Manufacturing method for watch parts

Abstract

To provide a method for manufacturing a three-dimensional horology component of a shape that is complex on a micrometric or nanometric scale.SOLUTION: A method for manufacturing a horology component 6 at least comprises: a step of manufacturing, from a first photosensitive resin, a first structure comprising at least one photosensitive resin layer comprising a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask, and then developing the first photosensitive resin; and a step of transforming the first structure into a second structure by structuring at least one surface of the first structure by addition of a second photosensitive resin to the at least one surface, the second structure being intended to at least partially form a manufacturing mold for the horology component.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a method for manufacturing a watch component. [Background technology]

[0002] Photolithography is a technique commonly used in the manufacture of watch components and in particular makes it possible to create the plastic moulds used in the manufacture of watch components.

[0003] US Pat. No. 5,399,633, for example, discloses the implementation of a method for manufacturing metallic parts having at least two layers using photolithographic techniques.

[0004] US Pat. No. 5,399,633 proposes an improved method for manufacturing multi-layer watch parts using photolithography techniques.

[0005] US Pat. No. 5,399,633 discloses a method for manufacturing a watch part made of polycrystalline ceramic, using a mold formed by photolithography.

[0006] These prior art approaches, based on so-called conventional photolithography, have the drawback that they are unable to produce completely all three-dimensional shapes, such as complex shapes on the micrometer or nanometer scale. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] European Patent Application Publication No. 2405300 [Patent Document 2] European Patent Application Publication No. 3035125 [Patent Document 3] European Patent Application Publication No. 3260932 [Patent Document 4] U.S. Patent No. 9,302,430 [Patent Document 5] International Publication No. 2017 / 102661 Summary of the Invention [Problem to be solved by the invention]

[0008] For this reason, one of the objects of the present invention is to improve the methods known from the prior art and to propose a solution for the production of three-dimensional watch components, possibly with complex shapes on a micrometer or nanometer scale. Another object of the present invention is to enable the production of watch components with high reliability and precision. [Means for solving the problem]

[0009] The present invention therefore relates to a method for manufacturing a watch component, said method comprising the steps of: - manufacturing a first structure comprising at least one photosensitive resin layer from said first photosensitive resin, the first structure comprising a first pattern obtained by polymerizing said first photosensitive resin by irradiating through at least one mask and then developing said first photosensitive resin; and a second step of transforming said first structure into a second structure by structuring said at least one surface of said first structure by adding a second photosensitive resin to said at least one surface, said second structure intended to form at least partially the production mould for said watch part, advantageously using a two-photon polymerization technique.

[0010] The invention is more particularly defined by the claims.

[0011] The invention also relates to the timepiece component itself.

[0012] These objects, features and advantages of the present invention will be presented in more detail in the following description of particular embodiments, given by way of non-limiting example with reference to the accompanying drawings. [Brief description of the drawings]

[0013] [Figure 1]FIG. 1 shows a perspective view of an escape wheel manufactured by a manufacturing method according to one embodiment of the present invention. [Diagram 2] FIG. 2 shows an enlarged perspective view of a tooth of the escape wheel of FIG. 1 manufactured by a manufacturing method according to one embodiment of the present invention. [Diagram 3] FIG. 3 shows successive steps of a method for manufacturing the escape wheel shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Figure 4] FIG. 4 shows successive steps of a method for manufacturing the escape wheel and pinion shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Diagram 5] FIG. 5 shows successive steps of a method for manufacturing the escape wheel and pinion shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Figure 6] FIG. 6 shows successive steps of a method for manufacturing the escape wheel and pinion shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Figure 7] FIG. 7 shows successive steps of a method for manufacturing the escape wheel and pinion shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Figure 8] FIG. 8 shows successive steps of a method for manufacturing the escape wheel and pinion shown in FIGS. 1 and 2 according to one embodiment of the present invention. [Figure 9] FIG. 9 shows a perspective view of a heart-shaped watch part manufactured by a manufacturing method according to one embodiment of the present invention. [Figure 10] FIG. 10 shows a cross-section of the watch part of FIG. 9 in plane AA. [Figure 11] FIG. 11 illustrates a flow chart that shows, in schematic form, the steps and sub-steps of one embodiment of the present invention in two separate and alternative forms. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0014] The invention advantageously implements a method for the manufacture of watch components, combining at least one step based on conventional photolithography with at least one step based on the two-photon polymerization technique, known by the abbreviation TPP. For example, said method is used in a method disclosed in patent application US 2005 / 0139999, in a field far removed from watches. Finally, said method can be likened to a specific, three-dimensional, photolithographic method, totally different from conventional photolithography.

