Display apparatus having a light-emitting device and a pixel lens

Abstract

The present invention relates to a display device in which a light-emitting element and an optical lens are laminated on a light-emitting region of a device substrate. A black matrix and a touch electrode may be laminated on a non-light-emitting region of the device substrate. An encapsulation unit covering the light-emitting element and an optical insulating film covering the black matrix may be located on the light-emitting region and the non-light-emitting region of the device substrate. The touch electrode and the optical lens may be located on the optical insulating film. A lens barrier may be located on the optical insulating film. Each optical lens may be surrounded by the lens barrier. Accordingly, deformation of each optical lens due to a reflow process can be prevented in the display device. Therefore, degradation of image quality due to the formation process of the optical lens can be prevented in the display device.

Description

Technology Field

[0001] The present invention relates to a display device in which a light-emitting element and an optical lens are stacked on each light-emitting region of a device substrate. Background Technology

[0002] Generally, a display device provides an image to a user. For example, the display device may include a plurality of pixel regions. A light-emitting region may be defined within each pixel region. For example, a light-emitting element and an optical lens may be located within the light-emitting region of each pixel region.

[0003] The light-emitting element may emit light of a specific color. For example, the light-emitting element may include a first electrode, a light-emitting layer, and a second electrode stacked sequentially on a device substrate. The optical lens may concentrate light emitted from the light-emitting element. For example, the optical lens in each pixel area may have an area larger than the light-emitting area of ​​the corresponding pixel area.

[0004] The surface of the optical lens may be curved. For example, the cross-section of the optical lens may be hemispherical. The optical lens may be formed by a reflow process. However, in the display device, the optical lens in each pixel area may come into contact with the optical lens in an adjacent pixel area due to the reflow process. Accordingly, the shape of some of the optical lenses may be deformed in the display device. The shape deviation of the optical lenses may distort the displayed image. Therefore, the quality of the image may be degraded in the display device due to the formation process of the optical lenses. The problem to be solved

[0005] The problem that the present invention aims to solve is to provide a display device capable of preventing image quality degradation caused by the formation process of optical lenses.

[0006] Another problem that the present invention aims to solve is to provide a display device capable of preventing deformation of each optical lens due to the reflow process.

[0007] The problems that the present invention aims to solve are not limited to those mentioned above. Problems not mentioned herein will be clearly understood by a person skilled in the art from the description below. means of solving the problem

[0008] A display device according to the technical concept of the present invention for achieving the above-mentioned problem includes a device substrate. A bank insulating film is located on the device substrate. The bank insulating film defines a light-emitting region. A light-emitting element is located on the light-emitting region. An encapsulation unit is located on the bank insulating film and the light-emitting element. A black matrix and an optical lens are located on the encapsulation unit. The black matrix overlaps with the bank insulating film. The optical lens overlaps with the light-emitting region. An optical insulating film is located between the encapsulation unit and the optical lens. The optical insulating film covers the black matrix. A touch electrode and a lens barrier are located on the optical insulating film. The touch electrode overlaps with the black matrix. The lens barrier surrounds the optical lens.

[0009] The lens barrier may include an insulating material.

[0010] The lens barrier can come into contact with the edge of the optical lens.

[0011] The lens barrier can extend along the edge of the optical lens.

[0012] The lens barrier can come into contact with the upper surface of the optical insulating film facing the device substrate.

[0013] The lens barrier may contain the same material as the optical insulating film.

[0014] A bridge electrode may be located between the black matrix and the optical insulating film. The bridge electrode may be electrically connected to the touch electrode.

[0015] The bridge electrode can come into contact with the upper surface of the black matrix toward the touch electrode.

[0016] The end of the touch electrode can be located on the lens barrier.

[0017] The thickness of the lens barrier can be greater than the thickness of the touch electrode.

[0018] A display device according to the technical concept of the present invention for achieving other problems to be solved as described above includes a device substrate. The device substrate includes light-emitting regions and non-light-emitting regions. The non-light-emitting regions are located between the light-emitting regions. Light-emitting elements are located on the light-emitting regions of the device substrate. An encapsulation unit is located on the light-emitting elements. The encapsulation unit extends onto the non-light-emitting regions of the device substrate. A black matrix is ​​located on the encapsulation unit. The black matrix overlaps with the non-light-emitting regions. An optical insulating film is located on the black matrix. The optical insulating film extends onto the light-emitting regions of the device substrate. Touch electrodes, optical lenses, and lens barriers are located on the optical insulating film. The touch electrodes overlap with the black matrix. The optical lenses overlap with the light-emitting regions. The lens barriers are located between the optical lenses.

[0019] Each optical lens can be surrounded by lens barriers. The plane of each lens barrier can have a shape different from the outline of each optical lens.

[0020] Each lens barrier can be located on the edge of one of the touch electrodes.

[0021] Lens barriers may contain the same material as touch electrodes.

[0022] Lens barriers can be spaced apart from optical lenses. Effects of the invention

[0023] A display device according to the technical concept of the present invention comprises a black matrix, an optical lens, a touch electrode, and a lens barrier located on an encapsulation unit covering a light-emitting element, wherein the optical lens, the touch electrode, and the lens barrier are located on an optical insulating film covering the black matrix, the touch electrode overlaps with the black matrix, and the optical lens overlapping with the light-emitting element may be surrounded by the lens barrier. Accordingly, deformation of the optical lens due to a reflow process can be prevented in the display device. Therefore, degradation of image quality due to the formation process of the optical lens can be prevented in the display device. Brief explanation of the drawing

[0024] FIGS. 1 and 2 are schematic drawings illustrating a display device according to an embodiment of the present invention. Figure 3 is an enlarged view of the K region of Figure 2. Figure 4 is a drawing showing a cross-section cut along the line I-I' of Figure 3. FIGS. 5 to 9 are drawings showing a display device according to another embodiment of the present invention. Specific details for implementing the invention

[0025] Detailed information regarding the above-mentioned objectives, technical configuration, and resulting effects of the present invention will be more clearly understood through the following detailed description with reference to the drawings illustrating embodiments of the present invention. Here, since the embodiments of the present invention are provided to ensure that the technical concept of the present invention is sufficiently conveyed to those skilled in the art, the present invention may be embodied in other forms so as not to be limited to the embodiments described below.

