ２ -, -CH(CH ３ )CH(CH ３ )-,-C(CH ３ ) ２ CH ２ -, -CH(CH ２ CH ３ )CH ２ -, -C(CH ２ CH ３ ) ２ -CH ２ - Alkyl ethylene groups such as -CH(CH ３ )CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ - Alkyl trimethylene groups such as -CH(CH ３ )CH ２ CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ CH ２Examples include alkylalkylene groups such as alkyltetramethylene groups. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred. 【0154】 Also, R' ２０１ The cyclic hydrocarbon group in may contain heteroatoms, such as heterocycles. Specifically, lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), and -SO groups represented by the general formulas (b5-r-1) to (b5-r-4), respectively. ２ - The contained cyclic groups include heterocyclic groups represented by the following chemical formulas (r-hr-1) to (r-hr-16). 【0155】 【0156】 R' ２０１ Examples of substituents on the cyclic group include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, and nitro groups. Preferred alkyl groups as substituents are alkyl groups having 1 to 5 carbon atoms, with methyl, ethyl, propyl, n-butyl, and tert-butyl groups being the most preferred. Preferred alkoxy groups as substituents are alkoxy groups having 1 to 5 carbon atoms, with methoxy, ethoxy, n-propoxy, iso-propoxy, n-butoxy, and tert-butoxy groups being more preferred, with methoxy and ethoxy groups being the most preferred. Preferred halogen atoms as substituents are fluorine atoms. Examples of alkyl halides as substituents include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, propyl, n-butyl, and tert-butyl groups, in which some or all of the hydrogen atoms are substituted with the halogen atoms. Carbonyl groups as substituents are methylene groups (-CH) that constitute the cyclic hydrocarbon group. ２ It is a substituting group for -). 【0157】 A chain-like alkyl group which may have substituents: R' ２０１The linear alkyl group may be linear or branched. Linear alkyl groups preferably have 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. Branched alkyl groups preferably have 3 to 20 carbon atoms, more preferably 3 to 15 carbon atoms, and most preferably 3 to 10 carbon atoms. Specifically, examples include 1-methylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, and 4-methylpentyl group. 【0158】 A chain-like alkenyl group which may have substituents: R' ２０１ The linear alkenyl group may be linear or branched, preferably having 2 to 10 carbon atoms, more preferably 2 to 5 carbon atoms, even more preferably 2 to 4 carbon atoms, and particularly preferably 2 carbon atoms. Examples of linear alkenyl groups include vinyl groups, propenyl groups (allyl groups), and butenyl groups. Examples of branched alkenyl groups include 1-methylvinyl groups, 2-methylvinyl groups, 1-methylpropenyl groups, and 2-methylpropenyl groups. Among the linear alkenyl groups listed above, linear alkenyl groups are preferred, vinyl groups and propenyl groups are more preferred, and vinyl groups are particularly preferred. 【0159】 R' ２０１ Examples of substituents in the chain-like alkyl or alkenyl group include alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, nitro groups, amino groups, and the above R'. ２０１ Examples include cyclic groups in this context. 【0160】 R' ２０１In addition to those mentioned above, examples of optionally substituted cyclic groups, optionally substituted linear alkyl groups, or optionally substituted linear alkenyl groups include tertiary alkyl ester type acid-dissociable groups. 【0161】 Tertiary alkyl ester type acid-dissociating groups: Among the polar groups mentioned above, an example of an acid-dissociating group that protects a carboxyl group is the acid-dissociating group represented by the following general formula (a1-r-2). Of the acid-dissociating groups represented by the following formula (a1-r-2), those composed of alkyl groups may hereafter be referred to as "tertiary alkyl ester type acid-dissociating groups" for convenience. 【0162】 [In the formula, Ra' ４ ~Ra' ６ Each of these is a hydrocarbon group, Ra' ５ , Ra' ６ They may be joined to each other to form a ring. 【0163】 Ra' ４ Examples of hydrocarbon groups include linear or branched alkyl groups, linear or cyclic alkenyl groups, or cyclic hydrocarbon groups. The linear alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. Specifically, examples include methyl groups, ethyl groups, n-propyl groups, n-butyl groups, and n-pentyl groups. Among these, methyl groups, ethyl groups, or n-butyl groups are preferred, and methyl groups or ethyl groups are more preferred. 【0164】 The branched alkyl group preferably has 3 to 10 carbon atoms, and more preferably 3 to 5 carbon atoms. Specifically, examples include isopropyl group, isobutyl group, tert-butyl group, isopentyl group, neopentyl group, 1,1-diethylpropyl group, 2,2-dimethylbutyl group, etc., with isopropyl group being preferred. 【0165】 Ra' ４ The linear or cyclic alkenyl group in this is preferably an alkenyl group having 2 to 10 carbon atoms. 【0166】 Ra' ４ When the hydrocarbon group is cyclic, it may be an aliphatic hydrocarbon group or an aromatic group, and may be a polycyclic or monocyclic group. A preferred monocyclic aliphatic hydrocarbon group is one obtained by removing one hydrogen atom from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic aliphatic hydrocarbon group is one obtained by removing one hydrogen atom from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ Examples include decane and tetracyclododecane. 【0167】 Ra' ４When a cyclic hydrocarbon group becomes an aromatic group, the aromatic group is a group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic, polycyclic, or have substituents that substitute for hydrogen atoms on the aromatic ring. Examples of aromatic rings include aromatic hydrocarbon rings and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. The number of carbon atoms in the aromatic hydrocarbon ring is preferably 5 to 30, more preferably 6 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms on the aromatic hydrocarbon ring. Specific examples of aromatic hydrocarbon rings include benzene, naphthalene, anthracene, phenanthrene, etc. The number of carbon atoms in the aromatic heterocycle is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12. However, the number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms in the aromatic heterocycle. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. 【0168】 Ra' ４ The number of carbon atoms in the aromatic group is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12. 【0169】 Ra' ４Specific examples of aromatic groups in this context include: a group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or the aromatic heterocycle (aryl group or heteroaryl group); a group obtained by removing one hydrogen atom from an aromatic compound containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and a group in which one of the hydrogen atoms of the aromatic hydrocarbon ring or the aromatic heterocycle is substituted with an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aromatic hydrocarbon ring or the aromatic heterocycle is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. 【0170】 Ra' ４ The cyclic hydrocarbon group in may have substituents. For example, the above-mentioned Ra ｘ５ These are some examples. Here, R Ｐ１ R is a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic group having 4 to 30 carbon atoms. Ｐ２ R is a single bond, a divalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic group having 4 to 30 carbon atoms. However, R Ｐ１ and R Ｐ２Some or all of the hydrogen atoms in the chain-like saturated hydrocarbon group, aliphatic cyclic saturated hydrocarbon group, and aromatic group may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of the substituents individually, or it may have one or more of each of the substituents. Examples of monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups. Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl groups; bicyclo[2.2.2]octanyl group, tricyclo[5.2.1.0 ２，６ ] Decanyl group, tricyclo[3.3.1.1 ３，７ ] Decanyl group, tetracyclo[6.2.1.1 ３，６ . 0 ２，７ Examples include polycyclic aliphatic saturated hydrocarbon groups such as dodecanyl groups and adamantyl groups. Examples of monovalent aromatic groups with 4 to 30 carbon atoms include groups obtained by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene. 【0171】 Ra' ５ , Ra' ６ The hydrocarbon group is the aforementioned Ra' ４ Similar examples include the above. 【0172】 Ra' ５ and Ra' ６ When these groups bond to each other to form a ring, the following groups are preferably represented by the general formula (a1-r2-1), the general formula (a1-r2-2), and the general formula (a1-r2-3). On the other hand, Ra' ４ ~Ra' ６ When these are independent hydrocarbon groups that are not bonded to each other, the groups represented by the following general formula (a1-r2-4) are preferred. 【0173】 [In formula (a1-r2-1), Ra'１０ This represents a linear or branched alkyl group having 1 to 12 carbon atoms, which may be partially substituted with halogen atoms or heteroatom-containing groups. １１ Ra' １０ This indicates a group that forms an aliphatic cyclic group together with the bonded carbon atom. In formula (a1-r2-2), Ya is a carbon atom. Xa is a group that forms a cyclic hydrocarbon group together with Ya. Some or all of the hydrogen atoms in this cyclic hydrocarbon group may be substituted. Ra １０１ ~Ra １０３ Each of these is independently a hydrogen atom, a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all of the hydrogen atoms in these linear saturated hydrocarbon groups and aliphatic cyclic saturated hydrocarbon groups may be substituted. Ra １０１ ~Ra １０３ Two or more of these may be bonded to each other to form a cyclic structure. In formula (a1-r2-3), Yaa is a carbon atom. Xaa is a group that forms an aliphatic cyclic group together with Yaa. Ra １０４ is an aromatic group which may have substituents. In formula (a1-r2-4), Ra' １２ and Ra' １３ Each of these is independently a monovalent, chain-like saturated hydrocarbon group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted. Ra' １４ This is a hydrocarbon group that may have substituents. * indicates a bond (the same applies hereafter). 【0174】 In the above formula (a1 - r2 - 1), Ra' １０ This is a linear or branched alkyl group having 1 to 12 carbon atoms, which may be partially substituted with halogen atoms or heteroatom-containing groups. 【0175】 Ra' １０ In this context, the linear alkyl group has 1 to 12 carbon atoms, preferably 1 to 10 carbon atoms, and particularly preferably 1 to 5 carbon atoms. １０ In this, the branched alkyl group is the Ra' ４ Similar examples include the above. 【0176】 Ra' １０ In this context, the alkyl group may be partially substituted with a halogen atom or a heteroatom-containing group. For example, some of the hydrogen atoms constituting the alkyl group may be substituted with a halogen atom or a heteroatom-containing group. Also, some of the carbon atoms constituting the alkyl group (such as a methylene group) may be substituted with a heteroatom-containing group. Examples of heteroatoms here include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of heteroatom-containing groups include (-O-), -C(=O)-O-, -O-C(=O)-, -C(=O)-NH-, -NH-, -S-, and -S(=O). ２ -, -S (=O) ２ Examples include -O-, etc. 【0177】 In formula (a1-r2-1), Ra' １１ (Ra' １０ The aliphatic cyclic group formed together with the bonded carbon atom is the Ra' ４ The aliphatic hydrocarbon groups (alicyclic hydrocarbon groups) listed above, which are monocyclic or polycyclic groups, are preferred. Among these, monocyclic alicyclic hydrocarbon groups are preferred, and specifically, cyclopentyl groups and cyclohexyl groups are more preferred. 【0178】 In formula (a1-r2-2), the cyclic hydrocarbon group formed by Xa together with Ya is the aforementioned Ra' ４ Examples include a cyclic monovalent hydrocarbon group (aliphatic hydrocarbon group) from which one or more hydrogen atoms have been further removed. The cyclic hydrocarbon group formed by Xa together with Ya may have substituents. An example of such substituent is the Ra' ４ Examples include substituents similar to those that may be present on the cyclic hydrocarbon group in formula (a1-r2-2). １０１ ~Ra １０３ Examples of monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups. １０１ ~Ra １０３Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl groups; bicyclo[2.2.2]octanyl, tricyclo[5.2.1.0 ２，６ ] Decanyl group, tricyclo[3.3.1.1 ３，７ ] Decanyl group, tetracyclo[6.2.1.1 ３，６ . 0 ２，７ Examples include polycyclic aliphatic saturated hydrocarbon groups such as dodecanyl groups and adamantyl groups. １０１ ~Ra １０３ Of these, from the viewpoint of ease of synthesis, hydrogen atoms and monovalent chain saturated hydrocarbon groups having 1 to 10 carbon atoms are preferred, and among these, hydrogen atoms, methyl groups, and ethyl groups are more preferred, with hydrogen atoms being particularly preferred. 【0179】 The above Ra １０１ ~Ra １０３ Examples of substituents on a chain-like saturated hydrocarbon group or an aliphatic cyclic saturated hydrocarbon group represented by the above Ra ｘ５ Similar bases can be cited. 【0180】 Ra １０１ ~Ra １０３ Groups containing a carbon-carbon double bond formed by the bonding of two or more carbon atoms to each other to form a cyclic structure include, for example, cyclopentenyl group, cyclohexenyl group, methylcyclopentenyl group, methylcyclohexenyl group, cyclopentylideneethenyl group, and cyclohexyllideneethenyl group. Among these, cyclopentenyl group, cyclohexenyl group, and cyclopentylideneethenyl group are preferred from the viewpoint of ease of synthesis. 