[0015] More specifically, the invention implements a manufacturing method comprising at least a first step E1 consisting of producing a first structure on a substrate using conventional photolithography techniques and a second step E2 consisting of converting the first structure into a second structure by structuring at least one surface of the first structure, advantageously in particular using two-photon polymerization techniques.

[0016] A manufacturing method according to an embodiment of the invention is described in the context of the manufacture of an escape wheel 6 illustrated in figures 1 and 2. The escape wheel 6 is, for example, made of a nickel phosphorus (NiP) alloy and comprises teeth 62 which include at their contact surface a microstructure 63 designed to constitute paths for guiding a lubricant. The wheel, and in particular the microstructured surface of the teeth 62, has a very complex shape and can advantageously be obtained by the manufacturing method according to the embodiment described below.

[0017] With particular reference to Figures 3 to 8, an embodiment of a method for manufacturing a timepiece part will be described, which is particularly suitable for the manufacture of the escape wheel described above, and more generally for the manufacture of any timepiece part.

[0018] According to this embodiment, the method comprises a first step E1 consisting of producing a first structure 10 on a substrate 20, using conventional photolithographic techniques.

[0019] By convention, the horizontal direction is defined as the direction parallel to the plane of the substrate 20. The vertical direction is defined as the direction perpendicular to the horizontal direction, and therefore perpendicular to the plane of the substrate.

[0020] The substrate 20 may take the form of a metal wafer, such as stainless steel, or a silicon wafer, or a glass wafer, or a ceramic wafer. It is advantageously planar. The substrate may optionally include structures, for example produced by laser processing. These structures may for example include patterns, in particular processed patterns, and / or cavities. The substrate is prepared according to rules known to the skilled person, in particular with regard to degreasing, cleaning, possibly passivation and / or activation. If desired, the substrate 20 is provided with reference marks so that it can be positioned with high precision. The substrate 20 may be made of a conductive material, for example stainless steel. Alternatively, it is also possible to use a substrate made of a non-conductive material, for example silicon. In this case, a conductive layer 21 may be formed on the upper surface of the substrate 20 in a preparation step carried out before the first step E1, for example by means of thermal evaporation. The conductive layer 21 is intended to perform the function of an electrode, in particular to trigger electroplating or electrodeposition, for the purpose of the future metal growth of the component, as will be explained in more detail later. In a known manner, the conductive initiation layer 21 may comprise a sub-layer of chromium, nickel or titanium covered with a layer of gold or copper, and thus may present the form of a multi-layer structure.

[0021] The first step comprises a sub-step E11 consisting of forming a first photosensitive resin 31, according to rules known to the skilled person, so as to cover all or part of the top surface of the conductive layer 21 of the substrate 20 over the desired height with a layer of the first photosensitive resin 31 (or directly covering the top surface of the substrate 20 in the absence of the conductive layer 21). The first photosensitive resin 31 is suitable for conventional photolithography. The first photosensitive resin 31 may be negative or positive. In the former case, it is designed to be insoluble or barely soluble in a developer under the action of irradiation (i.e. the irradiated areas resist development), while in the latter case, it is designed to be soluble in a developer under the action of irradiation, while the parts not exposed to irradiation remain insoluble or barely soluble. Said photosensitive resin 31 may be of the SU-8 type, which is a negative photosensitive resin that is polymerized under the action of UV irradiation, for example the resin SU-8-100 resin from the company Microchem.