[0026] Additionally, parts indicated by the same reference number throughout the specification refer to the same components, and the length and thickness of layers or regions in the drawings may be exaggerated for convenience. Furthermore, where it is stated that a first component is "on" a second component, this includes not only the case where the first component is located on the upper side in direct contact with the second component, but also the case where a third component is located between the first component and the second component.

[0027] Here, the terms first, second, etc. are used to describe various components and to distinguish one component from another. However, within the scope of the technical concept of the present invention, the first component and the second component may be named arbitrarily for the convenience of those skilled in the art.

[0028] The terms used in the specification of the present invention are used merely to describe specific embodiments and are not intended to limit the invention. For example, a component expressed in the singular includes a plurality of components unless the context clearly implies only the singular. Furthermore, in the specification of the present invention, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0029] Additionally, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by those skilled in the art to which the present invention pertains. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in the specification of the present invention.

[0030] (Example)

[0031] FIGS. 1 and 2 are schematic drawings illustrating a display device according to an embodiment of the present invention. FIG. 3 is an enlarged view of the K region of FIG. 2. FIG. 4 is a cross-sectional view taken along the line I-I' of FIG. 3.

[0032] Referring to FIGS. 1 to 4, a display device according to an embodiment of the present invention may include a device substrate (100). The device substrate (100) may include an insulating material. For example, the device substrate (100) may include glass or plastic. The device substrate (100) may include a display area (AA) and a bezel area (BZ). The display area (AA) may be an area where an image provided to a user is generated. For example, a plurality of pixel areas (PA) may be located within the display area (AA).

[0033] Each pixel area (PA) may display a specific color. For example, a light-emitting element (130) and a pixel driving circuit electrically connected to the light-emitting element (130) may be located on each pixel area (PA). The light-emitting element (130) may emit light that displays a specific color. For example, the light-emitting element (130) may include a first electrode (131), a light-emitting layer (132), and a second electrode (132) stacked in order on the element substrate (100).

[0034] The first electrode (131) may include a conductive material. The first electrode (131) may include a material having a high reflectivity. For example, the first electrode (131) may include a metal such as aluminum (Al) and silver (Ag). The first electrode (131) may have a multilayer structure. For example, the first electrode (131) may have a structure in which a reflective electrode made of metal is positioned between transparent electrodes made of transparent conductive materials such as ITO and IZO.

[0035] The light-emitting layer (132) can generate light of brightness corresponding to the voltage difference between the first electrode (131) and the second electrode (133). For example, the light-emitting layer (132) may include an emission material layer (EML) containing a light-emitting material. The light-emitting material may include an organic material, an inorganic material, or a hybrid material. For example, a display device according to an embodiment of the present invention may be an organic light-emitting display device containing an organic light-emitting material.

[0036] The light-emitting layer (132) may have a multilayer structure. For example, the light-emitting layer (132) may further include at least one of a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). Accordingly, in a display device according to an embodiment of the present invention, the light-emitting efficiency of the light-emitting layer (132) may be improved.

[0037] The second electrode (133) may include a conductive material. The second electrode (133) may include a material different from the first electrode (131). The transmittance of the second electrode (133) may be greater than the transmittance of the first electrode (131). For example, the second electrode (133) may be a transparent electrode made of a transparent conductive material such as ITO and IZO. Accordingly, in a display device according to an embodiment of the present invention, light generated by the light-emitting layer (132) may be emitted to the outside through the second electrode (133).

[0038] Various signals may be applied to the pixel driving circuit of each pixel area (PA). For example, the pixel driving circuit of each pixel area (PA) may be electrically connected to one of the gate lines (GL) that apply a gate signal and one of the data lines (DL) that apply a data signal. The pixel driving circuit of each pixel area (PA) may supply a driving current corresponding to the data signal to the light-emitting element (130) of the corresponding pixel area (PA) for one frame according to the gate signal. For example, the pixel driving circuit of each pixel area (PA) may include a first thin-film transistor (T1), a second thin-film transistor (T2), and a storage capacitor (Cst).

[0039] The first thin-film transistor (T1) may include a first semiconductor pattern, a first gate electrode, a first source electrode, and a first drain electrode. The first thin-film transistor (T1) may transmit the data signal to the second thin-film transistor (T2) according to the gate signal. For example, the first thin-film transistor (T1) may be a switching thin-film transistor. The first gate electrode of the first thin-film transistor (T1) may be electrically connected to the gate line (GL), and the first source electrode of the first thin-film transistor (T2) may be electrically connected to the data line (DL).

[0040] The second thin-film transistor (T2) may include a second semiconductor pattern (121), a second gate electrode (123), a second source electrode (125), and a second drain electrode (127). The second thin-film transistor (T2) may generate the driving current corresponding to the data signal. For example, the second thin-film transistor (T2) may be a driving thin-film transistor. The second gate electrode (123) of the second thin-film transistor (T2) may be electrically connected to the first drain electrode of the first thin-film transistor (T1), and the second source electrode (125) of the second thin-film transistor (T2) may be electrically connected to a signal wire supplying a positive power supply voltage (VDD). The light-emitting element (130) may be electrically connected to the second thin-film transistor (T2). For example, the second drain electrode (127) of the second thin-film transistor (T2) can be electrically connected to the light-emitting element (130).

[0041] The second semiconductor pattern (121) may include a semiconductor material. For example, the second semiconductor pattern (121) may include an oxide semiconductor such as IGZO. The second semiconductor pattern (121) may include a source region, a channel region, and a drain region. The channel region may be located between the source region and the drain region. The source region and the drain region may have lower resistance than the channel region. For example, the source region and the drain region may include a conductive region of the oxide semiconductor. The channel region may be a non-conductive region of the oxide semiconductor.

[0042] The second gate electrode (123) may include a conductive material. For example, the second gate electrode (123) may include a metal such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second gate electrode (123) may be located on the second semiconductor pattern (121). For example, the second gate electrode (123) may overlap with the channel region of the second semiconductor pattern (121). The second gate electrode (123) may be insulated from the second semiconductor pattern (121). For example, the channel region of the second semiconductor pattern (121) may have an electrical conductivity corresponding to the voltage applied to the second gate electrode (123).