【0181】 In formula (a1-r2-3), the aliphatic cyclic group formed by Xaa together with Yaa is the Ra' group. ４ The groups listed as aliphatic hydrocarbon groups that are monocyclic or polycyclic in formula (a1-r2-3) are preferred. １０４Examples of aromatic groups in include aromatic groups having 4 to 30 carbon atoms, preferably aromatic groups having 4 to 15 carbon atoms, for example, groups obtained by removing one or more hydrogen atoms from an aromatic hydrocarbon ring or an aromatic heterocycle. Among these, Ra １０４ The group is preferably an aromatic hydrocarbon ring having 6 to 15 carbon atoms with one or more hydrogen atoms removed; more preferably a group from benzene, naphthalene, anthracene, phenanthrene, or thiophene with one or more hydrogen atoms removed; even more preferably a group from benzene, naphthalene, anthracene, or thiophene with one or more hydrogen atoms removed; particularly preferably a group from benzene, naphthalene, or thiophene with one or more hydrogen atoms removed; and most preferably a group from benzene with one or more hydrogen atoms removed. 【0182】 Ra in equation (a1-r2-3) １０４ Examples of substituents that may be present include methyl groups, ethyl groups, propyl groups, hydroxyl groups, carboxyl groups, halogen atoms, alkoxy groups (such as methoxy groups, ethoxy groups, propoxy groups, butoxy groups, etc.), and alkyloxycarbonyl groups. 【0183】 In formula (a1-r2-4), Ra' １２ and Ra' １３ Each of these is independently a monovalent, chain-like saturated hydrocarbon group having 1 to 10 carbon atoms. １２ and Ra' １３ In this, the monovalent chain-like saturated hydrocarbon group having 1 to 10 carbon atoms is the above Ra １０１ ~Ra １０３ Examples include monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms. Some or all of the hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted. Ra' １２ and Ra' １３ Among these, alkyl groups having 1 to 5 carbon atoms are preferred, alkyl groups having 1 to 5 carbon atoms are more preferred, methyl groups and ethyl groups are even more preferred, and methyl groups are particularly preferred. １２ and Ra' １３ When a chain-like saturated hydrocarbon group represented by is substituted, the substituent may be, for example, the above-mentioned Ra ｘ５Similar bases can be cited. 【0184】 In formula (a1-r2-4), Ra' １４ Ra' is a hydrocarbon group that may have substituents. １４ Examples of hydrocarbon groups in this context include linear or branched alkyl groups, or cyclic hydrocarbon groups. 【0185】 Ra' １４ The linear alkyl group in this compound preferably has 1 to 5 carbon atoms, more preferably 1 to 4, and even more preferably 1 or 2. Specifically, examples include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, etc. Among these, methyl group, ethyl group, or n-butyl group is preferred, and methyl group or ethyl group is more preferred. 【0186】 Ra' １４ The branched alkyl group in the compound preferably has 3 to 10 carbon atoms, and more preferably 3 to 5. Specifically, examples include isopropyl group, isobutyl group, tert-butyl group, isopentyl group, neopentyl group, 1,1-diethylpropyl group, 2,2-dimethylbutyl group, etc., with isopropyl group being preferred. 【0187】 Ra' １４ When the hydrocarbon group is cyclic, it may be an aliphatic hydrocarbon group or an aromatic group, and may be a polycyclic or monocyclic group. A preferred monocyclic aliphatic hydrocarbon group is one obtained by removing one hydrogen atom from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic aliphatic hydrocarbon group is one obtained by removing one hydrogen atom from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ Examples include decane and tetracyclododecane. 【0188】 Ra' １４ As for aromatic groups in this case, Ra １０４Examples include those similar to aromatic groups in [the text]. Among them, Ra' １４ Examples include aromatic groups having 4 to 15 carbon atoms, preferably groups obtained by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably groups obtained by removing one or more hydrogen atoms from benzene, naphthalene, anthracene, or phenanthrene, even more preferably groups obtained by removing one or more hydrogen atoms from benzene, naphthalene, or anthracene, particularly preferably groups obtained by removing one or more hydrogen atoms from naphthalene or anthracene, and most preferably groups obtained by removing one or more hydrogen atoms from naphthalene. １４ A substituent that may be present is Ra １０４ Examples of substituents that may be present include those similar to those that the molecule may have. 【0189】 Ra' in equation (a1-r2-4) １４ When is a naphthyl group, the position where it bonds to the tertiary carbon atom in formula (a1-r2-4) may be either position 1 or position 2 of the naphthyl group. １４ If is an anthyl group, the position of the bond with the tertiary carbon atom in formula (a1-r2-4) may be position 1, 2, or 9 of the anthyl group. 【0190】 Specific examples of the group represented by the above formula (a1-r2-1) are given below. 【0191】 【0192】 【0193】 【0194】 Specific examples of the group represented by the above formula (a1-r2-2) are given below. 【0195】 【0196】 【0197】 【0198】 Specific examples of the group represented by the above formula (a1-r2-3) are given below. 【0199】 【0200】 Specific examples of the group represented by the above formula (a1-r2-4) are given below. 【0201】 【0202】 Among the above, R' ２０１ The cyclic group is preferably a cyclic group which may have substituents, and more preferably a cyclic hydrocarbon group which may have substituents. More specifically, for example, a phenyl group, a naphthyl group, a group obtained by removing one or more hydrogen atoms from a polycycloalkane; a lactone-containing cyclic group represented by the general formulas (a2-r-1) to (a2-r-7); and a -SO group represented by the general formulas (b5-r-1) to (b5-r-4). ２ - A cyclic group is preferred. 【0203】 In the above formula (b0-ca), Rb ０２ and Rb ０３ When these atoms bond to each other and form a ring with the sulfur atom in the formula, they can be heteroatoms such as sulfur, oxygen, and nitrogen atoms, or carbonyl groups, -SO-, -SO ２ -, -SO ３ -, -COO-, -CONH- or -N(R Ｎ )-(the R Ｎ Rb is an alkyl group having 1 to 5 carbon atoms. It may also be bonded via a functional group such as . The formed ring is preferably a 3 to 10-membered ring, and particularly preferably a 5 to 7-membered ring, including the sulfur atom in its ring skeleton. Specific examples of the formed ring include, for example, a tetrahydrothiophene ring, a thiane ring, a thiophene ring, a thiazole ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthlene ring, a phenoxatiyine ring, a tetrahydrothiopyranium ring, etc. From the viewpoint of improving resolution, Rb ０２ and Rb ０３ It is preferable that these atoms bond to each other and form a ring together with the sulfur atom in the formula. 【0204】 In the formula (b0-ca), Lb ０１Examples of divalent linking groups in include ether bonds (-O-), ester bonds (-C(=O)-O-), oxycarbonyl groups (-O-C(=O)-), amide bonds (-C(=O)-NH-), carbonyl groups (-C(=O)-), carbonate bonds (-O-C(=O)-O-), linear or branched alkylene groups, alicyclic hydrocarbon groups, aromatic groups, or combinations thereof. Among these, Lb ０１ Preferably, the group is a carbonyl group (-C(=O)-), a linear or branched alkylene group, an aromatic group, or a combination thereof. 【0205】 Specific examples of preferred cations represented by the formula (b0-ca) include the cations represented by formulas (ca-1-1) to (ca-1-104) and (ca-3-1) to (ca-3-7), respectively, as described later. Among these, as preferred cations represented by the formula (b0-ca), from the viewpoint of improving resolution, the cations represented by formulas (ca-1-64) to (ca-1-70), (ca-1-82) to (ca-1-83), (ca-1-92) to (ca-1-93), and (ca-3-1) to (ca-3-7), respectively, are preferred, and the cations represented by formula (ca-1-64) or (ca-3-7), respectively, are more preferred. As a preferred cation represented by the above formula (b0-ca), from the viewpoint of resolution and CDU improvement, the cation represented by formula (ca-1-64) is even more preferred, and in formula (ca-1-64) R" ２０１ A hydrogen atom is preferred. 【0206】 Specific examples of compound (B0) are shown below, but are not limited to these. 【0207】 【0208】In the resist composition of this embodiment, component (B0) may be used alone or in combination of two or more types. The content of component (B0) in the resist composition is preferably 1 to 25 parts by mass, more preferably 1 to 20 parts by mass, and even more preferably 1 to 15 parts by mass, per 100 parts by mass of component (A). If the content of component (B0) is above the above preferred lower limit, the sensitivity can be further improved. If the content of component (B0) is below the above preferred upper limit, a uniform solution is easily obtained when each component of the resist composition is dissolved in an organic solvent, and the storage stability of the resist composition tends to be good. 【0209】 The resist composition of this embodiment may contain an acid generating agent component (B1) other than the above-described component (B0) (hereinafter also referred to as "component (B1)"). 【0210】 ≪Acid Generating Agent Component (B1)≫ Acid generating agent component (B1) (hereinafter also referred to as "component (B1)") is an acid generating agent component that generates acid upon exposure. However, components that fall under component (B0) above are excluded from component (B1). In other words, component (B1) is an acid generating agent component other than the compound (B0) above. 【0211】 (B1) The component is not particularly limited, and any acid generators previously proposed for chemically amplified resist compositions can be used. Examples of such acid generators include onium salt-based acid generators such as iodonium salts and sulfonium salts, oxime sulfonate-based acid generators; diazomethane-based acid generators such as bisalkyl or bisarylsulfonyl diazomethanes and poly(bissulfonyl) diazomethanes; nitrobenzyl sulfonate-based acid generators, iminosulfonate-based acid generators, disulfone-based acid generators, and many others. 【0212】Examples of onium salt-based acid generators include the compound represented by the following general formula (b-1) (hereinafter also referred to as "component (b-1)"), the compound represented by the general formula (b-2) (hereinafter also referred to as "component (b-2)"), the compound represented by the general formula (b-3) (hereinafter also referred to as "component (b-3)"), and the compound represented by the general formula (b-4) (hereinafter also referred to as "component (b-4)"). 【0213】 [In the formula, R １０１ and R １０４ ~R １０８ Each of these is independently a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. １０４ and R １０５ These may be bonded to each other to form a ring structure. １０２ This is a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. １０１ This is a divalent linking group or single bond containing an oxygen atom. １０１ ~V １０３ Each of these is independently a single bond, an alkylene group, or a fluorinated alkylene group. However, Y １０１ and V １０１ They cannot be single bonds at the same time. １０１ ~L １０２ Each of these is independently either a single bond or an oxygen atom. １０３ ~L １０５ These are, independently, single bonds, -CO-, or -SO-. ２ - is true. m is an integer greater than or equal to 1, and M' ｍ＋ This is an onium cation with a positive (m) charge. 【0214】 [In the formula, Rb ２ Rb is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. ２ In this diagram, it is assumed that no fluorine atoms are bonded to carbon atoms adjacent to the sulfur atom. m is an integer greater than or equal to 1, and M' ｍ＋ This is an onium cation with a positive (m) charge. 【0215】{Anion part} • In the anion formula (b-1) of component (b-1), R １０１ This is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. 【0216】 A cyclic group which may have substituents: The cyclic group is preferably a cyclic hydrocarbon group, which may be an aromatic group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group means a hydrocarbon group that does not have aromaticity. Furthermore, the aliphatic hydrocarbon group is preferably saturated. 【0217】 R １０１ The aromatic group in this formula is a group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic, polycyclic, or have substituents that substitute for the hydrogen atoms of the aromatic ring. Examples of aromatic rings include aromatic hydrocarbon rings and aromatic heterocycles in which part of the ring skeleton is composed of heteroatoms. The number of carbon atoms in the aromatic hydrocarbon ring is preferably 5 to 30, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for the hydrogen atoms of the aromatic hydrocarbon ring. Specific examples of aromatic hydrocarbon rings include benzene, fluorene, naphthalene, anthracene, phenanthrene, and biphenyl. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, nitrogen atoms, etc. The number of carbon atoms in the aromatic heterocycle is preferably 4 to 30, more preferably 4 to 20, even more preferably 4 to 15, and particularly preferably 4 to 12. However, this number of carbon atoms does not include the number of carbon atoms in substituents that substitute for hydrogen atoms in the aromatic heterocycle. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. The number of carbon atoms in the aromatic group is preferably 4 to 30, more preferably 4 to 25, particularly preferably 4 to 15, and most preferably 4 to 10. １０１Specific examples of aromatic groups in this context include groups obtained by removing one hydrogen atom from the aromatic ring (aryl groups: for example, phenyl groups, naphthyl groups, etc.), and groups in which one of the hydrogen atoms of the aromatic ring is replaced by an alkylene group (for example, benzyl groups, phenethyl groups, 1-naphthylmethyl groups, etc.). The number of carbon atoms in the alkylene group (alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. 