Vaporization device and film deposition device
The vaporization device controls carrier gas flow to prevent material mixing, ensuring uniform and high-quality thin film deposition by using a vaporization device with controlled gas flow and suction means, addressing the non-uniformity and quality issues in conventional apparatuses.
JP2025151737APending Publication Date: 2025-10-09KANEKA CORP
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Patent Information
- Application Number
- JP2024053302
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-03-28
- Publication Date
- 2025-10-09
AI Technical Summary
Technical Problem
Conventional vapor deposition apparatuses cause powdered thin film forming materials to fly up due to carrier gas, leading to non-vaporized material mixing with the gas and adhering to the substrate, resulting in non-uniform thin films with reduced quality.
Method used
A vaporization device with a vaporization section, carrier gas supply, gas introduction piping, and suction means to control carrier gas flow, using opening/closing units and suction to prevent material mixing, and a film-forming apparatus with a gas supply and release section to deposit high-quality films.
Benefits of technology
Prevents powdered thin film forming material from mixing into the source gas, ensuring uniform and high-quality thin film deposition on the substrate.
✦ Generated by Eureka AI based on patent content.
Abstract
To provide a vaporization device and a film deposition device such that powdery thin-film forming material is hardly mixed with a material gas as compared with before.SOLUTION: A vaporization device has: a vaporization part which vaporizes powdery thin-film forming material to produce a material gas; a carrier gas supply part which supplies a carrier gas toward the vaporization part; a gas introduction piping part which introduces the carrier gas into the vaporization part from the carrier gas supply part; and a first opening / closing part which is in the middle of the gas introduction piping part, and enters an opening state to allow the carrier gas to circulate from the carrier gas supply part to the vaporization part and also enters a closing state to stop the carrier gas from circulating from the carrier gas supply part to the vaporization part, wherein the gas introduction piping part has suction means for sucking the carrier gas in the gas introduction piping part connected between the first opening / closing part and carrier gas supply part.SELECTED DRAWING: Figure 2
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