[0043] The second source electrode (125) may include a conductive material. For example, the second source electrode (125) may include a metal such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second source electrode (125) may include a material different from that of the second gate electrode (123). The second source electrode (125) may be located on a different layer from that of the second gate electrode (123). For example, the second source electrode (125) may be insulated from the second gate electrode (123). The second source electrode (125) may be electrically connected to the source region of the second semiconductor pattern (121).

[0044] The second drain electrode (127) may include a conductive material. For example, the second drain electrode (127) may include a metal such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second drain electrode (127) may include a material different from that of the second gate electrode (123). The second drain electrode (127) may be located on a different layer from that of the second gate electrode (123). For example, the second drain electrode (127) may be insulated from the second gate electrode (123). The second drain electrode (127) may be located on the same layer as the second source electrode (125). The second drain electrode (127) may include the same material as the second source electrode (125). For example, the second drain electrode (127) may be formed simultaneously with the second source electrode (125). The second drain electrode (127) may be insulated from the second source electrode (125). For example, the second drain electrode (127) may be electrically connected to the drain region of the second semiconductor pattern (121).

[0045] The first thin-film transistor (T1) can be formed simultaneously with the second thin-film transistor (T2). For example, the first semiconductor pattern of the first thin-film transistor (T1) may include the same material as the second semiconductor pattern (121) of the second thin-film transistor (T2), and the first gate electrode of the first thin-film transistor (T1) may include the same material as the second gate electrode (123) of the second thin-film transistor (T2). The first source electrode and the first drain electrode of the first thin-film transistor (T1) may be located on the same layer as the second source electrode (125) and the second drain electrode (127) of the second thin-film transistor (T2).

[0046] The storage capacitor (Cst) can maintain a signal applied to the second gate electrode (123) of the second thin-film transistor (T2) for one frame. For example, the storage capacitor (Cst) may be electrically connected between the second gate electrode (123) and the second drain electrode (127) of the second thin-film transistor (T2). The storage capacitor (Cst) may have a stacked structure of capacitor electrodes. The storage capacitor (Cst) may be formed using the formation process of the first thin-film transistor (T1) and the second thin-film transistor (T2). For example, the storage capacitor (Cst) may include a first capacitor electrode located on the same layer as the second gate electrode (123) and a second capacitor electrode located on the same layer as the second drain electrode (127).

[0047] A plurality of insulating films (111, 112, 113, 114, 115, 116) may be positioned on the above-described device substrate (100) to prevent unnecessary electrical connections within each pixel area (PA). For example, a device buffer film (111), a gate insulating film (112), an interlayer insulating film (113), a device protection film (114), an overcoat layer (115), and a bank insulating film (116) may be positioned on the above-described device substrate (100).

[0048] The device buffer film (111) may be located close to the device substrate (100). The device buffer film (111) can prevent contamination by the device substrate (100) during the formation process of the pixel driving circuit located within each pixel area (PA). For example, the upper surface of the device substrate (100) facing the pixel driving circuit of each pixel area (PA) may be covered by the device buffer film (111). The first thin-film transistor (T1) and the second thin-film transistor (T2) of each pixel area (PA) may be located on the device buffer film (111). The device buffer film (111) may include an insulating material. For example, the device buffer film (111) may include an inorganic insulating material such as silicon oxide (SiOx) and silicon nitride (SiNx). The device buffer film (111) may have a multilayer structure. For example, the above-mentioned device buffer film (111) may have a stacked structure of an inorganic film made of silicon nitride (SiNx) and an inorganic film made of silicon oxide (SiOx).

[0049] The gate insulating film (112) can insulate between the semiconductor pattern (121) and the gate electrode (123) of each thin-film transistor (T1, T2). For example, the second semiconductor pattern (121) of each pixel region (PA) can be located between the device buffer film (111) and the gate insulating film (112). The gate insulating film (112) can cover the first semiconductor pattern and the second semiconductor pattern (121) of each pixel region (PA). The first gate electrode and the second gate electrode (123) of each pixel region (PA) can be located on the gate insulating film (112). The gate insulating film (112) may include an insulating material. For example, the gate insulating film (112) may include an inorganic insulating material such as silicon oxide (SiOx).

[0050] The interlayer insulating film (113) may insulate the source electrode (125) and the drain electrode (127) of each thin-film transistor (T1, T2) from the gate electrode (123) of the corresponding thin-film transistor (T1, T2). For example, the second gate electrode (123) of the second thin-film transistor (T2) located within each pixel area (PA) may be located between the gate insulating film (112) and the interlayer insulating film (113). The second source electrode (125) and the second drain electrode (127) of the second thin-film transistor (T2) located within each pixel area (PA) may be located on the interlayer insulating film (113). The interlayer insulating film (113) may include an insulating material. For example, the interlayer insulating film (113) may include an inorganic insulating material such as silicon nitride (SiNx) and silicon oxide (SiOx). The above interlayer insulating film (113) may have a multilayer structure.

[0051] The above-mentioned device protective film (114) may be located on the pixel driving circuit of each pixel area (PA). The above-mentioned device protective film (114) may prevent damage to the pixel driving circuit located within each pixel area (PA) due to external shock and moisture. The above-mentioned device protective film (114) may extend along the surface of each pixel driving circuit facing the device substrate (100). For example, the second source electrode (125) and the second drain electrode (127) of each pixel driving circuit may be covered by the above-mentioned device protective film (114). The above-mentioned device protective film (114) may include an insulating material. For example, the above-mentioned device protective film (114) may include an inorganic insulating material such as silicon nitride (SiNx) and silicon oxide (SiOx).

[0052] The overcoat layer (115) may be positioned on the device protective film (114). The overcoat layer (115) may eliminate step heights caused by the pixel driving circuit of each pixel area (PA). For example, step heights caused by the first thin-film transistor (T1) and the second thin-film transistor (T2) of each pixel area (PA) may be eliminated by the overcoat layer (115). The upper surface of the overcoat layer (115) facing the device substrate (100) may be a flat plane. The overcoat layer (115) may include an insulating material. The overcoat layer (115) may include a material different from that of the device protective film (114). For example, the overcoat layer (115) may include an organic insulating material.

[0053] The light-emitting element (130) of each pixel area (PA) may be located on the overcoat layer (115). For example, the first electrode (131), the light-emitting layer (132), and the second electrode (132) of each pixel area (PA) may be stacked in order on the overcoat layer (115) located within the corresponding pixel area (PA). The first electrode (131) of each pixel area (PA) may be in direct contact with the upper surface of the overcoat layer (115). Accordingly, in a display device according to an embodiment of the present invention, a variation in brightness according to the position of light generation emitted from each light-emitting element (130) can be prevented.

