Intaglio printing

Abstract

To provide an intaglio printed matter having an intaglio pattern whose printing failure, such as printing image breakage, is less likely to occur even for a large printing image width.SOLUTION: An intaglio printed matter has an intaglio pattern formed on a base material. The intaglio pattern includes: a contour printing image constituting a contour; a plurality of first printing images that is formed in a region surrounded by the contour printing image and extends radially from a side of a reference point to a side of a contour printing image; and a plurality of second printing images formed so as to surround the reference point and intersect with the plurality of first printing images. A printing image width and / or a pitch in the plurality of first printing images and the plurality of second printing images is configured so as to continuously change between the contour printing image and the reference point.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present invention relates to an intaglio-printed matter with an intaglio pattern for preventing forgery and duplication.

Background Art

[0002] Conventionally, valuable printed matters such as banknotes, travel documents, gift certificates, and various certificates are required not to be forged or altered due to their nature, and anti-forgery technology is required to be applied. As one of the anti-forgery technologies, for example, an intaglio-printed matter with an intaglio pattern can be mentioned. Different from offset printing widely used in general commercial printing, the intaglio pattern is formed by applying intaglio ink to an intaglio plate surface having a printing pattern composed of concave linear patterns, wiping off excess ink other than the concave portions forming the linear patterns, and then transferring the ink in the concave portions to paper. Therefore, it is characterized by the need for a special printing machine.

[0003] However, when applying ink to the intaglio plate surface and wiping off the excess ink, the ink in the concave portions is also wiped off. Therefore, sufficient ink cannot be transferred to the paper during printing, and there has been a problem of printing defects such as breakage of the linear patterns and insufficient buildup of the ink.

[0004] On the other hand, Patent Document 1 discloses a configuration in which an ink stopper called a partition is formed on the bottom surface of the concave portion in order to prevent the ink in the concave portion from being excessively wiped off on the intaglio plate surface. By forming a partition on the bottom surface of the concave portion, it becomes difficult to wipe off the ink in the concave portion, so that printing defects can be suppressed.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] As described above, in Patent Document 1, by forming an ink stopper at the bottom of the intaglio plate surface, it becomes possible to prevent the ink in the recess from being wiped off when wiping off the excess ink. The technique of Patent Document 1 is effective in a recess for forming an intaglio pattern with a narrow line width, such as a contour line extending in one direction. However, for example, when forming an intaglio pattern with a large line width, such as the circular intaglio pattern 1 shown in FIG. 1B, it is impossible to avoid the situation where the angle of wiping off the excess ink and the arrangement direction (extending direction) of the ruled lines are the same direction. Therefore, even when an ink stopper as shown in Patent Document 1 is formed on the bottom surface of the recess in the intaglio plate surface for forming such an intaglio pattern, the ink in the recess may be wiped off, and there is a possibility that the ruled line break cannot be prevented.

[0007] Therefore, an object of the present invention is to provide an intaglio-printed matter having an intaglio pattern in which the occurrence of printing defects such as ruled line breaks is suppressed even when the line width is large.

Means for Solving the Problems

[0008] In order to solve the above problems and achieve the object of the present invention, the intaglio pattern in the intaglio-printed matter of the present invention includes a contour line constituting the contour, a plurality of first ruled lines formed in the region surrounded by the contour line and extending radially from the reference point side to the contour line side, and a plurality of second ruled lines formed so as to surround the reference point and intersect the plurality of first ruled lines. The line width and / or pitch of the plurality of first ruled lines and the plurality of second ruled lines are configured to continuously change between the contour line and the reference point.

[0009] Further, in the intaglio-printed matter, in the region divided by the second ruled lines in the circumferential direction centered on the reference point, the number of the plurality of first ruled lines at a position closer to the reference point is configured to be less than the number of the plurality of first ruled lines at a position closer to the contour line.

