Wafer storage container cleaning device

Abstract

To effectively washing and drying a wafer housing container.SOLUTION: A wafer housing container washing device according to an embodiment includes a washing tank for washing a wafer housing container. The washing tank houses a main body of the wafer housing container, and includes: a tank that can be opened and closed by an opening / closing lid via a hinge; a door holding part that is provided to the opening / closing lid, and holds a door of the wafer housing container; a washing nozze that supplies a washing liquid to the main body and the door; a rotational mechanism that rotates the main body and the door; a circular frame that is provided to surround an outside of the door, and has a height for covering part of a thickness of the door when the opening / closing lid is in a closing state; and an inclination cover that is provided to a position on the side opposite to the hinge while nipping the circular frame of the opening / closing lid when the opening / closing lid is in the closing state, is provided so as to be inclined so as to becomes higher toward the circular frame, and guides the washing liquid supplied to the door and scattered. An end part on the side where the hinge of the inclination cover is provided is provided to a position where the washing liquid is guided to the side surface of the circular frame when the opening / closing lid changes from the closing state to an opening state.SELECTED DRAWING: Figure 8

Claims

1. A wafer storage container cleaning apparatus for cleaning a wafer storage container having a storage space for storing semiconductor wafers, the main body having a storage space communicating with an opening, and a door that can be attached to and detached from the opening, The wafer storage container has a cleaning tank for cleaning, The aforementioned cleaning tank is A tank having a body storage area for housing the aforementioned body, and having an entrance / exit port at the top that can be opened and closed by a hinged lid, The aforementioned opening and closing lid includes a door holding portion that holds the door, The main body is housed in the main body housing area, and the cleaning nozzle is held in the door holding portion and supplies cleaning fluid to the door. The main body and the door are rotated by a rotating mechanism, A circular frame is provided in a position that does not interfere with the door that is rotated by the aforementioned rotation mechanism, so as to surround the outside of the door that is held by the door holding part, and has a height that covers a portion of the thickness of the door that is held by the door holding part when the opening and closing lid is in the closed state, When the opening / closing lid is in the closed position, an inclined cover is provided on the opening / closing lid, on the opposite side of the hinge from the circular frame, and is inclined such that the end opposite the hinge is the lowest and rises towards the circular frame, and guides the cleaning liquid that is supplied from the cleaning nozzle to the door held by the door holding part and scattered, It has, A wafer storage container cleaning device, wherein the end of the inclined cover on the side where the hinge is provided is positioned to guide the cleaning liquid to the side surface of the circular frame when the opening / closing lid transitions from a closed state to an open state, and is provided to have a portion that overlaps with the circular frame in a side view.

2. The side of the door held by the door holding portion that is opposite to the side facing the opening / closing lid is located below the circular frame in the height direction of the tank. Between the circular frame and the hinge of the opening / closing lid, a guide plate is provided to guide the cleaning liquid from the opening / closing lid to the wall surface of the tank. The wafer storage container cleaning apparatus according to claim 1, wherein the guide plate is provided at a height position that includes a height position at which the cleaning liquid splashing from the door held by the door holding part strikes when the opening and closing lid is in the closed position, and has a first inclined portion having a surface that is inclined such that its upper end is located inside the tank than its lower end.

3. One end of the guide board is provided on the opening / closing lid, The guide board comprises a first vertical section, a first inclined section, a second vertical section, and a second inclined section in the order of the first vertical section, the first inclined section, the second vertical section, and the second inclined section, in the direction extending from one end of the guide board. The first vertical portion and the second vertical portion form surfaces perpendicular to the horizontal plane when the opening / closing lid is in the closed state. The wafer storage container cleaning apparatus according to claim 2, wherein the second inclined portion has a surface perpendicular to the horizontal plane when the opening / closing lid is opened to a 45-degree angle.

4. A first canopy is provided at one end on the wall surface of the tank, below the guide board, to receive the cleaning liquid flowing down the guide board and to guide the cleaning liquid to the wall surface of the tank, The wafer storage container cleaning apparatus according to claim 2 or 3, wherein the first eaves is inclined such that the other end is higher than the one end, and a hole is formed between the one end and the wall surface through which the cleaning liquid can pass.

5. A second canopy is provided, having one end on the wall surface of the tank between the lower end of the guide board and the first canopy, and inclined such that the other end is at a higher position than the first end, and having a hole between the first end and the wall surface through which the cleaning liquid can pass. The wafer storage container cleaning apparatus according to claim 4, wherein the cleaning nozzle remains in a standby position provided between the second overhang and the first overhang when the cleaning fluid is not supplied.

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