[0054] The first electrode (131) of each pixel area (PA) may be electrically connected to the second drain electrode (127) of the corresponding pixel area (PA). For example, the element protective film (114) and the overcoat layer (115) include electrode contact holes that partially expose the second drain electrode (127) of each pixel area (PA), and the first electrode (131) of each light-emitting element (130) may come into direct contact with the second drain electrode (127) of the corresponding pixel area (PA) through one of the electrode contact holes.

[0055] The bank insulating film (116) may be positioned on the overcoat layer (115). The bank insulating film (116) may define light-emitting regions (BEA, GEA, REA) within each pixel area (PA). For example, the bank insulating film (116) may cover the edge of the first electrode (131) located within each pixel area (PA). The light-emitting layer (132) and the second electrode (133) of each pixel area (PA) may be laminated on a portion of the corresponding first electrode (131) exposed by the bank insulating film (116). For example, the light-emitting element (130) of each pixel area (PA) may be positioned on the light-emitting regions (BEA, GEA, REA) defined within the corresponding pixel area (PA) by the bank insulating film (116). The first electrode (131) of each pixel area (PA) may be insulated from the first electrode (131) of an adjacent pixel area (PA) by the bank insulating film (116). The area where the bank insulating film (116) is located may be a non-luminous area (NA) where light is not emitted. For example, the non-luminous area (NA) may be located between the luminous areas (BEA, GEA, REA).

[0056] The light emitted from the light-emitting element (130) of each pixel area (PA) may exhibit a different color from the light emitted from the light-emitting element (130) of an adjacent pixel area (PA). For example, the light-emitting areas (BEA, GEA, REA) defined within each pixel area (PA) by the bank insulating film (116) may be one of a blue light-emitting area (BEA) that emits blue light, a green light-emitting area (GEA) that emits green light, and a red light-emitting area (REA) that emits red light. The size of each light-emitting area (BEA, GEA, REA) may differ from the size of an adjacent light-emitting area (BEA, GEA, REA).

[0057] The pixel regions (PA) may be positioned side by side in a first direction and a second direction perpendicular to the first direction. For example, in a display device according to an embodiment of the present invention, a first row in which the pixel regions (PA) including the red light-emitting region (REA) and the pixel regions (PA) including the blue light-emitting region (BEA) are positioned alternately, and a second row in which the pixel regions (PA) including the green light-emitting region (GEA) are positioned may be repeated in a column direction. Light emitted from the light-emitting region (BEA, GEA, REA) of each pixel region (PA) may exhibit a different color from the light emitted from the light-emitting region (BEA, GEA, REA) of a pixel region (PA) adjacent in the row direction and the light emitted from the light-emitting region (BEA, GEA, REA) of a pixel region (PA) adjacent in the column direction. The row direction and the column direction may be different from the first direction and the second direction. For example, a display device according to an embodiment of the present invention may have a pentile structure in which the red light-emitting regions (REA) and the blue light-emitting regions (BEA) of the first row are arranged alternately with the green light-emitting regions (GEA) of the second row.

[0058] The light-emitting layer (132) of each pixel area (PA) may be spaced apart from the light-emitting layer (132) of an adjacent pixel area (PA). The light-emitting layer (132) of each pixel area (PA) may be formed individually. For example, the light-emitting layer (132) of each pixel area (PA) may be formed as a fine metal mask (FMM).

[0059] The voltage applied to the second electrode (133) of each pixel area (PA) may be the same as the voltage applied to the second electrode (133) of an adjacent pixel area (PA). For example, a negative power supply voltage (VSS) may be applied to the second electrode (133) of each pixel area (PA). The second electrode (133) of each pixel area (PA) may be electrically connected to the second electrode (133) of an adjacent pixel area (PA). The second electrode (133) of each pixel area (PA) may contain the same material as the second electrode (133) of an adjacent pixel area (PA). For example, the second electrode (133) of each pixel area (PA) may be formed simultaneously with the second electrode (133) of an adjacent pixel area (PA). The second electrode (133) of each pixel area (PA) may be in direct contact with the second electrode (133) of an adjacent pixel area (PA). For example, the second electrode (133) of each pixel area (PA) may extend onto the bank insulating film (116). The bank insulating film (116) may be covered by the second electrode (133). Accordingly, in a display device according to an embodiment of the present invention, the process of forming the second electrode (133) within each pixel area (PA) may be simplified. Additionally, in a display device according to an embodiment of the present invention, the brightness of light emitted from the light-emitting element (130) of the corresponding pixel area (PA) may be controlled by the data signal applied to the pixel driving circuit of each pixel area (PA).

[0060] An encapsulation unit (200) may be positioned on the light-emitting element (130) of each pixel area (PA). The encapsulation unit (200) can prevent damage to the light-emitting elements (130) caused by external shock and moisture. The encapsulation unit (200) may have a multilayer structure. For example, the encapsulation unit (200) may include a first encapsulation layer (210), a second encapsulation layer (220), and a third encapsulation layer (230) stacked in order. The first encapsulation layer (210), the second encapsulation layer (220), and the third encapsulation layer (230) may include an insulating material. The second encapsulation layer (220) may include a material different from the first encapsulation layer (210) and the third encapsulation layer (230). For example, the first encapsulation layer (210) and the third encapsulation layer (230) may include inorganic insulating materials such as silicon nitride (SiNx) and silicon oxide (SiOx), and the second encapsulation layer (220) may include an organic insulating material. Accordingly, in a display device according to an embodiment of the present invention, damage to the light-emitting elements (130) caused by external shock and moisture can be effectively prevented.

[0061] The above-described encapsulation unit (200) can completely cover the light-emitting elements (130). For example, the display area (AA) of the element substrate (100) can be completely covered by the encapsulation unit (200). The bezel area (BZ) can be located outside the display area (AA). For example, the display area (AA) can be surrounded by the bezel area (BZ). At least one dam (106) can be located on the bezel area (BZ). The dam (106) can block the flow of the second encapsulation layer (220) containing an organic insulating material. For example, the second encapsulation layer (220) can be formed within an area defined by the dam (106).