[0022] The first step then comprises a sub-step E12 consisting of exposing the first photosensitive resin 31 through a mask 4, in particular by means of UV radiation, X-ray radiation or an electron beam in a direction substantially perpendicular to the mask, in order to polymerize the first photosensitive resin according to a first pattern defined in the mask 4, as shown in FIG. 3. The exposure consists of exposing the layer of photosensitive resin 31 to light radiation through a mask 4 comprising openings and opaque areas, which thus defines the first pattern to be replicated to form the structure or part of the structure. The radiation used is perpendicular or substantially perpendicular to the plane in which the mask extends and also perpendicular or substantially perpendicular to the substrate 20, so that only the areas of the resin that are directly coincident with the openings formed in the mask are illuminated. These areas are thus defined by perpendicular or substantially perpendicular walls, i.e. walls perpendicular or substantially perpendicular to the plane of the substrate 20. Alternatively, a mask with a variation in transmittance may be used to form non-perpendicular or inclined walls.

[0023] The first step then comprises a sub-step E13 consisting of developing the first photosensitive resin 31. If the resin 31 is a negative resin, the development consists of removing the non-exposed (i.e. non-irradiated) areas of the resin in a manner suitable for the photosensitive resin 31, for example by dissolving them with chemical products or by using a plasma process. Alternatively, in the case of a positive photosensitive resin, the irradiated areas are removed during development, for example via a chemical route, while the non-irradiated areas remain on the substrate. After development, the substrate 20 or any conductive layer 21 is surfaced where the resin has been removed. The remaining parts of the resin thus form a first structure 10, as shown in FIG. 4. Said structure rests on the upper surface of the substrate 20 or, in some cases, on the conductive layer 21 of the substrate 20. To this end, the first structure 10 comprises two horizontal surfaces, an upper (defined as the interface between the polymerized resin and air) and a lower (defined as the interface between the polymerized resin and the upper surface of the substrate 20 or the optional conductive layer 21), and generally substantially vertical, but alternatively may be inclined, side surfaces 11 extending between the two horizontal surfaces. These side surfaces are notably the result of openings formed in the first photosensitive resin 31 by the removal of non-polymerized photosensitive resin using conventional photolithography. By preference, the first structure 10 has a constant height (measured between the two upper and lower surfaces).

[0024] To create a multi-layer structure, the first step E1 may involve repetition of the above-mentioned sub-steps with different masks having different first sub-patterns, resulting in the creation of a first structure having a first pattern corresponding to a combination of the various first sub-patterns.

[0025] The method then comprises a second step E2 consisting of transforming the first structure 10 into a second structure 1 by structuring at least one surface of the first structure 10, in particular at least one side surface 11 of the first structure 10. This step comprises adding to at least one surface a second three-dimensional pattern 12 in polymerized resin.

[0026] For this purpose, the second step comprises a sub-step E21 consisting of forming a layer of a liquid or semi-fluid second photosensitive resin 32 on at least a portion of at least one of the above-mentioned surfaces of the first structure 10, in particular on the side surfaces 11, as shown in FIG. 5. This step may be carried out, for example, by drop casting or by any other method allowing the application of a liquid or semi-fluid resin (spraying, spin coating, etc.). The second photosensitive resin 32 is particularly suitable for the two-photon polymerization technique mentioned above. The second photosensitive resin 32 may be negative or positive. In one particular embodiment, the photosensitive resin 32 used is a semi-fluid resin, for example the IP-Dip by Nanoscribe, which is a negative resin. TM The embodiment is not limited to the above description. Said surface of the first structure may alternatively or additionally be horizontal and is not limited to a lateral surface, especially in the case of the production of multi-layer watch parts.

