Retaining device having patterns comprising at least one continuous portion provided with retaining elements

Abstract

The invention relates to a retaining device (301) comprising a base (302) having two longitudinal end edges (309a, 309b) extending in a first direction (X), two transverse end edges (310a, 310b) extending in a direction which is secant to the first direction (X), and at least one retaining pattern (M) which has at least one retaining zone (307a, 307b) provided with retaining elements (305) and is delimited by two opposite longitudinal edges (312a, 312b) extending in the first direction (X), the retaining zone (307a, 307b) of the retaining pattern (M) comprising at least one continuous portion (307a) which extends continuously from the first transverse end edge (310a) to the second transverse end edge (310b) in a longitudinal direction (A), the continuous portion (307a) having a width which is greater than the distance between two adjacent retaining elements (305).

Description

Description Title of the invention: Retaining device comprising motifs including at least one continuous portion provided with retaining elements Technical Field

[0001] This presentation relates to a self-gripping type restraint device comprising restraint elements such as hooks, a molding strip for making such a restraint device, a method for preparing such a molding strip and a method for manufacturing a restraint device. Previous technique

[0002] Retaining devices, for example with hooks, are used particularly in the field of hygiene and cooperate with a counterpart with loops forming an application area of ​​the retaining device.

[0003] Examples of restraint devices with restraint elements such as hooks, and methods for making these restraint devices, are known from documents WO2017187096, WO2021116613 and WO2021116612.

[0004] The restraint devices comprise a base having at least one first zone provided with restraint elements and at least one second zone without restraint elements. The restraint elements extend from a first upper face of the base into the first zone and each comprises a rod which may be surmounted by a head.

[0005] There is a classic aim to reduce the amount of material used to manufacture these restraint devices in order to reduce environmental impact and lower manufacturing costs.

[0006] With the known restraint systems, it is sometimes difficult for the user to easily distinguish the area equipped with restraint elements from the area without restraint elements, and therefore to position themselves correctly on the counterpart or on a counterpart that is difficult for the user to identify, for example, a counterpart with loops or the outer layer of the diaper (or "backsheet"). These restraint devices are also difficult to grasp and cause discomfort for the user at the ends of the base, which are sometimes sharp and / or abrasive.

[0007] Furthermore, during the manufacturing process of restraint devices, it is necessary to cut the tapes to obtain separate restraint components. However, this cutting is not always easy to perform, and the restraint elements are often damaged during this cutting operation.

[0008] There is also a need to improve the flexibility of restraint systems, for example so that they adapt better to the user's body shape. Description of the invention

[0009] The present presentation aims to address, at least partially, the issues mentioned above.

[0010] According to a first aspect of the invention, the present description relates to a retaining device comprising a base having at least a first zone provided with retaining elements and at least a second zone without retaining elements. The base extends in a first direction and in a second direction, perpendicular to the first direction, and has a lower face, a first upper face provided with retaining elements in the first zone, and a second upper face without retaining elements in the second zone. The retaining elements extend from the first upper face in the first zone in a third direction perpendicular to the first and second directions, and each comprises a rod. The base has a first thickness E1 measured in the third direction in the first zone and a second thickness E2 measured in the third direction in the second zone.The first thickness El is less than 360 pm or less than or equal to 300 pm, in particular less than or equal to 120. pm, in particular less than or equal to 100 pm and / or the second thickness E2 being less than or equal to 200 pm, a ratio RI =(E1-E2) / E1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0011] The invention thus provides restraint devices comprising less material, thereby reducing environmental impact and manufacturing costs.

[0012] With such a retention device, the retention and / or gripping function is more concentrated in the area where it is needed. The retention elements form visual cues that improve the discernibility of the retention pattern. Furthermore, gripping is facilitated, and use by new users, such as new parents changing a newborn's diaper, is made easier by better identification of the gripping area (or retention zone). Applications incorporating such retention devices are easier and simpler to use. Moreover, such retention devices use a reduced amount of material, localizing it to the areas where the retention function is required, or, in other words, minimizing material in areas not used for retention.

[0013] Furthermore, the retainers have improved flex and / or flexibility capabilities in the first and / or second direction to better position themselves for cooperation with a counterpart, such as a looped counterpart, particularly for absorbent material applications. Winding the retainers into a roll is also facilitated, especially when winding them into a slit coil.

[0014] The invention also provides retention devices that are less aggressive in areas lacking retention elements, for example, at one or more ends of the base. In particular, the retention devices are less aggressive by reducing or eliminating the appearance of marks. Redness and / or irritation may occur if the base comes into contact with the skin, for example, with the skin of adults, children, and / or infants. The retaining devices are particularly less abrasive to the touch after a cut has been made in the second area, which is free of a retaining element.

[0015] Restraint systems configured in this way also allow for the creation of a belt of restraints with fewer constraints during the manufacturing process. These restraint systems are more flexible and lighter for the user while reducing the risk of injury to the wearer. For the same function, the reduced weight of the restraint system allows for a reduction in the overall mass carried for the same purpose.

[0016] Furthermore, during the manufacturing process, the area without a retaining element on the retaining device according to the invention has a lower thickness than the areas without a retaining element of devices according to the prior art, which makes it easier to cut the area without a retaining element and to form external edges at the cutouts that are less protruding and aggressive to the user.

[0017] According to one example, the first upper face is offset from the second upper face along the third direction so as to form a step between the first and second upper faces, the first thickness El being measured between the lower face and the first upper face and the second thickness E2 being measured between the lower face and the second upper face.

[0018] In one example, the second zone extends over a distance d2 along the first direction, which is greater than a distance dl separating two adjacent retaining elements in the first direction, and / or the second zone extends over a distance d3 along the second direction, which is greater than a distance d4 separating two adjacent retaining elements in the second direction. In another example, to perform the comparisons between the distances dl, d2, d3, and / or d4, the absolute value of this distance is used.

[0019] According to an example, the second zone extends over a distance d2 along the first direction, which is greater than a distance dl separating two adjacent restraint elements in the first direction and / or extends over a distance d3 along the second direction, which is greater than a distance d4 separating two adjacent restraint elements in the second direction.

[0020] This allows the second zone to extend over a sufficient distance to increase the flexibility and / or suppleness of the tape and / or restraint device in the primary and / or secondary direction, for example, to better position itself to cooperate with a counterpart, and also to facilitate its winding into a roll and / or facilitate cutting between two restraint devices and / or improve the identification of the area equipped with restraint elements while facilitating gripping for the user.

[0021] As an example, the retaining elements can be arranged so that they are aligned in the first and second directions, with two successive rows or columns offset respectively in the first and second directions by a distance equal to half the interval between two adjacent retaining elements in the first and / or second direction. Such a configuration can be considered a staggered arrangement of the retaining elements, unlike a row and column arrangement, which is not staggered.

[0022] According to an example, the first and second zones are adjacent along the first direction and / or the second direction.

[0023] According to an example, the first zone and / or the second zone has a dimension that varies according to the first direction and / or according to the second direction.

[0024] According to one example, the restraint system includes at least two first zones (also called first zones with restraint element), the second zone (also called second zone without restraint element) being positioned between the first two zones.

[0025] According to one example, the restraint system includes at least two second zones, with the first zone positioned between the two second zones.

[0026] According to an example, the first thickness El is less than 360 pm or less than or equal to 300 pm or El is less than 200 pm, in particular less than or equal to 150 pm, in particular less than or equal to 140 pm, 130 pm, 120 pm, 110 pm, 100 pm, 90 pm, 85 pm, 80 pm, 75 pm or 70 pm, in particular less than 65 pm and / or greater than or equal to 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 15 pm, 20 pm or 30 pm.

[0027] This allows for increased flexibility and / or suppleness of the tape and / or retaining device, and for a reduction in the weight of the tape and / or retaining device.

[0028] For example, the second thickness E2 is less than or equal to 200 pm, in particular is less than or equal to 130 pm, in particular less than or equal to 120 pm, 110 pm, 100 pm, 90 pm, 80 pm, 75 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than or equal to 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm. For example, the second thickness E2 may be strictly greater than zero.

[0029] According to an example, the first thickness E1 minus the second thickness E2, i.e. E1-E2, is less than or equal to 250 pm, less than 200 pm, in particular less than or equal to 150 pm, in particular less than or equal to 120 pm, in particular less than or equal to 81 pm, 76.5 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 20 pm, in particular greater than or equal to 40 pm.

[0030] According to an example, the first thickness El minus the second thickness E2, i.e. E1-E2, is strictly greater than 0.

[0031] This increases the tape's flexibility and suppleness, and reduces the weight of the tape and / or the retention device. Furthermore, this second layer reduces or eliminates the appearance of red marks and / or irritation when the base comes into contact with the skin, for example, the skin of adults, children, and / or infants. In particular, the tape is less abrasive to the touch after a cut in the second area without a retention element, and / or it improves the identification of the area with retention elements while also making it easier for the user to grip.

[0032] According to one example, the area devoid of restraint elements is arranged along at least one edge of the base, for example at least one edge of the base extending in the first direction and / or the second direction.

[0033] Preferably, the area without retaining elements extends continuously along one edge of the base. Preferably, the area without retaining elements extends along at least two, three, or four edges of the base. With such an arrangement, the retaining device reduces or eliminates the appearance of red marks and / or irritation upon contact of the base with skin, for example, with the skin of adults, children, and / or infants. In particular, the retaining device is less abrasive to the touch after a cutout is made in the second area without retaining elements, and / or the identification of the area with retaining elements is improved while also facilitating gripping for the user.

[0034] In one example, the restraint system includes at least two secondary zones without restraint elements, arranged respectively along two opposite edges of the base. The two opposite edges of the base extend in a direction parallel to the first and / or second direction.

[0035] Preferably, the areas without retaining elements extend continuously along both opposite edges of the base. With such an arrangement, the The retention device reduces or eliminates the appearance of red marks and / or irritation upon contact of the base with the skin, for example, with the skin of adults, children, and / or infants. In particular, the retention device is less abrasive to the touch after a cutout is made in the second area without a retention element and / or improves the identification of the area with retention elements while facilitating gripping for the user.

[0036] For example, the area without retaining elements completely surrounds the area with retaining elements. With this design, the retaining device reduces or eliminates the appearance of red marks and / or irritation if the base comes into contact with the skin, for example, the skin of adults, children, and / or infants. In particular, the retaining device is less abrasive to the touch after a cut is made in the second area without retaining elements, and / or it improves the identification of the area with retaining elements while also making it easier for the user to grasp.

[0037] As an example, the containment system includes an area without a containment element, at least partially bordered by an area with containment elements, and in particular, entirely bordered by an area with containment elements. Thus, with such an area without a containment element within it, the containment system is even more optimized in terms of the materials used.In addition, the retaining elements are arranged specifically where they are required to achieve the desired performance, for example, suitable peel values ​​(e.g. greater than or equal to IN, in particular greater than or equal to 2N and / or less than or equal to 12N, in particular less than or equal to 9N for a rectangular retaining device of 13mm*25.4mm and for example measured according to the method indicated in application WO2019145646) and / or suitable shear values ​​(e.g. greater than or equal to 8N / mm, in particular greater than or equal to 12N and / or less than or equal to 100N, in particular less than or equal to 80N for a rectangular retaining device of 13mm*25.4mm).

[0038] According to an example, the retaining elements may have a height that is greater than or equal to 75 micrometers, in particular greater than or equal to 125 micrometers, in particular greater than or equal to 200 micrometers, more preferably greater than or equal to 250 micrometers and / or less than or equal to 500 micrometers, in particular less than or equal to 425 micrometers, in particular less than or equal to 375 micrometers.

[0039] According to an example, the ratio of the height of the retaining elements to the thickness El of the base in the first zone is greater than or equal to 1.5, in particular greater than or equal to 1.75, in particular greater than or equal to 2.0 and / or less than or equal to 50, in particular less than or equal to 25, in particular less than or equal to 15, even more in particular less than or equal to 10. Thus, with such ratio values, the flexibility and suppleness of the retaining device are further improved.

[0040] According to an example, the ratio of the height of the retaining elements to the thickness E2 of the base in the second zone is greater than or equal to 0.7, in particular greater than or equal to 0.8, in particular greater than or equal to 1.0 and / or less than or equal to 100, in particular less than or equal to 50, in particular less than or equal to 30, even more particularly less than or equal to 20. Thus, with such ratio values, the flexibility and suppleness of the retaining device are further improved compared to the gripping capacity of the retaining elements.

[0041] According to one example, the retaining elements have a height of between 5 and 5,000 micrometers, more particularly between 5 and 2,000 micrometers, or even more particularly between 20 and 800 micrometers, preferably between 120 and 380 micrometers, the height being measured in a direction perpendicular to the top face of the base.

[0042] For example, the stem of the retaining elements has a height that is greater than or equal to 50 micrometers, in particular greater than or equal to 150 micrometers, in particular greater than or equal to 200 micrometers and / or less or equal to 500 micrometers, in particular less than or equal to 450 micrometers, in particular less than or equal to 300 micrometers.

[0043] For example, the retaining elements have a density greater than or equal to 50 retaining elements per cm 2 , typically greater than or equal to 100 retaining elements per cm 2 , in particular greater than or equal to 125 retaining elements per cm 2 and / or less than or equal to 3000 retaining elements per cm 2 , or typically less than or equal to 800 retaining elements per cm 2 , in particular less than or equal to 500 retaining elements per cm 2 .

[0044] For example, the area(s) equipped with retaining elements and / or the area(s) without retaining elements are free from any overlap of a nonwoven strip and / or a layer forming an elastic film. "Free from overlap" means that no layer of nonwoven fabric and / or elastic film is arranged on the face of the base containing the retaining elements. Therefore, this formulation does not preclude the possibility that a film and / or nonwoven fabric may be arranged partially and / or completely on the face of the base opposite the face bearing the retaining elements of the area equipped with retaining elements.

[0045] For example, the base and retaining elements are a single unit, or "integral," as the English term is used. Another example is the base and retaining elements forming a contiguous mass of resin. This simplifies the manufacturing process by requiring only a single extrusion / molding step and increases the strength of the retaining device, resulting in a high peel force.

[0046] In one example, the base has a first basis weight G1 measured in the first zone and a second basis weight G2 in the second zone. The first and second zones are adjacent or successive in the first and / or second direction. For example, the first basis weight G1 is less than 120 g / m² 2 , a surface basis weight ratio R3=(G1-G2) / G1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or less than 1.0, in particular less than or equal to 0.8.

[0047] This presentation also relates to a ribbon comprising restraint devices as defined above and the aforementioned advantages.

[0048] In one example, the ribbon extends in the first direction and the second direction, the dimension of the ribbon in the first direction being at least ten times greater than or equal to the dimension of the ribbon in the second direction.

[0049] This presentation also concerns a molding device adapted for mounting on a molding machine and intended for forming a retaining device. The molding device extends along a machine direction and has a width defined along a transverse direction perpendicular to the machine direction. The molding device comprises a first molding zone having open cavities to define molding cavities for forming retaining elements and / or preforms of retaining elements, a second molding zone without open cavities, and an inner face and a first outer face in the first molding zone.The molding device includes an offset zone arranged within the second molding zone, which is partially delimited by a second external face. This offset zone is also offset from the first external face along a third direction, perpendicular to the machine direction and the transverse direction. The molding device allows for the simple, rapid, and highly flexible formation of a tape of retaining devices with first and second zones of varying thicknesses.

[0050] In one example, the molding device has a first thickness Ebl measured between the inner face and the first outer face, and a second thickness Eb2 measured between the inner face and the second outer face, which is greater than the first thickness Ebl. In particular, Eb2 is greater than Ebl in an area of ​​the molding device that is located in the second molding area, which lacks open cavities.

[0051] In one example, the offset area is formed by embossing.

[0052] In one example, the molding device includes a molding strip adapted to be mounted on at least one roller of the molding apparatus, the offset area being formed by a masking layer partially covering the molding strip. The molding device includes open cavities that are not covered by the masking layer in the first area and closed cavities that are sealed by the masking layer in the second area.

[0053] This solution allows for the simple formation of a molding strip and provides flexibility to vary the shapes of the initial areas intended for forming the retaining elements. The retaining elements arranged on the retaining devices have a pattern with a shape that can be easily adapted or customized by completely removing the masking layer from the molding strip and repeating the masking process described below on the same molding strip.

[0054] Alternatively, a ratio R2=(Eb2-Ebl) / Eb2 is strictly greater than 0, in particular greater than or equal to 0.05 and / or strictly less than 1.0, in particular less than or equal to 0.5, notably less than or equal to 0.4.

[0055] For example, the molding cavities are arranged at least partially within a molding sleeve, which is part of the molding device, and / or within a molding roller. Using a molding strip with cavities has the advantage of facilitating its replacement with a new one, which may, for example, have different or similar cavities. Using a molding sleeve and / or a molding roller each requires significant assembly and disassembly times, often several hours, unlike a molding strip, which can be changed in seconds, or at most, a few minutes.

[0056] In one example, the masking layer extends across the surface of the molding strip to form an endless masking strip in the machine direction.

[0057] As an example, cavities, and more specifically open cavities, can be arranged so as to be aligned along the machine direction and the transverse direction. Two successive rows or columns are then offset, respectively along the machine direction and the transverse direction, by a step corresponding to half the interval separating two adjacent cavities along the machine direction and / or the transverse direction. Such a configuration can be considered a staggered arrangement of cavities, unlike a row and column arrangement, which is not offset.

[0058] The present exposition also relates to a method of preparing a molding device for the manufacture of a restraint device, for example of the type described in the present invention, extending along a machine direction, and having a width defined along a transverse direction perpendicular to the machine direction, the method comprising a step of forming an offset zone on the molding device so as to form a first external face in a first molding zone having open cavities and to define molding cavities for the formation of restraint elements and / or preforms of restraint elements in the restraint device and a second external face in a second molding zone without open cavities, the second external face being offset with respect to the first external face along a third direction perpendicular to the machine direction and to the transverse direction.

[0059] The molding device may have a first thickness Ebl, measured between the inner face and the first outer face, and a second thickness Eb2, measured between the inner face and the second outer face, which is greater than the first thickness Ebl.

[0060] According to one example, the first thickness Ebl and the second thickness Eb2 are measured on the same line extending in the first direction.

[0061] According to one example, the first thickness Ebl and the second thickness Eb2 are measured on the same line extending in the second direction.

[0062] This process makes it possible to form a molding device with first and second zones of different thicknesses in a simple and rapid way while retaining material in places where the gripping function is needed, or, in other words, to reduce the amount of material in non-functional areas to fulfill the gripping function without radically complicating the manufacturing process of the retaining devices.

[0063] With the process of the invention, only one step of gluing the film onto the molding device is required, instead of several steps of covering with layers of resin according to the prior art.

[0064] This molding device makes it possible to manufacture restraint device tapes with first and second zones of different thicknesses, in a simple way, and in a single extrusion / molding step.

[0065] According to one example, the process includes the following steps: - provision of a molding support comprising an inner face, an outer support face, and a plurality of cavities, - at least partial covering of the outer surface of the support by a masking layer so as to seal at least part of the cavities with the masking layer and form an offset zone along a third direction on the outer surface of the support, and - removal of the masking layer from part of the outer surface of the support to form the open cavities opening through the first outer surface into the first molding area, and keeping the offset area only in the second molding area delimited in part by the second outer surface formed by the masking layer.

[0066] In one example, the overcoating step is carried out with a perforated masking layer so that the removal step is optional.

[0067] In one example, the overcoating step is carried out with a perforated masking layer and the removal step is also applied.

[0068] According to a second aspect of the invention, independent of the first aspect, but which can be combined with it in a favorable manner, the present exposition This also concerns a restraint device comprising a base with an upper face, a lower face, and at least one first zone with restraint elements and at least one second zone without restraint elements. The base extends in a first direction, for example, a machine direction, and has a dimension, for example, a width, defined in a second direction, for example, a transverse direction, perpendicular to the first direction. The restraint elements extend from the upper face in the first zone in a third direction perpendicular to the first and second directions, and each includes a rod. The base has a first basis weight G1 measured in the first zone and a second basis weight G2 in the second zone. The first and second zones are adjacent or successive in the first and / or second direction.For example, the first surface weight G1 is less than 120 g / m². 2 , a surface weight ratio R3=((G1-G2) / G1) being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or less than 1.0, in particular less than or equal to 0.8.

[0069] The retention devices thus configured, by reducing the surface mass of material (grams per unit area) in the second zones, are less susceptible to thermal shrinkage of the retention device material. The retention devices according to the invention therefore have a limited risk of unwanted wave formation in the first and / or second direction, which could reduce product quality and increase difficulties in winding, unwinding, and transporting the tape.

[0070] This second aspect of the invention can be used alone or in combination with the first aspect of the invention and its variants derived therefrom.

[0071] Indeed, according to one variant, the base also has a first thickness El measured along the third direction in the first zone and a second thickness E2 measured along the third direction in the second zone, the first thickness El being less than 360 pm or less than or equal to 300 pm, in particular less than or equal to 120 pm, in particular less than 100 pm and / or the second thickness E2 being less than or equal to 200 pm, the ratio R1=(E1-E2) / E1 being greater than 0.1, in particular greater than 0.2, in particular greater than 0.3 and / or in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0072] The retention devices thus configured, by reducing the thickness and surface mass of the material (basis weight) in the second zones, are less susceptible to thermal shrinkage of the retention device material. The retention devices according to the invention therefore have a limited risk of unwanted wave formation in the first and / or second direction, which could reduce product quality and increase difficulties in winding, unwinding, and transporting the tape.

[0073] According to one example, the restraint device includes a third zone and the base has a third thickness E3 measured along the third direction in the third zone and / or a third surface weight G3 in the third zone.

[0074] According to one example, the third zone is an area devoid of restraint elements.

[0075] According to an example, the third zone being an area without restraint elements, the RI ratio being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, and / or less than 1.0, in particular less than or equal to 0.9, the third thickness E3 is different from the second thickness E2, in particular the third thickness E3 being greater than the second thickness E2, in particular the third thickness E3 being greater than or equal to the second thickness E2 by at least 10%.

[0076] For example, if the third zone is an area without retaining elements, and the R3 ratio is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, and / or less than 1.0, then the third basis weight G3 is different from the second basis weight G2, in particular the third basis weight G3 being greater than the second surface weight G2, in particular the third surface weight G3 being greater than the second surface weight G2 by at least 10%.

[0077] For example, the second area(s) without a restraint element are arranged so that there is at least one straight line extending continuously in a direction parallel to the first direction. This allows the restraint device to be better anchored to the support.

[0078] According to an example, the first zone(s) with a retaining element and the second zone(s) without a retaining element are arranged in such a way that for each straight line, parallel to the second direction, and passing through the first zone(s) with a retaining element and the second zone(s) without a retaining element, a ratio is defined which is the sum of the extents SE2 of the second zone(s) without a retaining element divided by the sum of the extents SE1 of the first zone(s) with a retaining element. The ratio is greater than or equal to 0.10, in particular greater than or equal to 0.2, notably greater than or equal to 0.25 and / or less than or equal to 0.9, notably less than or equal to 0.85, 0.80, 0.75, 0.70.Thus, with such a ratio, the base area with reduced thickness and / or weight facilitates flexing and flexibility in both directions, allowing for better positioning to cooperate with a counterpart. For example, the counterpart could be a looped counterpart, particularly useful for absorbent material applications. Winding the tape of restraint devices into a roll, for example in the form of cut rolls, is made easier. Cutting between two restraint devices is also made easier.

[0079] According to an example, the first zone(s) equipped with a retaining element and the second zone(s) without a retaining element are arranged such that for each straight line, parallel to the first direction, and passing through the first zone(s) equipped with a retaining element and the second zone(s) without a retaining element, a ratio is defined which is the sum of the extents SE2 of the second zone(s). devoid of retention elements on the sum of the SE1 extents of the first zone(s) equipped with retention elements. The ratio is greater than or equal to 0.10, in particular greater than or equal to 0.2, notably greater than or equal to 0.25 and / or less than or equal to 0.9, notably less than or equal to 0.85, 0.80, 0.75 or 0.70.