[0062] Display pads (104) may be located on the bezel area (BZ). Various signals applied to the pixel driving circuit of each pixel area (PA) may be provided through the display pads (104). The display pads (104) may be located outside the encapsulation unit (200). For example, the dam (106) may be located between the display area (AA) and the display pads (104). Accordingly, in the display device according to the embodiment of the present invention, it is prevented that some of the display pads (104) are unintentionally obscured by the second encapsulation layer (220). Therefore, in the display device according to the embodiment of the present invention, distortion of the signal transmitted through the display pads (104) may be prevented.

[0063] A touch sensor (Cm) may be positioned on the above-mentioned bag unit (200). The touch sensor (Cm) may detect a touch by a user and / or a tool. For example, the touch sensor (Cm) may detect the presence or absence of a touch and the location of the touch through a change in mutual capacitance. The touch sensor (Cm) may include first touch lines (310) and second touch lines (320).

[0064] A touch driving signal may be applied to the first touch lines (310). For example, the first touch lines (310) may be touch driving lines. Each first touch line (310) may include first touch electrodes (311) and first bridge electrodes (312). The first touch electrodes (311) may be positioned side by side on the encapsulation unit (200). The first bridge electrodes (312) may electrically connect the first touch electrodes (311). Each first bridge electrode (312) may extend in a third direction. For example, each first touch electrode (311) may be electrically connected to a first touch electrode (311) adjacent in the third direction by one of the first bridge electrodes (312).

[0065] The first touch electrodes (311) may include a conductive material. The first touch electrodes (311) may include a material having relatively low resistance. For example, the first touch electrodes (311) may include metals such as titanium (Ti), copper (Cu), molybdenum (Mo), and tantalum (Ta). Each first touch electrode (311) may have a multilayer structure. For example, the first touch electrodes (311) may have a triple layer structure such as Ti / Al / Ti, MoTi / Cu / MoTi, and Ti / Al / Mo.

[0066] The first bridge electrodes (312) may include a conductive material. The first bridge electrodes (312) may include a material having relatively low resistance. For example, the first bridge electrodes (312) may include metals such as titanium (Ti), copper (Cu), molybdenum (Mo), and tantalum (Ta). The first bridge electrodes (312) may include the same material as the first touch electrodes (311). Each first bridge electrode (312) may have a multilayer structure. For example, the first bridge electrodes (312) may have a triple layer structure such as Ti / Al / Ti, MoTi / Cu / MoTi, and Ti / Al / Mo. The first bridge electrodes (312) may have the same structure as the first touch electrodes (311). The first bridge electrodes (312) may be located on the same layer as the first touch electrodes (311). For example, each first bridge electrode (312) may be in direct contact with the corresponding first touch electrodes (311).

[0067] Each second touch line (320) may include second touch electrodes (321) and second bridge electrodes (322). The second touch electrodes (321) may be positioned side by side on the encapsulation unit (200). The second touch electrodes (321) may be positioned on the same layer as the first touch electrodes (311). The second touch electrodes (321) may be insulated from the first touch electrodes (311). For example, the second touch electrodes (321) may be positioned between the first touch electrodes (311). The second touch electrodes (321) may have the same shape as the first touch electrodes (311). For example, the first touch electrodes (311) and the second touch electrodes (312) may be arranged alternately on the encapsulation unit (200). Accordingly, in a display device according to an embodiment of the present invention, the charge charged by the touch driving signal may be discharged through the second touch lines (320). For example, the second touch lines (320) may be touch sensing lines. Accordingly, a display device according to an embodiment of the present invention can detect whether a user and / or tool touch and the location of the touch using the touch sensor (Cm).

[0068] The second touch electrodes (321) may include a conductive material. The second touch electrodes (321) may include a material having relatively low resistance. For example, the second touch electrodes (321) may include metals such as titanium (Ti), copper (Cu), molybdenum (Mo), and tantalum (Ta). The second touch electrodes (321) may include the same material as the first touch electrodes (311). Each second touch electrode (321) may have a multilayer structure. For example, the second touch electrodes (321) may have a triple layer structure such as Ti / Al / Ti, MoTi / Cu / MoTi, and Ti / Al / Mo. Each second touch electrode (321) may have the same structure as each first touch electrode (311).

[0069] The second touch electrodes (321) may be located on the same layer as the first touch electrodes (311) and the first bridge electrodes (312). The second touch electrodes (321) may be insulated from the first bridge electrodes (312). The second touch electrodes (321) may be spaced apart from the first bridge electrodes (312). For example, the first bridge electrodes (312) may cross between the second touch electrodes (321).

[0070] The second bridge electrodes (322) can electrically connect the second touch electrodes (321). Each second bridge electrode (322) can extend in a fourth direction. For example, each second touch electrode (321) can be connected to an adjacent second touch electrode (321) in the fourth direction by one of the second bridge electrodes (322). The fourth direction may be different from the third direction. For example, the fourth direction may be perpendicular to the third direction. The second bridge electrodes (322) can cross between the first touch electrodes (311). For example, each second bridge electrode (322) may cross one of the first bridge electrodes (312). The second bridge electrodes (322) may be insulated from the first bridge electrodes (312). The second bridge electrodes (321) may be located on a different layer from the first bridge electrodes (312). For example, the touch sensor (Cm) includes an optical insulating film (350) located on the second bridge electrodes (322), and the first touch electrodes (311), the first bridge electrodes (312), and the second touch electrodes (321) may be located on the optical insulating film (350).

[0071] The optical insulating film (350) may include an insulating material. The optical insulating film (350) may include a material having high transmittance. For example, the optical insulating film (350) may include an organic insulating material. The step difference caused by the second bridge electrodes (322) can be eliminated by the optical insulating film (350). For example, the upper surface of the optical insulating film (350) facing the device substrate (100) may be a flat plane. The first touch electrodes (311) and the second touch electrodes (321) may come into direct contact with the upper surface of the optical insulating film (350). Accordingly, in a display device according to an embodiment of the present invention, distortion of the touch of a user and / or tool due to positional deviation of the first touch electrodes (311) and the second touch electrodes (321) can be prevented. The optical insulating film (350) may include touch contact holes that partially expose each second bridge electrode (322). Each second touch electrode (321) may be connected to the corresponding second bridge electrode (322) through one of the touch contact holes.