[0027] Alternatively, the first and second photosensitive resins 31, 32 may be identical, in which case the resin used in the two steps E1, E2 is suitable for conventional photolithography and two-photon polymerization.

[0028] The second step then comprises a sub-step E22 consisting of carrying out two-photon polymerization on at least a part of the layer of the second photosensitive resin 32, as shown in Fig. 6, in order to achieve a stereopolymerization according to a second predetermined stereopattern. For this purpose, the method may use a photonic device 5 intended to irradiate electromagnetic waves onto or into the photosensitive resin 32 in order to polymerize it according to spatial coordinates corresponding to the second pattern. The advantage of the method is the accuracy of the resolution and the complexity of the patterns that can be achieved, in particular vertically discontinuous patterns.

[0029] According to an advantageous embodiment, the photonic device 5 comprises an objective lens 51 at least partially immersed in the second photosensitive resin 32 for polymerization according to spatial coordinates defining the shape or volume 12 of the second pattern. This alternative advantageously allows optimizing the resolution of the second volumetric pattern. More specifically, the objective lens 51 is designed to guide and focus the laser beam 52 so that its focal point passes through the various spatial coordinates defining the contour or shape 12 of the second pattern. For each of the coordinates, two photons may be simultaneously absorbed in the resin 32 in a very small volume known as a "voxel" at the focal point of the laser 52. A chemical reaction is initiated and the liquid or semi-liquid resin is polymerized and hardened within the voxel. Thus, the voxels resulting from the path of the focal point of the laser beam 52 define the contour or shape 12 of the second pattern. Advantageously combining the focusing lens of the laser with the material of the photosensitive resin 32, the diameter of the voxels can be smaller than 0.1 μm, thus making it possible to define very high resolution micro- or nanostructures on at least one surface, and in particular on at least one side surface 11, of the first structure 10. 3 This allows the second pattern to be defined with a three-dimensional resolution of 0.1 μm or better and a lateral resolution equal to the diameter of a voxel, ie 0.1 μm or better.

[0030] In addition, the at least partial or complete immersion of the objective lens 51 in the second photosensitive resin 32 prevents the laser beam 52 from crossing the interface between the objective lens and the air and between the air and the second photosensitive resin, and avoids deflection of the laser beam at said interface. The laser beam (photon beam) interacts exclusively with the second photosensitive resin. The laser beam is processed in a continuous medium, avoiding any parasitic reflections, refractions or power losses. Thus, the path of the laser beam is minimized, making it easier to detect the already polymerized parts. Thus, the three-dimensional resolution of the second pattern is optimized and the processing speed is maximized.

[0031] Furthermore, as shown in FIG. 6, the second pattern may extend at least partially horizontally or may have a significant horizontal component due to the formation of a second photosensitive resin 32 on the side surface 11 of the first structure 10, in particular on a surface that is perpendicular or substantially perpendicular to the substrate 20.

[0032] The steps may thus form micro- or nanostructures, for example having the shape of square waves or steps 12 on the surface 11, as shown in Figure 7. The shapes are not cut into the surface 11 but are applied in relief on the surface 11.

[0033] The second step then comprises a sub-step E23 consisting of developing the second photosensitive resin 32 in order to remove the non-polymerized second photosensitive resin 32 and to obtain second structures 1 of the shape defined by the first and second patterns. In particular, once the second photosensitive resin 32 has been polymerized according to the predetermined three-dimensional shape, the areas of the photosensitive resin 32 that have not been exposed to light are removed, for example by dissolving in a chemical product or using a plasma process, in the case of a negative photosensitive resin. By preference, the chemical product used is the same as that used in the first step. It may be, for example, a PGMEA-based solvent.

[0034] At the end of this second step, the combination of the two photosensitive resins 31, 32, respectively shaped into the two abovementioned patterns, finally forms a second structure 1 attached to the substrate 20. According to this embodiment, this second structure 1 together with the substrate 20 is intended to form a mould for the production of a watch part. To this end, the second structure may have at least one cavity 13. As a result of the above-mentioned method, it is possible to form a second structure 1 with absolutely any complex three-dimensional shape, thus enabling the production of absolutely any watch part with a corresponding complex three-dimensional shape.