[0080] Furthermore, with the aforementioned R3 weight ratio and RI thickness values, the flexibility and / or suppleness of the retention device are further improved while reducing and / or eliminating the appearance of red marks and / or irritations in case of contact of the base with the skin.

[0081] As an example, the first zone equipped with retaining elements is delimited by a contour with at least one curved portion, preferably several curved portions. A curved portion is understood to be a portion of the contour that is not exclusively arranged in the first and second directions, but rather in a direction that has both a component in the first direction and a component in the second direction. Thus, thanks to such a curved portion, or a plurality of curved portions forming the contour of the first zone equipped with retaining elements, the retaining device has improved flexing, flexibility, and torsional capacity in the first and / or second direction, allowing it to better position itself to cooperate with a counterpart, such as a looped counterpart, particularly for absorbent article applications in the hygiene sector.

[0082] According to one example, the first thickness and the second thickness are measured at at least two different positions arranged on the same straight line extending parallel to the first direction.

[0083] In one example, the first thickness and the second thickness are measured at two different positions arranged on the same straight line extending parallel to the second direction.

[0084] In one example, the first basis weight and the second basis weight are measured at at least two positions or areas (different) whose barycenter is arranged on the same straight line extending parallel to the first direction.

[0085] According to one example, the first surface weight and the second surface weight are measured at at least two (different) positions or zones whose centroid is arranged on the same straight line extending parallel to the second direction.

[0086] In one example, the restraint system comprises a straight line extending perpendicular to the first direction and passing through the second area, which is devoid of restraint elements. Specifically, the thickness of this straight line, extending parallel to the first direction, is greater than or equal to 2xd4 and / or 2xdl and / or 2xd2 and / or 2xd3, or more precisely, greater than or equal to 3xd4 and / or 3xdl and / or 3xd2 and / or 3xd3, or more precisely, greater than or equal to 4xd4 and / or 4xdl and / or 4xd2 and / or 4xd3. Thus, with such ratio values, the flexibility and suppleness of the restraint system are improved.

[0087] According to an example, the step has a thickness E=E1-E2 and the retaining elements have a height H, in particular an average height, taken from the first upper face of the base to the free end of the retaining elements.

[0088] The ratio between the thickness of the step and the height of the retaining elements (E / H) is less than or equal to 1.5, in particular less than or equal to 1.2, in particular less than or equal to 1 and / or greater than or equal to 0.05, in particular greater than or equal to 0.2.

[0089] According to a third aspect of the invention, which can be implemented favorably independently of the first and / or the second aspect, but can also be implemented favorably in combination with one and / or the other, the present disclosure also relates to a restraint device comprising a base extending in a first direction and a second direction, perpendicular to the first direction, and restraint elements extending from the base in a third direction, perpendicular to the first and second directions, the retaining elements each comprising a rod, in which: - the base comprises at least one first upper face provided with retaining elements in a first zone, and at least one second upper face without retaining elements in a second zone, - the retaining device comprises intermediate elements extending from the first upper face in the third direction, and bordering at least partially the second upper face, the intermediate elements being partially formed retaining elements, - the first upper face is offset from the second upper face along the third direction so as to form a step comprising a riser connecting the first upper face to the second upper face.

[0090] In one example, the intermediate elements are adjacent to or intersecting the riser.

[0091] According to one example, the intermediate elements are adjacent to the riser such that the riser is at a distance less than or equal to the distance dl, separating two adjacent retaining elements in the first direction and / or the distance d4, separating two adjacent retaining elements in the second direction.

[0092] According to one example, a boundary between the first upper face and the second upper face is formed by a succession of intermediate elements and retaining elements positioned at the end of the first upper face.

[0093] According to one example, the second zone is bordered at least partially, in particular totally, by intermediate elements and restraint elements arranged in at least a first zone.

[0094] In one example, the riser extends below at least one intermediate element and / or below a retaining element.

[0095] According to one example, the second zone is bordered by intermediate elements and retaining elements.

[0096] According to one example, at least part of the intermediate elements include a truncated stem extending along the third direction, the truncated stem having a truncated portion opening at least partially into the second zone.

[0097] According to an example, at least 5% of the intermediate elements have a truncated head, in particular at least 10%, 20%, of the intermediate elements have a truncated head and / or less than 90% of the intermediate elements have a truncated head, in particular less than 80%, 70%, 60% and / or a truncated stem, in particular at least 10%, 20%, of the intermediate elements have a truncated stem and / or less than 90% of the intermediate elements have a truncated stem, in particular less than 80%, 70%, 60%.

[0098] According to an example, let Bt be the width of the intermediate element at the truncated portion and let Ct be the width of a missing portion of the truncated stem of the intermediate element, the ratio Bt / (Bt+Ct) is greater than or equal to 0.1, 0.2, 0.3, and / or less than or equal to 0.9, 0.8.

[0099] According to an example, the base has a first thickness El measured along the third direction in the first zone and a second thickness E2 measured along the third direction in the second zone, the first thickness El being less than 120 pm, in particular less than or equal to 100 pm, a ratio RI =(E1-E2) / E1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than 0.3 and / or in particular less than 1.0.

[0100] According to an example, the second zone extends over a distance d2 along the first direction, which is greater than a distance dl separating two adjacent restraint elements in the first direction and / or extends over a distance d3 along the second direction, which is greater than a distance d4 separating two adjacent restraint elements in the second direction.

[0101] The invention also relates to a ribbon comprising retaining devices as defined above.

[0102] For example, the base and / or retaining elements and / or intermediate elements are a single piece, or they are "integral," as the English term is used. For instance, the base and / or retaining elements and / or intermediate elements form a contiguous mass of resin. This simplifies the manufacturing process by requiring only a single extrusion / molding step, increases the strength of the retaining device, and results in a high peel force.

[0103] According to one example, the base and / or retaining elements and / or preforms of retaining elements and / or intermediate elements are produced by extrusion, in particular directly by extrusion, or in other words have not undergone an additional deformation operation, in particular an additional operation after demolding.

[0104] This presentation also concerns an absorbent article, for example such as a baby diaper, an adult incontinence diaper, or a feminine hygiene product, which includes: - an upper sheet, a lower sheet, and an absorbent core arranged between the two upper and lower sheets, and - at least one device as defined above.

[0105] For example, the absorbent article, for instance, such as a baby diaper or an adult incontinence diaper or a feminine hygiene product, includes at least additional retaining elements arranged to cooperate with the retaining elements of the device to achieve the closure of the absorbent article and / or to achieve the assembly, including temporary assembly, of one or more sub-assemblies of the absorbent article.

[0106] This presentation also concerns a molding device adapted for mounting on a molding machine and intended for forming a device of retained, for example as defined above, the molding device extending along a machine direction, having a width defined along a transverse direction perpendicular to the machine direction and comprising: - at least one molding support comprising an external face, and a plurality of cavities opening through the external face, - a masking layer comprising at least one film partially covering the outer face of the molding support so as to obtain a molding device comprising: o a first external face in a first zone comprising open cavities, not covered by the film, defining molding cavities for the formation of retaining elements and / or preforms of retaining elements, and partially open cavities, partially covered by the film, defining molding cavities for the formation of intermediate elements, and o a second external face formed by a surface of the film in a second molding zone having closed cavities which are sealed by the film, the second external face being offset from the first external face along a third direction perpendicular to the machine direction and the transverse direction.

[0107] According to one example, the film may comprise two opposite ends along a machine direction, which two opposite ends in the machine direction are coincident and the film has at least one interface, for example a macromolecular interface and / or with a different molecular orientation, arranged at two opposite ends of the film.

[0108] According to an example, the film may include two opposite ends in the machine direction, said two opposite ends in the machine direction are disjoint.

[0109] As an example, the film can have a variable thickness.

[0110] According to an example, the film may include two opposite ends in a transverse direction, perpendicular to the machine direction, said two opposite ends in the transverse direction are disjoint.

[0111] According to one example, the masking layer comprises at least two films that are disjoint, specifically disjoint at all points.

[0112] According to one example, the masking layer includes a bonding agent arranged at least in part between at least one film and the molding support.

[0113] According to another example, the masking layer lacks two coincident ends and lacks an interface arranged at both ends of the masking layer.

[0114] According to an example, the molding device has in the first molding zone, a first thickness Ebl measured between an inner face of the molding support and the first outer face, and, in the second molding zone, a second thickness Eb2 measured between the inner face and the second outer face, in particular which is greater than the first thickness Ebl, a ratio R2=(Eb2-Ebl) / Eb2 being greater than 0 and / or less than 1.0, in particular less than or equal to 0.9, preferably less than or equal to 0.5, more particularly less than or equal to 0.3.

[0115] According to an example, the Eb3 / Ebl ratio is less than or equal to 1.5, in particular less than or equal to 1.2, in particular less than or equal to 1 and / or greater than or equal to 0.05, in particular greater than or equal to 0.2.

[0116] According to one example, the film is a polymer-based film, including a polyimide and / or polyester and / or PVC and / or fluorinated polymer and / or epoxy polymer and / or silicone (or polysiloxane) and / or acrylate polymer and / or latex and / or metallic film (e.g., copper-based and / or aluminum and / or steel-based).

[0117] According to one example, the molding device is a molding strip adapted to be mounted on at least one roller of the molding apparatus.

[0118] As an example, the molding device is a molding roller.

[0119] This presentation also relates to a method for preparing a molding device intended for the manufacture of a retaining device, extending along a machine direction, and having a width defined along a transverse direction perpendicular to the machine direction, the method comprising the following steps: - provision of a molding support comprising an external face and a plurality of cavities opening through the external face, - covering the outer surface with a masking layer comprising at least one film so as to seal part of the cavities with at least one film and form an offset zone on the outer surface, the molding support comprising: o a first external face in a first molding zone having open cavities so as to define molding cavities for the formation of retaining elements and / or preforms of retaining elements in the retaining device, and partially open cavities defining partially open molding cavities for the formation of intermediate elements, and o a second external face formed by the surface of the film, in a second molding zone having closed cavities, the second external face being offset from the first external face along a third direction perpendicular to the machine direction and the transverse direction.

[0120] According to one example, the film is a polymer-based film that is fixed to the outer face of the molding strip by a bonding agent (or adhesive).

[0121] According to one example, the process includes a step of removing at least a portion of the film to form open cavities and partially open cavities in the first molding zone.

[0122] The characteristics of the third aspect can be combined with the characteristics of the first and / or second aspects, and vice versa, or with other aspects of this description.

[0123] This presentation also relates to a manufacturing process for a restraint device implemented by a molding apparatus comprising one of the molding devices as defined previously.

[0124] The use of a masking layer including a film, in particular a polymer, makes it possible to obtain a retention device as described above, and including a step between the first and second zone, as well as intermediate elements in the first zone.

[0125] Intermediate elements can be incomplete retaining elements. Like retaining elements, intermediate elements can have a fastening function that has a different functional characteristic than that of retaining elements.

[0126] For the same masking area, the area with retaining elements can have a greater quantity of retaining elements compared to an area with retaining elements obtained with a resin masking layer.

[0127] Indeed, tests have shown that using film instead of resin results in more retaining elements forming at the edge of the area covered by retaining elements, even if these elements are partially formed (or truncated). With resin, fewer retaining elements are formed at the edge of the area covered by retaining elements due to the amount of masking required when using resin.

[0128] In one example, the masking layer extends at least 10% outside the molding cavities. In another example, the masking layer extends mainly over the surface of the molding device, particularly over the surface of the molding strip; in other words, the masking layer extends at least 50% outside the molding cavities, and in other cases, more than 60%, 70%, or 80% outside the molding cavities.

[0129] The presence of intermediate elements allows for a containment system with a less aggressive border delimiting the area equipped with containment elements. The intermediate elements are more flexible. Intermediate elements exhibit a greater degree of mobility than fully formed retaining elements, due to their truncated stem.

[0130] In the case where a non-woven material is attached to the back of the base, the anchoring of the non-woven material is better in the area devoid of retaining elements.

[0131] During the cooling of the ribbon composed of the retaining devices and / or the retaining device itself, there is also a reduction in deformation, for example cupping, of the base due to the limited amount of material and the effect of thermal shrinkage of the material.

[0132] The user is also given better identification of the area equipped with retaining elements to facilitate gripping. The aesthetic appearance is also improved.

[0133] As an example, using a film instead of another masking method such as resin also provides a smoother area free of retaining elements.

[0134] Using film as a masking agent offers other advantages. Indeed, the process using epoxy resins, for example, as a masking agent is tedious because numerous steps, particularly preparation, are required to achieve this masking.

[0135] In cases where protective adhesive is not used and masking resins are deposited over the entire surface of the molding support, the areas in which the hooks will be molded will need to be freed by an additional ablation step, for example using a laser.

[0136] Furthermore, the use of resin requires the application of several successive layers of resin on the molding strip in order to achieve a reduction in the thickness of the area without retaining elements sufficient to provide adequate flexibility, which is tedious and time-consuming.

[0137] The thickness and / or cross-section of the film is predefined upstream and the film is glued directly onto the molding support, which requires only one step and is simpler industrially.

[0138] According to a fourth aspect, which is itself an invention independently of the other aspects of the invention, but which can be favorably implemented in combination with at least one of them, the invention relates to a restraining device comprising a base extending in a first direction and a second direction, perpendicular to the first direction, and restraining elements extending from a first face of the base in a third direction, perpendicular to the first and second directions.

[0139] The base comprises two opposing longitudinal end edges (or first end edges) extending along the first direction, including a first longitudinal end edge and a second longitudinal end edge, and at least one retention pattern having at least two retention zones, each provided with retention elements. Each retention element includes a rod. The at least one retention pattern is delimited by two opposing longitudinal edges extending along the first direction, including a first longitudinal edge and a second longitudinal edge.

[0140] The at least two retention zones of the at least one retention pattern are arranged such that any straight line segment extending in the second direction from the first longitudinal end edge of the base to the second longitudinal end edge of the base intersects at least one of the at least two retention zones. The straight line segment is rectilinear.

[0141] The base includes at least one area free of retaining elements, comprising at least one transverse portion extending continuously across the first face of the base from the first longitudinal edge of at least one retaining pattern to the second longitudinal edge of at least one retaining pattern. The transverse portion is bounded at least partially by at least two retaining areas.

[0142] The invention thus provides a more flexible and adaptable retaining device when used in conjunction with a counterpart, for example a loop counterpart. and / or when the user handles it, in particular when the restraint device is mounted on an absorbent article and / or a hygiene article.

[0143] The flexibility of the restraint device is particularly improved in the direction of the greatest length of the restraint device.

[0144] The flexibility of the restraint device is particularly improved in torsion, especially in torsion around the greatest length of the restraint device.

[0145] The restraint system adapts better to the user's body shape and provides improved support when the user is mobile. The retention of the restraint system on a buckled counterpart, for example, as well as its conformability, are improved.

[0146] The attachment performance of the restraint device is equivalent to that of a conventional restraint device but using fewer restraint elements and therefore using less material.

[0147] By reducing the number of retaining elements, the "fakir effect" can be mitigated. The "fakir carpet effect" is an effect found in hook-and-loop fasteners where, due to an excessive number of retaining elements (e.g., hooks) relative to the number of loops, it becomes difficult, or even impossible, for the retaining elements to penetrate the loops to form a hook-and-loop fastener. The retaining element assembly thus has a greater capacity to engage with the hook loops. Furthermore, the retaining elements penetrate the counterpart, particularly the loop counterpart, more easily.

[0148] The number of restraint elements in the peripheral zone of the restraint system is increased. These restraint elements are fully formed and more readily available because they are less congested. Grip performance is locally enhanced in these peripheral zones.

[0149] According to one example, the transverse portion is not straight.

[0150] According to one example, the straight segment also intersects a transverse portion at least once.

[0151] The term "longitudinal" is used generally and is not linked to a particular base shape, which could be rectangular, square, or trapezoidal, for example. Thus, depending on the restraint device in question and / or the application in which the restraint device is installed, "longitudinal" can refer to the longest length of the base, for example, the longest length of the base parallel to the machine direction or the transverse direction of the application in question. The term "transverse" is generally used to mean perpendicular to "longitudinal."

[0152] According to one example, the at least two retention areas are distinct.

[0153] In one example, at least one containment pattern, and in particular at least two containment zones, are delimited (bounded or bounded) by two longitudinal edges. These two longitudinal edges delimit the containment pattern from the outside.

[0154] The two longitudinal end edges define the outer periphery of the base of the restraint device. The two longitudinal end edges may be straight or non-straight.

[0155] In one example, each retention area is delimited by a continuous border (or outline).

[0156] In one example, the two longitudinal edges of the restraint pattern are straight.

[0157] According to an example, every line segment passes through the restraint pattern.

[0158] According to an example, every line segment passes through the base.

[0159] According to one example, at least one area devoid of retaining elements includes at least one first longitudinal edge devoid of retaining elements. retention extending at least partially along the first direction between the first longitudinal end edge of the base and the first longitudinal edge of at least one retention pattern, the transverse portion being connected to the first longitudinal edge.

[0160] According to one example, at least one area devoid of restraint elements includes at least one second longitudinal edge devoid of restraint elements extending at least partially along the first direction between the second longitudinal end edge of the base and the second longitudinal edge of at least one restraint pattern, the transverse portion being connected to the second longitudinal edge.

[0161] In one example, the base has a first thickness E1, measured along the third direction, in the retention areas of at least one retention pattern, and a second thickness E2, measured along the third direction, in at least one area without retention elements. The first thickness E1 is less than 360 µm, in particular less than or equal to 300 µm, in particular less than or equal to 120 µm, in particular less than 100 µm. A ratio RI = (E1-E2) / E1 is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0162] These features improve the flexibility of the restraint device and further reduce the amount of material forming the base of the restraint device.

[0163] According to an example, the ratio between the length and the width of the transverse portion is greater than or equal to 2, in particular greater than or equal to 4, in particular greater than or equal to 5 and / or less than or equal to 500, in particular less than or equal to 300, in particular less than or equal to 200.

[0164] According to one example, the ratio between the length of the transverse portion and the width of at least one restraint pattern along the second direction is strictly greater than 1.

[0165] According to one example, the transverse portion has a variable width.

[0166] In one example, the transverse portion has a width that is greater than or equal to twice the average distance separating two adjacent restraint elements.

[0167] The average distance separating two restraint elements is the shortest average distance between two restraint elements, for example, along a direction parallel to the first direction or the second direction.

[0168] According to an example, the transverse portion has a width greater than or equal to 0.5 mm, in particular greater than or equal to 0.7 mm, in particular greater than or equal to 0.8 mm, and / or less than or equal to 5 mm, in particular less than or equal to 3 mm.

[0169] As an example, the width of the cross-section is measured along a direction perpendicular to at least one of the edges of the cross-section. The width can be measured along any direction that lies within a plane formed by the first and second directions.

[0170] According to one example, the width of the cross portion extends perpendicularly to the length of the cross portion shape.

[0171] As an example, any straight line segment extending in a direction parallel to the second direction, from the first longitudinal end edge of the base to the second longitudinal end edge of the base, crosses the transverse portion at least once.

[0172] According to an example, any straight line segment extending in a direction parallel to the second direction, from the first longitudinal edge of at least one restraint pattern to the second longitudinal edge of at least one restraint pattern, crosses the transverse portion at least once.

[0173] According to one example, the base includes a second face, opposite the first face, which is connected to a support.

[0174] According to one example, the support forms all or part of the second face of the restraint device.

[0175] For example, the retention pattern includes a retention area lacking a continuous portion, for example, a retention area that is at a distance from at least one of the two transverse end edges.

[0176] According to one example, the backing is a non-woven material or a film or a combination of film and non-woven material.

[0177] For example, the base and retaining elements form a single unit, or they are a single piece, or they are "integral" according to the English term. For instance, the base and retaining elements form a contiguous mass of resin.

[0178] According to one example, at least one transverse portion includes at least one part extending over the first face of the base in a direction parallel to the first direction or in a direction inclined to the first direction at an angle other than 90°.

[0179] According to one example, the base comprises two opposite transverse end edges extending in a direction that is secant to the first direction, of which a first transverse end edge of the base and a second transverse end edge of the base, any straight line segment passing through the base being arranged between the first transverse end edge of the base and the second transverse end edge of the base.

[0180] As an example, the base may include a first transverse border extending along the second direction which is devoid of a retaining element and / or a second transverse border, opposite the first transverse border, extending along the second direction which is devoid of a retaining element.

[0181] The features of the invention can be combined with the features according to the previous aspects of the invention.

[0182] The retaining elements can be obtained by an extrusion process as defined above and / or obtained by a process using vibratory energy, for example ultrasound, for example an ultrasonic welding process.

[0183] The invention also relates to a restraint device as defined above in the form of a strip or roll intended to be cut to form several restraint devices.

[0184] According to a fifth aspect, which is itself an invention independently of the other aspects of the invention, but which can be favorably implemented in combination with at least one of them, the invention relates to a restraining device comprising a base extending in a first direction and a second direction, perpendicular to the first direction, and restraining elements extending from a first face of the base in a third direction, perpendicular to the first and second directions.

[0185] The base includes: - two opposing longitudinal end edges (or first end edges) extending along the first direction, of which a first longitudinal end edge and a second longitudinal end edge, - two opposing transverse end edges (or second end edges) extending in a direction that is secant to the first direction, of which a first transverse end edge and a second transverse end edge, and - at least one restraint pattern comprising at least one restraint zone provided with restraint elements, the restraint elements each comprising a rod, said at least one restraint pattern being delimited by two opposing longitudinal edges extending along the first direction.

[0186] The retention area of ​​at least one retention pattern includes at least one continuous portion extending continuously from the first transverse end edge of the base to the second transverse end edge of the base, in a longitudinal direction. The continuous portion has a width, including a minimum width, that is greater than the distance between two adjacent retention elements.

[0187] Said at least one restraining pattern is arranged so that any straight segment arranged in said at least one restraining pattern and extending perpendicularly to the longitudinal direction and / or extending perpendicularly to the first direction, from the first longitudinal edge of the at least one restraining pattern to the second longitudinal edge of the at least one restraining pattern, crosses the continuous portion at least once.

[0188] The at least one retaining pattern has a retaining width (or cumulative retaining width, corresponding to the sum of the retaining widths along the same straight line segment) extending in the second direction between the two longitudinal edges of the at least one retaining pattern. The retaining width varies in the direction of the first direction, specifically so as to form at least a partial area devoid of retaining elements on the first face of the base. The retaining width varies as one progresses along the first direction.

[0189] The invention thus provides a more flexible and supple restraint device when cooperating with a counterpart, for example a loop counterpart, and / or when the user handles it, in particular when the restraint device is mounted on an absorbent article and / or a hygiene article.

[0190] The flexibility of the restraint device is particularly improved in the direction of the greatest length of the restraint device.

[0191] The flexibility of the restraint device is particularly improved in torsion, especially in torsion around the greatest length of the restraint device.

[0192] The restraint system adapts better to the user's body shape and provides improved support when the user is mobile. The retention and conformability of the restraint system on, for example, a buckled counterpart are improved.

[0193] The attachment performance of the restraint device is equivalent to that of a conventional restraint device but using fewer restraint elements and therefore using less material.

[0194] By reducing the number of retaining elements, it is possible to mitigate the "fakir effect." The "fakir carpet effect" is an effect found in hook-and-loop fasteners where, due to an excessive number of retaining elements (e.g., hooks) relative to the number of loops, it becomes difficult, or even impossible, for the retaining elements to penetrate the loops to form a hook-and-loop fastener. The retaining element assembly thus has a greater capacity to engage with the hook loops. Furthermore, the retaining elements penetrate the counterpart, particularly the loop counterpart, more easily.

[0195] The number of restraint elements in the peripheral zone of the restraint system is increased. These restraint elements are fully formed and more readily available because they are less congested. Grip performance is locally enhanced in these peripheral zones.

[0196] The term "longitudinal" is used generally and is not linked to a particular shape of the base, which can be rectangular, square, or trapezoidal, for example. Thus, depending on the restraint device considered and / or the application on which the restraint device is arranged, "longitudinal" can be the greatest length of the base, for example, the greatest length of the base parallel to the machine direction or the transverse direction of the application. concerned. The term "transverse" is generally used to mean perpendicular to "longitudinal".