【0218】 R １０１ The cyclic aliphatic hydrocarbon group in this context refers to an aliphatic hydrocarbon group that contains a ring in its structure. Examples of aliphatic hydrocarbon groups containing a ring in their structure include alicyclic hydrocarbon groups (groups from which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), groups in which an alicyclic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which an alicyclic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms. The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group from which one or more hydrogen atoms have been removed from a monocycloalkane. The preferred monocycloalkane has 3 to 6 carbon atoms, and specifically includes cyclopentane and cyclohexane. A preferred polycyclic alicyclic hydrocarbon group is a group from which one or more hydrogen atoms have been removed from a polycycloalkane, and the preferred polycycloalkane has 7 to 30 carbon atoms. Among these, the polycycloalkanes include adamantane, norbornane, isobornane, and tricyclo[5.2.1.0 ２，６ Polycycloalkanes having a cross-linked ring system polycyclic skeleton, such as decane and tetracyclododecane; polycycloalkanes having a fused ring system polycyclic skeleton, such as a cyclic group having a steroid skeleton, are more preferred. 【0219】 Among them, R １０１The cyclic aliphatic hydrocarbon group in is preferably a monocycloalkane or polycycloalkane from which one or more hydrogen atoms have been removed, more preferably a polycycloalkane from which one hydrogen atom has been removed, even more preferably an adamantyl group or a norbornyl group, and particularly preferably an adamantyl group. 【0220】 The linear aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 1 to 10 carbon atoms, more preferably 1 to 6, even more preferably 1 to 4, and most preferably 1 to 3. A linear alkylene group is preferred as the linear aliphatic hydrocarbon group, specifically a methylene group [-CH₂]. ２ -], ethylene group [- (CH ２ ) ２ -], trimethylene group [-(CH ２ ) ３ -], tetramethylene group [-(CH ２ ) ４ -], pentamethylene group [-(CH ２ ) ５ Examples include -]. The branched aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 2 to 10 carbon atoms, more preferably 3 to 6, even more preferably 3 or 4, and most preferably 3. A branched alkylene group is preferred as the branched aliphatic hydrocarbon group, specifically -CH(CH ３ )-,-CH(CH ２ CH ３ )-,-C(CH ３ ) ２ -, -C(CH ３ ) (CH ２ CH ３ )-,-C(CH ３ ) (CH ２ CH ２ CH ３ )-,-C(CH ２ CH ３ ) ２ - Alkyl methylene groups such as -CH(CH ３ )CH ２ -, -CH(CH ３ )CH(CH ３ )-,-C(CH ３ ) ２ CH２ -, -CH(CH ２ CH ３ )CH ２ -, -C(CH ２ CH ３ ) ２ -CH ２ - Alkyl ethylene groups such as -CH(CH ３ )CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ - Alkyl trimethylene groups such as -CH(CH ３ )CH ２ CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ CH ２ Examples include alkylalkylene groups such as alkyltetramethylene groups. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred. 【0221】 Also, R １０１ The cyclic hydrocarbon group in may contain heteroatoms, such as heterocycles. Specifically, lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), and -SO groups represented by the general formulas (b5-r-1) to (b5-r-4), respectively. ２ - Examples include cyclic groups and heterocyclic groups represented by the chemical formulas (r-hr-1) to (r-hr-16), respectively. 【0222】 R １０１Examples of substituents on the cyclic group include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, and nitro groups. C1-C5 alkyl groups are preferred as substituents. C1-C5 alkoxy groups are preferred as substituents, with methoxy, ethoxy, n-propoxy, iso-propoxy, n-butoxy, and tert-butoxy groups being more preferred, and methoxy and ethoxy groups being most preferred. Fluorine, bromine, and iodine atoms are preferred as substituents. C1-C5 alkyl halides are examples of alkyl groups, such as methyl, ethyl, propyl, n-butyl, and tert-butyl groups, in which some or all of the hydrogen atoms are substituted with the halogen atoms. Carbonyl groups as substituents include methylene groups (-CH4) that constitute the cyclic hydrocarbon group. ２ It is a substituting group for -). 【0223】 R １０１ The cyclic hydrocarbon group in may be a fused ring group containing a fused ring formed by the fusion of an aliphatic hydrocarbon ring and an aromatic ring. Examples of the fused ring include a polycycloalkane having a bridging ring system with one or more aromatic rings fused to it. Specific examples of the bridging ring system polycycloalkane include bicycloalkanes such as bicyclo[2.2.1]heptane (norbornane) and bicyclo[2.2.2]octane. The fused ring group is preferably a group containing a fused ring formed by the fusion of two or three aromatic rings to a bicycloalkane, and more preferably a group containing a fused ring formed by the fusion of two or three aromatic rings to bicyclo[2.2.2]octane. １０１ Specific examples of fused ring groups in this context include the groups represented by the following formulas (r-br-1) to (r-br-2). In the formulas, * represents Y in formula (b-1). １０１ This represents a coupling that connects to something. 【0224】 【0225】 R １０１Examples of substituents that the fused ring group in R may have include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, nitro groups, aromatic groups, alicyclic hydrocarbon groups, etc. The alkyl groups, alkoxy groups, halogen atoms, and alkyl halides as substituents of the fused ring group are as described above. １０１ Examples of substituents for cyclic groups include those similar to those listed in the above. Aromatic groups as substituents for the fused cyclic group include groups obtained by removing one hydrogen atom from an aromatic ring (aryl groups: e.g., phenyl group, naphthyl group, etc.), groups in which one hydrogen atom of the aromatic ring is replaced by an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.), and heterocyclic groups represented by the above formulas (r-hr-1) to (r-hr-6). Alicyclic hydrocarbon groups as substituents for the fused cyclic group include groups obtained by removing one hydrogen atom from monocycloalkanes such as cyclopentane and cyclohexane; adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ ] Groups obtained by removing one hydrogen atom from polycycloalkanes such as decane and tetracyclododecane; lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), respectively; -SO groups represented by the general formulas (b5-r-1) to (b5-r-4), respectively. ２ - Containing cyclic groups; examples include heterocyclic groups represented by the chemical formulas (r-hr-7) to (r-hr-16), respectively. 【0226】 A chain-like alkyl group which may have substituents: R １０１The linear alkyl group may be linear or branched. Linear alkyl groups preferably have 1 to 20 carbon atoms, more preferably 1 to 15, and most preferably 1 to 10. Branched alkyl groups preferably have 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10. Specifically, examples include 1-methylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, and 4-methylpentyl group. 【0227】 A chain-like alkenyl group which may have substituents: R １０１ The linear alkenyl group may be linear or branched, and preferably has 2 to 10 carbon atoms, more preferably 2 to 5, even more preferably 2 to 4, and particularly preferably 3. Examples of linear alkenyl groups include vinyl groups, propenyl groups (allyl groups), and butenyl groups. Examples of branched alkenyl groups include 1-methylvinyl groups, 2-methylvinyl groups, 1-methylpropenyl groups, and 2-methylpropenyl groups. Among the linear alkenyl groups listed above, linear alkenyl groups are preferred, vinyl groups and propenyl groups are more preferred, and vinyl groups are particularly preferred. 【0228】 R １０１ Examples of substituents in the chain-like alkyl or alkenyl group include alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, nitro groups, amino groups, and the above R １０１ Examples include cyclic groups in this context. 【0229】 In formula (b-1), Y １０１ Y is a single bond or a divalent linking group containing an oxygen atom. １０１ If Y is a divalent linking group containing an oxygen atom, １０１It may contain atoms other than oxygen atoms. Examples of atoms other than oxygen atoms include carbon atoms, hydrogen atoms, sulfur atoms, nitrogen atoms, etc. Examples of divalent linking groups containing oxygen atoms include non-hydrocarbon oxygen atom-containing linking groups such as oxygen atoms (ether bond: -O-), ester bonds (-C(=O)-O-), oxycarbonyl groups (-O-C(=O)-), amide bonds (-C(=O)-NH-), carbonyl groups (-C(=O)-), and carbonate bonds (-O-C(=O)-O-); and combinations of the non-hydrocarbon oxygen atom-containing linking group and alkylene groups. This combination may further include sulfonyl groups (-SO ２ A -) may be linked. Examples of such divalent linking groups containing an oxygen atom include the linking groups represented by the following general formulas (y-al-1) to (y-al-7). Note that in the following general formulas (y-al-1) to (y-al-7), the R in formula (b-1) above １０１ The combination with this is V' in the following general formulas (y-al-1) to (y-al-7). １０１ That is the case. 【0230】 [In the formula, V' １０１ V' is a single bond or an alkylene group having 1 to 5 carbon atoms. １０２ [This refers to a divalent saturated hydrocarbon group having 1 to 30 carbon atoms.] 【0231】 V' １０２ The divalent saturated hydrocarbon group in is preferably an alkylene group having 1 to 30 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, and even more preferably an alkylene group having 1 to 5 carbon atoms. 【0232】 V' １０１ and V' １０２ The alkylene group in V' may be a linear alkylene group or a branched alkylene group, but a linear alkylene group is preferred. １０１ and V' １０２ Specifically, the alkylene group in this case is the methylene group [-CH ２ -come; -CH(CH ３ )-,-CH(CH ２ CH ３)-,-C(CH ３ ) ２ -, -C(CH ３ ) (CH ２ CH ３ )-,-C(CH ３ ) (CH ２ CH ２ CH ３ )-,-C(CH ２ CH ３ ) ２ - Alkylmethylene groups such as; ethylene groups [-CH ２ CH ２ -come; -CH(CH ３ )CH ２ -, -CH(CH ３ )CH(CH ３ )-,-C(CH ３ ) ２ CH ２ -, -CH(CH ２ CH ３ )CH ２ - Alkylethylene groups such as; trimethylene group (n-propylene group) [-CH ２ CH ２ CH ２ -come; -CH(CH ３ )CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ - Alkyl trimethylene groups such as; tetramethylene groups [-CH ２ CH ２ CH ２ CH ２ -come; -CH(CH ３ )CH ２ CH ２ CH ２ -ien-CH ２ CH (CH ３ )CH ２ CH ２ - Alkyltetramethylene groups such as; pentamethylene groups [-CH ２ CH ２ CH ２ CH ２ CH ２ -] are some examples. Also, V' １０１ or V' １０２Some of the methylene groups in the alkylene group may be substituted with a divalent aliphatic cyclic group having 5 to 10 carbon atoms. The aliphatic cyclic group is Ra' in formula (a1-r-2). ４ A divalent group is preferred, which is obtained by removing one more hydrogen atom from a cyclic aliphatic hydrocarbon group (a monocyclic aliphatic hydrocarbon group or a polycyclic aliphatic hydrocarbon group), and a cyclohexylene group, a 1,5-adamantilene group, or a 2,6-adamantilene group is more preferred. 【0233】 Y １０１ Preferably, the linking group is a divalent linking group containing an ester bond or a divalent linking group containing an ether bond, and more preferably the linking groups represented by the above formulas (y-al-1) to (y-al-5). 【0234】 In formula (b-1), V １０１ These are single bonds, alkylene groups, or fluorinated alkylene groups. Among them, V １０１ It is preferable that the fluorinated alkylene group is a single bond or a linear fluorinated alkylene group having 1 to 4 carbon atoms. 【0235】 In formula (b-1), R １０２ R is a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. １０２ It is preferably a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms, and more preferably a fluorine atom. 【0236】 A specific example of the anion part represented by formula (b-1) is, for example, Y １０１ When it is a single bond, examples include fluorinated alkyl sulfonate anions such as trifluoromethanesulfonate anions and perfluorobutanesulfonate anions; Y １０１ When is a divalent linking group containing an oxygen atom, anions represented by any of the following formulas (an-1) to (an-3) are included. 【0237】 [In the formula, R” １０１R'' is an optionally substituted aliphatic cyclic group, a monovalent heterocyclic group represented by the above chemical formulas (r-hr-1) to (r-hr-16), a fused cyclic group represented by the above formula (r-br-1) or (r-br-2), an optionally substituted linear alkyl group, or an optionally substituted aromatic cyclic group. １０２ This includes an aliphatic cyclic group which may have substituents, a fused cyclic group represented by formula (r-br-1) or (r-br-2), a lactone-containing cyclic group represented by the general formulas (a2-r-1), (a2-r-3) to (a2-r-7), respectively, or a -SO group represented by the general formulas (b5-r-1) to (b5-r-4), respectively. ２ - Contains a cyclic group. R'' １０３ V'' is an optionally substituted aromatic cyclic group, an optionally substituted aliphatic cyclic group, or an optionally substituted linear alkenyl group. １０１ This is a single bond, an alkylene group having 1 to 4 carbon atoms, or a fluorinated alkylene group having 1 to 4 carbon atoms. １０２ [wherein 'v' is a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms; where 'v' is an independent integer from 0 to 3, where 'q' is an independent integer from 0 to 20, and where 'n' is 0 or 1.] 【0238】 R" １０１ , R” １０２ and R” １０３ The aliphatic cyclic group which may have substituents is R in formula (b-1) above. １０１ It is preferable that the substituent is the group exemplified as a cyclic aliphatic hydrocarbon group in formula (b-1). １０１ Examples include substituents similar to those that may be substituted for the cyclic aliphatic hydrocarbon group in the above. 