Black photosensitive composition, method for producing black photosensitive composition, cured film, color filter, light-shielding film, optical element, solid-state imaging element, headlight unit

The black photosensitive composition with a carboxylic acid anhydride and polymerizable compound addresses residue and adhesion issues, enabling high-quality pattern formation with reduced exposure.

JP7828330B2Active Publication Date: 2026-03-11FUJIFILM CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-03-23
Publication Date
2026-03-11

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Abstract

The present invention provides a black photosensitive composition that excels in residue suppression property when forming a pattern and can form a pattern having excellent adhesion at a smaller exposure amount, and also provides a manufacturing method of the black photosensitive composition, a cured film, a color filter, a light-shielding film, an optical element, a solid-state image capturing element, and a headlight unit. The black photosensitive composition according to the present invention includes a black pigment, a resin, a carboxylic acid anhydride, and a polymerizable compound, wherein the carboxylic acid anhydride has a molecular weight of 50-550, the content of the carboxylic acid anhydride is 0.30-10.0% by mass with respect to the total solid content of the black photosensitive composition, and the average particle size of the black pigment is 250 nm or less.
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Citation Information

Patent Citations

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    JP2008203841A

  • Composition for forming black matrix for color filter by inkjet method, method for forming black matrix using the same, black matrix, color filter, and liquid crystal display device

    JP2009145884A

  • Composition, light shielding film, color filter, optical element, sensor, solid-state imaging element, and headlight unit

    WO2020203080A1