[0197] Said at least one retention zone is surrounded or bordered at least partially by at least one zone devoid of retention elements and / or by at least one of the two transverse end edges of the base and / or by at least one of the two longitudinal end edges of the base and / or by at least one of the two transverse edges of at least one retention pattern and / or by at least one of the two longitudinal edges of at least one retention pattern.

[0198] For example, the retention area is delimited by the two longitudinal edges of at least one opposing retention pattern extending along the first direction.

[0199] For example, the continuous portion extends continuously via one or more straight segments and / or one or more curved segments, from the first transverse end edge of the base to the second transverse end edge of the base. The straight segments and / or the curved segments are connected to each other.

[0200] For example, the restraint zone is arranged so that any straight line segment arranged in the restraint pattern and extending along the second direction, from the first longitudinal edge of at least one restraint pattern to the second longitudinal edge of at least one restraint pattern, crosses the continuous portion at least once.

[0201] The line segment is straight.

[0202] For example, the longitudinal direction is parallel to the first direction. The straight line segment is parallel to the second direction.

[0203] For example, the retention area includes at least one lateral portion extending from the continuous portion.

[0204] For example, the lateral portion extends from the continuous portion to one of the longitudinal edges of at least one restraint pattern.

[0205] For example, the restraint device includes at least one area devoid of restraint elements comprising at least one transverse portion positioned at least partially between said at least one lateral portion and one of the first and second transverse end edges of the base and extending from the continuous portion to one of the longitudinal edges of at least one restraint pattern.

[0206] For example, at least one containment area is delimited by a continuous border (or outline). The continuous border is surrounded by the area without containment elements and / or is arranged along the edge of the base.

[0207] For example, the area devoid of restraint elements of the restraint device comprises several transverse portions, each positioned between two successive lateral portions along the first direction and extending from the continuous portion to one of the longitudinal edges of at least one restraint pattern and / or to one of the longitudinal end edges of the base.

[0208] For example, at least one of the lateral portions may be in contact with one of the first and / or second transverse end edges, without there being a transverse portion arranged between a lateral portion and one of the first and second transverse end edges of the base.

[0209] For example, the area devoid of restraint elements includes at least one first longitudinal edge devoid of restraint elements extending at least partially along the first direction between the first longitudinal end edge of the base and the first longitudinal edge of the at least one restraint pattern, at least one transverse portion, in particular each transverse portion being connected to the first longitudinal edge.

[0210] For example, the area without restraints includes a second longitudinal edge without restraints extending at least partially in the first direction between the second longitudinal end edge of the base and the second longitudinal edge of the at least a restraint pattern, at least one transverse portion, in particular each transverse portion being connected to the second longitudinal border.

[0211] For example, an area lacking restraint elements may lack (or not include) longitudinal edges. The first longitudinal edge coincides with the first longitudinal end edge of the base, and the second longitudinal edge of at least one restraint pattern may coincide with the second longitudinal end edge of the base.

[0212] For example, the base has a first thickness El, measured along the third direction, in the retention areas of the retention pattern and a second thickness E2, measured along the third direction, in at least one area without retention elements. The first thickness El is less than 360 pm, in particular less than or equal to 300 pm, in particular less than or equal to 120 pm, in particular less than 100 pm, a ratio R1=(E1- E2) / E1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0213] For example, the ratio between the length and the width of the cross portion is greater than or equal to 2, in particular greater than or equal to 4, in particular greater than or equal to 5 and / or less than or equal to 500, in particular less than or equal to 300, in particular less than or equal to 200.

[0214] For example, the ratio between the area of ​​at least one retention zone of the retention pattern and the area of ​​the transverse portions is greater than or equal to 1, in particular greater than or equal to 1.5, in particular greater than or equal to 2, and / or less than or equal to 50, in particular less than or equal to 40, in particular less than or equal to 30.

[0215] For example, the ratio along the first direction between the width of the lateral portions of at least one retention zone of the retention pattern and the width of the transverse portions is greater than 0.5.

[0216] For example, the transverse portion has a width greater than or equal to 0.5 mm, in particular greater than or equal to 0.7 mm, in particular greater than or equal to 0.8 mm, and / or less than or equal to 5 mm, in particular less than or equal to 3 mm.

[0217] For example, the variation in the width of the retention area varies between 5% and 100% of the maximum width of the retention area, in particular between 10% and 100% of the maximum width of the retention area, in particular between 20% and 100% of the maximum width of the retention area.

[0218] For example, the continuous portion of the retention area of ​​the retention pattern has a width greater than or equal to 10% of the maximum width of the retention area, in particular greater than or equal to 15%, in particular greater than or equal to 20% and / or less than or equal to 45%, in particular less than or equal to 40%.

[0219] For example, the continuous portion of the retention area of ​​the retention pattern has a width greater than or equal to 10% of the maximum width of the retention area, in particular greater than or equal to 5%, in particular greater than or equal to 10% and / or less than or equal to 100%, in particular less than or equal to 80%.

[0220] For example, the retention pattern further includes a retention area lacking a continuous portion, for example a retention area that is at a distance from at least one of the two transverse end edges.

[0221] According to one example, at least one retention pattern includes two retention areas, including a first retention area and a second retention area, the first retention area being separate from and / or at a distance from the second retention area.

[0222] According to one example, the retention pattern includes at least two retention areas, each retention area comprising a continuous portion.

[0223] For example, at least one continuous portion has a width extending along the second direction between the two longitudinal edges of at least one restraint pattern, which varies in the direction of the first direction.

[0224] For example, at least one lateral portion has a width extending along the second direction between the two longitudinal edges of at least one restraint pattern, which varies in the direction of the first direction.

[0225] For example, the lateral portion extends here from at least one continuous portion, forming a discontinuity of curvature with the continuous part.

[0226] At least one continuous portion of the retention area may have a wavy, sinusoidal, sawtooth, or crenellated shape, for example.

[0227] For example, at least one continuous portion of the retention area extends continuously in the first direction.

[0228] For example, at least one continuous portion and at least one lateral portion are spaced apart. In this case, the continuous portion forms a retention zone due to at least one retention pattern, and the lateral portion forms another retention zone due to at least one retention pattern.

[0229] For example, depending on the first direction and / or the second direction, the continuous portion may include at least three rows of retaining elements.

[0230] For example, depending on the first direction and / or the second direction, the lateral portion may include at least three rows of restraint elements.

[0231] According to one example, the base includes a second face, opposite the first face, which is connected to a support.

[0232] According to one example, the support forms all or part of the second face of the restraint device.

[0233] According to one example, the backing is a non-woven material or a film or a combination of film and non-woven material.

[0234] In one example, the base and the retaining elements form a unitary whole.

[0235] According to one example, the lateral portion can be in contact with one of the first and second transverse end edges, without there being a transverse portion arranged between a lateral portion and one of the first and second transverse end edges.

[0236] The features of the invention can be combined with the features according to the previous aspects of the invention.

[0237] The retaining elements can be obtained by an extrusion process as defined above and / or obtained by a process using vibratory energy, for example ultrasound, for example an ultrasonic welding process.

[0238] The invention also relates to a restraint device as defined above in the form of a strip or roll intended to be cut to form several restraint devices.

[0239] According to a sixth aspect, which is itself an invention independently of the other aspects of the invention, but which can be favorably implemented in combination with at least one of them, the invention relates to a retaining device comprising a base extending in a first direction and a second direction, perpendicular to the first direction, and retaining elements extending from a first face of the base in a third direction, perpendicular to the first and second directions, the retaining elements each comprising a rod.

[0240] The base includes at least one retention pattern comprising one or more retention area(s) equipped with retention elements, and at least one area without retention elements.

[0241] At least one retention pattern is delimited by two opposing longitudinal edges extending along the first direction, one of which is a longitudinal edge and a second longitudinal edge, and by two opposite transverse edges, in particular which extend along the second direction, of which a first transverse edge and a second transverse edge.

[0242] Let Qi be an isosurface coefficient SO s = (P / Pref) x 100, where P is the perimeter of at least one retention pattern, and P ref being a reference perimeter corresponding to the perimeter of a disk having the same area as the at least one retention pattern, the at least one retention pattern has an isosurface coefficient Qisos that is greater than or equal to 130%, in particular greater than or equal to 140%, in particular greater than or equal to 180%. For example, the isosurface coefficient Qisos can be greater than or equal to 250%, in particular greater than or equal to 350%.

[0243] The invention makes it possible to increase the flexibility of the restraint device while maximizing gripping performance due to the largest possible gripping surface for the same surface area of ​​the restraint device.

[0244] On the retention system, creating retention patterns by removing retention zones—that is, by forming strips or lines of areas without retention elements—results in retention patterns with larger perimeters. This adds flexibility to the product because material is removed and areas of weakness are created.

[0245] The isosurface coefficient represents the flexibility and gripping performance of restraint devices, thus facilitating comparison between them. The higher the isosurface coefficient, the greater the flexibility and gripping performance of the restraint device. This results in a better balance between flexibility and gripping performance.

[0246] The term "longitudinal" is used generally and is not linked to a particular base shape, which could be rectangular, square, or trapezoidal, for example. Thus, depending on the restraint system in question and / or the application in which the restraint system is used, "longitudinal" can be the greatest length of the base, for example, the greatest length of the base parallel to the machine direction or the transverse direction of the application in question. The term "transverse" is generally used to mean perpendicular to "longitudinal".

[0247] According to one example, the at least two retention areas are distinct.

[0248] In one example, the retention zone(s) are delimited (bounded or bounded) by the two longitudinal edges of the retention pattern. These two longitudinal edges define the exterior of at least one retention pattern.

[0249] In one example, the base comprises two longitudinal end edges defining the outer periphery of the restraint device. The two longitudinal end edges may be straight or non-straight.

[0250] In one example, each retention area is delimited by a continuous (peripheral) boundary, forming a retention area perimeter. The perimeter P of the retention pattern corresponds to the perimeter of the retention area when the retention pattern comprises a single retention area, or to the sum of the perimeters of the retention areas when the retention pattern comprises multiple retention areas.

[0251] In one example, the two longitudinal edges of the restraint pattern are straight.

[0252] According to one example, the two transverse end edges of the base extend in a direction that is secant to the first direction and / or the second direction, in particular a direction that is perpendicular to the first or second direction.

[0253] According to one example, the two transverse edges of the restraint pattern extend in a direction that is secant to the first direction and / or the second direction, including a direction that is perpendicular to the first or second direction.

[0254] According to an example, the isosurface coefficient Qisos is less than or equal to 800%, in particular less than or equal to 700%, in particular less than or equal to 600%.

[0255] As an example, in the retention pattern, the ratio between the area of ​​the retention zone, or the sum of the areas of the retention zones, and the total area of ​​the first face of the base delimited by the first longitudinal edge, the second longitudinal edge and the two transverse edges is greater than or equal to 50% and less than 100%.

[0256] According to one example, the total surface area of ​​the first face of the base delimited by the first longitudinal edge, the second longitudinal edge and the two transverse edges forms a square or a smallest rectangle in which the restraint pattern is inscribed.

[0257] For example, consider an isoperimetric coefficient Qi SO p = (S / Sref) x 100, where S is the area of ​​at least one retention pattern, and S ref being a reference surface corresponding to a surface of a disk having the same perimeter as the at least one retention pattern, the at least one retention pattern has an isoperimetric coefficient Qisop which is greater than 1% and less than 50%.

[0258] The features of the invention can be combined with the features according to the previous aspects of the invention.

[0259] According to a seventh aspect, which is itself an invention independently of the other aspects of the invention, but which can be favorably implemented in combination with at least one of them, the invention relates to a retaining device comprising a base extending in a first direction and a second direction, perpendicular to the first direction, and retaining elements extending from a first face of the base in a third direction, perpendicular to the first and second directions, the retaining elements each comprising a rod.

[0260] The base includes at least one retention pattern comprising one or more retention area(s) equipped with retention elements, and at least one area without retention elements.

[0261] The restraint pattern is delimited by two opposing longitudinal edges extending along the first direction, including a first longitudinal edge and a second longitudinal edge, and by two opposing transverse edges, in particular extending along the second direction, including a first transverse edge and a second transverse edge.

[0262] Let Qi be an isoperimetric coefficient SO p = (S / Sref) x 100, where S is the area of ​​at least one retention pattern, and S re f being a reference surface corresponding to a surface of a disk having the same perimeter as the at least one retention pattern, the at least one retention pattern has an isoperimetric coefficient Qisop which is greater than 1% and less than 50%.

[0263] The invention makes it possible to increase the flexibility of the restraint device while maximizing gripping performance due to the largest possible gripping surface for the same surface area of ​​the restraint device.

[0264] On the retention system, creating retention patterns by removing retention zones—that is, by forming strips or lines of areas without retention elements—results in retention patterns with larger perimeters. This adds flexibility to the product because material is removed and areas of weakness are created.

[0265] The isoperimetric coefficient is representative of the flexibility and gripping performance of restraint devices and therefore makes it easier to compare restraint devices with each other.

[0266] The term "longitudinal" is used generally and is not linked to a particular base shape, which could be rectangular, square, or trapezoidal, for example. Thus, depending on the restraint system in question and / or the application in which the restraint system is used, "longitudinal" can be the greatest length of the base, for example, the greatest length of the base parallel to the machine direction or the transverse direction of the application in question. The term "transverse" is generally used to mean perpendicular to "longitudinal".

[0267] According to one example, the at least two retention areas are distinct.

[0268] In one example, at least one retention pattern, and in particular the retention zone(s), are delimited (bounded or bounded) by two longitudinal edges. These two longitudinal edges are adjacent to the retention pattern and outside of it.

[0269] In one example, the base comprises two longitudinal end edges defining the outer periphery of the base, or in some cases, the outer periphery of the restraint device. In another example, the two longitudinal end edges may be straight or non-straight.

[0270] The two longitudinal edges of at least one retention pattern and the two transverse edges of at least one retention pattern delimit the external periphery of the retention pattern.

[0271] In one example, the two longitudinal edges of the retaining pattern and the two transverse edges of the retaining pattern are straight. In another example, the angle formed between a longitudinal edge and a transverse edge is 90 degrees.

[0272] In one example, each containment area is delimited by a continuous (peripheral) boundary, forming a containment area perimeter and a containment area surface. The perimeter P of the containment pattern corresponds to the perimeter of the containment area when the containment pattern comprises a single containment area, or to the sum of the perimeters of the containment areas when the containment pattern comprises multiple containment areas. The surface S of the containment pattern corresponds either to the surface area of ​​the containment area when the containment pattern comprises a single containment area, or to the sum of the surfaces of the retention zones when the reason for retention includes multiple retention zones.

[0273] According to one example, the two longitudinal edges of at least one restraint pattern are straight.

[0274] The two transverse end edges of the base extend in a direction that is secant to the first direction and / or the second direction, in particular a direction that is perpendicular to the first or second direction.

[0275] According to one example, the two transverse edges of the restraint pattern extend in a direction that is secant to the first direction and / or the second direction, including a direction that is perpendicular to the first or second direction.

[0276] The features of the invention can be combined with the features according to the previous aspects of the invention. Brief description of the drawings

[0277] The invention and its advantages will be better understood upon reading the detailed description below of various embodiments of the invention given by way of non-limiting examples.

[0278] [Fig. 1] Figure 1 is a schematic view of a restraint device according to one aspect of the invention;

[0279] [Fig. 2] Figure 2 is a schematic view of a restraint device according to another aspect of the invention;

[0280] [Fig. 3] Figure 3 is a schematic view of a ribbon comprising retaining devices according to another aspect of the invention;

[0281] [Fig. 4] Figure 4 is a representation of a device of molding comprising a molding strip according to one aspect of the invention;

[0282] [Fig. 5] Figure 5 is a detailed schematic sectional view of a portion of the molding strip of Figure 4;

[0283] [Fig. 6] Figure 6 is a detailed schematic sectional view of a portion of the molding strip according to another aspect of the invention;

[0284] [Fig. 7] Figure 7 is an enlarged schematic top view of a restraint device comprising restraint elements and intermediate elements;

[0285] [Fig. 8] Figure 8 is a schematic cross-sectional view of a restraint device similar to that in Figure 7;

[0286] [Fig. 9] Figure 9 is another schematic cross-sectional view of a restraint device similar to that in Figure 7;

[0287] [Fig. 10] Figure 10 is a schematic view of a restraint device comprising patterns and transverse portions devoid of restraint elements, according to another aspect of the invention;

[0288] [Fig. 10A] Figure 10A is a schematic view of another restraint device according to a variant embodiment of the restraint device of Figure 10;

[0289] [Fig. 11] Figure 11 is a schematic view of a restraint device comprising patterns and transverse portions devoid of restraint elements, according to another example;

[0290] [Fig. 12] Figure 12 is a schematic view of a restraint device including transverse portions without restraint elements, according to another example;

[0291] [Fig. 13] Figure 13 is a schematic view of a restraint device comprising a restraint zone comprising at least one continuous portion, according to another aspect of the invention;

[0292] [Fig. 14] Figure 14 is a schematic view of a restraint device comprising a restraint zone including at least one continuous portion, according to another example.

[0293] Across all figures, common elements are identified by identical numerical references. Description of the implementation methods

[0294] Figure 1 schematically represents a restraint device 1 comprising a base 2 having a first upper face 3A, a second upper face 3B, and a lower face 4, opposite the upper faces 3A and 3B. The base 2 extends along a first direction X, which may correspond to a machine direction MD as described later. The base 2 has a width defined along a second direction Y, perpendicular to the first direction X, and which may correspond to a transverse direction CD, perpendicular to the machine direction MD.

[0295] The base 2 comprises at least a first zone 7A provided with retaining elements 5 and at least a second zone 7B without retaining elements 5. The retaining elements 5 extend from the first upper face 3A of the base 2 into the first zone 7A along a third direction Z which is perpendicular to the first direction X and the second direction Y and each comprise a rod 6. The second upper face 3B in the second zone 7B is without retaining elements 5.

[0296] The retaining elements 5 can be perpendicular or inclined with respect to the first upper face 3A.

[0297] The statement "the restraint elements 5 extend along a third direction Z" means that the restraint elements extend predominantly along a component parallel to the third direction Z. In other words, the largest dimension of the restraint elements extends along a component parallel to the third direction Z.

[0298] The base 2 and the retaining elements 5 are typically made of a thermoplastic material, for example, a non-elastic thermoplastic. The base 2 and the retaining elements 5 are made of a material such that it can be stretched under a tensile force applied in a given direction without substantially returning to its original shape and dimensions after the tensile force is released. In some cases, the base 2 breaks under the effect of a tensile force. For example, this is a material forming the base 2 and / or the retaining elements 5 which retain a residual deformation or set after elongation and release (residual deformation also called "permanent set" or "SET") greater than or equal to 20%, preferably greater than or equal to 30%, of its initial dimension (before elongation) for an elongation of 100% of its initial dimension, at room temperature (23°C). The SET can be measured as indicated in European patent application publication no. EP1783257, the content of which is incorporated by reference, and in particular in paragraphs

[0056] to

[0062] of European patent application publication no. EP1783257, which details an example of SET measurement.

[0299] In some cases, the retaining elements can be made of a thermoplastic material, for example an elastic thermoplastic material.

[0300] The retaining device 1 can be manufactured, for example, using a molding apparatus 100 as shown in Figure 4. The molding apparatus 100 makes it possible to manufacture a ribbon 26 comprising several retaining devices 1, as illustrated in Figure 3. The ribbon 26 can then be cut or subdivided into a plurality of retaining devices 1. This example shows a portion of ribbon 26 comprising four retaining devices 1. The ribbon 26 can be cut along a first cutting line 28 extending along the first direction X and along a second cutting line 29 extending along the second direction Y.

[0301] The ribbon 26 comprises the base 2, a plurality of first zones 7A provided with retaining elements 5 and a second zone 7B without retaining elements 5 surrounding the first zones 7A. In the embodiment of Figure 3, the retaining elements 5 are hooks, each hook comprising a shank 6 surmounted by a head 10.

[0302] Base 2 has a first thickness El measured along the third direction Z in the first zone 7A and a second thickness E2 measured along the third direction Z in the second zone 7B which is less than the thickness El. The first thickness El is measured between the lower face 4 and the first upper face 3A of the base 2. The second thickness E2 is measured between the lower face 4 and the second upper face 3B of the base 2. The first thickness El and the second thickness E2 can be obtained respectively by performing an average, for example an average of 5 local and individual thickness measurements.

[0303] In the example, the first upper face 3A, the second upper face 3B, and the lower face 4 are substantially parallel to a plane formed by the first direction X and the second direction Y when the retaining device 1 is placed on a flat surface. In an alternative embodiment, the second upper face 3B could have a variable thickness and / or form local undulations.

[0304] The first upper face 3A is offset from the second upper face 3B along the third direction Z so as to form a step 12 between the first and second upper faces 3A, 3B. The step 12 has a non-zero thickness E, with E = E1-E2. In other words, the first upper face 3A of the base 2 includes an extra thickness that projects from the second upper face 3B.

[0305] The step 12 includes a riser 31 connecting the first upper face 3A to the second upper face 3B. The riser 31 extends in a general direction that is perpendicular or inclined with respect to the first upper face 3A and / or the second upper face 3B. The riser 31 may be smooth or have raised features.

[0306] In one example, the riser 31 extends in a general direction forming an angle between 0 and 60 degrees with respect to a direction parallel to the third direction Z and passing through the foot of the riser 31, specifically an angle between 1 and 45 degrees. In another example, the tread 12 and the riser 31 form an acute or obtuse angle.

[0307] According to another example, the first upper face 3A can be inclined relative to the second upper face 3B and / or the lower face 4.

[0308] According to another example, the second upper face 3 B can be inclined relative to the lower face 4.

[0309] According to one example, the base lacks an inverted U-shaped rib completely surrounding the first zone 7A equipped with a retaining element 5.

[0310] The first thickness El is less than or equal to 360 pm or less than or equal to 300 pm, in particular less than or equal to 200 pm, 150 pm, 140 pm, 130 pm, 120 pm, 110 pm, in particular less than or equal to 100 pm, in particular less than or equal to 90 pm, in particular less than or equal to 85 pm, 80 pm, 75 pm or 70 pm, in particular less than or equal to 65 pm and / or greater than or equal to 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 15 pm, 20 pm or 30 pm.

[0311] The second thickness E2 is less than or equal to 200 pm, 120 pm, 110 pm, 100 pm, 90 pm, in particular less than or equal to 80 pm, 75 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than or equal to 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm.

[0312] The ratio RI =(E1-E2) / E1 is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0313] For example, for an RI ratio greater than or equal to 0.1 and a thickness El of 80 pm, E2 is less than or equal to 72 pm and the value of E=E1-E2 is greater than or equal to 8 pm, E corresponding to the thickness of step 12.

[0314] For an RI ratio greater than or equal to 0.2 and an El thickness of 80 pm, E2 is less than or equal to 64 pm and the value of E=E1-E2 is greater than or equal to 16 pm.

[0315] For an RI ratio greater than or equal to 0.3 and an El thickness of 80 pm, E2 is less than or equal to 56 pm and the value of E=E1-E2 is greater than or equal to 24 pm.

[0316] For example, the first thickness E1 could be equal to 62.3 pm and the second thickness E2 could be equal to 37.6 pm. The RI ratio is then 0.397 and the value of E=E1-E2 is 24.7 pm.

[0317] For example, the first thickness E1 could be equal to 62.3 pm and the second thickness E2 could be equal to 39.03 pm. The RI ratio is then 0.374 37.4% and the value of E=E1-E2 is 23.27 pm.

[0318] For example, the first thickness E1 could be equal to 10 pm and the second thickness E2 could be equal to 5 pm. The RI ratio is then 0.5 and the value of E=E1-E2 is 5 pm.

[0319] In some applications, the RI ratio is greater than or equal to 0.1 and strictly less than or equal to 0.2. In such a case, it is possible to obtain a base 2 with improved flexibility and / or suppleness compared to a prior art base while reducing the amount of material used without making the retaining device too flexible and / or too supple for applications requiring a certain rigidity for the proper functioning of the retaining device.