Effects of the Invention

[0010] According to the present invention, it is possible to obtain an intaglio-printed matter having an intaglio pattern in which printing defects such as broken lines are suppressed. Further, since the intaglio pattern of the present invention has a three-dimensional effect and is visually recognized, in a precious printed matter with limited size, not only can printing defects be suppressed, but two functions, namely designability, can be obtained with a single pattern.

Brief Description of the Drawings

[0011]

Figure 1

Figure 2

Figure 3

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Figure 5

Figure 6

Figure 7

Modes for Carrying Out the Invention

[0012] Hereinafter, an example of an intaglio-printed matter according to an embodiment of the present invention will be described with reference to the drawings. Note that the present invention is not limited to the following examples. In each of the drawings described below, the same reference numerals are given to common parts.

[0013] 1. First Embodiment 1-1. Configuration of Intaglio-Printed Matter First, a gravure printed matter according to the first embodiment of the present invention will be described with reference to the drawings. FIG. 1A is a schematic configuration diagram of a gravure printed matter 100 according to the first embodiment of the present invention. Further, FIG. 1B is an enlarged view of a main part of the gravure printed matter 100.

[0014] The gravure printed matter 100 shown in FIG. 1A has a gravure pattern M formed by performing gravure printing on a base material 6 such as paper. The base material 6 is not particularly limited as long as the gravure pattern M described later can be formed. In the present embodiment, as shown in FIG. 1B, among the gravure patterns M, the gravure pattern 1 having a large image width (the pattern corresponding to the "eye" of the face mark in FIG. 1A) is characteristic. FIG. 2 is an enlarged view showing a circular gravure pattern 1 which is a pattern corresponding to the "eye" of the face mark among the gravure patterns M. Further, FIG. 3A is a cross-sectional configuration diagram along the line A-A' of the gravure pattern 1 shown in FIG. 2, and FIG. 3B is an enlarged view showing the central region of the gravure pattern 1 shown in FIG. 2.

[0015] Hereinafter, the configuration of the gravure pattern 1 shown in FIG. 2 will be described. The gravure pattern 1 shown in FIG. 2 is circular, and its diameter is formed, for example, in the range of 2 mm to 10 mm, and is formed at 2.5 mm in FIG. 2 as an example.

[0016] As shown in FIG. 2, the gravure pattern 1 has a contour line 5 imitating the eye of the face mark, and inside the contour line 5, it has a plurality of first lines 3 and a plurality of second lines 4. The contour line 5 is an annular (ring-shaped) line forming the contour of the gravure pattern 1, and is formed, for example, with a diameter in the range of 2 mm to 10 mm, and is formed in a circular shape with a diameter of 2.5 mm as an example.

[0017] The line width and the height of the ink buildup in the direction orthogonal to the extending direction of the contour line 5 are not particularly limited as long as they are within the range of general gravure printing. The line width is formed, for example, in the range of 20 μm to 60 μm, and is formed at 40 μm as an example. Further, the height of the ink buildup from the base material 6 (hereinafter referred to as the line depth) in the contour line 5 is formed, for example, in the range of 20 μm to 60 μm.

[0018] The first reference line 3 is a linear reference line that extends from a reference point P (in this embodiment, the center position of the circle formed by the contour line 5) provided in the region surrounded by the contour line 5 to the contour line 5 side inside the contour line 5. A plurality of the first reference lines 3 are provided radially from the second reference line 4 provided at the position closest to the reference point P in the region within the contour line 5 toward the contour line 5 side. A plurality of these first reference lines 3 are provided at equal intervals in the circumferential direction. Note that if the reference lines 3 do not overlap adjacent first reference lines 3, they are not limited to being at equal intervals and may have different intervals.