[0072] The second bridge electrodes (322) may include a conductive material. The second bridge electrodes (322) may include a material having relatively low resistance. For example, the second bridge electrodes (322) may include metals such as titanium (Ti), copper (Cu), molybdenum (Mo), and tantalum (Ta). Each second bridge electrode (322) may have a multilayer structure. For example, the second bridge electrodes (322) may have a triple layer structure such as Ti / Al / Ti, MoTi / Cu / MoTi, and Ti / Al / Mo.

[0073] The first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322) of the touch sensor (Cm) may be located within the display area (AA) of the device substrate (110). The light-emitting area (BEA, GEA, REA) of each pixel area (PA) may be located between the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322b). The first touch lines (310) and the second touch lines (320) may be located outside the light-emitting elements (130). For example, the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322) may be located on the non-luminous region (NA) of the device substrate (100). The first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322) may overlap with the bank insulating film (114). The plane of each first touch electrode (311) and the plane of each second touch electrode (321) may have a mesh shape including openings that overlap with the luminous region (BEA, GEA, REA) of each pixel region (PA). Accordingly, in a display device according to an embodiment of the present invention, the accuracy of touch detection using the touch sensor (Cm) is improved, and the reduction in light extraction efficiency by the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322) of the touch sensor (Cm) can be minimized.

[0074] The first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the second bridge electrodes (322) can limit the direction of light emitted from each light-emitting region (BEA, GEA, REA). For example, light traveling from each light-emitting region (BEA, GEA, REA) toward an adjacent non-light-emitting region (NA) can be blocked by the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), or the second bridge electrodes (322). Accordingly, color mixing can be prevented in the display device according to an embodiment of the present invention. Additionally, the viewing angle can be limited in the display device according to an embodiment of the present invention.

[0075] Touch pads (304) may be located on the bezel area (BZ) of the device substrate (100). The first touch lines (310) and the second touch lines (320) may be electrically connected to the touch pads (304) through touch routing lines (330). For example, the touch driving signal may be applied to the first touch line (310) through one of the touch pads (304). The touch pads (304) may be located side by side with the display pads (104). For example, the dam (106) may be located between the touch pads (304) and the display area (AA). Accordingly, in the display device according to an embodiment of the present invention, it is prevented that some of the touch pads (304) are unintentionally obscured by the second encapsulation layer (220). Accordingly, in the display device according to the embodiment of the present invention, distortion of the signal transmitted through the touch pads (304) can be prevented.

[0076] A black matrix (400) may be positioned between the above-mentioned encapsulation unit (200) and the above-mentioned optical insulating film (350). The black matrix (400) may block light. For example, the black matrix (400) may overlap with the non-emissive region (NA) of the device substrate (100). The black matrix (400) may be positioned between the emissive regions (BEA, GEA, REA). For example, the plane of the black matrix (400) may be shaped to surround the emissive regions (BEA, GEA, REA). Accordingly, in a display device according to an embodiment of the present invention, light emitted from each light-emitting region (BEA, GEA, REA) toward an adjacent non-light-emitting region (NA) is blocked by the black matrix (400), and light traveling toward an adjacent non-light-emitting region (NA) within the optical insulating film (350) can be blocked by the first touch electrodes (311) and the second touch electrodes (321). Therefore, in a display device according to an embodiment of the present invention, color mixing can be effectively prevented.

[0077] Each second bridge electrode (322) may overlap with the black matrix (400). For example, each second bridge electrode (322) may be located between the black matrix (400) and the optical insulating film (350). Each second bridge electrode (322) may be in direct contact with the upper surface of the black matrix (400) facing the device substrate (100). Each second bridge electrode (322) may have a size smaller than the black matrix (400). For example, the lower surface of each second bridge (322) facing the device substrate (100) may be completely obscured by the black matrix (400). Accordingly, in a display device according to an embodiment of the present invention, reflection of light emitted from each light-emitting region (BEA, GEA, REA) by the second bridge electrodes (322) may be prevented. Accordingly, in the display device according to the embodiment of the present invention, degradation of image quality due to light reflected by the second bridge electrodes (322) can be prevented.

[0078] A lens assembly (500) may be positioned on the touch sensor (Cm). The lens assembly (500) may include a plurality of optical lenses (510). The optical lenses (510) may be positioned in the path of light emitted from the light-emitting regions (BEA, GEA, REA). For example, each optical lens (510) may overlap with one of the light-emitting regions (BEA, GEA, REA). Each optical lens (510) may collect light emitted from the corresponding light-emitting region (BEA, GEA, REA). For example, the lower surface of each optical lens (510) facing the device substrate (100) may be a flat plane, and the surface of each optical lens (510) facing the device substrate (100) may be semicircular. The optical lenses (510) may be positioned side by side on the optical insulating film (350). For example, the lower surface of each optical lens (510) may be in direct contact with the optical insulating film (350). The planar shape of the lower surface of each optical lens (510) may be circular. Accordingly, in a display device according to an embodiment of the present invention, the frontal brightness of each pixel area (PA) may be improved. The optical lenses (510) may be in direct contact with the upper surface of the optical insulating film (350). Therefore, in a display device according to an embodiment of the present invention, diffraction deviations due to differences in the position of light incident on each optical lens (510) may be prevented.

[0079] The lens assembly (500) may include a lens protective film (520) positioned on the optical lenses (510). Each optical lens (510) may be covered by the lens protective film (520). For example, a semicircular surface of each optical lens (510) may be in direct contact with the lens protective film (520). The lens protective film (520) may include an insulating material. For example, the lens protective film (520) may include an organic insulating material. Steps caused by the optical lenses (510) may be eliminated by the lens protective film (520). For example, the upper surface of the lens protective film (520) facing the device substrate (100) may be a flat plane. Accordingly, in a display device according to an embodiment of the present invention, a variation in brightness according to the emission position of light emitted from each pixel area (PA) can be prevented. The refractive index of the lens protective film (520) may be smaller than the refractive index of each optical lens (510). Accordingly, in a display device according to an embodiment of the present invention, light passing through each optical lens (510) may be prevented from being reflected toward the device substrate (100) due to the difference in refractive index between the optical lens (510) and the lens protective film (520).