【0239】 R" １０１ and R” １０３ The aromatic cyclic group which may have substituents in formula (b-1) is R １０１ It is preferable that the substituent is the group exemplified as an aromatic group in the cyclic hydrocarbon group in the above formula (b-1). １０１ Examples include substituents similar to those that may be substituted for the aromatic group in the above. 【0240】 R" １０１ The chain-like alkyl group which may have substituents in formula (b-1) is R １０１ The group exemplified as the chain-like alkyl group in R is preferred. １０３ The chain-like alkenyl group which may have substituents in formula (b-1) is R １０１ It is preferable that the group is one of the examples given as a chain-like alkenyl group in the formula. 【0241】 • In the anionic formula (b-2) of component (b-2), R １０４ , R １０５ Each of these is independently a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents, and each of them is R in formula (b-1). １０１ Similar examples can be given. However, R １０４ , R １０５ They may be bonded to each other to form a ring. １０４ , R １０５ The linear alkyl group is preferably a substituted linear alkyl group, more preferably a linear or branched alkyl group, or a linear or branched fluorinated alkyl group. The number of carbon atoms in the linear alkyl group is preferably 1 to 10, more preferably 1 to 7, and even more preferably 1 to 3. １０４ , R １０５ The number of carbon atoms in the chain-like alkyl group is preferably small within the above range of carbon atoms, for reasons such as good solubility in the resist solvent. １０４ , R １０５ In the chain-like alkyl group, the greater the number of hydrogen atoms substituted with fluorine atoms, the stronger the acidity and the better the transparency to high-energy light and electron beams below 250 nm, which is preferable. The proportion of fluorine atoms in the chain-like alkyl group, i.e., the fluorination rate, is preferably 70 to 100%, more preferably 90 to 100%, and most preferably a perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms. In formula (b-2), V １０２ , V １０３These are, independently, a single bond, an alkylene group, or a fluorinated alkylene group, and each is V in formula (b-1). １０１ Similar examples can be given. In equation (b-2), L １０１ , L １０２ Each of these is either a single bond or an oxygen atom, independently of the others. 【0242】 • In the anionic formula (b-3) of component (b-3), R １０６ ~R １０８ Each of these is independently a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents, and each of them is R in formula (b-1). １０１ Similar examples can be given. In equation (b-3), L １０３ ~L １０５ These are, independently, single bonds, -CO-, or -SO-. ２ - is the case. 【0243】 • In the anionic formula (b-4) of component (b-4), Rb ２ R' is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. ２０１ Similar examples include the following. However, Rb ２ In this example, assume that the carbon atom adjacent to the S atom is not bonded to a fluorine atom (i.e., not fluorine-substituted). Rb ２ Preferably, the group is a chain-like alkyl group which may have substituents, or an aliphatic cyclic group which may have substituents, and more preferably an aliphatic cyclic group which may have substituents. 【0244】 The linear alkyl group is preferably having 1 to 10 carbon atoms, and more preferably 3 to 10 carbon atoms. The aliphatic cyclic group is adamantane, norbornane, isobornane, tricyclo[5.2.1.0 ２，６ A group obtained by removing one or more hydrogen atoms from decane, tetracyclododecane, etc. (which may have substituents); more preferably a group obtained by removing one or more hydrogen atoms from camphor. 【0245】 Rb ２The hydrocarbon group may have substituents, and such substituents may be Rd of formula (d2-1) described below. １ Examples of substituents that may be present on hydrocarbon groups (aromatic groups, aliphatic cyclic groups, and linear alkyl groups) in the above are similar to those mentioned above. 【0246】 The following are preferred specific examples of the anionic portion of component (b-4). 【0247】 【0248】 {Cation part} In the above formulas (b-1), (b-2), (b-3), and (b-4), M' ｍ＋ This represents an m-valent onium cation. Among these, sulfonium cations and iodonium cations are preferred. m is an integer of 1 or more. 【0249】 As the cation portion of component (B1), a sulfonium cation is preferred, the cations represented by the following formulas (ca-1) to (ca-3) are more preferred, the cation represented by the following formula (ca-1) is even more preferred, and the cations represented by the following formulas (ca-1-1) to (ca-1-104) are particularly preferred. 【0250】 [In the formula, R ２０１ ~R ２０７ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ２０１ ~R ２０３ , R ２０６ ~R ２０７ These atoms may bond to each other to form a ring with the sulfur atom in the formula. ２０８ ~R ２０９ Each of these independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. ２１０ This may be an aryl group having a substituent, an alkyl group having a substituent, an alkenyl group having a substituent, or an -SO group having a substituent. ２ - Contains a cyclic group. L ２０１ This represents -C(=O)- or -C(=O)-O-. 【0251】In the above general formulas (ca-1) to (ca-3), R ２０１ ~R ２０７ Examples of the aryl group in include aryl groups having 6 to 20 carbon atoms, and a phenyl group and a naphthyl group are preferable. R ２０１ ~R ２０７ Examples of the alkyl group in include linear or cyclic alkyl groups, preferably those having 1 to 30 carbon atoms. R ２０１ ~R ２０７ Examples of the alkenyl group in preferably have 2 to 10 carbon atoms. R ２０１ ~R ２０７ , and R ２１０ Examples of the substituent that may have include, for example, an alkyl group, a halogen atom, a halogenated alkyl group, a carbonyl group, a cyano group, an amino group, an aryl group, a group represented by each of the above general formulas (ca-r-1) to (ca-r-7), and the like. 【0252】 In the above general formulas (ca-1) to (ca-3), R ２０１ ~R ２０３ , R ２０６ ~R ２０７ When R~R are bonded to each other to form a ring together with the sulfur atom in the formula, they may be bonded via a hetero atom such as a sulfur atom, an oxygen atom, or a nitrogen atom, or a functional group such as a carbonyl group, -SO-, -SO ２ -, -SO ３ -, -COO-, -CONH-, or -N(R Ｎ )-(where R Ｎ is an alkyl group having 1 to 5 carbon atoms).). The ring formed is preferably a 3- to 10-membered ring, particularly preferably a 5- to 7-membered ring, including the sulfur atom in the formula in its ring skeleton. Specific examples of the ring formed include, for example, a thiophene ring, a thiazole ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthrene ring, a phenoxathiin ring, a tetrahydrothiophenium ring, a tetrahydrothiopyranium ring, and the like. 【0253】 R ２０８ ~R ２０９Each of these independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. If an alkyl group is formed, it may bond to each other to form a ring. 【0254】 R ２１０ This may be an aryl group having a substituent, an alkyl group having a substituent, an alkenyl group having a substituent, or an -SO group having a substituent. ２ - Contains a cyclic group. R ２１０ Examples of aryl groups in this context include aryl groups having 6 to 20 carbon atoms, with phenyl and naphthyl groups being preferred. ２１０ The alkyl group in is preferably a linear or cyclic alkyl group having 1 to 30 carbon atoms. ２１０ The alkenyl group in is preferably one with 2 to 10 carbon atoms. ２１０ In, -SO ２ - The contained cyclic group is not particularly limited and any group can be used. Specifically, the groups represented by the general formulas (b5-r-1) to (b5-r-4) are examples, and "-SO ２ A polycyclic group containing a polycyclic group is preferred, and a group represented by the general formula (b5-r-1) is more preferred. 【0255】 Specific examples of suitable cations represented by the above formula (ca-1) include the cations represented by the following chemical formulas. 【0256】 【0257】 【0258】 [In the formula, g1, g2, and g3 represent the number of repetitions, where g1 is an integer from 1 to 5, g2 is an integer from 0 to 20, and g3 is an integer from 1 to 20.] 【0259】 【0260】 【0261】 [In the formula, R” ２０１is a hydrogen atom or a substituent, and the substituent is the aforementioned Rb ０１ ~Rb ０３ These are the same as those listed as substituents that may be present. 【0262】 【0263】 【0264】 【0265】 Specific examples of suitable cations represented by the formula (ca-2) include diphenyliodonium cation and bis(4-tert-butylphenyl)iodonium cation. 【0266】 Specific examples of suitable cations represented by the above formula (ca-3) include the cations represented by the following formulas (ca-3-1) to (ca-3-7). 【0267】 【0268】 The cation portion of component (B1) is preferably a sulfonium cation, more preferably the cations represented by formulas (ca-1) to (ca-3), even more preferably the cation represented by formula (ca-1), and particularly preferably the cations represented by formulas (ca-1-1) to (ca-1-104). 【0269】 In the resist composition of this embodiment, component (B1) may be used alone or in combination of two or more types. When the resist composition contains component (B1), the content of component (B1) in the resist composition is preferably less than 40 parts by mass, more preferably 0 to 20 parts by mass, and even more preferably 0 to 5 parts by mass, per 100 parts by mass of component (A). Setting the content of component (B1) within the above preferred range makes it easier to obtain a uniform solution when each component of the resist composition is dissolved in an organic solvent, and thus improves the storage stability of the resist composition, which is preferable. 【0270】 Since the resist composition of this embodiment contains component (B0), it is preferable that it does not contain component (B1). 【0271】 <<Crosslinking Agent (C)>> Component (C) in the resist composition of this embodiment is at least one crosslinking agent selected from the group consisting of a melamine-based crosslinking agent, a urea-based crosslinking agent, an alkylene urea-based crosslinking agent, a glycoluril-based crosslinking agent, and an epoxy-based crosslinking agent. 【0272】 As the melamine-based crosslinking agent, compounds obtained by reacting melamine with formaldehyde to substitute the hydrogen atom of the amino group with a hydroxymethyl group, compounds obtained by reacting melamine with formaldehyde and a lower alcohol to substitute the hydrogen atom of the amino group with a lower alkoxymethyl group, etc. can be mentioned. Specifically, hexamethoxymethylmelamine, hexaethoxymethylmelamine, hexapropoxymethylmelamine, hexabutoxymethylmelamine, etc. can be mentioned, and among them, hexamethoxymethylmelamine is preferable. 【0273】 As the urea-based crosslinking agent, compounds obtained by reacting urea with formaldehyde to substitute the hydrogen atom of the amino group with a hydroxymethyl group, compounds obtained by reacting urea with formaldehyde and a lower alcohol to substitute the hydrogen atom of the amino group with a lower alkoxymethyl group, etc. can be mentioned. Specifically, bis(methoxymethyl)urea, bis(ethoxymethyl)urea, bis(propoxymethyl)urea, bis(butoxymethyl)urea, etc. can be mentioned, and among them, bis(methoxymethyl)urea is preferable. 【0274】 As the alkylene urea-based crosslinking agent, compounds represented by the following general formula (CA-1) can be mentioned. [In formula (CA-1), Rc １ and Rc ２ are each independently a hydroxyl group or a lower alkoxy group, Rc ３ and Rc ４ are each independently a hydrogen atom, a hydroxyl group or a lower alkoxy group, and vc is an integer of 0 to 2. ] 【0275】 Rc １ and Rc ２ When they are lower alkoxy groups, they are preferably alkoxy groups having 1 to 4 carbon atoms, which may be linear or branched. Rc １ and Rc ２They may be the same, or they may be different from each other. It is more preferable that they be the same. Rc ３ and Rc ４ When Rc is a lower alkoxy group, it is preferably an alkoxy group having 1 to 4 carbon atoms, and may be linear or branched. ３ and Rc ４ They may be the same or different from each other. It is more preferable that they be the same. vc is an integer between 0 and 2, preferably 0 or 1. As alkylene urea crosslinking agents, compounds in which vc is 0 (ethylene urea crosslinking agents) and / or compounds in which vc is 1 (propylene urea crosslinking agents) are particularly preferred. 【0276】 The compound represented by the above general formula (CA-1) can be obtained by condensing alkylene urea with formalin, and then by reacting the resulting product with a lower alcohol. 【0277】 Specific examples of alkylene urea-based crosslinking agents include, for example, ethylene urea-based crosslinking agents such as mono and / or dihydroxymethylated ethylene urea, mono and / or dimethoxymethylated ethylene urea, mono and / or diethoxymethylated ethylene urea, mono and / or dipropoxymethylated ethylene urea, and mono and / or dibutoxymethylated ethylene urea; propylene urea-based crosslinking agents such as mono and / or dihydroxymethylated propylene urea, mono and / or dimethoxymethylated propylene urea, mono and / or diethoxymethylated propylene urea, mono and / or dipropoxymethylated propylene urea, and mono and / or dibutoxymethylated propylene urea; and 1,3-di(methoxymethyl)4,5-dihydroxy-2-imidazolidinone, 1,3-di(methoxymethyl)-4,5-dimethoxy-2-imidazolidinone, and the like. 