[0035] The manufacturing method then carries out a third step E3 consisting of using the second structure 1 and the substrate 20 together as a mould for the manufacture of a watch part 6. The watch part may in particular be made of a metal or a metal alloy or of a ceramic, in particular of a technical ceramic or a composite material, or may be fibre reinforced, for example carbon fibre or Kevlar.

[0036] According to a first alternative embodiment, the watch part 6 is made of metal or a metal alloy.

[0037] In a first alternative embodiment, the third step comprises a sub-step E31 consisting of forming, by electrodeposition or electroplating, in the cavity or cavities 13 of the second structure 1, forming the watch part. In this sub-step, the aforementioned conductive layer 21 or the substrate 20 itself, if made of a conductive material, acts as a cathode to initiate the deposition reaction. This step uses, for example, the LIGA method and a metal or metal alloy, for example nickel (Ni) or nickel phosphorus (NiP) or a nickel-based material. Advantageously, the alloys described in patent application WO 2005 / 023363 can be used. The obtained metal layer 61 preferably has a height H equal to the height of the mold formed by the second structure 1. The metal layer 61 may also have a height less than or greater than the height of the mold. Optionally, this sub-step may comprise a thickness adjustment by simultaneous mechanical polishing of the metal layer and the mold, in order to obtain a perfectly planar horizontal top surface.

[0038] Furthermore, the resulting metal layer 61 preferably has a height H that is substantially greater than the height of layer 21. The height is greater than 5 times the height of layer 21, or greater than 10 times the height of layer 21.

[0039] In a first alternative form of this embodiment, the third step comprises a sub-step E32 of separating the assembly formed by said metal layer 61 and the second structure 1 from the substrate 20, for example by peeling the conductive layer 21 from the substrate.

[0040] In a first alternative of this embodiment, the third step comprises a substep E33 consisting of separating the watch part 6 formed by said metal layer 61 from the second structure 1, for example by means of a chemical attack or a plasma, whereby the watch part 6 is debindered.

[0041] Steps E32 and E33 may be carried out in any order.

[0042] According to a second alternative embodiment, the watch part 6 is made of ceramic, in particular technical ceramic.

[0043] In a second alternative of the embodiment, the third step comprises a sub-step E31' consisting of filling the second structure with a product comprising ceramic powder by means of a liquid path. The step may comprise, for example, injecting a slurry or injecting a gel or injecting a solid. Alternatively, the step may be carried out by means of electrophoresis in case of a substrate made of conductive material or if the top surface of the substrate is coated with a conductive layer 21. In case of a slurry, the slurry may comprise a liquid substance, a ceramic powder and at least one additive. The liquid substance may comprise water, an alcohol or another organic solvent. The ceramic powder may comprise, for example, zirconia or alumina or an oxide or a carbide or a nitride. The step may be carried out under vacuum to ensure a perfect filling without air inclusion.

[0044] Said sub-step E31' may be preceded by an optional sub-step consisting of preparing at least a surface portion of the substrate 20 facing the at least one cavity 13 of the second structure 1 or applying a coating to at least a surface portion of the substrate 20 facing the at least one cavity 13 of the second structure 1, with the aim of simplifying the debinding of the blank of the future watch part 6. Said blank may for example be in the form of a green body, a precursor of the watch part 6.

[0045] In a second alternative of said embodiment, the first step comprises a sub-step E32' consisting of consolidating the products placed on the second structure 1. This sub-step comprises drying the slurry to obtain a blank of the watch part 6.

[0046] An optional intermediate sub-step may consist of adjusting the height of a blank of the watch part 6 before debinding of the mould. Said blank may for example take the form of a green body, the precursor of the watch part 6.