[0080] Lens barriers (350b) may be positioned between the optical lenses (510). Each optical lens (510) may be surrounded by one of the lens barriers (350b). For example, each lens barrier (350b) may extend along the edge of one of the optical lenses (510). Each optical lens (510) may be formed within an area defined by the corresponding lens barrier (350b). Accordingly, in a display device according to an embodiment of the present invention, deformation of each optical lens (510) due to the forming process may be prevented. For example, in a display device according to an embodiment of the present invention, contact between adjacent optical lenses (510) during a reflow process may be prevented by the lens barriers (350b). Therefore, in a display device according to an embodiment of the present invention, degradation of image quality due to the forming process of the optical lenses (510) may be prevented.

[0081] The edge of each optical lens (510) may come into direct contact with the corresponding lens barrier (350b). For example, the plane of each lens barrier (350b) may have the same shape as the outline of the corresponding optical lens (510). Accordingly, in a display device according to an embodiment of the present invention, the planar shape of each optical lens (510) may be defined by the corresponding lens barrier (350b). Thus, in a display device according to an embodiment of the present invention, deformation of each optical lens (510) during the forming process can be effectively prevented by the lens barriers (350b).

[0082] The lens barriers (350b) may include an insulating material. The lens barriers (350b) may be located between the optical lenses (510), the first touch electrodes (311), and the second touch electrodes (321). For example, the lens barriers (350b) may be in direct contact with the upper surface of the optical insulating film (350). The lens barriers (350b) may include the same material as the optical insulating film (350). The process of forming the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the optical lenses (510) may be performed after the lens barriers (350b) are formed. For example, the process of forming the lens barriers (350b) may include a process of recessing a portion of the optical insulating film (350) that overlaps with the first touch electrodes (311), the first bridge electrodes (312), the second touch electrodes (321), and the optical lenses (510) formed by a subsequent process. Accordingly, in a display device according to an embodiment of the present invention, the process of forming the lens barriers (350b) can be simplified.

[0083] Each lens barrier (350b) may overlap with the edge of the black matrix (400). For example, the lens barriers (350b) may be located on the non-emissive region (NA) of the device substrate (100). The size of each optical lens (510) may be larger than the size of the corresponding emissive region (BEA, GEA, REA). For example, the edge of each optical lens (510) may overlap with the black matrix (400). Each lens barrier (350b) may be located on the upper surface of the black matrix (400). For example, the space between the optical lenses (510) may be smaller than the non-emissive region (NA). Accordingly, the light extraction efficiency in the display device according to an embodiment of the present invention may be improved.

[0084] The thickness of each lens barrier (350b) may be greater than the thickness of each touch electrode (311, 321). Accordingly, in a display device according to an embodiment of the present invention, it may be prevented that a portion of the semicircular surface of each optical lens (510) is covered by the first touch electrodes (311), the first bridge electrodes (312), or the second touch electrodes (321). Therefore, in a display device according to an embodiment of the present invention, a decrease in light extraction efficiency by the touch sensor (Cm) may be prevented.

[0085] Consequently, a display device according to an embodiment of the present invention comprises a black matrix (400), optical lenses (510), touch electrodes (311, 321), and lens barriers (350b) located on the encapsulation unit (200) covering the light-emitting elements (130), wherein the optical lenses (510), touch electrodes (311, 321), and lens barriers (350b) are located on the optical insulating film (350) covering the black matrix (400), the black matrix (400) and the touch electrodes (311, 321) overlap with the non-light-emitting region (NA) of the element substrate (100), and the optical lenses (510) that overlap with the light-emitting elements (130) may each be surrounded by the lens barriers (350b). Accordingly, in the display device, contact between each optical lens (510) formed by the forming process and an adjacent optical lens (510) can be prevented. Therefore, in the display device, degradation of image quality caused by the forming process of the optical lenses (510) can be prevented.

[0086] A display device according to an embodiment of the present invention is described such that the black matrix (400) has the same area as the non-luminous region (NA). However, in a display device according to another embodiment of the present invention, the black matrix (400) may have a smaller area than the non-luminous region (NA). That is, in a display device according to another embodiment of the present invention, it may be formed narrower than the non-luminous region (NA) between the luminous regions (BEA, GEA, REA). Accordingly, in a display device according to another embodiment of the present invention, the formation of the black matrix (400) on the luminous regions (BEA, GEA, REA) due to misalignment or process error can be prevented. Therefore, in a display device according to another embodiment of the present invention, light loss caused by the black matrix (400) can be prevented.

[0087] A display device according to an embodiment of the present invention is described as forming the optical lenses (510) through a reflow process. However, in a display device according to another embodiment of the present invention, the optical lenses (510) may be formed in various ways. For example, in a display device according to another embodiment of the present invention, the optical lenses (510) may be formed within an area defined by each lens barrier (350b) in an ink-jet manner. Accordingly, in a display device according to another embodiment of the present invention, the flow of the material applied for forming each optical lens (510) may be blocked by the lens barriers (350b). That is, in a display device according to another embodiment of the present invention, the optical lenses (510) having the same shape may be formed in various ways. Therefore, in a display device according to another embodiment of the present invention, the degree of freedom regarding the formation process of the optical lenses (510) may be improved.

[0088] In a display device according to another embodiment of the present invention, the lens barriers (350b) may be spaced apart from the optical lenses (510). For example, as shown in FIG. 5, in a display device according to another embodiment of the present invention, some ends of the touch electrodes (311, 321) may be located on an adjacent lens barrier (350b). Accordingly, in a display device according to another embodiment of the present invention, the formation area of ​​each optical lens (510) may be set in various ways.

[0089] In a display device according to an embodiment of the present invention, the touch electrodes (311, 321) are described as being located between the lens barriers (350b). However, as illustrated in FIG. 6, in a display device according to another embodiment of the present invention, the end of each touch electrode (311, 321) may be located on an adjacent lens barrier (350b). Accordingly, in a display device according to another embodiment of the present invention, the area of ​​each touch electrode (311, 321) may be maximized. Thus, in a display device according to another embodiment of the present invention, deformation of the optical lenses (510) is prevented, and the accuracy of touch detection by a user and / or tool may be improved.

