Nanoimprint master, optical waveguide and method of manufacturing the same

The nanoimprint master with recessed structures addresses edge alignment and adhesive issues in optical waveguides, improving display performance and appearance by ensuring tight fitting and uniform adhesive distribution.

JP2025536448APending Publication Date: 2025-11-06SUNNY AOLAI MICRO NANO OPTOELECTRONIC INFORMATION TECHNOLOGY (SHANGHAI) CO LTD
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Patent Information

Application Number
JP2024570502
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-08-31
Filing Date
2023-12-22
Publication Date
2025-11-06

AI Technical Summary

Technical Problem

The nanoimprinting process for optical waveguide products faces challenges with large height differences between lattice and non-lattice structure areas, leading to poor edge alignment and uneven adhesive residue, affecting the performance and appearance of optical waveguide displays.

Method used

A nanoimprint master with a depressed structure surrounding the lattice region, featuring recessed structures that reduce height differences and ensure tight fitting, and a method to calculate and form annular or stepped grooves to prevent defects.

Benefits of technology

Improves edge alignment and adhesive uniformity, enhancing the performance and appearance of optical waveguides by preventing defective edges and uneven residual adhesive.

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Abstract

The present invention provides a nanoimprint master, an optical waveguide, and a method for manufacturing the same. The nanoimprint master includes a lattice structure region, a non-lattice structure region surrounding the lattice structure region, and a depressed structure. The depressed structure is disposed in the non-lattice structure region adjacent to the lattice structure region, and extends along the circumferential direction of the lattice structure region so as to surround the lattice structure region.
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