[0320] The second zone 7B extends over a distance d2, extending between two first zones 7A or between a first zone 7A and the edge of the base 2 along the first direction X, which is greater than a distance dl, separating two adjacent restraint elements 5 in the first direction X and / or the second zone 7B extends over a distance d3, extending between two first zones 7A or between a first zone 7A and the edge of the base 2 along the second direction Y, which is greater than a distance d4, separating two adjacent restraint elements 5 in the second direction Y.

[0321] Preferably d2 > 2 x dl, even more preferably d2 > 5 x dl and advantageously d2 > 10 x dl.

[0322] Preferably d3 > 2 x d4, even more preferably d3 > 5 x d4 and advantageously d3 > 10 x d4.

[0323] Preferably d3 > 2 x dl, even more preferably d3 > 5 x dl and advantageously d3 > 10 x dl.

[0324] Preferably d2 > 2 x d4, even more preferably d2 > 5 x d4 and advantageously d2 > 10 x d4.

[0325] With such values ​​d2 and d4, the second zone 7B can extend over a sufficiently large distance to increase the flexibility and suppleness of the tape and / or retaining device in the first X direction and / or the second Y direction to better position itself to cooperate with a counterpart for example, and also to facilitate its winding into a roll and / or facilitate cutting between two retaining devices, for example due to the reduced thickness and / or facilitate identification of the area to be cut.

[0326] For example, when comparing dl and / or d2 and / or d3 and / or d4, the respective values ​​of dl, d2, d3, and / or d4 taken in the corresponding direction are compared, not the projection in another direction. For instance, when comparing d3 and dl, the value of d3 obtained in the second direction Y is compared with the value of dl obtained in the first direction X.

[0327] According to an example, the values ​​used of dl and / or d2 and / or d3 and / or d4 can be minimum and / or average and / or maximum values.

[0328] The second zone 7B (or the projection of the second zone onto a line parallel to the second Y direction) extends in the second Y direction over at least 50%, 60%, 70%, 80% or preferably 90% of the width of base 2. In some cases, the second zone 7B extends in the second Y direction over less than 100% of the width of base 2.

[0329] The second zone 7B extends in the first direction X, between two first zones 7A or between a first zone 7A and the edge of base 2, by at least 5% of the dimension of a first zone 7A in the first direction X. In other words, d2 is equal to at least 5% of a dimension of a first zone 7A in the first direction X, specifically the maximum dimension of a first zone 7A in the first direction X. This allows for a second zone 7B of lesser thickness between two first zones 7A or between a first zone 7A and the edge of base 2 that is sufficiently Important to ensure sufficient flexibility for winding the tape 26 and to allow easy cutting in the second zone 7B along the second direction Y and / or to reduce or eliminate the appearance of red marks and / or irritation if the base 2 comes into contact with the skin, for example, the skin of adults, children, and / or infants. In particular, the retaining device is less abrasive to the touch after a cut made in the second zone, which lacks a retaining element.

[0330] Alternatively, the second zone 7B extends, between two first zones 7A, in the first direction X by at least 2%, preferably by at least 5% and even more preferably by at least 10% of a dimension of a first zone 7A along the first direction X, in particular the maximum dimension of a first zone 7A in the first direction X. This makes it possible to further improve the flexibility of the tape 26 and / or the retaining device, and / or facilitate cutting between two retaining devices for example due to the reduced thickness and / or facilitate the identification of the area to be cut.

[0331] The second zone 7B extends, between two first zones 7A, in the first direction X over a distance less than or equal to 70%, in particular less than or equal to 50%, in particular less than or equal to 40%, and preferably less than or equal to 30% of the distance of a first zone 7A in the first direction X.

[0332] The retaining device 1 is manufactured by a molding / extrusion process described later, and preferably exclusively by a molding / extrusion process. The base 2 and the retaining elements 5 are integral, or the base and retaining elements are "integral" according to the English designation. For example, the base and the retaining elements form a contiguous mass of resin. The raised section and / or step 12 is formed directly in the base 2 during the molding / extrusion operation without any subsequent cutting or planing operation to form the second zone(s) 7B.

[0333] The second zone 7B, which lacks retaining elements, is formed by extrusion or, in other words, has not undergone (or lacks) a retaining element removal operation, for example, has not undergone (or lacks) a hook removal operation. The formation of the first zone 7A and the second zone 7B is carried out simultaneously.

[0334] The first upper face 3A and / or the second upper face 3B of the base 2 is produced by extrusion or in other words has not undergone (or is devoid of) an additional operation after extrusion or, put another way, is produced directly by extrusion.

[0335] Base 2 exhibits a similar material density in the first and second zones 7A, 7B.

[0336] For example, base 2 and step 12 are integral and produced by extrusion, specifically as a single unit and directly from extrusion. For instance, the base and step are "integral," according to the English term. For example, the base and step form a contiguous mass of resin.

[0337] According to an example, the base 2 of the retaining device 1 includes a straight edge which extends parallel to the machine direction MD. The edge of the base 2 is such that the maximum deviation along a direction parallel to the transverse direction CD varies along the machine direction MD, between hills and valleys formed along the edge of the base 2 is less than or equal to 3.0 mm, or more precisely less than or equal to 2.0 mm, or even more precisely less than or equal to 1.0 mm, or even between 0.001 mm and 1.0 mm, more particularly between 0.001 mm and 0.5 mm, even more particularly between 0.001 mm and 0.1 mm. Obtaining edges of the base that can thus be described as "straight" is advantageous in that it makes it possible to avoid a subsequent step of rectifying the edges, for example via a cutting step, such straight edges being perceived by the user as a sign of product quality.Furthermore, the equipment and process used make it possible to obtain such straight edges without requiring the formation of a longitudinal overthickness at the edge of the ribbon, such an overthickness having no functional interest.

[0338] Base 2 is preferably devoid of through openings or recesses in the second zones 7B devoid of retaining elements 5. Base 2 typically has a constant width.

[0339] In the embodiment of Figures 2 and 3, the retaining device 1 includes a support layer 8 connected to the lower face 4 of the base 2.

[0340] The support layer 8 can be in the form of a non-woven strip, a thermoplastic film, or a woven strip. For example, the base 2 can be overmolded onto the support layer, which can be the non-woven strip. The base 2 can also be bonded to the non-woven strip by adding one or more adhesives, or welded using vibrational energy, for example, by ultrasound, or hot-laminated.

[0341] Alternatively, the retaining elements 5 can be made entirely with the support layer 8, the support layer 8 thus forming the base 2. According to one example, the retaining elements 5 are formed entirely with the support layer 8 by vibratory energy, for example by ultrasound, and / or calendering.

[0342] The first and second zones 7A, 7B are adjacent along the first direction X and / or the second direction Y. The restraint device 1 comprises an alternation of first and second zones 7A, 7B in the first direction X and / or the second direction Y.

[0343] In the example of figures 1 and 2, the first and second zones 7A, 7B are adjacent and alternate along the first direction X. Alternatively, the first and second zones 7A, 7B could be adjacent and alternate along the second direction Y.

[0344] In this example of figures 1 and 2, the base 2 includes at least a second zone 7B positioned between two first zones 7A.

[0345] Alternatively, base 2 includes at least one first zone 7A positioned between two second zones 7B.

[0346] Alternatively, the second zone 7B completely surrounds the first zone(s) 7A and / or the first zone 7B completely surrounds the second zone(s).

[0347] According to an example, the containment system may include between 1 and 10 first zones 7A and / or between 1 and 10 second zones 7B, in particular between 2 and 10 first zones 7A and / or between 2 and 10 second zones 7B, the zones being able to have a different or identical shape and / or thickness and / or density and / or arrangement and / or size and / or composition of containment elements 5.

[0348] According to one example, the first zone 7A of the restraint system has a surface area greater than or equal to 1 mm 2 , in particular greater than or equal to 5 mm 2 and / or less than or equal to 10,000 mm 2 , in particular less than or equal to 5,000 mm 2 .

[0349] According to one example, the second zone 7B of the restraint system has a surface area greater than or equal to 1 mm 2 , in particular greater than or equal to 5 mm 2 and / or less than or equal to 10,000 mm 2 , in particular less than or equal to 5,000 mm 2 .

[0350] The example in Figure 3 shows a portion of ribbon 26 comprising four initial zones 7A, of which two initial zones 7A are adjacent along the first direction X and two initial zones 7A are adjacent along the second direction Y. Each of the four initial zones 7A is surrounded by a second zone 7B. The ribbon 26 potentially includes four retaining devices 1, which will be obtained during a subsequent cutting step.

[0351] The second zone 7B is continuous and forms a single second zone 7B. The first zones 7A form islands on the second zone 7B.

[0352] Alternatively, the first zone 7A is continuous and forms a single first zone 7A. The second zones form islands on the first zone.

[0353] Base 2 is supported by a support layer 8 formed by a non-woven material.

[0354] The base 2 formed on the ribbon 26 comprises two opposing transverse outer edges 9a, 9b parallel to the first direction X, and one longitudinal outer edge 11b parallel to the second direction Y. The two edges External transverse 9a, 9b and the external longitudinal edge 11b partially delimit ribbon 26 and the second zone 7B.

[0355] Each first zone 7A is delimited by a border or step 12 comprising a riser 31 connecting the first upper face 3A to the second upper face 3B and extending generally perpendicularly with respect to the second upper face 3B of the second zone 7B.

[0356] A first portion 7B1 of the second zone 7B extends over a distance d3 between the first external transverse edge 9a and the border 12 of one of the first zones 7A, following the second direction Y.

[0357] A second portion 7B2 of the second zone 7B extends over a distance d3' between two successive first zones 7A, following the second direction Y.

[0358] A third portion 7B3 of the second zone 7B extends over a distance d3" between the edge 12 of another first zone 7A and the second external transverse edge 9b, along the second direction Y.

[0359] The distances d3, d3' and d3" are different in this example.

[0360] Alternatively, the distances d3, d3' and d3" can be identical or different from those shown in Figure 3.

[0361] A fourth portion 7B4 of the second zone 7B extends over a distance d2 between two successive first zones 7A, following the first direction X.

[0362] Fifth portions 7B5 of the second zone 7B extend over a distance d2' between each border 12 of the first two zones 7A and the outer longitudinal border 11b, along the first direction X.

[0363] As explained previously, the ribbon 26 can be cut in the second portion 7B2 of the second zone 7B, along a first cutting line 28 extending along the first direction X. This cutting line can be straight as shown in Figure 3 or have another shape, for example in the form of a regular undulation, for example in the form of a sinusoid or an equivalent shape.

[0364] According to one example, the second portion 7B2 forms a gripping area for a user of the restraint device arranged on an application, for example for an application of the type of hygiene article or absorbent article.

[0365] The ribbon 26 can also be cut in the fourth portion 7B4 of the second zone 7B, along a second cutting line 29 extending along the second direction Y. This cutting line can be straight as shown in Figure 3 or have another shape, for example in the form of a regular undulation, for example in the form of a sinusoid or an equivalent shape.

[0366] The distances d2 and d2' are different in this example. According to one example, d2 is approximately equal to 2 x d2'.

[0367] The reduction in thickness in these second and fourth portions 7B2, 7B4 separating two successive first zones 7A and a distance between two successive first zones 7A which is greater than four times the distance between two retaining elements 5 along the first direction X, and / or the second direction Y make it easier to cut.

[0368] The ratio of the width of the first zone 7A to the width of the second zone 7B along the second direction Y is less than or equal to 1, in particular strictly less than 1, in particular less than or equal to 0.9, 0.8, 0.7, 0.6.

[0369] Preferably, the lower face 4 has a continuous surface which may be flat or have a repeating pattern.

[0370] Preferably, the lower face 4 extends substantially in a single plane extending along the first direction X and the second direction Y.

[0371] The second upper face 3B in the second zone 7B is flat and / or regular. For example, the second upper face 3B in the second zone 7B is at least as flat and / or regular as the first upper face 3A in the first zone 7A. For example, the second upper face 3B in the second zone 7B is flatter and / or more regular than the first upper face 3A in the first zone 7A.

[0372] According to one example, the retaining elements 5 being arranged in a regular pattern, the retaining device 1 comprises raised elements (not shown in the figures) arranged (in particular exclusively arranged) on the second upper face 3B in the second zone 7B. The raised elements are not retaining elements 5, and the raised elements are arranged in a "Pitch" (or arrangement) such that A1=B1 to within 15%, in particular 10%, with A1 being the distance, in a first direction between two centers of two successive retaining elements 5, and B1 being the distance, in the first direction, between two centers of two successive raised elements.

[0373] According to an example, the 5 restraint elements and the relief elements are such that the ratio of the maximum heights along the third direction Z of a relief element to a 5 restraint element is less than or equal to 10%, in particular less than or equal to 7% and / or greater than or equal to 0.1%.

[0374] The first thickness El in the first zone 7A and the second thickness E2 in the second zone 7B are substantially constant.

[0375] The retaining elements 5 may possibly form a pattern in the first zone 7A.

[0376] Alternatively, one or more first zones 7A may be included, partially or entirely, in one or more second zones 7B and / or one or more second zones 7B may be included, partially or entirely, in one or more first zones 7A.

[0377] Alternatively, the first thickness El in the first zone 7A and / or the second thickness E2 in the second zone 7B can vary. Varying the first thickness El allows for the formation of sub-patterns in the first zone 7A, for example, which may themselves form a pattern.

[0378] Alternatively, base 2 includes a first basis weight G1 in the first zone 7A and a second basis weight G2 in the second zone 7B. The ratio (G1-G2) / G1 is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or less than 1.0, in particular less than or equal to 0.8.

[0379] For example, when the support layer 8 is a non-woven, it can interpenetrate the base 2. The second layer E2 in the second zone 7B is partially or fully included in the thickness of the support layer 8. When the second layer E2 in the second zone 7B is fully included in the support layer 8, the second upper face 3B of the base 2 is flush with the upper surface 13 of the support layer 8 which at least partially surrounds the base 2.

[0380] Alternatively, at least 10% of the second upper face 3B of the base 2 is flush with the upper surface of the support layer 8, in particular without being completely included in the support layer 8.

[0381] Alternatively, the containment system 1 may include at least two initial zones 7A equipped with containment elements that are distinct, for example, in shape and / or thickness and / or density and / or arrangement and / or size and / or composition of the containment elements 5. The containment system 1 may include at least 3, 4, or 5 initial zones 7A equipped with containment elements that are distinct.

[0382] Alternatively, the restraint system 1 may comprise at least two first zones 7A equipped with restraint elements that are distinct and at least two second zones 7B without restraint elements that are distinct. "Distinct" means that the zones differ in their shapes and / or thicknesses and / or densities and / or surfaces and / or are arranged at two opposite ends of the restraint system along the first direction X and / or along the second direction Y.

[0383] Alternatively, the restraint system 1 may include first zones 7A equipped with similar restraint elements and at least two second zones 7B without restraint elements, or three, four or more second zones 7B which may be distinct or identical.

[0384] The second upper face 3 B of the base 2 can be substantially flat or planar, for example without any asperities perceptible to the touch.

[0385] The lower face 4 at the level of the second zone 7B has a different appearance, which is noticeably flat for example, compared to the upper face 3B of the base 2.

[0386] In this application, heights and thicknesses are typically observed from a photo obtained with a digital microscope from Keyence Corporation under the reference "VHX 6000", at an appropriate magnification, for example a magnification of X500. The measurements are obtained with the image analysis software of the digital microscope.

[0387] Figure 4 represents a molding apparatus 100 for manufacturing tapes 26 of restraint devices 1. Such a molding apparatus 100 and a manufacturing process is described in document WO2021116613.

[0388] In this example, the molding apparatus 100 includes a molding device 101 which is formed by a molding strip 102 positioned on rotating drive means 104A, 104B comprising a first roller 104A and a second roller 104B, a material distribution means 106, arranged to inject molding material, for example thermoplastic, onto the external face of the molding strip.

[0389] The assembly formed by the molding strip 102 and the rotational drive means 104A, 104B thus forms the molding apparatus 100.

[0390] Machine direction MD means the direction of movement of the molding strip 102 in the molding device 100 during the manufacture of the retaining device 1, in accordance with the English acronym for "Machine Direction", and cross direction CD means the direction perpendicular to the machine direction MD.

[0391] The illustrated example, comprising two rollers 104A and 104B, is not limiting; the number and arrangement of the roller(s) may vary, particularly to adapt to the length of the molding strip 102 and the different stations of the molding machine 100. For example, three rollers or even just one could be used, such that the molding strip 102 is arranged around the periphery of the single roller to form a sleeve or a "screen" according to the commonly used English language designations. In particular, only one of the two rollers can be driven in rotation by motorized means, for example a first roller 104A, a second roller 104B being free, that is to say without motorized means, and driven in rotation via the molding belt 102, itself driven by the first roller 104A.

[0392] The molding strip 102 as presented comprises an inner face 102A and an outer face 102B, 102E, the inner face 102A being in contact with the rotating drive means 104A, 104B.

[0393] The material distribution means 106 is arranged to inject molding material onto the external face 102B, 102E of the molding strip 102.

[0394] More specifically, the material distribution means 106 is arranged opposite the outer face 102B, 102E of the molding strip 102, spaced from the molding strip 102 so as to define an air gap e indicated in figure 4. The limit of the material injected on the outer face 102B, 102E of the molding strip 102 is identified by the reference C, corresponding to the rear front of the material injected on the molding strip 102 with respect to the direction of movement of the molding strip 102.

[0395] In the example, the molding strip 102 includes a first molding zone A having open cavities 102C so as to define, from a first external face 102B, molding cavities for the formation of retaining elements and / or preforms of retaining elements and a second molding zone B without open cavities 102C.

[0396] The molding strip 102 includes an offset zone 108 in the second molding zone B, as illustrated in Figures 4 and 5. Only one offset zone 108 is shown in Figure 4 as an example and for ease of representation. The molding strip 102 may include several offset zones 108.

[0397] The molding strip 102 also includes a second external face 102E in the second molding zone B which is offset from the first external face 102B along the third direction Z.

[0398] The second external face 102E corresponds to the external face of the offset zone 108.

[0399] The first external face 102B and the second external face 102E can be substantially parallel or inclined with respect to each other when the molding strip 102 is placed on a flat surface parallel to a plane formed by the machine direction MD and the transverse direction CD.

[0400] The molding strip 102 has a first thickness Ebl measured along the third direction Z between the inner face 102A and the first outer face 102B, in the first molding zone A, and a second thickness Eb2 measured along the third direction Z between the inner face 102A and the second outer face 102E, in the second molding zone B, which is greater than the first thickness Ebl.

[0401] The offset zone 108 has a thickness Eb3=Eb2-Ebl which is less than or equal to 250 pm, less than or equal to 200 pm, in particular less than or equal to 150 pm, in particular less than or equal to 120 pm, in particular less than or equal to 81 pm, 76.5 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than or equal to 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 20 pm, in particular greater than or equal to 40 pm.

[0402] For example, Ebl could be equal to 330 micrometers and Eb2 equal to 380 micrometers. Eb3 is then equal to 50 micrometers.

[0403] For example, Ebl could be equal to 220 micrometers and Eb2 equal to 380 micrometers. Eb3 is then equal to 160 micrometers.

[0404] For example, Ebl could be equal to 300 micrometers and Eb2 equal to 310 micrometers. Eb3 is then equal to 10 micrometers.

[0405] The molding strip 102 is provided with a plurality of open cavities 102C in the first molding zone A allowing the production of retaining elements 5 or preforms for the production of retaining elements 5, for example by a subsequent calendering operation or any other suitable operation, for example as described in application WO2017187096. Throughout the description, the term "retaining elements" will refer to retaining elements 5 or preforms for the production of retaining elements 5 intended to form a hook-and-loop fastener of the hook-and-loop or hook-and-loop type.

[0406] As an example, the retaining elements 5 may have a shape that is preferably chosen from the group consisting of hooks, for example T-shaped and / or inverted J-shaped, and / or inverted double J-shaped or mushroom-shaped, or cup-shaped fasteners (or "cup-shaped" according to the usual English designation), and / or a combination of these shapes.

[0407] The open cavities 102C are each typically formed so as to define a stem shape I extending from the outer face 102B, 102G to the inner face 102A of the molding strip 102 and a head shape 24 extending between the stem shape ZI and the inner face 102A of the molding strip 102.

[0408] The 102 molding strip typically has a thickness of between 100 and 1000 microns, or typically between 200 and 400 microns.

[0409] The molding strip 102 typically has a perimeter between 200 mm and 3000 mm, or typically between 400 mm and 2000 mm.

[0410] The molding strip 102 has a cavity density 102C greater than or equal to 50 cavities per cm 2 , typically greater than or equal to 100 cavities per cm 2 , in particular greater than or equal to 125 cavities per cm 2 and / or less than or equal to 3000 cavities per cm 2 , or typically less than or equal to 800 cavities per cm 2 , in particular less than or equal to 500 cavities per cm 2 .

[0411] It is thus understood that the arrangement of the open cavities 102C determines the arrangement of the retaining elements 5 on the retaining device 1 formed at with the aid of the molding device 100. The open cavities 102C are typically arranged in rows and columns, said rows and columns being arranged respectively along the transverse direction CD and the machine direction MD. Each row and column is composed of one or more open cavities 102C, where appropriate aligned along the transverse direction CD and the machine direction MD respectively.

[0412] Within the same row, successive open cavities 102C are typically spaced regularly according to a transverse interval. Within the same column, successive open cavities 102C are typically spaced regularly according to a machine interval. Alternatively, said rows are spaced regularly according to a first transverse interval and a second transverse interval, the second transverse interval not being an integer multiple of the first transverse interval and the first transverse interval being smaller than the second transverse interval, and / or said columns are spaced regularly according to a first machine interval and a second machine interval, the second machine interval not being an integer multiple of the first machine interval and the first machine interval being smaller than the second machine interval.

[0413] The rows and columns of open cavities 102C can be aligned, or arranged in a staggered pattern. More precisely, the different open cavities 102C can be arranged so as to be aligned along the transverse direction CD and along the machine direction MD, or be offset so as to form a staggered or honeycomb pattern, two successive rows or two successive columns then being offset respectively along the transverse direction CD and along the machine direction MD, by a step corresponding to half the transverse interval or half the machine interval respectively.

[0414] As will be seen later, it follows that the retaining elements 5 formed using these open cavities 102C are arranged in columns and rows, respectively along a primary direction and a secondary direction, typically corresponding to the machine direction MD and the transverse direction CD.

[0415] In the example illustrated in Figure 5, head shapes 24 of the open cavities 102C open through the inner face 102A of the molding strip 102 into the first zone A. The open cavities 102C are therefore through-cavities.

[0416] The offset zone 108 is formed by a masking layer 105. The open cavities 102C are not covered by the masking layer 105 in the first molding zone A. The second molding zone B of the molding strip 102 includes closed cavities 102D which are plugged or partially plugged by the masking layer 105 and therefore do not open through the external face of the molding strip 102.

[0417] The open cavities 102C may only contain stem forms 27 and no head forms 24.

[0418] The masking layer 105 is a resin deposited as a thin film in this example according to a process described below.

[0419] The portions of the open cavities 102C forming the rod shapes 27 typically extend along the third direction Z perpendicular to the external faces 102B, 102E of the molding strip 102. The portions of the open cavities 102C forming the rod shapes I typically have a cylindrical, hyperbolic shape, and / or include at least two opposite parallel faces, in particular at least two opposite parallel faces that are planar.

[0420] The portions of the open cavities 102C forming the head shapes 24 typically extend radially or transversely with respect to the third direction Z. The portions of the open cavities 102C forming the head shapes 24 typically have a substantially frustoconical, cylindrical or hexahedral shape.

[0421] The portions of the open cavities 102C forming the head shapes 24 can be linear or curved, for example to form portions curved towards the inner face 102A or towards the outer faces 102B, 102E of the molding strip 102 extending from the portions of the open cavities 102C forming the shapes of rods 27. The molding strip 102 may further have a shape such as those described in patent applications WO0213647 A2 and / or W00050208 A2 and / or W017109902 Al and / or W017110106 Al and / or WO17110127 Al and / or WO17110825 Al.