【0278】Examples of glycoluryl crosslinking agents include glycoluryl derivatives in which the N position is substituted with one or both of a hydroxyalkyl group and an alkoxyalkyl group having 1 to 4 carbon atoms. Such glycoluryl derivatives can be obtained by condensing glycoluryl with formalin, and by reacting the product with a lower alcohol. Specific examples of glycoluryl crosslinking agents include, for example, mono, di, tri and / or tetrahydroxymethylated glycoluryl; mono, di, tri and / or tetramethoxymethylated glycoluryl; mono, di, tri and / or tetraethoxymethylated glycoluryl; mono, di, tri and / or tetrapropoxymethylated glycoluryl; and mono, di, tri and / or tetrabutoxymethylated glycoluryl. 【0279】 The epoxy crosslinking agent is not particularly limited as long as it has epoxy groups, and can be arbitrarily selected and used. Among these, those having two or more epoxy groups are preferred. Having two or more epoxy groups improves the crosslinking reactivity. The number of epoxy groups is preferably two or more, more preferably two to four, and most preferably two. Suitable epoxy crosslinking agents are listed below. 【0280】 【0281】 In particular, the (C) component is -NCH ２ - OCH ３ A crosslinking agent having a group is preferred, and is a compound represented by the following formula (c1-1) or (c1-2), -NCH ２ - OCH ３ A crosslinking agent selected from the group consisting of compounds having a group and a melamine skeleton, and mono, di, tri and / or tetramethoxymethylated glycoluryl is more preferred, -NCH ２ - OCH ３ A crosslinking agent selected from the group consisting of compounds having a group and a melamine skeleton, and mono, di, tri and / or tetramethoxymethylated glycoluryls is even more preferred. 【0282】 [In the formula, nc1 and nc2 are each an integer between 1 and 3, independently of each other.] 【0283】 Component (C) may be used alone or in combination of two or more types. In the resist composition of this embodiment, the content of component (C) is preferably 1 to 50 parts by mass, more preferably 3 to 40 parts by mass, even more preferably 3 to 30 parts by mass, and most preferably 5 to 25 parts by mass, per 100 parts by mass of component (A1). If the content of component (C) is above the lower limit, crosslinking will proceed sufficiently, and the resolution performance and lithography characteristics will be further improved. In addition, a good resist pattern with less swelling can be obtained. If the content is below this upper limit, the storage stability of the resist composition will be good, and the deterioration of sensitivity over time will be more easily suppressed. 【0284】 <Other Components> In addition to the components (A), (B), and (C) described above, the resist composition of this embodiment may further contain other components. Examples of other components include the components (D), (E), (F), and (S) shown below. 【0285】 ≪Basic Component (D)≫ Component (D) acts as a quencher (acid diffusion control agent) that traps the acid generated by exposure in the resist composition. Examples of component (D) include nitrogen-containing organic compounds (D1) (hereinafter referred to as "component (D1)") and photodegradable bases (D2) that do not fall under component (D1) and decompose upon exposure, losing their acid diffusion control properties (hereinafter referred to as "component (D2)")). By using a resist composition containing component (D), the contrast between the exposed and unexposed areas of the resist film can be further improved when forming a resist pattern. As for component (D), component (D1) is preferred from the viewpoint of improving the transmittance of the resist film to the exposure light source when forming a thick resist pattern. 【0286】 Regarding component (D1): Component (D1) is a basic component and is a nitrogen-containing organic compound that acts as an acid diffusion control agent in the resist composition. 【0287】The (D1) component is not particularly limited as long as it acts as an acid diffusion control agent, and examples include aliphatic amines, aromatic amines, etc. 【0288】 Among aliphatic amines, secondary and tertiary aliphatic amines are preferred. An aliphatic amine is an amine having one or more aliphatic groups, and the aliphatic groups preferably have 1 to 12 carbon atoms. Ammonia NH ３ Examples include amines (alkylamines or alkyl alcoholamines) or cyclic amines in which at least one hydrogen atom is substituted with an alkyl group or hydroxyalkyl group having 12 or fewer carbon atoms. Specific examples of alkylamines and alkyl alcoholamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, and tri-n-dodecylamine; and alkyl alcoholamines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, and tri-n-octanolamine. Among these, trialkylamines having 5 to 10 carbon atoms are more preferred, and tri-n-pentylamine or tri-n-octylamine are particularly preferred. 【0289】Examples of cyclic amines include heterocyclic compounds containing a nitrogen atom as a heteroatom. These heterocyclic compounds may be monocyclic (aliphatic monocyclic amines) or polycyclic (aliphatic polycyclic amines). Specific examples of aliphatic monocyclic amines include piperidine and piperazine. Aliphatic polycyclic amines with 6 to 10 carbon atoms are preferred, and specific examples include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo[2.2.2]octane. 【0290】 Other aliphatic amines include tris(2-methoxymethoxyethyl)amine, tris{2-(2-methoxyethoxy)ethyl}amine, tris{2-(2-methoxyethoxymethoxy)ethyl}amine, tris{2-(1-methoxyethoxy)ethyl}amine, tris{2-(1-ethoxyethoxy)ethyl}amine, tris{2-(1-ethoxypropoxy)ethyl}amine, tris[2-{2-(2-hydroxyethoxy)ethoxy}ethyl]amine, triethanolamine triacetate, etc., with triethanolamine triacetate being preferred. 【0291】 Examples of aromatic amines include 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole or derivatives thereof, tripenzylamine, aniline compounds, and N-tert-butoxycarbonylpyrrolidine. 【0292】Component (D1) may be used alone or in combination of two or more. Among the above, aromatic amines are preferred for component (D1), and aniline compounds are more preferred. Examples of aniline compounds include 2,6-diisopropylaniline, N,N-dimethylaniline, N,N-dibutylaniline, and N,N-dihexylaniline. When the resist composition contains component (D1), the content of component (D1) in the resist composition is preferably more than 0 parts by mass and 25 parts by mass or less, more preferably 0.1 to 15 parts by mass, even more preferably 0.2 to 10 parts by mass, and particularly preferably 0.3 to 5 parts by mass, per 100 parts by mass of component (A). 【0293】 Regarding component (D2): Component (D2) is not particularly limited as long as it decomposes upon exposure and loses its acid diffusion controllability. Preferably, it is one or more compounds selected from the group consisting of the compound represented by the following general formula (d2-1) (hereinafter referred to as "component (d2-1)"), the compound represented by the following general formula (d2-2) (hereinafter referred to as "component (d2-2)"), and the compound represented by the following general formula (d2-3) (hereinafter referred to as "component (d2-3)"). Components (d2-1) to (d2-3) decompose in the exposed areas of the resist film and lose their acid diffusion controllability (basicity), and therefore do not act as quenchers, but act as quenchers in the unexposed areas of the resist film. 【0294】 [In the formula, Rd １ ~Rd ４ Rd in general formula (d2-2) is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. ２ In this example, assume that no fluorine atoms are bonded to the carbon atoms adjacent to the sulfur atom. １ is a single bond or a divalent linking group. m is an integer greater than or equal to 1, and M' ｍ＋ These are each independently m-valent onium cations. 【0295】 {(d2-1) component} - In the anionic component of formula (d2-1), Rd １R in formula (b-1) is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents, and each of these is R １０１ Examples of similar items include Rd １ Preferred substituents include optionally substituted aromatic hydrocarbon groups, optionally substituted aliphatic cyclic groups, or optionally substituted linear alkyl groups. Examples of substituents these groups may have include hydroxyl groups, oxo groups, alkyl groups, aryl groups, fluorine atoms, fluorinated alkyl groups, lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), ether bonds, ester bonds, or combinations thereof. When ether bonds or ester bonds are included as substituents, they may be mediated via alkylene groups, and preferred substituents in this case are the linking groups represented by the general formulas (y-al-1) to (y-al-5). Suitable examples of the aromatic hydrocarbon groups include phenyl groups, naphthyl groups, and polycyclic structures containing a bicyclooctane skeleton (for example, polycyclic structures consisting of a bicyclooctane skeleton ring structure and other ring structures). The aliphatic cyclic group is more preferably a group obtained by removing one or more hydrogen atoms from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane. The linear alkyl group is preferably having 1 to 10 carbon atoms, and specifically includes linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl groups; and branched alkyl groups such as 1-methylethyl, 1-methylpropyl, 2-methylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, and 4-methylpentyl groups. 【0296】When the chain-like alkyl group is a fluorinated alkyl group having a fluorinated alkyl group as a substituent, the number of carbon atoms in the fluorinated alkyl group is preferably 1 to 11, more preferably 1 to 8, and even more preferably 1 to 4. The fluorinated alkyl group may contain atoms other than fluorine. Examples of atoms other than fluorine include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Rd １ Preferably, the linear alkyl group is a fluorinated alkyl group in which some or all of the hydrogen atoms constituting the linear alkyl group are substituted with fluorine atoms, and particularly preferably, the linear alkyl group is a fluorinated alkyl group (linear perfluoroalkyl group) in which all of the hydrogen atoms constituting the linear alkyl group are substituted with fluorine atoms. 【0297】 The following are preferred specific examples of the anion portion of component (d2-1). 【0298】 【0299】 - In the cation component of formula (d2-1), M' ｍ＋ This is an m-valent onium cation. ｍ＋ Suitable onium cations include those similar to those represented by the general formulas (ca-1) to (ca-3), with the cation represented by the general formula (ca-1) being more preferred, and the cations represented by the formulas (ca-1-1) to (ca-1-104) being even more preferred. The (d2-1) component may be used alone or in combination of two or more types. 【0300】 {(d2-2) component} - In the anionic component of formula (d2-2), Rd ２ R in formula (b-1) is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. １０１ Examples include those similar to the above. However, Rd ２ In this case, the carbon atom adjacent to the S atom is assumed to be unbonded to a fluorine atom (not fluorine-substituted). This results in the (d2-2) component anion becoming a moderately weak acid anion, improving the quenching ability of the (D2) component. Rd ２is preferably a linear alkyl group which may have a substituent, or an aliphatic cyclic group which may have a substituent. The linear alkyl group preferably has 1 to 10 carbon atoms, more preferably 3 to 10 carbon atoms. The aliphatic cyclic group includes a group obtained by removing one or more hydrogen atoms from adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc. (which may have a substituent); and a group obtained by removing one or more hydrogen atoms from camphor or the like. Rd ２ The hydrocarbon group of may have a substituent, and examples of the substituent include the same ones as those which the hydrocarbon group (aromatic group, aliphatic cyclic group, linear alkyl group) in Rd of the formula (d2-1) may have. １ The hydrocarbon group in Rd of the formula (d2-1) may have the same substituents as those which the hydrocarbon group (aromatic group, aliphatic cyclic group, linear alkyl group) may have. 【0301】 Preferred specific examples of the anionic part of the component (d2-2) are shown below. 【0302】 【0303】 - In the cationic part formula (d2-2), M' ｍ＋ is an m-valent onium cation, which is the same as M' in the formula (d2-1). The component (d2-2) may be used alone or in combination of two or more. ｍ＋ The component (d2-2) may be used alone or in combination of two or more. 【0304】 {Component (d2-3)} - In the anionic part formula (d2-3), Rd ３ is a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent, and examples thereof include the same ones as those of R in the formula (b-1). It is preferably a cyclic group, a linear alkyl group, or a linear alkenyl group containing a fluorine atom. Among them, a fluorinated alkyl group is preferable, and a group similar to the fluorinated alkyl group of Rd is more preferable. １０１ In the formula (d2-3), Rd １ is a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent, and examples thereof include the same ones as those of R in the formula (b-1). It is preferably a cyclic group, a linear alkyl group, or a linear alkenyl group containing a fluorine atom. Among them, a fluorinated alkyl group is preferable, and a group similar to the fluorinated alkyl group of Rd is more preferable. 