Plasma generator using a resonant waveguide equipped with a tuner

Abstract

A plasma generator using a resonant waveguide is disclosed. The plasma generator includes a ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface, a first input waveguide tangentially connected to the central waveguide to allow electromagnetic waves to pass therethrough, an electromagnetic wave supplier transmitting electromagnetic waves to the input waveguide, and a plasma chamber having an electromagnetic wave input window located at the exit of the slots to seal the interior of the central waveguide and through which the electromagnetic waves introduced through the slots can be radiated to the outside.

Description

Technical Field

[0001] The present invention relates to a plasma generating device using a resonant waveguide, and more particularly to a plasma generating device using a resonant waveguide capable of generating a uniform large-area plasma.

Background Art

[0002] Generally, for large-area base materials, especially in the plasma treatment of flexible OLED thin film processes and functional fabrics, it is very efficient to use the roll-to-roll method.

[0003] Since such a roll-to-roll method processes by scanning from one end to the other end of the base material, it requires a plasma source large enough to cover the entire base material. However, in the case of a microwave plasma source according to the prior art, its length or diameter is limited within the size of the microwave wavelength, and there is a limit in processing a base material larger than a predetermined size.

[0004] To solve such problems, a plasma source using electromagnetic waves formed in an elliptical shape with a long track shape in one direction is fabricated and used for plasma treatment of large-area workpieces. However, it is difficult to apply power for uniformly generating plasma in the length direction of the long track shape, and thus there is a problem that it is difficult to generate a uniform large-area plasma. Also, it is difficult to adjust the density of the large-area plasma.

Summary of the Invention

Problems to be Solved by the Invention

[0005] Therefore, the problem to be solved by the present invention is to provide a plasma generating device using a resonant waveguide capable of generating a large-area plasma in which the power of electromagnetic waves is uniformly maintained throughout the entire section in the resonant waveguide and the density and uniformity are maintained in the plasma chamber.

[0006] Another objective is to provide a plasma generator using a resonant waveguide that can make the plasma density more uniform or increase the plasma density. [Means for solving the problem]

[0007] A plasma generator using a resonant waveguide according to one embodiment of the present invention is characterized by comprising: a ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface; a first incident waveguide tangentially connected to the central waveguide so as to allow electromagnetic wave communication; an electromagnetic wave supply unit for transmitting electromagnetic waves to the incident waveguide; and a plasma chamber located on the outlet side of the slots so as to be sealed to the inside of the central waveguide, with an electromagnetic wave incident window formed therein so as to allow electromagnetic waves flowing in through the slots to be radiated to the outside. Electromagnetic waves are input to the central waveguide in the normal direction, resonate while the central waveguide rotates, and a strong resonant electromagnetic wave is formed inside the central waveguide, allowing the strong electromagnetic wave to be emitted through the slits.

[0008] In one embodiment, a second incident waveguide may be included that is tangentially connected to the central waveguide in a manner that allows electromagnetic waves to communicate, at a point symmetric to the central waveguide with respect to the first incident waveguide. When the incident waveguide is placed on this diagonal, the waves in the central waveguide propagate in the same direction, inducing resonance and simultaneously compensating for the disadvantage of power decreasing with distance in the incident waveguide. The central waveguide reduces electromagnetic wave loss by forming resonance and simultaneously induces plasma formation in the chamber through uniform distribution of electromagnetic waves. This plasma source provides a structure in which plasma is generated inside the chamber by electromagnetic waves applied through a plurality of slits at specified positions in a straight section of the central waveguide.

[0009] This invention solves the conventional problem of non-uniform plasma distribution in a straight section, where relatively strong electromagnetic waves are formed near the incident waveguide, and the electromagnetic waves weaken as the distance from the incident waveguide increases. To solve this, the present invention introduces a structure in which electromagnetic waves are incident in both directions. The first and second incident waveguides are positioned at points symmetrical to each other at their central point, so that microwaves propagate in the same direction within the waveguide. At the same time, the problem of non-uniform electromagnetic wave strength, which weakens as the distance from the incident point increases, is solved by supplying electromagnetic waves from both directions.