[0090] A display device according to an embodiment of the present invention is described such that the lens barriers (350b) are in direct contact with the optical insulating film (350). However, in a display device according to another embodiment of the present invention, the lens barriers (350b) may be formed of a material different from that of the optical insulating film (350). For example, as shown in FIG. 7, in a display device according to another embodiment of the present invention, each lens barrier (600b) may be located on the edge of one of the touch electrodes (311, 321). The lens barriers (600b) may be formed of an inorganic insulating material or an organic insulating material. The end of each touch electrode (311, 321) may be located between the optical insulating film (350) and one of the lens barriers (600b). Accordingly, in a display device according to another embodiment of the present invention, each optical lens (510) may come into contact with the ends of adjacent touch electrodes (311, 321). That is, in a display device according to another embodiment of the present invention, the flow of each optical lens (510) by a reflow process may be blocked by the ends of the touch electrodes (311, 321) and the lens barriers (600b). Therefore, in a display device according to another embodiment of the present invention, the degree of freedom regarding the position of the lens barriers (600b) may be improved.

[0091] A display device according to an embodiment of the present invention is described such that the lens barriers (350b) comprise an insulating material. However, in a display device according to another embodiment of the present invention, the lens barriers (350b) may be formed of metal. For example, as shown in FIG. 8, in a display device according to another embodiment of the present invention, each lens barrier (300b) is positioned on the edge of one of the touch electrodes (311, 321), and the lens barriers (300b) may be formed using the forming process of the touch electrodes (311, 321). For example, the lens barriers (300b) may comprise the same material as the touch electrodes (311, 321). Each lens barrier (300b) may come into direct contact with one of the touch electrodes (311, 321). Accordingly, in a display device according to another embodiment of the present invention, the degree of freedom regarding the formation process of the lens barriers (600b) can be improved.

[0092] A display device according to an embodiment of the present invention is described as having a planar shape of the lower surface of each optical lens (510) that is circular. However, in a display device according to another embodiment of the present invention, the planar shape of the area defined by each lens barrier (350b) may have a polygonal shape. For example, in a display device according to another embodiment of the present invention, the optical lenses (510) are formed within the area defined by the lens barriers (350b), and the planar shape of the lower surface of each optical lens (510) may be pentagonal or hexagonal. The edge of each optical lens (510) may come into contact with the side of the corresponding lens barrier (350b). Accordingly, in a display device according to another embodiment of the present invention, the degree of freedom regarding the shape of the lower surface of each optical lens (510) may be improved.

[0093] A display device according to an embodiment of the present invention is described such that each lens barrier (350b) extends along the edge of the corresponding optical lens (510). However, in a display device according to another embodiment of the present invention, the plane of each lens barrier (350b) may have a shape different from the outline of each optical lens (510). For example, in a display device according to another embodiment of the present invention, the plane of each lens barrier (350b) may be a polygon such as a square, a pentagon, or a hexagon. As illustrated in FIG. 9, in a display device according to another embodiment of the present invention, the plane shape of the lower surface of each optical lens (510) may be a circular shape, and the plane of each lens barrier (350b) may be a rectangular shape surrounding the corresponding light-emitting area (BEA, GEA, REA). The optical lens (510) of each light-emitting area (BEA, GEA, REA) may be a circular shape inscribed within the corresponding lens barrier (350b). The sides of each first touch electrode (311) and each second touch electrode (321) can come into contact with one of the lens barriers (350b). Accordingly, in a display device according to another embodiment of the present invention, the degree of freedom regarding the planar shape of the lens barriers (350b) can be improved. Explanation of the symbols

[0094] 100: Device substrate 130: Light-emitting element 200: Encapsulation unit 311: First touch electrode 321: Second touch electrode 350: Optical insulating film 350b: Lens Barrier 400: Black Matrix 510: Optical lens

Claims

Claim 1 A display device comprising: a bank insulating film located on a device substrate and defining a light-emitting region; a light-emitting element located on the light-emitting region of the device substrate; an encapsulation unit located on the bank insulating film and the light-emitting element; a black matrix located on the encapsulation unit and overlapping with the bank insulating film; an optical lens located on the encapsulation unit and overlapping with the light-emitting region; an optical insulating film located between the encapsulation unit and the optical lens and covering the black matrix; a touch electrode located on the optical insulating film and overlapping with the black matrix; and a lens barrier located on the optical insulating film and surrounding the optical lens, wherein the lens barrier has a thickness greater than that of the touch electrode, so that at least a portion of the touch electrode is exposed by the optical lens and the lens barrier. Claim 2 In claim 1, the lens barrier is a display device comprising an insulating material. Claim 3 In claim 1, the lens barrier is a display device in contact with the edge of the optical lens. Claim 4 In claim 3, the lens barrier is a display device that extends along the edge of the optical lens. Claim 5 In claim 1, the lens barrier is a display device in contact with the upper surface of the optical insulating film facing the element substrate. Claim 6 In claim 5, the lens barrier comprises the same material as the optical insulating film in the display device. Claim 7 A display device according to claim 1, further comprising a bridge electrode located between the black matrix and the optical insulating film and electrically connected to the touch electrode. Claim 8 In claim 7, the bridge electrode is a display device in contact with the upper surface of the black matrix facing the touch electrode. Claim 9 In claim 1, the end of the touch electrode is located on the lens barrier in a display device. Claim 10 A display device according to claim 1, wherein the thickness of the lens barrier is greater than the thickness of the touch electrode. Claim 11 A display device comprising: a device substrate including light-emitting regions and non-light-emitting regions located between the light-emitting regions; light-emitting elements located on the light-emitting regions of the device substrate; an encapsulation unit located on the light-emitting elements and extending onto the non-light-emitting regions of the device substrate; a black matrix located on the encapsulation unit and overlapping with the non-light-emitting regions; an optical insulating film located on the black matrix and extending onto the light-emitting regions of the device substrate; touch electrodes located on the optical insulating film and overlapping with the black matrix; optical lenses located on the optical insulating film and overlapping with the light-emitting regions; and lens barriers located between the optical lenses on the optical insulating film, wherein each lens barrier has a thickness greater than that of each touch electrode, so that at least a portion of each touch electrode is exposed by the optical lenses and the lens barriers. Claim 12 A display device according to claim 11, wherein each optical lens is surrounded by the lens barriers, and the plane of each lens barrier has a shape different from the outline of the corresponding optical lens. Claim 13 In claim 11, each lens barrier is a display device located on the edge of one of the touch electrodes. Claim 14 In claim 13, the lens barriers comprise the same material as the touch electrodes in a display device. Claim 15 In claim 13, the lens barriers are a display device spaced apart from the optical lenses.

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