[0019] Also, in this embodiment, the number of the first reference lines 3 in the circumferential direction of the intaglio pattern 1 is configured to be different according to the distance from the reference point P. Specifically, within the region delimited by the second reference line 4 in the circumferential direction centered on the reference point P, the number of the plurality of first reference lines 3 at a position closer to the reference point P is configured to be less than the number of the plurality of first reference lines 3 at a position closer to the contour line 5. For example, as shown in FIG. 3B, the number of the first reference lines 3 extending from the second reference line 4-3 located third from the reference point P outward to the contour line 5 is less than the number of the first reference lines 3 provided between the second reference line 4-2 located second from the reference point P outward and the third reference line 4-3. Also, the number of the first reference lines 3 provided between the second reference line 4-1 located first from the reference point P outward and the second reference line 4-2 located second from the reference point P is less than the number of the first reference lines 3 provided between the second reference line 4-2 located second from the reference point P outward and the third reference line 4-3.

[0020] Thus, at positions close to the reference point P, a plurality of first lines 3 in the circumferential direction are appropriately thinned compared to the contour line 5 side. Thereby, it is possible to prevent a plurality of first lines 3 from being densely formed at the central portion of the intaglio pattern 1. When the first line width W3 of the first line 3 is large, the plurality of arranged lines may be recognized not as individual lines but as a solid printed area. The human eye recognizes that among light and darkness, light is in the foreground and darkness is in the background. Although it should originally give a visual effect in the foreground with respect to the central portion, when it becomes a solid printed area, it is recognized as dark, so it becomes a visual effect in the background, and the effect of visually recognizing the intaglio pattern 1 three-dimensionally is reduced. In the present embodiment, in the circumferential direction, the distance between two adjacent first lines 3 (hereinafter, the first line interval W2) is formed to be, for example, 40 μm or more and less than 130 μm.

[0021] Furthermore, the first line 3 is configured such that the first line width W1 in the direction orthogonal to its extending direction (radial direction) continuously changes between the contour line 5 and the reference point P. In the present embodiment, as shown in FIG. 2, the first line width W1 of the first line 3 is configured such that the first line width W1 continuously increases from the reference point P toward the contour line 5 side. The change in the first line width W1 is not limited to this, and for example, it may be configured to continuously decrease from the reference point P toward the contour line 5 side, or may be configured to decrease again after once increasing. Furthermore, the first line width W1 may be constant from the reference point P to the contour line 5 side.

[0022] As described above, the first line width W1 can be variously changed. The first line width W1 is not particularly limited as long as it is within the range of general intaglio printing. For example, it is formed to be 80 μm or more and less than 90 μm. Also, in the present embodiment, the width of the first line 3 in the depth direction is configured to be constant and is formed to be 20 μm to 40 μm, but it is not limited to being constant and may be formed with some differences.

[0023] By being configured such that the first line width W1 continuously increases or decreases from the reference point P toward the contour line 5 side, and further continuously decreases toward the contour line 5 side and then continuously increases again, the design property of the entire intaglio pattern 1 can be enhanced.

[0024] The second line 4 is composed of a line having the same shape (circular shape in this embodiment) as the contour line 5 formed so as to surround the reference point P within the contour line 5. In this embodiment, within the contour line 5, a plurality of second lines 4 having different sizes are formed from the reference point P toward the contour line 5 side so as not to overlap each other. In this embodiment, the second lines 4 are each formed in the same shape with a different size from the contour line 5 and are arranged on concentric circles centered on the reference point P.

[0025] Also, the plurality of second lines 4 are each provided so as to intersect with the first line 3 extending radially in the circumferential direction centered on the reference point P.

[0026] The plurality of second lines 4 are configured such that the second line width W3 (see FIG. 3A) in the direction orthogonal to the extending direction of the second line 4 continuously changes between the contour line 5 and the reference point P. In this embodiment, the second line width W3 is configured to increase from the reference point P toward the contour line 5 side. The change of the second line width W3 is not limited to this, and may be configured such that the second line width W3 continuously decreases from the reference point P to the contour line 5, or may be configured such that it continuously decreases from the reference point P toward the contour line 5 side and then continuously increases again. Or, the second line width W3 may be constant from the reference point P toward the contour line 5 side.