[0047] In a second alternative of this embodiment, the third step comprises a sub-step E33' consisting of separating the blank of the component from the production tool formed in the second configuration and separating the blank of the component from the substrate 20, the two separations being possible in any order, said separation being achieved for example by chemical attack or by treatment with plasma.

[0048] In a second alternative of this embodiment, the third step finally comprises a sub-step E34' consisting of debinding the blank obtained in the previous step, followed by densification by sintering. Preferentially, the substrate 20 is made of a material intended to withstand the temperatures at which the sub-steps of the third step E3' are carried out. For example, the substrate may be made of silicon or alumina.

[0049] The manufacturing method of the clock part described above may be used for the manufacture of all clock parts, for example, as illustrative and non-limiting examples, balances, pallets, jumpers, pinions, gears, levers, springs, cams or blanks. The manufacturing method may be used for the manufacture of any element, especially necessarily including a microstructure. For this reason, figures 9 and 10 illustrate another example of a clock part, here in the shape of a heart 6'. Said heart is preferentially made of technical ceramic. It has a hole 62', which has a groove 63'. Advantageously, said groove 63' is provided to contain an element provided for integrating the heart to the hour wheel 190, for example a circlip. Said groove may have a hemispherical shape, as shown in figures 9 and 10. Of course, the groove may have any shape. It may have an asymmetric shape, for example to best respond to stresses caused by forces or torques.

[0050] In a second alternative of the embodiment, the watch component is preferably made of ceramic or composite material. Such ceramic components are preferably made of ceramics known as technical ceramics. "Technical ceramics" is the name given to high-density materials based on aluminum oxide and / or on zirconium oxide and / or on zirconium oxide stabilized in particular by yttrium oxide and / or cerium oxide and / or magnesium oxide and / or made of strontium aluminate, in particular doped strontium aluminate, and / or made of nitrides and / or made of carbides, optionally colored in particular with metal oxides and / or mixed metal oxides and / or spinel phases. For ease of explanation, the word "ceramic" can be used to refer to the "technical ceramics" used to manufacture the component 6. A material is considered to be "high density" if its density is comprised between 95% and 100% of the theoretical density of the material in question. It is noted here that the idea of ​​"based on" means that the mentioned chemical components represent at least 50% by weight of the total chemical composition of the ceramic concerned.

[0051] It is therefore clear that the invention achieves the sought-after objective by advantageously combining two different techniques: traditional photolithography allows the main volume of the watch part to be formed simply, quickly and reliably in a first step, and the two-photon polymerization technique allows the addition of complex shapes to said main volume in a second, more complex and less rapid, but more precise and flexible step, thus allowing any three-dimensional pattern to be perfectly defined. This results in a watch part whose shape is complex and which is produced in a simple and robust way.

[0052] The invention also relates to a watch component obtained by the manufacturing method described above, said watch component comprising a surface constituted by a second pattern of a second structure as described above, the watch component therefore being in the form of a monolithic part comprising a structured, or more particularly microstructured or nanostructured, surface, in other words the structured surface is integral with the remainder of the watch component.

[0053] Advantageously, the structured surface extends at least partially over the side surface of the watch part. The structuring has a horizontal recess or has a significant horizontal component. The structured surface has, for example, a micro- or nanostructure. Such a structure may, for example, take the form of a square wave or a staircase. The structure is present in relief and recessed into the structured surface of the watch part. The structured surface may additionally be very precisely defined. In particular, the structured surface may have a resolution of 0.001 μm. 3 below 3D resolution of 0.1μm below It may also have lateral resolution (in the horizontal direction). [Explanation of symbols]

[0054] 1 Second structure 4. Mask 5 Photon Device 6. Watch Parts 10 First structure 11 Side 13 Cavity 20 Substrate 21 Conductive layer 31 No. 1 photosensitive resin 32. Second photosensitive resin 61 Metal Layer