[0010] In one embodiment, the design may include a third incident waveguide parallel to the first incident waveguide and tangentially connected to the central waveguide in a manner that allows electromagnetic wave communication at a point where it intersects with the central waveguide in the same row as the second incident waveguide, and a fourth incident waveguide parallel to the second incident waveguide and tangentially connected to the central waveguide in a manner that allows electromagnetic wave communication at a point where it intersects with the central waveguide in the same row as the first incident waveguide. This structure of four incident waveguides allows for the incidence of two waves in different directions, and can induce standing waves inside the waveguides. By forming standing waves, electromagnetic waves of uniform strength can be induced in each slit. Furthermore, the first, second, third, and fourth incident waveguides are each located in a direction normal to the center of the central waveguide in a symmetrical manner, reducing the problem of non-uniform electric field strength near different incident waveguides.

[0011] In one embodiment, the central waveguide includes a first straight rectangular waveguide, a second straight rectangular waveguide parallel to the first straight rectangular waveguide, a first curved rectangular waveguide that connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on one side so as to allow electromagnetic wave communication, and a second curved rectangular waveguide that connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on the other side so as to allow electromagnetic wave communication, wherein the first incident waveguide can be connected to the end portion of the first straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to allow electromagnetic wave communication.

[0012] In one embodiment, the first incident waveguide includes a second incident waveguide connected tangentially to the central waveguide at a point symmetric to the central waveguide, allowing electromagnetic waves to communicate, wherein the second incident waveguide can be connected in parallel to the second curved rectangular waveguide at the end of the second straight rectangular waveguide, allowing electromagnetic waves to communicate.

[0013] In one embodiment, the waveguide includes a third incident waveguide parallel to the first incident waveguide and connected tangentially to the central waveguide in the same row as the second incident waveguide, allowing electromagnetic wave communication at the point where they intersect, and a fourth incident waveguide parallel to the second incident waveguide and connected tangentially to the central waveguide in the same row as the first incident waveguide, allowing electromagnetic wave communication at the point where they intersect, wherein the third incident waveguide is connected to the end of the first straight rectangular waveguide in parallel with the second curved rectangular waveguide, allowing electromagnetic wave communication.

[0014] The fourth incident waveguide can be connected to the end of the second straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to allow electromagnetic wave communication.

[0015] In one embodiment, the straight rectangular waveguide and the curved rectangular waveguide are in TE mode, and one of the two surfaces perpendicular to the electric field inside the straight rectangular waveguide and the curved rectangular waveguide is positioned to face inward, and the slit can be formed on the inner surface of the straight rectangular waveguide.

[0016] In one embodiment, the linear rectangular waveguide may be WR430, the curved rectangular waveguide may be WR284, and the incident waveguide may be WR340.

[0017] In one embodiment, the linear rectangular waveguide may include a tuner installed on the surface facing the slots. Each slot may have its own tuner, which allows for adjusting the wavelength within the resonant waveguide and thereby adjusting the power of the microwaves applied to each slit. By adjusting the position of the tuners located on the surface facing each slit within the linear rectangular waveguide, the wavelength within each waveguide changes, which in turn changes the power of the electromagnetic waves applied to the slits. This may also affect the power of the electromagnetic waves applied to the next slit. This is a means by which the power of the electromagnetic waves (plasma density) applied to each slit can be independently controlled in each of the plasma source structures. As the plasma generator becomes larger, the problem of non-uniformity of the electromagnetic waves applied to each slit becomes more serious. To solve this problem, a tuner for controlling each slit is located on the surface facing the slits.

[0018] In one embodiment, the tuners may be included in a number corresponding to the number of slots.

[0019] In one embodiment, the tuner is a stub tuner, and the tuner can be installed penetrating from the outside to the inside of the outer surface. [Effects of the Invention]

[0020] The plasma generator using a resonant waveguide according to the present invention has the advantage that the power of the electromagnetic waves is uniformly maintained throughout the entire section of the resonant waveguide, thereby radiating electromagnetic waves of uniform power into the plasma chamber through multiple slots, and generating a large-area plasma with maintained density and uniformity within the plasma chamber.

[0021] In addition, the tuner can adjust the power of the electromagnetic waves flowing into each of the plurality of slots so that they become uniform, and there is an advantage that the density of the plasma in the plasma chamber becomes more uniform or a plasma with a high density can be generated.

Brief Description of the Drawings

[0022] [Figure 1] It is a cross-sectional view for explaining the configuration of a plasma generation device using a resonant waveguide according to an embodiment of the present invention. [Figure 2] It is a perspective view showing the central waveguide and the incident waveguide shown in FIG. 1. [Figure 3] It is a cross-sectional view showing the transmission of electromagnetic waves and plasma generation of a plasma generation device using a resonant waveguide according to an embodiment of the present invention.