[0027] Thus, the change in the second line width W3 can be varied in various ways. In this embodiment, the second line width W3 is not particularly limited as long as it is within the range of general intaglio printing. For example, it is formed to be 80 μm or more and less than 90 μm. Further, in this embodiment, the width in the depth direction of the second line is configured to be constant and is formed to have the same width as the width in the depth direction of the first line, for example, 20 μm to 60 μm.

[0028] By configuring the second line width W3 to continuously change from the reference point P toward the contour line 5 side, the design property of the entire intaglio pattern 1 can be enhanced.

[0029] Also, the pitch (second line interval W4) between two adjacent second lines 4 in the radial direction of the intaglio pattern 1 may be constant or may be configured to continuously change. Specifically, the pitch may be changed to be 1.1 times larger, alternately made shorter, or further, not limited to two adjacent ones, but may be changed so that every few lines has a smaller pitch. The second line interval W4 is formed, for example, to be 40 μm or more and less than 100 μm.

[0030] As described above, in this embodiment, a plurality of first lines 3 and a plurality of second lines 4 are formed inside the contour line 5. In this embodiment, the area near the reference point P of the intaglio pattern 1 is not formed with lines and is the base material 6, but the area including the reference point P may be formed with lines. In this case, for example, a circular line with a diameter of 100 μm or more and less than 300 μm is formed at the reference point P of the intaglio pattern 1.

[0031] When forming the intaglio pattern 1 having the above-described configuration, as shown by the two-dot chain line in FIG. 3A, an intaglio plate surface 200 in which the contour line 5, the first line 3, and the second line 4 are recessed portions is used.

[0032] 1-2. Effects Next, the effects brought about by forming the intaglio pattern 1 of this embodiment will be described.

[0033] As described above, conventionally, in order to form the circular intaglio pattern 1, when using an intaglio printing plate surface configured only with circular concave portions that mimic the intaglio pattern 1 shown in FIG. 1B, there was a problem that when wiping off excess ink, the ink in the concave portions was also wiped off, resulting in broken lines. Or, there was also a problem that the ink applied to the concave portions of the intaglio printing plate surface overflowed from the concave portions and the printed lines were blurred.

[0034] In contrast, in the present embodiment, the intaglio printing plate surface 200 (see FIG. 3A) for forming the intaglio pattern shown in FIG. 2 has a plurality of concave portions formed at the same depth in order to form the outline line 5, the first printed line 3, and the second printed line 4. Conventionally, it was necessary to form a dam in the intaglio printing plate surface, but in the intaglio printing plate surface 200 of the present invention, the convex portions between the plurality of concave portions serve as a dam (ink stop). Further, in the intaglio printing plate surface 200 for forming the intaglio pattern 1 shown in FIG. 2, the concave portions are provided with concave portions extending radially around the reference point P and concave portions formed in the same shape as the outline line 5 around the reference point P. For this reason, the portion where the wiping direction of the excess ink after applying the ink to the intaglio printing plate surface 200 and the arrangement direction (extending direction) of the concave portions are in the same direction is reduced. Thereby, since it is possible to prevent the ink applied to the concave portions of the intaglio printing plate surface 200 from being excessively wiped off within the outline line 5, in the intaglio pattern 1 of the present embodiment, the occurrence of broken lines can be suppressed.

[0035] Further, in the present embodiment, by providing the first printed line 3 and the second printed line 4 within the outline line 5, the intaglio pattern 1 can be given a design property. For this reason, even when forming a mark having a certain area as in the intaglio pattern 1 shown in FIG. 1B, the color tone does not become monotonous and a design property is imparted.

[0036] By the way, intaglio printed matter typified by banknotes and valuable printed matter such as securities has a limited printing area. Therefore, it is required to form an intaglio pattern having both a forgery prevention function and a design function within the limited printing area.