[0422] The molding strip 102 may have on its inner face 102A or on its outer faces 102B, 102E a particular texture such as scratches and / or grooves, for example extending mainly in the machine direction MD and / or the transverse direction CD, and / or a network of grooves and / or a network of passages forming vents or studs, or be substantially smooth.

[0423] The molding strip 102 can be formed by layering several strips, and is therefore not necessarily a single piece or made of a single material. The molding strip 102 can be composed of one or more materials or composites, typically metallic such as Ni (Nickel), Cu (Copper), Inox (Stainless Steel), or any other suitable material.

[0424] The material distribution means 106 is typically arranged to carry out the injection of molding material into the molding strip 102 in a section of the molding strip 102 where the latter is in contact with a drive roller, in this case the first roller 104A in the example shown in Figure 4. The first roller 104A then forms a bottom for the open cavities 102C.

[0425] The open cavities 102C in the molding strip 102 can be created by an ablation process, for example a chemical etching process and / or by using a laser in the areas where retention elements 5 are to be formed, and / or by an additive growth process, for example electrochemical, for example using nickel. Alternatively, the molding strip 102 can be made with open cavities 102C distributed uniformly across its entire length, and the open cavities 102C can then be filled in the areas where a second zone 7B without retention elements is to be formed, as explained below.

[0426] More specifically, in order to be able to define different configurations in the arrangement of the retaining elements 5 and thus define a ribbon 26 and / or a retaining device 1 having retaining elements 5 arranged to form patterns, the molding strip 102 has open cavities 102C having a configuration similar to that of the retaining elements 5. The open cavities 102C are formed directly in the molding strip 102, in the material forming the molding strip 102.

[0427] However, it is understood that creating open cavities 102C in the molding strip 102 is complex, particularly in the case of a non-uniform distribution. Furthermore, such molding strips are dedicated exclusively to the production of retention devices according to the specific arrangement of open cavities, and it is technically and economically difficult, if not impossible, to reuse them to create other specific arrangements.

[0428] Cavities 102C, 102D can thus be uniformly formed on the molding strip 102. Then, some of the cavities 102C, 102D thus formed can be at least partially sealed to create closed cavities 102D in the second molding zone B, while another portion of the cavities 102C are left unsealed to form open cavities 102C in the first molding zone A, as explained previously. Such total or partial sealing of some of the cavities 102C, 102D thus allows us to define two subsets of cavities: functional cavities (open cavities 102C) and non-functional cavities (closed cavities 102D).

[0429] Functional cavities are defined as cavities that can be filled with molding material so as to form, directly after demolding, retention elements 5 or preforms of retention elements which are processed after demolding to form retention elements 5.

[0430] Non-functional cavities are defined as cavities that have been totally or partially blocked, so that the molding material cannot fully penetrate them to form retaining elements or preforms of complete retaining elements. It is understood, however, that due to possible material shrinkage, non-functional cavities may cause irregularities in the formation of the retaining device 5, these irregularities having, however, a smaller dimension compared to the retaining elements 5 or the preforms formed by the functional cavities, typically a dimension along a direction perpendicular to the first external face 102B of the base 2 at least 5 times smaller.

[0431] The material used to achieve such total or partial sealing of a portion of the cavities 102C, 102D and to form the offset zone 108 is a covering material, typically distinct from the injection material and / or distinct from the material in which the molding cavities are formed, for example, a material having a heat deflection temperature (HDT) at least 20°C above that of the molding material (or the material of the retaining device). The covering material is, for example, a resin or a film. In one example, the melting temperature of the retaining device material is lower, in particular at least 20°C lower, than the melting temperature of the covering material (or the masking layer material), in particular that of the film.The masking layer 105 can be formed in one layer of cover material, or in several layers of cover material, typically between 2 and 20 layers for example deposited successively.

[0432] The molding strip 102 includes a molding support 111 having a first external support face 102F and a second external support face 102G.

[0433] According to an example of a method for preparing a molding strip 102, the external faces of the support 102F, 102G are partially covered by a masking layer 105 such that the first external face of the support 102F, corresponding to the first external face 102B of the molding strip 102, is not covered by the masking layer 105, and the second external face of the support 102G is covered by the masking layer 105. to form an offset zone 108 on the second external support face 102G and to close part of the cavities 102C, 102D. The external face of the offset zone 108 defines the second external face 102E of the molding strip 102.

[0434] According to one variant, the first and second external faces of support 102F, 102G of the molding support 111 are completely covered by the masking layer 105 so as to seal all the cavities 102C, 102D by the masking layer 105 and form an offset area 108 and / or an overthickness extending over the entire external face of support 102F, 102G.

[0435] A portion of the masking layer 105 is then removed from the first outer surface of the support 102F to form the first outer surface 102B and the open cavities 102C in the first molding zone A. The offset zone 108 is retained only in the second molding zone B, thus creating the closed cavities 102D. The outer surface of the offset zone 108 defines the second outer surface 102E of the molding strip 102, which thus overlaps the second outer surface of the support 102G of the molding support 111.

[0436] The masking layer 105 is removed at least in part, for example, by laser ablation.

[0437] As illustrated in Figure 5, the closed cavities 102D are at least partially blocked by the covering material of the masking layer 105. The open cavities 102C are through-holes.

[0438] Cavities 102C, 102D can have identical or distinct shapes, and can be arranged in different patterns.

[0439] Alternatively, the molding strip 102 comprises a succession of first molding zones A and second molding zones B allowing a strip 26 to be obtained comprising retaining devices 1 as described in the example in Figure 3.

[0440] According to one possible manufacturing process for a ribbon 26, material is injected onto the outer face of the support 102B, 102E of the molding strip 102 while filling the open cavities 102C, corresponding to the upstream front of the material injected onto the molding strip 102 with respect to the direction of movement of the molding strip 102.

[0441] Figure 4 shows the separation between the ribbon 26 and the molding strip 102 by reference D, this point corresponding for example to the level from which the base 2 of the ribbon 26 is no longer in contact with the molding strip 102. It may be provided that the ribbon 26 and / or the retaining device 1 and / or the molding strip 102 are mounted on a demolding roller 109, that is to say that the demolding roller 109 forms a lever on the ribbon 26 to facilitate the demolding of the preforms of retaining elements and / or the retaining elements.

[0442] The molding apparatus 100 may include an element, such as a scraper 110, positioned to scrape the inner face of the molding strip 102A to remove excess molding material as needed. Injection molding refers to the action of shaping a molding material by melting, for example, dispensing, filling, molding, injection, or extrusion.

[0443] The molding apparatus 100 presented previously and the associated process may also include means and a step for associating a support layer 8 in the form of a strip which may be a non-woven (or woven or film) strip to the base 2.

[0444] Such an association of a support layer 8 on a base 2 comprising retaining elements 5 is typically achieved by means of mechanical and / or chemical anchoring and / or via an adhesive, or via a fusion of the base 2 or of the support layer 8.

[0445] According to one example, in order to achieve such a bonding of a support layer 8, for example of non-woven material, to the base 2 of the retaining device 1, the molding apparatus 100 proposed may include non-woven strip drive means, adapted to provide a feed in the form of a strip and to apply the non-woven strip against the lower face 4 of the base 2 downstream of the material distribution means 106.

[0446] Preferably, the tape 26 is then cut at the location of the second band B zone(s) to obtain restraint devices 1 which will then attached, for example, to a diaper and / or an adult incontinence diaper or even "pants". The reduced thickness at the location of the second B band area(s) makes cutting easier.

[0447] Alternatively, the masking layer 105 may include several layers of resins such as from 2 to 18 layers of resins in order to increase the thickness Eb3 of the offset area 108 or any other number of resin layers between 2 and 18, each number in this range being incremented by 1.

[0448] The various resin layers may have a thickness greater than 3 micrometers, particularly greater than 30 micrometers, particularly greater than 60 micrometers, and / or less than 70 micrometers, particularly less than 60 micrometers, particularly less than 30 micrometers. In some cases, the resin layers may have the disadvantage of separating from the molding tape due to their fragility during use of the molding tape, for example, due to the stresses applied.

[0449] Alternatively or in combination, the molding strip can also be locally reinforced with a suitable material, in particular bronze and / or copper and / or tin and / or nickel to form the masking layer 105.

[0450] As an alternative or in combination, the preparation process for the molding strip 102 is based on a principle of differentiated growth, for example by electroforming.

[0451] The preparation process includes a first step of depositing metal such as nickel by electroforming in a localized manner on the molding support 111. The molding support 111 is then covered by rows formed of an alternation of nickel agglomerates and holes along the longitudinal MD and transverse CD directions.

[0452] This step is followed by a resin deposition step on a portion of the nickel agglomerate rows to form a resin layer masking the cavities intended to form the open cavities 102C in the first zone A. The thickness of the resin layer determines the thickness Eb3 of the offset zone. 108 which will be carried out later. The molding strip 102 includes cavities not covered by the resin layer and intended to form closed cavities 102D in the second zone B.

[0453] The preparation process then includes a second electroforming step to coat the rows of nickel agglomerates not covered by the resin and to seal the cavities not covered by the resin layer. The closed cavities 102D in the second zone B are thus obtained during this step. At this stage, all the cavities are therefore covered either by the resin layer or by the nickel layer.

[0454] The preparation process then includes a step of removing the resin layer, by laser ablation for example, to form the open cavities 102C in the first molding zone A.

[0455] Alternatively or in combination, the process for preparing the molding strip 102 includes a step of depositing a film, for example a capillary film, onto the molding support 111, for example based on a photosensitive emulsion pre-coated on a polyester and / or polyethylene film, for example a diazo photo film which, after cross-linking, ensures its fixation to the molding support 111. The application of the film, in particular the capillary film, can be local or over the entire external surface of the molding support 111. A removal step, by laser ablation for example, of the unwanted portions of the film is then applied so that the film covers only the second molding zone B and forms the offset zone.

[0456] The film, for example the capillary film, may comprise a thickness greater than or equal to 5 micrometers, in particular greater than or equal to 10 micrometers, in particular greater than or equal to 15 micrometers, and / or less than or equal to 700 micrometers, in particular less than or equal to 500 micrometers, in particular less than or equal to 150 micrometers, more particularly less than or equal to 120 micrometers, in particular less than or equal to 60 micrometers.

[0457] Alternatively, the masking layer 105 includes a film, as illustrated in Figures 5 and 6. The film is applied to all or part of the face external support 102F, 102G of the molding support 111 so as to form a step and therefore a difference in thickness between the second external face 102E and the first external face 102B. The second external face 102E of the molding strip 102 is defined by the external surface of the film.

[0458] In one example, the film is formed from a contiguous mass of material. In another example, the film can be a composite film comprising a matrix and fibers, including matrix-reinforcing fibers.

[0459] According to one example, the film has a constant thickness.

[0460] Figure 6 illustrates an example in which the molding device 101 is a molding strip 102, the molding support 111 being in the form of a strip. The molding support 111 comprises an outer face 102F, 102G, and a plurality of cavities 102C, 102D, 102H opening through the outer face 102F, 102G.

[0461] The outer face of support 102F, 102G of the molding support 111 is at least partially covered by the film so as to seal part of the cavities 102C, 102D, 102H by at least one film and form an offset area 108 on the outer face 102F, 102G.

[0462] Alternatively, the molding device 101 can be a roller or a sleeve (not shown), the molding support 111 being in the form of a roller or a sleeve.

[0463] The film is a high-temperature resistant polymer-based film, in particular a film based on polyimide and / or polyester and / or PVC and / or a fluorinated polymer and / or an epoxy polymer and / or a silicone (or polysiloxane) and / or an acrylate polymer and / or latex and / or metal.

[0464] The masking layer 105, in particular the film, may advantageously exhibit an elongation at break greater than or equal to 10%, in particular greater than or equal to 12%, in particular greater than or equal to 30%, for example tested according to elongation at break according to ASTM D1000 and at a temperature of 23°C.

[0465] The masking layer 105, in particular the film, may advantageously exhibit a breaking strength greater than or equal to 5 N / cm, in particular greater than or equal to 10 N / cm, in particular greater than or equal to 25 N / cm, for example, tested according to elongation at break according to ASTM D1000 and at a temperature of 23°C.

[0466] The masking layer 105, in particular the film, may advantageously exhibit an adhesion to steel greater than or equal to 0.5 N / cm, in particular greater than or equal to 1 N / cm, in particular greater than or equal to 1.5 N / cm, for example tested according to elongation at break according to ASTM D1000 and at a temperature of 23°C.

[0467] The masking layer 105, in particular the film, may advantageously have a surface weight greater than or equal to 15 g / m² 2 , in particular greater than or equal to 20 g / m³ 2 , in particular greater than or equal to 25 g / m³ 2 and / or less than or equal to 220 g / m² 2, in particular less than or equal to 170 g / m² 2 , in particular less than or equal to 130 g / m² 2 .

[0468] The masking layer 105, in particular the film, may advantageously exhibit no melting point and / or a melting point greater than or equal to 180°C, in particular greater than or equal to 200°C, in particular greater than or equal to 220°C, for example, as measured by Differential Scanning Calorimetry (DSC). As an example, the masking layer 105, in particular the film, may advantageously exhibit a degradation point greater than or equal to 200°C, in particular greater than or equal to 220°C, in particular greater than or equal to 250°C, for example, as measured by thermogravimetric analysis (TGA).

[0469] The masking layer 105 may additionally include an adhesive layer (or tape) bonded to the second outer surface of the support 102G of the molding support 111. The adhesive layer is positioned between the second outer surface of the support 102G and the film. For example, the adhesive layer is silicone-based (or polysiloxane-based), in particular a thermosetting silicone (or, according to the English designation, "thermosetting silinone").

[0470] The adhesive layer may advantageously have a surface basis weight greater than or equal to 5 g / m². 2 , in particular greater than or equal to 10 g / m³ 2 , in particular greater than or equal to 15 g / m³ 2 and / or less than or equal to 100 g / m² 2 , in particular less than or equal to 90 g / m³ 2 , in particular less than or equal to 75 g / m² 2 .

[0471] The adhesive layer may advantageously have a thickness greater than or equal to 5 micrometers, in particular greater than or equal to 10 micrometers, in particular greater than or equal to 20 micrometers and / or less than or equal to 150 micrometers, in particular less than or equal to 120 micrometers, in particular less than or equal to 100 micrometers, in particular less than or equal to 80 micrometers.

[0472] The masking layer 105 formed by the adhesive layer and the film has a thickness Eb3 which is predefined upstream.

[0473] According to an example of a method for preparing a molding device 101, the external face of the support 102F, 102G of the molding support 111 is completely covered by the film so as to seal almost all the cavities 102C, 102D, 102H with the film.

[0474] At least one portion of the film is then removed from the molding support 111 to form at least one first molding area A intended to form at least one pattern of retaining elements 1. The other portion or portions of the film remaining glued to the second outer face of support 102G form at least one offset area 108 and / or an overthickness in at least one second molding area B.

[0475] The offset areas 108 are created by cutting the film and adhesive layer by laser or by digital cutting or other equivalent type of cutting.

[0476] Alternatively, the film is pre-cut to form patterns and then adhered with adhesive to the second outer surface of the 102G backing of the 111 molding support. The pre-cut film can form a single unit comprising several cutouts. Alternatively, several films can be pre-cut, then glued onto the second external face of support 102G to form the offset areas 108.

[0477] Whether the film is pre-cut or not, a molding strip 102 is obtained comprising a first external face 102B in the first molding zone A having open cavities 102C, not covered by the film, defining molding cavities for the formation of retaining elements 1 and / or preforms of retaining elements, and partially open cavities 102H, which are partially covered by the film, defining molding cavities for the formation of intermediate elements 5b.

[0478] The molding strip 102 also includes a second outer face 102E formed by a surface of the film in the second molding zone B having closed cavities 102D that are sealed by the film. The second outer face 102E is offset relative to the first outer face 102B along the third direction Z perpendicular to the machine direction MD and the transverse direction CD, forming the offset zone 108.

[0479] As illustrated in Figure 6, the film forming the masking layer 105 includes an end zone 156 which partially covers and obstructs a portion of the cavities 102C, 102D, 102H, forming the partially open cavities 102H. Each partially open cavity 102H has an external orifice 157 which is covered by the end zone 156 over at least 5%, in particular at least 10% and / or not more than 95%, in particular not more than 90%.

[0480] This partial covering of cavities 102C, 102D, 102H is possible with a film but not with a resin because the resin fills, partially or completely, the cavity while the film only covers the surface.

[0481] The molding strip 102 has, in the first molding zone A, a first thickness Ebl measured between an inner face 102A of the molding support 111 and the first outer face 102B, and, in the second molding zone B, a second thickness Eb2 measured between the inner face 102A and the second outer face 102E. The ratio R2=(Eb2-Ebl) / Eb2 is greater than 0 and / or less than 1.0, in particular less than or equal to 0.9, preferably less than or equal to 0.5, more particularly less than or equal to 0.3.

[0482] The characteristics, particularly those relating to thickness, described previously for the embodiment of Figure 5 using a resin also apply to the embodiment of Figure 6 using a film.

[0483] The characteristics of Figures 5 and 6 are entirely compatible and can be combined. For example, some areas of the masking layer 105 may contain both zones as shown in Figure 5 and / or other zones as shown in Figure 6, particularly when the masking layer 105 comprises at least one film.

[0484] The molding strip 102 is mounted in the molding device 100 described previously, and a manufacturing process is applied to obtain a retaining device 1 comprising a base 2 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 5 extending from the base 2 along a third direction Z, perpendicular to the first and second directions X, Y. In this example, the retaining elements 5 each comprise a rod 6 surmounted by a head 10. The retaining elements 5 may not comprise a head.

[0485] Detailed examples of restraint devices 1 are illustrated in figures 7 to 9.

[0486] Base 2 has at least a first upper face 3A provided with retaining elements 5 in a first zone 7A, and at least a second upper face 3B without retaining elements 5 in a second zone 7B.

[0487] The first upper face 3A is offset from the second upper face 3B along the third direction Z so as to form a step 12 comprising a riser 31 connecting the first upper face 3A to the second upper face 3B.

[0488] The restraint device 1 comprises intermediate elements 5b in the first zone 7A, extending from the first upper face 3A along the third direction Z. The intermediate elements 5b border (or run alongside) the second upper face 3B, and are partially formed retaining elements 5.

[0489] The term "partially formed" means that the intermediate elements 5b are missing a portion compared to the retaining elements 5, which are fully formed.

[0490] The intermediate elements 5b are obtained from the partially open cavities 102H. Indeed, during the manufacturing process of the retaining device 1 by molding / extrusion, the injected molding material only partially fills the partially open cavity 102H because it is partially blocked by the end zone 156 of the film. The molding material does not completely fill the partially open cavity 102H, thus forming a partially formed retaining element 5, i.e., an intermediate element 5b.

[0491] At least part of the intermediate elements 5b comprise a truncated rod 6' extending along the third direction Z. The truncated rod 6' has a truncated portion 32 opening at least partially towards the second zone 7B, as illustrated in Figures 7 and 9. The truncated portion 32 has an opening 34 oriented towards the second zone 7B, as illustrated in Figure 9.

[0492] According to one example, in particular in each retention area of ​​the retention pattern as described later in the application, the end area 156 of the masking layer 105 (for example including a film) extends vertically over at least one molding cavity of the molding device 101, among all the cavities (see figure 6) and / or the end area 156 of the masking layer 105 (for example including a film) extends at least once vertically over a wall of the molding support 111 in an area without a cavity of the molding device 101 (see figure 5).

[0493] According to one example, specifically in each retention zone of the retention pattern as described later in the application, the end zone 156 of the masking layer 105 (for example, including a film) extends vertically of at least 2, 3, 4, 5, 10 or 15 molding cavities of the molding device 101, among all the cavities and / or the end area 156 of the masking layer 105 (for example including a film) extends at least 2, 3, 4, 5, 10 or 15 times vertically from the wall of the molding support 111 in an area devoid of a cavity of the molding device 101.

[0494] In figures 7 and 9, the retaining elements 5 and the intermediate elements 5b are positioned in a staggered pattern. That is to say, the retaining elements 5 are arranged so as to be aligned along the first direction X and along the second direction Y, with two successive rows or two columns being offset respectively along the first direction X and along the second direction Y, by a step corresponding to half the interval separating two adjacent retaining elements 5 or two adjacent intermediate elements 5b along the first and / or second direction X, Y.

[0495] Figures 8 and 9 represent an example in which the support layer 8, in this case a non-woven, is anchored in the base 2.

[0496] The intermediate element 5b may include a truncated stem 6' and a fully formed head 10, as illustrated in Figure 7, or a truncated head that is partially formed.

[0497] The intermediate element 5b may include a truncated rod 6' without a head 10 or a complete rod 6 without a head 10, as illustrated in figure 8.

[0498] The intermediate element 5b may be without a head 10 and include a truncated stem 6' which is shortened along the third direction Z.

[0499] According to an example, the retaining elements 5 and the truncated rod(s) 6' shortened are such that the ratio of the maximum heights along the third direction Z of a truncated rod 6' shortened on a retaining element 5 is strictly greater than 10%, in particular greater than or equal to 15%, in particular greater than or equal to 25% and / or less than or equal to 80%.

[0500] At least 5% of the intermediate 5b elements have a truncated head, in particular at least 10% or at least 20% of the intermediate 5b elements have a truncated head and / or less than 90% of the intermediate elements 5b have a truncated head, in particular less than 80%, 70%, 60%.

[0501] According to one example, at least 5%, in particular 10% of the intermediate elements 5b have a truncated head, and / or at least 5%, in particular 10% of the intermediate elements 5b have a truncated stem 6', and / or at least 5%, in particular 10% of the intermediate elements 5b are headless and include a shortened stem 6'.

[0502] According to one possible method of evaluating the level of truncation of the intermediate element 5b, let Bt be the width of the intermediate element 5b at the level of the truncated portion 32, as illustrated in Figure 9, and let Ct be the width of a missing portion of the truncated stem 6' of the intermediate element 5b along a measurement direction parallel to the first and second directions X and Y, the ratio Bt / (Bt+Ct) is greater than or equal to 0.1, in particular greater than or equal to 0.2, or greater than or equal to 0.3, and / or less than or equal to 0.9, in particular less than or equal to 0.8.

[0503] The measurement direction corresponds to the direction in which the missing portion is largest.

[0504] The retaining elements 5 and / or the intermediate elements 5b may extend perpendicularly with respect to the first upper face 3A or be inclined with respect to the first upper face 3A.

[0505] For example, with intermediate element 5b comprising a volume V5b and retaining element 5 comprising a volume V5, the ratio V5b / V5 can be greater than or equal to 0.1, 0.2, or 0.3, and / or less than or equal to 0.9, or 0.8.

[0506] As an example, the head 10' of the intermediate element 5b comprising a volume V10' and the head 10 of the retaining element 5 comprising a volume V10, the ratio VIO' / VIO can be greater than or equal to 0, 0.1, 0.2, or 0.3, and / or less than or equal to 0.9, or 0.8.

[0507] For example, the stem 6' of the intermediate element 5b comprising a volume V6' and the head 6 of the retaining element 5 comprising a volume V6, the The V6' / V6 ratio can be greater than or equal to 0.1, 0.2, or 0.3, and / or less than or equal to 0.9, or 0.8.

[0508] The intermediate elements 5b are adjacent or intersecting with the riser 31. The intermediate elements 5b run along the second zone 7B, in particular in each retention zone of the retention pattern as described later in the application.

[0509] The intermediate elements 5b can be positioned flush with the riser 31. The riser 31 extends in a plane running alongside intermediate elements 5b or which is intersecting with intermediate elements 5b.

[0510] The second zone 7B is bordered by intermediate elements 5b and restraint elements 5 which are closest to the second zone 7B. In other words, the second zone 7B is bordered by intermediate elements 5b which are adjacent or intersecting the riser 31 and by retaining elements 5 adjacent to the riser 31. A retaining element 5 adjacent to the riser 31 is also adjacent to one or two intermediate elements 5b.