Modes for Carrying Out the Invention

[0023] Hereinafter, a plasma generation device using a resonant waveguide according to an embodiment of the present invention will be described in detail with reference to the attached drawings. The present invention can be modified in various ways and can have various forms. Specific embodiments are illustrated in the drawings and will be described in detail in the text. However, this is not intended to limit the present invention to a specific disclosed form, and it should be understood that it includes all modifications, equivalents, or alternatives included in the spirit and technical scope of the present invention. When explaining each drawing, similar reference numerals are used for similar components. In the attached drawings, the dimensions of the structures are shown enlarged for the clarity of the present invention.

[0024] Terms such as first, second, etc. can be used to describe various components, but the components are not limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, within the scope not departing from the scope of the rights of the present invention, the first component can be named the second component, and similarly, the second component can also be named the first component.

[0025] The terms used in this application are only used to describe specific embodiments and are not intended to limit the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, terms such as "comprising" or "having" are intended to specify the presence of the features, steps, operations, components, parts, or combinations thereof described in the specification, and should be understood not to preclude the presence or addition of one or more other features, steps, operations, components, parts, or combinations thereof.

[0026] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by a person of ordinary skill in the technical field to which the present invention belongs. Terms defined in commonly used dictionaries should be interpreted to have a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or overly formal sense unless clearly defined in this application.

[0027] FIG. 1 is a cross-sectional view for explaining the configuration of a plasma generation device using a resonant waveguide according to an embodiment of the present invention, and FIG. 2 is a perspective view showing the central waveguide and the incident waveguide shown in FIG. 1.

[0028] Referring to FIGS. 1 and 2, a resonant waveguide according to an embodiment of the present invention may include a central waveguide 110, a first incident waveguide 141, an electromagnetic wave supply unit, and a plasma chamber 130.

[0029] The central waveguide 110 can be provided in a track form so as to transmit electromagnetic waves in a clockwise or counterclockwise direction. For example, it may be provided in an annular or elliptical shape. The central waveguide 110 is a rectangular waveguide.

[0030] Specifically, the central waveguide 110 may include a first linear rectangular waveguide 111, a second linear rectangular waveguide 112, a first curved rectangular waveguide 113, and a second curved rectangular waveguide 114.

[0031] The first linear rectangular waveguide 111 is a waveguide that extends linearly in one direction from the central waveguide 110.

[0032] The second linear rectangular waveguide 112 is a waveguide that runs parallel to the first linear rectangular waveguide 111 with respect to the central waveguide 110.

[0033] The first curved rectangular waveguide 113 connects the ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 to one side of the central waveguide 110, that is, in the direction of one end of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112, so that electromagnetic waves can communicate between them.

[0034] The second curved rectangular waveguide 114 connects the ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 to the other side of the central waveguide 110, that is, in the direction of the other ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112, so that electromagnetic waves can communicate between them.

[0035] In this central waveguide 110 structure, the first linear rectangular waveguide and the second linear rectangular waveguide 112, and the first curved rectangular waveguide and the second curved rectangular waveguide 114 are TE mode, and the central waveguide 110 can be positioned upright such that one of the two faces perpendicular to the electric field in the first linear rectangular waveguide and the second linear rectangular waveguide 112, and the first curved rectangular waveguide and the second curved rectangular waveguide 114 faces inward towards the ring or ellipse of the central waveguide 110. At this time, of the two upright faces of each rectangular waveguide 111, 112, 113, and 114, the face facing inward towards the ring or ellipse of the central waveguide 110 is the inner surface of the central waveguide 110, and the face facing outward towards the ring or ellipse of the central waveguide 110 is the outer surface of the central waveguide 110.

[0036] In one embodiment, the first linear rectangular waveguide and the second linear rectangular waveguide 112 are made of WR430 waveguides, and the first curved rectangular waveguide and the second curved rectangular waveguide 114 may be made of WR284 waveguides.

[0037] On the other hand, the central waveguide 110 may include a plurality of slots 115. The slots 115 can be provided to radiate electromagnetic waves from within the central waveguide 110 to the outside. For example, the plurality of slots 115 can be arranged at predetermined intervals on the inner surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112. There are no particular restrictions on the shape of the slots 115; for example, they may be provided so as to expand in size from inside the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 toward the inner surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112.