[0037] In contrast, in the present embodiment, by continuously changing the first line width W1 and / or the second line width W3 from the reference point P toward the contour line 5 side, the design function and the anti-counterfeiting function are improved as compared with simple cross-hatching formed by intersecting regular lines. Therefore, according to the present embodiment, when it is desired to form a mark having a predetermined contour as an intaglio pattern, the design function and the anti-counterfeiting function can be integrated with respect to the intaglio pattern.

[0038] In the present embodiment, the circular intaglio pattern 1 has been described as an example, but the configuration of the present invention can be applied to intaglio patterns of various shapes. Hereinafter, the case of using the configuration of the present invention for a square intaglio pattern will be described.

[0039] 2. Second Embodiment FIG. 4 is an enlarged view showing an intaglio pattern 10 formed on an intaglio-printed matter according to the second embodiment of the present invention. As shown in FIG. 4, in the second embodiment, it is an intaglio-printed matter in which a polygonal intaglio pattern 10 such as a square shape or a rectangular shape is formed on a base material 6 (not shown), and the square shape will be described as an example.

[0040] As shown in FIG. 4, in the second embodiment, it is composed of a contour line 15 constituting the contour line of the intaglio pattern 10, a first line 13, and a second line 14 formed inside the contour line 15.

[0041] In the present embodiment, the contour line 15 is a line constituting a square contour, and the length of one side is formed, for example, with a diameter of 2 mm to 10 mm, and is formed in a square shape of 2.5 μm as an example. The line width and the height of the ink buildup in the direction orthogonal to the extending direction of the contour line 15 are not particularly limited as long as they are within the range of general intaglio printing as in the first embodiment, but the line width is formed, for example, with a width of 20 μm to 60 μm, and is formed with a width of 40 μm as an example. Further, the line depth (not shown) of the contour line 15 is formed, for example, with a depth of 20 μm to 60 μm.

[0042] The first line 13 is a line provided on the inner side of the contour line 15 and extending from the reference point P (in this embodiment, the center position of the square formed by the contour line 15) provided in the area surrounded by the contour line 15 toward the contour line 15 side. A plurality of the first lines 13 are provided radially from the second line 14 at the position closest to the reference point P to the contour line 15. These plurality of first lines 13 are provided at equal intervals in the circumferential direction surrounding the reference point P.

[0043] Furthermore, the first line 13 is configured such that the first line width W1 in the direction orthogonal to its extending direction continuously changes between the contour line 15 and the reference point P. In this embodiment, as shown in FIG. 4, the first line width W1 is configured such that the first line width W1 continuously increases from the reference point P toward the contour line 15 side. The first line width W1 is not particularly limited as long as it is within the range of general intaglio printing. For example, it is formed to be 80 μm or more and less than 90 μm. Also, in this embodiment, the width in the depth direction of the first line 13 is configured to be constant and is formed to be 25 μm. Furthermore, in this embodiment, in the circumferential direction, the distance between two adjacent first lines 13 (hereinafter, the first line interval W2) is preferably formed to be, for example, 40 μm or more and less than 200 μm.

[0044] The second line 14 is a line having the same shape (square shape in this embodiment) as the contour line 15 formed so as to surround the reference point P within the contour line 15. The second line 14 is composed of lines having the same shape but different sizes from the contour line 15. In this embodiment, within the contour line 15, a plurality of second lines 14 having different sizes are provided from the reference point P toward the contour line 15 side so as not to overlap each other. These plurality of second lines 14 are respectively arranged concentrically with the reference point P as the center. The length W5 of one side of the square formed by the second line 14 formed at the position closest to the reference point P is not particularly limited, but is set to 100 μm to 300 μm, for example, 200 μm.