【0305】 In the formula (d2-3), Rd ４ is a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent, and examples thereof include the same ones as those of R in the formula (b-1). １０１Examples thereof include the same as those described above. Among them, an alkyl group, an alkoxy group, an alkenyl group, or a cyclic group which may have a substituent is preferable. Rd ４ The alkyl group in Rd is preferably a linear or branched alkyl group having 1 to 5 carbon atoms. Specifically, examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group. Rd ４ A part of the hydrogen atoms of the alkyl group of Rd may be substituted with a hydroxyl group, a cyano group, or the like. Rd ４ The alkoxy group in Rd is preferably an alkoxy group having 1 to 5 carbon atoms. Specific examples of the alkoxy group having 1 to 5 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group. Among them, a methoxy group and an ethoxy group are preferable. 【0306】 Rd ４ The alkenyl group in Rd includes the same as those such as R in the above formula (b-1). １０１ Examples thereof include a vinyl group, a propenyl group (allyl group), a 1-methylpropenyl group, and a 2-methylpropenyl group. These groups may further have an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms as a substituent. 【0307】 Rd ４ The cyclic group in Rd includes the same as those such as R in the above formula (b-1). １０１ Examples thereof include an alicyclic group obtained by removing one or more hydrogen atoms from cycloalkanes such as cyclopentane, cyclohexane, adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane, or an aromatic group such as a phenyl group and a naphthyl group. Rd ４ When Rd is an alicyclic group, the resist composition dissolves well in an organic solvent, and thus the lithography characteristics are good. 【0308】 In the formula (d2-3), Yd １ is a single bond or a divalent linking group. Yd １The divalent linking group in formula (a10-1) is not particularly limited, but may include divalent hydrocarbon groups (aliphatic hydrocarbon groups, aromatic groups) which may have substituents, and divalent linking groups containing heteroatoms. These are respectively Ya in formula (a10-1) above. ｘ１ Examples of divalent linking groups include divalent hydrocarbon groups that may have substituents, and divalent linking groups containing heteroatoms, as mentioned in the explanation of divalent linking groups in Yd. １ The preferred members are carbonyl groups, ester bonds, amide bonds, alkylene groups, or combinations thereof. The alkylene group is more preferably a linear or branched alkylene group, and even more preferably a methylene group or an ethylene group. 【0309】 The following are preferred specific examples of the anionic portion of component (d2-3). 【0310】 【0311】 【0312】 - In the cation component formula (d2-3), M' ｍ＋ This is an onium cation with m-valence, and M' in formula (d2-1) above. ｍ＋ The same applies. (d2-3) Components may be used individually or in combination of two or more. 【0313】 The (D2) component may be any one of the above components (d2-1) to (d2-3), or two or more may be used in combination. When the resist composition contains the (D2) component, the content of the (D2) component in the resist composition is preferably 0.5 to 35 parts by mass, more preferably 1 to 25 parts by mass, even more preferably 2 to 20 parts by mass, and particularly preferably 3 to 15 parts by mass, per 100 parts by mass of component (A). When the content of the (D2) component is above the preferred lower limit, particularly good lithography characteristics and resist pattern shape are easily obtained. On the other hand, when it is below the upper limit, a balance with other components can be achieved, and various lithography characteristics are good. 【0314】Method for producing component (D2): The methods for producing components (d2-1) and (d2-2) described above are not particularly limited and can be produced by known methods. The method for producing component (d2-3) is also not particularly limited and can be produced, for example, in the same manner as described in US2012-0149916. 【0315】 ≪At least one compound (E) selected from the group consisting of organic carboxylic acids and phosphorus oxoacids and their derivatives≫ The resist composition of this embodiment may contain, as an optional component, at least one compound (E) selected from the group consisting of organic carboxylic acids and phosphorus oxoacids and their derivatives (hereinafter referred to as "component (E)"). Specifically, examples of organic carboxylic acids include acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, salicylic acid, etc., with salicylic acid being preferred among them. Examples of phosphorus oxoacids include phosphoric acid, phosphonic acid, phosphinic acid, etc., with phosphonic acid being particularly preferred among these. Examples of derivatives of phosphorus oxoacids include esters obtained by substituting the hydrogen atoms of the above oxoacid with hydrocarbon groups, and examples of hydrocarbon groups include alkyl groups having 1 to 5 carbon atoms and aryl groups having 6 to 15 carbon atoms. Examples of phosphoric acid derivatives include phosphate esters such as di-n-butyl phosphate and diphenyl phosphate. Examples of phosphonic acid derivatives include phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate. Examples of phosphinic acid derivatives include phosphinic acid esters and phenylphosphinic acid. 【0316】In the resist composition of this embodiment, component (E) may be used alone or in combination of two or more types. When the resist composition contains component (E), the content of component (E) is preferably 0.01 to 5 parts by mass, and more preferably 0.05 to 3 parts by mass, per 100 parts by mass of component (A). By setting the content within the above range, the lithography characteristics are further improved. 【0317】 ≪Fluorine Additive Component (F)≫ The resist composition in this embodiment may contain a fluorine additive component (hereinafter referred to as "component (F)") as a hydrophobic resin. Component (F) is used to impart water repellency to the resist film and improves lithography properties by being used as a resin separate from component (A). As component (F), for example, fluorine-containing polymer compounds described in Japanese Patent Publication No. 2010-002870, Japanese Patent Publication No. 2010-032994, Japanese Patent Publication No. 2010-277043, Japanese Patent Publication No. 2011-13569, and Japanese Patent Publication No. 2011-128226 can be used. More specifically as component (F), polymers having a constituent unit (f1) represented by the following general formula (f1-1) can be mentioned. The polymer is preferably a polymer (homopolymer) consisting only of a constituent unit (f1) represented by the following formula (f1-1); a copolymer of the constituent unit (f1) and the constituent unit (a1); and more preferably a copolymer of the constituent unit (f1) and a constituent unit derived from acrylic acid or methacrylic acid and the constituent unit (a1). Here, the constituent unit (a1) copolymerized with the constituent unit (f1) is preferably a constituent unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate, a constituent unit derived from 1-methyl-1-adamantyl (meth)acrylate, and more preferably a constituent unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate. 【0318】 [In the formula, R is the same as above, Rf １０２ and Rf １０３ Each of these independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, and Rf１０２ and Rf １０３ They may be the same or different. １ Rf is an integer between 0 and 5. １０１ It is an organic group containing a fluorine atom. 【0319】 In formula (f1-1), R bonded to the carbon atom at the α position is the same as described above. R is preferably a hydrogen atom or a methyl group. In formula (f1-1), Rf １０２ and Rf １０３ A fluorine atom is preferred as the halogen atom. Rf １０２ and Rf １０３ Examples of alkyl groups having 1 to 5 carbon atoms in R include those similar to the alkyl groups having 1 to 5 carbon atoms in R above, with methyl or ethyl groups being preferred. １０２ and Rf １０３ Specifically, examples of halogenated alkyl groups having 1 to 5 carbon atoms include groups in which some or all of the hydrogen atoms of the alkyl group having 1 to 5 carbon atoms are substituted with halogen atoms. Fluorine atoms are preferred as the halogen atoms, particularly Rf. １０２ and Rf １０３ Preferably, the atoms are hydrogen atoms, fluorine atoms, or alkyl groups having 1 to 5 carbon atoms; more preferably, hydrogen atoms, fluorine atoms, methyl groups, or ethyl groups; and even more preferably, hydrogen atoms. In formula (f1-1), nf １ x is an integer between 0 and 5, preferably between 0 and 3, and more preferably 1 or 2. 【0320】 In formula (f1-1), Rf １０１The fluorine atom is an organic group containing a fluorine atom, and preferably a hydrocarbon group containing a fluorine atom. The hydrocarbon group containing a fluorine atom may be linear, branched, or cyclic, and preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and particularly preferably 1 to 10 carbon atoms. Furthermore, it is preferable that 25% or more of the hydrogen atoms in the hydrocarbon group are fluorinated, more preferably 50% or more, and particularly preferable that 60% or more are fluorinated, as this increases the hydrophobicity of the resist film during immersion exposure. Among these, Rf １０１ More preferably, it is a fluorinated hydrocarbon group having 1 to 6 carbon atoms, a trifluoromethyl group, or -CH ２ -CF ３ ien-CH ２ -CF ２ -CF ３ , -CH(CF ３ ) ２ ien-CH ２ -CH ２ -CF ３ ien-CH ２ -CH ２ -CF ２ -CF ２ -CF ２ -CF ３ That is particularly preferable. 【0321】 The weight-average molecular weight (Mw) of component (F) (based on polystyrene conversion by gel permeation chromatography) is preferably 1,000 to 50,000, more preferably 5,000 to 40,000, and most preferably 10,000 to 30,000. If it is below the upper limit of this range, it has sufficient solubility in the resist solvent for use as a resist, and if it is above the lower limit of this range, the water repellency of the resist film is good. The dispersion degree (Mw / Mn) of component (F) is preferably 1.0 to 5.0, more preferably 1.0 to 3.0, and most preferably 1.0 to 2.5. 【0322】In the resist composition of this embodiment, component (F) may be used alone or in combination of two or more types. When the resist composition contains component (F), the content of component (F) is preferably 0.5 to 10 parts by mass, and more preferably 1 to 10 parts by mass, per 100 parts by mass of component (A). 【0323】≪Organic Solvent Component (S)≫ The resist composition of this embodiment can be manufactured by dissolving the resist material in an organic solvent component (hereinafter referred to as "component (S)"). The component (S) can be any solvent that can dissolve each component used and form a homogeneous solution, and any solvent can be appropriately selected from those conventionally known as solvents for chemically amplified resist compositions. (S) components include, for example, lactones such as γ-butyrolactone; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone; polyhydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol; compounds having ester bonds such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, or dipropylene glycol monoacetate; monoalkyl ethers such as monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, or monophenyl ether of the aforementioned polyhydric alcohols or compounds having ester bonds. Examples include derivatives of polyhydric alcohols [of which propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) are preferred]; cyclic ethers such as dioxane, and esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate; aromatic organic solvents such as anisole, ethyl benzyl ether, cresyl methyl ether, diphenyl ether, dibenzyl ether, phenethole, butylphenyl ether, ethylbenzene, diethylbenzene, pentylbenzene, isopropylbenzene, toluene, xylene, cymene, mesitylene, and dimethyl sulfoxide (DMSO). In the resist composition of this embodiment, component (S) may be used alone or as a mixture of two or more solvents. Among these, PGMEA, PGME, γ-butyrolactone, EL, and cyclohexanone are preferred. 【0324】 Furthermore, as the (S) component, a mixed solvent obtained by mixing PGMEA and a polar solvent is also preferred. The mixing ratio (mass ratio) can be appropriately determined considering the compatibility between PGMEA and the polar solvent, but it is preferably in the range of 1:9 to 9:1, and more preferably in the range of 2:8 to 8:2. More specifically, when EL or cyclohexanone is used as the polar solvent, the mass ratio of PGMEA to EL or cyclohexanone is preferably 1:9 to 9:1, and more preferably 2:8 to 8:2. When PGME is used as the polar solvent, the mass ratio of PGMEA to PGME is preferably 1:9 to 9:1, more preferably 2:8 to 8:2, and even more preferably 3:7 to 7:3. Furthermore, a mixed solvent of PGMEA, PGME, and cyclohexanone is also preferred. Furthermore, as the (S) component, a mixed solvent of at least one selected from PGMEA and EL and γ-butyrolactone is also preferred. In this case, the mass ratio of the former to the latter is preferably 70:30 to 95:5. 【0325】 The amount of component (S) used is set according to the solid content concentration of the resist composition. In this specification, the solid content in the resist composition refers to components other than component (S). The solid content concentration of the resist composition is calculated by the following formula: Solid content concentration (mass%) = Total mass of components other than component (S) / Total mass of the resist composition × 100 【0326】 For example, if the resist composition consists of component (A), component (B), component (D), and component (S), the solid content concentration (mass%) = [((A) component + (B) component + (D) component) / ((A) component + (B) component + (D) component) + (S) component] × 100. 