[0038] The first incident waveguide 141 causes electromagnetic waves to be injected into the central waveguide 110. The first incident waveguide 141 can be tangentially connected to the central waveguide 110 so as to allow electromagnetic wave communication. At this time, the first incident waveguide 141 can be connected in parallel with the first curved rectangular waveguide 113 to the end of the first straight rectangular waveguide 111, which is connected to the first curved rectangular waveguide 113, so as to allow electromagnetic wave communication. The transmission path of the electromagnetic waves injected from this first incident waveguide 141 is transmitted in a clockwise direction by being injected into the first straight rectangular waveguide 111 and then passing through the second curved rectangular waveguide 114, and can then pass through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. As an example, the first incident waveguide 141 can have one surface connected to the outer surface of the first linear rectangular waveguide 111 that is tapered in the direction of the first linear rectangular waveguide 111.

[0039] The electromagnetic wave supply unit 120 transmits electromagnetic waves to the first incident waveguide 141. For example, the electromagnetic wave supply unit may include a power supply unit and a magnetron that emits electromagnetic waves to the first incident waveguide 141. There may be multiple electromagnetic wave supply units 120, in which case each electromagnetic wave supply unit 120 can transmit electromagnetic waves to the first incident waveguide 141 and the second to fourth incident waveguides 152, which will be described later.

[0040] The plasma chamber 130 is positioned along the inner surface of the central waveguide 110, located inside the central waveguide 110, and electromagnetic waves can be incident into it from the central waveguide 110. For example, the plasma chamber 130 may be ring-shaped or elliptical.

[0041] To inject electromagnetic waves into the plasma chamber 130, the plasma chamber 130 may be equipped with an electromagnetic wave injection window 131. The electromagnetic wave injection window 131 is positioned opposite a plurality of slots 115 of the central waveguide 110. That is, the electromagnetic wave injection window 131 is positioned on the exit side of the plurality of slots 115 so as to be sealed to the inside of the central waveguide 110, and can be configured so that electromagnetic waves flowing in through the plurality of slots 115 are radiated to the outside of the plurality of slots 115, i.e., into the plasma chamber 130. There may be a plurality of electromagnetic wave injection windows 131, corresponding to the inner surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112, and covering the exit sides of the plurality of slots 115 provided in each linear rectangular waveguide 111, 112.

[0042] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may further include a second incident waveguide 142.

[0043] The second incident waveguide 142 causes electromagnetic waves to be injected into the central waveguide 110. The second incident waveguide 142 can be connected tangentially to the central waveguide 110 at a point symmetric to the central point of the first incident waveguide 141, allowing electromagnetic wave communication. At this time, the second incident waveguide 142 can be connected in parallel with the second curved rectangular waveguide 114 to the end of the second straight rectangular waveguide 112, which is connected to the second curved rectangular waveguide 114, allowing electromagnetic wave communication. In one embodiment, the second incident waveguide 142 can be arranged diagonally to the first incident waveguide 141. The transmission path of electromagnetic waves incident from such a second incident waveguide 142 is transmitted clockwise after being incident on the second linear rectangular waveguide 112 and passing through the first curved rectangular waveguide 113, and can then pass through the first linear rectangular waveguide 111 and the second curved rectangular waveguide 114. The frequency of electromagnetic waves incident via the second incident waveguide 142 may be the same as the frequency of electromagnetic waves incident via the first incident waveguide 141. As an example, one surface of the second incident waveguide 142 that is connected to the outer surface of the second linear rectangular waveguide 112 can be tapered in the direction of the second linear rectangular waveguide 112.

[0044] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may further include a third incident waveguide 151 and a fourth incident waveguide 152.