[0511] According to an example, the step 12 and / or the riser 31 passes at least once under an intermediate element 5b, in particular said step 12 passes at least once under 2, 3, 4, 5, 10 or 15 intermediate elements 5b of the same first zone 7A. The step 12 and / or the riser 31 passes under at least 10%, 20%, 30% of the intermediate elements 5b and / or less than 50% of the retaining elements 5 arranged at the edge of the first zone 7A, in particular less than 30%, 20%, 10% of the retaining elements 5 arranged at the edge of the first zone 7A.

[0512] In one example, the projection of the step 12 (and / or the riser 31) intersects at least once an area formed by the projection of an intermediate element, the projections being respectively drawn along a plane parallel to the lower face 4 and / or the first upper face 3A and / or the second upper face 3B of the base 2. In another example, the projection of the step 12 (and / or the riser 31) intersects each area formed by the projections respective of 2, 3, 4, 5, 10 or 15 intermediate elements, the projections being made according to a plane parallel to the lower face 4 and / or the first upper face 3A and / or the second upper face 3B of the base 2.

[0513] The succession of intermediate elements 5b and retaining elements 5 closest to the second zone 7B defines a theoretical boundary line 35 running along the second zone 7B. The boundary line 35 passes substantially through the center of the intermediate elements 5b and the retaining elements 5. The boundary line 35 runs along the riser 31.

[0514] The boundary line 35 crosses at least 30% of intermediate elements 5b. The remainder of the border line 35 crossing restraint elements 5. In other words, the second zone 7B is bordered by at least 30% intermediate elements 5b, and less than 70% retention elements 5.

[0515] The riser 31 extends in a general direction that is perpendicular or inclined with respect to the first upper face 3A and / or the second upper face 3B. The riser 31 may be smooth or have raised features.

[0516] According to an example, figures 7 to 9 are schematic figures and / or are schematic figures which are to scale from which it is possible to deduce other characteristics, for example by using a ruler or any other suitable measuring means.

[0517] Alternatively, base 2 has a first thickness El measured along the third direction Z in the first zone 7A and a second thickness E2 measured along the third direction Z in the second zone 7B, the first thickness El being less than or equal to 360 pm or 300 pm, in particular less than or equal to 120 pm, in particular less than or equal to 100 pm, the ratio R1=(E1- E2) / E1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3 and / or in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0518] Alternatively, the second zone 7B extends over a distance d2 along the first direction X, which is greater than a distance dl separating two elements of restraint 5 adjacent in the first direction X and / or extends over a distance d3 along the second direction Y, which is greater than a distance d4 separating two restraint elements 5 adjacent in the second direction Y.

[0519] The distance separating two intermediate elements 5b is identical to the distance separating two retaining elements 5, regardless of the direction.

[0520] Alternatively, the base 2 and / or the retaining elements 5 and / or the intermediate elements 5b are a single unit, or the base and / or the retaining elements and / or the intermediate elements are "integral" according to the English designation. For example, the base and / or the retaining elements and / or the intermediate elements form a contiguous mass of resin.

[0521] According to another aspect of the invention illustrated in Figure 10, the retaining device 201 comprises a base 202 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 205 extending from a first face 203 of the base 202 along a third direction Z, perpendicular to the first and second directions X, Y.

[0522] The base 202 comprises two opposing longitudinal end edges 209a, 209b extending along the first direction X, of which a first longitudinal end edge 209a and a second longitudinal end edge 209b.

[0523] The two longitudinal end edges 209a, 209b delimit the external periphery of the base 202, in some cases, also delimit the external periphery of the retaining device 201. The two longitudinal end edges 209a, 209b are here straight and extend in a direction that is parallel to the first direction X.

[0524] In this example, base 202 includes a retention pattern M comprising six retention zones 207a, 207b, 207c, 207d, 207e, 207f, each equipped with retention elements 205, including a first retention zone 207a, a second retention zone 207b, a third retention zone 207c, a fourth retention zone 207d, a fifth retention zone 207e, and a sixth retention zone 207f.

[0525] Alternatively, the 202 base can include a different number of retention zones. The 205 retention elements each include a stem, and optionally a head to form a hook capable of cooperating with a counterpart comprising loops.

[0526] Each retention pattern M is delimited by two opposing longitudinal edges 212a, 212b extending along the first direction X, of which a first longitudinal edge 212a and a second longitudinal edge 212b, and by two opposing transverse edges 218a, 218b extending along the second direction Y, of which a first transverse edge 218a and a second transverse edge 218b.

[0527] The two longitudinal edges 212a, 212b are straight. The two transverse edges 218a, 218b are straight.

[0528] The base 202 includes an area devoid of containment elements 208, 213a, 213b comprising several transverse portions 208, each extending continuously along the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the containment pattern M. Each transverse portion 208 is delimited by at least two containment zones 207a, 207b. In other words, each transverse portion 208 separates two containment zones 207a, 207b or 207b, 207c. A first transverse portion 208 separates the first containment zone 207a and the second containment zone 207b. A second transverse portion 208 separates the second containment zone 207b and the third containment zone 207c.

[0529] The pattern in Figure 10 also includes retention zones 207d, 207e, and 207f, of which the fourth retention zone 207d, the fifth retention zone 207e, and the sixth retention zone 207f are not completely delimited by transverse portions 208, each extending continuously along the first face 203 of the base 202 from the first edge longitudinal 212a up to the second longitudinal edge 212b of the retention pattern M.

[0530] The area without restraint elements 208, 213a, 213b also includes a first longitudinal edge 213a without restraint elements 205 extending along the first direction X between the first longitudinal end edge 209a and the first longitudinal edge 212a, and a second longitudinal edge 213b without restraint elements 205 extending along the first direction X between the second longitudinal end edge 209b and the second longitudinal edge 212.

[0531] The first and second longitudinal borders 213a, 213b respectively form a band devoid of retaining elements 205 which is straight, in this example.

[0532] The two longitudinal end edges 209a, 209b here delimit the external periphery of the base 202 of the restraint device 201, which is also here the external periphery of the restraint device 201. In an alternative embodiment, the restraint device 201 could include a support extending at least partially beyond the longitudinal end edges 209a, 209b of the base 202. In this case, the external periphery of the restraint device 201 is defined by the longitudinal end edges of the support.

[0533] The first and second longitudinal end edges 209a, 209b of the base 202, the first and second longitudinal edges 212a, 212b of the retaining pattern M and the first and second longitudinal edges 213a, 213b are here straight.

[0534] Alternatively, the first and second longitudinal end edges 209a, 209b of the base 202 and the first and second longitudinal edges 213a, 213b may be non-straight.

[0535] The transverse portion 208 is connected to the longitudinal borders 213a, 213b.

[0536] The transverse portion 208 is not rectilinear. The transverse portion 208 comprises several parts 211, 211a, 211b extending over the first face 203 of the base 202 in a direction parallel to the first direction X or inclined to the first direction X at an angle other than 90°. At least two parts 211, 211a, 211b of the transverse portion 208 are contiguous.

[0537] The transverse portion 208 includes parts 211a, 211b parallel to the first direction X and parts 211 inclined with respect to the first direction X and therefore to parts 211a, 211b parallel to the first direction X, at an angle other than 90°.

[0538] The retention zones 207a, 207b, 207c, 207d, 207e, 207f of the retention pattern M are arranged such that any straight line segment L extending along the second direction Y from the first longitudinal end edge 209a of the base 202 to the second longitudinal end edge 209b of the base 202, intersects at least one of the retention zones 207a, 207b, 207c, 207d, 207e, 207f. The straight line segment L is rectilinear.

[0539] In the example of Figure 10, the straight segment L crosses from top to bottom of Figure 10, a first part 214 of the first retention zone 207a, a first part 211a of the transverse portion 208 which is parallel to the first direction X, a part 215 of the second retention zone 207b, a second part 211b of the transverse portion 208 which is parallel to the first direction X, and a second part 216 of the first retention zone 207a.

[0540] Thus, the straight segment L which extends along the second direction Y from the first longitudinal end edge 209a of the base 202 to the second longitudinal end edge 209b of the base 202, crosses here twice the first retention zone 207a, once the second retention zone 207b and twice the transverse portion 208.

[0541] The transverse portion 208 has a general arrow shape and a defined width between two retention zones 207a, 207b, 207c, 207d, 207e, 207f which is substantially constant.

[0542] Each retention zone 207a, 207b, 207c, 207d, 207e, 207f runs along at least one continuous transverse portion 208. Each retention zone 207a, 207b, 207c, 207d, 207e, 207f has a continuous border 217 formed by external retention elements 205, located at the periphery of the retention zone 207a, 207b, 207c, 207d, 207e, 207f.

[0543] The base 202 comprises two opposing transverse end edges 210a, 210b extending along the second Y direction, of which a first transverse end edge 210a and a second transverse end edge 210b.

[0544] The two transverse end edges 210a, 210b of the base 202 extend along a direction that is secant to the first direction X and / or the second direction Y, in particular along a direction that is perpendicular to the first direction X or the second direction Y.

[0545] Each retention pattern M is delimited by two opposite transverse edges 218a, 218b extending along the second direction Y, of which a first transverse edge 218a and a second transverse edge 218b. The two transverse edges 218a, 218b are straight.

[0546] The two transverse edges 218a, 218b of the restraint pattern M extend along a direction that is secant to the first direction X and / or the second direction Y, in particular along a direction that is perpendicular to the first direction X or the second direction Y.

[0547] According to the example in Figure 10, the retention pattern comprises two sub-retention patterns M1, M2, which here have an identical shape. In this example, each sub-retention pattern M1, M2 includes a transverse portion 208 extending continuously along the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retention pattern M. The sub-retention patterns M1, M2 in Figure 10 exhibit an overlap. Alternatively, the retention pattern could be devoid of this overlap.

[0548] According to the example in Figure 10, the second retention area 207b is the largest retention area of ​​the retention pattern M. The fourth retention area 207d, the fifth retention area 207e, and the sixth retention area 207f of the retention pattern M are truncated retention areas, each corresponding to a truncated portion of the largest retention area.

[0549] Figure 10A illustrates another example corresponding to an alternative embodiment of Figure 10 in which the restraint device 201 comprises a single longitudinal edge 213b.

[0550] The restraint device 210 in Figure 10A includes, in addition to that of Figure 10, a transverse edge 213c, which is straight. In Figure 10A, the first longitudinal end edge 209a of the base 202 and the first longitudinal edge 212a of the restraint pattern M coincide. The first transverse end edge 210a of the base 201 and the first transverse edge 218a of the restraint pattern also coincide. The second transverse end edge 210b of the base 201 extends beyond the first transverse edge 218b of the restraint pattern 201.

[0551] Figure 11 illustrates another example in which the restraint device 201 comprises a base 202 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and restraint elements 205 extending from a first face 203 of the base 202 along a third direction Z, perpendicular to the first and second directions X, Y.

[0552] The base 202 comprises two opposing longitudinal end edges 209a, 209b extending along the first direction X, of which a first longitudinal end edge 209a and a second longitudinal end edge 209b.

[0553] The two longitudinal end edges 209a, 209b here delimit the outer periphery of the base 202 of the restraint device 201, which is also here the outer periphery of the restraint device 201. In an alternative embodiment, the restraint device 201 could include a support extending at least in portion beyond the longitudinal end edges 209a, 209b of the base 202. In this case, the outer periphery of the retaining device 201 would be defined by the longitudinal end edges of the support. The two longitudinal end edges 209a, 209b of the base 202 are here straight and extend in a direction that is parallel to the first direction X.

[0554] The base 202 comprises two opposing transverse end edges 210a, 210b extending along the second Y direction, of which a first transverse end edge 210a and a second transverse end edge 210b.

[0555] Each retention pattern M is delimited by two opposing longitudinal edges 212a, 212b extending along the first direction X, of which a first longitudinal edge 212a and a second longitudinal edge 212b, and by two opposing transverse edges 218a, 218b extending along the second direction Y, of which a first transverse edge 218a and a second transverse edge 218b.

[0556] The two longitudinal edges 212a, 212b are straight. The two transverse edges 218a, 218b are straight.

[0557] In this example, base 202 comprises a retention pattern with 16 retention zones 207, 207a, 207b, 207c, each equipped with retention elements 205, including at least one first retention zone 207a and one second retention zone 207b. Retention pattern M comprises three sub-patterns: a first sub-pattern M1, a second sub-pattern M2, and a third sub-pattern M3, each comprising several retention zones 207, 207a, 207b, 207c, each equipped with retention elements 205.

[0558] The retaining elements 205 each comprise a stem, and optionally a head, to form a hook capable of cooperating with a counterpart comprising loops. The retaining motif M is delimited by two opposing longitudinal edges 212a, 212b, extending along the first direction X, of which a first longitudinal edge 212a and a second longitudinal edge 212b are straight. The two longitudinal edges 212a, 212b are straight. The two transverse edges 218a, 218b are straight.

[0559] The base 202 includes an area devoid of retaining elements 208, 213a, 213b comprising several transverse portions 208, each extending continuously along the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retaining pattern M. The path C traversed by one of the transverse portions 208 is schematically represented by a dashed line in Figure 11. The path C may be unique, as in the example of Figures 10 and 10A, or comprise several intersections, as shown in Figure 11. In other words, the transverse portion 208 of Figure 11 comprises multiple paths.

[0560] Each transverse section 208 is bounded at least partially by at least two retention zones 207, 207a, 207b, 207c and / or by at least one of the two transverse end edges 210a, 210b of the base 202 and / or by at least one of the two longitudinal end edges 209a, 209b of the base 202 and / or by at least one of the two transverse edges 218a, 218b of the retention pattern M and / or by at least one of the two longitudinal edges 212a, 212b of the retention pattern M. Each transverse section 208 comprises portions 208a of the transverse section 208 adjacent to two retention zones 207, 207a, 207b, 207c and portions 208b of the transverse section 208 adjacent to four retention zones 207, 207a, 207b, 207c. The parts 208b of transverse section 208 adjacent to four retention zones 207, 207a, 207b, 207c are at intersections where two transverse sections 208 intersect. Thus, the set of transverse sections 208 here forms a network of crossing sections 208.Such a network of transverse portions has the advantage of presenting fewer constraints regarding the cutting of the restraint device 201, in particular fewer constraints regarding the synchronization of the cutting of the restraint device 201 with the shape of the restraint pattern M.

[0561] The area devoid of restraint elements 208, 213a, 213b also includes a first longitudinal edge 213a devoid of restraint elements 205 extending along the first direction X between the first edge longitudinal end edge 209a and the first longitudinal edge 212a, and a second longitudinal edge 213b without retaining elements 205 extending along the first direction X between the second longitudinal end edge 209b and the second longitudinal edge 212b.

[0562] The first and second longitudinal borders 213a, 213b form a band devoid of retaining elements 205 which is straight, in this example.

[0563] The two longitudinal end edges 209a, 209b of the base 202 define, here, the external periphery of the base 202 of the restraint device 201, which is also here the external periphery of the restraint device 201. In an alternative embodiment, the restraint device 201 could include a support extending at least partially beyond the longitudinal end edges 209a, 209b of the base 202. In this case, the external periphery of the restraint device 201 would be defined by the longitudinal end edges of the support.

[0564] The first and second longitudinal end edges 209a, 209b, the first and second longitudinal edges 212a, 212b and the first and second longitudinal edges 213a, 213b are, here, straight.

[0565] Alternatively, the first and second longitudinal end edges 209a, 209b of the base 202 and the first and second longitudinal edges 213a, 213b may be non-straight.

[0566] Each transverse portion 208 is connected to at least one of the longitudinal borders 213a, 213b. In particular, each transverse portion 208 is connected to both longitudinal borders 213a, 213b.

[0567] The transverse portion 208 is not straight and has one or more curvatures.

[0568] The transverse portion 208 extends over the first face 203 of the base 202 in a general direction which is inclined with respect to the first direction X at an angle other than 90°.

[0569] The retention zones 207, 207a, 207b, 207c of the retention pattern M are arranged so that any straight line segment L extending along the second direction Y from the first longitudinal end edge 209a of the base 202 to the second longitudinal end edge 209b of the base 202, intersects at least one of the retention zones 207, 207a, 207b, 207c. The straight line segment L is rectilinear.

[0570] In the example of Figure 11, the straight segment L crosses from top to bottom of Figure 11, a first retention zone 207a, a transverse portion 208, and a second retention zone 207b.

[0571] By shifting the straight segment L to the right or left, it can intersect two retention zones 207a, 207b, and two transverse sections 208, for example. Alternatively, the straight segment L could intersect a different number of retention zones 207a, 207b and / or transverse sections 208.

[0572] As illustrated in Figure 11, the retention pattern 201 comprises three sub-patterns M1, M2, and M3, which are identical in shape. Each sub-pattern M1, M2, and M3 includes at least one transverse portion 208 that extends continuously along the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retention pattern M. The sub-patterns M1, M2, and M3 shown in Figure 11 are shown without an overlap. Alternatively, the retention pattern M could have an overlap.

[0573] As illustrated in Figure 11, the retention pattern M includes a complete retention area 207c, here generally scale-shaped, which is the largest retention area. The retention pattern M also includes truncated retention areas such as the first and second retention areas 207a, with 207b representing a truncated portion of the largest retention area.

[0574] As an alternative embodiment, the retention zones 207, 207a, 207b, 207c of the retention pattern M could be of different shapes, for example different shapes than truncated or partial shapes of a retention zone.

[0575] The transverse portion 208 has a defined width between at least two retention zones 207, 207a, 207b, 207c which is variable.

[0576] Each retention zone 207, 207a, 207b is delimited by at least two continuous transverse portions 208. Each retention zone 207, 207a, 207b has a continuous border 217 (or contour) formed by external retention elements 205, located at the periphery of the retention zone 207, 207a, 207b.

[0577] Figure 12 illustrates another example in which the restraint device 201 comprises a base 202 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and restraint elements 205 extending from a first face 203 of the base 202 along a third direction Z, perpendicular to the first and second directions X, Y.

[0578] The base 202 comprises two opposing longitudinal end edges 209a, 209b extending along the first direction X, of which a first longitudinal end edge 209a and a second longitudinal end edge 209b.

[0579] The two longitudinal end edges 209a, 209b define the outer periphery of the base 202 of the restraint device 201, which is also the outer periphery of the restraint device 201. In an alternative embodiment, the restraint device 201 could include a support extending at least partially beyond the longitudinal end edges 209a, 209b of the base 202. In this case, the outer periphery of the restraint device 201 would be defined by the longitudinal end edges of the support. The two longitudinal end edges 209a, 209b are straight and extend in a direction parallel to the first direction X.

[0580] The base 202 comprises two opposing transverse end edges 210a, 210b extending along the second Y direction, of which a first transverse end edge 210a and a second transverse end edge 210b.

[0581] Each retention pattern M is delimited by two opposing longitudinal edges 212a, 212b extending along the first direction X, of which a first longitudinal edge 212a and a second longitudinal edge 212b, and by two opposing transverse edges 218a, 218b extending along the second direction Y, of which a first transverse edge 218a and a second transverse edge 218b.

[0582] The two longitudinal edges 212a, 212b of the retention pattern M are straight. The two transverse edges 218a, 218b of the retention pattern M are straight.

[0583] In this example, base 202 includes a retention pattern M comprising several retention zones 207, 207a, 207b, 207c, here nine retention zones, each equipped with retention elements 205, including at least a first retention zone 207a and a second retention zone 207b. The retention pattern M comprises a single sub-pattern.

[0584] The retaining elements 205 each comprise a stem, and optionally a head to form a hook capable of cooperating with a counterpart comprising loops. The retaining motif M is delimited by two opposing longitudinal edges 212a, 212b, extending along the first direction X, of which a first longitudinal edge 212a and a second longitudinal edge 212b are straight. The two longitudinal edges 212a, 212b are straight.

[0585] The base 202 includes an area devoid of retaining elements 208, 213a, 213b comprising several transverse portions 208 but of which only one transverse portion 208 extends continuously over the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retaining pattern M. Alternatively, a different number of transverse portions 208 could be represented extending continuously over the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retaining pattern M.

[0586] Each transverse section 208 is delimited by a first retention zone 207a and a second retention zone 207b. In the example, the transverse sections 208 do not intersect each other.

[0587] The area without restraint elements 208, 213a, 213b also includes a first longitudinal edge 213a without restraint elements 205 extending along the first direction X between the first longitudinal end edge 209a of the base 202 and the first longitudinal edge 212a of the restraint pattern M, and a second longitudinal edge 213b of the restraint pattern M without restraint elements 205 extending along the first direction X between the second longitudinal end edge 209b of the base 202 and the second longitudinal edge 212b of the restraint pattern M.

[0588] The first and second longitudinal borders 213a, 213b form a band devoid of retaining elements 205 which is straight, in this example.

[0589] The two longitudinal end edges 209a, 209b of the base 202 define the outer periphery of the base 202 of the restraint device 201, which is also the outer periphery of the restraint device 201. In an alternative embodiment, the restraint device 201 could include a support extending at least partially beyond the longitudinal end edges 209a, 209b of the base 202. In this case, the outer periphery of the restraint device 201 would be defined by the longitudinal end edges of the support.

[0590] The first and second longitudinal end edges 209a, 209b of the base 202, the first and second longitudinal edges 212a, 212b of the retaining pattern M and the first and second longitudinal edges 213a, 213b are here straight.

[0591] Alternatively, the first and second longitudinal end edges 209a, 209b of the base 202 and the first and second longitudinal edges 213a, 213b may be non-straight.

[0592] Each transverse portion 208 is here connected to at least one of the longitudinal borders 213a, 213b. In particular, each transverse portion 208 is connected to both longitudinal borders 213a, 213b.

[0593] In the example, each transverse portion 208 is not straight and has one or more curvatures.

[0594] Alternatively, the transverse portion 208 could include a straight region, a curved region, a succession of straight regions, and / or a succession of curved regions.

[0595] Each transverse portion 208 includes at least one part which extends over the first face 203 of the base 202 in a general direction which is inclined with respect to the first direction X at an angle other than 90°.

[0596] At least one of the transverse portions 208 includes a part 211 extending over the first face 203 of the base 202 in a general direction which is inclined with respect to the first direction X at an angle other than 90°.

[0597] The retention zones 207, 207a, 207b, 207c of the retention pattern M are arranged so that any straight line segment L extending along the second direction Y from the first longitudinal end edge 209a to the second longitudinal end edge 209b, crosses at least once one of the retention zones 207, 207a, 207b, 207c. The straight line segment L is rectilinear.

[0598] In the example in Figure 12, the straight segment L crosses, from top to bottom of Figure 12, a first retention zone 207a, a transverse portion 208, a second retention zone 207b, another transverse portion 208, and a third retention zone 207c. In the example in Figure 12, only one of the two transverse portions 208 extends continuously over the first face 203 of the base 202 from the first longitudinal edge 212a to the second longitudinal edge 212b of the retention pattern M.

[0599] The transverse portion 208 has a defined width between two retention zones 207, 207a, 207b, 207c which is variable here.

[0600] The retention areas 207, 207a, 207b, 207c are here delimited at least in part by a continuous transverse portion 208. Each retention area 207, 207a, 207b, 207c has a continuous border 217 (or contour) formed by external retention elements 205, located at the periphery of the retention area 207, 207a, 207b, 207c.

[0601] In the examples in Figures 10 to 12, the transverse portion 208 has a width that is more than twice the average distance between two adjacent retaining elements 205. This distance corresponds to the shortest distance between two retaining elements 205. Figures 10 to 12 are schematic representations in which far fewer retaining elements 205 are shown than in reality. The size of the retaining elements 205 and the distance between two retaining elements 205 are not representative of reality and are much greater than they actually are.

[0602] For example, in the examples in Figures 10 to 12, the restraint device 201 may include a single longitudinal edge 213a, 213b devoid of restraint elements 205, for example, as shown in Figure 10A.

[0603] For example, in the examples in Figures 10 to 12, the retaining device 201 may not include any longitudinal edge 213a, 213b. The first longitudinal end edge 209a coincides with the first longitudinal edge 212a, and the second longitudinal end edge 209b coincides with the second longitudinal edge 212b.

[0604] For example, in the examples in Figures 10 to 12, the restraint device 201 may include a single transverse edge 218a, 218b devoid of restraint elements 205, for example, as shown in Figure 10A.