【0327】When forming a thick resist film (for example, with a film thickness of 2 μm to 20 μm), it is preferable to have a solid content concentration of 15% by mass or more in the resist composition. The solid content concentration of the resist composition is not particularly limited as long as it is 15% by mass or more, and can be appropriately determined according to the desired film thickness of the resist film. Generally, the higher the solid content concentration, the thicker the resist film becomes. The upper limit of the solid content concentration of the resist composition is not particularly limited as long as the solid content is at a concentration in which it can be dissolved. The solid content concentration of the resist composition is, for example, 60% by mass or less, preferably 55% by mass or less, and more preferably 50% by mass or less. Examples of the range of solid content concentrations of the resist composition include 15 to 60% by mass, 15 to 55% by mass, or 15 to 50% by mass. 【0328】 When forming a thin resist film (for example, less than 2 μm), the solid content concentration of the resist composition is not particularly limited and is set appropriately according to the film thickness, at a concentration that allows it to be applied to a substrate or the like. Generally, the solid content concentration of the resist composition is set to be within the range of 0.1 to 20% by mass, preferably 0.2 to 15% by mass. 【0329】 The resist composition of this embodiment may further contain, if desired, miscible additives such as additional resins to improve the performance of the resist film, dissolution inhibitors, plasticizers, stabilizers, colorants, anti-halation agents, dyes, etc. 【0330】 The resist composition of this embodiment may be subjected to removal of impurities after dissolving the resist material in component (S), using a polyimide porous membrane, a polyamide-imide porous membrane, or the like. For example, the resist composition may be filtered using a filter made of a polyimide porous membrane, a filter made of a polyamide-imide porous membrane, or a filter made of a polyimide porous membrane and a polyamide-imide porous membrane. Examples of the polyimide porous membrane and the polyamide-imide porous membrane include those described in Japanese Patent Application Publication No. 2016-155121. 【0331】The resist composition of this embodiment described above contains an alkali-soluble resin (A), an acid generator (B), and a crosslinking agent (C), wherein the acid generator (B) contains compound (B0). Compound (B0) has a sulfo group (N-sulfo group) bonded to the nitrogen atom of a nitrogen-containing aromatic heterocycle. Compound (B0) having such a structure exhibits strong acid strength and a small acid diffusion length. Therefore, by including compound (B0) as an acid generator in the resist composition, good sensitivity can be obtained. 【0332】 (Method for forming a resist pattern) A method for forming a resist pattern according to a second aspect of the present invention is a method comprising the steps of forming a resist film on a support using the resist composition according to the first aspect of the present invention described above, exposing the resist film, and developing the exposed resist film to form a resist pattern. One embodiment of such a resist pattern forming method is, for example, a resist pattern forming method carried out as follows. 【0333】 First, the resist composition of the above-described embodiment is applied onto a support using a spinner or the like, and a bake (post-application bake (PAB)) treatment is performed for 40 to 120 seconds, preferably 60 to 90 seconds, at a temperature of, for example, 80 to 150°C, to form a resist film. Next, the resist film is subjected to selective exposure using an exposure apparatus such as an electron beam lithography apparatus or an ArF exposure apparatus, either through exposure via a mask (mask pattern) with a predetermined pattern formed on it or by direct irradiation with an electron beam without a mask pattern, and then a bake (post-exposure bake (PEB)) treatment is performed for 40 to 120 seconds, preferably 60 to 90 seconds, at a temperature of, for example, 80 to 150°C. Next, the resist film is subjected to a development treatment. In the case of an alkaline development process, an alkaline developer is used, and in the case of a solvent development process, a developer containing an organic solvent (organic developer) is used. 【0334】After the development process, a rinsing process is preferably performed. In the case of an alkaline development process, a water rinse using pure water is preferred, and in the case of a solvent development process, a rinsing solution containing an organic solvent is preferred. In the case of a solvent development process, after the development or rinsing process, a process to remove the developer or rinsing solution adhering to the pattern using a supercritical fluid may be performed. After the development or rinsing process, drying is performed. In some cases, a bake process (post-bake) may be performed after the development process. In this way, a resist pattern can be formed. 【0335】 The support material is not particularly limited and can be any conventionally known material, such as a substrate for electronic components or a substrate on which a predetermined wiring pattern has been formed. More specifically, examples include silicon wafers, metal substrates such as copper, chromium, iron, and aluminum, and glass substrates. As for the wiring pattern material, for example, copper, aluminum, nickel, and gold can be used. 【0336】 The wavelength used for exposure is not particularly limited, and the process can be carried out using radiation such as ArF excimer lasers, KrF excimer lasers, F2 excimer lasers, EUV (extreme ultraviolet), VUV (vacuum ultraviolet), EB (electron beam), X-rays, and soft X-rays. The resist composition is highly useful for KrF excimer lasers, ArF excimer lasers, EB, or EUV, and is even more useful for ultraviolet light such as g-rays and i-rays, KrF excimer laser light, and ArF excimer laser light, and is particularly useful for ultraviolet light such as g-rays and i-rays, and KrF excimer laser light. In other words, the resist pattern formation method of this embodiment is particularly useful when the step of exposing the resist film is irradiated with ultraviolet light such as g-rays and i-rays, or KrF excimer laser light. 【0337】The method for exposing the resist film may be conventional exposure (dry exposure) performed in an inert gas such as air or nitrogen, or it may be liquid immersion lithography. Liquid immersion lithography is an exposure method in which the space between the resist film and the lens at the lowest position of the exposure apparatus is filled in advance with a solvent (liquid immersion medium) having a refractive index greater than that of air, and exposure (immersion exposure) is performed in that state. The liquid immersion medium is preferably a solvent having a refractive index greater than that of air and smaller than that of the resist film to be exposed, and examples include water, fluorine-based inert liquids, silicon-based solvents, hydrocarbon-based solvents, etc. Water is preferably used as the liquid immersion medium. 【0338】 Examples of alkaline developers used in the alkaline development process include 0.1 to 10% by mass of tetramethylammonium hydroxide (TMAH) aqueous solution. 【0339】 The development process can be carried out by known development methods, such as immersing the support in developer for a certain period of time (dip method), piling up developer on the surface of the support by surface tension and leaving it still for a certain period of time (paddle method), spraying developer onto the surface of the support (spray method), or continuously dispensing developer onto a support rotating at a constant speed while scanning the developer dispensing nozzle at a constant speed (dynamic dispensing method). 【0340】 The rinse solution may contain known additives as needed. Examples of such additives include surfactants. Examples of surfactants are the same as those described above, with nonionic surfactants being preferred, nonionic fluorine-based surfactants, or nonionic silicone-based surfactants being more preferred. When a surfactant is added, the amount added is usually 0.001 to 5% by mass, preferably 0.005 to 2% by mass, and more preferably 0.01 to 0.5% by mass, relative to the total amount of the rinse solution. 【0341】Rinsing (cleaning) using a rinsing solution can be carried out by known rinsing methods. Examples of such rinsing methods include continuously applying the rinsing solution onto a support rotating at a constant speed (rotary coating method), immersing the support in the rinsing solution for a certain period of time (dip method), and spraying the rinsing solution onto the surface of the support (spray method). 【0342】 As described above, the resist pattern formation method of this embodiment uses the above-mentioned resist composition, making it possible to form a resist pattern with high sensitivity and good resolution and CDU. For example, a resist pattern with a film thickness of 0.5 to 10 μm can be formed with good sensitivity. 【0343】 The resist compositions of the embodiments described above, and the various materials used in the pattern forming methods of the embodiments described above (for example, resist solvents, developers, rinse solutions, anti-reflective film forming compositions, topcoat forming compositions, etc.) are preferably free of impurities such as metals, metal salts containing halogens, acids, alkalis, sulfur atoms, or phosphorus atoms. Examples of metal atom-containing impurities include Na, K, Ca, Fe, Cu, Mn, Mg, Al, Cr, Ni, Zn, Ag, Sn, Pb, Li, or salts thereof. The content of impurities in these materials is preferably 200 ppb or less, more preferably 1 ppb or less, even more preferably 100 ppt (parts per trillion) or less, particularly preferably 10 ppt or less, and most preferably substantially free (below the detection limit of the measuring device). 【0344】 (Compound) The compound according to the third aspect of the present invention is a compound represented by the following general formula (b0-1) (hereinafter also referred to as "compound (B0-1)"). 【0345】 [In the formula, R ０１１ and R ０１２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 【0346】Compound (B01) is the same compound represented by general formula (b0-1) as described in the resist-resist composition according to the first embodiment. Specific examples of compound (B01) are shown below, but are not limited to these. 【0347】 【0348】 (Compound) The compound according to the fourth aspect of the present invention is a compound represented by the following general formula (b0-2) (hereinafter also referred to as "compound (B0-2)"). 【0349】 [In the formula, z ０２１ and z ０２２ x represents an oxygen atom or a sulfur atom. ０２１ , x ０２２ , y ０２１ and y ０２２ Each of them independently, C(R ０２１ ) (Caution ０２２ ), represents C=O or C=S. C represents a carbon atom. R ０２１ and R ０２２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 【0350】 Compound (B02) is the same compound represented by general formula (b0-2) as described in the resist-resist composition according to the first embodiment. Specific examples of compound (B02) are shown below, but are not limited thereto. 【0351】 【0352】 <Method for producing the compound> Compound (B01) or compound (B02) can be produced by appropriately combining known methods, as shown in the <Example of compound synthesis> in the [Examples] section below. 【0353】 The compounds of this embodiment described above can be used in the production of the resist composition according to the first embodiment. Furthermore, the compounds of this embodiment can be used in the production of the acid generator according to the fifth embodiment described later. 【0354】(Acid Generator) The acid generator according to the fifth aspect of the present invention comprises the compound (B01) according to the third aspect or the compound (B02) according to the fourth aspect. The acid generator of this embodiment can be used in the manufacture of the resist composition according to the first aspect. By incorporating the acid generator of this embodiment into the resist composition, a resist composition with good sensitivity can be obtained. 【0355】 The present invention will be described below with reference to examples, but the present invention is not limited to the following examples. 【0356】 <Examples of compound synthesis> (Example of compound (B0-2) synthesis) Compound (B0-2-pre1) (25.0 g) was dissolved in pyridine (175 g) and cooled to 0°C. Sulfur trioxide pyridine complex (SO ３ After adding 46.0 g of py(π), the mixture was heated under reflux (115°C) and stirred for 4 hours. After the reaction solution was cooled to room temperature, 250 g of tert-butyl methyl ether was added, and the resulting solid was washed three times with ultrapure water to obtain compound (B0-2-pre2). Compound (B0-2-pre2) was dissolved in dichloromethane (123 g), 126.1 g of 10% sodium hydroxide aqueous solution was added, and the mixture was stirred at room temperature for 10 hours. The precipitated solid was filtered, washed sequentially with ultrapure water and tert-butyl methyl ether, and then dried under reduced pressure to obtain 28.5 g of compound (B0-2-Na). Compound (B0-2-Na) (28.0 g), triphenylsulfonium bromide (53.6 g), dichloromethane (168 g), and ultrapure water (112 g) were mixed and stirred at room temperature for 1 hour, after which the aqueous layer was removed. The organic layer was repeatedly washed with ultrapure water, then concentrated under reduced pressure and dried under reduced pressure to obtain 48.8 g of compound (B0-2). 