[0045] The third incident waveguide 151 causes electromagnetic waves to be incident inside the central waveguide 110. The third incident waveguide 151 is parallel to the first incident waveguide 141 and can be tangentially connected to the central waveguide 110, which is in the same row as the second incident waveguide 142, in a manner that allows electromagnetic wave communication. At this time, the third incident waveguide 151 can be connected in parallel with the second curved rectangular waveguide 114 to the end of the first straight rectangular waveguide 111, which is connected to the second curved rectangular waveguide 114, in a manner that allows electromagnetic wave communication. The transmission path of electromagnetic waves incident from such a third incident waveguide 151 is transmitted in a counterclockwise direction by being incident on the first straight rectangular waveguide 111 and then passing through the first curved rectangular waveguide 113, and can then pass through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. The frequency of the electromagnetic wave incident on the third incident waveguide 151 may be the same as the frequency of the electromagnetic wave incident on the first incident waveguide 141 and the second incident waveguide 142. In this case, the electromagnetic wave incident on the third incident waveguide 151 may have the same frequency, amplitude, and phase angle as the electromagnetic wave incident on the first incident waveguide 141 and the second incident waveguide 142. As an example, one surface of the third incident waveguide 151 connected to the outer surface of the first linear rectangular waveguide 111 may be tapered in the direction of the first linear rectangular waveguide 111.

[0046] The fourth incident waveguide 152 causes electromagnetic waves to be incident inside the central waveguide 110. The fourth incident waveguide 152 is parallel to the second incident waveguide 142 and can be connected tangentially to the central waveguide 110, which is in the same row as the first incident waveguide 141, in a manner that allows electromagnetic wave communication. At this time, the fourth incident waveguide 152 can be connected in parallel with the first curved rectangular waveguide 113 to the end of the second straight rectangular waveguide 112, which is connected to the first curved rectangular waveguide 113, in a manner that allows electromagnetic wave communication. The transmission path of the electromagnetic waves incident in such a fourth incident waveguide 152 is transmitted in a counterclockwise direction by being incident in the second straight rectangular waveguide 112 and then passing through the second curved rectangular waveguide 114, and can then pass through the first straight rectangular waveguide 111 and the first curved rectangular waveguide 113. The frequency of the electromagnetic wave incident on the fourth incident waveguide 152 may be the same as the frequency of the electromagnetic wave incident on the third incident waveguide 151. As an example, one surface of the fourth incident waveguide 152 that is connected to the outer surface of the second linear rectangular waveguide 112 may be tapered in the direction of the second linear rectangular waveguide 112.

[0047] In one embodiment, the first to fourth incident waveguides 152 may be composed of WR340 waveguides.

[0048] On the other hand, a plasma generator using a resonant waveguide according to one embodiment of the present invention may further include a tuner 160.

[0049] Multiple tuners 160 are provided and can be installed within the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 of the central waveguide 110, on surfaces facing multiple slots 115, i.e., on the outer surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112.

[0050] The tuners 160 are provided in a number corresponding to the number of slots 115, and can be arranged on the outer surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112, facing each of the multiple slots 115.

[0051] In one embodiment, the tuner 160 may be a stub tuner and can be installed penetrating from the outside to the inside of the outer surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112. In this case, the tuner 160 may have a fixed insertion length, or it may be configured such that the distance between the slots 115 can be adjusted by adjusting the insertion length. If the insertion length of the tuner 160 is fixed, it can be installed so that the insertion lengths of the tuner 160 differ in the direction of propagation of electromagnetic waves in the central waveguide 110, and the distances between each slot 115 and the tuner 160 differ from each other in the direction of propagation of electromagnetic waves. For example, the tuner 160 can be installed in a structure in which the insertion length can be varied.

[0052] The electromagnetic wave incidence process and plasma formation process of a plasma generator using a resonant waveguide according to one embodiment of the present invention will be described below with reference to Figure 3. Figure 3 is a cross-sectional view showing the transmission of electromagnetic waves and plasma generation in a plasma generator using a resonant waveguide according to one embodiment of the present invention.

[0053] In order to form a plasma in the plasma chamber 130, electromagnetic waves are injected into the central waveguide 110 via the first to fourth incident waveguides 152.

[0054] The electromagnetic waves incident in the first incident waveguide 141 are first incident in the first linear rectangular waveguide 111 of the central waveguide 110, and then transmitted in the direction of the second linear rectangular waveguide 112 via the second curved rectangular waveguide 114.

[0055] The electromagnetic waves incident in the second incident waveguide 142 are first incident in the second linear rectangular waveguide 112 of the central waveguide 110, and then transmitted in the direction of the first linear rectangular waveguide 111 via the first curved rectangular waveguide 113.

[0056] The electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142 are electromagnetic waves of the same frequency, and they merge and are transmitted in the same direction (clockwise).