[0605] For example, in the examples in Figures 10, 11 and 12, the restraint device 201 may not include any transverse edge 218a, 218b. The first transverse end edge 210a coincides with the first transverse edge 218a, and the second transverse end edge 210b coincides with the second transverse edge 218b.

[0606] In the examples in Figures 10 to 12, the restraint device 201 can be obtained from a ribbon or roll which is cut to form several restraint devices 201.

[0607] The ribbon can be manufactured using a molding apparatus and a manufacturing process which are described in document WO2021116613. The base 202 then has a substantially constant thickness respectively at the location of the retention areas 207, 207a, 207b, 207c, 207d, 207e, 207f and the area without retention elements 208, 213a, 213b.

[0608] Alternatively, the ribbon is manufactured using a molding device 100 as described previously.

[0609] The molding apparatus 100 is illustrated in Figure 4 and comprises a molding device 101, as illustrated in Figures 5 and 6, comprising a first molding zone A having open cavities 102C so as to define molding cavities for the formation of retaining elements 5 and / or preforms of retaining elements and a second molding zone B without open cavities 102C. The molding device 101 comprises an inner face 102A and a first outer face 102B in the first molding zone A, and an offset zone 108 in the second molding zone B delimited in part by a second outer face 102E which is offset relative to the first outer face 102B along a third direction Z perpendicular to the machine direction MD and to the transverse direction CD.

[0610] The offset zone 108 is formed by a masking layer 105 partially covering the molding strip 102. The molding device 101 includes open cavities 102C which are not covered by the masking layer 105 in the first molding zone A and closed cavities 102D which are sealed by the masking layer 105 in the second molding zone B.

[0611] After the ribbon is manufactured using the molding device 101 described above, a ribbon is obtained comprising several retaining devices 201, each comprising a base 202 having a first thickness El measured along the third direction Z in the retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f of the retention pattern M and a second thickness E2 measured along the third direction Z in the area without retention elements 208, 213a, 213b.

[0612] The first thickness El is less than 360 pm, in particular less than or equal to 300 pm, in particular less than or equal to 120 pm, in particular less than 100 pm. A ratio R1=E1-E2 / E1 is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0613] A step 12 as shown in figures 1 and 2, is formed between a first upper face 3A, 203A of the base 2, 202, in the retention areas 207, 207a, 207b, 207c, 207d, 207e, 207f, and a second upper face 3 B, 203 B of the base 2, 202, in the areas without retention elements 208, 213a, 213b.

[0614] The first thickness El is measured between the second face of the base 2, 202, opposite the first face 203, and the first upper face 3A, 203A and the second thickness E2 is measured between the second face of the base 202 opposite the first face 203 and the second upper face 3 B, 203 B.

[0615] According to an example, the first thickness E1 minus the second thickness E2, i.e. E1-E2, is less than or equal to 250 pm, less than 200 pm, in particular less than or equal to 150 pm, in particular less than or equal to 120 pm, in particular less than or equal to 81 pm, 76.5 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 20 pm, in particular greater than or equal to 40 pm.

[0616] For example, step 12 has a thickness E=E1-E2 and retaining elements 205 have a height H, in particular a height average, taken from the first upper face of the base to the free end of the retaining elements.

[0617] The ratio between the thickness of step 12 and the height of the retaining elements (E / H) is less than or equal to 1.5, in particular less than or equal to 1.2, in particular less than or equal to 1 and / or greater than or equal to 0.05, in particular greater than or equal to 0.2.

[0618] Alternatively, the masking layer 105 comprises at least one film as described above and partially covering the outer face 102F, 102G of the molding support 111 so as to obtain a molding device 101 comprising: - a first external face 102B in a first molding zone A comprising open cavities 102C, not covered by the film, defining molding cavities for the formation of retaining elements 5 and / or preforms of retaining elements 5, and partially open cavities 102H, partially covered by the film, defining molding cavities for the formation of intermediate elements 5b, and - a second external face 102E formed by a surface of the film in a second molding zone B having closed cavities 102D which are sealed by the film, the second external face 102E being offset from the first external face 102B along a third direction Z perpendicular to the machine direction MD and to the transverse direction CD.

[0619] The molding device 101 is obtained by the molding device 101 preparation process as described above.

[0620] After the ribbon is manufactured using the molding device 101 described above, a ribbon is obtained comprising several retaining devices 201, each comprising intermediate elements 5b as described in Figures 7 to 9, and extending from the first upper face 3A, 203A of the base 2, 202, into the retaining zones 207, 207a, 207b, along the third direction Z, and bordering at least partially the second upper face 3B, 203B of the base 2, 202, in areas without containment elements 208, 213a, 213b. Intermediate elements 5b are partially formed containment elements 5, 205.

[0621] The first upper face 3A, 203A is offset from the second upper face 3B, 203B along the third direction Z so as to form a step 12 comprising a riser 31 connecting the first upper face 3A, 203A to the second upper face 3B, 203B.

[0622] The 217 border of the 207, 207a, 207b retention zones includes intermediate elements 5b and retention elements 5, 205.

[0623] The intermediate elements 5b are adjacent or intersecting with the riser 31.

[0624] At least part of the intermediate elements 5b includes a truncated rod 6' extending along the third direction Z, the truncated rod 6' having a truncated portion 32 opening at least partially into the areas devoid of retaining elements 7B, 208, 213a, 213b.

[0625] At least 5% of the intermediate 5b elements have a truncated head, in particular at least 10% or 20% of the intermediate 5b elements have a truncated head and / or less than 90% of the intermediate 5b elements have a truncated head, in particular less than 80%, 70%, 60%.

[0626] Let Bt be the width of the intermediate element 5b at the level of the truncated portion 32 and let Ct be the width of a missing portion of the truncated stem 6' of the intermediate element 5b, a ratio Bt / (Bt+Ct) is greater than or equal to 0.1, 0.2, 0.3, and / or less than or equal to 0.9, 0.8.

[0627] Alternatively, the base 202 and / or the retaining elements 205 and / or the intermediate elements 5b are a single unit, or the base and / or the retaining elements and / or the intermediate elements are "integral" according to the English designation. For example, the base and / or the retaining elements and / or the intermediate elements form a contiguous mass of resin.

[0628] According to another aspect of the invention illustrated in Figure 13, the retaining device 301 comprises a base 302 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 305 extending from a first face 303 of the base 302 along a third direction Z, perpendicular to the first and second directions X, Y.

[0629] Base 302 includes: - two opposing longitudinal end edges 309a, 309b extending along the first direction X, of which a first longitudinal end edge 309a and a second longitudinal end edge 309b, - two opposing transverse end edges 310a, 310b extending along a direction that is secant to the first direction X, of which a first transverse end edge 310a and a second transverse end edge 310b, and - at least one retention motif M comprising at least one retention zone 307a, 307b provided with retention elements 305, the retention elements 305 each comprising a shank, and optionally a head to form a hook capable of cooperating with a counterpart comprising loops, the at least one retention motif M being delimited by two opposing longitudinal edges 312a, 312b extending along the first direction X, and by two opposing transverse edges 318a, 318b extending along the second direction Y of which a first transverse edge 318a and a second transverse edge 318b.

[0630] The two transverse end edges 310a, 310b of the base 302 and the two transverse edges 318a, 318b of the retaining pattern M coincide in this example.

[0631] The retention area 307a, 307b of said at least one retention pattern M includes at least one continuous portion 307a which extends continuously from the first transverse end edge 310a of the base 302 to the second transverse end edge 310b of the base 302, in particular along a longitudinal direction A which is parallel to the first direction X in this example.

[0632] The continuous portion 307a has a width, including a minimum width, which is greater than the distance between two adjacent retaining elements 305.

[0633] Said at least one restraint pattern M is arranged so that any straight segment L arranged in said at least one restraint pattern M and extending perpendicularly to the longitudinal direction A and / or extending perpendicularly to the first direction X, from the first longitudinal edge 312a of at least one restraint pattern M to the second longitudinal edge 312b of at least one restraint pattern M, crosses at least once the continuous portion 307a.

[0634] Said at least one retention pattern M having a retention width extending along the second direction Y between the two longitudinal edges 312a, 312b of at least one retention pattern M, the retention width varies in the direction of the first direction X. The retention width varies as one progresses in one direction or the other along the first direction X.

[0635] According to one example, the width of the continuous portion 307a is less than ten times the distance between two adjacent restraint elements 305, in particular less than five times the distance between two adjacent restraint elements 305.

[0636] In the example, the width of the continuous portion 307a is approximately three times the distance between two adjacent retaining elements 305.

[0637] The retention area 307a, 307b comprises several lateral portions 307b extending from the continuous portion 307a, primarily along the second direction Y. At least one of the lateral portions 307b extends to one of the longitudinal edges 312a, 312b of at least one retention pattern M. The retention area 307a, 307b here presents a spine shape.

[0638] The restraint device 301 includes a zone devoid of restraint elements 308, 313a, 313b comprising several transverse portions 308, either positioned between a lateral portion 307b and one of the first or second transverse end edges 310a, 310b, or positioned between two adjacent lateral portions 307b. Each transverse portion 308 extends from the continuous portion 307a to one of the longitudinal edges 312a, 312b.

[0639] Figure 13 shows an embodiment comprising a single retention zone 307a, 307b which has a continuous border 317 (or contour) formed by external retention elements 305, located on the periphery of the retention zone 307a, 307b.

[0640] The area devoid of restraint elements 308, 313a, 313b of the restraint device 301 comprises several transverse portions 308, which are either positioned between two successive lateral portions 307b along the first direction X, or positioned between a lateral portion 307b and one of the first or second transverse end edges 310a, 310b of the base 302 and extending from the continuous portion 307a to one of the longitudinal edges 312a, 312b of the restraint pattern M.

[0641] The retention area 307a, 307b comprises a first row 306a of lateral portions 307b and a second row 306b of lateral portions 307b both connected to the continuous portion 307a.

[0642] The first and second rows 306a, 306b are virtually identical.

[0643] In each row 306a, 306b of lateral portions 307b the lateral portions 307b are spaced two by two by a transverse portion 308.

[0644] The restraint pattern M is arranged so that any straight line segment L arranged in the restraint pattern M and extending perpendicularly to the longitudinal direction A and / or extending perpendicularly to the first direction X, from the first longitudinal edge 312a to the second longitudinal edge 312b, crosses at least once the continuous portion 307a.

[0645] The line segment L is straight.

[0646] In the example, the straight segment L intersects the continuous portion 307a once. The straight segment L also intersects a transverse portion 308 and two lateral portions 307b.

[0647] The retention pattern M has a retention width or cumulative retention width corresponding to the sum of the retention widths on the same straight segment L extending along the second direction Y between the two longitudinal edges 312a, 312b. The retention width varies in the direction of the first direction X, in particular so as to form at least partially at least one zone devoid of retention elements 308, 313a, 313b on the first face 303 of the base 302. The retention width varies as one progresses along the first direction X.

[0648] For example, the retention pattern M has a first retention width L1 and a second retention width L2 corresponding to the sum of the widths L21 and L22 which is greater than the first retention width L1.

[0649] For example, the retention pattern M here presents a third retention width L3 corresponding to the sum of the widths L31 and L32, the third retention width L3 being greater than the second retention width L2.

[0650] Similarly, the width of the continuous portion 307a varies in the direction of the first X direction.

[0651] The area without restraint elements 308, 313a, 313b includes a first longitudinal edge 313a without restraint elements 305 extending along the first direction X between the first longitudinal end edge 309a and the first longitudinal edge 312a.

[0652] In the first row 306a of lateral portions 307b, at least one transverse portion 308. In the example, each transverse portion 308 is connected to the first longitudinal border 313a.

[0653] The area without restraint elements 308, 313a, 313b includes a second longitudinal edge 313b without restraint elements 305 extending along the first direction X between the second longitudinal end edge 309b and the second longitudinal edge 312b.

[0654] In the second row 306b of lateral portions 307b, there is at least one transverse portion. In the example, each transverse portion 308 is connected to the second longitudinal border 313b.

[0655] According to another aspect of the invention illustrated in Figure 14, the retaining device 301 comprises a base 302 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 305 extending from a first face 303 of the base 302 along a third direction Z, perpendicular to the first and second directions X, Y.

[0656] Base 302 includes: - two opposing longitudinal end edges 309a, 309b extending along the first direction X, of which a first longitudinal end edge 309a and a second longitudinal end edge 309b, - two opposing transverse end edges 310a, 310b extending along a direction that is secant to the first direction X, of which a first transverse end edge 310a and a second transverse end edge 310b, and - at least one retention motif M comprising at least one retention zone 307a, 307a', 307b, 307b' provided with retention elements 305, the retention elements 305 each comprising a stem and optionally a head to form a hook capable of cooperating with a counterpart comprising loops, the at least one retention motif M being delimited by two opposite longitudinal edges 312a, 312b extending along the first direction X, and by two opposite transverse edges 318a, 318b extending along the second direction Y of which a first transverse edge 318a and a second transverse edge 318b.

[0657] The two transverse end edges 310a, 310b of the base 202 and the two transverse edges 318a, 318b of the retaining pattern M coincide in this example.

[0658] The retention zone 307a, 307a', 307b, 307b' of said at least one retention pattern M comprises two continuous portions 307a, 307a' of which a first continuous portion 307a and a second continuous portion 307a', which each extend continuously from the first transverse end edge 310a to the second transverse end edge 310b, in particular along a longitudinal direction A which is parallel to the first direction X in this example.

[0659] The two continuous portions 307a, 307a' exhibit a wave and / or sinusoid shape.

[0660] At least one of the first and second continuous portions 307a, 307a', in particular each continuous portion 307a, 307a' has a width, in particular a minimum width, which is greater than the distance between two adjacent retaining elements 305.

[0661] Said at least one restraint pattern M is arranged so that any straight segment L arranged in said at least one restraint pattern M and extending perpendicularly to the longitudinal direction A and / or extending perpendicularly to the first direction X, from the first longitudinal edge 312a of at least one restraint pattern M to the second longitudinal edge 312b of at least one restraint pattern M, crosses at least once the first continuous portion 307a and / or the second continuous portion 307a'.

[0662] According to the example in Figure 14, any straight segment L intersects the first and second continuous portions 307a, 307a'.

[0663] The at least one restraint pattern M having a restraint width extending along the second direction Y between the two longitudinal edges 312a, 312b of the at least one restraint pattern M, the restraint width varies in the direction of the first direction X, that is to say as one progresses along the first direction X.

[0664] According to one example, the width of each continuous portion 307a is less than ten times the distance between two adjacent restraint elements 305, in particular less than five times the distance between two adjacent restraint elements 305.

[0665] The retention motif M comprises several lateral portions 307b, 307b' positioned along the longitudinal edges 312a, 312b, including a first lateral portion 307b positioned along the first longitudinal edge 312a and a second lateral portion 307b' positioned along the second longitudinal edge 312b. The lateral portions 307b, 307b' are rectangular in shape and are not connected to the continuous portions 307a, 307a'.

[0666] As an alternative embodiment, the shape of the lateral portions 307b, 307b' could be different, for example having the shape of a triangle, a square, a circle, or an oval shape, or equivalent.

[0667] According to the example in Figure 14, the lateral portions 307b, 307b' are arranged at a distance from the continuous portion 307a, 307a', unlike the lateral portions in Figure 13, which extend from and are contiguous to the continuous portion. The lateral portions in Figure 13 are delimited by a change in curvature with the continuous portion.

[0668] The containment system 301 includes an area without containment elements 308a, 308b, 308c, 313a, 313b comprising several portions without containment elements 308a, 308b, 308c, the first portion of which is without of retaining elements 308a positioned between the two continuous portions 307a, 307a', a second portion without retaining elements 308b positioned between the first longitudinal edge 312a and the first continuous portion 307a, and a third portion without retaining elements 308c positioned between the second longitudinal edge 312b and the second continuous portion 307a'.

[0669] The first portion without restraint elements 308a has a wave and / or sinusoid shape.

[0670] Each portion without retaining elements 308a, 308b, 308c extends along the first direction X between the two transverse end edges 310a, 310b.

[0671] Each retention zone 307a, 307a', 307b, 307b' is delimited by a continuous border 317 (or contour). The border 317 is surrounded at least partially by the area without retention elements 308a, 308b, 308c, 313a, 313b and / or by at least one of the two transverse end edges 310a, 310b of the base 302 and / or by at least one of the two longitudinal end edges 312a, 312b of the base 302 and / or by at least one of the two transverse edges 318a, 318b of the retention pattern M and / or by at least one of the two longitudinal edges 309a, 309b of the retention pattern M.

[0672] The restraint pattern M is arranged such that any straight line segment L arranged within the restraint pattern M and extending perpendicularly to the longitudinal direction A and / or extending perpendicularly to the first direction X, from the first longitudinal edge 312a to the second longitudinal edge 312b, intersects at least once one of the continuous portions 307a, 307a'. In the example, the longitudinal direction A is parallel to the first direction X. In an alternative embodiment, it could extend at an angle to the first direction X.

[0673] The line segment L is rectilinear.

[0674] In the example, the straight segment L intersects the first continuous portion 307a, the second continuous portion 307a' and the second lateral portion 307b'.

[0675] The straight segment L also intersects the three portions without retaining elements 308a, 308b, 308c.

[0676] The retention pattern M has a retention width, or cumulative retention width, corresponding to the sum of the retention widths on the same straight line segment extending along the second direction Y between the two longitudinal edges 312a, 312b. The retention width varies in the direction of the first direction X. The retention width varies as one progresses along the first direction X.

[0677] For example, the retention pattern M has a first retention width L1, corresponding to the sum of the widths L11 and L12, and a second retention width L2, corresponding to the sum of the widths L21, L22, L23, which is greater than the first retention width L1.

[0678] The area without restraint elements 308a, 308b, 308c, 313a, 313b includes a first longitudinal edge 313a without restraint elements 305 extending along the first direction X between the first longitudinal end edge 309a and the first longitudinal edge 312a.

[0679] The area devoid of restraint elements 308a, 308b, 308c, 313a, 313b includes a second longitudinal edge 313b devoid of restraint elements 305 extending along the first direction X between the second longitudinal end edge 309b and the second longitudinal edge 312b.

[0680] In the examples in Figures 13 and 14, the restraint device 301 can be obtained from a strip of restraint devices 301 which is cut to form several restraint devices 301.

[0681] The ribbon can be manufactured using a molding apparatus and a manufacturing process described in document WO2021116613. Base 302 then exhibits a substantially constant thickness at the location of the containment areas 307a, 307a', 307b, 307b' and the area without containment elements 308a, 308b, 308c, 313a, 313b.

[0682] Alternatively, the ribbon is manufactured using a molding device 100 as described previously.

[0683] The molding apparatus 100 is illustrated in Figure 4 and comprises a molding device 101, as illustrated in Figures 5 and 6, comprising a first molding zone A having open cavities 102C so as to define molding cavities for the formation of retaining elements 5 and / or preforms of retaining elements and a second molding zone B without open cavities 102C. The molding device 101 comprises an inner face 102A and a first outer face 102B in the first molding zone A, and an offset zone 108 in the second molding zone B delimited in part by a second outer face 102E which is offset relative to the first outer face 102B along a third direction Z perpendicular to the machine direction MD and to the transverse direction CD.

[0684] The offset zone 108 is formed by a masking layer 105 partially covering the molding strip 102. The molding device 101 includes open cavities 102C which are not covered by the masking layer 105 in the first molding zone A and closed cavities 102D which are sealed by the masking layer 105 in the second molding zone B.

[0685] After the manufacture of the ribbon using the molding device 101 described previously, a ribbon is obtained comprising several retaining devices 301 each comprising a base 302 having a first thickness El measured along the third direction Z in the retaining areas 307a, 307a', 307b, 307b' of the retaining pattern M and a second thickness E2 measured along the third direction Z in the areas without retaining elements 308a, 308b, 308c, 313a, 313b.

[0686] The first thickness El is less than 360 pm, in particular less than or equal to 300 pm, in particular less than or equal to 120 pm, in particular less than 100 pm. A ratio R1=E1-E2 / E1 is greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, in particular less than or equal to 1.0, in particular less than or equal to 0.9.

[0687] A step 12 as shown in figures 1 and 2, is formed between a first upper face 3A, 303A of the base 2, 202, in the retention areas 307a, 307a', 307b, 307b', and a second upper face 3B, 303B of the base 2, 302, in the areas without retention elements 308a, 308b, 308c, 313a, 313b.

[0688] The first thickness El is measured between the second face of the base 2, 302, opposite the first face 303, and the first upper face 3A, 303A and the second thickness E2 is measured between the second face of the base 302 opposite the first face 303 and the second upper face 3 B, 303 B.

[0689] According to an example, the first thickness E1 minus the second thickness E2, i.e. E1-E2, is less than or equal to 250 pm, less than 200 pm, in particular less than or equal to 150 pm, in particular less than or equal to 120 pm, in particular less than or equal to 81 pm, 76.5 pm, 70 pm or 65 pm, in particular less than or equal to 60 pm, in particular less than or equal to 55 pm, more preferably less than or equal to 50 pm and / or greater than or equal to 1 pm, in particular greater than or equal to 2 pm, in particular greater than 3 pm, 4 pm or 5 pm, in particular greater than or equal to 10 pm, in particular greater than or equal to 20 pm, in particular greater than or equal to 40 pm.

[0690] According to an example, step 12 has a thickness E=E1-E2 and retaining elements 305 have a height H, in particular an average height, taken from the first upper face of the base to the free end of the retaining elements.

[0691] The ratio between the thickness of step 12 and the height of the retaining elements (E / H) is less than or equal to 1.5, in particular less than or equal to 1.2, in particular less than or equal to 1 and / or greater than or equal to 0.05, in particular greater than or equal to 0.2.

[0692] Alternatively, the masking layer 105 comprises at least one film as described above and partially covering the outer face 102F, 102G of the molding support 111 so as to obtain a molding device 101 comprising: - a first external face 102B in a first molding zone A comprising open cavities 102C, not covered by the film, defining molding cavities for the formation of retaining elements 5 and / or preforms of retaining elements 5, and partially open cavities 102H, partially covered by the film, defining molding cavities for the formation of intermediate elements 5b, and - a second external face 102E formed by a surface of the film in a second molding zone B having closed cavities 102D which are sealed by the film, the second external face 102E being offset from the first external face 102B along a third direction Z perpendicular to the machine direction MD and to the transverse direction CD.

[0693] The molding device 101 is obtained by the molding device 101 preparation process as described above.

[0694] After the ribbon is manufactured using the molding device 101 described above, a ribbon is obtained comprising several retaining devices 301, each comprising intermediate elements 5b as described in Figures 7 to 9, and extending from the first upper face 3A, 303A of the base 2, 302, into the retaining zones 307a, 307a', 307b, 307b', along the third direction Z, and bordering at least partially the second upper face 3B, 303B of the base 2, 302, in the areas devoid of retaining elements 308a, 308b, 308c, 313a, 313b. The intermediate elements 5b are partially formed retaining elements 5, 305.

[0695] The first upper face 3A, 303A is offset relative to the second upper face 3B, 303B along the third direction Z so as to form a step 12 comprising a riser 31 connecting the first upper face 3A, 303A to the second upper face 3B, 303B.

[0696] The border 317 of the retention areas 307a, 307a', 307b, 307b' includes intermediate elements 5b and retention elements 5, 305.

[0697] The intermediate elements 5b are adjacent or intersecting with the riser 31.

[0698] At least part of the intermediate elements 5b includes a truncated rod 6' extending along the third direction Z, the truncated rod 6' having a truncated portion 32 opening at least partially towards the areas devoid of retaining elements 7B, 308a, 308b, 308c, 313a, 313b.

[0699] At least 5% of the intermediate 5b elements have a truncated head, in particular at least 10% or 20% of the intermediate 5b elements have a truncated head and / or less than 90% of the intermediate 5b elements have a truncated head, in particular less than 80%, 70%, 60%.

[0700] Let Bt be the width of the intermediate element 5b at the level of the truncated portion 32 and let Ct be the width of a missing portion of the truncated stem 6' of the intermediate element 5b, a ratio Bt / (Bt+Ct) is greater than or equal to 0.1, 0.2, 0.3, and / or less than or equal to 0.9, 0.8.