[0045] The plurality of second ruled lines 14 are configured such that the second ruled line width W3 in a direction orthogonal to the extending direction of the plurality of second ruled lines 14 is all the same width. In the present embodiment, the second ruled line width W3 is configured to increase from the reference point P toward the contour line 15 side. In the present embodiment, the second ruled line width W3 is not particularly limited as long as it is within the range of general intaglio printing as in the first embodiment. As an example, it is formed to be 80 μm or more and less than 90 μm. Further, in the present embodiment, the width in the depth direction of the second ruled line 14 is configured to be constant and is formed to have the same width (25 μm) as the width in the depth direction of the first ruled line 13.

[0046] Also, the distance (second ruled line interval W4) between two second ruled line widths adjacent in a direction parallel to the side of the square shape in the intaglio pattern 10 is configured to continuously increase from the reference point P side toward the contour line 15 side. In the present embodiment, the second ruled line interval W4 is not particularly limited as long as it is within the range of general intaglio printing as in the first embodiment. For example, it is formed in the range of 20 μm or more and less than 90 μm.

[0047] Also in the second embodiment, the same effects as in the first embodiment can be obtained. By the way, when the length W5 of one side of the square formed by the first ruled line 13 at the position closest to the reference point P is small as in the second embodiment, in the central region of the intaglio pattern 10, the ruled line density becomes high and the central region becomes dark. For this reason, depending on the ruled line density, the three-dimensional effect of the intaglio pattern 10 may be reduced and visually recognized.

[0048] Hereinafter, as a modification example of the second embodiment, a configuration example in which suppression of a decrease in the three-dimensional effect in the intaglio pattern is achieved will be described.

[0049] 2-1. Modification Example 1 FIG. 5 is a schematic configuration diagram of an intaglio pattern 20 according to Modification Example 1. In FIG. 5, the parts corresponding to those in FIG. 4 are denoted by the same reference numerals, and redundant description is omitted.

[0050] In Modification 1, the length W6 of one side of the square formed by the second ruled line 14 provided at the position closest to the reference point P is formed to be larger than the length W5 of one side of the square formed by the second ruled line 14 formed at the position closest to the reference point P according to the second embodiment. The length W6 of one side of the square is formed to be, for example, 350 μm. Therefore, in Modification 1, compared with the intaglio pattern 10 according to the second embodiment, the area of the region surrounded by the second ruled line 14 closest to the reference point P is large, and a wide area of the base material 6 of the region surrounding the reference point P is ensured. For this reason, the intaglio pattern 20 in Modification 1 is visually recognized as having a lighter density in the central portion compared with the intaglio pattern 10 of the second embodiment.

[0051] As described above, in Modification 1, compared with the intaglio pattern 10 of the second embodiment, since the area of the base material 6 around the reference point P becomes large, it is possible to prevent the density of the central portion from becoming high and the three-dimensional effect from decreasing.

[0052] Since a plurality of first ruled lines 13 are provided radially from the reference point P side within the contour ruled line 15, the ruled line density tends to be high in the central portion. However, according to Modification 1, by widening the area of the base material 6 in the central portion, the three-dimensional effect of the intaglio pattern can be maintained.

[0053] 2-2. Modification 2 FIG. 6 is a schematic configuration diagram of the intaglio pattern according to Modification 2. In FIG. 6, the parts corresponding to those in FIG. 4 are denoted by the same reference numerals, and redundant description is omitted.

[0054] The intaglio pattern 30 in Modification 2 is different from the second embodiment in that the second ruled line width W3 in the direction orthogonal to the extending direction of the second ruled line 34 is configured to continuously become thinner as it approaches the reference point P side. As shown in FIG. 6, since the second ruled line width W3 in the second ruled line 34 is configured to be thinner as it approaches the reference point P, the ruled line density per unit area at a position close to the reference point P can be reduced compared with the second embodiment.

[0055] Therefore, the area (the area of the central base material 6) surrounded by the second ruled line 34 closest to the reference point P can be maintained in the same manner as in the second embodiment, and a decrease in the three-dimensional effect can be suppressed.