【0357】 【0358】 The obtained compound (B0-2) was subjected to NMR measurement, and its structure was identified based on the analytical results shown below. １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 2.21 (s, CH3, 6H), 5.69 (d, Ar-H, 2H), 7.73-7.90 (m, Ar-H, 15H) 【0359】 (Synthesis examples of compounds (B0-1), (B0-3) to (B0-5)) Compounds (B0-1), (B0-3) to (B0-5) were obtained in the same manner as in the above (Synthesis example of compound (B0-2)), except that the following precursor compounds (B0-1-pre1), (B0-3-pre1) to (B0-5-pre1) were used instead of the precursor compound (B0-2-pre1). 【0360】 【0361】 (Synthesis examples of compounds (B0-6) to (B0-8)) Compounds (B0-6) to (B0-8) were obtained in the same manner as in the above (Synthesis example of compound (B0-2)), except that the precursor compound (B0-1-pre1) was used instead of the precursor compound (B0-2-pre1), and the corresponding triphenylsulfonium derivative bromide was used instead of triphenylsulfonium bromide. 【0362】 The obtained compounds (B0-1), (B0-3) to (B0-8) were subjected to NMR analysis, and their structures were identified based on the analytical results shown below. Compound (B0-1): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 6.67 (d, Ar-H, 2H), 7.26 (d, Ar-H, 2H), 7.73-7.90 (m, Ar-H, 15H) Compound (B0-3): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 6.33 (d, Ar-H, 2H), 7.73-7.90 (m, Ar-H, 15H), 11.40 (s, OH, 2H) Compound (B0-4): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 7.39 (d, Ar-H, 2H), 7.73-7.90 (m, Ar-H, 15H) Compound (B0-5): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 7.73-7.90 (m, Ar-H, 15H) １３Ｃ NMR (DMSO-d ６, 400MHz) δ (ppm) = 111.6 (Ar-C, 2C), 126.0-127.0 (Ar-C, 5C), 132.2-133.0 (Ar-C, 12C), 135.8 (Ar-C, 3C), 154.0 (C=O, 2C), 163.5 (C=O, 2C) Compound (B0-6): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 7.74-7.90 (m, ArH, 10H), 7.39 (s, ArH, 2H), 7.26 (d, Ar-H, 2H), 6.67 (d , Ar-H, 2H), 4.45 (s, CH2, 2H), 2.38 (s, Ar-CH3, 6H), 1.51-2.37 (m, Ad-CH3, Ad-CH2, 18H) Compound (B0-7): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 7.95-8.17 (m, ArH, 4H), 7.67-7.90 (m, ArH, 5H), 7.26 (d, Ar-H, 2H), 6.67 (d, Ar -H, 2H), 3.72-3.95 (m, CH2, 4H), 2.78-2.85 (m, CH, 1H), 1.22-2.22 (m, CH2, 14H), 1.05 (s, CH3, 9H) Compound (B0-8): １ H NMR (DMSO-d ６ , 400MHz) δ (ppm) = 7.95-8.17 (m, ArH, 4H), 7.51-7.90 (m, ArH, 9H), 7.26 (d, A r-H, 2H), 6.67 (d, Ar-H, 2H), 3.72-3.95 (m, CH2, 4H), 1.52-2.22 (m, CH2, 6H) 【0363】 The pKa of the acids generated by exposure in (B0)-1 to (B0)-8 and (B1)-1 to (B1)-2 was determined by simulation using ACD / Labs ver. 11.02. The obtained compounds (B0-1) to (B0-8) are shown below. 【0364】 【0365】<Production of Polymer Compounds> The polymer compounds (A-1) to (A-6) used in this example were obtained by anionic polymerization using monomers that induce the constituent units of each polymer compound in a predetermined molar ratio. For each obtained polymer compound, the weight-average molecular weight (Mw) and molecular weight dispersion (Mw / Mn) were determined by GPC measurement (standard polystyrene equivalent). Furthermore, for each obtained polymer compound, the copolymerization composition ratio (proportion (molar ratio) of each constituent unit in the structural formula) was determined by carbon-13 nuclear magnetic resonance spectroscopy (600 MHz)... １３ This was determined by C-NMR. 【0366】 【0367】 Polymer compound (A-1): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.2, l=100. Polymer compound (A-2): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.2, l / m=95 / 5. Polymer compound (A-3): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.2, l / m=85 / 15. Polymer compound (A-4): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.2, l / m=75 / 25. Polymer compound (A-5): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.5, l / m=85 / 15. Polymer compound (A-6): weight average molecular weight (Mw) 2500, molecular weight dispersity (Mw / Mn) 1.1, l / m=70 / 30. 【0368】 <Preparation of Resist Compositions> (Examples 1-20, Comparative Examples 1-4) The resist compositions for each example were prepared by mixing and dissolving the components shown in Tables 1-2. 【0369】 【0370】 【0371】 In Tables 1 and 2, each abbreviation has the following meaning. The numbers in brackets [ ] represent the amount (parts by mass) of the compound. (A)-1 to (A)-6: The above polymer compounds (A-1) to (A-6). 【0372】(B0)-1 to (B0)-8: Acid generators consisting of compounds represented by the chemical formulas (B0-1) to (B0-8) above. (B1)-1 to (B1)-2: Acid generators consisting of compounds represented by the chemical formulas (B1-1) to (B1-2) below. 【0373】 【0374】 (C)-1: A crosslinking agent consisting of a compound represented by the following chemical formula (C-1). 【0375】 【0376】 (D)-1: An acid diffusion control agent comprising a compound represented by the following chemical formula (D-1). 【0377】 【0378】 (S)-1: Propylene glycol monomethyl ether acetate (PGMEA). (S)-2: Propylene glycol monomethyl ether (PGME). 【0379】 <Formation of Resist Pattern 1> On a silicon wafer that had been treated with hexamethyldisilazane (HMDS) at 110°C for 60 seconds, the resist compositions of each example were applied using a spinner. A 2 μm thick resist film was formed by pre-bake (PAB) treatment on a hot plate at 90°C for 60 seconds and drying. Next, the resist film was selectively irradiated with a KrF excimer laser (248 nm) through a mask pattern (binary mask) using a KrF exposure apparatus NSR-S203B (manufactured by Nikon Corporation; NA (numerical aperture) = 0.60, σ = 0.68). Next, a post-exposure heating (PEB) treatment was performed at 110°C for 60 seconds. Then, alkaline development was performed using a 2.38 mass% tetramethylammonium hydroxide (TMAH) aqueous solution "NMD-3" (trade name, manufactured by Tokyo Ohka Kogyo Co., Ltd.) as the developer at 23°C for 60 seconds. Subsequently, a post-bake was performed at 100°C for 60 seconds. As a result, an isolated space pattern with a width of 500 nm was formed. 【0380】[Evaluation of Optimal Exposure Dose (Eop)] In the above <Formation of Resist Pattern 1>, the optimal exposure dose Eop (mJ / cm) for forming a pattern of the target size is determined. ２ The sensitivity (mJ / cm) was calculated. ２ This is shown in Table 3. 【0381】 [Resolution Evaluation] In <Formation of Resist Pattern 1> described above, when forming a pattern of the target size by gradually decreasing the exposure amount from the optimal exposure amount for forming the target size pattern, the space width (nm) of the resolved pattern was determined using a scanning electron microscope S-9380 (Hitachi High-Technologies Corporation). The results are shown in Table 3 as "Resolution (nm)". 【0382】 [Evaluation of CDU] In the above-mentioned <Formation of Resist Pattern 1>, the formed isolated space patterns were observed from above using a measuring SEM (scanning electron microscope, acceleration voltage 500V, product name: CG5000, manufactured by Hitachi High-Technologies Corporation), and the space width (nm) of each isolated space pattern was measured. Then, three times the standard deviation (σ) calculated from the measurement results (3σ) was determined. The smaller the value of 3σ obtained in this way, the higher the uniformity of the space width (CD) of the multiple isolated space patterns formed on the resist film. The results are shown in Table 3 as "CDU (nm)". 【0383】 【0384】 The resist compositions of Examples 1 to 20 were more sensitive than the resist compositions of Comparative Examples 1 to 4, and exhibited better resolution and CDU in the pattern formation of thick resist films. The resist compositions of Comparative Examples 3 and 4 were unresolved under the conditions of <Resist Pattern Formation 1> described above. 【0385】 <Preparation of Resist Compositions> (Examples 21-28, Comparative Examples 5-6) The resist compositions for each example were prepared by mixing and dissolving the components shown in Table 4. In Table 4, each abbreviation is the same as the abbreviations in Tables 1-2. The numbers in brackets [ ] represent the amount (parts by mass) of the mixture. 【0386】 【0387】 <Formation of Resist Pattern 2> On a silicon wafer on which an anti-reflective coating (Nissan Chemical Corporation: DUV-42P) had been formed, the resist compositions of each example were applied using a spinner. A pre-bake (PAB) treatment was performed on a hot plate at 100°C for 60 seconds, and a resist film with a thickness of 500 nm was formed by drying. Next, the resist film was selectively irradiated with a KrF excimer laser (248 nm) through a mask pattern (binary mask) using a KrF exposure apparatus NSR-S203B (Nikon Corporation; NA (numerical aperture) = 0.60, σ = 0.68). Next, a post-exposure heating (PEB) treatment was performed at 120°C for 60 seconds. Then, alkaline development was performed using a 2.38 mass% tetramethylammonium hydroxide (TMAH) aqueous solution "NMD-3" (product name, manufactured by Tokyo Ohka Kogyo Co., Ltd.) as the developer, at 23°C for 60 seconds. Subsequently, a post-bake was performed at 100°C for 60 seconds. As a result, an isolated space pattern with a width of 160 nm was formed. 【0388】 [Evaluation of Optimal Exposure Dose (Eop)] In the above <Formation of Resist Pattern 2>, the optimal exposure dose Eop (mJ / cm²) for forming a pattern of the target size is determined. ２ The sensitivity (mJ / cm) was calculated. ２ This is shown in Table 5. 【0389】 [Resolution Evaluation] In <Formation of Resist Pattern 2> described above, when forming a pattern of the target size by gradually decreasing the exposure amount from the optimal exposure amount for forming the target size pattern, the space width (nm) of the resolved pattern was determined using a scanning electron microscope S-9380 (Hitachi High-Technologies Corporation). This was defined as "resolution (nm)" and is shown in Table 5. 【0390】[Evaluation of CDU] In the above-mentioned <Formation of Resist Pattern 2>, the formed isolated space patterns were observed from above using a measuring SEM (scanning electron microscope, accelerating voltage 500V, product name: CG5000, manufactured by Hitachi High-Technologies Corporation), and the space width (nm) of each isolated space pattern was measured. Then, three times the standard deviation (σ) calculated from the measurement results (3σ) was determined. This is shown in Table 5 as "CDU (nm)". 【0391】 【0392】 The resist compositions of Examples 21 to 28 were found to be more sensitive than those of Comparative Examples 5 to 6, and both resolution and CDU were confirmed to be good in the pattern formation of thin-film resist films. The resist composition of Comparative Example 6 was unresolved under the conditions of <Formation of Resist Pattern 2> described above. 【0393】 While preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments. Additions, omissions, substitutions, and other modifications are possible without departing from the spirit of the invention. The present invention is not limited by the foregoing description, but only by the scope of the appended claims.

Claims

1. A resist composition containing an alkali-soluble resin (A), an acid generator (B), and a crosslinking agent (C), wherein the acid generator (B) contains a compound (B0) represented by the following general formula (b0). [In the formula, X ０ represents a nitrogen atom or CR Ｘ０ . Y ０ represents a nitrogen atom or CR Ｙ０ . Z ０ represents a nitrogen atom or CR Ｚ０ . C represents a carbon atom. R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ each independently represents a hydrogen atom or a substituent. Two or more of R Ｘ０ , R Ｙ０ , R Ｚ０ and R ０ may be bonded to each other to form a ring structure. m is an integer of 1 or more, and M ｍ＋ represents an m-valent cation. ] 2. The resist composition according to claim 1, wherein the cation portion of the compound (B0) is a cation represented by the following general formula (b0-ca). [In the formula, Rb ０１ ~Rb ０３ Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０２ and Rb ０３ These atoms may bond to each other, forming a ring structure with the sulfur atom in the formula. Lb ０１ This is a single bond or a divalent linking group.

3. In the above general formula (b0-ca), Rb ０２ and Rb ０３ The resist composition according to claim 2, wherein the atoms bond to each other to form a fatty ring structure together with the sulfur atom in the formula.

4. The resist composition according to claim 1, wherein the compound (B0) is a compound represented by the following general formula (b0-2). [In the formula, z ０２１ and z ０２２ x represents an oxygen atom or a sulfur atom. ０２１ , x ０２２ , y ０２１ and y ０２２ Each of them independently, C(R ０２１ ) (Caution ０２２ ), represents C=O or C=S. C represents a carbon atom. R ０２１ and R ０２２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 5. A method for forming a resist pattern, comprising the steps of: forming a resist film on a support using a resist composition according to any one of claims 1 to 4; exposing the resist film; and developing the exposed resist film to form a resist pattern.

6. Compounds represented by the following general formula (b0-1). [In the formula, R ０１１ and R ０１２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 7. Compounds represented by the following general formula (b0-2). [In the formula, z ０２１ and z ０２２ x represents an oxygen atom or a sulfur atom. ０２１ , x ０２２ , y ０２１ and y ０２２ Each of them independently, C(R ０２１ ) (Caution ０２２ ), represents C=O or C=S. C represents a carbon atom. R ０２１ and R ０２２ Each of these independently represents a hydrogen atom or a substituent. m is an integer of 1 or more, and M ｍ＋ [This represents a cation with m-valence.] 8. An acid generator comprising the compound described in claim 6 or 7.

Images