[0057] The electromagnetic waves incident in the third incident waveguide 151 are first incident in the first linear rectangular waveguide 111 of the central waveguide 110, and then transmitted in the direction of the second linear rectangular waveguide 112 via the first curved rectangular waveguide 113.

[0058] The electromagnetic waves incident in the fourth incident waveguide 152 are first incident in the second linear rectangular waveguide 112 of the central waveguide 110, and then transmitted in the direction of the first linear rectangular waveguide 111 via the second curved rectangular waveguide 114.

[0059] Electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 are electromagnetic waves of the same frequency and merge and are transmitted in the same direction (counterclockwise). Furthermore, electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 may have the same frequency, amplitude, and phase angle as electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142.

[0060] Therefore, electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142 and electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 propagate in opposite directions, causing interference and inducing a standing wave within the central waveguide 110 as electromagnetic waves of the same properties.

[0061] Next, electromagnetic waves in the central waveguide 110 flow into a plurality of slots 115 arranged in the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112, and are then radiated into the plasma chamber 130 through the electromagnetic wave incidence window 131 of the plasma chamber 130, thereby generating plasma within the plasma chamber 130.

[0062] In this electromagnetic wave transmission process and plasma generation process, the electromagnetic wave incident in the first incident waveguide 141 may experience a decrease in power as it moves further away from the first incident waveguide 141. However, since additional electromagnetic waves are incident in the second incident waveguide 142 in the same direction as the electromagnetic wave incident in the first incident waveguide 141 and merge with it, even if the power of the electromagnetic wave incident in the first incident waveguide 141 gradually decreases, the additional electromagnetic waves incident in the second incident waveguide 142 and transmitted in the same direction can maintain a uniform electromagnetic wave power throughout the entire section within the central waveguide 110.

[0063] The structure that solves the problem of reduced power of such electromagnetic waves also applies to electromagnetic waves that are incident via the third incident waveguide 151 and the fourth incident waveguide 152 and transmitted within the central waveguide 110.

[0064] Furthermore, the electromagnetic waves transmitted after being incident in the third incident waveguide 151 and the fourth incident waveguide 152 have the same properties as the electromagnetic waves transmitted after being incident in the first incident waveguide 141 and the second incident waveguide 142, but propagate in opposite directions. As a result, standing waves are induced in the central waveguide 110, and electromagnetic waves with uniform power can flow into multiple slots 115.

[0065] In this way, the electromagnetic wave power is uniformly maintained throughout the entire section of the central waveguide 110, and electromagnetic waves of uniform power flow into the multiple slots 115, making it possible to generate a plasma in which density and uniformity are maintained throughout the entire region of the plasma chamber 130.

[0066] On the other hand, during the electromagnetic wave transmission process and the plasma generation process, the power of the electromagnetic waves applied to the plasma chamber 130 can be adjusted using the tuner 160.

[0067] In other words, the tuners 160 facing each slot 115 along the direction of propagation of the electromagnetic waves incident and transmitted in the first incident waveguide 141 and the second incident waveguide 142 are positioned or varied so that the length of their insertion is at a distance between the slots 115, which allows the power of the electromagnetic waves flowing into each slot 115 to become more uniform, thereby enabling the density of the plasma generated in the plasma chamber 130 to become more uniform or to generate a high-density plasma.

[0068] Furthermore, since the central waveguide 110 and the plasma chamber 130 are formed in an annular or elliptical shape, a large-area plasma can be generated.

[0069] The description of the presented embodiments is provided so that a person with ordinary skill in the art of the invention can utilize or practice the invention. Various modifications to such embodiments should be obvious to a person with ordinary skill in the art of the invention, and the general principles defined herein can be applied to other embodiments without departing from the scope of the invention. Accordingly, the invention should not be limited to the embodiments presented herein, but should be interpreted in the broadest sense consistent with the principles and novel features presented herein.

