Semiconductor devices, electronic equipment and systems
The semiconductor device with a laminated structure and specific electrodes addresses the challenges of crystallinity and electrical properties in r-GeO2 devices, enhancing performance in high-voltage and high-current applications.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- PATENTIX INC
- Filing Date
- 2025-11-11
- Publication Date
- 2026-06-03
AI Technical Summary
Existing methods for manufacturing rutile-structured germanium dioxide (r-GeO2) semiconductor devices face challenges in achieving high crystallinity, controlling composition, and ensuring excellent electrical properties, particularly in laminated structures and Schottky barrier diodes, limiting their industrial applicability.
A semiconductor device with a laminated structure comprising a second semiconductor layer with the same crystal structure as the first, using a Schottky electrode and an ohmic electrode, formed through a mist CVD apparatus with a guide partition wall, ensuring excellent crystallinity and electrical characteristics.
The semiconductor device achieves improved crystallinity and electrical properties, enabling better control over doping and superior performance in high-voltage and high-current applications, such as Schottky barrier diodes.
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