[0056] In the first and second embodiments described above, the second ruled line was composed of ruled lines having the same shape but different sizes from the contour ruled line. However, various modifications are possible as long as the shape intersects a plurality of first ruled lines extending radially from the reference point P side. Hereinafter, an example in which the intaglio pattern 1 described in the first embodiment and the configuration of the second ruled line are different will be described.

[0057] 3. Third Embodiment FIG. 7 is a schematic configuration diagram of an intaglio pattern 50 formed on an intaglio-printed matter according to the third embodiment of the present invention. The intaglio pattern 50 according to the third embodiment is an example in which the configuration of the second ruled line 54 is different from that of the second ruled line 4 in the intaglio pattern 1 according to the first embodiment. In FIG. 7, the same reference numerals are given to the parts corresponding to those in FIG. 2, and redundant description is omitted.

[0058] The second ruled line 54 is formed of a circular ruled line formed so as to surround the reference point P within the contour ruled line 5. Further, the second ruled line 54 is formed of a wavy ruled line. In the present embodiment, a plurality of second ruled lines 54 having different sizes are provided from the reference point P side to the contour ruled line 5 side so as not to overlap each other within the contour ruled line 5. Further, the second ruled line 54 is configured such that the line width thereof repeatedly changes in a predetermined pattern in the circumferential direction.

[0059] Also in the third embodiment, the same effects as those in the first embodiment can be obtained. Further, in the intaglio pattern 50 according to the third embodiment, since the extending direction of the ruled line of the second ruled line 54 is not constant, it is possible to more effectively prevent the ink in the recessed portion from being excessively wiped off when wiping off the excess ink after applying the ink to the intaglio printing plate surface, as compared with the intaglio pattern 1 according to the first embodiment. Further, in the third embodiment, by configuring the second ruled line 54 as a wavy ruled line, it is possible to impart a design property.

[0060] In the above-described first to third embodiments, the second ruled line is exemplified as being composed of ruled lines having the same shape as the contour line, but it does not have to be the same shape as the contour line. For example, in the intaglio pattern 1 in the first embodiment, the second ruled line may be composed of a square-shaped ruled line portion, and in the intaglio pattern 10 in the second embodiment, the second ruled line may be composed of a circular ruled line. That is, the second ruled line can be variously modified as long as it is composed of a ruled line having a shape that intersects the first ruled line formed radially.

[0061] In the above-described embodiments, the intaglio pattern having a circular shape or a square shape has been described as an example, but the shape of the intaglio pattern is not limited to this. Further, the intaglio pattern is not limited to a line-symmetric figure centered on the reference point P, and can take various shapes. Also in this case, an arbitrary reference point can be formed inside the contour line constituting the contour, and by forming the first ruled line and the second ruled line inside the contour line, the same effects as those of the above-described embodiments can be obtained.

[0062] The above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described. For example, a part of the configuration of the embodiment can be replaced with another configuration, and another configuration can be added to the configuration of the embodiment.

Explanation of Reference Numerals

[0063] 1, 10, 20, 30, 50... intaglio pattern, 3, 13... first ruled line, 4, 14, 34, 54... second ruled line, 5, 15... contour line, 100... intaglio printed matter, 200... intaglio printing plate surface, W1... first ruled line width, W2... first ruled line interval, W3... second ruled line width, W4... second ruled line interval

Claims

1. An intaglio printed matter having an intaglio pattern formed on a substrate, wherein the intaglio pattern includes a contour line forming a contour, a plurality of first lines formed in a region surrounded by the contour line and extending radially from the reference point side to the contour line side, and a plurality of second lines formed so as to surround the reference point and intersect the plurality of first lines, wherein the line widths and / or pitches of the plurality of first lines and the plurality of second lines are configured to continuously change between the contour line and the reference point, the intaglio printed matter.

2. Within the region delimited by the second lines in the circumferential direction centered on the reference point, the number of the plurality of first lines at a position closer to the reference point is configured to be less than the number of the plurality of first lines at a position closer to the contour line, the intaglio printed matter according to Claim 1.

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