[0701] Alternatively, the base 302 and / or the retaining elements 305 and / or the intermediate elements 5b are a single unit, or the base and / or the retaining elements and / or the intermediate elements are "integral" according to the English designation. For example, the base and / or the retaining elements and / or the intermediate elements form a contiguous mass of resin.

[0702] According to another aspect of the invention, the retaining device 201, 301 comprises a base 202, 302 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 205, 305 extending from a first face 203, 303 of the base 202, 302 along a third direction Z, perpendicular to the first and second directions X, Y. The retaining elements 205, 305 each include a shank and optionally a head to form a hook capable of cooperating with a counterpart comprising loops.

[0703] Base 202,302 includes: - at least one M retention pattern comprising one or more retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' equipped with retention elements 205, 305, and - at least one area without restraint elements 208, 213a, 213b, 308a, 308b, 308c, 313a, 313b.

[0704] The at least one retention motif M is delimited by two opposing longitudinal edges 212a, 212b, 312a, 312b extending along the first direction X, of which a first longitudinal edge 212a, 312a and a second longitudinal edge 212b, 312b, and by two opposing transverse edges 218a, 218b, 318a, 318b extending along the second direction Y, of which a first transverse edge 218a, 318a and a second transverse edge 218b, 318b.

[0705] An isosurface coefficient Qi SO s = (P / Pref) x 100 is defined to characterize the level of flexibility and gripping efficiency of restraint devices, where P is the perimeter of the restraint pattern M, and P re f being a reference perimeter corresponding to the perimeter of a disk having the same area as the restraint pattern M.

[0706] The retention pattern M has an isosurface coefficient Qisos that is greater than or equal to 130%, in particular greater than or equal to 140%, and in particular greater than or equal to 180%. For example, the isosurface coefficient Qisos may be greater than or equal to 250%, in particular greater than or equal to 350%.

[0707] The isosurface coefficient allows the comparison of the actual perimeter of a retention pattern M versus the perimeter of a disk that would have the same area as the pattern.

[0708] Each retention area 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' of figures 10 to 14 is delimited by a border 217, 317 (or contour) which is continuous, forming a perimeter of the retention area. The perimeter P of the retention reason M corresponds to the perimeter of the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention reason M comprises a single retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', or to the sum of the perimeters of the retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention reason M comprises several zones retention 207, 207a, 207b, 307a, 207c, 207d, 207e, 207f, 307a', 307b, 307b'.Similarly, the area S of the retention pattern M corresponds to the area of ​​the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention pattern M comprises a single retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' or to the sum of the areas of the retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention pattern M includes several retention areas 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b'.

[0709] The isosurface coefficient Qisos is less than or equal to 800%, in particular less than or equal to 700%, in particular less than or equal to 600%.

[0710] When the retention pattern M comprises a single retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', in the retention pattern M, the ratio between the area of ​​the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', and the total area of ​​the first face 203, 303 of the base 202, 302 delimited by the first longitudinal edge 212a, 312a, the second longitudinal edge 212b, 312b and the two transverse edges 218a, 218b, 318a, 318b, is greater than or equal to 50% and less than 100%.

[0711] When the restraint pattern M includes several restraint zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', in the pattern of retention M, the ratio between the sum of the areas of the retention zones, and the total area of ​​the first face 203, 303 of the base 202, 302 delimited by the first longitudinal edge 212a, 312a, the second longitudinal edge 212b, 312b and the two transverse edges 218a, 218b, 318a, 318b is greater than or equal to 50% and less than 100%.

[0712] The method for calculating the isosurface coefficient Qisos includes the following steps: - identification of a reason for detention M, - measurement of the perimeter P of the retention reason M, - measurement of the surface area S of the retention pattern M, - Calculating the radius R of a disk with the same surface area S, using the formula S=Pi*R 2 , - calculation of the reference perimeter P re f of this disk given the radius R and the formula P re f=2*Pi*R, and - calculation of the isosurface coefficient Qi SO s = (P / Pref) x 100.

[0713] The reason for detention M may include a sub-reason which may be a single reason, or the reason for detention M may include several sub-reasons for detention and / or several times the same sub-reason for detention.

[0714] Figure 10 illustrates a first restraint device 201 comprising a restraint pattern M which includes two identical sub-patterns.

[0715] The perimeter P of the containment pattern M corresponds to the outline (or border 217) of each of the six containment zones 207a, 207b, 207c, 207d, 207e, 207f forming the containment pattern M. The border 217 is bounded at least partially by the zone without containment elements 208, 213a, 213b and / or by at least one of the two transverse end edges 210a, 210b of the base 202 and / or by at least one of the two longitudinal end edges 209a, 209b of the base 202 and / or by at least one of the two transverse edges 218a, 218b and / or by at least one of the two longitudinal edges 212a, 212b of the retention pattern M. The perimeter P is the sum of the six perimeters bordering each of the six retention zones 207a, 207b, 207c, 207d, 207e, 207f.

[0716] The surface area S of the retention pattern M corresponds to the sum of the areas of the six retention zones 207a, 207b, 207c, 207d, 207e, 207f forming the retention pattern M. The surface area S of the retention pattern M corresponds to the gripping surface.

[0717] Surfaces and perimeters can typically be observed from a photograph obtained with a Keyence Corporation digital microscope, model number "VHX 6000", at an appropriate magnification, for example, 20x, and possibly with 2D stitching. Measurements are obtained using the digital microscope's image analysis software.

[0718] The measured perimeter P is 276.3 mm and the measured surface area is 338.7 mm 2 .

[0719] We then calculate the radius R of a disk with the same surface area S using the formula S = Pi * R 2 .

[0720] Next, the reference perimeter P is calculated. re f of this disk given the radius R and the formula P re f=2*Pi*R.

[0721] The reference perimeter P re f of the retention pattern M in Figure 10 is 65.2 mm.

[0722] We obtain an isosurface coefficient Qi SO s= (P / Pref) x 100 = 423%.

[0723] In the retention pattern M, it is also possible to deduce a gripping surface area ratio S / total surface area of ​​the retention pattern M, which is approximately 77%. The surface area S (gripping surface) of the retention pattern M corresponds to the sum of the surfaces of the retention patterns 207a, 207b, 207c, 207d, 207e, 207f arranged within the retention pattern M. The total surface area of ​​the retention pattern M corresponds to the area delimited by the longitudinal edges 212a, 212b and the transverse edges 218a, 218b of the retention pattern M. Thus, the total surface area of ​​the The retention pattern M lacks the surface area corresponding to the longitudinal edges 213a, 213b and any transverse edges. Therefore, the longitudinal edges 213a, 213b are not taken into account. The transverse edges are therefore not taken into account.

[0724] Alternatively, the surface S (gripping surface) of the retention pattern M can correspond to the surface of the single retention area M (if the retention pattern includes a single retention area).

[0725] For the examples in Figures 10A to 14, the perimeter P (in mm), the area S (in mm 2 ), the reference perimeter PRef (in mm), and the isosurface coefficient Qisos were obtained using the same method as described previously for the example in Figure 10. These different values ​​have been summarized in the table below.

[0726] Table: Number of Coefficient Coefficient Number of zones Perimeter P Surface S isoperimetric isosurfacial Figure retention patterns in the P Ref Spef (mm) (mm 2 ) (mm) (mm 2 ) (%) (%) withheld reason for retained First device of 10 1 6 276.3 338.7 65.2 6073.8 6% 423% retained Second device of 10A 1 6 276.3 338.7 65.2 6073.8 6% 423% retained Third device of 11 1 16 222.5 201.8 50.4 3941.0 5% 442% retained Fourth device of 12 1 9 256.9 262.3 57.4 5251.9 5% 447% retained Fifth device of 13 1 1 231.4 220.0 52.6 4262.2 5% 440% retained Sixth device of 14 1 11 338.3 286.9 60.0 9105.8 3% 563% retained

[0727] The separation distance between the two transverse edges 218a, 218b of the retention pattern M (in mm), the separation distance between the two edges The longitudinal 212a, 212b of the retention pattern M (in mm), and the ratio of gripping surface S / total surface of the retention pattern M were obtained using the same method as previously described for the example in Figure 10. These different values ​​have been summarized in Table Tab2 below.

[0728] Table Tab2: Area ratio Distance between two Distance between two gripping S / transverse edges longitudinal edges Figure total surface the reason for withholding the reason for withholding of the pattern of (mm) (mm) retained (%) First device of 10 33.9 13.0 77% retained Second 10A device 33.9 13.0 77% retained Third device of 11 23.5 13.0 66% retained Fourth device of 12 26.2 12.3 82% retained Fifth device of 13 32.6 13.0 52% retained Sixth device of 14 35.8 13.0 62% retained

[0729] Figure 10A illustrates a second restraint device 201 for which the isosurface coefficient is 423%. Figure 11 illustrates a third restraint device 201 for which the isosurface coefficient is 442%. Figure 12 illustrates a fourth restraint device 201 for which the isosurface coefficient is 447%. Figure 13 illustrates a fifth restraint device 301 for which the isosurface coefficient is 440%. Figure 14 illustrates a sixth restraint device 301 for which the isosurface coefficient is 563%.

[0730] Comparing the six restraint devices 201, 301 in Figures 10 to 14, we find that the sixth restraint device 301 in Figure 14 has the highest isosurface coefficient (563%) compared to the other restraint devices 201, 301 in Figures 10 to 13.

[0731] On the contrary, the first and second restraint devices 201 in Figures 10 and 10A have the lowest isosurface coefficient (423%) compared to the other restraint devices 201, 301 in Figures 11 to 14.

[0732] Therefore, the restraint device 201 in Figure 14 presents a better compromise between flexibility and gripping performance compared to the other restraint devices 201, 301, the latter presenting a better compromise between flexibility and gripping performance compared with the restraint devices of the prior art.

[0733] The fourth restraint device 201 in Figure 12 has a gripping area ratio S / total area of ​​the restraint pattern M of 82% (Table Tab2), which is higher than that of the other restraint devices 201, 301 in Figures 10, 10A, 11, 13 and 14.

[0734] According to another aspect of the invention, the retaining device 201, 301 comprises a base 202, 302 extending along a first direction X and a second direction Y, perpendicular to the first direction X, and retaining elements 205, 305 extending from a first face 203, 303 of the base 202, 302 along a third direction Z, perpendicular to the first and second directions X, Y. The retaining elements 205, 305 each comprise a rod and optionally a head to form a hook suitable for cooperating with a counterpart comprising loops.

[0735] Base 202,302 includes: - at least one M retention pattern comprising one or more retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' equipped with retention elements 205, 305, and - at least one area without restraint elements 208, 213a, 213b, 308a, 308b, 308c, 313a, 313b.

[0736] The at least one retention motif M is delimited by two opposing longitudinal edges 212a, 212b, 312a, 312b extending along the first direction X, of which a first longitudinal edge 212a, 312a and a second longitudinal edge 212b, 312b, and by two opposing transverse edges 218a, 218b, 318a, 318b extending along the second direction Y, of which a first transverse edge 218a, 318a and a second transverse edge 218b, 318b.

[0737] An isoperimetric coefficient Qis O p = (S / Sref) x 100 is defined to characterize the level of flexibility and gripping efficiency of restraint devices, where S is the surface area of ​​the restraint pattern M, and S re f being a reference surface corresponding to the surface of a disk having the same perimeter as the restraint pattern M.

[0738] The retention pattern M has an isoperimetric coefficient Qi SO p which is greater than 1% and less than 50%.

[0739] The isoperimetric coefficient allows the comparison of the actual surface area of ​​a retention pattern M versus the surface area of ​​a disk that would have the same perimeter as the pattern.

[0740] Each retention area 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' is delimited by a border (peripheral) 217, 317 which is continuous, forming a perimeter of the retention area. The perimeter P of the retention reason M corresponds to the perimeter of the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention reason M includes a single retention zone 207, 207a, 207b, 307a, 207c, 207d, 207e, 207f, 307a', 307b, 307b' or to the sum of the perimeters of the retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the restraint pattern M includes several restraint areas 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b'. Similarly, the area S of the retention pattern M corresponds to the area of ​​the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention pattern M comprises a single retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' or to the sum of the areas of the retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' when the retention pattern M includes several retention areas 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b'.

[0741] The method for calculating the isoperimetric coefficient Qi SO p includes the following steps: - identification of a reason for detention M, - measurement of the perimeter P of the retention reason M, - measurement of the surface area S of the retention pattern M, - Calculating the radius R of a disk with the same perimeter P, using the formula P=2*Pi*R, - calculation of the reference surface S re f of this disk given the radius R and the formula S re f=Pi*R 2 , And - calculation of the isoperimetric coefficient Qis O p = (S / Sref) x 100.

[0742] The reason for detention M may include a sub-reason which may be a single reason, or the reason for detention M may include several sub-reasons and / or several times the same sub-reason.

[0743] Figure 10 illustrates a first restraint device 201 comprising a restraint pattern M which includes two identical sub-patterns.

[0744] The perimeter P of the containment pattern M corresponds to the outline (or border 217) of each of the six containment zones 207a, 207b, 207c, 207d, 207e, 207f forming the retention pattern M. The border 217 is bordered at least partially by the area without retention elements 208, 213a, 213b and / or by at least one of the two transverse end edges 210a, 210b of the base 202 and / or by at least one of the two longitudinal end edges 209a, 209b of the base 202 and / or by at least one of the two transverse edges 218a, 218b and / or by at least one of the two longitudinal edges 212a, 212b of the retention pattern M. The perimeter P is the sum of the six perimeters bordering each of the six retention areas 207a, 207b, 207c, 207d, 207e, 207f.

[0745] The surface area S of the retention pattern M corresponds to the sum of the areas of the six retention zones 207a, 207b, 207c, 207d, 207e, 207f forming the retention pattern M. The surface area S of the retention pattern M corresponds to the gripping surface.

[0746] The measured perimeter P is 276.3 mm and the measured surface area is 338.7 mm 2 .

[0747] We then calculate the radius R of a disk with the same perimeter P using the formula P=2*Pi*R.

[0748] The reference surface S is then calculated. re f of this disk given the radius R and the formula S re f=Pi*R 2 .

[0749] The reference surface Sref of the retention pattern M in Figure 10 is 6073.8 mm 2 .

[0750] We obtain an isoperimetric coefficient Qis O p= (S / S re f) x 100 = 6%.

[0751] For the examples in Figures 10A to 14, the surface area S (in mm 2 ), the perimeter P (in mm), the reference surface SRef (in mm 2 ) and the isoperimetric coefficient Qisop, were obtained using the same method as described previously for the example in Figure 10. These different values ​​have been summarized in Table Tabl.

[0752] Figure 10A illustrates a second restraint device 201 for which the isoperimetric coefficient is 6%. Figure 11 illustrates a third restraint device 201 for which the isoperimetric coefficient is 5%. Figure 12 Figure 13 illustrates a fourth restraint device 201 for which the isoperimetric coefficient is 5%. Figure 14 illustrates a sixth restraint device 301 for which the isoperimetric coefficient is 3%.

[0753] Comparing the six restraint devices 201, 301 in Figures 10 to 14, we find that the sixth restraint device 301 in Figure 14 has the lowest isoperimetric coefficient (3%) compared to the other restraint devices 201, 301 in Figures 10 to 13, when the isoperimetric coefficient Qisop is calculated in the restraint pattern M.

[0754] On the contrary, the first and second restraint devices 201 in Figures 10 and 10A have the highest isoperimetric coefficient (6%) compared to the other restraint devices 201, 301 in Figures 11 to 14.

[0755] Therefore, the sixth restraint device 301 in Figure 14 presents a better compromise between flexibility and gripping performance compared with the other restraint devices 201, 301, the latter presenting a better compromise between flexibility and gripping performance compared with the prior art devices.

[0756] The fourth restraint device 201 in Figure 12 has a gripping area ratio S / total area of ​​the restraint pattern M of 82% (Table Tab2), which is higher than that of the other restraint devices 201, 301 in Figures 10, 10A, 11, 13 and 14.

[0757] As an example, the retention pattern M includes at least one retention area 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' which has a different shape from a circle and / or a square and / or a rectangle and / or a triangle and / or a rhombus.

[0758] According to an example, the retention pattern M comprising at least two retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', the at least two retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' have a different retention surface and / or a different shape.

[0759] According to an example, the retention pattern M includes a number of retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' between 1 and 50, specifically between 1 and 25.

[0760] According to one example, the retention pattern includes a number of retention zones 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' between 2 and 50, specifically between 2 and 25.

[0761] According to an example, at least one retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' of the retention pattern M may be a retention zone M full of retention elements 205, 305. In other words, at least one retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b' is devoid of at least one hollowed-out region of retention elements 205, 305, which hollowed-out region being totally contained within the retention zone 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b'.

[0762] According to one example, the retention pattern M comprises fewer than ten hollowed-out retention areas, each hollowed-out retention area comprising at least one fully hollowed-out region within retention area 207, 207a, 207b, 207c, 207d, 207e, 207f, 307a, 307a', 307b, 307b', in particular fewer than five hollowed-out retention areas, in particular fewer than two hollowed-out retention areas.

[0763] According to one example, the restraint device M comprises a single restraint motif M.

[0764] Although the present invention has been described with reference to specific examples / aspects of embodiment, it is evident that modifications and changes can be made to these examples / aspects without departing from the general scope of the invention as defined by the claims. In particular, individual features of the various embodiments illustrated / mentioned can be combined in additional embodiments / aspects. Therefore, the description and drawings should be considered in an illustrative rather than restrictive sense.

[0765] It is also evident that all the characteristics described with reference to a process are transposable, alone or in combination, to a device, and conversely, all the characteristics described with reference to a device are transposable, alone or in combination, to a process.

Claims

Demands [Claim 1] Retaining device (301) comprising a base (302) extending along a first direction (X) and a second direction (Y), perpendicular to the first direction (X), and retaining elements (305) extending from a first face (303) of the base (302) along a third direction (Z), perpendicular to the first and second directions (X, Y), - the base (302) comprising: o two opposing longitudinal end edges (309a, 309b) extending along the first direction (X) of which a first longitudinal end edge (309a) and a second longitudinal end edge (309b), o two opposing transverse end edges (310a, 310b) extending in a direction that is secant to the first direction (X), including a first transverse end edge (310a) and a second transverse end edge (310b), and o at least one retention pattern (M) comprising at least one retention zone (307a, 307b) provided with retention elements (305), the retention elements (305) each comprising a rod, the at least one retention pattern (M) being delimited by two opposing longitudinal edges (312a, 312b) extending in the first direction (X), - the retention zone (307a, 307b) of said at least one retention pattern (M) comprising at least one continuous portion (307a) extending continuously from the first transverse end edge (310a) of the base (302) up to the second transverse end edge (310b) of the base (302) along a longitudinal direction (A),the continuous portion (307a) having a width that is greater than the distance between two adjacent retaining elements (305), - said at least one restraint pattern (M) being arranged so that any straight line segment (L) arranged in said at least one restraint pattern (M) and extending perpendicularly to the longitudinal direction (A) and / or extending perpendicularly to the first direction (X), from the first longitudinal edge (312a) of at least one retention pattern (M) to the second longitudinal edge (312b) of at least one retention pattern (M), crosses at least once the continuous portion (307a), - said at least one retention pattern (M) having a retention width extending along the second direction (Y) between the two longitudinal edges (312a, 312b) of at least one retention pattern (M), the retention width varying in the direction of the first direction (X). [Claim 2] Retention device (301) according to claim 1, wherein the retention area (307a, 307b) comprises at least one lateral portion (307b) extending from the continuous portion (307a). [Claim 3] Retaining device (301) according to claim 2, wherein the retaining device (301) comprises at least one area devoid of retaining elements (308, 308a, 308b, 308c, 313a, 313b) comprising at least one transverse portion (308, 308a, 308b, 308c) positioned at least partially between said at least one lateral portion (307b) and one of the first and second transverse end edges (310a, 310b) of the base (302) and extending from the continuous portion (307a) to one of the longitudinal edges (312a, 312b) of at least one retaining motif (M). [Claim 4] Retaining device (301) according to claim 3, wherein at least one area devoid of retaining elements (308, 308a, 308b, 308c, 313a, 313b) of the retaining device (301) comprises several transverse portions (308, 308a, 308b, 308c), each positioned between two successive lateral portions (307b) along the first direction (X) and extending from the continuous portion (307a) to one of the longitudinal edges (312a, 312b) of at least one retaining motif (M). [Claim 5] Retaining device (301) according to claim 3 or 4, wherein at least one area devoid of retaining elements (308, 308a, 308b, 308c, 313a, 313b) comprises at least one first longitudinal border (313a) devoid of retaining elements (305) extending at least partially along the first direction (X) between the first longitudinal end edge (309a) of the base (302) and the first longitudinal edge (312a) of at least one retaining pattern (M), at least one transverse portion (308, 308a, 308b, 308c), in particular each transverse portion (308, 308a, 308b, 308c) being connected to the first longitudinal border (313a). [Claim 6] Retaining device (301) according to any one of claims 3 to 5, wherein the base (302) has a first thickness El measured along the third direction (Z) in the retention areas (307a, 307b) of said at least one retention pattern (M) and a second thickness E2 measured along the third direction (Z) in the at least one area devoid of retention elements (308, 313a, 313b), the first thickness El being less than 360 pm, in particular less than or equal to 300 pm, in particular less than or equal to 120 pm, in particular less than 100 pm, a ratio R1=(E1- E2) / E1 being greater than or equal to 0.1, in particular greater than or equal to 0.2, in particular greater than or equal to 0.3, in particular less than or equal to 1.0, in particular less than or equal to 0.

9. [Claim 7] Retaining device (301) according to any one of claims 3 to 6, wherein the ratio between the length and the width of the transverse portion (308, 308a, 308b, 308c) is greater than or equal to 2, in particular greater than or equal to 4, in particular greater than or equal to 5 and / or less than or equal to 500, in particular less than or equal to 300, in particular less than or equal to 200. [Claim 8] Retention device (301) according to any one of claims 3 to 7, wherein the ratio between the area of ​​at least one retention zone (307a, 307b) of said at least one retention pattern (M) and the area of ​​the transverse portions (308, 308a, 308b, 308c) is greater than or equal to 1, in particular greater than or equal to 1.5, in particular greater than or equal to 2, and / or less than or equal to 50, in particular less than or equal to 40, in particular less than or equal to 30. [Claim 9] Retention device (301) according to any one of claims 3 to 8, wherein the ratio along the first direction (X) between the width of the lateral portions (307b) of the at least one retention zone (307a, 307b) of said at least one retention pattern (M) and the width of the transverse portions (308, 308a, 308b, 308c) is greater than 0.

5. [Claim 10] Retaining device (301) according to any one of claims 3 to 9, wherein the transverse portion (308, 308a, 308b, 308c) has a width greater than or equal to 0.5 mm, in particular greater than or equal to 0.7 mm, in particular greater than or equal to 0.8 mm, and / or less than or equal to 5 mm, in particular less than or equal to 3 mm. [Claim 11] Retention device (301) according to any one of claims 1 to 10, wherein the variation in the width of the retention zone (307a, 307b) varies between 5% and 100% of the maximum width of the retention zone (307a, 307b), in particular between 10% and 100% of the maximum width of the retention zone (307a, 307b), in particular between 20% and 100% of the maximum width of the retention zone (307a, 307b). [Claim 12] A restraint device (301) according to any one of claims 1 to 11, wherein the continuous portion (307a) of the restraint zone (307a, 307b) of said at least one restraint pattern (M) has a width greater than or equal to 10% of the maximum width of the restraint zone (307a, 307b), in particular greater than or equal to 15%, in particular greater than or equal to 20% and / or less than or equal to 45%, in particular less than or equal to 40%. [Claim 13] Restraint device (301) according to any one of claims 1 to 12, wherein said at least one restraint motif (M) further comprises a restraint zone devoid of a continuous portion. [Claim 14] Restraint device (301) according to any one of claims 1 to 12, wherein said at least one restraint motif (M) comprises two restraint zones (307a, 307a', 307b, 307b'), of which a first restraint zone and a second restraint zone, the first restraint zone being distinct from the second restraint zone.

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