Claims

1. A ring-shaped or elliptical central waveguide containing multiple slots on its inner surface, A first incident waveguide is tangentially connected to the central waveguide so as to allow electromagnetic wave communication, A second incident waveguide is connected tangentially to the first incident waveguide at a point symmetric to the center of the central waveguide, allowing electromagnetic waves to communicate with the central waveguide, An electromagnetic wave supply unit that transmits electromagnetic waves to the first incident waveguide and the second incident waveguide, A plasma chamber comprising: a plasma chamber having an electromagnetic wave incidence window formed therein, which is located on the exit side of the slot so as to be sealed to the inside of the central waveguide, and from which electromagnetic waves flowing in through the slot can be radiated to the outside; The aforementioned central waveguide is First linear rectangular waveguide, A second linear rectangular waveguide parallel to the first linear rectangular waveguide, A first curved rectangular waveguide connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on one side so that electromagnetic waves can communicate, It includes a second curved rectangular waveguide that connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on the other side in a manner that allows electromagnetic waves to communicate, The first incident waveguide is connected to the end of the first straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to allow electromagnetic wave communication. The second incident waveguide is a plasma generator using a resonant waveguide, connected in parallel to the second curved rectangular waveguide at the end of the second linear rectangular waveguide so as to allow electromagnetic wave communication.

2. A ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface, A first incident waveguide is tangentially connected to the central waveguide so as to allow electromagnetic wave communication, A second incident waveguide is connected tangentially to the first incident waveguide at a point symmetric to the center of the central waveguide, allowing electromagnetic waves to communicate with the central waveguide, A third incident waveguide is connected tangentially to the first incident waveguide, parallel to the first incident waveguide, at a point in the central waveguide where it intersects with a position corresponding to the second incident waveguide, allowing electromagnetic wave communication; A fourth incident waveguide is connected tangentially to the second incident waveguide, parallel to the second incident waveguide, at a point in the central waveguide where it intersects with a position corresponding to the first incident waveguide, allowing electromagnetic wave communication; An electromagnetic wave supply unit that transmits electromagnetic waves to the first to fourth incident waveguides, A plasma generator using a resonant waveguide, comprising: a plasma chamber having an electromagnetic wave incidence window formed therein, which is located on the outlet side of the slot so as to be sealed to the inside of the central waveguide, and which allows electromagnetic waves flowing in through the slot to be radiated to the outside.

3. The aforementioned central waveguide is First linear rectangular waveguide, A second linear rectangular waveguide parallel to the first linear rectangular waveguide, A first curved rectangular waveguide that connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on one side so as to allow electromagnetic wave communication, and It includes a second curved rectangular waveguide that connects the ends of the first straight rectangular waveguide and the second straight rectangular waveguide on the other side in a manner that allows electromagnetic waves to communicate, Plasma generating apparatus using a resonant waveguide according to claim 2, characterized in that the first incident waveguide is connected to the end portion of the first straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to be able to communicate electromagnetically.

4. Plasma generation apparatus using a resonant waveguide according to claim 3, characterized in that the second incident waveguide is connected to the end portion of the second linear rectangular waveguide in parallel with the second curved rectangular waveguide so as to allow electromagnetic wave communication.

5. The third incident waveguide is connected to the end of the first straight rectangular waveguide in parallel with the second curved rectangular waveguide so as to allow electromagnetic wave communication. Plasma generating apparatus using a resonant waveguide according to claim 4, characterized in that the fourth incident waveguide is connected to the end portion of the second linear rectangular waveguide in parallel with the first curved rectangular waveguide so as to be able to communicate electromagnetically.

6. The first linear rectangular waveguide, the second linear rectangular waveguide, the first curved rectangular waveguide, and the second curved rectangular waveguide are in TE mode, The first straight rectangular waveguide, the second straight rectangular waveguide, the first curved rectangular waveguide, and the second curved rectangular waveguide are positioned such that one of the two surfaces perpendicular to the electric field within the waveguide faces inward. Plasma generating apparatus using a resonant waveguide according to claim 1, wherein the slot is formed on the inner surface of the first linear rectangular waveguide and the second linear rectangular waveguide.

7. The first linear rectangular waveguide and the second linear rectangular waveguide are WR430, The first curved rectangular waveguide and the second curved rectangular waveguide are WR284, Plasma generating apparatus using a resonant waveguide according to claim 6, wherein the first incident waveguide and the second incident waveguide are WR340.

8. Plasma generating apparatus using a resonant waveguide according to claim 1, comprising a tuner installed on a surface facing the slot within the first linear rectangular waveguide and the second linear rectangular waveguide.

9. The plasma generator using a resonant waveguide according to claim 8, wherein the tuners are included in a number corresponding to the number of slots.

10. The aforementioned tuner is a stub tuner, The plasma generating apparatus using a resonant waveguide according to claim 8, wherein the tuner is installed penetrating from the outside to the inside of the outer surface of the surface facing the slot.

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