Claims

1. A method for manufacturing a timepiece component, the method comprising at least: a step (E1) of producing a first structure (10) comprising at least one photosensitive resin layer from a first photosensitive resin (31), the first structure comprising a first pattern obtained by polymerizing said first photosensitive resin (31) by irradiation through at least one mask (4) and then developing said first photosensitive resin; a step (E2) of transforming said first structure (10) into a second structure (1) by structuring said at least one surface of said first structure by adding a second photosensitive resin (32) to said at least one surface, said second structure (1) being intended to form at least partially a production tool for said watch part, said step consisting of transforming (E2) said first structure, forming (E21) a layer of said second photosensitive resin on at least a portion of said at least one surface of said first structure; performing (E22) a two-photon polymerization on the second photosensitive resin using a photonic device including an objective lens at least partially immersed in the second photosensitive resin to guide and focus a laser beam on voxels that define the contour or shape of a second pattern, while preventing the laser beam from crossing the interface between the objective lens and air and between air and the second photosensitive resin, in order to obtain a three-dimensional polymerization based on the second pattern; removing said second photosensitive resin and developing (E23) to obtain said second structure in a shape defined by said first and second patterns; and Including, The first photosensitive resin is an SU-8 type or an SU-8-100 type, and the second photosensitive resin is a liquid or semi-liquid resin different from the first photosensitive resin; The step of performing two-photon polymerization (E22) includes polymerizing and hardening the liquid or semi-liquid resin of the second photosensitive resin in the voxel by the laser beam focused by the objective lens, thereby forming a 0.001 μm ３ or better three-dimensional resolution and / or a lateral resolution of 0.1 μm or better.

2. The step consisting of transforming (E2) said first structure comprises transforming at least one of said first structure into adding said second photosensitive resin onto one side (11); A method for manufacturing a watch component according to claim 1.

3. The step consisting of producing (E1) said first structure comprises: forming the first photosensitive resin on the upper surface of the substrate (E11); exposing the first photosensitive resin to light through the mask to polymerize the first photosensitive resin according to a pattern defined by the mask (E12); developing the first photosensitive resin (E13); Including, A method for manufacturing a watch component according to claim 1 or 2.

4. The step consisting of exposing (E12) the first photosensitive resin to light produces first structures with lateral sides perpendicular or substantially perpendicular to the substrate and / or of constant cross-sectional area parallel or substantially parallel to the substrate, A method for manufacturing a watch component according to claim 3.

5. The two resins are positive or negative, A method for manufacturing a watch component according to any one of claims 1 to 4.

6. said method comprising the step of using said second structure as a mould for the manufacture of said timepiece part, A method for manufacturing a watch component according to any one of claims 1 to 5.

7. The method comprises: a step (E31) of applying, by electrochemical deposition or electroplating, to said second structure a metal layer which will form said watch part; A step (E32) of separating the assembly formed by the watch part made of the metal layer and the second structure from the substrate, and a step (E33) of separating the watch part made of the metal layer from the second structure, Including, The method for manufacturing a watch component according to claim 6.

8. The metal of the metal layer is a nickel-based or nickel-phosphorus alloy; A method for manufacturing a watch component according to claim 7.

9. A step (E31') of filling said second structure with a product comprising a ceramic powder, by means of a fluid path; A step of consolidating (E32') said products; A step (E33') of separating the blank formed by said product from said second structure and from the substrate; a step (E34') of debinding said blank obtained in the previous step and then densifying it by sintering; Including, The method for manufacturing a watch component according to claim 6.

10. A timepiece component manufactured by the method for manufacturing a timepiece component according to any one of claims 1 to 9, said timepiece component comprising a microstructured or nanostructured surface, integral with the remainder of the timepiece component, which surface extends in a concave manner over at least a portion of a side surface of said timepiece component, The structured surface has a surface roughness of 0.001 μm. ３ or better three-dimensional resolution, and / or a lateral resolution (in the horizontal direction) of 0.1 μm or better; Watch parts.

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